CN202362479U - Middle-infrared band transmission-type sub-wavelength metal grating - Google Patents

Middle-infrared band transmission-type sub-wavelength metal grating Download PDF

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Publication number
CN202362479U
CN202362479U CN2011204551927U CN201120455192U CN202362479U CN 202362479 U CN202362479 U CN 202362479U CN 2011204551927 U CN2011204551927 U CN 2011204551927U CN 201120455192 U CN201120455192 U CN 201120455192U CN 202362479 U CN202362479 U CN 202362479U
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infrared band
type sub
metal grating
infrared
band transmission
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CN2011204551927U
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Chinese (zh)
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周佩珩
张楠
谢建良
邓龙江
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University of Electronic Science and Technology of China
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University of Electronic Science and Technology of China
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Abstract

The utility model provides a middle-infrared band transmission-type sub-wavelength metal grating and belongs to the technical field of functional material and devices. The middle-infrared band transmission-type sub-wavelength metal grating includes a zinc selenide glass substrate, and a metal film disposed on the surface of the zinc selenide glass substrate and having a periodical hole structure. In the periodical hole structure, the radius of each hole is smaller than a half of a hole period P. The hole period P is 1 to 10 micro meters. In the utility model, by utilizing the sub-wavelength periodical structure smaller than an infrared wavelength, the selective transmission of infrared light is realized in a middle-infrared band of 2.5 to 25 micro meters. At the same time, a function of electromagnetic wave in microwave millimeter waveband is shielded. The middle-infrared band transmission-type sub-wavelength metal grating in the utility model has characteristics of simple structure and easy realization, and can be applied to infrared detection devices needing electromagnetic shielding.

Description

A kind of middle-infrared band transmission-type sub-wave length metal grating
Technical field
The utility model belongs to functional material and device technology field, is applied to the selectivity that middle-infrared band has electro-magnetic screen function and passes through infrared optical device fields such as ripple detection window and band general formula wave filter.
Background technology
In the application of infrared acquisition window, need a kind of effectively shield electromagnetic interference at present, can see through the optical window of infrared light again.Currently in application, be mostly to adopt the structure of metal grid mesh to realize above-mentioned functions.The cycle of this metallic mesh structure is much larger than infrared light wavelength, and is little to the performance impact of infrared optics wave band.
The research of sub-wavelength metal periodic structure is derived from last century end, a new branch of science that therefrom derives: surface etc. have become the research focus of a plurality of ambits such as optics, theoretical physics in the world from excitonics (plasmonics).Surface plasma has surperficial local and near field and strengthens two peculiar properties, and the character through can the control surface plasma to the adjustment of metal construction influence intercoupling of light and metal construction, controls the propagation characteristic of light.An important application of sub-wavelength metal periodic structure is exactly to utilize surface plasma to realize the extraordinary transmission of light: at the superelevation selective permeation of realizing light much larger than the wave band in metal construction cycle.
Chinese patent " a kind of electromagnetic screen optical window " (application number: 200810063988.0) disclose a kind of electromagnetic screen optical window of Harbin Institute of Technology's application with double-layer pane metallic mesh structure with double-layer pane metallic mesh structure; This electromagnetic screen optical window is by the identical grid metallic mesh of double-layer structure parameter or wire gauze is placed in parallel in optical window or the transparent substrates both sides constitute; The grid length of side of double-layer pane metallic mesh is greater than 2 times of the conventional monolayers grid metallic mesh grid length of side; And the spacing of its two-layer grid metallic mesh is 2~4 times of its grid length of side; With respect to conventional monolayers grid metallic mesh; The optical window that adopts double-layer pane metallic mesh structure is not when reducing transmittance; Increase substantially the shield effectiveness of microwave and millimeter wave, solved the problem that high transmission rate and forceful electric power magnetic shielding efficient can not be taken into account simultaneously in the existing optical window electromangnetic spectrum.
Another part Chinese patent of Harbin Institute of Technology's application " a kind of millimeter logical metallic mesh structure of wavestrip " (application number: 201010239333.1) disclose the logical metallic mesh structure of a kind of millimeter wavestrip; This metallic mesh structure is that periodic unit constitutes by square perception net grid, outer resonance annulus and interior resonance annulus; It is inner that wherein outer resonance annulus is positioned at square perception net grid; It is inner that the interior resonance annulus is positioned at outer resonance annulus; And square perception net grid have common center with outer resonance annulus and interior resonance annulus; The cycle of square perception net grid, the diameter of outer resonance annulus was less than the cycle of square perception net grid less than disturbing 1/2nd of electromagnetic wave minimum wavelength, and the diameter of outer resonance annulus is greater than the diameter of interior resonance annulus.Be applied to the anti-electromagnetic interference (EMI) technical field of millimeter wave, laser, infrared three mould complex probe instruments.
In some application of infrared acquisition, the infrared acquisition window not only need have electro-magnetic screen function, need have selectivity to infrared band (especially wavelength is 2.5~25 microns middle-infrared band) simultaneously and pass through wave energy.Though but the optical window that above-mentioned two kinds of technical schemes propose can satisfy the electromagnetic screen of microwave and millimeter wave section, can't realize that all the selectivity of infrared band is passed through ripple.
Summary of the invention
The technology of the utility model is dealt with problems: can only pass through the technological deficiency that ripple can't filtering to present infrared window, propose a kind of middle-infrared band transmission-type sub-wave length metal grating.This metal grating has the selective transmission function to wavelength at the infrared light of 2.5~25 microns middle-infrared band when satisfying the microwave and millimeter wave electro-magnetic screen function.
The technical scheme of the utility model is:
A kind of middle-infrared band transmission-type sub-wave length metal grating like Fig. 1, shown in 2, comprises zinc selenide glass substrate 1 and is positioned at the metallic film 2 that zinc selenide glass substrate 1 surface has the periodicity pore space structure.In the said periodicity pore space structure, the radius r of single hole is less than 1/2nd of hole cycle P, and described hole cycle P is 1~10 micron.
In the technique scheme: 1) said periodicity pore space structure can be square array array structure (as shown in Figure 1), also can be hexagonal array array structure (as shown in Figure 2); 2) said surface has periodically that the thickness of the metallic film 2 of pore space structure is 100~300 nanometers; 3) said surface has periodically that the material of the metallic film 2 of pore space structure can be gold, silver or aluminium.
The middle-infrared band transmission-type sub-wave length metal grating that the utility model provides; When the array cycle of metal hole is 1~10 micron; When the thickness of metallic film is 100~300 nanometers; Electromagnetic interference (EMI) that can the shield microwaves section; The transmission peaks of middle-infrared band appears at the wave band that is several times as much as the array cycle simultaneously: the electromagnetic wave of microwave section is 100% be reflected almost, and the strongest transmission peaks of quadrate array appears at place of about 2.5 times of array cycles, and the strongest transmission peaks of hexagonal array appears at place of about 2.2 times of array cycles.
The preparation method of above-mentioned transmission-type sub-wave length metal grating; Can adopt following method to prepare: at zinc selenide glass surface spin coating photoresist; Adopt contact uv-exposure machine to carry out figure transfer then, utilize electron beam evaporation metallic film on patterned photoresist surface deposition again, after use acetone is peeled off method removal photoresist; Use alcohol, washed with de-ionized water successively again, last nitrogen dries up and promptly obtains said transmission-type sub-wave length metal grating.
The utility model compared with prior art has the following advantages:
1. because the introducing of sub-wavelength structure can realize that a selectivity is good, transmitance is high passes through wavestrip, can realize the filtering performance of middle-infrared band, has overcome existing metal grid mesh structure and can only pass through the defective that ripple can't filtering.
The position and the intensity of the adjusting transmission peaks of cycle that 2. can be through array, the flexible in size of hole, the band general character are can controllability very strong.
3. the adjustment through array structure can be in a big way adjustment transmission peaks position and intensity, for the band general character can regulation and control the selection of diversification more is provided.
4. adopt zinc selenide glass as substrate, it has higher and more level and smooth transmitance in middle-infrared band than silicon substrate, does not have the characteristic absorption peak in the silicon substrate simultaneously, and the non-normalized transmitance of transmission spectrum is higher.
5. preparation technology simple, be easy to realize, can obtain large-area transmission-type sub-wave length metal grating.
Description of drawings
The structural representation of the middle-infrared band transmission-type sub-wave length metal grating that Fig. 1 provides for the utility model with square array array structure.
The structural representation of the middle-infrared band transmission-type sub-wave length metal grating that Fig. 2 provides for the utility model with hexagonal array array structure.
Fig. 3 is the normalized transmittance curve of quadrate array and hexagonal array pore space structure on the metallic aluminium film of the utility model.
Embodiment
Below in conjunction with accompanying drawing and embodiment the utility model is further specified.
Zinc selenide substrate 1, metallic film structural sheet 2
Example 1, be that quadrate array is arranged with pore space structure on the metallic aluminium film, in 6 microns of hole cycles, hole diameter is an example for 3 microns:
1. clean substrate, use acetone, alcohol, deionized water carry out ultrasonic cleaning to substrate successively, and the ultrasonic cleaning time of each step is all greatly about 10 minutes;
2. utilize photoresist spinner uniform AZ5214 reversal photoresist of thickness in the substrate surface spin coating after the cleaning;
3. with drying by the fire before the substrate of bake plate after to gluing, baking temperature is 100 degrees centigrade, 1 minute time;
4. adopt contact uv-exposure machine to the substrate exposure of gluing, the periodicity hole array pattern on the mask plate is transferred on the photoresist under ultraviolet source, the time shutter is 2.5 seconds;
5. with bake plate to the exposure after substrate after dry by the fire, make negative photoresist change positive photoresist into, baking temperature is 120 degrees centigrade, 90 seconds time;
6. the general exposure of substrate maskless after adopting contact uv-exposure machine to the back baking, the time shutter is 45 seconds;
7. place developer solution to develop the substrate after the general exposure, development time is 45 seconds;
The sample that 8. will pass through development places the interior depositing metal films of vacuum chamber of electron beam evaporation system, and the evaporation target is an aluminium, about per minute 12 nanometers of evaporation rate, and growth time is 17 minutes, about 200 nanometers of thickness of metal film;
9. remove photoresist with the sample of acetone to the metallic film of having grown, and use alcohol once more, washed with de-ionized water promptly obtains prepared grating sample after nitrogen dries up.
Example 2, be that hexagonal array is arranged with pore space structure on the metallic aluminium film, in 6 microns of array cycles, hole diameter is an example for 3 microns:
Except step 4., other is identical with routine 1 step.In this example, figure is that sexangle hole array structure is arranged on the 4. used photo mask board of step.
For above-mentioned two kinds of middle-infrared band transmission-type sub-wave length metal grating samples; Adopt Fourier infrared spectrograph to test its infrared transmission rate curve; As shown in Figure 3: the metal grating of hexagonal array array structure has been realized the peak that sees through of a transmitance about 30% 12~15 microns (about 2.2 times array cycles place), and the metal grating of square array array structure has been realized the peak that sees through of a transmitance about 18% at 13~16 microns (places of about 2.5 times of array cycles).

Claims (4)

1. a middle-infrared band transmission-type sub-wave length metal grating comprises zinc selenide glass substrate (1) and is positioned at zinc selenide glass substrate (1) surface to have the periodically metallic film (2) of pore space structure; It is characterized in that in the said periodicity pore space structure, the radius r of single hole is less than 1/2nd of hole cycle P, described hole cycle P is 1~10 micron.
2. middle-infrared band transmission-type sub-wave length metal grating according to claim 1 is characterized in that, said periodicity pore space structure is square array array structure or hexagonal array array structure.
3. middle-infrared band transmission-type sub-wave length metal grating according to claim 1 and 2 is characterized in that, the thickness that said surface has the metallic film (2) of periodicity pore space structure is 100~300 nanometers.
4. middle-infrared band transmission-type sub-wave length metal grating according to claim 1 and 2 is characterized in that, the material that said surface has the metallic film (2) of periodicity pore space structure is gold, silver or aluminium.
CN2011204551927U 2011-11-16 2011-11-16 Middle-infrared band transmission-type sub-wavelength metal grating Expired - Fee Related CN202362479U (en)

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Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102401917A (en) * 2011-11-16 2012-04-04 电子科技大学 Middle-infrared waveband transmission type sub-wavelength metal grating
CN104777528A (en) * 2015-03-12 2015-07-15 浙江大学 All-metal anti-reflection system based on two-dimensional grating structure
CN106385527A (en) * 2016-09-09 2017-02-08 中电科技扬州宝军电子有限公司 Microwave single pixel imaging front end device
CN107894625A (en) * 2017-09-29 2018-04-10 扬中市恒海电子科技有限公司 A kind of integrated infrared bandpass filter and its manufacture method and spectrometer
CN111045122A (en) * 2020-01-08 2020-04-21 中国人民解放军国防科技大学 Surface plasma display pixel structure based on circular hole array

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102401917A (en) * 2011-11-16 2012-04-04 电子科技大学 Middle-infrared waveband transmission type sub-wavelength metal grating
CN104777528A (en) * 2015-03-12 2015-07-15 浙江大学 All-metal anti-reflection system based on two-dimensional grating structure
CN106385527A (en) * 2016-09-09 2017-02-08 中电科技扬州宝军电子有限公司 Microwave single pixel imaging front end device
CN106385527B (en) * 2016-09-09 2019-04-09 中电科技扬州宝军电子有限公司 A kind of microwave single pixel imaging front device
CN107894625A (en) * 2017-09-29 2018-04-10 扬中市恒海电子科技有限公司 A kind of integrated infrared bandpass filter and its manufacture method and spectrometer
CN111045122A (en) * 2020-01-08 2020-04-21 中国人民解放军国防科技大学 Surface plasma display pixel structure based on circular hole array

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