CN202331010U - Baking equipment - Google Patents
Baking equipment Download PDFInfo
- Publication number
- CN202331010U CN202331010U CN2011204651164U CN201120465116U CN202331010U CN 202331010 U CN202331010 U CN 202331010U CN 2011204651164 U CN2011204651164 U CN 2011204651164U CN 201120465116 U CN201120465116 U CN 201120465116U CN 202331010 U CN202331010 U CN 202331010U
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- exhausr port
- cavity
- roasting plant
- lid
- hot plate
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Abstract
The utility model provides baking equipment, comprising a cavity, a cover body and a flow adjusting device, wherein the cavity is provided with an opening at one end; the cover body is arranged at an opening end of the cavity; the flow adjusting device is arranged outside the cavity; the cover body is provided with at least one air exhausting opening and the flow adjusting device is connected with the air exhausting opening. The air exhausting amount of the air exhausting opening of the baking equipment provided by the utility model can be adjusted in real time according to a technical process, so that the production efficiency of the baking equipment is improved.
Description
Technical field
The utility model relates to the photo-etching technological process of field of semiconductor manufacture, relates in particular to a kind of roasting plant.
Background technology
In the photoetching process of semiconductor manufacturing, relate to a plurality of baking procedures, at first rotary coating photoresist or ARC on crystal column surface, through a step that is called soft baking (Soft Bake), the purpose of soft baking is the solvent of removing in the photoresist.Soft baking can strengthen the adhesion of photoresist, discharges the stress in the photoresist film, improves the photoresist homogeneity.Then wafer is made public, carry out a step that is called postexposure bake (post exposure bake) again, with the catalytic reaction of accelerating light acid or the influence that reduces standing wave.Developing subsequently displays figure, at last maybe be also needs a step that is called (the hard bake) of hard baking so that to form the photoresistance figure firmer.
The photoresist baking procedure carries out in roasting plant; With soft baking is example; Shown in Figure 1 is a kind of soft baking equipment of prior art; Said soft baking equipment comprises cavity 11, lid 12, hot plate (Hot Plate) 13 and the well heater (Heater) (not showing among Fig. 1) of an end opening, and said lid 12 is arranged on the openend 111 of said cavity 11, and said hot plate 13 is arranged in the said cavity 11; Said well heater is arranged in the said hot plate 13, and said lid 12 is provided with an exhausr port 121 and a plurality of air intake openings 122.
The soft baking process of prior art is: continue in the soft baking equipment to maintain the entering of gas and taken away; In said cavity 11, feed dry room temperature (being about 22 ℃) gas 15 through said a plurality of air intake openings 122; For example nitrogen (N2) or air, and discharge from said exhausr port 121.When the temperature of current hot plate 13 is lower than the required baking temperature of technology; The said well heater required baking temperature of said hot plate 13 to technology that progressively heats up; When the temperature of current hot plate 13 is higher than the required baking temperature of technology; Said well heater stops heating, and the temperature of said hot plate 13 is taken away heat through input and output gas and progressively is cooled to the required baking temperature of technology.Have only when the required baking temperature of said hot plate 13 arrival technologies; The wafer 14 that scribbles photoresist (PR) just can get in the said cavity 11 through said openend 111; Place on the said hot plate 13, photoresist can produce volatile matter in the process of curing, and system discharges through turnover gas; After curing a period of time, said wafer 14 is transferred into the cold drawing cooling.
The soft baking equipment of prior art is except can soft baking photoresist, and the bottom anti-reflection layer (BARC) or other that also can soft baking be coated on the crystal column surface contain the spin-on material of organic solvent.
The air capacity of exhausr port described in the prior art 121 is a predefined definite value (the for example a certain value among 0.1～20L/min), equal the to lower the temperature air capacity of exhausr port 121 described in the process of cooling photoresist of the air capacity of exhausr port 121 described in the process of the baked photoresist that promptly heats up.Yet; The effect of room temperature air 15 in temperature-rise period that feeds in the said cavity 11 is different with its effect in temperature-fall period; In temperature-rise period; The thermal loss that the gas that expectation is discharged from said exhausr port 121 causes is as far as possible little, and in temperature-fall period, the gas that expectation is discharged from said exhausr port 121 can as often as possible be taken away heat.The soft baking equipment of prior art is because the air capacity of said exhausr port 121 is certain; In temperature-rise period, can cause bigger thermal loss (because the temperature of room temperature air 15 and the temperature in the cavity 11 differ bigger); Radiating effect is not good in temperature-fall period, is to a certain degree influencing the photoetching process efficiency of equipment.
The utility model content
The purpose of the utility model is to provide a kind of roasting plant, and the air capacity of its exhausr port is according to the process real-time regulated, to improve the production efficiency of roasting plant.
In order to reach above-mentioned purpose; The utility model provides a kind of roasting plant; Comprise an end opening cavity, be arranged on the lid on the openend of said cavity; And be arranged on the outer flow regulator of said cavity, and said lid is provided with at least one exhausr port, and said flow regulator is connected with said exhausr port.
Above-mentioned roasting plant, wherein, said flow regulator comprises flow valve and controller, and said flow valve is connected with said exhausr port, and said controller is connected with said flow valve.
Above-mentioned roasting plant, wherein, said flow regulator comprises pump and controller, and said pump is connected with said exhausr port, and said controller is connected with said pump.
Above-mentioned roasting plant, wherein, said exhausr port is one, said exhausr port is positioned at the central authorities of said lid.
Above-mentioned roasting plant wherein, also is provided with a plurality of air intake openings on the said lid, said a plurality of air intake openings are uniformly distributed in the edge of said lid.
Above-mentioned roasting plant, wherein, said exhausr port comprises a plurality of, said a plurality of exhausr ports are positioned at the edge of said lid.
Above-mentioned roasting plant, wherein, said a plurality of exhausr ports evenly distribute along same circumference.
Above-mentioned roasting plant, wherein, said roasting plant also comprises hot plate and well heater, and said hot plate is arranged in the said cavity, and said well heater is arranged in the said hot plate.
The roasting plant of the utility model utilizes flow regulator to control the air capacity of exhausr port in real time; In temperature-rise period, reduce the air capacity of exhausr port; In temperature-fall period, increase the air capacity of exhausr port, can accelerate programming rate and cooling rate, thereby improve the production efficiency of roasting plant.
Description of drawings
The roasting plant of the utility model is provided by following embodiment and accompanying drawing.
Fig. 1 is the structural representation of the soft baking equipment of prior art.
Fig. 2 is the structural representation of the roasting plant of the utility model embodiment one.
Fig. 3 is the structural representation of the roasting plant of the utility model embodiment two.
Embodiment
Below will combine Fig. 2～Fig. 3 that the roasting plant of the utility model is done further to describe in detail.
Embodiment one
Referring to Fig. 2, the roasting plant of the utility model embodiment comprises cavity 21, lid 22, hot plate 23, well heater (not showing among Fig. 2) and the flow regulator 24 of an end opening;
Said lid 22 is arranged on the openend 211 of said cavity 21, and the openend 211 of said cavity 21 forms the wafer of wafer turnover cavity 21 and imports and exports;
Said hot plate 23 is arranged in the said cavity 21, and said well heater is arranged in the said hot plate 23, and said well heater is used to heat said hot plate 23;
Said lid 22 is provided with an exhausr port 221 and a plurality of air intake openings 222, and preferably, said exhausr port 221 is positioned at the central authorities of lid 22, and said a plurality of air intake openings 222 are positioned at the edge of lid 22, and preferably, said a plurality of air intake openings 222 evenly distribute along same circumference;
Said flow regulator 24 is arranged on outside the said cavity 21, is connected with the exhausr port 221 of said lid 22.
Said flow regulator 24 is used for the air capacity of the said exhausr port 221 of real-time regulated.In one preferred embodiment; Said flow regulator 24 comprises flow valve and controller; Said flow valve is connected with said exhausr port 221; Said controller is connected with said flow valve, and said controller is used to control said flow valve, thereby realizes the real-time control to the air capacity of said exhausr port 221.
In another preferred embodiment; Said flow regulator 24 comprises pump and controller, and said pump is connected with said exhausr port 221, and said controller is connected with said pump; Said controller is used to control said pump, thereby realizes the real-time control to the air capacity of said exhausr port 221.
The process that the roasting plant of use present embodiment toasts is:
Said well heater progressively heats up and heats said hot plate 13; Simultaneously, dry room temperature (being about 22 ℃) gas 41, for example nitrogen (N2) or air; Get in the said cavity 21 through said a plurality of air intake openings 222; When the temperature of said hot plate 13 reached the required baking temperature of technology, the wafer 30 that scribbles photoresist got in the said cavity 21 through said openend 211, places on the said hot plate 23; 23 pairs of said wafer 30 lip-deep photoresists of said hot plate cure; The gas-entrained photoresist that gets into said cavity 21 cures the volatile matter that produces in the process and discharges from said exhausr port 221, and said flow regulator 24 is the air capacity of the said exhausr port 221 of control in real time, and the air capacity of said exhausr port 221 is controlled in the scope of 0.1～10L/min according to process;
In the present embodiment, the gas that feeds said cavity 21 is used to take away said volatile matter, and the temperature that feeds the gas of said cavity 21 is room temperature (being about 22 ℃); Differ bigger with the temperature in the said cavity 21, if the air capacity of said exhausr port 221 is bigger at this moment, the gas of then discharging from said exhausr port 221 will be taken away a large amount of heats; Cause big thermal loss, influence programming rate, and then influence baking efficient; The roasting plant of present embodiment utilizes said flow regulator 24 air capacity of the said exhausr port 221 of control in real time; With the air capacity of said exhausr port 221 be controlled at one more among a small circle in, significantly reduced thermal loss, accelerated programming rate;
After curing a period of time; Said well heater stops heating; Dry room temperature air 41 gets in the said cavity 21 through said a plurality of air intake openings 222; The heats that the gas that gets into said cavity 21 is taken away in the said cavity 21 are discharged from said exhausr port 221, and said flow regulator 24 is the air capacities of the said exhausr port 221 of control in real time, and the air capacity of said exhausr port 221 is controlled in the scope of 10～40L/min according to process;
In the process of cooling cooling photoresist; The gas that feeds said cavity 21 is used to take away the heat in the said cavity 21, reduces the temperature in the said cavity 21, and cooling rate is related to the time of technology cost; The roasting plant of present embodiment utilizes said flow regulator 24 air capacity of the said exhausr port 221 of control in real time; With the air capacity of said exhausr port 221 be controlled at one in a big way in, accelerated cooling rate greatly, saved the time;
The roasting plant of present embodiment utilizes flow regulator to control the air capacity of exhausr port in real time; In temperature-rise period, reduce the air capacity of exhausr port; In temperature-fall period, increase the air capacity of exhausr port, can accelerate programming rate and cooling rate, thereby improve the production efficiency of roasting plant.
Embodiment two
Referring to Fig. 3, embodiment two is that with the difference of embodiment one lid is provided with a plurality of exhausr ports 51 and an air intake opening 52; Wherein, said air intake opening is positioned at the central authorities of lid, and said a plurality of exhausr ports are positioned at the edge of lid; Preferably, said a plurality of exhausr port evenly distributes along same circumference.
Obviously, those skilled in the art can carry out various changes and modification to utility model and not break away from the spirit and the scope of the utility model.Like this, if these of the utility model are revised and modification belongs within the scope of the utility model claim and equivalent technologies thereof, then the utility model also is intended to comprise these change and modification.
Claims (8)
1. roasting plant; Lid on the cavity that comprises an end opening and the openend that is arranged on said cavity; Said lid is provided with at least one exhausr port; It is characterized in that said roasting plant also comprises the flow regulator that is arranged on outside the said cavity, said flow regulator is connected with said exhausr port.
2. roasting plant as claimed in claim 1 is characterized in that said flow regulator comprises flow valve and controller, and said flow valve is connected with said exhausr port, and said controller is connected with said flow valve.
3. roasting plant as claimed in claim 1 is characterized in that said flow regulator comprises pump and controller, and said pump is connected with said exhausr port, and said controller is connected with said pump.
4. like the described roasting plant of each claim in the claim 1 to 3, it is characterized in that said exhausr port is one, said exhausr port is positioned at the central authorities of said lid.
5. roasting plant as claimed in claim 4 is characterized in that, also is provided with a plurality of air intake openings on the said lid, and said a plurality of air intake openings are uniformly distributed in the edge of said lid.
6. like the described roasting plant of each claim in the claim 1 to 3, it is characterized in that said exhausr port comprises a plurality of, said a plurality of exhausr ports are positioned at the edge of said lid.
7. roasting plant as claimed in claim 6 is characterized in that, said a plurality of exhausr ports evenly distribute along same circumference.
8. like the described roasting plant of each claim in the claim 1 to 3, it is characterized in that said roasting plant also comprises hot plate and well heater, said hot plate is arranged in the said cavity, and said well heater is arranged in the said hot plate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011204651164U CN202331010U (en) | 2011-11-21 | 2011-11-21 | Baking equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011204651164U CN202331010U (en) | 2011-11-21 | 2011-11-21 | Baking equipment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN202331010U true CN202331010U (en) | 2012-07-11 |
Family
ID=46442985
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2011204651164U Expired - Fee Related CN202331010U (en) | 2011-11-21 | 2011-11-21 | Baking equipment |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN202331010U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105892243A (en) * | 2016-04-07 | 2016-08-24 | 上海华力微电子有限公司 | Hot plate air extracting device and temperature control method thereof |
| WO2023004892A1 (en) * | 2021-07-30 | 2023-02-02 | 长鑫存储技术有限公司 | Temperature control system, method, and apparatus, and storage medium |
-
2011
- 2011-11-21 CN CN2011204651164U patent/CN202331010U/en not_active Expired - Fee Related
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105892243A (en) * | 2016-04-07 | 2016-08-24 | 上海华力微电子有限公司 | Hot plate air extracting device and temperature control method thereof |
| WO2023004892A1 (en) * | 2021-07-30 | 2023-02-02 | 长鑫存储技术有限公司 | Temperature control system, method, and apparatus, and storage medium |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| ASS | Succession or assignment of patent right |
Owner name: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (BEIJING Free format text: FORMER OWNER: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION Effective date: 20130424 |
|
| C41 | Transfer of patent application or patent right or utility model | ||
| COR | Change of bibliographic data |
Free format text: CORRECT: ADDRESS; FROM: 201203 PUDONG NEW AREA, SHANGHAI TO: 100176 DAXING, BEIJING |
|
| TR01 | Transfer of patent right |
Effective date of registration: 20130424 Address after: 100176 No. 18, Wenchang Avenue, Beijing economic and Technological Development Zone, Beijing Patentee after: Semiconductor Manufacturing International (Beijing) Corporation Address before: 201203 Shanghai City, Pudong New Area Zhangjiang Road No. 18 Patentee before: Semiconductor Manufacturing International (Shanghai) Corporation |
|
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20120711 Termination date: 20181121 |
|
| CF01 | Termination of patent right due to non-payment of annual fee |