CN202238744U - Rinsing tank used for rinsing semi-conductor silicon wafers - Google Patents
Rinsing tank used for rinsing semi-conductor silicon wafers Download PDFInfo
- Publication number
- CN202238744U CN202238744U CN2011203530425U CN201120353042U CN202238744U CN 202238744 U CN202238744 U CN 202238744U CN 2011203530425 U CN2011203530425 U CN 2011203530425U CN 201120353042 U CN201120353042 U CN 201120353042U CN 202238744 U CN202238744 U CN 202238744U
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- China
- Prior art keywords
- shelf
- rinse bath
- leaks
- conductor silicon
- semi
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- Expired - Fee Related
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Abstract
The utility model discloses a rinsing tank used for rinsing semi-conductor silicon wafers. The rinsing tank comprises a rinsing tank body (1), wherein a water-seepage shelf (3) is arranged in a rinsing area (2) of the rinsing tank body (1); the water-seepage shelf (3) is horizontally arranged at the middle-lower part in the rinsing area; a water outlet valve (4) is arranged at the outer side of the side wall of the rinsing tank body (1); and the water outlet valve (4) is positioned on the side wall between the water-seepage shelf (3) and the bottom of the rinsing tank body (1). The rinsing tank can be designed to have different sizes according to practical requirements; and two or more flower baskets inserted with the semi-conductor silicon wafers can be placed on the water-seepage shelf in the rinsing tank, the time for rinsing the semi-conductor silicon wafers is shortened, and the use cost for deionized water is saved. The rinsing tank is simple in structure and convenient to operate; the manual operation is reduced; the work efficiency is improved; and the rinsing tank is suitable to be popularized and used in the production of semi-conductor silicon wafers.
Description
Technical field
The utility model relates to the cleaning equipment of silicon chip in the semiconductor technology, specifically a kind of rinse bath that is used to clean semi-conductor silicon chip.
Background technology
On existing technology; The quartzy cylinder of general employing washes semi-conductor silicon chip; Before flushing, need semi-conductor silicon chip be put into quartzy cylinder and wash, not only the manual work of labor and efficient are not high; Need wash with double conductor silicon chip of deionized water simultaneously, increase the cost of deionized water.
Summary of the invention
The purpose of the utility model is the defective to prior art, provides a kind of simple in structure, the rinse bath that is used to clean semi-conductor silicon chip that cleaning efficiency is high.
The purpose of the utility model solves through following technical scheme:
A kind of rinse bath that is used to clean semi-conductor silicon chip, it comprises the rinse bath body, is provided with the shelf that leaks in the cleaning area of said rinse bath body, this shelf that leaks is horizontally set on the middle and lower part in the cleaning area; The outside of said rinse bath body is provided with outlet valve, and described outlet valve is on the sidewall between the bottom land of dividing plate and rinse bath body that leaks.
The described shelf that leaks is provided with the leaking hole that runs through the shelf thickness that leaks.
Described leaking hole is rounded, oval, square, in rectangle or the triangle one or more.
The described shelf that leaks is provided with the division board of vertical setting, and described division board is positioned on the bisector of the shelf that leaks.
The said bisector place that leaks shelf upper surface one side is provided with groove, and described groove is inlayed with the lower end of division board and linked to each other.
The side wall upper part of said rinse bath body is provided with handle, and described handle is symmetricly set on the sidewall of rinse bath body.
The described shelf that leaks adopts plastic plate to process.
The utility model is compared prior art has following advantage:
The utility model can be designed to the different rinse bath of size according to actual needs; Two and the plural gaily decorated basket that is inserted with semi-conductor silicon chip be can place on the shelf that leaks in the rinse bath, and the scavenging period of semi-conductor silicon chip and the use cost of having saved deionized water shortened.
The utility model is simple in structure, easy to operate, has reduced manual operations, and has improved operating efficiency, suits in semi-conductor silicon chip production, to promote the use of.
Description of drawings
Accompanying drawing 1 is the part sectional structure sketch map of the utility model;
Accompanying drawing 2 is the diaphragm structure sketch mapes that leak of the utility model.
Wherein: 1-rinse bath body; 2-cleaning area; 3-shelf leaks; 4-outlet valve; 5-leaking hole; 6-division board; 7-groove; 8-handle.
The specific embodiment
Further illustrate the utility model below in conjunction with accompanying drawing and embodiment; Should understand these embodiment only be used to the utility model is described and be not used in the restriction the utility model scope; After having read the utility model, those skilled in the art all fall within the application's accompanying claims institute restricted portion to the modification of the various equivalent form of values of the utility model.
As depicted in figs. 1 and 2: a kind of rinse bath that is used to clean semi-conductor silicon chip; It comprises rinse bath body 1; In the cleaning area 2 of rinse bath body 1, be provided with the shelf 3 that leaks that plastic plate is processed; This shelf 3 that leaks is horizontally set on the middle and lower part in the cleaning area 2, on the shelf 3 that leaks, is provided with the leaking hole 5 that runs through shelf 3 thickness that leak, and leaking hole is 5 rounded, oval, square, in rectangle or the triangle one or more; Bisector place in shelf 3 upper surfaces one side of leaking is provided with groove 7; Groove 7 is embedded in the lower end that vertically is arranged on the division board 6 on the shelf 3 that leaks; The width of groove 7 is identical with the thickness of division board 6; Be that the lower end of division board 6 embeds in the groove 7 and is fixedly installed on the shelf 3 that leaks, separating cleaning to being placed on the gaily decorated basket that is inserted with semi-conductor silicon chip on the shelf 3 that leaks, the accompanying drawing 2 of the utility model show for placing the dividing plate 3 that leaks of two gailys decorated basket simultaneously.Outside at rinse bath body 1 also is provided with the outlet valve 4 that the control deionized water flows out, and this outlet valve 4 is on the sidewall between the bottom land of dividing plate 3 and rinse bath body 1 that leaks; Side wall upper part at rinse bath body 1 also is provided with the handle 8 that is symmetricly set on rinse bath body 1 sidewall in addition, and personnel move rinse bath with handled easily.
The utility model is at first closed the outlet valve 4 on the rinse bath in use, waits for and piles deionized water; The gaily decorated basket that is inserted with semi-conductor silicon chip that then pickling is finished is placed on the shelf 3 that leaks in the cleaning area 2; Open outlet valve 4 then; The semi-conductor silicon chip that the deionization water pipe is aimed between the gaily decorated basket washes; Because the reagent density of using in the cleaning process is all greater than water; So reagent all can down precipitate in water, make reagent along with outlet valve 4 flows out rinse bath, thereby make semi-conductor silicon chip reach optimal cleaning effect.The utility model can be designed to the different rinse bath of size according to actual needs; Two and the plural gaily decorated basket that is inserted with semi-conductor silicon chip be can place on the shelf that leaks in the rinse bath, the scavenging period of semi-conductor silicon chip and the use cost of having saved deionized water shortened; And simple in structure, easy to operate, reduce the manual operating efficiency that improved simultaneously, suit in semi-conductor silicon chip production, to promote the use of.
The technology that the utility model does not relate to all can realize through prior art.
Claims (7)
1. rinse bath that is used to clean semi-conductor silicon chip; It comprises rinse bath body (1); It is characterized in that being provided with the shelf that leaks (3) in the cleaning area (2) of said rinse bath body (1), this shelf that leaks (3) is horizontally set on the middle and lower part in the cleaning area (2); The outside of said rinse bath body (1) is provided with outlet valve (4), and described outlet valve (4) is positioned on the sidewall between the bottom land of dividing plate that leaks (3) and rinse bath body (1).
2. the rinse bath that is used to clean semi-conductor silicon chip according to claim 1 is characterized in that the described shelf that leaks (3) is provided with the leaking hole (5) that runs through the shelf that leaks (3) thickness.
3. the rinse bath that is used to clean semi-conductor silicon chip according to claim 2 is characterized in that described leaking hole (5) is rounded, oval, square, in rectangle or the triangle one or more.
4. the rinse bath that is used to clean semi-conductor silicon chip according to claim 1 is characterized in that the described shelf that leaks (3) is provided with the division board (6) of vertical setting, and described division board (6) is positioned on the bisector of the shelf that leaks (3).
5. according to claim 1 or the 4 described rinse baths that are used to clean semi-conductor silicon chip, it is characterized in that the bisector place of the said shelf that leaks (3) upper surface one side is provided with groove (7), described groove (7) is inlayed with the lower end of division board (6) and is linked to each other.
6. the rinse bath that is used to clean semi-conductor silicon chip according to claim 1 is characterized in that the side wall upper part of said rinse bath body (1) is provided with handle (8), and described handle (8) is symmetricly set on the sidewall of rinse bath body (1).
7. the rinse bath that is used to clean semi-conductor silicon chip according to claim 1 is characterized in that the described shelf that leaks (3) adopts plastic plate to process.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011203530425U CN202238744U (en) | 2011-09-20 | 2011-09-20 | Rinsing tank used for rinsing semi-conductor silicon wafers |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011203530425U CN202238744U (en) | 2011-09-20 | 2011-09-20 | Rinsing tank used for rinsing semi-conductor silicon wafers |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN202238744U true CN202238744U (en) | 2012-05-30 |
Family
ID=46100047
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2011203530425U Expired - Fee Related CN202238744U (en) | 2011-09-20 | 2011-09-20 | Rinsing tank used for rinsing semi-conductor silicon wafers |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN202238744U (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103008281A (en) * | 2011-09-20 | 2013-04-03 | 宜兴市环洲微电子有限公司 | Cleaning tank used for cleaning semiconductor wafers |
| CN104916528A (en) * | 2015-07-08 | 2015-09-16 | 上海华力微电子有限公司 | Automatic cleaning device of chemical tank |
| CN114392973A (en) * | 2022-01-21 | 2022-04-26 | 中国人民解放军空军研究院航空兵研究所 | A washing tank for rinsing aluminium honeycomb core |
-
2011
- 2011-09-20 CN CN2011203530425U patent/CN202238744U/en not_active Expired - Fee Related
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103008281A (en) * | 2011-09-20 | 2013-04-03 | 宜兴市环洲微电子有限公司 | Cleaning tank used for cleaning semiconductor wafers |
| CN104916528A (en) * | 2015-07-08 | 2015-09-16 | 上海华力微电子有限公司 | Automatic cleaning device of chemical tank |
| CN114392973A (en) * | 2022-01-21 | 2022-04-26 | 中国人民解放军空军研究院航空兵研究所 | A washing tank for rinsing aluminium honeycomb core |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20120530 Termination date: 20150920 |
|
| EXPY | Termination of patent right or utility model |