CN202181352U - Continuous deposition system - Google Patents
Continuous deposition system Download PDFInfo
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- CN202181352U CN202181352U CN2011202071520U CN201120207152U CN202181352U CN 202181352 U CN202181352 U CN 202181352U CN 2011202071520 U CN2011202071520 U CN 2011202071520U CN 201120207152 U CN201120207152 U CN 201120207152U CN 202181352 U CN202181352 U CN 202181352U
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- substrate
- loading stage
- successive sedimentation
- relieving platform
- platform
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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Abstract
The utility model discloses a continuous deposition system. The continuous deposition system comprises a loading platform, more than two deposition chambers and an unloading platform which are sequentially arranged, wherein the loading platform and the unloading platform are used for loading and unloading a large-area substrate; at least one of the loading platform and the unloading platform is provided with a substrate detecting and regulating mechanism; the substrate detecting and regulating mechanism comprises a detecting mechanism and a position regulating mechanism; the detecting mechanism detects the position of the substrate; and the position regulating mechanism regulates the position of the substrate relative to the loading platform or the unloading platform according to a detection result of the detecting mechanism. When the substrate is sent into the loading platform in front of each chamber and when the substrate is processed in each chamber and sent out to the unloading platform, the position of the substrate can be detected and regulated in time and the substrate is ensured to be at a preset ideal position, so that the damage or even destroy of the substrate caused by the collision between the substrate and the chamber due to the deflection of the position of the substrate can be effectively avoided; and the production efficiency and the qualified rate of products can be improved.
Description
Technical field
The utility model relates to a kind of successive sedimentation system, particularly a kind of can be used for handling large-area substrates the successive sedimentation system.
Background technology
Thin-film solar cells still can be generated electricity under low light condition; Its production process energy consumption is low; Possess the potentiality that reduce raw material and manufacturing cost significantly; Therefore, market increases the demand of thin-film solar cells just gradually, and the technology and equipment of manufacturing thin-film solar cells more becomes hot research in recent years.
Low pressure chemical gas phase successive sedimentation system is the thin-film solar cells producing apparatus of using always, and the low-pressure chemical vapor deposition system comprises the linear successively loading stage that is provided with, LOADED CAVITY, a plurality of low-pressure chemical vapor depositions chamber, unloading chamber and relieving platform usually.Pending substrate is loaded into said low pressure chemical gas phase successive sedimentation system from said loading stage, as through a dead lift mode or through mechanical manipulator substrate being placed on the loading stage.The substrate that is placed on the loading stage is transferred in the said LOADED CAVITY.After substrate entered into LOADED CAVITY, the air pressure in the LOADED CAVITY reduced, and simultaneously, LOADED CAVITY is carried out preheating to said substrate.After LOADED CAVITY was accomplished step-down and the preheating to substrate, substrate was sent to and carries out the low-pressure chemical vapor deposition processing in said a plurality of deposit cavity.The substrate of accomplishing the low-pressure chemical vapor deposition processing is transferred to said unloading chamber.Cool off said substrate in said unloading chamber, and the air pressure in the unloading chamber that raises simultaneously.Cooled substrate outputs to relieving platform from the unloading chamber, and substrate unloads at relieving platform.
The substrate that is used to make thin-film solar cells all is an area greater than 0.5 square metre large-area substrates usually.In the process of board transport, because the area of substrate is bigger, when substrate is placed on the loading stage, as long as the putting position of substrate has deviation slightly; Or because there is deviation in the transmission part in the transmission course, and cause substrate in transmission course, to depart from its predetermined position a little; Will cause the collision between substrate and low-pressure chemical vapor deposition chamber or the load/unload chamber, and then damage said substrate.
Therefore, in the successive sedimentation system of prior art, because of the substrate position deviation that a variety of causes produces, all as easy as rolling off a log impact damage that causes each chamber in substrate and the treatment system, thus reduced the good rate of production efficiency and product.
The utility model content
The purpose of the utility model is to provide a kind of successive sedimentation system, to prevent that large-area substrates is because of the problem of the skew of occurrence positions in transmission impact damage in the prior art.
For reaching above-mentioned purpose, the utility model provides a kind of successive sedimentation system that is used to handle large-area substrates, and it comprises the loading stage that sets gradually, two above deposit cavities and relieving platform; Wherein, said loading stage and said relieving platform are respectively applied for the loading and unloading large-area substrates, and at least one has substrate detection regulating mechanism in said loading stage and the said relieving platform; Said substrate detects regulating mechanism and comprises feeler mechanism and position adjusting mechanism; Said substrate position detects in said feeler mechanism; Said position adjusting mechanism is regulated the position of said relatively loading stage of said substrate or relieving platform according to the detected result of said feeler mechanism.
Preferably, said loading stage and said relieving platform comprise transmission guide rail, transport tape, delivery roll or the transmission roller that is used for transmission base plate (11).
Preferably, said feeler mechanism comprises at least two position sensors, and said position sensor is arranged on the same side of said loading stage or relieving platform; Said position sensor is confirmed the position of said substrate to the distance of said position sensor or through the position of detecting point of fixity on the said substrate through the edge that detects said substrate.
Preferably, said feeler mechanism comprises the position sensor that is arranged on said loading stage or relieving platform both sides, and wherein at least one side is provided with at least two position sensors; Said position sensor is confirmed the position of said substrate to the distance of said position sensor or through the position of detecting point of fixity on the said substrate through the edge that detects said substrate.
Preferably, said position sensor is infrared distance measurement device or image detection device.
Preferably, said position adjusting mechanism comprises a plurality of position controls; Be respectively arranged with at least two position controls in the both sides of said loading stage or relieving platform, said position control is used to drive said substrate adjustment position.
Preferably, said position control comprises push rod and the cylinder or the motor that drive this push rod.
Preferably, said substrate detects regulating mechanism and also comprises a member, and said member comprises a treater, and a driving governor that is connected with said treater; Wherein, said treater is connected with said feeler mechanism and the detected substrate position information of said feeler mechanism is handled; Said driving governor is connected with said position adjusting mechanism, and drives said position adjusting mechanism according to the result of said treater.
Preferably, said deposit cavity is the low-pressure chemical vapor deposition chamber; Said successive sedimentation system also comprises zinc ethyl source apparatus and source of water vapor device; Said zinc ethyl source apparatus is connected said low-pressure chemical vapor deposition chamber with said source of water vapor device, is used for to said low-pressure chemical vapor deposition chamber zinc ethyl gas and water vapour being provided respectively.
Use the successive sedimentation system that the utility model provided; When substrate is being admitted to the loading stage place before each chamber or finishes when seeing off to the relieving platform place when substrate is processed in each chamber; Can in time detect and adjust the position of substrate; Eliminate the position deviation of relative loading stage of substrate or relieving platform, guarantee that substrate is in preset ideal position, therefore can effectively avoid large-area substrates to bump because of offset and chamber; Cause damage even damage, improved the good rate of production efficiency and product greatly.
Description of drawings
Fig. 1 is the structural representation of successive sedimentation system in the utility model.
Fig. 2 is the vertical view of loading stage in the utility model.
Fig. 3 is the diagrammatic cross-section of loading stage shown in Figure 2 along the II-II line.
Fig. 4 is the structural representation of member in the utility model.
Embodiment
Below in conjunction with Fig. 1～Fig. 4, specify the embodiment of the utility model.
See also Fig. 1; The described successive sedimentation of the utility model system is used to handle large-area substrates; The large-area substrates of indication refers in particular to area at the substrate more than 0.5 square metre in the utility model, and said successive sedimentation system comprises loading stage 1, LOADED CAVITY 3, plural deposit cavity 5, unloading chamber 4 and the relieving platform 2 that sets gradually.Wherein, said loading stage 1 is respectively applied for loading and unloading large-area glass substrate with said relieving platform 2.Please consult Fig. 2 and Fig. 3 simultaneously, comprise on the said loading stage 1 that substrate detects regulating mechanism and transport sector 12.After substrate is placed on loading stage 1 place; Said substrate detects regulating mechanism and member carries out position detection and position adjustments to it; Subsequently, transport sector 12 transfers to substrate 11 in each chamber of successive sedimentation system and handles, and final substrate 11 is sent to relieving platform 2.Wherein, deposit cavity 5 is preferably the low-pressure chemical vapor deposition chamber; Said successive sedimentation system also comprises zinc ethyl source apparatus and source of water vapor device; Said zinc ethyl source apparatus is connected said low-pressure chemical vapor deposition chamber 5 with said source of water vapor device, is used for to said low-pressure chemical vapor deposition chamber 5 zinc ethyl gas and water vapour being provided respectively.
Please consult Fig. 2 and Fig. 3 once more, and consult Fig. 4 simultaneously, said transport sector 12 can be transmission guide rail, transport tape, delivery roll or the transmission roller that two rows laterally arrange.Spacing between transmission guide rail, transport tape, delivery roll or the transmission roller that said two rows of said transport sector 12 laterally arrange is less than the width of said substrate 11.Said transport sector 12 is used for substrate 11 is transferred in the LOADED CAVITY 3 by loading stage 1.
Said substrate detects regulating mechanism and comprises feeler mechanism 13 and position adjusting mechanism 14.Wherein, Said feeler mechanism 13 comprises at least two position sensors 131; Said position sensor 131 is confirmed the position of said substrate 11 through the edge that detects said substrate 11 to the distance of said position sensor 131 or through the position of detecting point of fixity on the said substrate 11, and forms the relevant detection signal.Said position sensor 131 can be the infrared distance measurement device, or image detection device.
In a preferred embodiment of the utility model, said position sensor 131 can be arranged on the same side of said loading stage 1.In another preferred embodiment of the utility model, said position sensor 131 can be arranged on the both sides of said loading stage 1, and at least one side of said loading stage 1 is provided with at least two position sensors 131.
Said position adjusting mechanism 14 is regulated the position of the said relatively loading stage 1 of said substrate 11 according to the detected result of said feeler mechanism 13.Said position adjusting mechanism 14 comprises a plurality of position controls 141; Be respectively arranged with at least two position controls 141 in the both sides of said loading stage 1, thereby said position control 141 is used to promote the position of said substrate 11 adjustment substrates 11, eliminates the position deviation of substrate 11 relative loading stages 1.Said position control 141 comprises push rod and the cylinder that drives this push rod, motor or other time clothes mechanisms, and said push rod promotes said substrate 11 under the driving of said cylinder, motor or other time clothes mechanisms.
In the present embodiment, as shown in Figure 2, loading stage 1 place in the successive sedimentation system need carry out position detection and adjustment location to substrate 11.Substrate is placed on the transport sector 12 on the loading stage 1.4 position sensors 131 and 4 position controls 141 are set in the both sides of loading stage 1 altogether, and every side is provided with two position sensors 131 and two position controls 141, respectively near four corner location of substrate 11.In other preferred embodiments of the utility model, more position sensor 131 and more position control 141 can be set also in every side of loading stage 1.
Please consult Fig. 4 once more, said substrate detects regulating mechanism and also comprises member 15.Said member 15 connects said feeler mechanism 13 and said position adjusting mechanism 14 respectively.Said member 15 comprises a treater 151, and a driving governor 152 that is connected with said treater 151.Wherein, said treater 151 is connected with said feeler mechanism 13, and said treater 151 receives by the substrate 11 of the said feeler mechanism 13 outputs detection signal in current position, and the detection signal of being accepted is handled, and generates corresponding actuate signal.Said driving governor 152 is connected with said position adjusting mechanism 14, and it receives the actuate signal by said treater 151 outputs, and controls the position that said position adjusting mechanism 14 is regulated substrate 11 according to the actuate signal of being accepted.
Below specify the principle of work that the described successive sedimentation of present embodiment system detected and regulated substrate position.In the successive sedimentation system, substrate 11 is placed on the loading stage 1, and is as shown in Figure 1, is transferred to LOADED CAVITY 3, a plurality of deposit cavity 5 and unloading chamber 4 successively and carries out handled, finally is transferred to relieving platform 2.
When substrate 11 is placed on 1 last time of loading stage, said feeler mechanism 13 detects the current position of substrate 11 respectively and forms the relevant detection signal.
Said feeler mechanism 13 transfers to the treater 151 in the said member 15 with said detection signal; In said treater 151, store the ideal position preset value of a substrate 11 in advance with respect to loading stage 1; Said treater 151 compares the ideal position preset value of detection signal that receives and said substrate 11; Generate the position error signal of said substrate 11 with respect to said loading stage 1 or relieving platform 2; Further, said treater 151 generates corresponding actuate signal according to said position error signal, and exports said driving governor 152 to.
Said driving governor 152 drives and controls said position adjusting mechanism 14 respectively and regulate the position of substrate 11, thereby make said substrate 11 return to preset ideal position according to the actuate signal that receives, and eliminates the position deviation of substrate 11 relative loading stages 1.
Use the successive sedimentation system that the utility model provided; When substrate during at the loading stage place that is being admitted to before each chamber, can in time detect and adjust the position of substrate, eliminate the position deviation of the relative loading stage of substrate; Guarantee that substrate is in preset ideal position; Therefore can effectively avoid large-area substrates because of offset and chamber bump, cause damage even damage, improve the good rate of production efficiency and product greatly.
It is said that the utility model is not limited to above-mentioned embodiment; As also can have in the said relieving platform 2 with above-mentioned embodiment in the identical structure of loading stage, finish when seeing off when substrate 11 is processed in each chamber to relieving platform 2 places, can in time detect and adjust the position of substrate 11; Eliminate the position deviation of substrate 11 relative relieving platforms 2; Guarantee that substrate 11 is in preset ideal position, therefore can effectively avoid substrate, cause damage even damage because of offset.Or have in the said relieving platform 2 with above-mentioned embodiment in the identical structure of loading stage, and in said loading stage 1, do not have said substrate to detect regulating mechanism.So; When being processed in each chamber, substrate 11 finishes when seeing off to relieving platform 2 places; Can in time detect and adjust the position of substrate 11, the mechanical manipulator that prevents to unload carried base board 11 usefulness bumps with the mechanical manipulator that unloads carried base board 11 usefulness because of the position deviation of substrate 11 relative relieving platforms 2.
Although the content of the utility model has been done detailed introduction through above-mentioned preferred embodiment, will be appreciated that above-mentioned description should not be considered to the restriction to the utility model.After those skilled in the art have read foregoing, for the multiple modification of the utility model with to substitute all will be conspicuous.Therefore, the protection domain of the utility model should be limited appended claim.
Claims (9)
1. successive sedimentation system that is used to handle large-area substrates; It comprises loading stage (1), two above deposit cavities (5) and the relieving platform (2) that sets gradually; Said loading stage (1) and said relieving platform (2) are respectively applied for loading and unloading substrate (11), it is characterized in that: at least one has substrate detection regulating mechanism in said loading stage (1) and the said relieving platform (2);
Said substrate detects regulating mechanism and comprises feeler mechanism (13) and position adjusting mechanism (14);
The position of said substrate (11) is detected by said feeler mechanism (13);
Said position adjusting mechanism (14) is regulated the position of said relatively loading stage of said substrate (11) (1) or relieving platform (2) according to the detected result of said feeler mechanism (13).
2. successive sedimentation system according to claim 1 is characterized in that, said loading stage (1) and said relieving platform (2) comprise transmission guide rail, transport tape, delivery roll or the transmission roller that is used for transmission base plate (11).
3. successive sedimentation system according to claim 1; It is characterized in that; Said feeler mechanism (13) comprises at least two position sensors (131); Said position sensor (131) is arranged on the same side of said loading stage (1) or relieving platform (2), and said position sensor (131) is gone up the position that said substrate (11) are confirmed in the position of point of fixity through the edge that detects said substrate (11) to the distance of said position sensor (131) or through detecting said substrate (11).
4. successive sedimentation system according to claim 1; It is characterized in that; Said feeler mechanism (13) comprises the position sensor (131) that is arranged on said loading stage (1) or relieving platform (2) both sides; Wherein at least one side is provided with at least two position sensors (131), and said position sensor (131) is gone up the position that said substrate (11) are confirmed in the position of point of fixity through the edge that detects said substrate (11) to the distance of said position sensor (131) or through detecting said substrate (11).
5. like claim 3 or 4 said successive sedimentation systems, it is characterized in that said position sensor (131) is infrared distance measurement device or image detection device.
6. like claim 3 or 4 said successive sedimentation systems, it is characterized in that said position adjusting mechanism (14) comprises a plurality of position controls (141); Both sides at said loading stage (1) or relieving platform (2) are respectively arranged with at least two position controls (141), and said position control (141) is used to drive said substrate (11) adjustment position.
7. like the said successive sedimentation of claim 6 system, it is characterized in that said position control (141) comprises push rod and the cylinder or the motor that drive this push rod.
8. successive sedimentation system according to claim 1; It is characterized in that; Said substrate detects regulating mechanism and also comprises a member (15), and said member (15) comprises a treater (151), and a driving governor (152) that is connected with said treater (151); Wherein,
Said treater (151) is connected with said feeler mechanism (13) and the detected substrate position information of said feeler mechanism (13) is handled;
Said driving governor (152) is connected with said position adjusting mechanism (14), and drives said position adjusting mechanism (14) according to the result of said treater (151).
9. successive sedimentation system according to claim 1; It is characterized in that; Said deposit cavity (5) is the low-pressure chemical vapor deposition chamber; Said successive sedimentation system also comprises zinc ethyl source apparatus and source of water vapor device, and said zinc ethyl source apparatus is connected said low-pressure chemical vapor deposition chamber with said source of water vapor device, is used for to said low-pressure chemical vapor deposition chamber zinc ethyl gas and water vapour being provided respectively.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011202071520U CN202181352U (en) | 2011-06-20 | 2011-06-20 | Continuous deposition system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011202071520U CN202181352U (en) | 2011-06-20 | 2011-06-20 | Continuous deposition system |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN202181352U true CN202181352U (en) | 2012-04-04 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2011202071520U Expired - Fee Related CN202181352U (en) | 2011-06-20 | 2011-06-20 | Continuous deposition system |
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| Country | Link |
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| CN (1) | CN202181352U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108428656A (en) * | 2018-03-12 | 2018-08-21 | 昆山国显光电有限公司 | Base board delivery device, system and method |
| CN114657537A (en) * | 2022-03-25 | 2022-06-24 | 厦门韫茂科技有限公司 | Continuous ALD coating equipment |
-
2011
- 2011-06-20 CN CN2011202071520U patent/CN202181352U/en not_active Expired - Fee Related
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108428656A (en) * | 2018-03-12 | 2018-08-21 | 昆山国显光电有限公司 | Base board delivery device, system and method |
| CN114657537A (en) * | 2022-03-25 | 2022-06-24 | 厦门韫茂科技有限公司 | Continuous ALD coating equipment |
| CN114657537B (en) * | 2022-03-25 | 2024-01-09 | 厦门韫茂科技有限公司 | Continuous ALD (atomic layer deposition) film plating equipment |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20170811 Address after: Yuhang District, Hangzhou City, Zhejiang Province, 311100 West No. 1500 Building 1 Room 411 Patentee after: Ideal Yao Rui (Zhejiang) Energy Technology Co., Ltd. Address before: 201203 Pudong New Area Zhangjiang Road, Shanghai, No. 1 Curie Patentee before: Ideal Energy Equipment (Shanghai) Ltd. |
|
| TR01 | Transfer of patent right | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20120404 Termination date: 20200620 |
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| CF01 | Termination of patent right due to non-payment of annual fee |