CN202105819U - Cleaning device of cauliflower-shaped polysilicon material with oxide attached to surface - Google Patents

Abstract

The utility model relates to a cleaning device for cauliflower-like polysilicon raw materials with oxides attached on the surface, which comprises a pickling pool, an overflow pool and an ultrasonic overflow cleaning pool. The overflow pool is divided into at least two water pools in sequence by at least one partition , the bottom of each pool has a drainage port, and the upper edge of the partition between two adjacent pools has an overflow opening; the ultrasonic cleaning pool includes a cleaning pool and an ultrasonic generator arranged in the cleaning pool, and the cleaning pool is equipped with The cleaning liquid also has a circulating water supply device, and the ultrasonic generator is arranged on two opposite side walls and the bottom of the cleaning pool, and also has a heating device for heating the cleaning liquid. The utility model cleaning device for cauliflower material and polysilicon raw material with oxide attached on the surface, after cleaning, the surface of the raw material is very clean, there are no oxides and other impurities in the gap, and the cauliflower-like raw material can be fully removed. Production requirements for ingots or pulled crystals.

Description

Cleaning device for cauliflower-shaped polysilicon raw materials with oxides on the surface

technical field

The utility model relates to the technical field of cleaning devices for polysilicon raw materials, in particular to a cleaning device for polysilicon raw materials in the shape of cauliflower and with oxides on the surface.

Background technique

Silicon semiconductor is resistant to high voltage and high temperature. Compared with other semiconductor materials, it has small volume, high efficiency, long life, strong reliability and stable performance. Therefore, it is the most ideal solar cell material. Silicon-based solar cells account for the total amount of solar cells. More than 80% of. If it is calculated that 17g of silicon material is required to produce 1W of solar cells, the demand for solar-grade silicon materials in the world will reach 8,000 tons in 2010.

The purity requirement of solar-grade silicon is about 6N, which is lower than the purity requirement of 10-12N for silicon used in the semiconductor industry, so solar-grade silicon mainly comes from the waste and defective products of silicon in the semiconductor industry. With the rapid development of the global solar cell industry, the source of solar silicon materials has been unable to meet its growing demand, and there has been a huge gap in the source of solar-grade silicon.

In order to save silicon raw materials, polysilicon waste should be processed and reused. CN200610010654 discloses a pickling method for metallurgical grade silicon: 1), first use hydrochloric acid with a concentration of 1-6mol/l to carry out pickling treatment with the pulverized silicon powder material, the leaching temperature is 40-80°C, and the leaching time is 0.5-2 days, then wash 2-5 times with distilled water, and then vacuum filter to separate the silicon powder from the leaching solution; ℃, secondary leaching for 0.5-2 days, and then use distilled water to wash 2-5 times, and then carry out vacuum filtration separation to separate the silicon powder from the leaching solution; 3), and finally use hydrofluoric acid with a concentration of 1-5mol/l, The temperature is 40-80°C, soaked for 0.5-1 day, then washed with distilled water for 3-8 times, and vacuum filtered to separate the silicon powder material from the leachate.

CN200910025729 discloses a cleaning method for polysilicon material: put the polysilicon material in a mixed acid solution and soak it in the dark for 1-10 minutes. After ultrasonic washing, compressed air bubbling, drying; the proportion of the mixed acid solution is nitric acid: hydrofluoric acid: glacial acetic acid solution volume ratio is 57:18:25, the concentration of nitric acid is 68-72%, hydrofluoric acid The concentration is 38-41%, and the concentration of glacial acetic acid is 99.8-99.9%.

CN200610050725 discloses a silicon material cleaning method: the silicon material is immersed in the mixed acid solution of hydrofluoric acid and nitric acid; The electrical conductivity of the pure water soaking solution; the silicon material is scooped out and dried; the concentration of hydrofluoric acid is 40%-49%, the concentration of nitric acid is 65-68%, and the volume ratio is 1:8-12.

In order to save silicon raw materials, polysilicon waste should be processed and reused. When the polysilicon deposition rate is too fast, the surface of the silicon rod is easy to grow into a cauliflower shape, and the surface of the polysilicon material is also covered with oxides. When the gap depth of the silicon material is large, the follow-up cleaning work is very difficult. For slices, the cauliflower material and oxides must be cleaned. Raw materials need to be pickled first, and then rinsed to remove residual acid before they can be used in subsequent operations. Existing equipment cannot completely remove residual acid.

Utility model content

The technical problem to be solved by the utility model is: in order to solve the deficiencies of the prior art, the utility model provides a cleaning device for cauliflower-shaped polysilicon raw materials with oxides on the surface, which meets the requirements of cauliflower-shaped materials and polysilicon materials with oxides on the surface. cleaning requirements for the removal of residual acid.

The technical solution adopted by the utility model to solve the technical problems is: a cleaning device for cauliflower-shaped polysilicon raw materials with oxides on the surface, including a pickling pool, an overflow pool and an ultrasonic overflow cleaning pool. The pool is divided into at least two pools sequentially by at least one partition, each pool has a drain outlet at the bottom, and the upper edge of the partition between two adjacent pools has an overflow opening; the ultrasonic cleaning pool includes cleaning The pool and the ultrasonic generator set in the cleaning pool, the cleaning pool is equipped with cleaning liquid and has a circulating water replenishment device, the ultrasonic generator is set on the two opposite side walls and bottom of the cleaning pool, and also has a heating mechanism for the cleaning liquid heating equipment.

Preferably, the overflow pool is three water pools separated by two partitions in turn.

In order to prevent mutual contamination of the pools, the heights of the overflow openings on the two partitions are different.

In order to realize automatic constant temperature, the heating device is a heating tube controlled to be turned on and off by a temperature control switch.

The beneficial effect of the utility model is that the cleaning device of the utility model for cauliflower-shaped polysilicon raw materials with oxides on the surface, after cleaning, the surface of the raw materials is very clean, there are no oxides and other impurities in the gaps, and the cauliflower-shaped raw materials are fully removed , under the standard procedure, it can meet the production requirements of casting ingots or pulling crystals.

Description of drawings

Below in conjunction with accompanying drawing and embodiment the utility model is further described.

Fig. 1 is the front view structural representation of the overflow tank described in the cleaning device of the polysilicon raw material of cauliflower shape and surface oxide of the present utility model;

Fig. 2 is the schematic diagram of the three-dimensional structure of the overflow tank described in the cleaning device of the cauliflower-shaped and surface-attached polysilicon raw materials of the present invention;

Fig. 3 is the top view structural representation of the ultrasonic overflow cleaning tank described in the cleaning device of the cauliflower-shaped and surface-attached polysilicon raw materials of the present invention;

Fig. 4 is the schematic diagram of the three-dimensional structure of the ultrasonic overflow cleaning tank described in the cleaning device of the cauliflower-shaped and surface-attached polysilicon raw materials of the present invention;

In the figure: 1. overflow tank, 11. clapboard, 12. drain, 13. overflow opening, 2. ultrasonic overflow cleaning tank, 21. ultrasonic generator, 22. side wall, 23. bottom, 24. heating equipment.

Detailed ways

Now in conjunction with accompanying drawing, the utility model is described in further detail. These drawings are all simplified schematic diagrams, and only schematically illustrate the basic structure of the utility model, so they only show the configurations related to the utility model.

Fig. 1 Fig. 2 Fig. 3 Fig. 4 is the cleaning device of a kind of cauliflower shape and the polysilicon raw material with oxide on the surface of the utility model, including pickling pool, overflow pool 1 and ultrasonic overflow cleaning pool 2, overflow pool 1 is Three pools are separated by two partitions 11 in turn, each pool has a drain outlet 12 at the bottom, and the upper edge of the partition 11 between two adjacent pools has an overflow opening 13, and the two partitions 11 The height of the overflow opening 13 on the top is different; the ultrasonic cleaning pool 2 includes a cleaning pool and an ultrasonic generator 21 arranged in the cleaning pool. The cleaning liquid is housed in the cleaning pool and has a circulating water supply device. The ultrasonic generator 21 is arranged on both sides of the cleaning pool. The opposite side wall 22 and bottom 23 also have a heating device 24 for heating the cleaning liquid.

The heating device 24 is a heating tube controlled on and off by a temperature control switch.

After the cauliflower-like material and the polysilicon material with oxides on the surface are cleaned by the pickling tank, the overflow tank 1 and the ultrasonic cleaning tank 2 are used to remove the residual acid during pickling.

When using the overflow tank 1 to overflow and rinse raw materials, feed pure water into the pool with the highest overflow opening 13 (i.e. the highest water level) in the three pools, and overflow to the pool next to it after filling, when cleaning the raw materials Put it into a pool with a low water level for cleaning first, and then gradually use a pool with a high water level for cleaning. The purpose of fully cleaning the raw acid solution can be achieved, and precious water resources can be saved.

When using the ultrasonic cleaning tank 2, pure water is introduced into the cleaning tank, and new pure water is constantly replenished, and the raw materials rinsed with the overflow tank 1 are put into the ultrasonic cleaning tank 2, and the ultrasonic waves on the side walls 22 and the bottom 23 The generator 21 works at the same time to remove the residual acid in the raw material, and the heating device 24 heats the cleaning solution to control the temperature of the cleaning solution at 60°C±5°C. Under this temperature environment, the cleaning effect is best if it is maintained for about 2 hours.

Inspired by the above ideal embodiment according to the utility model, through the above description content, relevant staff can completely make various changes and modifications within the scope of not deviating from the technical idea of the utility model. The technical scope of this utility model is not limited to the content in the description, but must be determined according to the scope of the claims.

Claims (4)

1. a kind of cleaning device of the polysilicon raw material of cauliflower shape and surface attached oxide, comprises pickling tank, overflow tank (1) and ultrasonic overflow cleaning tank (2), it is characterized in that: described overflow tank ( 1) At least two pools are divided in turn by at least one partition (11), each pool has a drain outlet (12) at the bottom, and the upper edge of the partition (11) between two adjacent pools has an overflow opening (13); The ultrasonic cleaning pool (2) comprises a cleaning pool and an ultrasonic generator (21) arranged in the cleaning pool. The cleaning fluid is housed in the cleaning pool and has a circulating water supply device. The ultrasonic generator (21) is arranged in the cleaning pool. The two opposite side walls (22) and the bottom (23) of the pool also have a heating device (24) for heating the cleaning liquid. 2. The cleaning device of cauliflower-shaped and surface-attached oxide polysilicon raw materials as claimed in claim 1 is characterized in that: the overflow pool (1) is divided into three successively by two dividing plates (11). pool. 3. The cleaning device for cauliflower-shaped polysilicon raw materials with oxides on the surface as claimed in claim 2, characterized in that: the overflow openings (13) on the two partitions (11) are of different heights. 4. The cleaning device for cauliflower-shaped polysilicon raw materials with oxides on the surface as claimed in claim 1, characterized in that: the heating device (24) is a heating tube controlled by a temperature control switch.

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