CN202105819U - Cleaning device of cauliflower-shaped polysilicon material with oxide attached to surface - Google Patents

Cleaning device of cauliflower-shaped polysilicon material with oxide attached to surface Download PDF

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Publication number
CN202105819U
CN202105819U CN2011202652270U CN201120265227U CN202105819U CN 202105819 U CN202105819 U CN 202105819U CN 2011202652270 U CN2011202652270 U CN 2011202652270U CN 201120265227 U CN201120265227 U CN 201120265227U CN 202105819 U CN202105819 U CN 202105819U
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China
Prior art keywords
pond
tank
oxide
cleaning device
overflow
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Expired - Fee Related
Application number
CN2011202652270U
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Chinese (zh)
Inventor
周罗洪
李义
王达山
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YINGKOU JOLAR TECHNOLOGY Corp
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YINGKOU JOLAR TECHNOLOGY Corp
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Priority to CN2011202652270U priority Critical patent/CN202105819U/en
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Publication of CN202105819U publication Critical patent/CN202105819U/en
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Abstract

The utility model relates to a cleaning device of a cauliflower-shaped polysilicon material with oxide attached to the surface. The cleaning device comprises a pickling tank, an overflow tank and an ultrasonic overflow washing tank. The overflow tank is divided by at least one partition plate into at least two tanks. The bottom of each tank is provided with a drainage port, the upper edge of the partition plate between two adjacent tanks is provided with overflow openings. The ultrasonic overflow washing tank comprises a clean water tank and ultrasonic generators arranged in the clean water tank. Washing liquid is filled in the clean water tank and the clean water tank is provided with a circulating water supplying device, the ultrasonic generators are arranged on two opposite lateral walls and at the bottom of the clean water tank, and a heating device for heating the washing liquid is further included. The surface of the material is quite clean after being washed, no oxide or other impurities remain in the gaps, cauliflower-shaped materials are removed thoroughly, production requirements of ingot casting in a furnace or crystal pulling can be met under a standard procedure.

Description

Cauliflower form and surface attach the cleaning device of the polycrystalline silicon raw material of oxide
Technical field
The utility model relates to polycrystalline silicon raw material cleaning device technical field, and especially a kind of cauliflower form and surface attach the cleaning device of the polycrystalline silicon raw material of oxide.
Background technology
Silicon semiconductor is high voltage withstanding, high temperature resistant, compare with other semi-conducting materials; Volume is little, efficient is high, the life-span is long, good reliability, stable performance; Thereby be optimal solar cell material, silica-based solar cell accounts for more than 80% of solar cell total amount.If need use silicon materials 17g to calculate according to every production 1W solar cell, whole world solar energy level silicon materials demand reached 8000 tons in 2010.
The purity requirement of solar energy level silicon material is lower than the purity requirement of semiconductor industry silicon 10-12N about 6N, so the solar energy level silicon material mainly comes from the waste material and the substandard products of semi-conductor industry silicon.Along with the fast development of global solar battery industry, its growing demand can't have been satisfied in the source of solar power silicon material, and huge breach has appearred in the solar energy level silicon source.
For the save silicon raw material, be utilizing again after the polysilicon waste disposal.1), the elder generation of the silica flour material after will crushing working concentration is that the hydrochloric acid of 1-6mol/l carries out acidleach and handles CN200610010654 discloses a kind of acid washing method of metallurgical grade silicon:; Extraction temperature 40-80 ℃; Extraction time is 0.5-2 days; Clean 2-5 time with distilled water then, vacuum filtration separates silica flour with leachate again; 2), use concentration of nitric acid to be 0.5-6mol/l isolated silica flour material, temperature 40-80 ℃, secondary leached 0.5-2 days, and carrying out the vacuum filtration separation after using distilled water to clean 2-5 time then separates silica flour with leachate; 3) adopting concentration again, at last is the hydrofluoric acid of 1-5mol/l, temperature 40-80 ℃, soaked 0.5-1 days, and with 3-8 final vacuum suction filtration of distilled water cleaning, the silica flour material is separated with leachate then.
CN200910025729 discloses a kind of cleaning method of polycrystalline silicon material: place mix acid liquor to carry out lucifuge polycrystalline silicon material and soaked 1-10 minute; The temperature of mix acid liquor is 30-35 ℃; After fish for, use pure water rinsing, behind ultrasonic irrigation, compressed air bubbling, dry again; The proportioning of mix acid liquor is a nitric acid: hydrofluoric acid: the liquor capacity ratio of glacial acetic acid is 57: 18: 25, and concentration of nitric acid is 68-72%, and hydrofluoric acid concentration is 38-41%, and glacial acetic acid concentration is 99.8-99.9%.
CN200610050725 discloses a kind of method for cleaning silicon material: the silicon material is immersed in hydrofluoric acid and the nitric acid mixed acid solution; Fish for the silicon material behind the dipping, with the multistage flushing of pure water; Silicon material after the flushing is soaked in pure water; Measure the electrical conductivity of pure water soak; Fish for the silicon material, oven dry; The concentration of hydrofluoric acid is 40%-49%, and concentration of nitric acid is 65-68%, volume ratio 1: 8-12.
For the save silicon raw material, be utilizing again after the polysilicon waste disposal.When polysilicon deposition speed was too fast, the silicon rod surface was grown to cauliflower form easily, and the polycrystalline silicon material surface is also with oxide; When silicon material gap depth is big; Follow-up cleaning is difficulty very, if will produce the silicon chip of standard compliant solar level, must cauliflower material and oxide be cleaned up.Raw material needs elder generation through overpickling, and acid residues is removed in rinsing again, could supply subsequent operation to use, and existing facilities fail is removed acid residues fully.
The utility model content
The technical problem that the utility model will solve is: in order to solve the deficiency of prior art; The cleaning device that the utility model provides a kind of cauliflower form and surface to attach the polycrystalline silicon raw material of oxide satisfies the cleaning requirement with the removal acid residues of the polycrystalline silicon material of oxide of cauliflower form material and surface.
The utility model solves the technical scheme that its technical problem adopted: a kind of cauliflower form and surface attach the cleaning device of the polycrystalline silicon raw material of oxide; Comprise pickling tube, run-off and ultrasonic wave overflow service sink; Described run-off is separated at least two ponds successively by at least one dividing plate; The bottom in each pond has discharge outlet, and the upper edge of the dividing plate between two adjacent ponds has overflow openings; Described ultrasonic waves for cleaning pond comprises to be cleaned the pond and is arranged on the supersonic generator that cleans in the pond; Clean in the pond and cleaning fluid is housed and has the circulation water replanishing device; Described supersonic generator is arranged on two relative sidewall and the bottoms of cleaning the pond, also has the heater to the cleaning fluid heating.
As preferably, three ponds of described run-off for being separated into successively by two dividing plates.
Pollute the overflow openings height difference on described two dividing plates each other for preventing the pond.
For realizing automatic constant-temperature, described heater is the heating tube that is opened and closed by temperature detect switch (TDS) control.
The beneficial effect of the utility model is; Cauliflower form of the utility model and surface attach the cleaning device of the polycrystalline silicon raw material of oxide; The surface of raw material is very clean after cleaning; There are not oxide and other impurity in the slit, fully remove the cauliflower form raw material, can reach the production requirement of throwing stove ingot casting or crystal pulling under the standardization program.
Description of drawings
Below in conjunction with accompanying drawing and embodiment the utility model is further specified.
Fig. 1 is the main TV structure sketch map of run-off described in the cauliflower form of the utility model and the cleaning device of polycrystalline silicon raw material that the surface attaches oxide;
Fig. 2 is the perspective view of run-off described in the cauliflower form of the utility model and the cleaning device of polycrystalline silicon raw material that the surface attaches oxide;
Fig. 3 is the plan structure sketch map of ultrasonic wave overflow service sink described in the cauliflower form of the utility model and the cleaning device of polycrystalline silicon raw material that the surface attaches oxide;
Fig. 4 is the perspective view of ultrasonic wave overflow service sink described in the cauliflower form of the utility model and the cleaning device of polycrystalline silicon raw material that the surface attaches oxide;
Among the figure: 1. run-off, 11. dividing plates, 12. discharge outlet, 13. overflow openings, 2. ultrasonic wave overflow service sink, 21. supersonic generators, 22. sidewalls, 23. bottoms, 24. heaters.
The specific embodiment
Combine accompanying drawing that the utility model is done further detailed explanation now.These accompanying drawings are the sketch map of simplification, the basic structure of the utility model only is described in a schematic way, so it only show the formation relevant with the utility model.
Fig. 1 Fig. 2 Fig. 3 Fig. 4 is the cleaning device that a kind of cauliflower form of the utility model and surface attach the polycrystalline silicon raw material of oxide; Comprise pickling tube, run-off 1 and ultrasonic wave overflow service sink 2; Three ponds of run-off 1 for being separated into successively by two dividing plates 11; The bottom in each pond has discharge outlet 12, and the overflow openings 13 that the upper edge of the dividing plate 11 between two adjacent ponds has on 13, two dividing plates 11 of overflow openings is highly different; Ultrasonic waves for cleaning pond 2 comprises to be cleaned the pond and is arranged on the supersonic generator 21 that cleans in the pond; Clean in the pond and cleaning fluid is housed and has the circulation water replanishing device; Supersonic generator 21 is arranged on the two relative sidewalls 22 and bottom 23 that clean the pond, also has the heater 24 to the cleaning fluid heating.
Heater 24 is the heating tube that is opened and closed by temperature detect switch (TDS) control.
Cauliflower form material and surface are with the polycrystalline silicon material of oxide residual acid solution when pickling tube cleans the back and adopts run-off 1 with the 2 removal pickling of ultrasonic waves for cleaning pond.
When using run-off 1 overflow rinsing raw material; In three ponds, feed pure water in the pond of overflow openings 13 the highest (being that water level is the highest); Do not stop after filling with to the overflow of the pond on next door, put into the low pond of water level when cleaning raw material earlier and clean, progressively clean again with the high water level pond.Reach the purpose of abundant cleaning raw material acid solution, and can save valuable water resource.
When using ultrasonic waves for cleaning pond 2, clean and feed pure water in the pond, do not stop to replenish new pure water; To put into ultrasonic waves for cleaning pond 2 with the raw material after run-off 1 rinsing, the supersonic generator 21 of two side 22 and bottom 23 is worked simultaneously, removes the acid residues in the raw material; 24 pairs of cleaning fluid heating of heater; The control rinse liquid temperature is 60 ℃ ± 5 ℃, and under this temperature environment, it is best to keep about 2 hours cleaning performance.
With above-mentioned desirable embodiment according to the utility model is enlightenment, and through above-mentioned description, the related work personnel can carry out various change and modification fully in the scope that does not depart from this utility model technological thought.The technical scope of this utility model is not limited to the content on the specification, must confirm its technical scope according to the claim scope.

Claims (4)

1. cauliflower form and surface attach the cleaning device of the polycrystalline silicon raw material of oxide; Comprise pickling tube, run-off (1) and ultrasonic wave overflow service sink (2); It is characterized in that: described run-off (1) is separated at least two ponds successively by at least one dividing plate (11); The bottom in each pond has discharge outlet (12), and the upper edge of the dividing plate (11) between two adjacent ponds has overflow openings (13);
Described ultrasonic waves for cleaning pond (2) comprises to be cleaned the pond and is arranged on the supersonic generator (21) that cleans in the pond; Clean in the pond and cleaning fluid is housed and has the circulation water replanishing device; Described supersonic generator (21) is arranged on two relative sidewall (22) and bottom (23) of cleaning the pond, also has the heater (24) that cleaning fluid is heated.
2. the cleaning device that cauliflower form as claimed in claim 1 and surface attach the polycrystalline silicon raw material of oxide is characterized in that: three ponds of described run-off (1) for being separated into successively by two dividing plates (11).
3. the cleaning device that cauliflower form as claimed in claim 2 and surface attach the polycrystalline silicon raw material of oxide is characterized in that: the overflow openings (13) on described two dividing plates (11) is highly different.
4. the cleaning device that cauliflower form as claimed in claim 1 and surface attach the polycrystalline silicon raw material of oxide is characterized in that: the heating tube of described heater (24) for being opened and closed by temperature detect switch (TDS) control.
CN2011202652270U 2011-07-25 2011-07-25 Cleaning device of cauliflower-shaped polysilicon material with oxide attached to surface Expired - Fee Related CN202105819U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN2011202652270U CN202105819U (en) 2011-07-25 2011-07-25 Cleaning device of cauliflower-shaped polysilicon material with oxide attached to surface

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN2011202652270U CN202105819U (en) 2011-07-25 2011-07-25 Cleaning device of cauliflower-shaped polysilicon material with oxide attached to surface

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CN202105819U true CN202105819U (en) 2012-01-11

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102266859A (en) * 2011-07-25 2011-12-07 营口晶晶光电科技有限公司 Method and device for cleaning cauliflower-shaped polycrystalline silicon raw material with oxides on surface thereof
CN103157622A (en) * 2013-04-03 2013-06-19 沈陈益 Washing device
CN104550091A (en) * 2014-12-31 2015-04-29 东莞市华荣涂装设备有限公司 Water circulation system and circulation method for spray treatment before coating

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102266859A (en) * 2011-07-25 2011-12-07 营口晶晶光电科技有限公司 Method and device for cleaning cauliflower-shaped polycrystalline silicon raw material with oxides on surface thereof
CN103157622A (en) * 2013-04-03 2013-06-19 沈陈益 Washing device
CN104550091A (en) * 2014-12-31 2015-04-29 东莞市华荣涂装设备有限公司 Water circulation system and circulation method for spray treatment before coating

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GR01 Patent grant
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20120111

Termination date: 20140725

EXPY Termination of patent right or utility model