CN202075477U - Optical window device with high rigidity and low friction - Google Patents
Optical window device with high rigidity and low friction Download PDFInfo
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- CN202075477U CN202075477U CN2011201750187U CN201120175018U CN202075477U CN 202075477 U CN202075477 U CN 202075477U CN 2011201750187 U CN2011201750187 U CN 2011201750187U CN 201120175018 U CN201120175018 U CN 201120175018U CN 202075477 U CN202075477 U CN 202075477U
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Abstract
The utility model discloses an optical window device with high rigidity and low friction, which comprises an optical material substrate and a protective layer arranged on the optical material substrate and is characterized in that the protective layer comprises a layer of composite coating with the thickness larger than 4000nm and a layer of transmission enhanced layer. The composite coating is composed of a plurality of combination unit layers which are formed by silicon dioxide layers with the thickness ranging from 10nm to 120nm and silicon carbide layers with the thickness ranging from 100nm to 1000nm. Particles on the surfaces of the silicon carbide layers are embedded in the silicon dioxide layers. The optical window device with the high rigidity and the low friction has the advantages of having high rigidity coefficient and low friction coefficient and good visible light transmissivity. Through testing, the rigidity can reach above 2000HV, the friction coefficient is less than 02, and the transmissivity can reach 85% or so within the spectral range from 620nm to 670nm. The optical window device with the high rigidity and the low friction is convenient to manufacture and low in cost, the service life can reach a quarter of that of an optical window device with sapphire pieces covered on the surface of optical materials in a bonding mode, however the cost is equal to one-tenth of that of the optical window device with sapphire pieces covered on the surface of the optical materials in a bonding mode.
Description
Technical field
The utility model relates to a kind of optical device, especially relates to the optical window device of the low friction of a kind of high rigidity.
Background technology
Many occasions in daily life all can be used the optical window device, in widely used desk-top bar code reader in the supermarket.Characteristics of this optical window device are that it will bear up to ten thousand times goods contact every day, also in the optical system of bar code reader, participate in imaging simultaneously, except window surface is resisted damage, the shock proof requirement, also to the face shape of window, the requirement that visible light transmissivity all has optical grade.The many sapphire sheet of being covered at the matrix optical material surface by the matrix optical material and the subsides of saturating visible light of this type of optical window device constitute at present.But the problem that exists is that this optical window size of devices is bigger usually, and large-sized sapphire production technology has only the minority enterprise of the U.S. and Japan to grasp, and domestic still do not have producer and can produce, and caused the price of product very expensive thus yet.
The utility model content
Technical problem to be solved in the utility model provides a kind of easily manufactured, low price and have the optical window device of the low friction of high rigidity of good visible light transmissivity.
The utility model solves the problems of the technologies described above the technical scheme that is adopted: the optical window device of the low friction of a kind of high rigidity; comprise optical material substrate and the protective seam that is arranged on the described optical material substrate; described protective seam comprises composite deposite and one deck antireflection layer of a layer thickness greater than 4000nm; described composite deposite is made up of a plurality of assembled unit layers; described assembled unit layer is that the silicon oxide layer of 10～120nm and silicon carbide layer that thickness is 100～1000nm constitute by thickness, and the particle on described silicon carbide layer surface embeds described silicon oxide layer.
Described antireflection layer comprise thickness be the first assisted oxidation silicon layer, the thickness of 10～100nm be the second assisted oxidation silicon layer of 10～50nm and be arranged on the described first assisted oxidation silicon layer and the described second assisted oxidation silicon layer between thickness be the silicon nitride layer of 10～100nm, the particle on the outermost silicon carbide layer surface in the described composite deposite embeds the described first assisted oxidation silicon layer.
The ranges of indices of refraction that the surface of described antireflection layer is provided with layer of transparent is 1.4～1.6 macromolecule material films.
Described macromolecule material film is PMMA film or plasticon, also can be the film that other macromolecular material with similar performance is made.
Described optical material substrate is a tempered glass, also can be the substrate of being made by the materials such as optical glass, optical plastic, optical resin or optical crystal of saturating visible light.
Compared with prior art, advantage of the present utility model is by the surface at the optical material substrate protective seam to be set, and protective seam comprises composite deposite and one deck antireflection layer of a layer thickness greater than 4000nm, composite deposite is made up of a plurality of assembled unit layers, the assembled unit layer is that the silicon oxide layer of 10～120nm and silicon carbide layer that thickness is 100～1000nm constitute by thickness, this protective seam has high rigidity and low frictional factor and has good visible light transmissivity, after tested, hardness can reach more than the 2000HV, friction factor is less than 0.2, and the transmitance in the spectral range of 620nm～670nm reaches about 85%; The macromolecule material film of layer of transparent is set on the surface of antireflection layer again, then can further reduces skin-friction coefficient.Optical window device manufacturing method of the present utility model just, low price and have good visible light transmissivity, life-span can reach at optical material surface pastes 1/4th of optical window device cover sapphire sheet, cost then be equivalent to the optical material surface subsides cover sapphire sheet the optical window device 1/10th.
Description of drawings
Fig. 1 is the structural representation of optical window device of the present utility model;
Fig. 2 is the structural representation after optical window device of the present utility model amplifies.
Embodiment
Embodiment describes in further detail the utility model below in conjunction with accompanying drawing.
Embodiment one: the optical window device of the low friction of a kind of high rigidity; comprise tempered glass 1 and the protective seam 2 that is arranged on the tempered glass 1; protective seam 2 comprises one deck composite deposite 3 and one deck antireflection layer 4; the thickness of composite deposite 3 is 4320nm; form by 14 assembled unit layers 5; assembled unit layer 5 is that the silicon oxide layer of 60nm and silicon carbide layer that thickness is 300nm constitute by thickness; the particle on silicon carbide layer 52 surfaces embeds silicon oxide layer 51; antireflection layer 4 comprises that thickness is the first assisted oxidation silicon layer 41 of 60nm and the second assisted oxidation silicon layer 42 that thickness is 20nm; between the first assisted oxidation silicon layer 41 and the second assisted oxidation silicon layer 42, be provided with the silicon nitride layer 43 that thickness is 60nm; the particle on outermost silicon carbide layer 52 surfaces in the composite deposite 3 embeds the first assisted oxidation silicon layer 41, and the surface of antireflection layer 4 is provided with the plasticon 6 that a layer thickness is 15nm.
Embodiment two: the optical window device of the low friction of a kind of high rigidity; comprise tempered glass 1 and the protective seam 2 that is arranged on the tempered glass 1; protective seam 2 comprises one deck composite deposite 3 and one deck antireflection layer 4; the thickness of composite deposite 3 is 4200nm; form by 20 assembled unit layers 5; assembled unit layer 5 is that the silicon oxide layer of 10nm and silicon carbide layer that thickness is 200nm constitute by thickness; the particle on silicon carbide layer 52 surfaces embeds silicon oxide layer 51; antireflection layer 4 comprises that thickness is the first assisted oxidation silicon layer 41 of 20nm and the second assisted oxidation silicon layer 42 that thickness is 50nm; between the first assisted oxidation silicon layer 41 and the second assisted oxidation silicon layer 42, be provided with the silicon nitride layer 43 that thickness is 80nm; the particle on outermost silicon carbide layer 52 surfaces in the composite deposite 3 embeds the first assisted oxidation silicon layer 41, and the surface of antireflection layer 4 is provided with the plasticon 6 that a layer thickness is 20nm.
Embodiment three: the optical window device of the low friction of a kind of high rigidity; comprise tempered glass 1 and the protective seam 2 that is arranged on the tempered glass 1; protective seam 2 comprises one deck composite deposite 3 and one deck antireflection layer 4; the thickness of composite deposite 3 is 5000nm; form by 10 assembled unit layers 5; assembled unit layer 5 is that the silicon oxide layer of 100nm and silicon carbide layer that thickness is 400nm constitute by thickness; the particle on silicon carbide layer 52 surfaces embeds silicon oxide layer 51; antireflection layer 4 comprises that thickness is the first assisted oxidation silicon layer 41 of 100nm and the second assisted oxidation silicon layer 42 that thickness is 30nm; between the first assisted oxidation silicon layer 41 and the second assisted oxidation silicon layer 42, be provided with the silicon nitride layer 43 that thickness is 40nm; the particle on outermost silicon carbide layer 52 surfaces in the composite deposite 3 embeds the first assisted oxidation silicon layer 41, and the surface of antireflection layer 4 is provided with the PMMA film 6 that a layer thickness is 10nm.
PMMA film in the foregoing description or plasticon can be that the film that 1.4～1.6 macromolecular materials are made substitutes by transparent ranges of indices of refraction with other, and tempered glass also can substitute with the substrate of being made by the materials such as optical glass, optical plastic, optical resin or optical crystal of saturating visible light.
Following table is the test result of above-mentioned three embodiment samples:
Below introduce a kind of method for preparing composite deposite and antireflection layer among above-mentioned three embodiment: with the RAS-1100C type magnetron sputtering coater (RAS coating machine) of Japanese SHINCRON company as preparation equipment, make noncrystalline silicon carbide target and silicon target material respectively with noncrystalline silicon carbide and silicon, tempered glass is placed on magnetron sputtering coater to be steamed in the chamber, vacuumizing and set working temperature is 75 ℃, and the vacuum tightness of steaming in the chamber when magnetron sputtering coater reaches 3.0 * 10
-4More than the Pa, and reach the working temperature of setting by heating after, carry out following steps again: 1. silicon is separated out, simultaneously to steaming the indoor oxygen that charges into by sputter to the silicon target material, the control speed separated out of silicon and charge into the speed of oxygen forms silicon oxide layer by the speed of steaming of 0.4nm/s; 2. by the sputter to noncrystalline silicon carbide target and silicon target material amorphous carbon and silicon are separated out, the speed that control noncrystalline silicon carbide and silicon are separated out forms silicon carbide layer by the speed of steaming of 0.1nm/s; 3. charge into hydrogen and made hydrogen ion infiltrate coating in 70 seconds, the volume that control charges into hydrogen is whole 3% of the chamber volume that steaming; 4. 1.～3. repeating step finishes steaming of composite deposite; 5. by sputter silicon is separated out to the silicon target material, simultaneously to steaming the indoor oxygen that charges into, speed of separating out by control silicon and the speed that charges into oxygen, the speed of steaming on the surface of composite deposite with 0.4nm/s forms the first assisted oxidation silicon layer; 6. by sputter silicon is separated out to the silicon target material, simultaneously to steaming the indoor nitrogen that charges into, speed of separating out by control silicon and the speed that charges into nitrogen, the speed of steaming on the surface of composite deposite with 0.5nm/s forms silicon nitride layer; The sputter of 7. crossing the silicon target material is separated out silicon, simultaneously to steaming the indoor oxygen that charges into, and speed of separating out by control silicon and the speed that charges into oxygen, the speed of steaming on the surface of composite deposite with 0.6nm/s forms the second assisted oxidation silicon layer; 8. when temperature is cooled to 20 ℃ of left and right sides, argon gas is full of steaming the chamber, and then open coating machine, take out finished product.
Only corresponding material need have been made target just and the macromolecule material film that forms layer of transparent on the surface of antireflection layer again is same.
Claims (5)
1. a high rigidity is hanged down the optical window device of friction; comprise optical material substrate and the protective seam that is arranged on the described optical material substrate; it is characterized in that described protective seam comprises composite deposite and one deck antireflection layer of a layer thickness greater than 4000nm; described composite deposite is made up of a plurality of assembled unit layers; described assembled unit layer is that the silicon oxide layer of 10～120nm and silicon carbide layer that thickness is 100～1000nm constitute by thickness, and the particle on described silicon carbide layer surface embeds described silicon oxide layer.
2. the optical window device of the low friction of a kind of high rigidity as claimed in claim 1, it is characterized in that described antireflection layer comprise thickness be the first assisted oxidation silicon layer, the thickness of 10～100nm be the second assisted oxidation silicon layer of 10～50nm and be arranged on the described first assisted oxidation silicon layer and the described second assisted oxidation silicon layer between thickness be the silicon nitride layer of 10～100nm, the particle on the outermost silicon carbide layer surface in the described composite deposite embeds the described first assisted oxidation silicon layer
3. the optical window device of the low friction of a kind of high rigidity as claimed in claim 1 or 2, the ranges of indices of refraction that the surface that it is characterized in that described antireflection layer is provided with layer of transparent is 1.4～1.6 macromolecule material films.
4. the optical window device of the low friction of a kind of high rigidity as claimed in claim 3 is characterized in that described macromolecule material film is PMMA film or plasticon.
5. the optical window device of the low friction of a kind of high rigidity as claimed in claim 1 is characterized in that described optical material substrate is a tempered glass.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011201750187U CN202075477U (en) | 2011-05-27 | 2011-05-27 | Optical window device with high rigidity and low friction |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011201750187U CN202075477U (en) | 2011-05-27 | 2011-05-27 | Optical window device with high rigidity and low friction |
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| Publication Number | Publication Date |
|---|---|
| CN202075477U true CN202075477U (en) | 2011-12-14 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN2011201750187U Expired - Lifetime CN202075477U (en) | 2011-05-27 | 2011-05-27 | Optical window device with high rigidity and low friction |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102207597A (en) * | 2011-05-27 | 2011-10-05 | 宁波永新光学股份有限公司 | Optical window device with high hardness and low friction coefficient |
| CN109182969A (en) * | 2018-08-30 | 2019-01-11 | 湖北久之洋红外系统股份有限公司 | The preparation method of medium-wave infrared optics horniness protective film |
-
2011
- 2011-05-27 CN CN2011201750187U patent/CN202075477U/en not_active Expired - Lifetime
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102207597A (en) * | 2011-05-27 | 2011-10-05 | 宁波永新光学股份有限公司 | Optical window device with high hardness and low friction coefficient |
| CN102207597B (en) * | 2011-05-27 | 2012-12-19 | 宁波永新光学股份有限公司 | Optical window device with high hardness and low friction coefficient |
| CN109182969A (en) * | 2018-08-30 | 2019-01-11 | 湖北久之洋红外系统股份有限公司 | The preparation method of medium-wave infrared optics horniness protective film |
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| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| AV01 | Patent right actively abandoned |
Granted publication date: 20111214 Effective date of abandoning: 20130306 |
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| AV01 | Patent right actively abandoned |
Granted publication date: 20111214 Effective date of abandoning: 20130306 |
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| RGAV | Abandon patent right to avoid regrant |