CN201942743U - Magnetic control target air-distribution structure - Google Patents
Magnetic control target air-distribution structure Download PDFInfo
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- CN201942743U CN201942743U CN 201020656917 CN201020656917U CN201942743U CN 201942743 U CN201942743 U CN 201942743U CN 201020656917 CN201020656917 CN 201020656917 CN 201020656917 U CN201020656917 U CN 201020656917U CN 201942743 U CN201942743 U CN 201942743U
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- target stand
- gas distribution
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Abstract
The utility model belongs to the field of magnetic control sputtering and particularly relates to a magnetic control target air-distribution structure. The magnetic control target air-distribution structure comprises a target seat, a pole piece, a target, magnetic steel and a shielding case, wherein the target seat is arranged below a sample, the pole piece is arranged in the target seat, the top of the target seat is provided with the target, and the shielding case is arranged outside the target seat and the target; the magnetic steel is arranged on the pole piece, and an oblique angle is formed by the upper end surface of the magnetic steel along an axial cross section; a sputtering gas path is arranged between the shielding cover and the target seat, and sputtering gas is introduced to the upper surface of the target through the sputtering gas path; and a reaction gas admission pipe is arranged outside the shielding cover, and reaction gas is introduced to the lower surface of the sample through the admission pipe. The magnetic control target air-distribution structure improves the use ratio of the target and working gas, improves the evenness of coating films, reduces the cost and improves the income.
Description
Technical field
The utility model belongs to the magnetron sputtering field, specifically a kind of magnetic controlling target gas distribution structure.
Background technology
At present, the mode of vacuum plating is a lot, comprises multiple modes such as magnetron sputtering, thermal resistance evaporation, electron beam, molecular beam epitaxy, arc ion plating, can both be under vacuum state, and film forming on sample.Wherein, magnetron sputtering is film forming a kind of very conventional mode of operation, and it is fast to have sedimentation velocity, substrate low temperature, advantages such as low damage.But the target utilization of magnetron sputtering is low, and working gas is to be directed to target material surface or sample surfaces by even compression ring mostly, to reach the homogeneity of sample plated film.
The utility model content
In order to solve the low problem of target utilization, and can more effectively utilize working gas, the purpose of this utility model to be to provide a kind of magnetic controlling target gas distribution structure.This magnetic controlling target gas distribution structure is directed to target material surface with sputter gas on the one hand, and other direction is directed to sample surfaces with reactant gases, can more effectively utilize working gas, has also improved quality of forming film greatly; Also improved the utilization ratio of target simultaneously.
The purpose of this utility model is achieved through the following technical solutions:
The utility model comprises target stand, pole shoe, target, magnet steel and shielding case, and wherein target stand is positioned at the below of sample, is provided with pole shoe in target stand, and the top of target stand is equipped with target, and target stand and target are provided with shielding case outward; Described magnet steel is installed on the pole shoe, and the upper surface of magnet steel cross section vertically is the oblique angle; Be provided with the sputter gas passage between shielding case and target stand, sputter gas is directed to the upper surface of target by this sputter gas passage; Be provided with the inlet pipe of reactant gases in the outside of shielding case, reactant gases is directed to the lower surface of sample by this inlet pipe.
Wherein: described magnet steel comprises first magnet steel that surrounds Fang Huan and Fang Huan is separated into two-part second magnet steel, the upper end of the first magnet steel internal surface is a chamfering, the vertical both sides of second magnet steel are chamfering respectively, on axial cross section, vertical two hypotenuses of second magnet steel tilt with the hypotenuse of the first magnet steel upper inner of both sides respectively; Described magnet steel comprises first magnet steel and second magnet steel, and first magnet steel is an annular, and its outside surface is a cylinder, and the bottom of internal surface is a cylinder, and the top is the conical surface; Described second magnet steel is positioned at the mid-way of first magnet steel, and the top of second magnet steel is a taper type, and on axial cross section, two hypotenuses of the second magnet steel frustum tilt with two hypotenuses of the first magnet steel conical surface respectively; The bottom of described target stand has inlet mouth, and an end of this inlet mouth is an inlet end, and the other end links to each other with total pipeline in being arranged on target stand, and this total pipeline is by a plurality of first pores and sputter gas channel connection; Inlet mouth is one or more; The diameter of first pore is less than the diameter of total pipeline; The top of described target stand is provided with the target stand loam cake, and the target gland of target by middle perforate is installed on the target stand and covers; The both sides of described target stand are respectively equipped with retaining plate, and the inwall at each retaining plate top all is connected with hook, and inlet pipe is installed on the hook, have second pore towards the sample lower surface on inlet pipe; Be provided with the recirculated cooling water passage in the described target stand.
Advantage of the present utility model and positively effect are:
1. the utility model guides to the surface of target with sputter gas, and reactant gases is guided to the surface of sample, has improved the utilization ratio of working gas, has also improved the homogeneity of plated film.
2. magnetic line of force has been evened up at the oblique angle between first magnet steel of the present utility model and the second magnet steel top, has increased the width of target etched area, has improved the utilization ratio of target.
3. the utility model is simple in structure, and cost is low, and income is big.
Description of drawings
Fig. 1 is an internal structure synoptic diagram of the present utility model;
Wherein: 1 is sample, and 2 is retaining plate, and 3 are hook, 4 is inlet pipe, and 5 is shielding case, and 6 is the target gland, 7 is target, and 8 is the target stand loam cake, and 9 is target stand, 10 is the first roller steel, and 11 is second magnet steel, and 12 is pole shoe, 13 is inlet mouth, and 14 is water-in, and 15 is first pore, 16 is the sputter gas passage, and 17 is second pore.
Embodiment
The utility model is described in further detail below in conjunction with accompanying drawing.
As shown in Figure 1, the utility model comprises retaining plate 2, shielding case 5, target gland 6, target 7, target stand loam cake 8, target stand 9, magnet steel and pole shoe 12, and wherein target stand 9 is a rectangular parallelepiped, inner hollow, and its inside is provided with pole shoe 12; On pole shoe 12, magnet steel is installed, magnet steel of the present utility model can be rectangle or annular, when magnet steel is rectangle, comprise first magnet steel 10 that surrounds Fang Huan and Fang Huan be separated into two-part second magnet steel 11, pole shoe 12 connects the magnetic field of first and second magnet steel 10,11, the upper end of first magnet steel, 10 internal surfaces is a chamfering, the vertical both sides of second magnet steel 11 are chamfering respectively, on axial cross section, second magnet steel, 11 vertical two hypotenuses tilt (formation toroidal) with the hypotenuse of first magnet steel, 10 upper inner of both sides respectively; When magnet steel is annular, comprise that first magnet steel 10 and second magnet steel, 11, the first magnet steel 10 are annular, its outside surface is a cylinder, the bottom of internal surface is a cylinder, the top is the conical surface; Second magnet steel is positioned at the mid-way of first magnet steel 10, the top of second magnet steel 11 is a taper type, on axial cross section, two hypotenuses of second magnet steel, 11 frustums tilt with two hypotenuses of first magnet steel, 10 conical surfaces respectively, even up magnetic field in order to widen, increase the width of target etched area, improve the utilization ratio of target.The top of target stand 9 is provided with target stand loam cake 8, forms the cavity of a sealing with target stand 9; Target 7 is positioned on the target stand loam cake 8, is fixed by target gland 6.Outside at target gland 6 and target stand 9 is provided with shielding case 5, and this shielding case 5 can play shielding effect, also can be used for blocking sputter gas, sputter gas is guided to the surface of target 7; The centre of shielding case 5 and target gland 6 has the hole.Be provided with sputter gas passage 16 between the both sides of target stand 9 and the shielding case 5 and between target gland 6 upper surfaces and the shielding case 5, the bottom of target stand 9 has one or more inlet mouths 13, when inlet mouth 13 was one, an end was an inlet end, and the other end links to each other with total pipeline 18; When inlet mouth 13 was a plurality of, an end of each inlet mouth 13 was an inlet end, and the other end converges to total pipeline 18, and this total pipeline 18 is arranged in the target stand 9, closed at both ends, and total pipeline 18 is connected with sputter gas passage 16 by a plurality of first pores 15; The diameter of first pore 15 is less than the diameter of total pipeline 18, to slow down the flow velocity of sputter gas.Also be provided with the recirculated cooling water passage in target stand 9, water coolant can enter by water-in 14, and first and second magnet steel 10,11 is cooled.The both sides of target stand 9 are respectively equipped with retaining plate 2, and the inwall at each retaining plate 2 top all is connected with hook 3, and inlet pipe 4 is installed on the hook 3, has second pore 17 towards sample 1 lower surface on inlet pipe 4.Sputter gas is directed to the upper surface of target 7 by sputter gas passage 16, and reactant gases is directed to the lower surface of sample 1 by inlet pipe 4, to improve the utilization ratio of gas, improves the homogeneity of plated film.
Principle of work of the present utility model is:
When magnetic controlling target is worked, first magnet steel 10 and second magnet steel 11 tilt the structure at (oblique angle) for magnetic controlling target provides magnetic field between the top of the top of first magnet steel 10 and second magnet steel 11, magnetic line of force is evened up, put down the width that has added etched area, improved the utilization ratio of target 7.Sputter gas is entered by admission port 13, enters sputter gas passage 16 through total pipeline 18, first pore 15, is directed to the upper surface of target 7 again, i.e. a-quadrant among Fig. 1, and the arrow C direction among Fig. 1 is the flow direction of sputter gas; Reactant gases is penetrated by second pore 17 by inlet pipe 4, is directed to the lower surface of sample 1, i.e. B zone among Fig. 1, and the arrow D direction among Fig. 1 is the flow direction of reactant gases; Sputter gas constantly bombards target 7 under the effect in electric field and magnetic field, finish the even plated film on sample 1.
Claims (8)
1. magnetic controlling target gas distribution structure, it is characterized in that: comprise target stand (9), pole shoe (12), target (7), magnet steel and shielding case (6), wherein target stand (9) is positioned at the below of sample (1), in target stand (9), be provided with pole shoe (12), the top of target stand (9) is equipped with target (7), the outer shielding case (6) that is provided with of target stand (9) and target (7); Described magnet steel is installed on the pole shoe (12), and the upper surface of magnet steel cross section vertically is the oblique angle; Be provided with sputter gas passage (16) between shielding case (5) and target stand (9), sputter gas is directed to the upper surface of target (7) by this sputter gas passage (16); Be provided with the inlet pipe (4) of reactant gases in the outside of shielding case (5), reactant gases is directed to the lower surface of sample (1) by this inlet pipe (4).
2. by the described magnetic controlling target gas distribution of claim 1 structure, it is characterized in that: described magnet steel comprises first magnet steel (10) that surrounds Fang Huan and Fang Huan is separated into two-part second magnet steel (11), the upper end of first magnet steel (10) internal surface is a chamfering, the vertical both sides of second magnet steel (11) are chamfering respectively, on axial cross section, vertical two hypotenuses of second magnet steel (11) tilt with the hypotenuse of first magnet steel (10) upper inner of both sides respectively.
3. by the described magnetic controlling target gas distribution of claim 1 structure, it is characterized in that: described magnet steel comprises first magnet steel (10) and second magnet steel (11), and first magnet steel (10) is an annular, and its outside surface is a cylinder, and the bottom of internal surface is a cylinder, and the top is the conical surface; Described second magnet steel is positioned at the mid-way of first magnet steel (10), and the top of second magnet steel (11) is a taper type, and on axial cross section, two hypotenuses of second magnet steel (11) frustum tilt with two hypotenuses of first magnet steel (10) conical surface respectively.
4. by the described magnetic controlling target gas distribution of claim 1 structure, it is characterized in that: the bottom of described target stand (9) has inlet mouth (13), one end of this inlet mouth (13) is an inlet end, the other end total pipeline (18) interior with being arranged on target stand (9) links to each other, and this total pipeline (18) is communicated with sputter gas passage (16) by a plurality of first pores (15).
5. by the described magnetic controlling target gas distribution of claim 3 structure, it is characterized in that: described inlet mouth (13) is for one or more; The diameter of first pore (15) is less than the diameter of total pipeline (18).
6. by the described magnetic controlling target gas distribution of claim 1 structure, it is characterized in that: the top of described target stand (9) is provided with target stand loam cake (8), and target (7) is installed on the target stand loam cake (8) by the target gland (6) of middle perforate.
7. by the described magnetic controlling target gas distribution of claim 1 structure, it is characterized in that: the both sides of described target stand (9) are respectively equipped with retaining plate (2), the inwall at each retaining plate (2) top all is connected with hook (3), inlet pipe (4) is installed on the hook (3), has second pore (17) towards sample (1) lower surface on inlet pipe (4).
8. by the described magnetic controlling target gas distribution of claim 1 structure, it is characterized in that: described target stand is provided with the recirculated cooling water passage in (9).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201020656917 CN201942743U (en) | 2010-12-13 | 2010-12-13 | Magnetic control target air-distribution structure |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201020656917 CN201942743U (en) | 2010-12-13 | 2010-12-13 | Magnetic control target air-distribution structure |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN201942743U true CN201942743U (en) | 2011-08-24 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 201020656917 Expired - Fee Related CN201942743U (en) | 2010-12-13 | 2010-12-13 | Magnetic control target air-distribution structure |
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| CN (1) | CN201942743U (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102534521A (en) * | 2010-12-13 | 2012-07-04 | 中国科学院沈阳科学仪器研制中心有限公司 | Magnetron target gas distribution structure |
| CN103291586A (en) * | 2013-06-19 | 2013-09-11 | 储继国 | Vacuum furnace air-pumping system and air-pumping technology thereof |
| CN112281126A (en) * | 2020-10-29 | 2021-01-29 | 河南卓金光电科技股份有限公司 | Reactive magnetron sputtering separation type gas distribution method |
| CN113373418A (en) * | 2021-06-16 | 2021-09-10 | 北京航空航天大学合肥创新研究院(北京航空航天大学合肥研究生院) | Magnetron sputtering cathode target for preparing nanoclusters |
-
2010
- 2010-12-13 CN CN 201020656917 patent/CN201942743U/en not_active Expired - Fee Related
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102534521A (en) * | 2010-12-13 | 2012-07-04 | 中国科学院沈阳科学仪器研制中心有限公司 | Magnetron target gas distribution structure |
| CN103291586A (en) * | 2013-06-19 | 2013-09-11 | 储继国 | Vacuum furnace air-pumping system and air-pumping technology thereof |
| CN112281126A (en) * | 2020-10-29 | 2021-01-29 | 河南卓金光电科技股份有限公司 | Reactive magnetron sputtering separation type gas distribution method |
| CN113373418A (en) * | 2021-06-16 | 2021-09-10 | 北京航空航天大学合肥创新研究院(北京航空航天大学合肥研究生院) | Magnetron sputtering cathode target for preparing nanoclusters |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20110824 Termination date: 20141213 |
|
| EXPY | Termination of patent right or utility model |