CN201896128U - Annealing temperature control device for TFT (thin film transistor) glass substrate - Google Patents
Annealing temperature control device for TFT (thin film transistor) glass substrate Download PDFInfo
- Publication number
- CN201896128U CN201896128U CN2010205866633U CN201020586663U CN201896128U CN 201896128 U CN201896128 U CN 201896128U CN 2010205866633 U CN2010205866633 U CN 2010205866633U CN 201020586663 U CN201020586663 U CN 201020586663U CN 201896128 U CN201896128 U CN 201896128U
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- control device
- glass substrate
- annealing
- temperature control
- tft
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Abstract
The utility model discloses an annealing temperature control device for a TFT (thin film transistor) glass substrate, which comprises a heating module 1 and a mean temperature plate 4, wherein the mean temperature plate 4 is connected with an annealing furnace 2 through an extension mechanism 3; and the heating module 1 is fixed on the annealing furnace 2. The annealing temperature control device can control the temperature and airflow inside the annealing furnace, has the characteristics of simple structure, and is easy to use.
Description
Technical field
The utility model relates to a kind of glass annealing temperature-control device, especially relates to a kind of annealing temperature control device of the TFT of being used for glass substrate.
Background technology
The size of glass substrate stress is an one important performance characteristic, if base plate stress can not guarantee in acceptability limit, then in manufacturing processed, can occur bursting, problem such as distortion, and annealing is an important means that effectively eliminates stress.Produce in several sophisticated method of TFT glass substrate at present, send out the most popular with the overflow moulding, also relative is the most ripe, but this relative technology requires all very high to the control of production process and production environment, what equipment will be lacked when the annealing device in the TFT glass substrate field was compared the annealing of using in other glass industry is many, be not easy to multinomial adjustment, the adjustment means are single, can't reach by improving the purpose that the annealing effect effectively eliminates stress.
Summary of the invention
In order to overcome the shortcoming of above-mentioned prior art, the purpose of this utility model is to provide a kind of annealing temperature control device of the TFT of being used for glass substrate, this annealing temperature control device can make annealing furnace temperature inside and air-flow controlled, has the characteristics that are easy to utilize simple in structure.
In order to achieve the above object, the technical solution adopted in the utility model is:
A kind of annealing temperature control device that is used for the TFT glass substrate comprises heating module 1, also comprises temperature-uniforming plate 4, and temperature-uniforming plate 4 is connected with annealing furnace 2 by telescoping mechanism 3, is fixed with heating module 1 on the annealing furnace 2.
Described heating module 1 is a plurality of.
The utility model compared with prior art has the following advantages:
1) makes that the annealing furnace temperature inside is controlled.
2) make that the air-flow of annealing furnace inside is controlled.
Description of drawings
Fig. 1 is a structural representation of the present utility model.
Fig. 2 is user mode figure of the present utility model.
Embodiment
Below in conjunction with accompanying drawing the utility model is described in further details.
As shown in Figure 1 and Figure 2, a kind of annealing temperature control device that is used for the TFT glass substrate comprises heating module 1, also comprises temperature-uniforming plate 4, and temperature-uniforming plate 4 is connected with annealing furnace 2 by telescoping mechanism 3, is fixed with heating module 1 on the annealing furnace 2.Described heating module 1 is a plurality of.
Principle of work of the present utility model is:
During work, the utility model is equally distributed on the both sides of sheet glass 5, utilizes the heating module 1 in the annealed temperature-control device to eliminate stress when sheet glass 5 is dirty, and utilizes the change in location control moulding device interior air-flow of temperature-uniforming plate 4.Internal stress according to sheet glass 5, at first use 1 pair of corresponding site of heating module to carry out temperature control, reduced to zero or rise to greatest extent as heating module 1 power, in the time of still can not satisfying the technology service requirements, then start telescoping mechanism 3, with temperature-uniforming plate 4 relative to moving, to change the cooling environment in the annealing furnace 2 with sheet glass 5, make temperature rising or decline in annealing furnace 2 cavitys, to reach the purpose that changes technological temperature.When utilizing telescoping mechanism 3, adjust temperature-uniforming plate 4 with the relative position of sheet glass 5 time, also can have influence on the airflow east of molding device inside, and finally change whole air-flow in the body of heater.
Claims (2)
1. annealing temperature control device that is used for the TFT glass substrate, comprise heating module (1), it is characterized in that, also comprise temperature-uniforming plate (4), temperature-uniforming plate (4) is connected with annealing furnace (2) by telescoping mechanism (3), is fixed with heating module (1) on the annealing furnace (2).
2. a kind of annealing temperature control device that is used for the TFT glass substrate according to claim 1 is characterized in that heating module (1) is a plurality of.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010205866633U CN201896128U (en) | 2010-10-28 | 2010-10-28 | Annealing temperature control device for TFT (thin film transistor) glass substrate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010205866633U CN201896128U (en) | 2010-10-28 | 2010-10-28 | Annealing temperature control device for TFT (thin film transistor) glass substrate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN201896128U true CN201896128U (en) | 2011-07-13 |
Family
ID=44254042
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2010205866633U Expired - Lifetime CN201896128U (en) | 2010-10-28 | 2010-10-28 | Annealing temperature control device for TFT (thin film transistor) glass substrate |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN201896128U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106517757A (en) * | 2016-11-04 | 2017-03-22 | 重庆兴宝兴玻璃制品有限公司 | Annealing furnace for glassware |
-
2010
- 2010-10-28 CN CN2010205866633U patent/CN201896128U/en not_active Expired - Lifetime
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106517757A (en) * | 2016-11-04 | 2017-03-22 | 重庆兴宝兴玻璃制品有限公司 | Annealing furnace for glassware |
| CN106517757B (en) * | 2016-11-04 | 2018-12-18 | 重庆兴宝兴玻璃制品有限公司 | Annealing of glassware furnace |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C41 | Transfer of patent application or patent right or utility model | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20160330 Address after: 712021 Rainbow Road, Shaanxi, Xianyang, No. 1 Patentee after: IRICO Group Corp. Address before: 712021 Rainbow Road, Shaanxi, Xianyang Patentee before: Shaanxi Caihong Electronic Glass Co., Ltd. |
|
| CX01 | Expiry of patent term |
Granted publication date: 20110713 |
|
| CX01 | Expiry of patent term |