CN201864794U - Polysilicon etching tank - Google Patents
Polysilicon etching tank Download PDFInfo
- Publication number
- CN201864794U CN201864794U CN2010206298384U CN201020629838U CN201864794U CN 201864794 U CN201864794 U CN 201864794U CN 2010206298384 U CN2010206298384 U CN 2010206298384U CN 201020629838 U CN201020629838 U CN 201020629838U CN 201864794 U CN201864794 U CN 201864794U
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- CN
- China
- Prior art keywords
- water jacket
- feed liquor
- reactive tank
- overflow passage
- texturing slot
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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Abstract
The utility model discloses a polysilicon etching tank, comprising a reaction tank (2), an outer tank (1), a liquid inlet pipeline arranged on the reaction tank (2) and an overflow pipeline arranged on the outer tank (1), wherein the reaction tank (2) is partially arranged in the outer tank (1), the liquid inlet pipeline is provided with an adjusting valve and can control the feed liquid quantity of the reaction tank (2), and a liquid level sensor is arranged on the outer tank (1) so that the overflow quantity of the outer tank (1) can be automatically and correspondingly adjusted according to the feed liquid quantity of the outer tank (1).
Description
Technical field
The utility model relates to the solar energy generation technology field, particularly a kind of polysilicon texturing slot.
Background technology
Solar photoelectric (photovoltaic, PV) in the industry, the making herbs into wool of polysilicon chip need be carried out under low-temperature condition, because of its reaction can be emitted a large amount of reaction heat, for making reaction solution maintain the low temperature steady state, adopt the mode of tank solution circularly cooling to take away reaction heat.In the prior art, the feed liquor amount and the spillway discharge of reaction solution are separate, and reactive tank feed liquor amount is not controlled, and the spillway discharge of water jacket can't carry out corresponding adjusting according to the size of the feed liquor amount of water jacket.
The utility model content
(1) technical problem that will solve
The technical problems to be solved in the utility model is: how reactive tank feed liquor amount is controlled, and the spillway discharge of water jacket can be regulated voluntarily accordingly according to the size of the feed liquor amount of water jacket.
(2) technical scheme
For solving the problems of the technologies described above, the utility model provides a kind of polysilicon texturing slot, comprise: reactive tank, water jacket, be installed in the feed liquor pipeline on the described reactive tank and be installed on overflow passage on the described water jacket, described reactive tank partly places described water jacket, wherein, described feed liquor pipeline is provided with variable valve.
Wherein, described reaction tank bottom is provided with the even flow plate in some uniform flows hole, and described reactive tank sidewall is lower than described water jacket place and is provided with some uniform flows hole.
Wherein, described feed liquor pipeline comprises: side feed liquor pipeline and below feed liquor pipeline, and described below feed liquor pipeline is located under the described even flow plate, and described side feed liquor pipeline is located at the above place, some uniform flows hole of described reactive tank sidewall.
Wherein, also comprise: high position sensor and low sensors, described high position sensor are located at described water jacket sidewall, and described low sensors is located at described water jacket sidewall and is lower than described high position sensor place.
Wherein, described overflow passage comprises the low level overflow passage, and described low level overflow passage is arranged at described outer slot bottom.
Wherein, be provided with at least two protection dividing plates between described reactive tank and the water jacket.
Wherein, described overflow passage also comprises high-order overflow passage, and described high-order overflow passage is located at described water jacket sidewall and is located between high position sensor and low sensors level attitude.
Wherein, described reactive tank bottom also is provided with the reactive tank discharge pipe.
Wherein, described water jacket bottom also is provided with the water jacket discharge pipe.
(3) beneficial effect
The utility model can be controlled reactive tank feed liquor amount by on the feed liquor pipeline variable valve being set, and by liquid level sensor is set on water jacket, and the spillway discharge of water jacket can be regulated voluntarily accordingly according to the size of the feed liquor amount of water jacket.
Description of drawings
Fig. 1 is the structural representation according to the polysilicon texturing slot of a kind of embodiment of the utility model;
Fig. 2 is the front view of polysilicon texturing slot shown in Figure 1.
Embodiment
Below in conjunction with drawings and Examples, embodiment of the present utility model is described in further detail.Following examples are used to illustrate the utility model, but are not used for limiting scope of the present utility model.Fig. 1 is the structural representation according to the polysilicon texturing slot of a kind of embodiment of the present utility model, comprise: water jacket 1, reactive tank 2, be installed in the feed liquor pipeline on the described reactive tank 2, and be installed on overflow passage on the described water jacket 1, reactive tank 2 parts place water jacket 1, described feed liquor pipeline is provided with the variable valve (not shown), described feed liquor pipeline links to each other with feed liquor magnetic drive pump one end, can cooperate described feed liquor magnetic drive pump easily the feed liquor amount of reactive tank 2 to be regulated by described variable valve, described feed liquor magnetic drive pump is connected with feed liquor magnetic drive pump controller, the described feed liquor magnetic drive pump the other end connects the outlet of cooling tank, and described overflow passage connects the import of described cooling tank.Preferably, described reactive tank 2 bottoms are equipped with the even flow plate 10 in some uniform flows hole 11, are lower than water jacket 1 place on the sidewall and are provided with some uniform flows hole 11.Described feed liquor pipeline comprises: side feed liquor pipeline 12 and below feed liquor pipeline 13, and below feed liquor pipeline 13 is located at reactive tank 2 bottoms, and even flow plate 10 times, side feed liquor pipeline 12 are located at the above 11 place, some uniform flows hole of reactive tank 2 sidewalls.For the spillway discharge that makes water jacket 1 can be regulated voluntarily accordingly according to the size of the feed liquor amount of water jacket 1, preferably, the polysilicon texturing slot also comprises: high position sensor 4 and low sensors 5, described high position sensor 4 is located at described water jacket 1 sidewall, described low sensors 5 is located at described water jacket 1 sidewall and is lower than described high position sensor 4 places, described overflow passage comprises low level overflow passage 9, be located at water jacket 1 bottom, described low level overflow passage 9 links to each other with overflow magnetic drive pump one end, the described overflow magnetic drive pump the other end links to each other with the cooling tank import, described overflow magnetic drive pump is connected with overflow magnetic drive pump controller, and described high position sensor 4 all links to each other with described magnetic drive pump controller with low sensors 5.The level fluctuation that produces when preventing described overflow passage overflow, and the flase operation that causes preferably, is provided with at least two protection dividing plate (not shown) in high position sensor 4 and low sensors 5 places between reactive tank 2 and the water jacket 1.For improving spillover efficiency, described overflow passage also comprises high-order overflow passage 6, and described high-order overflow passage 6 is located at described water jacket 1 sidewall and is located between high position sensor 4 and low sensors 5 level attitudes.Conveniently reaction solution is not discharged for making when circulate soln does not re-use when needing to change solution, preferably, reactive tank 2 also is provided with reactive tank discharge pipe 8, and water jacket 1 also is provided with water jacket discharge pipe 7.
The principle of work of above-mentioned polysilicon texturing slot is: described feed liquor magnetic drive pump injects reactive tank 2 with the solution in the described cooling tank by the feed liquor pipeline, and after solution was filled with, overflow was to water jacket 1, and the solution of water jacket 1 is back to cooling tank by overflow passage.Silicon chip is put into after some circulations reach technological temperature finishing, and after technology begins, no matter whether is placed with silicon chip in this time slot, and this circulation is all being carried out.According to the quantity of putting into silicon chip, can regulate the feed liquor flow by the variable valve of regulating on feed liquor magnetic drive pump controller and the feed liquor pipeline.Size according to water jacket 1 feed liquor amount, the signal that overflow magnetic drive pump controller is sent according to high position sensor 4 and low sensors 5, control low level overflow passage 9, match by low level overflow passage 9 and high-order overflow passage 6, liquid level is remained between high position sensor 4 and the low sensors 5.High-order overflow passage 6 is discharged solution by gravity, as long as the liquid level of water jacket 1 surpasses high-order overflow passage 6, and then high-order overflow passage 6 automatic drains, and the solution of discharging is delivered to described cooling tank.If the feed liquor amount of water jacket 1 is less, can only carry out discharge opeing by high-order overflow passage 6.If the feed liquor amount of water jacket 1 is bigger, make the solution level of water jacket 1 surpass high position sensor 4, high-order overflow passage 6 is because the relation of gravity is discharged a part of solution, described overflow magnetic drive pump controller receives the signal of high position sensor 4, then start described overflow magnetic drive pump, solution is extracted out from low level overflow passage 9, be lower than low sensors 5 until liquid level, described overflow magnetic drive pump controller receives the signal of low sensors 5, close described overflow magnetic drive pump, the big I of the spillway discharge of low level overflow passage 9 is regulated by described overflow magnetic drive pump controller, when low level overflow passage 9 was delivered to described cooling tank by described overflow magnetic drive pump with solution, high-order overflow passage 6 was delivered to described cooling tank by gravity with solution simultaneously.When circulate soln does not re-use, when needing to change, then reaction solution is discharged by reactive tank discharge pipe 8 and water jacket discharge pipe 7.
Above embodiment only is used to illustrate the utility model; and be not to restriction of the present utility model; the those of ordinary skill in relevant technologies field; under the situation that does not break away from spirit and scope of the present utility model; can also make various variations and modification; therefore all technical schemes that are equal to also belong to category of the present utility model, and scope of patent protection of the present utility model should be defined by the claims.
Claims (9)
1. polysilicon texturing slot, comprise: reactive tank (2), water jacket (1), be installed in the feed liquor pipeline on the described reactive tank (2) and be installed on overflow passage on the described water jacket (1), described reactive tank (2) part places described water jacket (1), it is characterized in that described feed liquor pipeline is provided with variable valve.
2. polysilicon texturing slot as claimed in claim 1 is characterized in that, described reactive tank (2) bottom is provided with the even flow plate (10) in some uniform flows hole (11), and described reactive tank (2) sidewall is lower than described water jacket (1) and locates to be provided with some uniform flows hole (11).
3. polysilicon texturing slot as claimed in claim 2, it is characterized in that, described feed liquor pipeline comprises: side feed liquor pipeline (12) and below feed liquor pipeline (13), described below feed liquor pipeline (13) is located under the described even flow plate (10), and described side feed liquor pipeline (12) is located at the above some uniform flows hole (11) of described reactive tank (2) sidewall and is located.
4. polysilicon texturing slot as claimed in claim 1, it is characterized in that, also comprise: high position sensor (4) and low sensors (5), described high position sensor (4) is located at described water jacket (1) sidewall, and described low sensors (5) is located at described water jacket (1) sidewall and is lower than described high position sensor (4) and locates.
5. polysilicon texturing slot as claimed in claim 4 is characterized in that, described overflow passage comprises low level overflow passage (9), and described low level overflow passage is arranged at described water jacket (1) bottom.
6. polysilicon texturing slot as claimed in claim 4 is characterized in that, is provided with at least two protection dividing plates between described reactive tank (2) and the water jacket (1).
7. polysilicon texturing slot as claimed in claim 4, it is characterized in that, described overflow passage also comprises high-order overflow passage (6), described high-order overflow passage (6) be located at described water jacket (1) sidewall and be positioned at high position sensor (4) and low sensors (5) level attitude between locate.
8. as each described polysilicon texturing slot of claim 1 to 7, it is characterized in that described reactive tank (2) bottom also is provided with reactive tank discharge pipe (8).
9. polysilicon texturing slot as claimed in claim 8 is characterized in that, described water jacket (1) bottom also is provided with water jacket discharge pipe (7).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010206298384U CN201864794U (en) | 2010-11-23 | 2010-11-23 | Polysilicon etching tank |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010206298384U CN201864794U (en) | 2010-11-23 | 2010-11-23 | Polysilicon etching tank |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN201864794U true CN201864794U (en) | 2011-06-15 |
Family
ID=44135956
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2010206298384U Expired - Lifetime CN201864794U (en) | 2010-11-23 | 2010-11-23 | Polysilicon etching tank |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN201864794U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109887861A (en) * | 2019-01-14 | 2019-06-14 | 上海釜川自动化设备有限公司 | A kind of flow-harmonization device and its uniform flow implementation method |
-
2010
- 2010-11-23 CN CN2010206298384U patent/CN201864794U/en not_active Expired - Lifetime
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109887861A (en) * | 2019-01-14 | 2019-06-14 | 上海釜川自动化设备有限公司 | A kind of flow-harmonization device and its uniform flow implementation method |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CX01 | Expiry of patent term | ||
| CX01 | Expiry of patent term |
Granted publication date: 20110615 |