CN201724962U - Probe positioning structure of four-point probe test instrument - Google Patents
Probe positioning structure of four-point probe test instrument Download PDFInfo
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- CN201724962U CN201724962U CN2010202375038U CN201020237503U CN201724962U CN 201724962 U CN201724962 U CN 201724962U CN 2010202375038 U CN2010202375038 U CN 2010202375038U CN 201020237503 U CN201020237503 U CN 201020237503U CN 201724962 U CN201724962 U CN 201724962U
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Abstract
A probe positioning structure of a four-point probe test instrument comprises an insulative detecting head and four probes, wherein an elastic insulation spacer ring is fixedly sheathed on each probe, the internal diameter of the elastic insulation spacer ring is matched with the diameter of the probe, and the sum of the wall thicknesses of the elastic insulation spacer rings sheathed on two adjacent probes is equal to the value obtained by subtracting the diameter of a probe from the center distance between the two adjacent probes; the four elastic insulation spacer rings are arranged in the positions on the probes with same height; and the distances of the elastic insulation spacer rings away from the lower ends of the metal probes are 1/4 to 1/2 of the total length of the probes. By adopting tetrafluoro elastic insulating material to manufacture the probe spacer rings, the process is simple, the precision of the spacer rings is high, and the cost is low. Since the tetrafluoro elastic insulated rings are sheathed on all the probes, the four probes can be steadily spaced out to increase the strength of the probes, the mechanical deviation of the probes can be accurately controlled, and the electric insulation performance among the probes and the constant-pressure elasticity and good electric contact performance of the probes can be guaranteed.
Description
Technical field:
The utility model relates to the four point probe tester that is used for silicon chip resistance and resistivity measurement, relates in particular to the probe test parts of four point probe tester.
Background technology:
Sun power is a kind of cleaning, pollution-free and recycled regenerative resource, and the solar cell manufacturing technology that sun power is converted to electric energy is effectively to utilize an important technology of sun power.At present, diffusion is a process procedure of making solar cell photoelectric conversion core component P-N knot, is the gordian technique that solar cell is made.And the measurement of resistance is to guarantee one of important parameter of diffusion quality, and it has reflected in the material concentration of residual impurity after the impurity compensation.During measurement, four metal probes are pressed on the silicon chip surface, impressed current flows in the semiconductor by the contact point of outer metal and semiconductor surface, by the voltage between the measurement internal probe, thereby calculates resistance and resistivity.
For accuracy and the repeatability that guarantees to measure, requiring not only will have high electrical insulating property between four probes, guarantees that insulativity is greater than 10 between probe
9Ohm, and make the machinery amount of vacillating of probe as far as possible little, probe also should have the elasticity and the good electrical contact of constant voltage.At present, people usually adopt with four probes be solidificated in the probe reinforcement fixedly way overcome, but in actual use, probe also can produce skew, and the spacing between the probe can not guarantee constant, not only insulativity is difficult to meet the demands between probe, and serviceable life is not long, can directly influence accuracy of detection again if force to use.The applicant once adopted the synthetic cut stone plate to locate and separated four probes, promptly the position according to four probes gets out four apertures on a synthetic cut stone plate, then four probes are inserted in four apertures, reach thus four probes are separated, and the skew of qualification probe, the purpose of the minimizing machinery amount of vacillating.Though this scheme is than superior before improving, but metal probe lacks constant voltage elasticity in test process, electrically contacting property also be cannot say for sure to demonstrate,prove, simultaneously, to on the synthetic cut stone sheet, get out very difficulty of four location aperture processing by pre-provisioning request, processing cost height not only, and the positional precision between four apertures also is difficult to reach requirement.
The utility model content:
In order to solve the problems referred to above that the four point probe tester exists, the utility model provides a kind of probe location structure of four point probe tester.The machinery that adopts this location structure can accurately control probe is vacillated, and can guarantee the electrical insulating property between probe again, can also make metal probe have constant voltage elasticity and good electrical contact simultaneously.
The technical scheme that the utility model adopted is:
The probe location structure of described four point probe tester, comprise insulation detecting head and four probes, the upper end of four probes is solidificated on the insulation detecting head, it is characterized in that: all fixed cover is equipped with elastic insulated spacer ring on each root probe, the internal diameter of elastic insulated spacer ring and the diameter of probe are complementary, and the wall thickness sum of the elastic insulated spacer ring of institute's suit equals the diameter that centre distance between two adjacent probe deducts a probe on adjacent two probes; And four elastic insulated spacer rings are on the sustained height position of probe.
Further, elastic insulated spacer ring is 1/4~1/2 of a probe total length apart from the distance of metal probe lower end.
Further, described elastic insulated spacer ring is formed by the mold pressing of tetrafluoro elastic insulating material, and its inner core is provided with and relaxes the chamber.
Not only technology is simple to adopt the tetrafluoro elastic insulating material to make the probe spacer ring, and spacer ring precision height, with low cost, elastic insulated circle of suit tetrafluoro all on every probe, four probes very stably can be separated, increase the intensity of probe, can accurately control the machinery of probe again and vacillate, guarantee the electrical insulating property between probe, can also guarantee that probe has constant voltage elasticity and good electrical contact.
Description of drawings:
Fig. 1 is a structural representation of the present utility model.
Fig. 2 is that elastic insulated spacer ring is sleeved on the structural representation on the probe;
Among the figure: the 1-detecting head that insulate; The 2-probe; The elastic insulated spacer ring of 3-; 4-relaxes the chamber.
Embodiment:
Below in conjunction with description of drawings embodiment of the present utility model:
The probe location structure of described four point probe tester, as shown in Figure 1 and Figure 2, it comprises insulation detecting head 1 and four probes 2, the upper end of four probes 2 is solidificated on the insulation detecting head 1, fixing elastic insulated spacer ring 3 that forms by the mold pressing of tetrafluoro elastic insulating material of suit all on each root probe 2, the diameter of the internal diameter of elastic insulated spacer ring 3 and probe 2 is complementary, and the wall thickness sum of the elastic insulated spacer ring 3 of institute's suit equals the diameter that centre distance between two adjacent probe 2 deducts a probe 2 on adjacent two probes 2; And four elastic insulated spacer rings 3 are in the sustained height position on probe 2, specific requirement is elastic insulated spacer ring 3 apart from the distance of metal probe 2 lower ends is 1/4~1/2 of probe 2 total lengths, be 1/3 in this example, be provided with at the inner core of elastic insulated spacer ring 3 and relax chamber 4.
Claims (3)
1. the probe location structure of a four point probe tester, comprise insulation detecting head (1) and four probes (2), the upper end of four probes (2) is solidificated on the insulation detecting head (1), it is characterized in that: shooting property of fixed cover insulated spacing collar (3) all on each root probe (2), the diameter of the internal diameter of elastic insulated spacer ring (3) and probe (2) is complementary, and the wall thickness sum of the elastic insulated spacer ring (3) of institute's suit equals the diameter that centre distance between two adjacent probe (2) deducts a probe (2) on adjacent two probes (2); And four elastic insulated spacer rings (3) are on the sustained height position of probe.
2. according to the probe location structure of the described four point probe tester of claim 1, it is characterized in that: described elastic insulated spacer ring (3) is 1/4~1/2 of probe (a 2) total length apart from the distance of metal probe (2) lower end.
3. according to the probe location structure of the described four point probe tester of claim 1, it is characterized in that: described elastic insulated spacer ring (3) is formed by the mold pressing of tetrafluoro elastic insulating material, and its inner core is provided with and relaxes chamber (4).
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN2010202375038U CN201724962U (en) | 2010-06-18 | 2010-06-18 | Probe positioning structure of four-point probe test instrument |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN2010202375038U CN201724962U (en) | 2010-06-18 | 2010-06-18 | Probe positioning structure of four-point probe test instrument |
Publications (1)
Publication Number | Publication Date |
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CN201724962U true CN201724962U (en) | 2011-01-26 |
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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CN2010202375038U Expired - Fee Related CN201724962U (en) | 2010-06-18 | 2010-06-18 | Probe positioning structure of four-point probe test instrument |
Country Status (1)
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CN (1) | CN201724962U (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101968497A (en) * | 2010-06-18 | 2011-02-09 | 常州亿晶光电科技有限公司 | Probe positioning structure of four-probe instrument |
CN103472303A (en) * | 2013-09-10 | 2013-12-25 | 南通大学 | Multifunctional automatic four-point probe tester |
CN103675455A (en) * | 2013-10-31 | 2014-03-26 | 成都金采科技有限公司 | Four-point resistor testing device |
-
2010
- 2010-06-18 CN CN2010202375038U patent/CN201724962U/en not_active Expired - Fee Related
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101968497A (en) * | 2010-06-18 | 2011-02-09 | 常州亿晶光电科技有限公司 | Probe positioning structure of four-probe instrument |
CN101968497B (en) * | 2010-06-18 | 2014-07-23 | 常州亿晶光电科技有限公司 | Probe positioning structure of four-probe instrument |
CN103472303A (en) * | 2013-09-10 | 2013-12-25 | 南通大学 | Multifunctional automatic four-point probe tester |
CN103675455A (en) * | 2013-10-31 | 2014-03-26 | 成都金采科技有限公司 | Four-point resistor testing device |
CN103675455B (en) * | 2013-10-31 | 2016-08-17 | 成都金采科技有限公司 | A kind of four probe resistance test devices |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20110126 Termination date: 20150618 |
|
EXPY | Termination of patent right or utility model |