CN201655761U - Cleaning rack for semiconductor elements - Google Patents
Cleaning rack for semiconductor elements Download PDFInfo
- Publication number
- CN201655761U CN201655761U CN201020142574XU CN201020142574U CN201655761U CN 201655761 U CN201655761 U CN 201655761U CN 201020142574X U CN201020142574X U CN 201020142574XU CN 201020142574 U CN201020142574 U CN 201020142574U CN 201655761 U CN201655761 U CN 201655761U
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- CN
- China
- Prior art keywords
- cleaning
- rack
- upper bracket
- plate
- base plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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Abstract
The utility model relates to a cleaning rack for semiconductor elements, which comprises a bottom plate, an upper support, more than two supporting seats and lower blocks. An opening is arranged in the middle of the bottom plate; the upper support is a groove-shaped support with a front opening; two sides of the supporting seats in parallely inclined arrangement are respectively fixed onto the bottom plate and two sides of the upper support; more than two lower blocks are respectively fixed onto the bottom plate and positioned in the front of the supporting seats; and an insertion groove for washing a cleaning plate is arranged between each lower block and each support. The cleaning rack has simple structure, and is convenient in assembling and disassembling the cleaning plate, as the cleaning plate is slantingly arranged inside the cleaning rack, heavy metal iron at the bottom of the cleaning plate can be washed away along with ions, and the cleaning rack can ensure cleaning effect of a semiconductor diode, and increases yield of semiconductor diodes.
Description
Technical field
The utility model relates to a kind of rack for cleaning that is used for semiconductor element, belongs to the cleaning technique field of semiconductor diode.
Background technology
In the manufacturing process of semiconductor diode, need carry out pickling to semiconductor diode, whether semiconductor diode is clean, directly influences the performance of semiconductor diode.In acid cleaning process, usually semiconductor diode is inserted in the jack of cleaning disc, corrosive vitriolated pickle to going into the immersion of in the cleaning disc semiconductor diode being carried out the short time, is washed with double conductor diode of deionized water again.Cleaning disc adopts four corrosion resistant outrigger supports usually, when pouring cleaning disc into, pickle need keep the cleaning disc level, soak semiconductor diode by pickle, when using deionized water rinsing, because cleaning disc is a horizontal, though to washing, also have minute quantity metal remained ion to wash out in the cleaning disc, and influence the semiconductor diode cleaning performance by certain flow rate deionized water semiconductor diode.
Summary of the invention
The purpose of this utility model provides a kind of simple in structure, loads and unloads the rack for cleaning that is used for semiconductor element that cleaning disc is convenient, be convenient to rinse well.
The utility model is that the technical scheme that achieves the above object is: a kind of rack for cleaning that is used for semiconductor element, it is characterized in that: comprise base plate, upper bracket, plural bearing and following block, the base plate middle part has opening, described upper bracket is the troffer of front opening, parallel two tilting both sides that are separately fixed at base plate and upper bracket with its both sides of upper bracket, plural block down is separately fixed on the base plate and is positioned at the front portion of each bearing, and is the slot that cleaning disc is installed between following block and the bearing.
The utility model is connected the both sides of base plate and upper bracket by plural bearing, to form frame structure, simple in structure, be fixed with down block on the base plate, make and form the slot that cleaning disc is installed between each bearing and the following block, because it is skewed slot that the slot of cleaning disc is installed, cleaning disc is inserted in the slot, spacing by bearing and following block respectively, easy to loading and unloading quick, when especially using deionized water rinsing, because cleaning disc is and is obliquely installed, the heavy metal ion that is positioned at the cleaning disc bottom can be washed out with deionization, and can guarantee the semiconductor diode cleaning performance.The utility model adopts plural bearing, once the flushing of the semiconductor diode in the plural cleaning disc can be able to be improved flush efficiency.
Description of drawings
Below in conjunction with accompanying drawing embodiment of the present utility model is further described description.
Fig. 1 is a structural representation of the present utility model.
Fig. 2 is the side-looking structural representation of Fig. 1.
Wherein: block under the 1-, 2-base plate, 3-bearing, 4-slot, 5-upper bracket, 6-cleaning disc.
Embodiment
See Fig. 1, shown in 2, the utility model is used for the rack for cleaning of semiconductor element, comprise base plate 2, upper bracket 5, plural bearing 3 and following block 1, base plate 2 middle parts have opening, upper bracket 5 is the troffer of front opening, parallel two tilting both sides that are separately fixed at base plate 2 and upper bracket 5 with upper bracket 3 its both sides, plural block 1 down is separately fixed on the base plate 2 and is positioned at the front portion of each bearing 3, it between following block 1 and the bearing 3 slot 4 that cleaning disc is installed, see shown in Figure 2, cleaning disc 6 can be inserted in this slot 4, the preceding bottom of cleaning disc 6 is by block 1 is spacing down, the rear side of cleaning disc 6 is then spacing by the prism of bearing 3, and is because cleaning disc is tilting, easy to loading and unloading quick, the heavy metal ion of cleaning disc 6 bottoms can be washed out with deionization, and can guarantee the semiconductor diode cleaning performance, and the utility model leans against respectively on bearing 3 and the following block 1 for making cleaning disc 6, and following block 1 is parallel with upper bracket 3.
Claims (2)
1. rack for cleaning that is used for semiconductor element, it is characterized in that: comprise base plate (2), upper bracket (5), plural bearing (3) and following block (1), base plate (2) middle part has opening, described upper bracket (5) is the troffer of front opening, parallel two tilting both sides that are separately fixed at base plate (2) and upper bracket (5) with its both sides of upper bracket (3), plural block (1) down is separately fixed at the front portion that each bearing (3) were gone up and be positioned to base plate (2), and block (1) is the slot (4) that cleaning disc is installed with bearing (3) down.
2. the rack for cleaning that is used for semiconductor element according to claim 1 is characterized in that: described block (1) is parallel with upper bracket (3) down.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201020142574XU CN201655761U (en) | 2010-03-26 | 2010-03-26 | Cleaning rack for semiconductor elements |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201020142574XU CN201655761U (en) | 2010-03-26 | 2010-03-26 | Cleaning rack for semiconductor elements |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN201655761U true CN201655761U (en) | 2010-11-24 |
Family
ID=43121005
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201020142574XU Expired - Fee Related CN201655761U (en) | 2010-03-26 | 2010-03-26 | Cleaning rack for semiconductor elements |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN201655761U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8815017B2 (en) | 2011-02-25 | 2014-08-26 | Fujitsu Limited | Method of manufacturing semiconductor device and method of cleaning semiconductor substrate |
| CN111908078A (en) * | 2020-08-18 | 2020-11-10 | 衡山兄弟金属制品有限公司 | Glass tube cleaning and transferring device |
-
2010
- 2010-03-26 CN CN201020142574XU patent/CN201655761U/en not_active Expired - Fee Related
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8815017B2 (en) | 2011-02-25 | 2014-08-26 | Fujitsu Limited | Method of manufacturing semiconductor device and method of cleaning semiconductor substrate |
| TWI484545B (en) * | 2011-02-25 | 2015-05-11 | Fujitsu Ltd | Method of manufacturing semiconductor device and method of cleaning semiconductor substrate |
| CN111908078A (en) * | 2020-08-18 | 2020-11-10 | 衡山兄弟金属制品有限公司 | Glass tube cleaning and transferring device |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C17 | Cessation of patent right | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20101124 Termination date: 20130326 |