CN201545909U - Continuous pulse laser filming device - Google Patents
Continuous pulse laser filming device Download PDFInfo
- Publication number
- CN201545909U CN201545909U CN2009202461153U CN200920246115U CN201545909U CN 201545909 U CN201545909 U CN 201545909U CN 2009202461153 U CN2009202461153 U CN 2009202461153U CN 200920246115 U CN200920246115 U CN 200920246115U CN 201545909 U CN201545909 U CN 201545909U
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Abstract
The utility model provides a continuous pulse laser coating device, comprising a vacuum coating chamber, a pump exhausting and vacuum measuring system, a gas path and an electric-controlled system, wherein each gas path of the gas path system is connected to the vacuum coating chamber, a plurality of target device for pulse laser coating is arranged in the vacuum coating chamber, target material capable of revolving and rotating are arranged on the target device, a baseband coiling system is arranged, the baseband coiling system comprises a band releasing chamber and a band tightening chamber are respectively arranged at two sides of the vacuum coating chamber, the band releasing chamber and the band tightening chamber are communicated with the vacuum coating chamber by pipes. The band between the band releasing chamber and the band tightening chamber runs through the pipe and the vacuum coating chamber, and a magnetron sputtering target is arranged in the pipe at one side of the vacuum coating chamber. The device has auxiliary magnetron sputtering coating function without destroying vacuum condition, thereby implementing discontinuously or continuously coating for single or multiple examples, especially implementing one or more coating process of pulse laser deposition and magnetron sputtering process for same example.
Description
Technical field
The utility model belongs to the electric mechanical technical field and relates in particular to a kind of consecutive pulses laser coating device.
Background technology
Pulsed laser deposition is a kind of physical vacuum coating technology.One of most important advantage of pulsed laser deposition technique can keep target consistent with thin film composition exactly, helps the plated film of polycompound film.Polycomponent superconducting thin film, oxide ferroelectric, piezoelectricity, thermoelectricity, semi-conductor, thin-film material such as superhard, ferromagnetic have been widely used at present.Owing to need the process environments of vacuum in coating process, the pulsed laser deposition device all is furnished with pumping system and relevant gas circuit control and detection system; Most film coating apparatus are furnished with heating system; The computer control of some equipment implementations to whole equipment also arranged.
Now general pulsed laser deposition device is all at static or small sample and design, can only realize pulsed laser deposition at small area, and can't carry out pulsed laser deposition for the long banding pattern sample in moving, more can not realize the Suresh Kumar plated film of same sample, this has just caused these plant factors low, efficient low problem concerning producing.Obviously, the simplification of existing pulsed laser deposition apparatus function, its scope of application is too limited to, and has not satisfied the application of pulsed laser deposition technique aspect mass-producing.
Summary of the invention
The purpose of this utility model provides a kind of consecutive pulses laser coating device, it can be under the condition of not destroying vacuum, in a cavity, assist and be furnished with the magnetron sputtering plating function, thereby can realize, interruption single or multiple or successive plated film, especially can finish one or more coating process in pulsed laser deposition and the magnetron sputtering membrane process continuously same sample to sample.
For achieving the above object, the utility model is taked following design:
A kind of consecutive pulses laser coating device, by vacuum film coating chamber, pump is taken out and the vacuum measurement system, gas circuit and electrical control system are formed, each gas circuit of described air-channel system inserts vacuum film coating chamber, indoor several pulse laser plated film target devices of having deployed to ensure effective monitoring and control of illegal activities of described vacuum plating, have on the described target device and can realize revolving round the sun and the target of rotation, dispose a base band reel system, this base band reel system includes free reel chamber and the take-up reel chamber that splits in the vacuum film coating chamber both sides, free reel chamber and take-up reel chamber communicate by pipeline with vacuum film coating chamber, and the tape transport between free reel chamber and take-up reel chamber passes through this pipeline and vacuum film coating chamber.In a side pipe road of vacuum film coating chamber, be furnished with magnetron sputtering target.
The pulse laser that the laser source of the utility model consecutive pulses laser coating device sends can be realized continuous sweep in the X and the Y direction of target surface, and it can be to realize by the rotation of the lens on the light path in X and Y direction.
Well heater is installed in vacuum film coating chamber.
Described magnetron sputtering target and sample distance are adjustable.
Described target is revolution and the adjustable target of rotational velocity.
Is furnished with the tension pick-up that is used to monitor and control long carry sample in that vacuum plating is indoor.
The utility model has the advantages that:
1, compare with general pulsed laser deposition device, the utility model promptly is suitable for static small sample, also is suitable for long banding pattern sample continuous coating in moving.
2. adopt large-area heating lamp that sample is heated, temperature rise rate is fast, the significant temp height, and heating-surface area is big, and is pollution-free, and mobile example is heated evenly.
3. the utility model has been settled magnetic control sputtering device at a wing passage, and (except sputtering target and the shielding power supply) realized an apparatus multifunction under the condition that does not increase any vacuum facility.According to the experiment demand, can be in the pulse laser plated film or forward and backward sample is carried out magnetron sputtering plating.Comparing with the vacuum coater of simple function has increased function, has reduced manufacturing cost.
4. the utility model is furnished with a plurality of pulse laser target position, can revolve round the sun and rotation; Pulse laser can be in the X and the Y direction continuous sweep of target surface, so very convenient long banding pattern sample continuous coating in moving.
Description of drawings
Fig. 1 is the utility model consecutive pulses laser coating device structural representation
Embodiment
As shown in Figure 1, the configurations of the utility model consecutive pulses laser coating device is same as existing film coating apparatus, take out and vacuum measurement system, gas circuit and electrical control system (can adopt the split housing to control respectively by vacuum film coating chamber, pump, it is automatically controlled in a whole housing also can to collect all, can realize by prior art, do not give unnecessary details herein) to form, each gas circuit of air-channel system inserts vacuum film coating chamber.And at the indoor pulse laser plated film target device of having deployed to ensure effective monitoring and control of illegal activities of vacuum plating.
The utility model consecutive pulses laser coating device is provided with an independent vacuum coating chamber 1, and the independent single chamber that it can be the horizontal double-deck water-cooled all steel structure of tubular also can be other shape.
The improvement of the utility model consecutive pulses laser coating device is: magnetic controlling target and sample distance are adjustable, and are furnished with viewing window.A plurality of pulse laser plated film target devices of in vacuum film coating chamber 1, having deployed to ensure effective monitoring and control of illegal activities, and the target on the target device is designed to revolve round the sun and the structure formation (prior art can realize, not give unnecessary details herein) of rotation.
Configuration one base band reel system in the consecutive pulses laser coating device, this base band reel system includes free reel chamber 6 and the take-up reel chamber 5 that splits in vacuum film coating chamber 1 both sides, free reel chamber and take-up reel chamber communicate by pipeline with vacuum film coating chamber, and the tape transport that spurs between free reel chamber and take-up reel chamber passes through this pipeline and vacuum film coating chamber.A fixed reel is arranged in the free reel chamber, and base band (sample) is wrapped on the fixed reel in advance, and fixed reel rotates the motor that is controlled by the outside, can adopt the walking of computer control base band, thereby make travelling speed and time accurately controlled.Bleed by the pipeline that pumping system and vacuum film coating chamber link to each other for band chamber (comprising free reel chamber and take-up reel chamber).
A magnetron sputtering target has been installed in the passage of vacuum film coating chamber 1 one sides, can realize the magnetron sputtering plating of sample, this magnetron sputtering target has power control switch, promptly manual, also can utilize computer technology to realize control automatically, as noted earlier, can implement independent control by the control corresponding cabinet, also can develop and be integral machine control.
The utility model consecutive pulses laser coating device also is furnished with frame platform 7, and vacuum film coating chamber, base band reel system are fixed thereon, and pumping system (including molecular pump 2, mechanical pump 3 etc.) is settled within it; The both sides of frame are useful on the active fixedly ramuscule pallet of free reel chamber 6, take-up reel chamber 5.
Indoor sample baffle plate, the well heater baffle plate of also being equipped with of described vacuum plating also is equipped with the magnetron sputtering target baffle plate in addition.Can open according to the needs time spent of plated film, the time spent does not cover sample.
Described gas circuit and Controlling System adopt single gas circuit or two above gas circuits are straight-through or feed vacuum film coating chamber through mass flowmeter.
Establishing one at the side of vacuum film coating chamber is used for the side that bypass bleeds and takes out valve 10.On opening the door, the front of vacuum film coating chamber can be placed with several (in the present embodiment two) sealing-in viewing windows 9, leaded flange in vacuum film coating chamber back and stopping valve, and valve is taken out on a side.Also can leave easily detachable interface and be equipped with corresponding blind plate, be used to connect other facility.
Viewing window also all can be offered in front in free reel chamber 6, take-up reel chamber 5.
Vacuum plating is indoor also can be furnished with tension pick-up, is used to monitor and control the tension force of long carry sample.Tension control can be can't harm to the sample that moves continuously, and the two-way translational speed of long carry sample can be accurately controlled.
The revolution of above-mentioned target and rotational velocity, tension pick-up and the two-way mobile motor of the long carry sample of drive all can be realized control by being equipped with computer system, the high-quality plated film of finishing of assurance total system.
The various embodiments described above can not break away under the scope of the present utility model in addition some variations, thus above explanation comprises and accompanying drawing shown in structure should be considered as exemplary, but not in order to limit patent protection scope of the present utility model.
The utility model is used in the long plating multilayer film of being with, and can also be used for short sample, static sample plating multilayer film.Its working process is (is example with long carry sample): the base band that will desire plated film twines on the fixed reel that is placed on free reel chamber, vacuumizes; When waiting to reach required vacuum tightness, open and add thermal control; Logical desired gas; Revolution is required target position extremely, and makes the target rotation, and starter motor begins tape transport, and opens control and laser source.If need the while or forward and backward, at the power control switch (according to predefined order sequencing) of corresponding period unlatching magnetron sputtering target, so that the magnetic controlling target sputter coating of being correlated with in laser coating.At walking states, film uniformity can reach 5%.
Claims (5)
1. consecutive pulses laser coating device, by vacuum film coating chamber, pump is taken out and the vacuum measurement system, gas circuit and electrical control system are formed, each gas circuit of described air-channel system inserts vacuum film coating chamber, at indoor several pulse laser plated film targets of having deployed to ensure effective monitoring and control of illegal activities of vacuum plating, it is characterized in that: described target can revolve round the sun and rotation, dispose a base band reel system, this base band reel system includes free reel chamber and the take-up reel chamber that splits in the vacuum film coating chamber both sides, free reel chamber and take-up reel chamber communicate by pipeline with vacuum film coating chamber, tape transport between free reel chamber and take-up reel chamber passes through this pipeline and vacuum film coating chamber, is furnished with magnetron sputtering target in a side pipe road of vacuum film coating chamber.
2. consecutive pulses laser coating device according to claim 1 is characterized in that: well heater is installed in vacuum film coating chamber.
3. consecutive pulses laser coating device according to claim 1 is characterized in that: described magnetron sputtering target and sample distance are adjustable.
4. consecutive pulses laser coating device according to claim 1 is characterized in that: described target is revolution and the adjustable target of rotational velocity.
5. consecutive pulses laser coating device according to claim 1 is characterized in that: be furnished with the tension pick-up that is used to monitor and control long carry sample in that vacuum plating is indoor.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2009202461153U CN201545909U (en) | 2009-09-30 | 2009-09-30 | Continuous pulse laser filming device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2009202461153U CN201545909U (en) | 2009-09-30 | 2009-09-30 | Continuous pulse laser filming device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN201545909U true CN201545909U (en) | 2010-08-11 |
Family
ID=42601078
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2009202461153U Expired - Lifetime CN201545909U (en) | 2009-09-30 | 2009-09-30 | Continuous pulse laser filming device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN201545909U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108220888A (en) * | 2017-12-27 | 2018-06-29 | 上海超导科技股份有限公司 | Heating unit and its pulse laser coating apparatus suitable for pulse laser plated film |
-
2009
- 2009-09-30 CN CN2009202461153U patent/CN201545909U/en not_active Expired - Lifetime
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108220888A (en) * | 2017-12-27 | 2018-06-29 | 上海超导科技股份有限公司 | Heating unit and its pulse laser coating apparatus suitable for pulse laser plated film |
| CN108220888B (en) * | 2017-12-27 | 2019-12-27 | 上海超导科技股份有限公司 | Heating device suitable for pulse laser coating and pulse laser coating device thereof |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20190708 Address after: 101407 No. 11 Xingke East Street, Yanqi Economic Development Zone, Huairou District, Beijing Patentee after: Research Institute of engineering and Technology Co., Ltd. Address before: 100088, 2, Xinjie street, Beijing Patentee before: General Research Institute for Nonferrous Metals |
|
| TR01 | Transfer of patent right | ||
| CX01 | Expiry of patent term |
Granted publication date: 20100811 |
|
| CX01 | Expiry of patent term |