CN201488540U - Diffusion furnace with partition treatment device - Google Patents

Diffusion furnace with partition treatment device Download PDF

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Publication number
CN201488540U
CN201488540U CN2009202041602U CN200920204160U CN201488540U CN 201488540 U CN201488540 U CN 201488540U CN 2009202041602 U CN2009202041602 U CN 2009202041602U CN 200920204160 U CN200920204160 U CN 200920204160U CN 201488540 U CN201488540 U CN 201488540U
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CN
China
Prior art keywords
furnace
operating room
air knife
diffusion furnace
heating furnace
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
CN2009202041602U
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Chinese (zh)
Inventor
伍波
张勇
李果山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shenzhen S. C New Energy Equipment Co., Ltd.
Original Assignee
SHENZHEN JIEJIACHUANG MICROELECTRONIC EQUIPMENT CO Ltd
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Priority to CN2009202041602U priority Critical patent/CN201488540U/en
Application granted granted Critical
Publication of CN201488540U publication Critical patent/CN201488540U/en
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    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

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Abstract

The utility model discloses a diffusion furnace with a partition treatment device. The diffusion furnace comprises a heating furnace and an operating room, wherein the heating furnace is provided with a furnace chamber and has the mouth thereof facing toward the direction of the operating room, and a quartz boat capable of sliding inside and outside along the direction of the furnace chamber is arranged inside the heating furnace; and a partition plate with a round opening arranged at the middle part thereof is arranged inside the operating room in the position close to the mouth of the furnace, and an annular air knife is embedded on the inner side of the opening. The diffusion furnace can effectively partition the heating furnace from the operating room through an air curtain formed by the annular air knife, so as to avoid or reduce the amount of dust particles and impurities diffusing into silicon wafers at a high temperature, which cause influence on the quality of PN junction. During unloading, the diffusion furnace can purge the residual gas on the silicon wafer and partition the furnace and the operating room, so as to prevent the residual gas from entering the sealed operating room to generate corrosion, pollution and contamination to operators.

Description

The diffusion furnace of band isolation processing device
Technical field
The utility model relates to a kind of diffusion furnace, relates in particular to a kind of diffusion furnace with the isolation processing device.
Background technology
Diffusion furnace is a kind of semiconductor manufacturing equipment, is mainly used in doping process, and in crystal silicon solar energy battery was produced, diffusion furnace was unique implantation equipment, is in the manufacturing process generation of PN junction, the raising of conversion efficiency to be played conclusive key equipment especially.Diffusion furnace is made up of heating furnace, operating room and source of the gas usually; Heating furnace has furnace chamber, and its fire door is towards the operating room direction; In heating furnace, also be provided with the quartz boat that is used to place silicon chip.In the existing diffusion furnace, have the following disadvantages:
1, existing diffusion furnace is when loading silicon chip, and some grits in the operating room operating space can enter into cleaner High temperature diffusion zone in the heating stove furnace chamber, and these grits and impurity influence device quality thereby can be diffused in the silicon chip.In silicon solar cell, this is one of problem that will solve especially.
2, existing diffusion furnace is understood the residual waste gas that diffusion technique gas, generation are arranged etc. on the quartz boat of silicon chip and carrying silicon chip when the unloading silicon chip.Especially the diffusion technique of crystal silicon solar energy battery, because dopant dose is big, residual gas and the waste gas just diffusion technique than general are many, these residual gas (P 2O 5) and waste gas (Cl 2).If run into the lower cold air of temperature, water wherein will with P 2O 5In conjunction with generating metaphosphoric acid and Cl 2In conjunction with generating hydrochloric acid.Metaphosphoric acid is a kind of flint glass shape body, is poisonous substance, and respiratory tract is had stimulation, and eye contacts or causes and burns, and causes permanent lesion, and the skin contact can cause third-degree burn.Hydrochloric acid is a kind of corrosive gas, and is harmful equally to human body.Glass metaphosphoric acid, influential to the technology of back.The also easy deliquescence of metaphosphoric acid becomes phosphoric acid, and phosphoric acid and hydrochloric acid produce corrosion to equipment, instrument, factory building facility.
3, present diffusion furnace generally is contained in the clean room.Clean room is a hermetically-sealed construction, and these phosphoric acid and hydrochloric acid will destroy purification facility for a long time, thereby damages facility, harm operating personnel.
Summary of the invention
Grit and residue easily spread between heating furnace and operating room the utility model in the existing diffusion furnace in order to solve, and easily influence the processing quality of device and damage equipment, personnel's defective, and a kind of diffusion furnace with the isolation processing device is provided; By the space isolation of annular air knife with heating furnace and operating room is set, effectively reduce the diffusion of grit and residue.
For solving the problems of the technologies described above, the utility model adopts following technical scheme: a kind of diffusion furnace with the isolation processing device, include heating furnace and operating room, and heating furnace has furnace chamber, its fire door is towards the operating room direction, also is provided with the quartz boat that can slide inside and outside the furnace chamber direction in heating furnace; Be provided with the dividing plate of a middle part band circular open in the described operating room near the fire door place, the opening inboard is embedded with an annular air knife.
Described annular air knife is one to connect the annular body of air supply plant, is provided with a circle spilehole in the body inboard; The annular air knife fits snugly on the dividing plate madial wall; The size of described annular air knife and dividing plate upper shed is equal to or greater than the fire door size.
Space between described dividing plate and the fire door is an exhaust chamber, is provided with air extractor in exhaust chamber.
Described exhaust chamber avris is provided with a column air knife.
Described column air knife is body always, has the spilehole of a row towards the exhaust chamber inboard at the body sidepiece; The sealing of body upper end, the lower end is connected with corresponding air supply plant.
The utility model is by being provided with annular air knife between heating furnace and operating room, the air curtain that the annular air knife forms effectively will be kept apart between heating furnace and operating room, so just can avoid or reduce some grits and impurity is diffused in the silicon chip when high temperature, cause influence the PN junction quality; And when unloading can be able to purge the residual gas on the silicon chip, isolated in the stove and operation room, can avoid residual gas to enter into the operation room of sealing, produces that burn into pollutes and to personnel's pollution.
Description of drawings
Below in conjunction with drawings and Examples the utility model is described further:
Fig. 1 is the utility model sectional structure schematic diagram.
The specific embodiment
A kind of as shown in Figure 1 diffusion furnace with the isolation processing device, include heating furnace 1 and operating room 8, heating furnace 1 has furnace chamber, its fire door 2 is towards operating room 8 directions, also be provided with the quartz boat 3 that can slide inside and outside the furnace chamber direction in heating furnace 1, quartz boat 3 is mounted with relevant drive system and control software.Be provided with the dividing plate 9 of a middle part band circular open in the described operating room 8 near fire door 2 places, the opening inboard is embedded with an annular air knife 11; The size of described annular air knife 11 and dividing plate 9 upper sheds is equal to or greater than fire door 2 sizes, can pass through when quartz boat 3 carries silicon chip 4 with assurance.Space between dividing plate 9 and the fire door 2 is an exhaust chamber 7, is provided with air extractor at exhaust chamber 7 avris.Described annular air knife 11 is one to connect the annular body of air supply plant, is provided with a circle spilehole 10 in the body inboard; Annular air knife 11 fits snugly on dividing plate 9 madial walls.Also be provided with a column air knife 5 in the described exhaust chamber 7; Described column air knife 5 is body always, has the spilehole 6 of a row towards exhaust chamber 7 inboards at the body sidepiece, and it is parallel with fire door 2 that spilehole 6 forms the direction of air curtains; The sealing of body upper end, the lower end is connected with corresponding air supply plant.Column air knife 5 play a part to blow off residue and dust on the silicon chip 4, and the effect of annular air knife 11 focuses on insulating space.The air extractor effect is the waste gas of taking out in the exhaust chamber 7 in the aforementioned exhaust chamber 7, and the gas that annular air knife 11 and column air knife 5 blow out is directly proportional with the gas of being taken out.
Described annular air knife and column air knife also can be the air knives of existing other structure type, and corresponding air supply plant and air extractor are with reference to prior art.The nitrogen source of the gas that air supply plant also comprises.
With reference to Fig. 1, annular air knife 11 is a body high temperature resistant, corrosion-resistant material, is connected with the clean N of certain pressure in body 2The time, will enclose spilehole 10 to central-injection along this, form a complete air curtain, operating room 8 and furnace chamber are kept apart.Column air knife 5 principles are identical.When quartz boat 3 carries silicon chip 4 when loading the drive system band and the aperture position of dividing plate 9 into, control software can be controlled actuating speed, makes it to slow down to some extent near opening, thereby makes it slowly pass air curtain.Can purge the grit on the silicon chip 4 on the one hand, can isolate two spaces on the one hand, make the grit of operating room 8 not advance furnace chamber.When quartz boat 3 carries silicon chip 4 when loading the drive system band and out the fire door cabinet, control software can be controlled actuating speed, makes it to slow down to some extent near fire door cabinet mouth, thereby makes it slowly pass air curtain.Can purge the residual gas on the silicon chip on the one hand, can isolate two spaces on the one hand, make the residual gas P in the stove 2O 5) and waste gas (Cl 2) do not go out in the stove.
Disclosed technology of the utility model and device, to the lifting means technical performance, protection production line operation room is not contaminated, and the protection operating personnel preserve from and play an important role.

Claims (5)

1. diffusion furnace with the isolation processing device, include heating furnace (1) and operating room (8), heating furnace (1) has furnace chamber, its fire door (2) is towards operating room (8) direction, in heating furnace (1), also be provided with quartz boat (3), it is characterized in that: locate to be provided with the dividing plate (9) of a middle part band circular open in the described operating room (8) near fire door (2), the opening inboard is embedded with an annular air knife (11).
2. the diffusion furnace of band isolation processing device according to claim 1 is characterized in that: described annular air knife (11) is one to connect the annular body of air supply plant, is provided with a circle spilehole (10) in the body inboard; Annular air knife (11) fits snugly on dividing plate (9) madial wall; The size of described annular air knife (11) and dividing plate (9) upper shed is equal to or greater than fire door (2) size.
3. the diffusion furnace of band isolation processing device according to claim 1 and 2 is characterized in that: the space between described dividing plate (9) and the fire door (2) is exhaust chamber (7), is provided with air extractor in exhaust chamber (7).
4. the diffusion furnace of band isolation processing device according to claim 3 is characterized in that: described exhaust chamber (7) avris is provided with a column air knife (5).
5. the diffusion furnace of band isolation processing device according to claim 4 is characterized in that: described column air knife (5) is body always, has a row towards the inboard spilehole (6) of exhaust chamber (7) at the body sidepiece; The sealing of body upper end, the lower end is connected with corresponding air supply plant.
CN2009202041602U 2009-08-28 2009-08-28 Diffusion furnace with partition treatment device Expired - Lifetime CN201488540U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN2009202041602U CN201488540U (en) 2009-08-28 2009-08-28 Diffusion furnace with partition treatment device

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Application Number Priority Date Filing Date Title
CN2009202041602U CN201488540U (en) 2009-08-28 2009-08-28 Diffusion furnace with partition treatment device

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CN201488540U true CN201488540U (en) 2010-05-26

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103088428A (en) * 2013-01-17 2013-05-08 陈功 Exhaust pipe buffer tank of phosphorus diffusion furnace
CN103147131A (en) * 2013-03-06 2013-06-12 上海大学 Multilayer gas curtain isolation device for continuous-type diffusion furnace
CN106746527A (en) * 2016-12-20 2017-05-31 广东省智能机器人研究院 A kind of hot-bending machine

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103088428A (en) * 2013-01-17 2013-05-08 陈功 Exhaust pipe buffer tank of phosphorus diffusion furnace
CN103147131A (en) * 2013-03-06 2013-06-12 上海大学 Multilayer gas curtain isolation device for continuous-type diffusion furnace
CN106746527A (en) * 2016-12-20 2017-05-31 广东省智能机器人研究院 A kind of hot-bending machine

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Date Code Title Description
C14 Grant of patent or utility model
GR01 Patent grant
C56 Change in the name or address of the patentee

Owner name: SHENZHEN S.C NEW ENERGY TECHNOLOGY CORPORATION

Free format text: FORMER NAME: SHENZHEN JIEJIA WEICHUANG MICROELECTRONICS EQUIPMENT CO., LTD.

CP03 Change of name, title or address

Address after: 518000, Guangdong, Shenzhen province Baoan District manhole Street oyster four Lin slope pit Industrial Zone A4 and No. A6 workshop

Patentee after: Shenzhen S. C New Energy Equipment Co., Ltd.

Address before: 518103 A4 building, oyster four woods slope pit Industrial Zone, Baoan District, Guangdong, Shenzhen

Patentee before: Shenzhen Jiejiachuang Microelectronic Equipment Co., Ltd.

CX01 Expiry of patent term
CX01 Expiry of patent term

Granted publication date: 20100526