CN103088428A - Exhaust pipe buffer tank of phosphorus diffusion furnace - Google Patents
Exhaust pipe buffer tank of phosphorus diffusion furnace Download PDFInfo
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- CN103088428A CN103088428A CN2013100182306A CN201310018230A CN103088428A CN 103088428 A CN103088428 A CN 103088428A CN 2013100182306 A CN2013100182306 A CN 2013100182306A CN 201310018230 A CN201310018230 A CN 201310018230A CN 103088428 A CN103088428 A CN 103088428A
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- buffer tank
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Abstract
The invention discloses an exhaust pipe buffer tank of a phosphorus diffusion furnace. The exhaust pipe buffer tank comprises a square buffer tank body, wherein a furnace pipe opening is formed in the rear side wall of the buffer tank body; a furnace pipe of the phosphorus diffusion furnace extends into a buffer tank through the furnace pipe opening; a furnace cap is arranged on the furnace pipe mouth part; the furnace cap comprises a cylindrical quartz cap body with a sealed bottom; an outward-protruding opening extension mouth is arranged at the bottom of the cap body; a quartz clamp ring is welded on the inner wall of the bottom of the cap body; the opening extension mouth is arranged between the bottom surface of the clamp ring and the bottom wall of the cap body; the front side of the buffer tank body is open, and a sealing door is arranged; a locking structure is arranged between the left side of the sealing door and the buffer tank body; a guide structure is arranged on the sealing door; and an exhaust pipe opening is formed in the right side wall of the buffer tank body. According to the invention, a guide structure is arranged on the sealing door of the buffer tank to guide air in, and thus the tail gas discharged by the furnace pipe can be cooled and dispersed by natural air; and the furnace cap can guide phosphorus oxychloride gas to prevent the buffer tank from dispersing the harmful gas phosphorus oxychloride to air.
Description
Technical field
The present invention relates to the manufacturing field of semi-conductor discrete device and solar battery sheet.
Background technology
Phosphorous diffusion is that semi-conductor discrete device, integrated circuit (IC) chip are made the necessary technique of PN junction with solar battery sheet, and the technology that adopts of this road technique is thermal diffusion technology at present.Semi-conductor discrete device is mainly for the manufacture of diode, triode, power device, IGBT and thyristor etc., and these series product have the sales volume of over ten billion at home, and production capacity is very huge.As the purposes of solar battery sheet, silicon chip uses also very extensive on the other hand, and the solar battery sheet of the whole world 70% or more is the use silicon chip as cell piece.Realized the production capacity of 25GW in 2011, it is 6 times of semi-conductor consumption that the polycrystalline consumption reaches 180,000 tons, so the output of sun power is larger than semi-conductor output.Domesticly can produce approximately family more than 120 of silicon chip of solar cell producer, and the producer that can produce the semi-conductor discrete device diffusion sheet also reaches tens.Diffusion furnace each producer that is used for phosphorous diffusion has tens to up to a hundred substantially, and market demand is very large.
The phosphorus diffusing technique of technology maturation mainly contains three kinds in the market: 1, adopt the source diffusion of liquid phosphorus oxychloride; 2, chain type diffusion after employing spraying phosphate aqueous solution; 3, chain type diffusion after the folder layer of employing phosphorus source.It is higher that the method for these three kinds of phosphorous diffusions has production efficiency with the method for liquid phosphorus source diffusion, obtains the surperficial advantage such as good of even, the smooth and diffusion layer of PN junction, therefore uses widest in arealy, and manufacturer generally adopts the method to produce in enormous quantities.The structure iron of phosphorus diffusion method as shown in Figure 1,
The chemical equation of phosphorous diffusion is as follows:
The P that generates
2O
5With pasc reaction, generate silicon-dioxide (SiO under diffusion temperature
2) and phosphorus atom, its reaction formula is as follows:
2P
2O
5+5Si＝5SiO
2+4P↓
Can fully react for phosphorus oxychloride and be filled with a certain proportion of oxygen when must pass into nitrogen in silica tube, phosphorus oxychloride could fully be reacted with silicon, forms at silicon face that one deck phosphorus---silex glass, phosphorus is to the silicon internal diffusion.
The gas that carries phosphorus oxychloride can not be fully after by the diffusion furnace tube of high temperature and pasc reaction, and quite a few unreacted phosphorus oxychloride gas is discharged from boiler tube.And phosphorus oxychloride has following chemistry, physical properties: achromaticity and clarification liquid.Irritant smell.Strongly be fuming.Water absorbability is arranged.Meet water and
EthanolDecompose heating.Relative density (d25) 1.645.
Fusing point1.25 ℃.
Boiling point105.8 ℃.Medium poison, medium lethal dose (rat, per os) 380mg/kg.Tearing property and corrodibility are arranged.Therefore unreacted phosphorus oxychloride can not be let alone to be diffused in air, these residual phosphorus oxychlorides need to be taken away, otherwise operator be endangered huge.Existing diffusion furnace has generally all been installed suction opening in the silica tube exit phosphorus oxychloride has been detached.These extractor fans generally adopt stainless steel or iron sheet to make, but the corrosive nature of phosphorus oxychloride is very strong, and general half a year will be with these induced exhaust corrosion thoroughly to one-year age, and phosphorus oxychloride will leak the operator is produced very large harm.
In the induced exhaust corrosion process, the corrosion speed that the high temperature of the gas that carries phosphorus oxychloride that diffusion furnace tube is discharged has aggravated induced exhaust greatly.
Summary of the invention
Technical problem to be solved by this invention just is to provide a kind of phosphorous diffusion stove induced exhaust baffle-box, reduce the temperature of the gas that carries phosphorus oxychloride of diffusion furnace tube discharge, diffusing capacity in the air of the work-ing life of prolongation induced exhaust, minimizing phosphorus oxychloride obnoxious flavour prevents from the person is produced injury.
for solving the problems of the technologies described above, the present invention adopts following technical scheme: a kind of phosphorous diffusion stove induced exhaust baffle-box, it is characterized in that: comprise square buffering casing, described buffering casing rear wall is provided with the boiler tube opening, the boiler tube of phosphorous diffusion stove stretches into described baffle-box by described boiler tube opening, the boiler tube oral area is provided with furnace crown, described furnace crown comprises the quartzy material cap of the round shape body of closed bottom, described cap body bottom is provided with an outwardly opening Yan Zui, described cap body bottom interior wall is welded with a quartzy snap ring, described opening Yan Zui is arranged between snap ring bottom surface and cap body diapire, described buffering casing front side is uncovered and be provided with hermatic door, described hermatic door right side is hinged with the buffering casing, be provided with lock structure between described hermatic door left side and buffering casing, described hermatic door is provided with flow-guiding structure, described buffering casing right side wall is provided with the induced exhaust opening.
As preferably, described hermatic door upper edge, lower edge and the right seal along being provided with sealed strip.
As preferably, described flow-guiding structure is the diversion trench at edge, hermatic door left side.
As preferably, described lock structure comprises that the hook installed in the middle of diversion trench and limit, buffering casing left side are to linking up with buckling of setting.
As preferably, described baffle-box is 312 stainless steel structure, and described baffle-box inwall is coated with teflon coatings.
As preferably, described cap body bottom outer wall is welded with a quartzy handle.
As preferably, described opening prolongs mouth length and is controlled at 3-5cm, and opening prolongs the mouth internal diameter and is controlled at 0.5-1cm.
As preferably, described snap ring thickness equals cap body bottom wall thickness.
The present invention connects a baffle-box at the blast inlet end of induced exhaust, and the baffle-box hermatic door is provided with flow-guiding structure guiding air and enters, thereby, can utilize the tail gas of getting rid of in the cooling diffusion furnace tube of natural air, prevent from melting the teflon coatings of induced exhaust.Thereby reduced the corrosion speed of exhausting system, avoided the leakage of phosphorus oxychloride of gasification and the generation of intoxication accident.
and furnace crown is socketed on the boiler tube opening, furnace crown adopts quartzy material, thermostability is high, the opening Yan Zui of quartzy furnace crown bottom sides is used for the phosphorus oxychloride gas of the boiler tube discharge of release phosphorous diffusion stove over against the induced exhaust blast inlet, prevent from the buffering casing to outward leakage phosphorus oxychloride gas, cap body bottom interior wall is welded with a quartzy snap ring, snap ring just leaves the width of opening Yan Zui apart from the bottom, boiler tube oral area apical grafting is unlikely to block opening Yan Zui on snap ring, handle at furnace crown bottom welding quartz has facilitated operation, thereby furnace crown can guide phosphorus oxychloride gas, prevent that baffle-box from spreading the phosphorus oxychloride obnoxious flavour in air.
Description of drawings
The invention will be further described below in conjunction with the drawings and specific embodiments:
Fig. 1 is the structural representation of phosphorus diffusion method in prior art;
Fig. 2 is the overall structure schematic diagram of the phosphorus oxychloride remover of phosphorous diffusion stove;
Fig. 3 is the furnace crown structural representation;
Fig. 4 is the furnace crown bottom schematic view;
Fig. 5 is the baffle-box structural representation;
Fig. 6 is the sealing radiator structural representation;
Fig. 7 is the cooling tank structural representation.
Embodiment
As shown in Figure 2, be the overall structure of the phosphorus oxychloride remover of the phosphorous diffusion stove of using baffle-box 2 of the present invention, it comprises baffle-box 2, induced exhaust 3 and sealing radiator 4, has also comprised simultaneously a cooling tank 5 shown in Figure 7.
As shown in Figure 3 and Figure 4, be phosphorous diffusion stove boiler tube furnace crown 1, it comprises the quartzy material cap of the round shape body 10 of closed bottom, described cap body 10 bottoms are provided with an outwardly opening and prolong mouth 12, described cap body bottom interior wall is welded with a quartzy snap ring 13, and described opening Yan Zui is arranged between snap ring bottom surface and cap body diapire.Described cap body bottom outer wall is welded with a quartzy handle 11.Described opening prolongs mouth 12 length and is controlled at 3-5cm, and opening prolongs the mouth internal diameter and is controlled at 0.5-1cm.Described snap ring 13 thickness equal cap body 10 bottom wall thickness.
Furnace crown 1 adopts quartzy material, thermostability is high, the opening of quartzy furnace crown bottom sides prolongs the phosphorus oxychloride gas that mouth 12 is used for the boiler tube discharge of release phosphorous diffusion stove, cap body bottom interior wall is welded with a quartzy snap ring 13, snap ring just leaves the width of opening Yan Zui apart from the bottom, boiler tube oral area apical grafting is unlikely to block opening and prolongs mouth 12 on snap ring, facilitated operation at the handle of furnace crown 1 bottom welding quartz.
as shown in Figure 5, be phosphorous diffusion stove induced exhaust baffle-box 2, it comprises square buffering casing 20, described buffering casing rear wall is provided with the boiler tube opening, the boiler tube of phosphorous diffusion stove stretches into described baffle-box by described boiler tube opening, furnace crown 1 also is positioned at baffle-box 2 and is enclosed within on the boiler tube oral area, described buffering casing front side is uncovered and be provided with hermatic door 21, described hermatic door 21 right sides are hinged with buffering casing 20, be provided with lock structure between described hermatic door left side and buffering casing, described hermatic door is provided with flow-guiding structure, described buffering casing right side wall is provided with the induced exhaust opening.The blast inlet of induced exhaust 3 has just put in baffle-box by the induced exhaust opening.
Described hermatic door upper edge, lower edge and the right seal along being provided with sealed strip 22.Described flow-guiding structure is the diversion trench 24 at edge, hermatic door left side.On the left of described lock structure comprises the hook 23 of installing in the middle of diversion trench and cushions casing, the limit is to linking up with buckling of setting, and described baffle-box inwall is coated with teflon coatings.
Baffle-box 2 materials are used 312 stainless steels, the size of baffle-box 2 changes according to boiler tube and diffusion furnace size, induced exhaust 3 begins the inner teflon coatings that adopts of induced exhaust 3 with the operation buffer joining place, the Teflon coating thickness is 0.2-10mm, the high temperature that teflon coatings can the highest anti-260 ℃.Three of hermatic door 21 adopt D type sealing materials to seal, and diversion trench 24 places on hermatic door do not add sealed strip 22 and are beneficial to air and enter.
Phosphorous diffusion stove induced exhaust 3 as shown in Figure 2, this induced exhaust is the U-shaped pipe, induced exhaust one end arranges the vertical blast inlet of opening direction and induced exhaust left side pipeline, the induced exhaust the other end is provided with the air outlet higher than blast inlet, this air outlet opening upwards also connects vacuum fan, and described vacuum fan is flow-mixing blower fan.The left side pipeline roof of described induced exhaust is provided with the ammonia spray nozzle 32 of spray ammoniacal liquor, can realize vaporific spray in induced exhaust.
Described induced exhaust 3 comprises that cross section is square pipeline body 30, is provided with a vertical central dividing plate 31 in described pipeline body induced exhaust is separated into the U-shaped structure.Described induced exhaust bottom opening also is provided with throat structure 33, and described central dividing plate 31 bottoms only arrive throat structure 33 places, and the throat structure bottom of described induced exhaust is provided with extension board 34, and described throat structure outer wall is provided with barb.
U-shaped induced exhaust 3 is from baffle-box 2 combining sites, the inner Teflons that all adopt spray, and coating thickness is 0.2-10mm, and the Teflon spraying is not carried out in the induced exhaust outside, induced exhaust bottom opening constriction is carried out the Teflon spraying, and the U-shaped induced exhaust is installed on the side of diffusion furnace.
Phosphorous diffusion stove induced exhaust sealing radiator 4 as shown in Figure 6, it comprises the quad seal casing 40 that the top is uncovered, the dehisce structure 41 of uncovered position, seal case top for opening laterally, the described inner structural wall of dehiscing is installed a circle sealing-ring 44, the outside, uncovered upper edge, top is equipped with clip 45, the seal case bottom sides is provided with water-in 42, and seal case is provided with Overflow drainage mouth 43 over against the side of water-in above water-in.Described sealing radiator is stainless steel structure, and the sealing radiator inwall is provided with teflon coatings.The coating thickness of described teflon coatings is 0.2-10mm.
Wherein, the clip 45 of seal case 40 tops of sealing radiator 4 fastens with described barb, and described sealing-ring 44 forms sealing with described throat structure 33 outer walls.
The extension board 34 of throat structure 33 bottoms of described induced exhaust 3 stretches into below the liquid level of sealing radiator 4, and specifically the length of this extension board 34 is the 5cm left and right.The height of described Overflow drainage mouth 43 is lower than central dividing plate 31 bottoms of U-shaped induced exhaust 3, higher than extension board 34 bottoms of U-shaped induced exhaust 3.
Described sealing radiator 4 water-ins are connected with cooling tank 5 by pipeline, and described Overflow drainage mouth 43 connects Waste Water Treatment by pipeline.
the present invention utilizes the natural wind of baffle-box collection to carry out the waste gas that contains phosphorus oxychloride that rapid cooling diffusion furnace is got rid of, utilize simultaneously water conservancy diversion hermatic door and band having directional exhaust mouth to get furnace crown and prevent that the gaseous state phosphorus oxychloride from revealing and orientation is taken away, utilize in the ammoniacal liquor sprinkling and the phosphorus oxychloride of gaseous state, utilize in the cooling sodium hydrogen carbonate solution that flows and liquid phosphorus oxychloride and innoxious wastewater treatment, utilize the high temperature resistant and erosion resistance of Teflon to prevent the corrosion of air draft pipe, reduced the disclosure risk of phosphorus oxychloride, reduce operator's injury accident, significantly promote the work-ing life of air draft pipe, simultaneously phosphorus oxychloride is carried out harmless treatment, has environment protecting.
Claims (8)
1. phosphorous diffusion stove induced exhaust baffle-box, it is characterized in that: comprise square buffering casing, described buffering casing rear wall is provided with the boiler tube opening, the boiler tube of phosphorous diffusion stove stretches into described baffle-box by described boiler tube opening, the boiler tube oral area is provided with furnace crown, described furnace crown comprises the quartzy material cap of the round shape body of closed bottom, described cap body bottom is provided with an outwardly opening Yan Zui, described cap body bottom interior wall is welded with a quartzy snap ring, described opening Yan Zui is arranged between snap ring bottom surface and cap body diapire, described buffering casing front side is uncovered and be provided with hermatic door, described hermatic door right side is hinged with the buffering casing, be provided with lock structure between described hermatic door left side and buffering casing, described hermatic door is provided with flow-guiding structure, described buffering casing right side wall is provided with the induced exhaust opening.
2. phosphorous diffusion stove induced exhaust baffle-box according to claim 1 is characterized in that: described hermatic door upper edge, lower edge and the right seal along being provided with sealed strip.
3. phosphorous diffusion stove induced exhaust baffle-box according to claim 2 is characterized in that: described flow-guiding structure is the diversion trench at edge, hermatic door left side.
4. phosphorous diffusion stove induced exhaust baffle-box according to claim 3 is characterized in that: described lock structure comprises that the hook installed in the middle of diversion trench and limit, buffering casing left side are to linking up with buckling of setting.
5. phosphorous diffusion stove induced exhaust baffle-box according to claim 4, it is characterized in that: described baffle-box is 312 stainless steel structure, described baffle-box inwall is coated with teflon coatings.
6. phosphorous diffusion stove induced exhaust baffle-box according to claim 1, it is characterized in that: described cap body bottom outer wall is welded with a quartzy handle.
7. phosphorous diffusion stove induced exhaust baffle-box according to claim 6, it is characterized in that: described opening prolongs mouth length and is controlled at 3-5cm, and opening prolongs the mouth internal diameter and is controlled at 0.5-1cm.
8. phosphorous diffusion stove induced exhaust baffle-box according to claim 7 is characterized in that: described snap ring thickness equals cap body bottom wall thickness.
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| CN2013100182306A CN103088428A (en) | 2013-01-17 | 2013-01-17 | Exhaust pipe buffer tank of phosphorus diffusion furnace |
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| CN2013100182306A CN103088428A (en) | 2013-01-17 | 2013-01-17 | Exhaust pipe buffer tank of phosphorus diffusion furnace |
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Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6150330A (en) * | 1984-08-20 | 1986-03-12 | Oki Electric Ind Co Ltd | Cleaning method for diffusion furnace |
| JPH06112144A (en) * | 1992-09-24 | 1994-04-22 | Meidensha Corp | Semiconductor manufacturing apparatus and operation thereof |
| JP2005276993A (en) * | 2004-03-24 | 2005-10-06 | Sanyo Electric Co Ltd | Diffusion furnace and manufacturing method of semiconductor apparatus |
| CN101220518A (en) * | 2007-01-12 | 2008-07-16 | 中国电子科技集团公司第四十八研究所 | Tail gas collecting device for high temperature diffusion system |
| CN201488540U (en) * | 2009-08-28 | 2010-05-26 | 深圳市捷佳伟创微电子设备有限公司 | Diffusion furnace with partition treatment device |
| CN202096779U (en) * | 2011-05-18 | 2012-01-04 | 阳光大地（福建）新能源有限公司 | Tail gas treatment device for solar cell diffusion equipment |
| CN102936752A (en) * | 2012-10-26 | 2013-02-20 | 陈功 | Phosphorus oxychloride remover for phosphorus diffusion furnace |
-
2013
- 2013-01-17 CN CN2013100182306A patent/CN103088428A/en active Pending
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6150330A (en) * | 1984-08-20 | 1986-03-12 | Oki Electric Ind Co Ltd | Cleaning method for diffusion furnace |
| JPH06112144A (en) * | 1992-09-24 | 1994-04-22 | Meidensha Corp | Semiconductor manufacturing apparatus and operation thereof |
| JP2005276993A (en) * | 2004-03-24 | 2005-10-06 | Sanyo Electric Co Ltd | Diffusion furnace and manufacturing method of semiconductor apparatus |
| CN101220518A (en) * | 2007-01-12 | 2008-07-16 | 中国电子科技集团公司第四十八研究所 | Tail gas collecting device for high temperature diffusion system |
| CN201488540U (en) * | 2009-08-28 | 2010-05-26 | 深圳市捷佳伟创微电子设备有限公司 | Diffusion furnace with partition treatment device |
| CN202096779U (en) * | 2011-05-18 | 2012-01-04 | 阳光大地（福建）新能源有限公司 | Tail gas treatment device for solar cell diffusion equipment |
| CN102936752A (en) * | 2012-10-26 | 2013-02-20 | 陈功 | Phosphorus oxychloride remover for phosphorus diffusion furnace |
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Application publication date: 20130508 |