CN201381281Y

CN201381281Y - Etching equipment

Info

Publication number: CN201381281Y
Application number: CN200920006953U
Authority: CN
Inventors: 李玟澄; 陈麒文; 朱德铭
Original assignee: Manz Taiwan Ltd
Current assignee: Manz Taiwan Ltd
Priority date: 2009-03-16
Filing date: 2009-03-16
Publication date: 2010-01-13
Anticipated expiration: 2019-03-16

Abstract

The utility model discloses etching equipment; a feed guiding wheel for conveying a substrate and a spray barrel are arranged in an etching chamber; the spray barrel comprises a plurality of spray sources; the spray sources are uniformly arranged above the etching chamber; the spray sources are spray nozzles with a plurality of small holes; and the spray sources receive the liquid medicine which is supplied by a liquid medicine working tank outside the etching chamber. The spray sources spray the misty liquid medicine at ultra-high speed, so that the etching chamber is fully filled with misty liquid medicine; and when the substrate goes through the etching chamber, the liquid medicine can be uniformly covered on the surface so as to achieve the purpose of etching.

Description

Etching machines

Technical field

The utility model relates to a kind of etching machines, and relating in particular to a kind ofly can provide uniform etching solution on substrate and reach the system of etching purpose.

Background technology

With reference to figure 2, be a kind of etching machines of the prior art, this etching machines includes a feeding district A, an etching chamber B, a preliminary chamber C of cleaning, main chamber D, a kiln E, the discharge zone F of cleaning substantially, be provided with a successive feeding guide wheel G between the working spaces, this feeding guide wheel G is by an outport electric control chamber (figure does not show) control.Wherein this etching chamber comprises a soaking compartment B1, the also external soup work nest H of this soaking compartment B1, this soup work nest H comprise basically one soak pump H1 as the propulsion source supply of chemical to soaking compartment B1, and the member of resistance detecting meter H3, potential of hydrogen detecting meter H2, temperature detecting device H4, heater H 5, spiral coil cooling tube H6 control soup.Glass substrate I delivers into etching chamber B soaking compartment B1 by feeding district A by conveying guide wheel G, roller is out of service, soak pump H1 and squeeze into soup to soaking compartment B1, make the soup cover glass substrate I in the soaking compartment B1, after glass substrate I soaks for some time, feeding guide wheel G starts, and glass substrate I is transported to the preliminary chamber C of cleaning.Glass substrate I one end (to call head end in the following text) is introduced into the preliminary chamber C of cleaning and cleans, and the other end (to call end in the following text) is also entered the preliminary chamber C of cleaning by feeding guide wheel G drive and accepts cleaning thereafter, and soup and the secondary resultant that remains on the substrate tentatively washed out.

Some problem appears in etching process, and first, enter soaking compartment fully because etching process of the prior art such as is at a substrate, and be statically placed on the feeding guide wheel, just supply of chemical has so just prolonged the time of substrate in etch phase to soaking compartment.The second, etching process, it is the soup immersion that substrate is accepted soaking compartment comprehensively synchronously, soak the back and leave soaking compartment earlier by the substrate head end, end also is soaked in the groove simultaneously, such transmission operation can cause the asynchronism(-nization) of glass substrate head, last two end in contact soups, and cause etching degree difference, make etching result inhomogeneous.Three, in immersion process, must constantly upgrade soup, can keep the concentration of soup.Four, can make on the substrate thickness of plated film blocked up with immersion way.

The utility model content

In the etching process in the prior art, after need treating that glass substrate is statically placed in soaking compartment fully, the side begins to carry out the etching operation, can cause the long problem in man-hour of etch phase, so the utility model main purpose provides a kind of etching machines that can save etching period.

At glass substrate in etched process, the asynchronism(-nization) of substrate head, terminal contact soup, the situation that can cause the etching inequality, therefore another purpose of the utility model is that to make the glass substrate everywhere be dipped into time of etching solution all identical, to provide a kind of substrate that can make by the etching machines of uniform etching.

Because glass substrate is in the process of soaking soup, do not change soup fully, the material that etching is produced down may influence liquor strength, fluid temperature also can be influenced with the etching period growth, so the another purpose of the utility model is to make substrate surface can simultaneously and contact new soup uniformly everywhere.

The utility model is a purpose again, is the thickness that desire reduces plated film on the substrate, to save material.

In order to achieve the above object, the utility model provides a kind of etching machines, and this equipment comprises: an etching chamber; One feeding guide wheel in order to carry a substrate, makes this substrate can pass through this etching chamber; One spraying system, it has one and connects the soup work nest that is located at this etching chamber outside, and a plurality of sprays source that links to each other with pipeline with this soup work nest, and the spray source is on average to be arranged at above this etching chamber and corresponding to the feeding guide wheel; This soup work nest is squeezed into soup to described spray source with high pressure, and described spray source makes described etching chamber fill the air vaporific soup to spray vaporific soup at a high speed.

The utility model is different from etching immersion type of the prior art and adopts fog to attach the thickness that formula mainly can be saved plated film on the substrate, also can reach in this way make substrate surface blooming by the purpose of uniform etching.On the other hand, the soup work nest is constantly supplied with new soup and is given the spray source, not only keeps the liquor strength in the etching chamber, and substrate surface to accept the time that soup upgrades everywhere identical, can promote etched uniformity coefficient.Again, the program that the utility model adopts contact soup, the acceptance earlier earlier of substrate head end to clean, it is identical making the total time of substrate comprehensive engagement soup, can guarantee further that the etching degree is identical.

Description of drawings

Fig. 1 is the synoptic diagram of etching machines among the utility model embodiment.

Fig. 2 is a kind of etching machines structure iron in the prior art.

Embodiment

Below cooperation is graphic does more detailed description to embodiment of the present utility model, and those skilled in the art can be implemented after studying this specification sheets carefully according to this.

With reference to figure 1, be the preferred embodiment synoptic diagram of the utility model etching machines.Main in an etching chamber 10, be provided with one pass to inner air extractor 1, wherein one section portion of a successive feeding guide wheel 2 passes through, and one sprays system 3.This sprinkling system 3 includes a row's spray source 31 and a soup work nest 32 that links to each other with pipeline, and this spray source 31 is meant the nozzle with most small holes, and nozzle is on average to be arranged on etching chamber 10 tops, and corresponds respectively to feeding guide wheel 2 everywhere; This soup work nest 32 is to be arranged in etching chamber 10 outsides, soup work nest 32 inside include a spray pump 33 as the propulsion source supply of chemical to each spray source 31, and the member of control fluid temperature such as resistance detecting meter 34, one potential of hydrogen detecting meter 35, one temperature detecting device 36, a well heater 37, a spiral coil cooling tube 38 or concentration.

The function mode of etching machines, be by an external control chamber (figure does not show) control feeding guide wheel 2, spraying system 6 starts, squeeze into the high density soup to each spray source 31 by spray pump 33 high pressure, soup sprays with high speed from the tiny spray orifice in spray source 31, after for some time, whole etching chamber 10 forms the thick fog state, glass substrate 20 is sent to etching chamber 10 by feeding guide wheel 2, glass substrate 20 is statically placed in to be accepted soup and is built-up in the surface uniformly on the feeding guide wheel 2, and wait for that the scheduled time arrives, process herb liquid work nest 32 continuous supply of chemical give each spray source 31 and produce thick fog shape soup, to keep the liquor strength in the etching chamber 10, make the blooming on glass substrate 20 surfaces etched uniformly; 1 of described air extractor can make and keep negative pressure in the etching chamber 10, medicine gas can spill and leakage to etching chamber.After etching reached a scheduled time, the watch-keeping cubicle started feeding guide wheel 2 drive glass substrates 20 and leaves etching chamber 10, enters water wash procedures subsequently.

The utility model etching machines is to carry out etching in the mode that vaporific soup is built-up in substrate, and it is even not only to reach substrate surface etching degree everywhere, and can save the thickness of plated film on the substrate.Because being introduced into etching chamber, the head end of glass substrate touches soup again, also be to leave etching chamber earlier by head end to accept cleaning, so it is identical with the total time of accepting flushing that glass substrate head, last two ends (comprehensively) soak the time of soup, the time that the expression soup remains in the arbitrary place of glass baseplate surface is identical, in order to do producing uniform etching face.

The above only is in order to explain preferred embodiment of the present utility model; be not that attempt is done any pro forma restriction to the utility model according to this; therefore; all have in that identical utility model spirit is following do relevant any modification of the present utility model or change, all must be included in the category of the utility model intention protection.

Claims

1. an etching machines is characterized in that, this equipment comprises:

One etching chamber;

One feeding guide wheel in order to carry a substrate, makes this substrate can pass through this etching chamber;

One spraying system, it has one and connects the soup work nest that is located at this etching chamber outside, and a plurality of sprays source that links to each other with pipeline with this soup work nest, and the spray source is on average to be arranged at above this etching chamber and corresponding to the feeding guide wheel;

This soup work nest is squeezed into soup to described spray source with high pressure, and described spray source makes described etching chamber fill the air vaporific soup to spray vaporific soup at a high speed.