CN201353899Y - High-activity fluororesin thin film and solar-energy cell - Google Patents
High-activity fluororesin thin film and solar-energy cell Download PDFInfo
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- CN201353899Y CN201353899Y CN 200920144609 CN200920144609U CN201353899Y CN 201353899 Y CN201353899 Y CN 201353899Y CN 200920144609 CN200920144609 CN 200920144609 CN 200920144609 U CN200920144609 U CN 200920144609U CN 201353899 Y CN201353899 Y CN 201353899Y
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- resin film
- fluorine resin
- fluorosilicone
- high activity
- forming layer
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
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Abstract
A high-activity fluororesin thin film comprises a substrate layer made of fluorinated ethylene propylene resins with the distribution of bimodule molecular weight, and a fluorosilicone-alkylation film-forming layer or a silicon-titanizing film-forming layer which is arranged on the surface of the substrate. The utility model adopts the substrate layer made of fluorinated ethylene propylene resins with the distribution of bimodule molecular weight, conducts the fluorosilicone-alkylation processing or the silicon-titanizing processing on the substrate layer to form the fluorosilicone-alkylation film-forming layer or the silicon-titanizing film-forming layer, thereby having higher corrosion resistance, weather resistance and fire resistance; and meanwhile, the outer surface of the thin film is provided with high scratch-resisting performance, the cohesiveness between the internal surface and a glass panel or a rear panel is increased, and the transparency is higher.
Description
Technical field:
The utility model relates to a kind of solar cell, also relates to a kind of panel of solar cell or protective material on the backboard of being applicable to.
Background technology:
Solar panel is a laminated construction normally, mainly comprises surface layer of glass, EVA sealant, solar battery sheet, EVA sealant and solar battery back film, and wherein solar battery sheet is by two-layer EVA sealant sealed envelope.The main effect of solar battery panel is that the high good overall mechanical strength of sunshine transmitance is arranged, and can prevent that in addition water vapor permeable from sealant, influencing the service life of battery sheet.Therefore, the facial mask of solar cell of the prior art adopts face glass usually, and the light transmission of this face glass is relatively good, and intensity is also high, and water resistance might as well.In addition, the main effect of solar battery back film is the overall mechanical strength that improves solar panel, can prevent that water vapor permeable from sealant, influencing the service life of battery sheet.But face glass and conventional notacoria long term exposure are outside, especially around under the environment condition of severe, and seashore for example, can cause serious corrosion to face glass and notacoria, after face glass was corroded, its light transmittance can reduce greatly, has influenced service life.Secondly, after face glass and notacoria were corroded, its water proofing property and electric durability can also can reduce greatly.
The utility model content:
Technical problem to be solved in the utility model overcomes the deficiency of above-mentioned prior art, and a kind of have high activity, corrosion-resistant, the resistant to elevated temperatures solar cell that is used for the fluorine resin film of solar cell and uses this film are provided.
A kind ofly have a high activity fluorine resin film according to what the utility model provided, comprise that basic unit that exhaustive fluorinated ethylene propylene with bimodulus molecular weight distribution is made and the fluorosilicone that is located at described substrate surface change into rete or silicon titanizing film forming layer.
A kind ofly have the high activity fluorine resin film and also have following attached technical characterictic according to what the utility model provided:
Described exhaustive fluorinated ethylene propylene is formed by high molecular weight component exhaustive fluorinated ethylene propylene and the mixing of lower-molecular-weight component exhaustive fluorinated ethylene propylene.
The thickness of described basic unit is 0.01mm-0.3mm.
The thickness of described basic unit is 0.07mm-0.15mm.
The thickness that described fluorosilicone changes into rete or silicon titanizing film forming layer is 0.01 micron to 5 microns.
The thickness that described fluorosilicone changes into rete or silicon titanizing film forming layer is 0.1 micron to 2 microns.
Described fluorine-based laminar surface forms described fluorosilicone through the processing of plasma fluorosilicone and changes into rete.
Described fluorine-based laminar surface is handled through plasma silicon titanizing and is formed described silicon titanizing film forming layer.
A kind of solar cell that provides according to the utility model, comprise battery main body and the light-passing board that is installed on the described battery main body, the surface recombination of described light-passing board has the high activity fluorine resin film, and described fluorine resin film comprises that exhaustive fluorinated ethylene propylene basic unit of making and the fluorosilicone that is located at described substrate surface with bimodulus molecular weight distribution change into rete or silicon titanizing film forming layer.
A kind ofly have the high activity fluorine resin film and have following advantage according to what the utility model provided: at first, the utility model adopts the exhaustive fluorinated ethylene propylene of bimodulus molecular weight distribution to make basic unit, and basic unit is carried out fluorosiliconeization or silicon titanizing handle, form fluorosilicone and change into rete or silicon titanizing film forming layer, thereby have higher corrosion resistance, high weatherability, high flame retardant, make the film outer surface have high scratch resistance simultaneously, the caking property of inner surface increase and face glass or backboard has higher transparency; Secondly, change into rete or silicon titanizing film forming layer owing to form fluorosilicone, make that rete of the present utility model is closely knit, improved barrier property, especially further improve the obstruct to steam, humidity resistance is good, and electric property and weather resistance are better.
A kind of solar cell that provides according to the utility model has following advantage: film of the present utility model is covered on face glass or the backboard, improve corrosion resistance, the weatherability of face glass and backboard, simultaneously, can not influence the light transmittance of face glass, prolong the service life of solar cell.
Description of drawings:
Fig. 1 is the structural representation of a kind of embodiment of the present utility model.
Fig. 2 is the structural representation of another kind of embodiment of the present utility model.
The specific embodiment:
Referring to Fig. 1,, comprise that exhaustive fluorinated ethylene propylene basic unit 1 of making and the fluorosilicone that is located at described basic unit 1 surface with bimodulus molecular weight distribution change into rete 2 at a kind of embodiment that the utility model provides with high activity fluorine resin film.Basic unit 1 of the present utility model is that the exhaustive fluorinated ethylene propylene with bimodulus molecular weight is made, and wherein exhaustive fluorinated ethylene propylene is also referred to as F46, and the film of making is called fep film.This material has higher protection against the tide, anti-permeability, and electric property and weather resistance are also very high, and it is in light weight.And light transmittance reaches 97%, light transmission might as well, can fully improve the performance of solar cell mask or backboard.In order to improve the overall performance of this material, make its bonding easy and face glass, the utility model is provided with one or both sides shaping fluorosilicone and changes into rete 2 in basic unit 1, thereby the surface of film can be promoted, and hydrophiling makes its easy bonding.Promptly under the prerequisite that guarantees the advantage that basic unit had, overcome the shortcoming that itself characteristic has.Therefore, the barrier of film of the present utility model is better, and whole humidity resistance, electric property and weather resistance are better.And the fluorosilicone that is positioned at basic unit's 1 outer surface changes into rete 2 makes scratch resistance better, plays a protective role.Make film have higher caking property and the fluorosilicone of inner surface changes into rete, be more prone to bond with face glass or backboard.
In the foregoing description that the utility model provides, described exhaustive fluorinated ethylene propylene is formed by high molecular weight component exhaustive fluorinated ethylene propylene and the mixing of lower-molecular-weight component exhaustive fluorinated ethylene propylene.The content of described high molecular weight component exhaustive fluorinated ethylene propylene is 30%-50%, specifically can elect 30%, 35%, 40%, 45% and 50% as.The content of described lower-molecular-weight component exhaustive fluorinated ethylene propylene is 70%-50%, and concrete correspondence elects 70%, 65% as, 60%, 55% and 50%.Adopt the exhaustive fluorinated ethylene propylene of bimodulus molecular weight distribution can improve overall performance, better satisfy demand of the present utility model.
In the foregoing description that the utility model provides, the thickness of described basic unit 1 is 0.01mm-0.3mm.The thickness of preferred described basic unit 1 is 0.07mm-0.15mm.Specifically can be chosen as 0.01mm, 0.04mm, 0.07mm, 0.09mm, 0.11mm, 0.12mm, 0.15mm.Select for use the basic unit 1 of above-mentioned size to cover on the face glass, can not influence light transmittance.Simultaneously, be well positioned to meet corrosion-resistant and weatherability again.
In the foregoing description that the utility model provides, the thickness that described fluorosilicone changes into rete 2 is 0.01 micron to 5 microns, preferred scheme is between 0.1 micron to 2 microns, and concrete numerical value can be elected 0.01 micron, 0.05 micron, 0.1 micron, 0.2 micron, 0.5 micron, 0.8 micron, 1 micron, 1.5 microns, 2 microns as.The thickness that fluorosilicone is changed into rete 2 is limited in the above-mentioned size range and can better meets close-burning demand, and selects above-mentioned concrete one-tenth-value thickness 1/10, can better meet technological requirement, is beneficial to the processing that fluorosilicone changes into rete.
In the foregoing description that the utility model provides, described basic unit 1 surface forms described fluorosilicone through the processing of plasma fluorosilicone and changes into rete 2.
A kind of preparation technology with high activity fluorine resin film of preparation the foregoing description that the utility model provides mainly may further comprise the steps:
(1), the exhaustive fluorinated ethylene propylene of high molecular weight component and the exhaustive fluorinated ethylene propylene of lower-molecular-weight component are mixed and made into the exhaustive fluorinated ethylene propylene particle with bimodulus molecular weight distribution;
(2), above-mentioned particle sent into Langaloy screw type extruder head prepare wide cut basic unit, described basic unit 1 has the exhaustive fluorinated ethylene propylene of bimodulus molecular weight distribution; The extruder head here has high temperature resistant, corrosion-resistant characteristic, can satisfy processing needs of the present invention.
(3), substrate surface is carried out plasma handles the activation substrate surface; The plasma treatment process that is adopted can be the plasma treatment process of comparative maturity in the prior art.
(4), to activating back basic unit's spraying or roller coating or dipping fluosilicic oxyalkane compound or silicon-titanium compound, through 20-200 degree centigrade of heating 1-600 second, make substrate surface form fluorosilicone and change into rete.At this, fluosilicic oxyalkane compound also can be coated in the surface of basic unit 1 by the mode of roller coating or dipping, thereby makes the surface formation fluorosilicone of basic unit 1 change into rete.Above-mentioned technology of the present utility model is fairly simple, can realize serialization production, has improved production efficiency, has reduced manufacturing cost, is beneficial to marketing.
In step (4), heating-up temperature can be 20-200 degree centigrade, be preferably 80-150 degree centigrade, concrete numerical value can be selected from 20 degrees centigrade, 40 degrees centigrade, 60 degrees centigrade, 80 degrees centigrade, 100 degrees centigrade, 120 degrees centigrade, 150 degrees centigrade, 180 degrees centigrade, 200 degrees centigrade; Be 1-600 second heat time heating time, is preferably 10-60 second, and concrete numerical value can be selected from 5 seconds, 10 seconds, 20 seconds, 30 seconds, 40 seconds, 50 seconds, 80 seconds, 100 seconds, 120 seconds, 150 seconds, 200 seconds, 250 seconds, 300 seconds, 350 seconds, 400 seconds, 450 seconds, 500 seconds.The qualification of said temperature and time is beneficial to the carrying out of fluorosiliconeization, satisfies the formation that fluorosilicone changes into rete.
Fluorosilicone solid content 1-90% in preparation technology of the present utility model in the fluosilicic oxyalkane compound.The molecular formula of the fluosilicic oxyalkane compound that is adopted in the utility model: R
f-Si (OR)
3, this compound can buy finished product from the market.This fluosilicic oxyalkane compound is an organic compound, carries out proportioning with other liquid.Its characteristic makes it have end parent organic matter, and the other end can close inorganic matter, thus the cohesive force of effectively raising.
Referring to Fig. 2,, comprise exhaustive fluorinated ethylene propylene basic unit 1 of making and the silicon titanizing film forming layer 3 that is located at described basic unit 1 surface with bimodulus molecular weight distribution at a kind of another kind of embodiment that the utility model provides with high activity fluorine resin film.Basic unit 1 of the present utility model is that the exhaustive fluorinated ethylene propylene with bimodulus molecular weight is made, and wherein exhaustive fluorinated ethylene propylene is also referred to as F46, and the film of making is called fep film.This material has higher protection against the tide, anti-permeability, and electric property and weather resistance are also very high, and it is in light weight.And light transmittance reaches 97%, light transmission might as well, can fully improve the performance of solar cell mask or backboard.In order to improve the overall performance of this material, make its bonding easy and face glass, the utility model is provided with one or both sides shaping silicon titanizing film forming layer 3 in basic unit 1, thereby the surface of film can be promoted, and hydrophiling makes its easy bonding.Promptly under the prerequisite that guarantees the advantage that basic unit had, overcome the shortcoming that itself characteristic has.Therefore, the barrier of film of the present utility model is better, and whole humidity resistance, electric property and weather resistance are better.And the silicon titanizing film forming layer 3 that is positioned at basic unit's 1 outer surface makes scratch resistance better, plays a protective role.And the silicon titanizing film forming layer of inner surface makes film have higher caking property, is more prone to bond with face glass or backboard.
In the foregoing description that the utility model provides, the structure of described basic unit 1 and composition are same as the previously described embodiments, repeat no more herein.
In the foregoing description that the utility model provides, the thickness of described silicon titanizing film forming layer 3 is 0.01 micron to 5 microns, preferred scheme is between 0.1 micron to 2 microns, and concrete numerical value can be elected 0.01 micron, 0.05 micron, 0.1 micron, 0.2 micron, 0.5 micron, 0.8 micron, 1 micron, 1.5 microns, 2 microns as.The thickness of silicon titanizing film forming layer 3 is limited in the above-mentioned size range can better meets close-burning demand, and select above-mentioned concrete one-tenth-value thickness 1/10, can better meet technological requirement, be beneficial to the processing of silicon titanizing film forming layer.
In the foregoing description that the utility model provides, described basic unit 1 surface is handled through plasma silicon titanizing and is formed described silicon titanizing film forming layer 3.
A kind of preparation technology with high activity fluorine resin film of preparation the foregoing description that the utility model provides mainly may further comprise the steps:
(1), the exhaustive fluorinated ethylene propylene of high molecular weight component and the exhaustive fluorinated ethylene propylene of lower-molecular-weight component are mixed and made into the exhaustive fluorinated ethylene propylene particle with bimodulus molecular weight distribution;
(2), above-mentioned particle sent into Langaloy screw type extruder head prepare wide cut basic unit, described basic unit 1 has the exhaustive fluorinated ethylene propylene of bimodulus molecular weight distribution; The extruder head here has high temperature resistant, corrosion-resistant characteristic, can satisfy processing needs of the present utility model.
(3), substrate surface is carried out plasma handles the activation substrate surface; The plasma treatment process that is adopted can be the plasma treatment process of comparative maturity in the prior art.
(4), to activating back basic unit's spraying or roller coating or dipping silicon-titanium compound or silicon-titanium compound, through 20-200 degree centigrade of heating 1-600 second, make substrate surface form silicon titanizing film forming layer.At this, silicon-titanium compound also can be coated in the surface of basic unit 1 by the mode of roller coating or dipping, thereby makes the surface of basic unit 1 form silicon titanizing film forming layer.Above-mentioned technology of the present utility model is fairly simple, can realize serialization production, has improved production efficiency, has reduced manufacturing cost, is beneficial to marketing.
In step (4), heating-up temperature can be 20-200 degree centigrade, be preferably 80-150 degree centigrade, concrete numerical value can be selected from 20 degrees centigrade, 40 degrees centigrade, 60 degrees centigrade, 80 degrees centigrade, 100 degrees centigrade, 120 degrees centigrade, 150 degrees centigrade, 180 degrees centigrade, 200 degrees centigrade; Be 1-600 second heat time heating time, is preferably 10-60 second, and concrete numerical value can be selected from 5 seconds, 10 seconds, 20 seconds, 30 seconds, 40 seconds, 50 seconds, 80 seconds, 100 seconds, 120 seconds, 150 seconds, 200 seconds, 250 seconds, 300 seconds, 350 seconds, 400 seconds, 450 seconds, 500 seconds.The qualification of said temperature and time is beneficial to the carrying out of silicon titanizing, satisfies the formation of silicon titanizing film forming layer.
Silicon titanium solid content 1-90% in preparation technology of the present utility model in the silicon-titanium compound.The molecular formula of the silicon-titanium compound that is adopted in the utility model: SiOx, TiO
2, this compound can buy finished product from the market.This silicon-titanium compound is a hybrid, thus the cohesive force of effectively raising.
A kind of solar cell that provides at the utility model, comprise battery main body and the light-passing board that is installed on the described battery main body, the surface recombination of described light-passing board has the high activity fluorine resin film, and described fluorine resin film is the fluorine resin film described in above-mentioned two embodiment.Because the compound above-mentioned film of light-passing board of the present utility model, make the corrosion resistance of solar cell, weatherability improves greatly, has prolonged service life.
Claims (9)
1, a kind of have a high activity fluorine resin film, it is characterized in that: comprise that basic unit that exhaustive fluorinated ethylene propylene with bimodulus molecular weight distribution is made and the fluorosilicone that is located at described substrate surface change into rete or silicon titanizing film forming layer.
2, a kind of high activity fluorine resin film that has as claimed in claim 1 is characterized in that: described exhaustive fluorinated ethylene propylene is formed by high molecular weight component exhaustive fluorinated ethylene propylene and the mixing of lower-molecular-weight component exhaustive fluorinated ethylene propylene.
3, a kind of high activity fluorine resin film that has as claimed in claim 1, it is characterized in that: the thickness of described basic unit is 0.01mm-0.3mm.
4, a kind of high activity fluorine resin film that has as claimed in claim 3, it is characterized in that: the thickness of described basic unit is 0.07mm-0.15mm.
5, a kind of high activity fluorine resin film that has as claimed in claim 1 is characterized in that: the thickness that described fluorosilicone changes into rete or silicon titanizing film forming layer is 0.01 micron to 5 microns.
6, a kind of high activity fluorine resin film that has as claimed in claim 1 is characterized in that: the thickness that described fluorosilicone changes into rete or silicon titanizing film forming layer is 0.1 micron to 2 microns.
7, a kind of high activity fluorine resin film that has as claimed in claim 1, it is characterized in that: described fluorine-based laminar surface forms described fluorosilicone through the processing of plasma fluorosilicone and changes into rete.
8, a kind of high activity fluorine resin film that has as claimed in claim 1 is characterized in that: described fluorine-based laminar surface is handled through plasma silicon titanizing and is formed described silicon titanizing film forming layer.
9, a kind of solar cell, comprise battery main body and the light-passing board that is installed on the described battery main body, it is characterized in that the surface recombination of described light-passing board has the high activity fluorine resin film, described fluorine resin film is the described fluorine resin film of above-mentioned arbitrary claim.
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CN 200920144609 CN201353899Y (en) | 2009-02-24 | 2009-02-24 | High-activity fluororesin thin film and solar-energy cell |
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CN 200920144609 CN201353899Y (en) | 2009-02-24 | 2009-02-24 | High-activity fluororesin thin film and solar-energy cell |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101814533B (en) * | 2009-02-24 | 2012-02-15 | 苏州中来光伏新材股份有限公司 | Fluororesin membrane with high activity, preparation process thereof and solar cell |
-
2009
- 2009-02-24 CN CN 200920144609 patent/CN201353899Y/en not_active Expired - Lifetime
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101814533B (en) * | 2009-02-24 | 2012-02-15 | 苏州中来光伏新材股份有限公司 | Fluororesin membrane with high activity, preparation process thereof and solar cell |
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Legal Events
Date | Code | Title | Description |
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C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
AV01 | Patent right actively abandoned |
Granted publication date: 20091202 Effective date of abandoning: 20090224 |