CN201256138Y - Ion beam leading out system for ionic source - Google Patents
Ion beam leading out system for ionic source Download PDFInfo
- Publication number
- CN201256138Y CN201256138Y CNU2008201278936U CN200820127893U CN201256138Y CN 201256138 Y CN201256138 Y CN 201256138Y CN U2008201278936 U CNU2008201278936 U CN U2008201278936U CN 200820127893 U CN200820127893 U CN 200820127893U CN 201256138 Y CN201256138 Y CN 201256138Y
- Authority
- CN
- China
- Prior art keywords
- aperture plate
- screen
- grid
- ion beam
- plate district
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Landscapes
- Electron Sources, Ion Sources (AREA)
Abstract
The utility model relates to an ion beam extraction system for ion source, which is provided with two grids axially separated from each other on a same center line, wherein one grid is an accelerating grid (6), a circular grid area (6a) with grid apertures is positioned on the accelerating grid (6), and the other grid is a screen grid (5). The ion beam extraction system is characterized in that the screen grid (5) is provided with a grid area (5a) with grid apertures. Ion sources can extract rectangular, arbitrarily polygonal or elliptical sectioned ion beams by the ion beam extraction system, required circular or other shaped ion beams can be output by changing one screen grid, thereby achieving the purpose of multiple use of one system.
Description
Technical field
The utility model belongs to a kind of ion source device, is specifically related to a kind of ionogenic ion beam extraction system.
Background technology
Ion source can be used for the Surface Machining of material, as etching, polishing, assisted deposition etc., its structure mainly is to comprise an arc chamber, with the ion beam extraction system that is fixed on the arc chamber, arc chamber is used to produce ion, and the ion beam extraction system is used for ion is drawn, referring to Fig. 1,2, ion beam extraction system primary structure is to be provided with two grids, and a slice is a screen 5, and a slice is an accelerating grid 6.Present known Kaufman ion source is divided into circular and rectangle two classes by the difference of drawing the ion beam profile, be respectively equipped with circular aperture plate district 5a and 6a (referring to Fig. 8) on the screen 5 of circular ion source ion beam extraction system and the accelerating grid 6, this class device can only removal cross-section be circular cylindrical ion beam, for drawing the rectangle ion beam, its arc chamber of existing apparatus and extraction system all are necessary for rectangle (referring to Fig. 9).
Summary of the invention
It is rectangle or arbitrary polygon or elliptical ion beam that the technical problems to be solved in the utility model provides a kind of exportable cross section, and only need change the ionogenic ion beam extraction system that a slice grid can change the ion beam shape.
The technical scheme that addresses the above problem is: two grids that are provided with axial withdrawal distance on same center line, a slice is accelerating grid (6), which is provided with the circular aperture plate district (6a) in band grid hole, another sheet is screen (5), it is characterized in that: screen is provided with the rectangle in band grid hole, or arbitrary polygon, or oval-shaped aperture plate district (5a).
Operation principle of the present utility model is: the ion that arc chamber produces is when the ion beam extraction system is drawn, the ion beam cross section is constrained to rectangle or arbitrary polygon or oval back at screen by aperture plate district (5a) and arrives accelerating grid, thus removal cross-section and the identical ion beam of screen aperture plate district (5a) shape.
Adopting ion source of the present utility model can removal cross-section be rectangle, or arbitrary polygon or oval-shaped ion beam, and when needs output circle or other shape ion beam, only needs to change a slice screen and get final product, and reaches the purpose of a tractor serves several purposes.
Description of drawings
Fig. 1, the utility model embodiment 1 structural representation
The A-B-C of Fig. 2, Fig. 1 is to cutaway view
Fig. 3, the utility model embodiment 1 accelerating grid 6 and screen 5 deployed configuration schematic diagrames
Enlarged diagram is arranged in Fig. 4, grid hole, the utility model embodiment 1 aperture plate district 8
Fig. 5, the utility model embodiment 2 accelerating grids 6 and screen 5 deployed configuration schematic diagrames
Fig. 6, the utility model embodiment 3 accelerating grids 6 and screen 5 deployed configuration schematic diagrames
Fig. 7, the utility model embodiment 4 accelerating grids 6 and screen 5 deployed configuration schematic diagrames
Fig. 8, prior art are drawn the accelerating grid 6 and screen 5 deployed configuration schematic diagrames of circular ion beam
Fig. 9, prior art are drawn the accelerating grid 6 and screen 5 deployed configuration schematic diagrames of rectangle ion beam
1-insulator 2-insulator 3-screw 4-screw 5-screen 5a-screen aperture plate district 5b-screen frame
5d-screen aperture plate sheet 6-accelerating grid 6a-accelerating grid aperture plate district 6b-accelerating grid frame
6c-accelerating grid barrier projection 6d-accelerating grid aperture plate sheet 7-screw 8-grid hole 9-insulator
Embodiment
Referring to Fig. 1, Fig. 2, Fig. 3, Fig. 4, this routine ion beam extraction system concrete structure is: the axial withdrawal distance is provided with screen 5 and accelerating grid 6 on same center line.
Accelerating grid 5 and screen 6 are connected as a single entity in parallel to each other by insulator 9 and screw 7, constitute the ion beam extraction system, and this ion beam extraction system is fixed on the ion source discharge chamber by insulator 2,1 and screw 3.
Circular accelerating grid aperture plate district 6a diameter on this routine accelerating grid 6 is 60mm, the long limit L of the rectangle aperture plate district 5a in screen 5 centres is 60mm, identical with the circular projection 6c diameter D of accelerating grid aperture plate district 6a on screen, its two minor face H is 8mm, circumscribed with the circular projection 6c of accelerating grid aperture plate district 6a on screen, two grid spacing 1mm.
The aperture plate district of accelerating grid and screen is covered with one heart and is the grid hole 8 of hexagonal array, and aperture, grid hole is 2mm (referring to Fig. 4), and pitch-row is 1.25 times of aperture, and circular accelerating grid aperture plate district 6a has 522 holes, and the screen aperture plate district 5a of rectangle has 88 holes.
The cylindrical Kaufman ion source of good design, under anode extraction voltage 500V, every Kongzui is drawn ion beam current greatly can reach 150 μ A.Adopt the ion beam extraction system of this routine structure, 13.2mA can draw in rectangle aperture plate district, 88 hole, cross-sectional width is that 8mm, length are the narrow rectangle ion beam current of 60mm.
Accelerating grid frame 6b that this is routine and screen frame 5b outline are all rounded.
The narrow rectangle ion beam current that this example produces is specially adapted to be undertaken by etching association areas such as crystal frequency fine setting.
If need to produce cylindrical or other shape ion beam current, only need unload screw, screen 5 is replaced by aperture plate district getting final product for circular or other required form.
The optional common low carbon steel or stainless steel of screen frame 5b material, the optional magnetism-free stainless steel of accelerating grid frame 6b, aperture plate material are non-magnetic rustproof steel disc, high strength graphite sheet or molybdenum sheet.
Referring to Fig. 5, as different from Example 1, the long limit of the rectangle aperture plate district 5a at these routine screen 5 centers connects in rectangle aperture plate district 5a and the circular projection 6c of accelerating grid aperture plate district 6a on screen less than the circular projection 6c diameter of accelerating grid aperture plate district 6a on screen.
Referring to Fig. 6, as different from Example 1, the aperture plate district 5a at these routine screen 5 centers is oval, its major diameter and the accelerating grid aperture plate district 6a circular projection 6c inscribe on screen.
It is oval-shaped ion beam that this example can produce the cross section, is used for material surface processing.
Referring to Fig. 7, as different from Example 1, the aperture plate district 5a at these routine screen 5 centers is 5 limit shapes, and connects in the circular projection 6c of accelerating grid aperture plate district 6a on screen.
The above; it only is preferred embodiment of the present utility model; be not that the utility model is done any pro forma restriction; every foundation technical spirit of the present utility model all still belongs to the protection range of technical solutions of the utility model to any simple modification, equivalent variations and modification that above embodiment did.
Claims (9)
1, ionogenic ion beam extraction system, be provided with two grids of axial withdrawal distance on same center line, a slice is accelerating grid (6), which is provided with the circular aperture plate district (6a) in band grid hole, another sheet is screen (5), it is characterized in that: screen (5) is provided with rectangle or the arbitrary polygon or the oval-shaped aperture plate district (5a) in band grid hole.
2, ionogenic ion beam extraction system according to claim 1, it is characterized in that: described screen (5) centre is provided with the aperture plate district (5a) of rectangle, its long limit is identical with circular projection (6c) diameter of accelerating grid aperture plate district (6a) on screen, and its two minor face and accelerating grid aperture plate district (6a) circular projection (6c) on screen is circumscribed.
3, ionogenic ion beam extraction system according to claim 1, it is characterized in that: described screen (5) centre is provided with the aperture plate district (5a) of rectangle, long limit, this rectangle aperture plate district (5a) connects in rectangle aperture plate district (5a) and the circular projection (6c) of accelerating grid aperture plate district (6a) on screen less than circular projection (6c) diameter of accelerating grid aperture plate district (6a) on screen.
4, ionogenic ion beam extraction system according to claim 1, it is characterized in that: described screen (5) centre is provided with oval aperture plate district (5a), its major diameter is identical with circular projection (6c) diameter of accelerating grid aperture plate district (6a) on screen, oval aperture plate district (5a) and circular projection (6c) inscribe of accelerating grid aperture plate district on screen.
5, ionogenic ion beam extraction system according to claim 1 is characterized in that: described screen (5) centre is provided with polygon aperture plate district (5a), connects in polygon aperture plate district and the accelerating grid aperture plate district circular projection (6c) on screen.
6, according to the described ionogenic ion beam extraction system of the arbitrary claim of claim 1-5, it is characterized in that: the aperture plate district of screen and accelerating grid is covered with one heart and is the grid hole (8) of hexagonal array.
7, according to the described ionogenic ion beam extraction system of the arbitrary claim of claim 1-5, it is characterized in that: accelerating grid (6) is made of accelerating grid frame (6b) and the accelerating grid aperture plate sheet (6d) that is fixed therein on the heart window, accelerating grid aperture plate district (6a) is located at accelerating grid aperture plate sheet (6d) centre, screen (5) is made of screen frame (5b) and the screen aperture plate sheet (5d) that is fixed therein on the heart window, and screen aperture plate district (5a) is located at screen aperture plate sheet (5d) centre.
8, ionogenic ion beam extraction system according to claim 7 is characterized in that: described accelerating grid frame (6b) and screen frame (5b) outline are all rounded.
9, ionogenic ion beam extraction system according to claim 8, it is characterized in that: described accelerating grid aperture plate sheet (6d) and screen aperture plate sheet (5d) periphery are embedded in respectively in the groove of corresponding grid frame center window periphery, and be fixed on the corresponding grid frame by screw (4), accelerating grid (6) and screen (5) are connected as a single entity in parallel to each other by insulator (9) and screw (7), constitute the ion beam extraction system, this ion beam extraction system is fixed on the ion source discharge chamber by insulator (1,2) and screw (3).
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CNU2008201278936U CN201256138Y (en) | 2008-08-07 | 2008-08-07 | Ion beam leading out system for ionic source |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CNU2008201278936U CN201256138Y (en) | 2008-08-07 | 2008-08-07 | Ion beam leading out system for ionic source |
Publications (1)
Publication Number | Publication Date |
---|---|
CN201256138Y true CN201256138Y (en) | 2009-06-10 |
Family
ID=40739466
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNU2008201278936U Expired - Fee Related CN201256138Y (en) | 2008-08-07 | 2008-08-07 | Ion beam leading out system for ionic source |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN201256138Y (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103094029A (en) * | 2011-10-31 | 2013-05-08 | 日新离子机器株式会社 | Ion Beam Extraction Electrode And Ion Source |
CN104715986A (en) * | 2013-12-11 | 2015-06-17 | 中国航空工业第六一八研究所 | Suspension-type multi-claw grid combination and assembling method thereof |
CN106158565A (en) * | 2016-08-31 | 2016-11-23 | 北京埃德万斯离子束技术研究所股份有限公司 | Aperture plate and ion source |
CN108459342A (en) * | 2018-05-22 | 2018-08-28 | 南京航空航天大学 | A kind of Flouride-resistani acid phesphatase hyperbar honeycomb grid ionization chamber and manufacturing method |
CN109899263A (en) * | 2019-04-22 | 2019-06-18 | 南华大学 | Annular ion thruster grid assembly |
CN111526654A (en) * | 2020-05-09 | 2020-08-11 | 航宇动力技术(深圳)有限公司 | Quasi-neutral plasma beam extraction device |
-
2008
- 2008-08-07 CN CNU2008201278936U patent/CN201256138Y/en not_active Expired - Fee Related
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103094029A (en) * | 2011-10-31 | 2013-05-08 | 日新离子机器株式会社 | Ion Beam Extraction Electrode And Ion Source |
CN104715986A (en) * | 2013-12-11 | 2015-06-17 | 中国航空工业第六一八研究所 | Suspension-type multi-claw grid combination and assembling method thereof |
CN104715986B (en) * | 2013-12-11 | 2017-02-22 | 中国航空工业第六一八研究所 | Suspension-type multi-claw grid combination and assembling method thereof |
CN106158565A (en) * | 2016-08-31 | 2016-11-23 | 北京埃德万斯离子束技术研究所股份有限公司 | Aperture plate and ion source |
CN106158565B (en) * | 2016-08-31 | 2017-09-19 | 北京埃德万斯离子束技术研究所股份有限公司 | Aperture plate and ion gun |
CN108459342A (en) * | 2018-05-22 | 2018-08-28 | 南京航空航天大学 | A kind of Flouride-resistani acid phesphatase hyperbar honeycomb grid ionization chamber and manufacturing method |
CN109899263A (en) * | 2019-04-22 | 2019-06-18 | 南华大学 | Annular ion thruster grid assembly |
CN111526654A (en) * | 2020-05-09 | 2020-08-11 | 航宇动力技术(深圳)有限公司 | Quasi-neutral plasma beam extraction device |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN201256138Y (en) | Ion beam leading out system for ionic source | |
EP2753907B1 (en) | Ionization vacuum measuring cell | |
CN110594115B (en) | Ring-shaped ion thruster without discharge cathode | |
JP5675099B2 (en) | Ion source | |
CN105478238A (en) | Wire-mesh-electrode discharging device | |
DE1441243A1 (en) | ||
CN109831866A (en) | A kind of double rings electrode coplanar discharge plasma producing apparatus | |
CN112275130B (en) | Composite discharge electrode with insulating frame and purification device | |
CN201975363U (en) | Cation source device | |
JP2007024849A (en) | Multipole cold cathode ionization gauge | |
CN215389995U (en) | Blade-shaped corona electrode and discharge structure applying same | |
WO2002043100A3 (en) | Radio frequency ion source | |
CN213459636U (en) | Ion mobility spectrometer migration area with enhanced ion focusing effect | |
CN109841489A (en) | A kind of device for reducing radiofrequency quadrupole transmission quality and discriminating against | |
CN206560980U (en) | Feed Manufacturing pulverizer sieve plate | |
JPS5927499A (en) | Method of producing simple and highly efficient sheet plasma | |
CN207531152U (en) | A kind of double rings electrode coplanar discharge plasma producing apparatus | |
CN205124104U (en) | Magnetic control formula toper needle array disperse discharge electrode | |
JP6847267B2 (en) | Plasma source | |
CN101764021A (en) | Ion pipe and ion beam extraction method | |
CN205505245U (en) | Air cleaning device | |
CN211719557U (en) | Ion source anode | |
CN105728197A (en) | Electric field device | |
CN103811281A (en) | Field emission plane light source device and manufacturing method thereof | |
CN105817327B (en) | A kind of production method of curtain type electric field |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20090610 Termination date: 20160807 |
|
CF01 | Termination of patent right due to non-payment of annual fee |