CN201237695Y - Mask - Google Patents
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- CN201237695Y CN201237695Y CNU200820147200XU CN200820147200U CN201237695Y CN 201237695 Y CN201237695 Y CN 201237695Y CN U200820147200X U CNU200820147200X U CN U200820147200XU CN 200820147200 U CN200820147200 U CN 200820147200U CN 201237695 Y CN201237695 Y CN 201237695Y
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- scale mark
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- mask
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Abstract
The utility model is applicable to the technical field of the semiconductor photoetching development, and provides a mask plate. The mask plate is provided with a developing accuracy control icon; the developing accuracy control icon comprises a first group of scale markers; the first group of scale markers consists of a group of scale marking patterns; the line width of each scale marking pattern in the first group of scale markers gradually increases or decreases; and the line width of each scale marking pattern in the first group of scale markers is uniform. Because the developing accuracy control icon is arranged on the mask plate and comprises a group of scale markers, each group of scale markers consist of the scale marking patterns with the gradually increasing or decreasing but uniform line widths, the developing degree of the scale marking patterns in the scale marker can be monitored to control the developing accuracy; the constant concentration of the developing solution can be controlled or maintained without controlling the developing time according to the changes of the concentration of the developing solution; the operation is simple; and the cost pressure is relieved.
Description
Technical field
The utility model belongs to semiconductor lithography developing technique field, relates in particular to a kind of mask.
Background technology
The processing procedure of semiconductor devices such as LCD, integrated circuit need be used mask, to etch the figure that the user needs on glass substrate or semiconductor chip.Fig. 1 shows the making flow process of mask, at first carry out graphic making with design software, and figure is converted to the discernible data of exposure sources, exposure sources exposes to the figure consistent with designing requirement being coated with on the mask of photoresists then, at last mask is carried out development treatment, make the photoresists on the mask present the figure that the user needs.
Mask is in developing process, because the otherness of process conditions, the skill level of the gimmick of perhaps developing all can influence the precision of development.For guaranteeing the stability of this crucial processing procedure, must seek a kind of control technology of developing reliably, easily, guarantee that the quality of mask satisfies various requirement.
Existing developing process mainly is the concentration that relies on the control developer solution, temperature in the developing process, the gimmick of developing and the time of development are controlled the precision of development, this method is subjected to the influence of process environments bigger, front end processing procedure to mask also has higher requirements, reach the high-precision stable control of mask, must guarantee the material settling out of mask, stablizing of exposure technology, stablizing of developing process, especially in development phase, main rely on realize the developing control of precision of two kinds of methods: 1, find out the development number of times of developer solution in the same container and the relation of development time based on a large amount of experiments, it is applied to actual production, development time is controlled according to the variation of solution level; 2, the constant concentration that keeps developer solution.Wherein the mode production operation of development time being controlled according to the variation of solution level realizes that difficulty is higher, and adopts the mode cost pressure of control solution level bigger.
The utility model content
The purpose of this utility model is to provide a kind of mask, and the control that is intended to solve in the prior art mask development precision realizes the problem that difficulty is higher or cost pressure is big.
The utility model is to realize like this, a kind of mask, described mask has development precision control icon, described development precision control icon includes first group of scale mark, described first group of scale mark is made up of one group of scale mark pattern, the live width of each scale mark pattern in described first group of scale mark is increasing or decreasing successively and changes, and the live width of each the scale mark pattern in described first group of scale mark is even.
In the utility model, by on mask, making development precision control icon, include one group of scale mark in this development precision control icon, every group of scale mark is by live width that increasing or decreasing changes in proper order and the uniform scale mark pattern of live width is formed, by monitoring the development degree of scale mark pattern in this scale mark, the development situation of change of scale mark and the development time of mask are organically combined, the final control development precision that realizes, reduced the influence of the variation of solution level simultaneously to the product precision, and no longer need according to the variation of solution level development time to be controlled, or keep the constant concentration of developer solution, realize simple and alleviated cost pressure, can judge the development degree of mask simultaneously according to this icon very easily, improve the stability and the trackability of processing procedure.
Description of drawings
Fig. 1 is the making schematic flow sheet of the mask that provides of prior art;
Fig. 2 is that the development precision control chart of the mask of the use positive-working photoresist that provides of the utility model first embodiment indicates intention;
Fig. 3 is that the development precision control chart of the mask of the use negative-working photoresist that provides of the utility model first embodiment indicates intention;
Fig. 4 is that the mask development precision control chart that the utility model second embodiment provides indicates intention;
Fig. 5 is that the mask development precision control chart that the utility model the 3rd embodiment provides indicates intention.
Embodiment
In order to make the purpose of this utility model, technical scheme and advantage clearer,, the utility model is further elaborated below in conjunction with drawings and Examples.Should be appreciated that specific embodiment described herein only in order to explanation the utility model, and be not used in qualification the utility model.
Among the utility model embodiment, on mask, make development precision control icon, include one or more groups scale mark in this development precision control icon, every group of scale mark is by live width that increasing or decreasing changes in proper order and the uniform scale mark pattern of live width is formed, and finally realizes controlling the development precision by the development degree of monitoring scale mark pattern in this scale mark.
Fig. 2 shows the development precision control icon of the mask that the utility model first embodiment provides, this development precision control icon includes first group of scale mark 1, first group of scale mark 1 is made up of one group of scale mark pattern, the live width of each scale mark pattern in first group of scale mark 1 is successively from top to bottom and increases progressively variation, can certainly be set to the variation of successively decreasing, each scale mark pattern form wherein can be rectangle, also can be the uniform pattern of other live widths, as live width uniform curve etc.When to through overexposure, when the mask that is coated with photoresists is carried out development treatment, can be by the development degree change of desired live width in first group of scale mark 1 of vision monitoring, judge the development degree that mask is current, for example suppose the scale mark pattern that the rectangle scale mark pattern 11 among Fig. 1 develops for expectation, rectangle scale mark pattern 12,13 live width respectively less than with live width greater than rectangle scale mark pattern 11, and photoresists are positive-working photoresist, if the maximum line width of the scale mark pattern of the current image that can develop is less than the live width of rectangle scale mark pattern 11, for example have only rectangle scale mark pattern 12 and live width less than the scale mark pattern of rectangle scale mark pattern 12 image that can develop, the lines that then show layout in the mask do not develop fully, and promptly mask is underdevelop; If the maximum line width of the scale mark pattern of the current image that can develop is greater than the live width of rectangle scale mark pattern 11, for example rectangle scale mark pattern 13 and live width are less than the scale mark pattern of rectangle scale mark pattern 13 image that can develop, the lines development degree that then shows layout in the mask has exceeded needs, i.e. the mask overdevelop.
Among the utility model embodiment, can learn the development degree of mask by the development degree of scale mark pattern in the monitoring scale mark, and then realization is to the control of mask development precision, and no longer need according to the variation of solution level development time to be controlled, or keep the constant concentration of developer solution, realize simple and alleviated cost pressure.
Among the utility model embodiment, development precision control icon further includes second group of scale mark 2, identical with first group of scale mark 1, second group of scale mark 2 is made up of one group of scale mark pattern equally, the live width of each scale mark pattern in second group of scale mark 2 is increasing or decreasing successively and changes, the live width of each scale mark pattern is even, and the maximum line width of scale mark pattern is less than the live width (is positive-working photoresist corresponding to photoresists) of the scale mark of desired development, as shown in Figure 2, or the minimum feature of scale mark pattern is greater than the live width (is negative-working photoresist corresponding to photoresists) of the scale mark of desired development, as shown in Figure 3, second group of scale mark 2 is applicable to extremely cooked situation, concrete monitoring judges that principle is as indicated above, repeats no more herein.
Further, in order in monitor procedure, more clearly to recognize the scale mark pattern in the development precision control icon, when making, the Design of length of scale mark pattern can also be changed for being certain rule, specifically see the development precision control icon of the mask that the utility model second embodiment shown in Fig. 4 provides and the development precision control icon of the mask that the utility model the 3rd embodiment shown in Fig. 5 provides.
Among the utility model embodiment, by on mask, making development precision control icon, include one or more groups scale mark in this development precision control icon, every group of scale mark is by live width that increasing or decreasing changes in proper order and the uniform scale mark pattern of live width is formed, as rectangular patterns, by monitoring the development degree of scale mark pattern in this scale mark, the development situation of change of scale mark and the development time of mask are organically combined, the final control development precision that realizes, reduced the influence of the variation of solution level simultaneously to the product precision, can judge the development degree of mask simultaneously according to this icon very easily, improve the stability and the trackability of processing procedure.
The above only is preferred embodiment of the present utility model; not in order to restriction the utility model; all any modifications of within spirit of the present utility model and principle, being done, be equal to and replace and improvement etc., all should be included within the protection domain of the present utility model.
Claims (4)
1, a kind of mask, it is characterized in that, described mask has development precision control icon, described development precision control icon includes first group of scale mark, described first group of scale mark is made up of one group of scale mark pattern, the live width of each scale mark pattern in described first group of scale mark is increasing or decreasing successively and changes, and the live width of each the scale mark pattern in described first group of scale mark is even.
2, mask as claimed in claim 1 is characterized in that, described scale mark pattern is a rectangular patterns.
3, mask as claimed in claim 1 or 2, it is characterized in that, described development precision control icon includes second group of scale mark, described second group of scale mark is made up of one group of scale mark pattern, the live width of each scale mark pattern in described second group of scale mark is the increasing or decreasing variation successively, and the live width of each the scale mark pattern in described second group of scale mark is even; The maximum line width of the scale mark pattern in described second group of scale mark is less than the live width of the scale mark of desired development.
4, mask as claimed in claim 1 or 2, it is characterized in that, described development precision control icon includes second group of scale mark, described second group of scale mark is made up of one group of scale mark pattern, the live width of each scale mark pattern in described second group of scale mark is the increasing or decreasing variation successively, and the live width of each the scale mark pattern in described second group of scale mark is even; The minimum feature of the scale mark pattern in described second group of scale mark is greater than the live width of the scale mark of desired development.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNU200820147200XU CN201237695Y (en) | 2008-09-05 | 2008-09-05 | Mask |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNU200820147200XU CN201237695Y (en) | 2008-09-05 | 2008-09-05 | Mask |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN201237695Y true CN201237695Y (en) | 2009-05-13 |
Family
ID=40650428
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNU200820147200XU Expired - Lifetime CN201237695Y (en) | 2008-09-05 | 2008-09-05 | Mask |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN201237695Y (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102683618A (en) * | 2011-03-15 | 2012-09-19 | 三星移动显示器株式会社 | Deposition mask |
-
2008
- 2008-09-05 CN CNU200820147200XU patent/CN201237695Y/en not_active Expired - Lifetime
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102683618A (en) * | 2011-03-15 | 2012-09-19 | 三星移动显示器株式会社 | Deposition mask |
| CN102683618B (en) * | 2011-03-15 | 2016-08-03 | 三星显示有限公司 | Deposition mas |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C56 | Change in the name or address of the patentee |
Owner name: QINGYI PRECISION MASKMAKING (SHENZHEN) CO., LTD. Free format text: FORMER NAME: SHENZHEN QINGYI PRECISION MASKMAKING CO.,LTD. |
|
| CP01 | Change in the name or title of a patent holder |
Address after: Two road high tech Industrial Zone in Shenzhen city Guangdong province 518057 North Song Ping Lang mountain No. 8 Patentee after: Qingyi Precision Maskmaking (Shenzhen) Co., Ltd. Address before: Two road high tech Industrial Zone in Shenzhen city Guangdong province 518057 North Song Ping Lang mountain No. 8 Patentee before: Qingyi Precision Mask Making (Shenzhen) Co., Ltd. |
|
| CX01 | Expiry of patent term |
Granted publication date: 20090513 |
|
| CX01 | Expiry of patent term |