CN201081534Y - Oxidation oven capable of preventing halt due to insufficient air drafting - Google Patents
Oxidation oven capable of preventing halt due to insufficient air drafting Download PDFInfo
- Publication number
- CN201081534Y CN201081534Y CNU2007200714312U CN200720071431U CN201081534Y CN 201081534 Y CN201081534 Y CN 201081534Y CN U2007200714312 U CNU2007200714312 U CN U2007200714312U CN 200720071431 U CN200720071431 U CN 200720071431U CN 201081534 Y CN201081534 Y CN 201081534Y
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- oxidation
- exhausting
- machine
- freely
- pipe support
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Abstract
The utility model provides an oxidation oven capable of avoiding machine delay due to unsmooth suction. Antifouling inert gas and reaction gas in the prior oxidation oven use the same suction device, thereby a phenomenon of machine delay due to unsmooth suction occurs. The oxidation oven capable of avoiding machine delay due to unsmooth suction of the utility model comprises an oxidation pipe support, oxidation pipes which are arranged inside the oxidation pipe support, and metal heating units which are arranged between the oxidation pipes and the oxidation pipe support, wherein, the oxidation pipes are used for draining the reaction gas for oxidation; the antifouling inert gas which is used for preventing metal pollution is drained between the oxidation pipe support and the oxidation pipes; the oxidation oven is provided with a first suction device corresponding to the reaction gas and also provided with a second suction device corresponding to the antifouling inert gas. By adoption of the oxidation oven of the utility mode, the phenomenon of machine delay due to unsmooth suction can be avoided.
Description
Technical field
The utility model relates to oxidation unit, particularly a kind of avoiding because of freely the do not delay oxidation furnace of machine of exhausting.
Background technology
For semiconductor devices, good and bad directly its electrical property of decision and the service life of quality of oxide layer.The making of oxide layer is normally carried out in oxidation furnace.
Referring to Fig. 1, existing oxidation furnace 1 comprises base station 10, oxidation pipe support 11, oxidation tube 12, METAL HEATING PROCESS unit 13, admission line 14 and 15, outlet pipe 16 and extractor fan 17, wherein, this oxidation pipe support 11 is arranged on the base station 10, oxidation tube 12 is arranged in the oxidation pipe support 11, this METAL HEATING PROCESS unit 13 is arranged on oxidation pipe support 11 and 12 of oxidation tubes and its and is the metallic resistance silk, this oxidation tube 12 is used for feeding reacting gas (hydrogen for example from admission line 14, oxygen and nitrogen or oxygen and nitrogen) wafer that is arranged on is wherein carried out oxidation, also be provided with the pressure control unit (not shown) that is used to regulate its internal pressure in this oxidation tube 12, antifouling noble gas (is generally nitrogen, its flow is generally 10 per minute standard liters) feed the metallic pollution of avoiding the 13 pairs of oxidation tubes 12 in METAL HEATING PROCESS unit from admission line 15, this reacting gas and this antifouling noble gas finally all enter outlet pipe 16, and discharge oxidation furnace 1 by extractor fan 17.
When in above-mentioned oxidation furnace, carrying out oxidation or passivation, the exhausting ability that extractor fan 17 can occur does not satisfy reacting gas and antifouling noble gas body and discharges the needs of oxidation furnace 1 simultaneously and the not smooth situation of exhausting promptly occurs, the pressure control unit that is arranged on this moment in the oxidation tube 12 just can't be controlled at the pressure in the oxidation tube 12 in the normal range (NR), the machine of delaying that so will cause oxidation furnace 1, just need do over again so carry out the wafer of oxidation in oxidation furnace, serious may causing scrapped.
So, how to provide a kind of oxidation furnace of avoiding freely not occurring the machine of delaying, become the technical problem that industry needs to be resolved hurrily because of exhausting.
The utility model content
The purpose of this utility model is to provide a kind of and avoids because of freely the do not delay oxidation furnace of machine of exhausting, can avoid oxidation furnace because of the exhausting machine of freely not delaying by described oxidation furnace.
The purpose of this utility model is achieved in that a kind of avoiding because of freely the do not delay oxidation furnace of machine of exhausting, this oxidation furnace comprise the oxidation pipe support, be arranged on the oxidation tube in the oxidation pipe support and be arranged on oxidation tube and the oxidation pipe support between the METAL HEATING PROCESS unit, this oxidation tube is used to feed reacting gas and carries out oxidation, be connected with the antifouling noble gas that is used to prevent metallic pollution between this oxidation pipe support and this oxidation tube, this oxidation furnace is to being provided with one first extractor fan by reacting gas, and this oxidation furnace is also to being provided with one second extractor fan by antifouling noble gas.
In the above-mentioned oxidation furnace of avoiding the machine of freely not delaying because of exhausting, this second extractor fan is an air pump.
In the above-mentioned oxidation furnace of avoiding the machine of freely not delaying because of exhausting, this first extractor fan is an air pump.
In the above-mentioned oxidation furnace of avoiding the machine of freely not delaying because of exhausting, this oxidation tube is a quartz ampoule.
In the above-mentioned oxidation furnace of avoiding the machine of freely not delaying because of exhausting, this antifouling noble gas is a nitrogen.
In the above-mentioned oxidation furnace of avoiding the machine of freely not delaying because of exhausting, this reacting gas is hydrogen, oxygen and nitrogen.
In the oxidation furnace of and the machine of delaying smooth in the above-mentioned oxidation furnace avoided exhausting, this reacting gas is oxygen and nitrogen.
Compare with the shared extractor fan of antifouling noble gas in the prior art and reacting gas, oxidation furnace of the present utility model is provided with first extractor fan and second extractor fan respectively at antifouling noble gas and reacting gas, so can avoid oxidation furnace because of exhausting freely the machine of delaying do not occur, improve the reliability of oxidation furnace greatly.
Description of drawings
Of the present utility model avoiding provided by following embodiment and accompanying drawing because of freely the do not delay oxidation furnace of machine of exhausting.
Fig. 1 is the composition structural representation of the oxidation furnace of prior art;
Fig. 2 avoids because of freely the do not delay composition structural representation of oxidation furnace of machine of exhausting for of the present utility model.
The specific embodiment
Below will be described in further detail because of freely the do not delay oxidation furnace of machine of exhausting of the present utility model avoiding.
Referring to Fig. 2, oxidation furnace 2 of the present utility model comprises base station 20, oxidation pipe support 21, oxidation tube 22, METAL HEATING PROCESS unit 23, admission line 24 and 25, outlet pipe 26 and 27, first extractor fan 28 and second extractor fan 29, wherein, this oxidation tube 22 is a quartz ampoule.Below above-mentioned member of the present utility model is elaborated.
Be provided with wafer-supporting platform (not shown), drive unit (not shown) in the base station 20 and be arranged on the baffle plate (not shown) that is used to seal oxidation tube 22 under the wafer-supporting platform, wherein, described wafer-supporting platform is used to be provided with the wafer that carries out oxidation, described drive unit drives wafer-supporting platform carrying wafer and enters oxidation tube 22, and described baffle plate enters oxidation tube 22 back sealing oxidation tubes 22 at wafer.
Described oxidation pipe support 21 corresponding wafer-supporting platforms are arranged on the base station 20, and oxidation tube 22 is arranged in the oxidation pipe support 21, and described METAL HEATING PROCESS unit 23 is arranged on oxidation pipe support 21 and 22 of oxidation tubes and its and is the metallic resistance silk.
Described oxidation tube 22 is used for feeding reacting gas (for example hydrogen and oxygen or oxygen) from admission line 24 and carries out oxidation, is provided with the pressure control unit (not shown) that is used to regulate its internal pressure in the described oxidation tube 22.
Reacting gas enters oxidation tube 22 from inlet channel 24, discharges oxidation furnace 2 from outlet passageway 26 then under the driving of first extractor fan 28.Antifouling noble gas (be generally nitrogen, flow is 10 per minute standard liters) feeds 22 of described oxidation pipe supports 21 and oxidation tubes from admission line 25, discharges oxidation furnaces 2 from outlet passageway 27 then under the driving of second extractor fan 29.
Described first extractor fan 28 and second extractor fan 29 are air pump.
When using oxidation furnace 2 of the present utility model to make oxide layer, at first oxidation tube 22 is heated to reaction temperature by METAL HEATING PROCESS unit 23, in heating, feed antifouling noble gas from inlet channel 25 and produce metallic pollution to avoid 23 pairs of oxidation tubes in METAL HEATING PROCESS unit 22, then wafer is arranged on the wafer-supporting platform in the base station 20, by drive unit described wafer is delivered in the oxidation tube 22 then, and baffle plate feeds oxidation tube 22 sealings reacting gas (this sentences oxygen and nitrogen is that example describes) from inlet channel 24 afterwards and carries out oxidation.In whole oxidizing process, reacting gas is by discharging oxidation furnace 2 from outlet passageway 26 under the driving of first extractor fan 28, and antifouling noble gas is discharged oxidation furnace 2 from outlet passageway 27 under the driving of first extractor fan 29.So, antifouling noble gas can not exert an influence to the exhaust of reacting gas.
In sum, oxidation furnace of the present utility model is provided with first extractor fan and second extractor fan respectively at antifouling noble gas and reacting gas, so can avoid the smooth and machine of delaying that occurs of exhausting, has improved the reliability of oxidation furnace greatly.
Claims (7)
1. can avoid because of freely the do not delay oxidation furnace of machine of exhausting for one kind, this oxidation furnace comprise the oxidation pipe support, be arranged on the oxidation tube in the oxidation pipe support and be arranged on oxidation tube and the oxidation pipe support between the METAL HEATING PROCESS unit, this oxidation tube is used to feed reacting gas and carries out oxidation, be connected with the antifouling noble gas that is used to prevent metallic pollution between this oxidation pipe support and this oxidation tube, this oxidation furnace is to being provided with one first extractor fan by reacting gas, it is characterized in that this oxidation furnace is also to being provided with one second extractor fan by antifouling noble gas.
2. as claimed in claim 1 avoiding is characterized in that because of freely the do not delay oxidation furnace of machine of exhausting this second extractor fan is an air pump.
3. as claimed in claim 1 avoiding is characterized in that because of freely the do not delay oxidation furnace of machine of exhausting this first extractor fan is an air pump.
4. as claimed in claim 1 avoiding is characterized in that because of freely the do not delay oxidation furnace of machine of exhausting this oxidation tube is a quartz ampoule.
5. as claimed in claim 1 avoiding is characterized in that because of freely the do not delay oxidation furnace of machine of exhausting this antifouling noble gas is a nitrogen.
6. as claimed in claim 1 avoiding is characterized in that because of freely the do not delay oxidation furnace of machine of exhausting this reacting gas is hydrogen, oxygen and nitrogen.
7. as claimed in claim 1 avoiding is characterized in that because of freely the do not delay oxidation furnace of machine of exhausting this reacting gas is oxygen and nitrogen.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNU2007200714312U CN201081534Y (en) | 2007-06-22 | 2007-06-22 | Oxidation oven capable of preventing halt due to insufficient air drafting |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNU2007200714312U CN201081534Y (en) | 2007-06-22 | 2007-06-22 | Oxidation oven capable of preventing halt due to insufficient air drafting |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN201081534Y true CN201081534Y (en) | 2008-07-02 |
Family
ID=39615203
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNU2007200714312U Expired - Lifetime CN201081534Y (en) | 2007-06-22 | 2007-06-22 | Oxidation oven capable of preventing halt due to insufficient air drafting |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN201081534Y (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2019233063A1 (en) * | 2018-06-08 | 2019-12-12 | 北京北方华创微电子装备有限公司 | Oxidizing furnace |
-
2007
- 2007-06-22 CN CNU2007200714312U patent/CN201081534Y/en not_active Expired - Lifetime
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2019233063A1 (en) * | 2018-06-08 | 2019-12-12 | 北京北方华创微电子装备有限公司 | Oxidizing furnace |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| ASS | Succession or assignment of patent right |
Owner name: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (BEIJING Free format text: FORMER OWNER: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION Effective date: 20130318 |
|
| C41 | Transfer of patent application or patent right or utility model | ||
| COR | Change of bibliographic data |
Free format text: CORRECT: ADDRESS; FROM: 201203 PUDONG NEW AREA, SHANGHAI TO: 100176 DAXING, BEIJING |
|
| TR01 | Transfer of patent right |
Effective date of registration: 20130318 Address after: 100176 No. 18, Wenchang Avenue, Beijing economic and Technological Development Zone Patentee after: Semiconductor Manufacturing International (Beijing) Corporation Address before: 201203 No. 18 Zhangjiang Road, Shanghai Patentee before: Semiconductor Manufacturing International (Shanghai) Corporation |
|
| CX01 | Expiry of patent term | ||
| CX01 | Expiry of patent term |
Granted publication date: 20080702 |