CN201077028Y - Modified chemical mechanical milling liquid container - Google Patents

Modified chemical mechanical milling liquid container Download PDF

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Publication number
CN201077028Y
CN201077028Y CNU2007200719477U CN200720071947U CN201077028Y CN 201077028 Y CN201077028 Y CN 201077028Y CN U2007200719477 U CNU2007200719477 U CN U2007200719477U CN 200720071947 U CN200720071947 U CN 200720071947U CN 201077028 Y CN201077028 Y CN 201077028Y
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CN
China
Prior art keywords
vessel
liquid
pipe road
mechanical grinding
modified chemical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
CNU2007200719477U
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Chinese (zh)
Inventor
陈肖科
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Semiconductor Manufacturing International Beijing Corp
Original Assignee
Semiconductor Manufacturing International Shanghai Corp
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Filing date
Publication date
Application filed by Semiconductor Manufacturing International Shanghai Corp filed Critical Semiconductor Manufacturing International Shanghai Corp
Priority to CNU2007200719477U priority Critical patent/CN201077028Y/en
Application granted granted Critical
Publication of CN201077028Y publication Critical patent/CN201077028Y/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Abstract

The utility model relates to a modified chemical mechanical grinding liquid vessel, comprising a vessel body, a discharge pipe and a charge pipe, wherein the discharge pipe is provided on the lower part of the vessel body, and put deeply into the inner of the vessel body; the charge pipe is provided on the upper part of the vessel body, and put deeply into the inner of the vessel body; the charge pipe is an annular structure; a plurality of nozzles directing to the inner wall of the vessel is provided on the annular structure charge pipeline; the annular structure charge pipeline is higher than the liquid level in the vessel; the annular structure charge pipeline is in parallel with the cross section of the vessel. The improving of the charge pipeline structure prevents the grinding liquid crystallization grain formed on the inner wall of the vessel, which guarantees the reasonable ratio of each chemical component in the grinding liquid and the product quality.

Description

A kind of modified chemical-mechanical grinding liquid container
Technical field
The utility model relates to a kind of container, specifically, is a kind of container of depositing chemical-mechanical grinding liquid.
Background technology
At microelectronic, the grinding of wafer is an indispensable production link.Chemical-mechanical grinding liquid is the lapping liquid that grinding wafer must use.Lapping liquid is a kind of mixed liquor, is mixed according to rational proportion by the number of chemical element.Lapping liquid is contained in the cmp container.Existing chemical-mechanical grinding liquid container as shown in Figure 1, it comprises: vessel 13, the fluid pipeline 12 that is arranged at vessel 13 bottoms and links to each other with vessel 13 is arranged at vessel 13 tops and gos deep into the direct insertion liquid-in pipe road 11 of vessel 13 inside.By water pump 15 lapping liquid 14 is pumped from fluid pipeline 12 during use, make make good use of after lapping liquid 14 get back in the vessel 13 by liquid-in pipe road 11 again, reuse.
When lapping liquid 14 is deposited in cmp vessel 13 or service time when of a specified duration; because lapping liquid 14 is mobile poor; chemical element in the lapping liquid 14 can be separated out from lapping liquid 14; on the inwall of vessel 13, form crystalline particle; make the chemical element proportion of composing imbalance in the lapping liquid 14; and crystalline particle can make crystal column surface scratch, and influences product quality.This just requires container 13 will often use washed with de-ionized water, and is clean the crystalline particle place to go on vessel 13 inwalls, wholely puts clean old lapping liquid 14, cleans, and disposes the process need 4.5 hours of new lapping liquid 14, influences production efficiency.
The utility model content
Technical problem to be solved in the utility model is, changes present lapping liquid and easily form crystalline particle on the vessel inwall, makes the chemical element proportion of composing imbalance in the lapping liquid, and crystalline particle can make crystal column surface scratch, and influences the problem of product quality.
In order to solve the problems of the technologies described above, the present invention has adopted following technological means: a kind of modified chemical-mechanical grinding liquid container, it comprises: vessel, the fluid pipeline that is arranged at the vessel bottom and links to each other with vessel, be arranged at vessel top and go deep into the liquid-in pipe road of vessel inside, its improvement is: described this part liquid-in pipe road in vessel inside is a loop configuration, and loop configuration liquid-in pipe road is provided with some spouts towards the vessel inwall in this section.
In above-mentioned modified chemical-mechanical grinding liquid container, described this part loop configuration liquid-in pipe road in vessel inside is higher than liquid level in the vessel.
In above-mentioned modified chemical-mechanical grinding liquid container, described this part loop configuration liquid-in pipe road and vessel transverse cross-section parallel in vessel inside.
In above-mentioned modified chemical-mechanical grinding liquid container, described this part loop configuration liquid-in pipe road in vessel inside is round.
In above-mentioned modified chemical-mechanical grinding liquid container, described this part loop configuration liquid-in pipe road in vessel inside is a square.
In above-mentioned modified chemical-mechanical grinding liquid container, described this part loop configuration liquid-in pipe road in vessel inside is irregular polygonal.
Modified chemical-mechanical grinding liquid container of the present utility model is owing to adopted technique scheme, make it compared with prior art, have the following advantages and good effect: original direct insertion liquid-in pipe road is improved in the liquid-in pipe road of vessel inner annular structure and the structure of vessel transverse cross-section parallel, this loop configuration liquid-in pipe road is provided with some spout and this loop configuration liquid-in pipe roads towards the vessel inwall and is higher than liquid level in the vessel, when the lapping liquid after using flows back in the vessel, grind the pond inwall by spraying to towards the spout that grinds the pond inwall, make inwall keep moistening, and make the lapping liquid of being close to inwall keep higher flowability, be difficult for making lapping liquid to form crystalline particle at inwall, guaranteed Grinding Quality, reduce the number of times that cleans the cmp container, improved production efficiency.
Description of drawings
Modified chemical-mechanical grinding liquid container of the present utility model is provided by following embodiment and accompanying drawing.
Fig. 1 is existing chemical-mechanical grinding liquid structure of container schematic diagram.
Fig. 2 is a kind of specific embodiment structural representation of the utility model chemical-mechanical grinding liquid container.
Fig. 3 is the utility model chemical-mechanical grinding liquid vessel inner annular structure liquid-in pipe road and spout structure schematic diagram.
The specific embodiment
Below with reference to accompanying drawing the utility model chemical-mechanical grinding liquid container is described in further detail, is specially following embodiment:
As shown in Figure 2, the utility model chemical-mechanical grinding liquid container comprises: vessel 23, the fluid pipeline 22 that is arranged at vessel 23 bottoms and links to each other with vessel 23, be arranged at vessel 23 tops and be the liquid-in pipe road 21 of circulus for one section in vessel 23 inside, at vessel 23 inner one section liquid level that are higher than lapping liquid 24 in the vessel 23 for the liquid-in pipe road 21 of circulus, the transverse cross-section parallel of this circulus liquid-in pipe road 21 and vessel 23, this loop configuration liquid-in pipe road 21 is provided with some spouts 26 towards vessel 23 inwalls, and the quantity setting of spout 26 is a standard with the lapping liquid 24 that can both obtain spout 26 ejections around the inwall that guarantees vessel 23.By water pump 25 lapping liquid 24 is pumped from fluid pipeline 22 during use, when the lapping liquid 24 after using flows back in the vessel 23, spray to container 23 inwalls by spout 26 towards vessel 23 inwalls, make inwall keep moistening, and make the lapping liquid of being close to inwall keep higher flowability, be difficult for making lapping liquid to form crystalline particle, thereby reduce the number of times that cleans the cmp pond at inwall, improve production efficiency, guaranteed Grinding Quality.
As shown in Figure 2, the utility model chemical-mechanical grinding liquid container itself in the foregoing description is shaped as drum type but is not limited to drum type.
As shown in Figure 2, in the utility model chemical-mechanical grinding liquid container in the foregoing description, described at vessel inner one section be round for the liquid-in pipe road of loop configuration but do not limit to and round, can do suitable adjustment according to the shape of vessel, as square, irregular polygonal
In the utility model chemical-mechanical grinding liquid container in the foregoing description, the setting of described spout quantity is a standard with the lapping liquid that can both obtain the spout ejection around the assurance vessel inwall, as shown in Figure 3, spout 36 has 6, being evenly distributed on vessel is that this vessel inner annular structure liquid-in pipe road is round on the liquid-in pipe road 31 of loop configuration for inner one section.

Claims (6)

1. modified chemical-mechanical grinding liquid container, it comprises: vessel, the fluid pipeline that is arranged at the vessel bottom and links to each other with vessel, be arranged at vessel top and go deep into the liquid-in pipe road of vessel inside, it is characterized in that: described this part liquid-in pipe road in vessel inside is a loop configuration, and loop configuration liquid-in pipe road is provided with some spouts towards the vessel inwall in this section.
2. modified chemical-mechanical grinding liquid container according to claim 1 is characterized in that, described this part loop configuration liquid-in pipe road in vessel inside is higher than liquid level in the vessel.
3. modified chemical-mechanical grinding liquid container according to claim 1 is characterized in that, described this part loop configuration liquid-in pipe road and vessel transverse cross-section parallel in vessel inside.
4. modified chemical-mechanical grinding liquid container according to claim 1 is characterized in that, described this part loop configuration liquid-in pipe road in vessel inside is round.
5. modified chemical-mechanical grinding liquid container according to claim 1 is characterized in that, described this part loop configuration liquid-in pipe road in vessel inside is a square.
6. modified chemical-mechanical grinding liquid container according to claim 1 is characterized in that, described this part loop configuration liquid-in pipe road in vessel inside is irregular polygonal.
CNU2007200719477U 2007-06-29 2007-06-29 Modified chemical mechanical milling liquid container Expired - Lifetime CN201077028Y (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CNU2007200719477U CN201077028Y (en) 2007-06-29 2007-06-29 Modified chemical mechanical milling liquid container

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CNU2007200719477U CN201077028Y (en) 2007-06-29 2007-06-29 Modified chemical mechanical milling liquid container

Publications (1)

Publication Number Publication Date
CN201077028Y true CN201077028Y (en) 2008-06-25

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Family Applications (1)

Application Number Title Priority Date Filing Date
CNU2007200719477U Expired - Lifetime CN201077028Y (en) 2007-06-29 2007-06-29 Modified chemical mechanical milling liquid container

Country Status (1)

Country Link
CN (1) CN201077028Y (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103406834A (en) * 2013-07-22 2013-11-27 中国科学院上海光学精密机械研究所 Inner wall protecting cover of comprehensive storage tank for magnetorheological fluid
CN112658991A (en) * 2020-12-16 2021-04-16 西安奕斯伟硅片技术有限公司 Polishing solution supply device
CN112658982A (en) * 2020-12-16 2021-04-16 西安奕斯伟硅片技术有限公司 Polishing solution supply device

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103406834A (en) * 2013-07-22 2013-11-27 中国科学院上海光学精密机械研究所 Inner wall protecting cover of comprehensive storage tank for magnetorheological fluid
CN112658991A (en) * 2020-12-16 2021-04-16 西安奕斯伟硅片技术有限公司 Polishing solution supply device
CN112658982A (en) * 2020-12-16 2021-04-16 西安奕斯伟硅片技术有限公司 Polishing solution supply device

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Date Code Title Description
C14 Grant of patent or utility model
GR01 Patent grant
ASS Succession or assignment of patent right

Owner name: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (BEIJING

Free format text: FORMER OWNER: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION

Effective date: 20130318

C41 Transfer of patent application or patent right or utility model
COR Change of bibliographic data

Free format text: CORRECT: ADDRESS; FROM: 201203 PUDONG NEW AREA, SHANGHAI TO: 100176 DAXING, BEIJING

TR01 Transfer of patent right

Effective date of registration: 20130318

Address after: 100176 No. 18, Wenchang Avenue, Beijing economic and Technological Development Zone

Patentee after: Semiconductor Manufacturing International (Beijing) Corporation

Address before: 201203 No. 18 Zhangjiang Road, Shanghai

Patentee before: Semiconductor Manufacturing International (Shanghai) Corporation

CX01 Expiry of patent term
CX01 Expiry of patent term

Granted publication date: 20080625