CN200953659Y - Double-layer quartz pipe water cooled sealing structure - Google Patents
Double-layer quartz pipe water cooled sealing structure Download PDFInfo
- Publication number
- CN200953659Y CN200953659Y CN 200620079789 CN200620079789U CN200953659Y CN 200953659 Y CN200953659 Y CN 200953659Y CN 200620079789 CN200620079789 CN 200620079789 CN 200620079789 U CN200620079789 U CN 200620079789U CN 200953659 Y CN200953659 Y CN 200953659Y
- Authority
- CN
- China
- Prior art keywords
- quartz ampoule
- rebound
- double
- quartz tube
- cavity
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Images
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
Abstract
The utility model discloses a double-layer water-cooled quartz tube hermetic structure, which comprises an internal quartz tube, an upper flange, a lower flange, a cushion and a gasket ring arranged at both ends of the internal quartz tube to fix and seal the internal quartz tube. Wherein, the internal quartz tube is externally provided with an external quartz tube. A cavity is arranged between the internal and external quartz tube. In addition, both ends of the external quartz tube are provided with a fixing and sealing device. The utility model has the advantages of simple structure, stable cooling effects and easy mounting and can vacuumize the cavity of the internal quartz tube to meet demand of special material production techniques, thus applying to high-temperature metal smelting industry, high-temperature semiconductor production industry, etc. as a high-temperature high-vacuum smelting chamber.
Description
Technical field
The utility model relates to a kind of quartz ampoule water cooled seal structure, particularly is applied to the double-deck quartz ampoule water cooled seal structure of industries such as vacuum metling, high temperature semiconductors material preparation.
Background technology
In the prior art, what be applied to that the quartz ampoule vacuum chamber in vacuum metling, high temperature semiconductors material growth field adopts is individual layer quartz ampoule structure, when this structure surpasses 2000 ℃ in pipe internal heat generation temperature, even if heater and quartz ampoule are isolated with isolated material, the quartz ampoule cavity temperature also can be very high, thereby influenced the condition of work of quartz ampoule and two end flanges, rubber seal and outside induction coil, caused easily that the quartz ampoule temperature distributing disproportionation is even, the problems such as high-temperature oxydation of the aging and induction coil of two end flanges rubber seal.For the temperature rise that reduces quartz ampoule with avoid non-uniform temperature to cause thermal stress to quartz ampoule, adopt the mode degree of cooling of external electric fan air blast cooling at present, DeGrain not only, also cause new non-uniform temperature problem because of the wind-force inequality easily, and noise is big, is difficult to satisfy the needs of industries such as the smelting of high temperature high vacuum, the growth of high temperature semiconductors material.
Summary of the invention
The purpose of this utility model provides a kind of double-deck quartz ampoule water cooled seal structure, solved individual layer quartz ampoule structure because problem such as the sealing ring that temperature rise and temperature rise inequality cause is aging, the life-span is short and the easy oxidation of induction coil is smoldered, simple in structure, easy to install, be suitable for industries such as high temperature high vacuum smelting industry, the growth of high temperature semiconductors material.
The technical scheme that the utility model adopted is, a kind of double-deck quartz ampoule water cooled seal structure, comprise interior quartz ampoule, respectively be arranged in the quartz ampoule two ends, be used for fixing upper flange, lower flange, cushion pad and the sealing ring of quartz ampoule in the sealing, interior quartz ampoule is set with outer quartz ampoule outward, form a cavity between interior quartz ampoule and the outer quartz ampoule, the two ends of outer quartz ampoule also are provided with the fixing seal device.
Characteristics of the present utility model also are:
The fixing seal device comprises last rebound and the following rebound that is arranged at outer quartz ampoule two ends, seal by the O RunddichtringO respectively between last rebound, following rebound and the outer quartz ampoule, the outer wall of outer quartz ampoule, fixedly connected a top board on last rebound and the O RunddichtringO, fixedly connected a lower platen on following rebound and the O RunddichtringO, have apopore and inlet opening on last rebound and the following rebound, the cavity that forms between apopore and inlet opening and interior quartz ampoule, the outer quartz ampoule communicates.
The inlet opening becomes 180 ° of layouts with apopore.
In the cavity between interior quartz ampoule and the outer quartz ampoule, apopore is provided with the place of communicating of cavity and divides water ring, and the inlet opening is provided with down with the place of communicating of cavity divides water ring, divides on water ring and the following minute water ring to have the limbers.
The limbers evenly was provided with in last the branch on water ring and the following minute water ring.
The utility model adopts inside and outside quartz ampoule fabricated construction, has realized that pipe intraformational bed cooling water evenly distributes, and cooling effect is stable.Simple in structure, easy installation and reliable, internally the inner chamber of quartz ampoule vacuumizes, and satisfying special material preparation technology's needs, thereby can be used for the vacuum metling chamber of industries such as high temperature high vacuum smelting industry and the growth of high temperature semiconductors functional material.
Description of drawings
Fig. 1 is a structural representation of the present utility model,
Fig. 2 is an application example schematic diagram of the present utility model.
Among the figure, 1. lower flange, 2. cushion pad, 3. sealing ring, 4. descend rebound, 5. the branch water ring is 6. descended in the inlet opening, the 7.O RunddichtringO, 8. lower platen, 9. top board, 10. upper flange, 11. apopores, 12. last rebound, 13. limbers, 14. interior quartz ampoules, 15. outer quartz ampoules, 16. induction heating circle, 17. heat-insulation layers, 18. heated objects, 19. support bars, 20. last water ring, 21. attachment screws, 22. housing screws of dividing.
Embodiment
Below in conjunction with the drawings and specific embodiments the utility model is elaborated.
The double-deck quartz ampoule water cooled seal of the utility model structure as shown in Figure 1, double-deck quartz ampoule water cooled seal structure, quartz ampoule 14 in comprising, respectively be arranged in quartz ampoule 14 two ends, be used for fixing upper flange 10, lower flange 1, cushion pad 2 and the sealing ring 3 of quartz ampoule 14 in the sealing, be set with outer quartz ampoule 15 outside the interior quartz ampoule 14, form a cavity between interior quartz ampoule 4 and the outer quartz ampoule 15, the two ends of outer quartz ampoule 15 also are provided with the fixing seal device.The fixing seal device comprises last rebound 12 and the following rebound 4 that is arranged at outer quartz ampoule 15 two ends.Seal by O RunddichtringO 7 respectively between last rebound 12, following rebound 4 and the outer quartz ampoule 15, the outer wall of outer quartz ampoule 15, fixedly connected a top board 9 on last rebound 12 and the O RunddichtringO 7, fixedly connected a lower platen 8 on following rebound 4 and the O RunddichtringO 7, have apopore 11 and inlet opening 5 on last rebound 12 and the following rebound 4, the cavity of formation communicates between apopore 11 and inlet opening 5 and interior quartz ampoule 14, the outer quartz ampoule 15.The upper and lower part unanimity of double-deck quartz ampoule water cooled seal structure, the apopore 11 that just last rebound 9 is provided with is provided with the 5 one-tenth 180 ° of layouts in inlet opening with following rebound 4.
For guaranteeing the even distribution of cooling water, in the cavity between interior quartz ampoule 14 and the outer quartz ampoule 15, apopore 11 is provided with the place of communicating of cavity and divides water ring 20, inlet opening 5 is provided with down with the place of communicating of cavity divides water ring 6, have limbers 13 last the branch on water ring 20 and the following minute water ring 6, and limbers 13 evenly was provided with in last the branch on water ring 20 and the following minute water ring 6.
Fig. 2 is the application schematic diagram of the double-deck quartz ampoule water cooled seal of the utility model structure, among the figure, heated object 18 is incorporated in the interior quartz ampoule 14 by support bar 19, load coil 16 is installed in the outside of outer quartz ampoule 15, during the preparation material, heat by 16 pairs of heated objects 18 of load coil, this moment, cooling water 5 entered from the inlet opening, by dividing limbers 13 on the water ring mobile in the interlayer between quartz ampoule 14 and the outer quartz ampoule 15 in entering equably up and down, internally, outer quartz ampoule cools off the back and flows out from apopore 11, realize the function of double-deck quartz ampoule water cooled seal structure, thereby finish material preparation process.At special material preparation technology's needs, the inner chamber by internal quartz ampoule 14 vacuumizes, and also can form the vacuum metling chamber and prepare material.
The double-deck quartz ampoule water cooled seal of the utility model structure adopts inside and outside quartz ampoule assembled hermetically-sealed construction, and pipe intraformational bed cooling water evenly distributes, and cooling effect is stable.The utility model is simple in structure, easy installation and reliable, internally the inner chamber of quartz ampoule vacuumizes, and satisfying special material preparation technology's needs, thereby can be used as the vacuum metling chamber and is used for industries such as high temperature high vacuum smelting industry and the growth of high temperature semiconductors functional material.
Claims (5)
1. double-deck quartz ampoule water cooled seal structure, comprise interior quartz ampoule (14), respectively be arranged at interior quartz ampoule (14) two ends, be used for fixing upper flange (10), lower flange (1), cushion pad (2) and the sealing ring (3) of quartz ampoule (14) in the sealing, it is characterized in that, the outer outer quartz ampoule (15) that is set with of quartz ampoule (14) in described, form a cavity between interior quartz ampoule (14) and the outer quartz ampoule (15), the two ends of described outer quartz ampoule (15) also are provided with the fixing seal device.
2. double-deck quartz ampoule water cooled seal structure according to claim 1, it is characterized in that, described fixing seal device comprises last rebound (12) and the following rebound (4) that is arranged at outer quartz ampoule (15) two ends, the described rebound (12) of going up, seal by O RunddichtringO (7) respectively between following rebound (4) and the outer quartz ampoule (15), the outer wall of described outer quartz ampoule (15), fixedly connected a top board (9) on last rebound (12) and the O RunddichtringO (7), fixedly connected a lower platen (8) on following rebound (4) and the O RunddichtringO (7), described going up on rebound (12) and the following rebound (4) has apopore (11) and inlet opening (5), apopore (11) and inlet opening (5) and interior quartz ampoule (14), the cavity that forms between the outer quartz ampoule (15) communicates.
3. double-deck quartz ampoule water cooled seal structure according to claim 2 is characterized in that described inlet opening (5) become 180 ° of layouts with apopore (11).
4. according to claim 2 or 3 described double-deck quartz ampoule water cooled seal structures, it is characterized in that, in the cavity in described between quartz ampoule (14) and the outer quartz ampoule (15), apopore (11) is provided with the place of communicating of cavity and divides water ring (20), inlet opening (5) is provided with down with the place of communicating of cavity divides water ring (6), and described going up on branch water ring (20) and the following minute water ring (6) has limbers (13).
5. double-deck quartz ampoule water cooled seal structure according to claim 4 is characterized in that, described limbers (13) go up evenly setting at last water ring (20) and the following minute water ring (6) of dividing.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200620079789 CN200953659Y (en) | 2006-09-14 | 2006-09-14 | Double-layer quartz pipe water cooled sealing structure |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200620079789 CN200953659Y (en) | 2006-09-14 | 2006-09-14 | Double-layer quartz pipe water cooled sealing structure |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN200953659Y true CN200953659Y (en) | 2007-09-26 |
Family
ID=38811960
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 200620079789 Expired - Lifetime CN200953659Y (en) | 2006-09-14 | 2006-09-14 | Double-layer quartz pipe water cooled sealing structure |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN200953659Y (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102011174A (en) * | 2010-11-30 | 2011-04-13 | 江苏华盛天龙光电设备股份有限公司 | Air-cooled sleeve for straight pull type silicon single crystal growing furnace |
| CN104233460A (en) * | 2013-06-09 | 2014-12-24 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Reaction chamber and MOCVD equipment provided with reaction chamber |
| CN109666971A (en) * | 2017-10-16 | 2019-04-23 | 北京北方华创微电子装备有限公司 | Growth furnace |
| CN112391610A (en) * | 2021-01-21 | 2021-02-23 | 北京凯德石英股份有限公司 | Quartz cooling tube and production equipment thereof |
| CN112665387A (en) * | 2020-12-04 | 2021-04-16 | 深圳市拉普拉斯能源技术有限公司 | Hot stove cooling structure based on quartz capsule layering |
| CN112665388A (en) * | 2020-12-04 | 2021-04-16 | 深圳市拉普拉斯能源技术有限公司 | Hot stove cooling structure |
-
2006
- 2006-09-14 CN CN 200620079789 patent/CN200953659Y/en not_active Expired - Lifetime
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102011174A (en) * | 2010-11-30 | 2011-04-13 | 江苏华盛天龙光电设备股份有限公司 | Air-cooled sleeve for straight pull type silicon single crystal growing furnace |
| CN102011174B (en) * | 2010-11-30 | 2012-07-25 | 江苏华盛天龙光电设备股份有限公司 | Air-cooled sleeve for straight pull type silicon single crystal growing furnace |
| CN104233460A (en) * | 2013-06-09 | 2014-12-24 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Reaction chamber and MOCVD equipment provided with reaction chamber |
| CN104233460B (en) * | 2013-06-09 | 2017-03-22 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Reaction chamber and MOCVD equipment provided with reaction chamber |
| CN109666971A (en) * | 2017-10-16 | 2019-04-23 | 北京北方华创微电子装备有限公司 | Growth furnace |
| CN112665387A (en) * | 2020-12-04 | 2021-04-16 | 深圳市拉普拉斯能源技术有限公司 | Hot stove cooling structure based on quartz capsule layering |
| CN112665388A (en) * | 2020-12-04 | 2021-04-16 | 深圳市拉普拉斯能源技术有限公司 | Hot stove cooling structure |
| CN112391610A (en) * | 2021-01-21 | 2021-02-23 | 北京凯德石英股份有限公司 | Quartz cooling tube and production equipment thereof |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN200953659Y (en) | Double-layer quartz pipe water cooled sealing structure | |
| CN103649369B (en) | The admission gear of CVD reactor | |
| CN102703966B (en) | A kind of device of seed temperature gradient method growing silicon carbide single crystal | |
| CN202430352U (en) | High-temperature spinning manifold | |
| US8377208B2 (en) | System and method for manufacturing polycrystal silicon | |
| CN103526186A (en) | Wafer loading disc for MOCVD (metal organic chemical vapor deposition) reactor and MOCVD reactor | |
| CN107400875A (en) | A kind of hot-filament chemical vapor deposition equipment | |
| CN110343897A (en) | A kind of preparation method and applications of crystalline flake graphite reinforced aluminum matrix composites | |
| CN106338197B (en) | A kind of vertical vacuum furnace | |
| CN104233460B (en) | Reaction chamber and MOCVD equipment provided with reaction chamber | |
| CN202116645U (en) | Multi-zone heating device of metal organic chemical vapor deposition device | |
| CN210314478U (en) | Pyrolysis furnace for vacuum coating | |
| CN102021660A (en) | Polysilicon crucible sintering furnace | |
| CN109721347B (en) | SiC whisker and C-AlPO4Preparation method of powder synergistic modified mullite coating | |
| CN101054257B (en) | Energy-saving quartz continuous melting furnace, energy-saving method and method for adjusting tube pulling specification | |
| CN209383850U (en) | It is a kind of for producing the chemical vapor deposition unit of silicon carbide epitaxial wafer | |
| CN210075613U (en) | Novel HVPE heater of high temperature resistance heating | |
| CN102320603B (en) | Heat-conducting oil silicon-core jacketed-type small bell cover for polycrystalline-silicon silane-decomposing furnace | |
| CN108106412B (en) | A kind of high efficiency brake disc production equipment and application | |
| CN2425427Y (en) | Molecular beam source furnace | |
| CN111809232A (en) | Batch purification device and method for raw materials by PVT (polyvinyl dichloride) method | |
| CN201990765U (en) | Sintering furnace of polycrystalline silicon crucible | |
| CN206438176U (en) | A kind of vacuum chamber high temperature CVD heating coil structures | |
| CN2876615Y (en) | Nested electrothermic diaphragm heating assembly | |
| CN207850117U (en) | A kind of energy-saving cold water tower |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| ASS | Succession or assignment of patent right |
Owner name: JIANGSU HUASHENG TIANLONG MACHINERY CO., LTD. Free format text: FORMER OWNER: XI AN UNIVERSITY OF TECHNOLOGY Effective date: 20081114 |
|
| C41 | Transfer of patent application or patent right or utility model | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20081114 Address after: Changzhou, Jiangsu Province, Jintan City, 1 mother Road No. 213200 Patentee after: Jiangsu Huashengtianlong Mechanical Co., Ltd. Address before: No. 5 Jinhua South Road, Shaanxi, Xi'an Province, China: 710048 Patentee before: Xi'an University of Technology |
|
| C56 | Change in the name or address of the patentee |
Owner name: JIANGSU HUASHENG TIANLONG PHOTOELECTRICITY EQUIPME Free format text: FORMER NAME: JIANGSU HUASHENG TIANLONG MACHINERY CO., LTD. |
|
| CP03 | Change of name, title or address |
Address after: Changzhou, Jiangsu Province, Jintan City, 1 mother Road No. 213200 Patentee after: Jiangsu Huasheng Tianlong Machinery Co., Ltd. Address before: Changzhou, Jiangsu Province, Jintan City, 1 mother Road No. 213200 Patentee before: Jiangsu Huashengtianlong Mechanical Co., Ltd. |
|
| CX01 | Expiry of patent term |
Granted publication date: 20070926 |
|
| EXPY | Termination of patent right or utility model |