CN210075613U - Novel HVPE heater of high temperature resistance heating - Google Patents
Novel HVPE heater of high temperature resistance heating Download PDFInfo
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- CN210075613U CN210075613U CN201920715002.7U CN201920715002U CN210075613U CN 210075613 U CN210075613 U CN 210075613U CN 201920715002 U CN201920715002 U CN 201920715002U CN 210075613 U CN210075613 U CN 210075613U
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Abstract
The utility model provides a novel HVPE heater of high temperature resistance heating, including last rack, well rack, lower rack and vacuum heating cavity, the vacuum heating cavity is installed in well rack, terminal surface installation cavity lower cover under the vacuum heating cavity, elevating system under the terminal surface installation under the cavity lower cover, elevating system installs under in the rack down, cover terminal surface installation high temperature heater one under the cavity, the source crucible is installed to high temperature heater one in, vacuum heating cavity up end installation cavity upper cover, and the inside side-mounting high temperature heater two of vacuum heating cavity, elevating system is gone up in the terminal surface installation to the cavity, it installs in last rack to go up elevating system, the interior bushing pipe of terminal surface installation on the cavity, compare with prior art, the utility model discloses following beneficial effect has: the temperature range of process development of compound semiconductors such as GaN or AlN is increased, and the limitations of development and production are reduced.
Description
Technical Field
The utility model relates to a novel HVPE heater of high temperature resistance heating belongs to HVPE heater technical field.
Background
HVPE is applied to the growth of crystal and thick film process of compound semiconductors such as GaN, AlN and the like in the industries of semiconductor power devices, LEDs and the like.
At present, a heating system of an HVPE system used in the industry mostly adopts a resistance heating mode, the heating can be carried out to 1200 ℃ at most, higher temperature is difficult to realize, a great deal of difficulty is brought to research and development and production of crystal or thick film processes of compound semiconductors such as GaN or AlN, and the difficulty of process research and development and the improvement of product performance are greatly increased.
SUMMERY OF THE UTILITY MODEL
The not enough that exists to prior art, the utility model aims at providing a novel high temperature resistance heating's HVPE heater to propose HVPE system and adopt the resistance heating mode in solving above-mentioned background art, highest heatable to 1200 ℃, be difficult to realize higher temperature, brought a great deal of difficulty to compound semiconductor like the research and development and the production of crystal or thick film technology such as GaN or AlN, greatly increased the degree of difficulty of technology research and development and produce the problem that the property performance promoted, the utility model provides the high temperature range of compound semiconductor's technology research and development reduces the limitation of research and development and production.
In order to achieve the above purpose, the present invention is realized by the following technical solution: a novel high-temperature resistance heating HVPE heater comprises an upper cabinet, a middle cabinet, a lower cabinet and a vacuum heating cavity, wherein the middle cabinet is arranged on the upper end face of the lower cabinet, the upper cabinet is arranged on the upper end face of the middle cabinet, the vacuum heating cavity is arranged in the middle cabinet, a cavity lower cover is arranged on the lower end face of the vacuum heating cavity, a lower lifting mechanism is arranged on the lower end face of the cavity lower cover, the lower lifting mechanism is arranged in the lower cabinet, a first high-temperature heater is arranged on the upper end face of the cavity lower cover, a source crucible is arranged in the first high-temperature heater, an air supply system is arranged on the right side of the lower cabinet and is connected with the cavity lower cover through a hose, a second high-temperature heater is arranged on the upper end face of the vacuum heating cavity, the upper lifting mechanism is arranged on the upper end face of the cavity upper cover, the upper lifting mechanism is arranged in the upper cabinet, the upper end face of the upper cavity cover is provided with a lining pipe, the lower end of the lining pipe extends into the high-temperature heater II, a support plate is installed in the upper cabinet, the upper end face of the support plate is provided with a threaded hole, a threaded rod is engaged in the threaded hole, the lower end of the threaded rod extends into the lining pipe and is provided with a substrate, the left side of the lower cabinet is provided with a vacuum system, and the vacuum system is connected with the upper cavity cover through a vacuum pipeline.
Furthermore, a sealing electrode is arranged on the upper end face of the cavity upper cover and sleeved on the lining pipe.
Further, the lower lifting mechanism comprises a first servo motor, a first screw rod and a first ball nut pair, the first servo motor is installed on the lower end face of the inner portion of the lower cabinet, the first screw rod is installed at the output end of the first servo motor, the upper end of the first screw rod is in rolling connection with the lower cabinet through a rolling bearing, the first screw rod is sleeved with the first ball nut pair, and the first ball nut pair is fixedly connected with the lower cavity cover.
Furthermore, the ascending and descending mechanism comprises a second servo motor, a second screw rod and a second ball nut pair, the second servo motor is installed on the upper end face inside the upper cabinet, the second screw rod is installed at the output end of the second servo motor, the lower end of the second screw rod is in rolling connection with the upper cabinet through a rolling bearing, the second ball nut pair is sleeved on the second screw rod, and the second ball nut pair is fixedly connected with the upper cover of the cavity.
The utility model has the advantages that: the utility model discloses utilize high temperature heater one and high temperature heater two warm areas that form two different temperatures in the vacuum heating cavity, satisfy compound semiconductor and need go on under vacuum state or atmospheric pressure state like the crystal or thick film growth technology of GaN or AlN etc. to need the requirement of two different temperature warm areas, improve heating system's the highest intensification temperature, the highest temperature can reach 2200 ℃, improve compound semiconductor greatly like the temperature range of the technology research and development of GaN or AlN etc., the limitation of research and development and production has been reduced, make the performance index of product obtain great promotion.
Drawings
Other features, objects and advantages of the invention will become more apparent upon reading of the detailed description of non-limiting embodiments with reference to the following drawings:
FIG. 1 is a schematic structural view of a novel HVPE heater with high temperature resistance heating according to the present invention;
in the figure: 1-upper cabinet, 2-middle cabinet, 3-lower cabinet, 4-vacuum system, 5-lower lifting mechanism, 6-gas supply system, 7-cavity lower cover, 8-high temperature heater I, 9-source crucible, 10-vacuum heating cavity, 11-substrate, 12-high temperature heater II, 13-threaded rod, 14-cavity upper cover, 15-lining tube, 16-upper lifting mechanism and 17-support plate.
Detailed Description
In order to make the technical means, creation features, achievement purposes and functions of the present invention easy to understand, the present invention is further described below with reference to the following embodiments.
Referring to fig. 1, the present invention provides a technical solution: a novel HVPE heater heated by high-temperature resistance comprises an upper cabinet 1, a middle cabinet 2, a lower cabinet 3 and a vacuum heating cavity 10, wherein the middle cabinet 2 is arranged on the upper end surface of the lower cabinet 3, the upper cabinet 1 is arranged on the upper end surface of the middle cabinet 2, the vacuum heating cavity 10 is arranged in the middle cabinet 2, a cavity lower cover 7 is arranged on the lower end surface of the vacuum heating cavity 10, a lower lifting mechanism 5 is arranged on the lower end surface of the cavity lower cover 7, the lower lifting mechanism 5 is arranged in the lower cabinet 3, a high-temperature heater I8 is arranged on the upper end surface of the cavity lower cover 7, a source crucible 9 is arranged in the high-temperature heater I8, an air supply system 6 is arranged on the right side of the lower cabinet 3, the air supply system 6 is connected with the cavity lower cover 7 through a hose, a cavity upper cover 14 is arranged on the upper end surface of the vacuum heating cavity 10, a high-temperature heater II 12 is arranged on, the ascending and descending mechanism 16 is arranged in the upper cabinet 1, the upper end surface of the cavity upper cover 14 is provided with the lining pipe 15, the lower end of the lining pipe 15 extends into the second high-temperature heater 12, the upper cabinet 1 is internally provided with the carrier plate 17, the upper end surface of the carrier plate 17 is provided with a threaded hole, the threaded hole is internally engaged with the threaded rod 13, the lower end of the threaded rod 13 extends into the lining pipe 15 and is provided with the substrate 11, the left side of the lower cabinet 3 is provided with the vacuum system 4, the vacuum system 4 is connected with the cavity upper cover 14 through a vacuum pipeline, the crystal or thick film growth process of compound semiconductors such as GaN or AlN and the like needs to be carried out in a vacuum state or an atmospheric pressure state and needs two temperature zones with different temperatures, the first high-temperature heater 8 and the second high-temperature heater 12 provide two temperature zones with different temperatures, the metal source is arranged in the source crucible 9 and is arranged in the first high-, reaction products enter a second high-temperature heater 12 of the vacuum heating cavity 10 through carrier gas and other process gases at the same time, the substrate 11 is also positioned in the second high-temperature heater 12, the source reaction products and the process gases react in a high-temperature zone (up to 2200 ℃) of the second high-temperature heater 12, the reactants directly grow on the substrate 11, and the substrate 11 can be micro-pulled by screwing a threaded rod 13 according to the growth time, so that the reactants can uniformly and stably grow on the substrate 11, and the reactants grow into a thick film or crystal state. Because the first high-temperature heater 8 and the second high-temperature heater 12 can independently heat, two temperature areas with different high temperatures can be realized, the requirements of research and development and production can be greatly met, growth processes under various high-temperature conditions are carried out, the temperature range of process research and development of compound semiconductors such as GaN or AlN is greatly improved, the limitations of research and development and production are reduced, the performance index of products is greatly improved, and the requirements of customers on various different processes are met.
As an embodiment of the present invention: the upper end face of the cavity upper cover 14 is provided with a sealing electrode which is sleeved on the lining tube 15, and the lining tube 15 and the cavity upper cover 14 are convenient to assemble with each other due to the design of the sealing electrode.
As an embodiment of the present invention: the lower lifting mechanism 5 comprises a first servo motor, a first screw rod and a first ball nut pair, the first servo motor is installed on the lower end face of the inner portion of the lower cabinet 3, the first screw rod is installed at the output end of the first servo motor, the upper end of the first screw rod is in rolling connection with the lower cabinet 3 through a rolling bearing, the first screw rod is sleeved with the first ball nut pair, the first ball nut pair is fixedly connected with the lower cavity cover 7, when the servo motor is operated, the first servo motor drives the first screw rod to rotate, the first ball nut pair converts the rotating motion of the first screw rod into linear motion and drives the lower cavity cover 7 to move, and the lower cavity cover 7 is tightly attached to the lower end face of the vacuum heating cavity.
As an embodiment of the present invention: the ascending and descending mechanism 16 comprises a second servo motor, a second screw rod and a second ball nut pair, the second servo motor is installed on the upper end face inside the upper cabinet 1, the second screw rod is installed at the output end of the second servo motor, the lower end of the second screw rod is in rolling connection with the upper cabinet 1 through a rolling bearing, the second ball nut pair is sleeved on the second screw rod and fixedly connected with the cavity upper cover 14, when the second servo motor is operated, the second servo motor drives the second screw rod to rotate, the second ball nut pair converts the rotary motion of the second screw rod into linear motion and drives the cavity upper cover 14 to move until the cavity upper cover 14 is tightly attached to the upper end face of the vacuum heating cavity 10.
The above description is only a preferred embodiment of the present invention, and the present invention is not limited to the above embodiments, and although the present invention has been disclosed with the preferred embodiments, it is not limited to the present invention, and any skilled person in the art can make some modifications or equivalent embodiments without departing from the scope of the present invention, but all the technical matters of the present invention are within the scope of the present invention.
Claims (4)
1. The utility model provides a novel HVPE heater of high temperature resistance heating, includes rack, well rack, lower rack and vacuum heating cavity, its characterized in that: the middle machine cabinet is arranged on the upper end surface of the lower machine cabinet, the upper machine cabinet is arranged on the upper end surface of the middle machine cabinet, the vacuum heating cavity is arranged in the middle machine cabinet, the lower end surface of the vacuum heating cavity is provided with a cavity lower cover, the lower end surface of the cavity lower cover is provided with a lower lifting mechanism, the lower lifting mechanism is arranged in the lower machine cabinet, the upper end surface of the cavity lower cover is provided with a first high-temperature heater, a source crucible is arranged in the first high-temperature heater, the right side of the lower machine cabinet is provided with an air supply system, the air supply system is connected with the cavity lower cover through a hose, the upper end surface of the vacuum heating cavity is provided with an upper cavity cover, a second high-temperature heater is arranged on the upper side in the vacuum heating cavity, the upper end surface of the cavity upper cover is provided with an upper lifting mechanism, the upper end surface of the cavity upper, a support plate is installed in the upper cabinet, a threaded hole is formed in the upper end face of the support plate, a threaded rod is engaged in the threaded hole, the lower end of the threaded rod extends into the lining pipe and is provided with a substrate, a vacuum system is arranged on the left side of the lower cabinet, and the vacuum system is connected with the upper cover of the cavity through a vacuum pipeline.
2. The HVPE heater of claim 1, wherein: and a sealing electrode is arranged on the upper end surface of the cavity upper cover and sleeved on the lining pipe.
3. The HVPE heater of claim 1, wherein: the lower lifting mechanism comprises a first servo motor, a first screw rod and a first ball nut pair, the first servo motor is installed on the lower end face of the inner portion of the lower cabinet, the first screw rod is installed at the output end of the first servo motor, the upper end of the first screw rod is in rolling connection with the lower cabinet through a rolling bearing, the first screw rod is sleeved with the first ball nut pair, and the first ball nut pair is fixedly connected with the lower cavity cover.
4. The HVPE heater of claim 1, wherein: the lifting mechanism comprises a second servo motor, a second screw rod and a second ball nut pair, the second servo motor is installed on the upper end face inside the upper cabinet, the second screw rod is installed at the output end of the second servo motor, the lower end of the second screw rod is in rolling connection with the upper cabinet through a rolling bearing, the second ball nut pair is sleeved on the second screw rod, and the second ball nut pair is fixedly connected with the upper cover of the cavity.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201920715002.7U CN210075613U (en) | 2019-05-19 | 2019-05-19 | Novel HVPE heater of high temperature resistance heating |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201920715002.7U CN210075613U (en) | 2019-05-19 | 2019-05-19 | Novel HVPE heater of high temperature resistance heating |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN210075613U true CN210075613U (en) | 2020-02-14 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201920715002.7U Active CN210075613U (en) | 2019-05-19 | 2019-05-19 | Novel HVPE heater of high temperature resistance heating |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN210075613U (en) |
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2019
- 2019-05-19 CN CN201920715002.7U patent/CN210075613U/en active Active
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