CN1966234A - Stamper, imprinting method, and method of manufacturing an information recording medium - Google Patents
Stamper, imprinting method, and method of manufacturing an information recording medium Download PDFInfo
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- CN1966234A CN1966234A CNA2006101285437A CN200610128543A CN1966234A CN 1966234 A CN1966234 A CN 1966234A CN A2006101285437 A CNA2006101285437 A CN A2006101285437A CN 200610128543 A CN200610128543 A CN 200610128543A CN 1966234 A CN1966234 A CN 1966234A
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- 238000000034 method Methods 0.000 title claims description 59
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Images
Classifications
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- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G11B5/855—Coating only part of a support with a magnetic layer
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B23/00—Record carriers not specific to the method of recording or reproducing; Accessories, e.g. containers, specially adapted for co-operation with the recording or reproducing apparatus ; Intermediate mediums; Apparatus or processes specially adapted for their manufacture
- G11B23/0057—Intermediate mediums, i.e. mediums provided with an information structure not specific to the method of reproducing or duplication such as matrixes for mechanical pressing of an information structure ; record carriers having a relief information structure provided with or included in layers not specific for a single reproducing method; apparatus or processes specially adapted for their manufacture
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
Abstract
A stamper has stamper-side concave/convex patterns forming a concave part having desired open length with high accuracy and is capable of manufacturing an information recording medium on which data track patterns and servo patterns are formed by concave/convex patterns. A plurality of types of convex parts with different heights from a reference plane, which is set between a front surface and a rear surface, to protruding ends of the convex parts are formed in the stamper-side concave/convex patterns. Second convex parts, at least one part of which has the height that is higher than the height of a highest first convex part out of the convex parts formed in regions corresponding to the data track patterns, are formed in regions corresponding to the servo patterns.
Description
Technical field
Push pressing mold on the pressing mold (stamper) that the present invention relates to when manufacturing information recording medium, to use, the resin bed that is being formed on substrate material surface and duplicate the method for stamping of its concaveconvex shape and the information recording medium-manufacturing method that utilizes the relief pattern manufacturing information recording medium of on resin bed, duplicating.
Background technology
In the operation of manufacturing information recording medium, as being formed on the method that the resist layer of substrate material surface (resin bed) go up to form fine relief pattern (resist pattern), known in the past have a photoetching process.In this photoetching process, the resist layer that is formed on the matrix material forms exposing patterns through irradiation light, then resist layer is carried out video picture and handles, and forms relief pattern with this on matrix material.Again, in recent years,, worked out replacement light, drawn the pattern of nano-scale, formed the electron beam slabstone art of printing of relief pattern with the method for electron beam irradiation as forming the technology that trickleer pattern is used.But, in this electron beam slabstone art of printing, resist layer is carried out the time that pattern is drawn to be needed than long, therefore exist and produce inconvenient problem in enormous quantities.
As this in-problem technology of solution, No. 5772905 specifications of United States Patent (USP) disclose such method, the pressing mold of relief pattern that will form nano-scale exactly is by on the resin bed that is pressed on the matrix material, the concaveconvex shape of pressing mold is duplicated on resin bed, with this nano impression slabstone art of printing that forms the relief pattern of nano-scale on the matrix material (form the method for stamping of the relief pattern of nano-scale: below be also referred to as " method for stamping ").In this method for stamping, at first, shown in Figure 1A of this specification, be manufactured on pressing mold (mold) 10z (following) of the relief pattern that forms nano-scale (for example minimum widith is about 25nm) on its duplicating face to additional " z " expression on its each label of disclosed structural element in No. 5772905 specifications of United States Patent (USP).Specifically, on the resin bed that is covered with films such as lip-deep silica (molding layer) the 14z formation that is formed on silicon substrate 12z, draw after the desirable pattern with electronics bondstone plate printing equipment, utilize reactive Etaching device that resin bed is carried out etch processes as mask to film 14z, in the thickness of film 14z, form relief pattern with a plurality of protuberances (features) 16z with this.Make pressing mold 10z with this.
Then, on the surface of for example silicon system matrix material 18z rotation coating PMMA (methyl methacrylate) to form thickness be resin bed (film) 20z about 55nm.Then, laminated body and the pressing mold 10z of matrix material 18z and resin bed 20z is heated to 200 ℃, then shown in Figure 1B of this specification, with 13.1MPa (133.6 kilograms/cm
2) pressure with each protuberance 16z of pressing mold 10z by on the resin bed 20z that is pressed on the matrix material 18z.Then, the laminated body of pushing under the state of pressing mold 10z is placed cool to room temperature, peel off pressing mold 10z from resin bed 20z then.By means of this, shown in Fig. 1 C of this specification, each the protuberance 16z in the relief pattern of pressing mold 10z is duplicated at resin bed 20z, form a plurality of recesses (regions) 24z, (resin bed 20z) forms the relief pattern of nano-scale on matrix material 18z.
Patent documentation 1: No. 5772905 specifications of United States Patent (USP)
But, in existing method for stamping, have following problems.Just in this method for stamping, shown in Figure 1A, the 1B of this specification, height from the bottom surface of the recess of relief pattern to the outstanding end of each protuberance 16z evenly forms ground at Zone Full, that is to say, the outstanding end of each protuberance 16z forms the pressing mold 10z of plane earth formation in fact by being pressed on the resin bed 20z, forms relief pattern on matrix material 18z.In this case, on pressing mold 10z, formation is corresponding to the shape of the data track that should form (track) pattern and servo pattern, along with the length (hereinafter referred to as " length of circumferencial direction ") and length (hereinafter referred to as " radially length ") the different various protuberance 16zs of edge of the corresponding direction of the circumferencial direction (direction of rotation) of carrier corresponding to the direction radially of carrier.But in existing method for stamping, for at the Zone Full of pressing mold 10z with pressing force in fact uniformly with relief pattern by being pressed on the resin bed 20z, to be for example radially long, and fully to be pressed into resin bed 20z be difficult at the formation position of the also long protuberance 16z of the length of circumferencial direction.
Specifically, as shown in figure 28, each protuberance 16z of using of the formation data track pattern of carrier for example, though the length of its circumferencial direction is long, its length L 11 radially is shorter to the Zone Full of outer circumferential side in interior all sides of carrier.Therefore, forming radical length L11 relatively in the formation zone of the data track pattern of short protuberance 16z, PMMA (forming the resin material of resin bed 20z) is successfully moved to the recess on every side of each protuberance 16z, consequently, each protuberance 16z can be pressed into resin bed 20z and be pressed into enough dark place.Consequently, form in the zone at the data track pattern, the thickness T 11 of the residue of (bottom of recess 24z) between the outstanding end and matrix material 18z of each protuberance 16z can be formed on the matrix material 18z at the enough thin relief pattern of formation on the matrix material 18z.
By contrast, as shown in figure 29, for example guiding (preamble) pattern of the servo pattern in the servo pattern of carrier and sevtor address pattern form each protuberance 16z of usefulness, usually the interior perimembranous of its length radially and the carrier length that arrives peripheral part with respect to, long, and at the position corresponding with the peripheral part of carrier, the length L 12 of its circumferencial direction is also long.Therefore, servo pattern at the long formation protuberance 16z of the length L 12 of circumferencial direction forms zone (being that the guiding pattern forms the zone and the sevtor address pattern forms regional peripheral part in this example), it is difficult that PMMA is moved in the recess around each protuberance 16z smoothly, so be difficult to each protuberance 16z is pressed into resin bed 20z to enough dark place.Consequently, the peripheral part in should forming the zone of servo pattern (guiding pattern etc.), it is difficult that the outstanding end of each protuberance 16z and the residue thickness T 12 between the matrix material 18z are enough approached.
Again, for example the unit in the servo pattern in the carrier synchronously synchronization pattern of constituting by protuberance of (burst) zone protuberance 16z (recess between the unit retaining zone of synchronization pattern forms the protuberance 16z of usefulness) of forming usefulness be defined as and unit retaining zone corresponding concave part between the length of circumferencial direction slowly elongated from interior perimembranous to peripheral part.And the unit in the servo pattern in the carrier synchronously synchronization pattern of constituting by recess of (burst) zone each protuberance 16z (the unit retaining zone of synchronization pattern forms each protuberance 16z of usefulness) of forming usefulness be defined as the length of its circumferencial direction, compare with the protuberance 16z of interior perimembranous, the protuberance 16z of its peripheral part is slowly elongated to peripheral part from interior perimembranous.Therefore, servo pattern at the long protuberance 16z of the length that forms circumferencial direction forms zone (being that synchronization pattern forms the peripheral part in the zone) in this example, it is difficult that PMMA is moved in the recess around each protuberance 16z smoothly, so be difficult to each protuberance 16z is pressed into resin bed 20z to enough degree of depth.Consequently, the peripheral part in should forming the zone of servo pattern (synchronization pattern), it is difficult that the outstanding end of each protuberance 16z and the residue thickness between the matrix material 18z are enough approached.And, the synchronization pattern that is made of protuberance for the unit retaining zone forms the protuberance 16z of usefulness, because form the area ratio of the recess in the zone with synchronization pattern big,, probably also be difficult to be pressed into resin bed to enough dark place in the relatively shorter interior perimembranous of the length of circumferencial direction.
In this case, when utilizing the relief pattern manufacturing information recording medium be formed on the matrix material 18z, be necessary to utilize the residue of the bottom surface of each the recess 24zs of method from matrix material 18z removal relief pattern such as etch processes.Therefore, when utilizing existing method for stamping to form relief pattern on matrix material 18z, the residue that exists the thickness T 12 at the position (peripheral part in the formation zone of guiding pattern etc.) that the big protuberance 16z of the length L 12 of circumferencial direction for example is pressed into is removed the long problem of data that needs.And as mentioned above, for example the thickness T 11 of the residue at the position (the formation zone of data track pattern) that is pressed into of the short protuberance 16z of length L 11 radially is much thinner than thickness T 12.Therefore, so that can remove the residue of thickness T 12 fully the time, before the removal of the residue of thickness T 12 was finished, the removal of the residue of thickness T 11 can be finished in the etch processes of carrying out the enough time.Consequently, at the removed position of the residue of thickness T 11 (radical length is the recess 24z of length L 11), before the residue of thickness T 12 is removed fully, proceed etching,, enlarge the radical length (opening length) of recess 24z with the madial wall of this etch recess 24z.Therefore, in existing method for stamping, exist on matrix material 18z when forming relief pattern the problem that after residue the is removed length (opening length) of each recess 24z of (after the etch processes) is difficult to form desirable size.
The present invention makes in view of such problem, and its main purpose is, pressing mold, method for stamping and the information recording medium-manufacturing method that can form the relief pattern of the recess with desirable opening length with high accuracy are provided.
Summary of the invention
To achieve these goals, pressing mold of the present invention, can make the carrier ground formation die-side relief pattern that forms data track pattern and servo pattern with relief pattern, in described die-side relief pattern, formation is from the height different multiple protuberance of the datum level of stipulating between surface and the back side to outstanding end, compare simultaneously with corresponding to the 1st highly the highest described in described each protuberance of formation in the zone of described data track pattern protuberance, the 2nd protuberance that the described height at least a portion is higher is formed on the zone corresponding with described servo pattern.Also have, " surface of pressing mold " in this manual means " bottom surface of the recess of die-side relief pattern ", i.e. " the formation face of die-side relief pattern ".In this case, when the bottom surface of each recess in the die-side relief pattern is not same plane, with the bottom surface of some recesses (as an example, for example in the bottom surface of each recess near the bottom surface at the back side of pressing mold) as " surface of pressing mold " of the present invention.And the hypothesis " between the surface and the back side " of the present invention comprise " surface of pressing mold " and " back side of pressing mold " both.Again, the arbitrary face stipulated between meaning from the stamper surface to the back side of the what is called in this specification " datum level ".
Again, pressing mold of the present invention, in described die-side relief pattern, formation as described the 2nd protuberance along the 3rd protuberance that forms continuously with the radially corresponding direction of described carrier, described the 3rd protuberance the length of the direction corresponding with the circumferencial direction of described carrier than the big position of the length in described the 1st protuberance with described radially corresponding direction on, form described aspect ratio the 1st protuberance height.Also have, in this manual " (protuberance) length of the direction corresponding with circumferencial direction " is to mean " distance along the circumferential direction between the side wall surface of the mutual subtend of a protuberance ".Again, the what is called of this specification " with (protuberance) length of radially corresponding direction " means " distance radially between the side wall surface of the mutual subtend of a protuberance ".
Also have, pressing mold of the present invention, the pairing position of unit retaining zone of the synchronization pattern in the described servo pattern is made of recess, around this recess, form the 4th protuberance simultaneously as described the 2nd protuberance, to constitute described die-side relief pattern, described the 4th protuberance forms described the 1st protuberance height of described aspect ratio at least a portion.Also have, what is called in this manual " unit retaining zone " be meant in the carrier along the circumferential direction side by side a plurality of protuberances that are essentially parallelogram or ellipse (comprising circle) or each zone in the zone of a plurality of recesses.
Again, pressing mold of the present invention, described the 4th protuberance form described the 1st protuberance height of described aspect ratio of its Zone Full.
Again, method for stamping of the present invention, resin bed to the formation of coating resin material on the surface of matrix material, the pressing mold of carrying out the described die-side relief pattern push above-mentioned arbitrary pressing mold is in regular turn pushed and is handled and peel off the pressing mold lift-off processing of described pressing mold from described resin bed, and the concaveconvex shape of described die-side relief pattern is duplicated on described resin bed.
Again, information recording medium-manufacturing method of the present invention utilizes above-mentioned method for stamping, is used in the relief pattern manufacturing information recording medium of duplicating on the described resin bed.
Adopt pressing mold of the present invention, and the method for stamping that uses this pressing mold, then compare the 1st highly the highest protuberance in each protuberance corresponding with the data track pattern, the 2nd protuberance that the height of at least a portion is higher is formed in the zone corresponding with servo pattern and constitutes the die-side relief pattern, like this, when impression the Zone Full (the formation zone of data track pattern and the formation zone of servo pattern) of pressing mold with uniform pressure with pressing mold when being pressed on the resin bed, a large amount of servo patterns that exist of protuberance that are not easy to be pressed into resin bed can be formed each protuberance in the zone and be pressed into resin bed and arrive enough degree of depth.Therefore the data track pattern forms each protuberance that each protuberance in the zone and servo pattern form in the zone and can fully be pressed into resin bed with identical degree, consequently, can make the Zone Full homogenising of thickness on the whole substrate material of the residue on the matrix material.Therefore can make that the Zone Full of removing the needed time of residue is identical in fact, therefore the side wall surface that can avoid duplicating each recess in the relief pattern on resin bed in the zone corresponding with the data track pattern is by etch, and the state of affairs that each recess forms undesired big A/F takes place.By means of this, can form the relief pattern of recess with high accuracy in two zones of data track area of the pattern and servo pattern zone with desirable A/F.And the relief pattern manufacturing information recording medium that can utilize high accuracy to form, can make the carrier that is not easy to take place the recording playback mistake with this.
Adopt pressing mold of the present invention, and the method for stamping that uses this pressing mold, then by in the length of the direction corresponding with the circumferencial direction of carrier than forming the 3rd protuberance with the big position of the length of the radially corresponding direction of the 1st protuberance, and make its aspect ratio the 1st protuberance height, by means of this, can be as for example guiding pattern to form the protuberance of usefulness and the protuberance that the sevtor address pattern forms usefulness, at its peripheral part, each 3rd protuberance bigger than the length radially of the 1st protuberance of data track pattern formation usefulness for the length of circumferencial direction also is pressed into resin bed to enough degree of depth with the degree identical with the 1st protuberance of data track pattern formation usefulness.The thickness that therefore can make the residue in the zone (the formation zone of data track pattern) corresponding to the data track area of the pattern is with even in fact corresponding to the thickness of the residue in the zone (the formation zone of servo pattern) in servo pattern zone.
Also have, the method for stamping that adopts pressing mold of the present invention and use this pressing mold, then by forming the 4th protuberance and making aspect ratio the 1st protuberance height of at least a portion, impress the peripheral part that is not easy to be pressed into resin bed when handling for the 4th protuberance that forms usefulness at synchronization pattern, can be forming the identical degree of the 1st protuberance of usefulness with the data track pattern, and be pressed into resin bed reliably with enough degree of depth.The thickness that therefore can make the residue in the zone (the formation zone of data track pattern) corresponding to the data track area of the pattern is with even in fact corresponding to the thickness of the residue in the zone (the formation zone of synchronization pattern) in synchronization pattern zone.
Again, the method for stamping that adopts pressing mold of the present invention and use this pressing mold, then by forming the 4th protuberance, and make aspect ratio the 1st protuberance height of its Zone Full, for with recess the 4th protuberance used than the synchronization pattern that is not easy to be pressed into resin bed greatly of specific area mutually, can be pressed into resin bed to enough degree of depth to the Zone Full of peripheral part in perimembranous in it.
Again, adopt information recording medium-manufacturing method of the present invention, then by utilizing the relief pattern manufacturing information recording medium of above-mentioned method for stamping duplicating on resin bed, can obtain servosignal reliably, therefore can produce and to make the desirable road of the correct tracking of magnetic head, simultaneously can carry out correct data record to the data recorded trace, and can be from the carrier of the data of the correct reading and recording in data record road.
Description of drawings
Fig. 1 is the block diagram of the structure of expression imprinting apparatus 100.
Fig. 2 is the plane of carrier 1.
Fig. 3 is the cutaway view of carrier 1.
Fig. 4 is the cutaway view of intermediate 10.
Fig. 5 is the cutaway view of pressing mold 20.
Fig. 6 is that the data track pattern of pressing mold 20 forms the plane that regional Ats and servo pattern form regional Ass.
Fig. 7 is the plane that the data track pattern of pressing mold 20 forms regional Ats.
Fig. 8 is that the servo pattern of pressing mold 20 forms the plane that the interior guiding pattern of regional Ass forms regional Aps.
Fig. 9 is that the servo pattern of pressing mold 20 forms the plane that the interior synchronization pattern of regional Ass forms regional Abs.
Figure 10 is that the bottom surface of each recess 35b is the cutaway view along circumferencial direction of conplane pressing mold 20.
Figure 11 is that the bottom surface of each recess 35b is not the cutaway view along circumferencial direction of conplane pressing mold 20.
Figure 12 is the graph of a relation of the length of each protuberance 35a and the height from datum level X to outstanding end.
Figure 13 is the cutaway view along circumferencial direction that forms the disc shaped matrix material 25 under the state of nickel dam 26 in the manufacturing process of pressing mold 20 from the teeth outwards.
Figure 14 is the cutaway view along circumferencial direction to the state lower wall flake matrix material 25 that is formed on the resist layer 27 irradiating electron beams formation exposing patterns 31 (forming sub-image 27a) on the nickel dam 26.
Figure 15 carries out video picture to the resist layer under the state shown in Figure 14 27 to handle the cutaway view along circumferencial direction of the disc shaped matrix material 25 under the state that forms relief pattern 32 on the nickel dam 26.
Figure 16 is to be that mask carries out etch processes to nickel dam 26 with the resist layer under the state shown in Figure 15 27 (relief pattern 32), forms the cutaway view along circumferencial direction of the disc shaped matrix material 25 under the state of mask pattern 33 with this.
Figure 17 forms the cutaway view along circumferencial direction of the disc shaped matrix material 25 under the state of relief pattern 34 by carry out etch processes with mask pattern 33 with this.
Figure 18 is covered with the cutaway view along circumferencial direction that relief pattern shown in Figure 17 34 forms the disc shaped matrix material 25 under the state of electrode films 21.
Figure 19 is covered with the cutaway view along circumferencial direction that electrode film shown in Figure 180 21 forms the disc shaped matrix material 25 under the state of nickel dams 22.
Figure 20 is with the cutaway view of pressing mold 20 by the state on the resin bed 14 that is pressed in intermediate 10.
Figure 21 be under the state of Figure 20 each protuberance 35a1 push near the position cutaway view.
Figure 22 be under the state of Figure 20 each protuberance 35a2 push near the position cutaway view.
Figure 23 is that the intermediate 10 under the state shown in Figure 20 is peeled off pressing mold 20, forms the cutaway view of the state of relief pattern 36.
Figure 24 utilizes relief pattern shown in Figure 23 36 etch metal layers 13, forms the cutaway view of the state of relief pattern 37 with this.
Figure 25 is that the servo pattern of pressing mold 20A forms the plane that the interior synchronization pattern of regional Ass forms regional Abs.
Figure 26 is that the servo pattern of pressing mold 20B forms the plane that the interior synchronization pattern of regional Ass forms regional Abs.
Figure 27 is that the servo pattern of pressing mold 20C forms the plane that the interior synchronization pattern of regional Ass forms regional Abs.
Figure 28 is that the short protuberance 16z of length L 11 among the existing pressing mold 10z is pressed into the cutaway view under the state of resin bed 20z.
Figure 29 is that the long protuberance 16z of length L 12 among the existing pressing mold 10z is pressed into the cutaway view under the state of resin bed 20z.
Label declaration
1 carrier
5,35～37 relief patterns
5a, 35a, 35a1～35a3 protuberance
5b, 35b, 35b1～35b3,36b recess
10 intermediates
11 disc shaped matrix materials
12 magnetospheres
13 metal levels
14 resin beds
20,20A～20C pressing mold
100 imprinting apparatus
110 press
120 control parts
As servo pattern zone
At data track area of the pattern
The Abs synchronization pattern forms the zone
Aps guiding pattern forms the zone
The Ass servo pattern forms the zone
Ats data track pattern forms the zone
L1～L8 length
H1～H3 height
T1, T2 thickness
The X datum level
The specific embodiment
Below, describe with reference to the optimal morphology of accompanying drawing pressing mold of the present invention, method for stamping and information recording medium-manufacturing method.
At first, describe with reference to the structure of accompanying drawing the imprinting apparatus 100 that utilizes pressing mold manufacturing information recording medium of the present invention.
Imprinting apparatus 100 shown in Figure 1, possess press 110 and control part 120, when formation can be according to the carrier shown in the method for stamping shop drawings 2,3 of the present invention with pressing mold 20 (with reference to Fig. 5) by being pressed on the intermediate 10 (with reference to Fig. 4), form the structure chart of relief pattern 36 (with reference to Figure 23).In this case, carrier 1 is the magnetic recording medium that disk is read type, as shown in Figure 2, be prescribed track for servo pattern zone As is set between each data track area of the pattern At, data track area of the pattern At and servo pattern zone As are at the direction of rotation (circumferencial direction: the direction of arrow R) go up alternately side by side of carrier 1.And as shown in Figure 3, at data track area of the pattern At, mass data record with the separated concentric circles of predetermined arrangement spacing is formed by the relief pattern 5 with many protuberance 5a and many recess 5b (relief pattern 5t) with the data track pattern that road and buffer zone portion constitute, at servo pattern zone As, the relief pattern 5 (relief pattern 5s) that the various servo pattern utilizations of tracking servo control usefulness have many protuberance 5a and many recess 5b forms.Also have, in this figure and Fig. 5, for the ease of understanding the present invention, the length of each protuberance and each recess uses the length different with reality to represent.And in the present invention, the zone that will be on direction of rotation be clipped by side by side two data track area of the pattern At (zone till the end of the relative direction of rotation upstream side among another data track area of the pattern At is played in the end in the relative direction of rotation downstream among data track area of the pattern At) is as servo pattern zone As.
And for example shown in Figure 4, intermediate 10 is to form laminated in regular turn magnetosphere 12 on the discoideus disc shaped matrix material 11, metal level 13 and resin bed 14 formations with for example aluminium oxide, silicon, glass or pottery etc.In this case, in fact between disc shaped matrix material 11 and magnetosphere 12, exist various functional layers such as soft ferromagnetic layer and oriented layer, but, omit for the explanation and the diagram of these parts for the ease of understanding the present invention.Also have, in this example, constitute matrix material among the present invention by disc shaped matrix material 11, magnetosphere 12 and metal level 13.Again, for the resin material that forms resin bed 14, because the concaveconvex shape of the relief pattern 36 that forms when peeling off pressing mold 20 as described below is good, therefore for example preferably adopting, polystyrene resin, isobutylene resin (PMMA), polystyrene, phenol are resin and novolac resin etc.In this case, in intermediate 10, for example utilize novolac resin to form resin bed 14, make its thickness in the following scope of the above 100nm of 40nm, (for example be 70nm).
On the other hand, as shown in Figure 5, pressing mold (mold) 20 is discoideus about 300 microns by the laminated thickness that forms of electrode film 21 and nickel dam 22, its back side (upper surface among this figure) forms tabular surface, and the relief pattern 35 (example of die-side relief pattern of the present invention) that forms relief pattern 36 usefulness simultaneously on the resin bed 14 of intermediate 10 is formed on its surface (bottom surface of each protuberance 35b of relief pattern 35: below among this figure).On pressing mold 20, prevent adhering to of when resin bed 14 is peeled off resin material that for as described below for example implementing to be coated with to the surface (surface of relief pattern 35) of electrode film 21, the processing of fluorine material reduces film 23 to form adhesive force again.Also have, form the material that adhesive force reduces film 23 and be not limited to the such coating material of fluorine material, can adopt the various materials that can reduce with the adhesive force of resin bed 14.In this case, the relief pattern 35 of this pressing mold 20 is corresponding with each recess 5b of the relief pattern 5 of carrier 1 (relief pattern 5t, 5s), forms each protuberance 35a, and each the protuberance 5a corresponding to relief pattern 5 forms each recess 35b simultaneously.
Specifically, as shown in Figure 6, on pressing mold 20, corresponding to the data track area of the pattern At and the servo pattern zone of carrier 1, be defined in data track pattern that the relief pattern 35t that is formed for forming relief pattern 5t (data track pattern) usefulness on the data track area of the pattern At of carrier 1 is formed and form regional Ats and form regional Ass with the servo pattern that the relief pattern 35s that is formed for forming relief pattern 5s (servo pattern) on the As of the servo pattern zone of carrier 1 is formed.Also have, this figure and below with reference to Fig. 7～9,25～27 in, illustrate the formation position of protuberance 35a with oblique line.Again, in servo pattern forms regional Ass, stipulated to form guiding pattern that relief pattern 35s that the guiding pattern uses is formed and formed address pattern that relief pattern 35s that regional Aps, calculated address pattern use is formed and form zone (not shown) and form the synchronization pattern that relief pattern 35s that synchronization pattern uses is formed and form regional Abs.Also have, in synchronization pattern forms regional Abs, stipulated four zones of corresponding regional Ab1s～Ab4s, each signal area in the synchronization pattern with carrier 1.
In this case, being formed on the data track pattern forms each protuberance 35a of regional Ats and is formed on each protuberance 35a that servo pattern forms regional Ass, according to the data track pattern of carrier 1 and the shape of servo pattern, the length (hereinafter referred to as " length of circumferencial direction ") on length (hereinafter referred to as " radical length ") on regulation and the radially corresponding direction of carrier 1 (following will be in pressing mold 20 be called " radially ") and the direction corresponding (following will be in pressing mold 20 be called " circumferencial direction ") with the corresponding direction of the circumferencial direction of carrier 1 with the circumferencial direction (direction of rotation) of carrier 1 with the radially corresponding direction of carrier 1.Specifically, as shown in Figure 7, be formed on each protuberance 35a1 that the data track pattern forms regional Ats, be the protuberance 35a of each buffer zone portion (recess between each road) usefulness that forms the data track pattern of carrier 1, form continuously along the direction corresponding, form the long ribbon shape of circumferencial direction with the circumferencial direction (direction of rotation) of carrier 1.This protuberance 35a1 is an example of the 1st protuberance of the present invention, and the length of its circumferencial direction is corresponding to the length legislations of the circumferencial direction of the data track area of the pattern At of carrier 1.And for example shown in Figure 12, protuberance 35a1 (" protuberance that the data track pattern is used " among this figure) the zone corresponding of carrier 1 with interior perimembranous Ai to the Zone Full in the corresponding zone of peripheral part Ao in, its length (length L 1 shown in Figure 7) radially forms for example 100nm.Also have, recess 35b1 shown in Figure 7 is the recess 35b that is used to form the protuberance 5a that the data record road of carrier 1 uses, and for example its length legislations radially forms with the length radially of protuberance 35a1 and equates in fact.
Again, as shown in Figure 8, the guiding pattern that servo pattern forms regional Ass forms the protuberance 35a2 that regional Aps goes up formation, be the protuberance 35a that recess 5b that the guiding pattern of carrier 1 is used forms usefulness, along forming continuously, form long ribbon shape diametrically with the radially corresponding direction of carrier 1.This protuberance 35a2 is an example as the 3rd protuberance of the 2nd protuberance of the present invention, and its length radially is corresponding to the interior perimembranous Ai of carrier 1 length legislations to peripheral part Ao.Again, as shown in figure 12, protuberance 35a2 (" protuberance " 2 long " that the guiding pattern is used " among this figure), the length of its circumferencial direction (length L 2 shown in Figure 2) is defined as from interior perimembranous slowly elongated to peripheral part, with the corresponding zone of interior perimembranous Ai (for example the distance with the center is the position of 5.0mm) of carrier 1, the length L 2 of its circumferencial direction forms for example 56nm, simultaneously with the corresponding zone of peripheral part Ao (for example the distance with the center is the position of 13.0mm) of carrier 1, the length of its circumferencial direction forms for example 147nm.Also have, recess 35b2 shown in Figure 8 is the recess 35b that protuberance 5a that the guiding pattern of carrier 1 is used forms usefulness, and regulation forms the length that the length of its circumferencial direction for example equals the circumferencial direction of the protuberance 35a2 on the same radial location in fact.Again, the what is called among Figure 12 " 2 long " is meant the length of the circumferencial direction that is identified as 2 signals in address pattern on same radial location etc.Equally, so-called " 8 long " is meant the length of the circumferencial direction that is identified as 8 signals in the address pattern on same radial location etc.
Also have, the sevtor address pattern that servo pattern forms among the regional Ass forms the protuberance 35a (not shown) that formation is gone up in the zone, it is the protuberance that the protuberance 5b that uses of the sevtor address pattern in the carrier 1 forms usefulness, the recess 5b that uses with above-mentioned guiding pattern forms the same processing of protuberance 35a2 of usefulness, form continuously along radially corresponding direction, become long ribbon shape in radial shape with carrier 1.Therefore, in the following description,, be marked with the label identical and describe with the protuberance 35a2 that guides pattern formation usefulness for the protuberance 35a of sevtor address pattern formation usefulness.This protuberance 35a2 is another example as the 3rd protuberance of the 2nd protuberance of the present invention, and its length radially is corresponding to the length legislations from the interior perimembranous Ai of carrier 1 to peripheral part Ao.Again, the sevtor address pattern forms the protuberance 35a2 of usefulness, and the length of its circumferencial direction (length L 2 shown in Figure 8) is defined as from interior perimembranous slowly elongated to peripheral part.Specifically, as shown in figure 12,2 long protuberance 35a2 among the protuberance 35a2 are in the zone corresponding with the interior perimembranous Ai of carrier 1, the length L 2 of its circumferencial direction forms for example 56nm, in the zone corresponding with the peripheral part Ao of carrier 1, the length L 2 of its circumferencial direction forms for example 147nm simultaneously.And, 8 long protuberance 35a2 among the protuberance 35a2 of sevtor address pattern formation usefulness are in the zone corresponding with the interior perimembranous Ai of carrier 1, the length L 2 of its circumferencial direction forms for example 226nm, in simultaneously corresponding with the peripheral part Ao of carrier 1 zone, the length L 2 of its circumferencial direction forms for example 587nm.Also have, it is the recess 35b that protuberance 5a that the sevtor address pattern of carrier 1 is used forms usefulness that the sevtor address pattern forms the recess 35b (not shown) that forms in the zone, as an example, be prescribed the length of circumferencial direction that the length that forms its circumferencial direction and sevtor address pattern form the protuberance 35a2 of usefulness and be similarly 2 and 8 long equal lengths.
Again, as shown in Figure 9, the synchronization pattern that forms among the regional Ass at servo pattern forms the protuberance 35a3 that regional Abs (for example regional Ab1s) goes up formation, be as an example of the 4th protuberance of the 2nd protuberance of the present invention, have the structure of the recess 5b of the synchronization pattern that can form carrier 1.In this case, synchronization pattern at this pressing mold 20 forms on the regional Abs, can make and form carrier 1 ground, form a plurality of recess 35b3 that overlook to parallelogram shape at the position corresponding with the constituent parts retaining zone with synchronization pattern that constituent parts retaining zone for example is made of protuberance.Again, protuberance 35a3 for example surrounds a plurality of recess 35b3 in each regional Ab1s～Ab4s and forms on the regional Abs at synchronization pattern and form as a protuberance.Also as shown in figure 12, protuberance 35a3 (" protuberance that synchronization pattern is used " among this figure) is defined as, the length (length L 3 shown in Figure 9) of the circumferencial direction in each regional Ab1s～Ab4s between adjacent in a circumferential direction two protuberance 35b3 is slowly elongated to peripheral part from interior perimembranous, form 56nm in the zone corresponding, form 147nm in the zone corresponding simultaneously with the peripheral part Ao of carrier 1 with the interior perimembranous Ai of carrier 1.Also have, the length (length L 3) that the length of the circumferencial direction of each recess 35b3 is defined as the circumferencial direction between two recess 35b3 with the protuberance 35a3 of for example same radial location equates in fact.
And, as shown in figure 10, this pressing mold 20, its bottom surface that constitutes each the recess 35b between each protuberance 35a of relief pattern 35 forms relief pattern with pressing mold 20 and forms face (surface of the present invention) and be essentially a plane.Also having, in this manual, is that datum level of the present invention (datum level X) carries out following explanation with the bottom surface (being that relief pattern forms face) of each recess 35b.In this case, datum level of the present invention is not limited to the datum level X with the bottom surface consistent location (position that comprises the bottom surface) of recess 35b, and the back side that can be formed on pressing mold is to the optional position of (being in the scope of thickness of pressing mold) between the relief pattern formation face.And for example shown in Figure 11, utilize this manufacture method, also there is the situation that does not form a plane bottom surface of each recess 35b, in this case, also can will comprise the plane of bottom surface of the arbitrary recess 35b (in this example, being formed in two recess 35b of the both sides of protuberance 35a1) among each recess 35b as datum level X.Also have, as shown in figure 10, in this relief pattern 35, each protuberance 35a is according to its length radially and the length legislations and the height of formation from datum level X to outstanding end of circumferencial direction.
Specifically, as shown in figure 12, radical length L1 is the protuberance 35a1 that the data track pattern of 100nm forms usefulness at the Zone Full from interior perimembranous to peripheral part, and the Zone Full that the height from datum level X to outstanding end (height H 1 shown in Figure 10,11: i.e. the outstanding length of protuberance 35a1) forms from interior perimembranous to peripheral part is 85nm.Again, the length L 2 of the circumferencial direction of interior perimembranous is 56nm, the length L 2 of the circumferencial direction of peripheral part is the protuberance 35a2 that the guiding pattern of 147nm forms usefulness, height from datum level X to outstanding end (height H 2 shown in Figure 10,11: i.e. the outstanding length of protuberance 35a2) slowly uprises to peripheral part from interior perimembranous, form 80nm in interior perimembranous, form 88nm at peripheral part.Equally, the length of the circumferencial direction of interior perimembranous is 56nm, the length of the circumferencial direction of peripheral part is the protuberance 35a2 of the sevtor address pattern of 147nm with (2 bit length), height (being the outstanding length of protuberance 35a2) from datum level X to outstanding end slowly uprises to peripheral part from interior perimembranous, form 80nm in interior perimembranous, form 88nm at peripheral part.And the length of the circumferencial direction of interior perimembranous is 226nm, the length of the circumferencial direction of peripheral part is the protuberance 35a2 of the sevtor address pattern of 587nm with (8 bit length), height (being the outstanding length of protuberance 35a2) from datum level X to outstanding end slowly uprises to peripheral part from interior perimembranous, form 90nm in interior perimembranous, form 98nm at peripheral part.Like this, in this pressing mold 20, for along the protuberance 35a2 that radially forms continuously, the length of its circumferencial direction, than being formed on the big position of length radially that the data track pattern forms the protuberance 35a1 of regional Ats, the height from datum level X to outstanding end forms the height than protuberance 35a1 in the length of its circumferencial direction.
Again, length L 3 between two adjacent in a circumferential direction recess 35b3 (and the retaining zone corresponding concave part 35b of unit) is 56nm in interior perimembranous, at peripheral part is that the synchronization pattern of 147nm forms among the protuberance 35a3 of usefulness, height till from the datum level X between two protuberance 35b3 to outstanding end (height H 3 shown in Figure 10,11: i.e. outstanding length two of protuberance 35a3 recess 35b3) is the such height of peripheral part, form 92nm in interior perimembranous, form 101nm at peripheral part.Like this, in this pressing mold 20,, form height H 1 height of the aspect ratio protuberance 35a1 from datum level X to outstanding end at its Zone Full for surrounding a plurality of recess 35b3 along the protuberance 35a that radially forms continuously with the circumferencial direction both direction.Also have, poor for height maximum in the height of each protuberance 35a and minimum height, for following when resin bed 14 is pushed each protuberance 35a can be pressed into reliably, preferably described poor maximum is also below 50nm.
On the other hand, as shown in Figure 1, press 110 possesses hotplate 111,112 and reciprocating mechanism 113.Hotplate 111,112 carries out heat treated to intermediate 10 and pressing mold 20 under the control of control part 120.And for example shown in Figure 20, hotplate 111 forms the structure of the formation that can support to make resin bed 14 intermediate 10 under the last state, and hotplate 112 forms the structure of the pressing mold 20 under the prone state of formation that can support to make relief pattern 35.Reciprocating mechanism 113 moves (declines) by the intermediate 10 that hotplate 112 is supported to hotplate 111, with the pressing mold 20 of hotplate 112 supports by on the resin bed 14 that is pressed in intermediate 10.Again, reciprocating mechanism 113 makes hotplate 112 leave hotplate 111 (hotplate 112 is risen), makes by the pressing mold 20 that is pressed on the resin bed 14 with this and peels off from resin bed 14.Control part 120 control hotplates 111,112, intermediate 10 and pressing mold 20 are heated, control reciprocating mechanism 113 simultaneously, pressing mold 20 (is carried out pressing mold of the present invention and pushed processing) by being pressed on the intermediate 10, also peel off by the pressing mold 20 (carrying out pressing mold lift-off processing of the present invention) that is pressed on the intermediate 10 from intermediate 10.
Below, describe with reference to the manufacture method of accompanying drawing pressing mold.
At first, as shown in figure 13, show that vapor deposition treatment forms nickel on the silicon substrate material 25 that passes through the smooth disc shaped of grinding, nickel dam 26 thickness of formation are about 10nm.Also have, the matrix material that uses when making pressing mold 20 is not limited to the matrix material of silicon system, can adopt various matrix materials such as peeling off matrix material and ceramic matrix material.Then as shown in figure 14, the resist on the nickel dam 26 that the rotation coating forms (ZEP520A that for example Japanese ゼ オ Application Co., Ltd. makes) is resist layer side 27 about 100nm with this forming thickness on the surface of nickel dam 26.Also have, the resist that forms resist layer 27 usefulness is not limited to above-mentioned resist, can use any anticorrosive additive material.Then use electron beam slabstone printing equipment to resist layer 27 irradiating electron beams, draw desirable exposing patterns 31 (being the pattern corresponding in this example) with each protuberance 35a of pressing mold 20.Then the resist layer under this state 27 is carried out video picture and handle, the position of sub-image 27a is disappeared with this.By means of this, as shown in figure 15, on nickel dam 26, form relief pattern 32.Then use as mask, nickel dam 26 is carried out etch processes, forming the mask pattern 33 that constitutes by nickel dam 26 on 25 on the disc shaped matrix material as shown in figure 16 with this with relief pattern 32 (resist layer 27).
Then, the nickel dam on the disc shaped matrix material 25 26 (mask pattern 33) is used as mask, by utilizing for example CF
4With O
2The mist reactive ion etch process of carrying out, as shown in figure 17, disc shaped matrix material 25 is carried out etching forms a plurality of recess 34a, form relief pattern 34.At this moment, by suitable adjustment CF
4With O
2Mixing ratio (flow-rate ratio), treating apparatus in pressure, the energy of giving and processing time etc., with the position of exposing from mask pattern 33 radially or the short position of the length of circumferencial direction (position that A/F is narrow: the position that for example formed each protuberance 35a1 etc. of pressing mold 20 afterwards) the recess 34a that forms compares, from position that mask pattern 33 exposes radially or the long position of the length of circumferencial direction (position that A/F is wide: the position that for example formed the protuberance 35a3 etc. of pressing mold 20 afterwards) the recess 34a of formation etched get darker.Specifically, for example with etching gas CF
4With O
2Flow-rate ratio be 35:15 (CF
4: 35sccm, O
2: the flow of 15sccm), the pressure in the process chamber is defined as 0.3Pa, and microwave power is defined as the bias power that applies on RF1kW, the disc shaped matrix material 25 and is defined as RF50W, carry out 25 seconds etch processes.Its result is as shown in the drawing, and the recess 34a that forms narrow with A/F (radially or the length of circumferencial direction short) compares, the darker relief pattern 34 of recess 34a of A/F big (radially or the length of circumferencial direction long).
Then, the disc shaped matrix material under this state 25 is immersed in the liquor potassic permanganate, carry out oxidation processes with this surface (surface of the nickel dam 26 on the disc shaped matrix material 25) to relief pattern 34.Finish stamper (not shown) with this.Then, as shown in figure 18,, after the electrode film 21 that the formation electroforming is used, this electrode film 21 is handled as electrode use carrying out electroforming, as shown in figure 19, on electrode film 21, formed nickel dam 22 with this at the concaveconvex shape of the relief pattern in stamper 34.Then, the laminated body (becoming the position of pressing mold 20 afterwards) of electrode film 21 and nickel dam 22 is peeled off from the laminated body of disc shaped matrix material 25 and nickel dam 26.At this moment since the surface of relief pattern 34 through peracid treatment, the laminated body of electrode film 21 and nickel dam 22 is peeled off easily.By means of this, with relief pattern 34 duplicating formation relief pattern 35 (with reference to Figure 10) on electrode film 21 and nickel dam 22 of stamper.Thereafter, rear side to nickel dam 22 is ground, make it smooth to its shaping, simultaneously the surface of electrode film 21 is coated with the coating processing of fluorine based material, form adhesive force and reduce film 23, by means of this, as shown in figure 10, finish the pressing mold 20 that forms length with its radical length and circumferencial direction and relief pattern 35 from datum level X to the different a plurality of protuberance 35a of the height of giving prominence to the end.
Then, with reference to accompanying drawing to describing with above-mentioned pressing mold 20 forms relief pattern on intermediate 10 operation according to method for stamping of the present invention.
At first, intermediate 10 and pressing mold 20 are set on the press 110.Specifically, the formation that makes resin bed 14 is installed on intermediate 10 on the hotplate 111 towards last, and the formation of relief pattern 35 is faced down, and pressing mold 20 is installed on the hotplate 112.Then, 120 pairs of hotplates of control part 111,112 are controlled, heating intermediate 10 and pressing mold 20 both.At this moment hotplate 111,112 heats, and both are heated to high about 100 ℃ about 170 ℃ of vitrification point (being about 70 ℃ in this example) than the novolac resin that forms resin bed 14 with intermediate 10 and pressing mold 20.By means of this, make resin bed 14 softening, form the state of easy deformation.In this case, preferably be heated to respect to the high high temperature below 120 ℃ more than 70 ℃ of vitrification point.Be heated to high even more ideal more than 100 ℃.By means of this, as described below easily with pressing mold 20 by being pressed on the resin bed 14.
Then, control part 120 control reciprocating mechanisms 113 make hotplate 112 descend to hotplate 111, by means of this, as shown in figure 20, on the resin bed 14 of the intermediate on the hotplate 111 10, push the relief pattern 35 (pressing mold of the present invention is pushed processing) of pressing mold 20.Also have, among Figure 21,22 of this figure and back reference, should be readily appreciated that, the length of each protuberance 35a of relief pattern 35 and the A/F of recess 35b are represented with length different with actual conditions and A/F in order to make the present invention.At this moment, reciprocating mechanism 113 is according to the control of control part 120, and for example, the state that applies the load of 34kN with the Zone Full at whole pressing mold 20 was kept 5 minutes.Again, hotplate 111,112 controls according to control part 120, by means of reciprocating mechanism 113 pressing mold 20 is pressed on the intermediate 10 during, proceed heat treated so that the temperature of intermediate 10 and pressing mold 20 does not reduce.When this heat treatment, preferably with temperature maintenance (for example holding temperature changes in ± 0.2 ℃ temperature range) in 170 ℃ ± 1 ℃ scope.Duplicate on resin bed 14 to form relief pattern 36 with this relief pattern 35 pressing mold 20.
In this case, be used in the pressing mold 20 of this imprinting apparatus 100, form relief pattern 35 as mentioned above, and be formed among each protuberance 35a that servo pattern forms regional Ass, the length of its circumferencial direction forms the long protuberance 35a2 (for example length of the circumferencial direction position longer than the length radially of protuberance 35a1 in each protuberance 35a2) of radical length of the protuberance 35a1 of regional Ats than data track pattern, its datum level X does higherly to the height of outstanding end.Therefore, when the Zone Full of pressing mold 20 applied uniform pressure ground and pushes, the long protuberance 35a (being protuberance 35a2 in this example) of the length of its circumferencial direction also was pressed into resin bed 14 to deep place equally with protuberance 35a1 etc.And as mentioned above, form the protuberance 35a3 of usefulness for synchronization pattern, the height from datum level X to outstanding end between two adjacent in a circumferential direction protuberance 35a3 forms from interior perimembranous and slowly uprises to peripheral part more, and forms height H 1 height than protuberance 35a1 at its Zone Full.Thereby, when the Zone Full of pressing mold 20 applies uniform pressing force and pushes, because it is bigger frequently with the area of recess 35b3, the protuberance 35a3 that is not easy to be pressed into resin bed 14 also can the same depths that is pressed into resin bed 14 with raised part 35a1,35a2, consequently, each protuberance 35a that the length of radical length and circumferencial direction is different can be pressed into resin bed 14 in fact equably.
Specifically, as shown in figure 21, be that the data track pattern of a plurality of protuberance 35a1 of 100nm forms among the regional Ats for example forming its radical length L1 for example, the resin bed 14 that is pressed into the position of each protuberance 35a1 smoothly moves to the recess 35b1 of pressing mold 20, as a result, each protuberance 35a1 is pressed into the resin bed 14 of intermediate 10 up to enough dark place.Therefore, the thickness T 1 of the residue at the position that protuberance 35a1 is pressed into (resin bed 14 between the surface of the bottom surface of each recess 36b1 and metal level 13) is for about 28nm ± 3nm.On the other hand, as shown in figure 22, it (is that the guiding pattern forms regional Aps in this example that the servo pattern that is forming the protuberance 35a2 about 147nm in the length L 2 of its circumferencial direction of peripheral part forms regional Ass, and the sevtor address pattern that forms 2 long sevtor address patterns forms the zone) in, the height H 2 from datum level X to outstanding end in the peripheral part side of protuberance 35a2 be than the 88nm about the height H 1 high 3nm of protuberance 35a1, and therefore the big protuberance 35a2 of width that more is difficult to be pressed into resin bed 14 than protuberance 35a1 can be pressed into resin bed 14 and arrive enough degree of depth.Therefore, be pressed into the thickness T 2 of residue (resin bed 14 between the bottom surface of each recess 36b2 and the metal level 13) at the position of protuberance 35a2 for about 29nm ± 3nm.
Again, in this pressing mold 20, the length that forms its circumferencial direction is 226nm in interior perimembranous, at peripheral part is that the sevtor address pattern of 587nm forms among the regional Ass (the sevtor address pattern that forms 8 long sevtor address patterns forms the zone) with the servo pattern of the protuberance 35a2 of (8 long), the height that also forms from datum level X to outstanding end slowly uprises 98nm from 90nm from interior perimembranous to peripheral part, and outstanding end is more outstanding than protuberance 35a1.Therefore, this protuberance 35a2 also can fully be pressed into resin bed 14, and only reaches the degree that is pressed into identical with protuberance 35a1.And, formation is 56nm along the length of the circumferencial direction between circumferencial direction two recess 35b side by side in interior perimembranous, at peripheral part is that the servo pattern of the protuberance 35a3 that uses of the synchronization pattern of 147nm forms among the regional Ass (synchronization pattern forms regional Abs), also be to form from interior perimembranous to the height of giving prominence to the end from datum level X slowly to increase to 101nm from 92nm to peripheral part, outstanding end is more outstanding than protuberance 35a1.Therefore, this protuberance 35a3 also can fully be pressed into resin bed 14, and only reaches the degree that is pressed into identical with protuberance 35a1.Therefore the thickness of residue that is pressed into the position of the radical length various protuberance 35a different with circumferencial direction length forms regional Ats and each servo pattern at the data track pattern, and to form the Zone Full of regional Ass identical in fact.Then, control part 120 control hotplates 111,112 are proceeded heat treated (keeping 170 ℃ ± 1 ℃ temperature range) on one side, on one side as shown in figure 23, the control reciprocating mechanism rises hotplate 112, peels off pressing mold 20 (pressing mold lift-off processing of the present invention) with this from intermediate 10 (resin bed 14).By means of this, the concaveconvex shape of the relief pattern on the pressing mold 20 35 is duplicated on the resin bed 14 of intermediate 10, on metal level 13, form relief pattern 36 with this.Finishing impression by aforesaid operation handles.
Below, with reference to accompanying drawing the operation according to information recording medium-manufacturing method manufacturing information recording medium 1 of the present invention is described.
At first, utilize oxygen plasma treatment to remove remaining resin material (residue) on the recess bottom surface of the relief pattern 36 in the resin bed 14.At this moment, in the scope of the thickness of the residue on the metal level 13 below the above 32nm of 25nm, have identical in fact thickness at Zone Full, therefore when removing residue, can avoid the situation (the recess sidewalls face is subjected to serious situation about corroding) that makes recess form undesired big A/F.Then, relief pattern 36 (protuberance) is used as mask, the gas that utilizes metal etch to use carries out etch processes.At this moment as shown in figure 24, the metal level 13 of the bottom surface portions of the recess of relief pattern 36 is removed, on magnetosphere 12, formed the relief pattern 37 that metal material constitutes.Then, relief pattern 37 (remaining metal level 13) is used as mask, the gas that uses magnetic to use carries out etch processes.Remove magnetosphere 12 with this from the position that relief pattern 37 exposes.
Then, carry out etch processes, remove metal remained layer 13 on magnetosphere 12 by the gas that utilizes metal etch to use.By means of this, as shown in Figure 3, the formation groove corresponding with each recess of the relief pattern 36 of the concaveconvex shape that duplicates mask 20 is formed on the relief pattern 5 on the magnetosphere 12.Then carrying out surface finish handles.In this surface finish was handled, at first, filling for example (not shown) after the silica utilized ion beam etching method to make having an even surface in groove.Then, for example DLC (Diamond Like Carbon: diamond-like-carbon) form diaphragm, last application of lubricating of the surface after the planarization.Finish carrier 1 with this.In this case, this carrier 1 utilizes the relief pattern 37 of formation as described below to make, described relief pattern 37 is that apparatus has that to form its A/F be that the relief pattern 36 of the recess of desirable width forms, and therefore utilizes each recess 5b of the relief pattern 5 (road that data record is used and servo pattern etc.) that this relief pattern 36,37 forms also to form desirable width.Consequently, can avoid occurrence record mistake and playback error in carrier 1.
Adopt this pressing mold 20 like this, and the method for stamping that uses this pressing mold 20, (in this example protuberance 35a2 then than being formed on the data track pattern forms protuberance 35a (being protuberance 35a1) at least a portion highly the highest among each protuberance 35a in the regional Ats in this example the higher protuberance 35a of height, 35a3 etc.) being formed on servo pattern forms in the regional Ass, constitute relief pattern 35, by means of this, when impression at the Zone Full (each data track pattern forms regional Ats and each servo pattern forms regional Ass) of pressing mold 20 when pressing mold 20 being pressed on resin bed 14 with uniform pressure, each protuberance 35a that a large amount of servo patterns that exist of protuberance 35a that are difficult to be pressed into resin bed can be formed in the regional Ass is pressed into the enough dark degree of depth.Therefore, the data track pattern form each protuberance 35a in the regional Ats and servo pattern form each protuberance 35a in the regional Ass can be with identical degree, be pressed into resin bed 14 fully, consequently, can make the thickness T of the residue on the metal level 13 keep evenly at the Zone Full of intermediate 10.Therefore, make that at Zone Full the removal needed time of residue is identical in fact, be subjected to etch so duplicate the side wall surface of each recess 36b of the relief pattern 36 on resin bed 14 in the zone corresponding with the data track area of the pattern, the situation that each recess 36b forms undesired big A/F can be avoided.Like this, can form the relief pattern 36 of recess in these two zones, data track area of the pattern and servo pattern zone with desirable A/F with high accuracy.The relief pattern 36 that utilizes high accuracy to form is again made recording medium the earliest, can produce the carrier 1 that is not easy to take place the recording playback mistake like this.
Again, adopt this pressing mold 20, then form the 3rd protuberance of the present invention (being protuberance 35a2) in the regional Ass in this example by forming at servo pattern, make at the length of the circumferencial direction position aspect ratio protuberance 35a1 height longer than the length radially of protuberance 35a1, can be as for example guiding pattern to form the protuberance 35a2 of usefulness and the protuberance 35a2 that the sevtor address pattern forms usefulness, for each the protuberance 35a that grows than the length L radially 1 of the protuberance 35a1 of data track pattern formation usefulness in the length of its peripheral part circumferencial direction, also can be pressed into resin bed 14 to enough dark degree of depth with the degree identical with the protuberance 35a1 of data track pattern formation usefulness.Therefore can make the residue in the zone corresponding (the data track pattern forms regional Ats) with the data track area of the pattern thickness and with corresponding zone (servo pattern forms regional Ass), servo pattern zone in the thickness equalization in fact of residue.
And, adopt this pressing mold 20, form regional Abs form the 4th protuberance of the present invention (being protuberance 35a3) in this example by form synchronization pattern in the regional Ass at servo pattern, the aspect ratio protuberance 35a1 height that makes at its Zone Full, to owing to forming the protuberance 35a3 of usefulness, can make it be pressed into resin bed 14 to enough degree of depth to the Zone Full of peripheral part in perimembranous in it with the bigger synchronization pattern that is difficult to be pressed into resin bed 14 of the area of recess 35b3.
Again, employing utilizes the method for this pressing mold 20 manufacturing information recording mediums 1, then by utilizing the relief pattern manufacturing information recording medium 1 of on resin bed 14, duplicating with above-mentioned method for stamping, can obtain servosignal reliably, therefore can make the desirable road of the correct tracking of magnetic head, can make simultaneously and can on the data record road, write down correct data, and can be from the carrier 1 of the correct reading and recording data in data record road.
Also have, the invention is not restricted to said structure and method.Do to such an extent that the high example of protuberance 35a1 that forms than data track pattern in the regional Ats is illustrated to the protuberance 35a3 that for example synchronization pattern is formed in the regional Abs at Zone Full above from interior perimembranous to peripheral part, but in for example its inside, the length (length of the circumferencial direction of protuberance 35a3) of the circumferencial direction between two recess 35b3 side by side can form this position lower than protuberance 35a1 than above-mentioned pressing mold 20 in short-term in a circumferential direction.In this example, form height H 1 high position (peripheral part of protuberance 35a3) than protuberance 35a1 and be equivalent to " at least a portion " among the present invention.Like this, synchronization pattern in servo pattern forms regional Ass forms regional Abs and form the 4th protuberance of the present invention (being protuberance 35a3 etc.) in this example, make the aspect ratio protuberance 35a1 height of at least a portion, by means of this, for impressing the peripheral part that is not easy to be pressed into resin bed 14 when handling among the protuberance 35a3 that forms usefulness at synchronization pattern, can be pressed into resin bed 14 reliably to enough degree of depth with the degree identical with the protuberance 35a1 of data track pattern formation usefulness.Therefore can make thickness corresponding to the residue in the zone (the data track pattern forms regional Ats) of data track area of the pattern with even in fact corresponding to the thickness of the residue in the zone (synchronization pattern forms regional Abs) in synchronization pattern zone.
Again, above the pressing mold 20 with the relief pattern that is made of recess 35b3 corresponding to the position of the unit retaining zone of carrier 1 is illustrated, but the pressing mold 20A shown in the image pattern 25 is such, also can constitute the position corresponding, form relief pattern 35 with protuberance 35a with the unit retaining zone of carrier 1.In this case, preferably the synchronization pattern as pressing mold 20A forms regional Abs, for along the length L 4 of its circumferencial direction and along at least one length protuberance 35a more much longer of radially length L 5, make height H 1 height of the aspect ratio protuberance 35a1 from datum level X to outstanding end than the length radially of protuberance 35a1.Like this, the protuberance 35a (the protuberance 35a that the length of any among length L 4, the L5 is more much longer than length L 1) that is not easy to be pressed into resin bed 14 when impression is handled also can be the same with raised part 35a2,35a3, with the degree the same, be pressed into resin bed 14 to enough degree of depth with protuberance 35a1.
Again, pressing mold 20, the 20A that the unit retaining zone of parallelogram shape is had in a circumferential direction a synchronization pattern side by side is illustrated above, but, also can use the present invention for being approximately the pressing mold that ellipse or circular unit retaining zone can be formed in circumferencial direction synchronization pattern side by side.And, as pressing mold 20B for example shown in Figure 26, also can adopt by forming the structure that relief pattern 35 that zigzag a plurality of protuberance 35a (a plurality of recess 35b) arranges diametrically forms synchronization pattern along circumferencial direction.The protuberance 35a of this pressing mold 20B is an example of the 3rd protuberance of the present invention, and the position of the arrow B shown in this figure is along radially forming continuously.Therefore, for the length (length L 6 shown in this figure) of the circumferencial direction of this protuberance 35a position longer, preferably will do from datum level X to the height H of outstanding end than height H 1 height of protuberance 35a1 than the length L radially 1 of raised part 35a1.By means of this, can when impressing processing, this protuberance 35a be pressed into resin bed 14 to enough degree of depth.And it is as shown in the drawing, in the state of what is called of the present invention " along radially forming continuously ", not only comprise the state that forms continuously along the direction vertical, and comprise along the state that forms continuously with the acutangulate direction of X-shape radially with circumferencial direction (direction of the arrow R shown in this figure).
And the pressing mold 20C shown in the image pattern 27 is such, also can adopt a plurality of protuberance 35a (a plurality of recess 35b) with parallelogram shape to be configured to check pattern to form the structure of synchronization pattern.In this case, synchronization pattern as pressing mold 20C forms regional Abs, for length L 7 and the protuberance 35a more much longer of at least one length in length L 8 radially, preferably make height H 1 height of the aspect ratio protuberance 35a1 from datum level X to outstanding end than the length radially of protuberance 35a1 along its circumferencial direction.Like this, the protuberance 35a (the protuberance 35a that the length of any among length L 7, the L8 is more much longer than length L 1) that is not easy to be pressed into resin bed 14 when impression is handled also can be the same with raised part 35a2,35a3, with the degree the same, be pressed into resin bed 14 to enough degree of depth with protuberance 35a1.
Again, in the manufacture method of above-mentioned pressing mold 20, be covered with nickel dam 26 (mask pattern 33) is used as mask, disc shaped matrix material 25 is carried out the relief pattern 34 that etching forms, form electrode film 21 and nickel dam 22, make mask 20, but moulding die making method of the present invention is not limited thereto, for example also can as described belowly make, promptly on disc shaped matrix material 25, form resist layer 27, on this resist layer 27, form the different recess of the degree of depth simultaneously, form relief pattern (not shown), be covered with this relief pattern and form electrode film 21 and nickel dam 22, make pressing mold 20 with this.And, also the concaveconvex shape of above-mentioned pressing mold 20 can be duplicated on pressing mold formation material and produce pressing mold, use as main pressing mold with it, the concaveconvex shape of this main pressing mold is duplicated on other pressing molds formation materials, by means of this, promptly duplicate even number, also can make pressing mold of the present invention by concaveconvex shape with above-mentioned pressing mold 20.
Again, utilize in the method for stamping (manufacture method of carrier 1) that above-mentioned die arrangement 100 carries out, during before the impression of pushing from 20 pairs of intermediates 10 of pressing mold is handled beginning, finishing to pressing mold 20 lift-off processing, continue that both carry out heat treated to intermediate 10 and pressing mold 20, but the invention is not restricted to this, for example also can adopt after pressing mold 20 fully is pressed into intermediate 10 to a certain extent, end is peeled off the operation of pressing mold 20 thereafter to the heat treated that intermediate 10 and pressing mold 20 carry out.Can also be before pressing mold 20 is peeled off both temperature of pressing mold 20 and intermediate 10 be reduced to temperature below the vitrification point of resin bed 14.Can adopt its vitrification point than the low resin material of normal temperature (for example 25 ℃) again; form the resin bed among the present invention, pressing mold push handle the pressing mold lift-off processing during do not carry out heat treated and cooling processing and just relief pattern be formed on method on the resin bed.Can also adopt method as described below, promptly adopt ultraviolet curing resin and electronic beam solidified resin etc. to form resin bed as resin material of the present invention, irradiation ultraviolet radiation or electron beam make resin bed solidify (or semi-harden) after pressing mold is pushed processing, carry out the pressing mold lift-off processing then, on resin bed, form the method for relief pattern with this.
Again, utilize the purposes of the relief pattern of method for stamping formation of the present invention to be not limited to the manufacturing that disc reads the carrier of type, and can be used in the manufacturing of pattern medium and the manufacturing of the various carriers (for example optical recording media and magneto-optic recording medium) beyond the magnetic recording medium with shape pattern pattern in addition.
Claims (6)
1. a pressing mold is characterized in that,
Can make the carrier ground formation die-side relief pattern that forms data track pattern and servo pattern with relief pattern,
In described die-side relief pattern, formation is from the height different multiple protuberance of the datum level of stipulating between surface and the back side to outstanding end, compare simultaneously with corresponding to the 1st highly the highest described in described each protuberance of formation in the zone of described data track pattern protuberance, the 2nd protuberance that the described height at least a portion is higher is formed on the zone corresponding with described servo pattern.
2. pressing mold according to claim 1 is characterized in that,
In described die-side relief pattern, form as described the 2nd protuberance along with the radially corresponding direction of described carrier the 3rd protuberance of formation continuously,
Described the 3rd protuberance the length of the direction corresponding with the circumferencial direction of described carrier than the big position of the length in described the 1st protuberance with described radially corresponding direction on, form described aspect ratio the 1st protuberance height.
3. pressing mold according to claim 1 and 2 is characterized in that,
Described die-side relief pattern formation as described below, the pairing position of unit retaining zone of the synchronization pattern in the promptly described servo pattern is made of recess, forms the 4th protuberance as described the 2nd protuberance simultaneously around this recess,
Described the 4th protuberance forms described the 1st protuberance height of described aspect ratio at least a portion.
4. pressing mold according to claim 3 is characterized in that,
Described the 4th protuberance forms described the 1st protuberance height of described aspect ratio of its Zone Full.
5. a method for stamping is characterized in that,
Resin bed to the formation of coating resin material on the surface of matrix material, the pressing mold of carrying out the described die-side relief pattern push each the described pressing mold in the claim 1 to 4 is in regular turn pushed and is handled and peel off the pressing mold lift-off processing of described pressing mold from described resin bed, and the concaveconvex shape of described die-side relief pattern is duplicated on described resin bed.
6. an information recording medium-manufacturing method is characterized in that,
Utilize the described method for stamping of claim 5, be used in the relief pattern manufacturing information recording medium of duplicating on the described resin bed.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005329601 | 2005-11-15 | ||
| JP2005329601A JP4058444B2 (en) | 2005-11-15 | 2005-11-15 | Stamper, imprint method, and information recording medium manufacturing method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN1966234A true CN1966234A (en) | 2007-05-23 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNA2006101285437A Pending CN1966234A (en) | 2005-11-15 | 2006-08-30 | Stamper, imprinting method, and method of manufacturing an information recording medium |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US20070108163A1 (en) |
| JP (1) | JP4058444B2 (en) |
| CN (1) | CN1966234A (en) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007317310A (en) * | 2006-05-26 | 2007-12-06 | Tdk Corp | Information medium |
| TW200902332A (en) * | 2007-03-26 | 2009-01-16 | Hitachi Maxell | Imprinting jig and imprinting apparatus |
| JP4742074B2 (en) * | 2007-06-29 | 2011-08-10 | 富士フイルム株式会社 | Method for manufacturing magnetic recording medium |
| US20090100677A1 (en) * | 2007-10-23 | 2009-04-23 | Tdk Corporation | Imprinting method, information recording medium manufacturing method, and imprinting system |
| WO2010073800A1 (en) * | 2008-12-22 | 2010-07-01 | 富士通株式会社 | Electronic component and method for manufacturing same |
| US10418235B2 (en) * | 2015-09-17 | 2019-09-17 | Milara Incorporated | Systems and methods for forming electronic devices from nanomaterials |
| JP2022540691A (en) | 2019-07-19 | 2022-09-16 | マジック リープ， インコーポレイテッド | How to process a diffraction grating |
| KR20230020035A (en) * | 2021-08-02 | 2023-02-10 | 삼성디스플레이 주식회사 | Mask for Deposition |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5772905A (en) * | 1995-11-15 | 1998-06-30 | Regents Of The University Of Minnesota | Nanoimprint lithography |
| US6852431B2 (en) * | 2001-10-16 | 2005-02-08 | Canon Kabushiki Kaisha | Magnetic recording media and method for manufacturing the same |
| JP3850718B2 (en) * | 2001-11-22 | 2006-11-29 | 株式会社東芝 | Processing method |
| JP4058425B2 (en) * | 2004-06-10 | 2008-03-12 | Ｔｄｋ株式会社 | Stamper, imprint method, and information recording medium manufacturing method |
| CN1828730B (en) * | 2005-02-28 | 2010-10-13 | Tdk股份有限公司 | Magnetic recording medium, recording/reproducing apparatus, and stamper |
-
2005
- 2005-11-15 JP JP2005329601A patent/JP4058444B2/en not_active Expired - Fee Related
-
2006
- 2006-08-30 CN CNA2006101285437A patent/CN1966234A/en active Pending
- 2006-09-29 US US11/536,954 patent/US20070108163A1/en not_active Abandoned
Also Published As
| Publication number | Publication date |
|---|---|
| US20070108163A1 (en) | 2007-05-17 |
| JP2007141280A (en) | 2007-06-07 |
| JP4058444B2 (en) | 2008-03-12 |
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