CN1964851A - Data processing method, data processing apparatus, mask generation method, and mask pattern - Google Patents

Abstract

The present invention provides a mask for divided printing that completes an image by plural scans using inks of different plural inks, the mask being able to suppress possible grains during printing to reduce image degradation resulting from beading. If for example, among the print permitting pixels for which the total repulsive potential is to be calculated, a print permitting pixel Do has the highest total repulsive potential, changes in repulsive potential after movement of the pixels are determined and the print permitting pixel Do is moved to a pixel having the lowest total repulsive potential after the movement. This processing is repeated to enable a reduction in the total energy of the entire plane. Consequently, the print permitting pixels are appropriately dispersed in overlapping plane masks so as to have few low frequency components.

Description

Data processing method, data processing equipment, mask manufacture method and mask pattern

Technical field

The present invention relates to data processing method, data processing equipment, mask (mask) manufacture method and mask pattern, the mask process and even the mask pattern that are used to generate these record data when in detail, the scanning that relates to the record head by repeatedly forms the inkspot (ink dot) that constitutes document image with cutting apart.

Background technology

In ink-jet printer, extensively adopted so-called multipath (multipath) recording mode.The multipath recording mode is the mode that constitutes the inkspot of this regional image when being formed on the arbitrary region of observing image by repeatedly scanning of record head with cutting apart.According to this mode, the concentration that the convey error etc. of discrete or paper used for recording of discharge performances such as ink emission direction that sprays the nozzle (and even ejiction opening) of ink because of each can be caused is fuzzy etc. is distributed in repeatedly the scanning.Thus, can write down the fuzzy unconspicuous high-quality image of concentration.

But,, be used for forming the generation of the some record data of a plurality of inkspots that constitute document image in scanning repeatedly generally by having used the mask process of mask pattern (mask pattern) (abbreviating " mask " as) with cutting apart.Mask pattern is the pattern of the pixel of having arranged the pixel that allows record (below be also referred to as " record allows pixel ") as described later as shown in Figure 5, not allowed to write down (below be also referred to as " non-record permission pixel ").Record allows pixel to be equivalent to the part of representing with black of Fig. 5, and non-record allows pixel to be equivalent to the part of representing with white.In addition, allow pixel, can produce counting of writing down in each of the scanning that is adjusted at repeatedly, eliminate perhaps that above-mentioned concentration is fuzzy to wait the form corresponding with various purposes by the record that disposes this mask pattern.

For example, 2 kinds of such below mask patterns are effective to the problem on the image quality.

As typical mask pattern, the mask pattern based on the pattern of Bayer type is arranged.But,,, the situation of the problem on the image quality of causing is arranged so cause interference with view data easily because such pattern is regular.

Therefore, in patent documentation 2, the record that disposes randomly in the mask pattern allows pixel, by using such mask pattern with randomness (below be also referred to as random mask), make the interference that is difficult to cause with view data.Thus, the problems referred to above have been improved.

On the other hand, in patent documentation 1, put down in writing the record that makes in the mask pattern allow being configured in of pixel dispersed superior, the reduction that departs from the picture quality that causes of the some formation position when using so dispersed high mask pattern to suppress to write down because of twocouese.That is, the record in the mask put down in writing of the document allows the configuration of pixel to use the notion of repulsion potential energy that it is disperseed well.Change a kind of saying, this mask pattern is to be generated as between the feasible point of as far as possible avoiding using its to form closely to be disposed, thus the few pattern of low-frequency component when allowing the configuration of pixel with the frequency content observed and recorded.In addition, by using this mask, depart from even form the position generation, and hypothesis is because this departs from the appearance (texture: texture) become remarkable of mask pattern self in document image at twocouese record mid point, but owing to it has disperseed well, so can be difficult to identify.

Patent documentation 1: the spy opens the 2002-144552 communique

Patent documentation 2: the spy opens flat 7-052390 communique

Patent documentation 3: the spy opens the 2002-96455 communique

But in ink-jet recording system in recent years, along with the variation of the kind of its high speed, densification and ink, the amount of the ink of paying in the quantity of ink of paying in the unit interval and the unit are of recording medium has the tendency of increase.Therefore, so far as above main problem, can enumerate granulating (beading) problem.Granulating be on the recording medium fully ink absorbed connect and in document image, become the phenomenon of the fuzzy reason that waits in contact on the medium.

In order to reduce granulating, importantly the ink that will pay at short notice is configured on the different positions as far as possible.For this reason, it is effective each color ink being used different mask patterns as far as possible.Thus, can be reduced in the probability that the ink of different colours is sprayed in identical position.

But, just make mask pattern to each color difference, granular reduction is also insufficient.

Figure 86 (a)～(c) is the figure of this problem of explanation.The figure shows the process of spraying each ink to recording medium with the order of cyan (cyan), carmetta (magenta), yellow (yellow) by certain scanning in the multipath record.Shown in Figure 86 (a), at first to also there not being injected recording medium ejection cyan.At this moment, spray the position of each cyan yes the configuration that allows pixel according to the record of employed mask.In addition, absorb fully in recording medium before this ink, there is cyan ink water droplet 10C in the configuration according to the foundation aforementioned mask on recording medium.Then, shown in Figure 86 (b), on position, spray magenta ink equally, before absorbing, form ink droplet 10M equally according to corresponding mask.At this, allow the relation of pixel arrangement according to the record of the mask that respectively cyan and magenta ink is used, have cyan ink water droplet 10C and magenta ink to drip that 10M joins and the situation that forms the ink droplet 10B (position of additional in the drawings * seal) that has been connected.And then shown in Figure 86 (c), similarly, yellow ink is ejected on the position according to corresponding mask, and forms ink droplet 10Y before absorbing.In this case, allow the relation of pixel arrangement, form the ink droplet 10B (position of additional in the drawings * seal) that has connected according to the record of the mask that each ink is used.And then if scan overlappingly, ink droplet uprises with respect to the ratio of pixel, and the situation that identical pixel is sprayed overlappingly ink droplet is then also arranged, form same connection ink droplet.

Like this, paying under the situation of the ink droplet that sprays in proper order to adjacent and even approaching pixel or identical pixel, can be in contact with one another and owing to mutual surface tension attracts, form a big 10B (grain: particle) of the ink droplet be combined into of 2 or 3 (or more than them).If in case form such particle, the ink droplet of then then being paid adjacent and even approaching position attracted to this particle place easily.That is, the initial particle that produces becomes nuclear and gradually grows up, and generates sizable particle.In addition, especially in the same image-region, in photographic fixing on the recording medium position of such particle under coarse brokenly state, disperses existence, can be identified as granulating.

In addition, mask pattern generally uses its pattern in 2 dimension direction cocycles.Therefore, the distribution of above-mentioned particle is the appearance of the cycle period of mask pattern easily by human eye perceives.

In patent documentation 1,2 mask patterns of being put down in writing, can't eliminate these problems.Because in these patent documentations 1,2, between the mask pattern of different colours, do not consider to disperse to design.

Between different colours, do not have in the mask of patent documentation 1,2 of mask design of such relevance, record during for the mask overlap between different colours allows the configuration of pixel, its poor dispersion can't be avoided the adjacency or and then point overlapping of the point in the image midway (intermediate image) of cutting recording.

Summary of the invention

The present invention proposes in order to address the above problem a little, and its purpose is: provide the granular image quality aggravation that a kind of particle midway that can alleviate because of cutting recording produces data processing method, handle treating apparatus, mask manufacture method and mask pattern.

In addition, to have more than be that surface tension owing between the ink produces to above-mentioned particle.For example, pay ink and it is condensed or thawless treatment fluid etc. reacts to each other under the situation of the liquid that forms in identical scanning, each drop that has contacted is because stronger chemical reaction and combination also has its to form the situation of particle.In addition, in identical scanning, pay under the situation of homochromy ink, between them, also produce particle.Therefore, other purposes of the present invention also solve the problem points that produces because of such particle.

The present invention who is used for solving above-mentioned problem is the manufacture method of the mask pattern that uses when generation is used for writing down the view data of multiple point respectively by scanning repeatedly, it is characterized in that comprising: the deciding step of decision and the configuration of above-mentioned multiple corresponding a plurality of mask patterns record permission pixel separately, above-mentioned deciding step comprises: determine that record allows the configuration of pixel, the feasible step that allows the low-frequency component of the configuration decision of pixel to reduce simultaneously in a plurality of mask patterns of correspondence by above-mentioned a plurality of mask patterns record separately.

In other forms, the manufacture method of the mask pattern that when generation is used for writing down the view data of multiple point respectively by scanning repeatedly, uses, it is characterized in that comprising: the deciding step of decision and the configuration of above-mentioned multiple corresponding a plurality of mask patterns record permission pixel separately, above-mentioned deciding step comprises: make above-mentioned a plurality of mask pattern record separately allow the step of the configuration variation of pixel, in this conversion step, make the configuration variation of the record permission pixel of above-mentioned a plurality of mask patterns, make that existing with ... above-mentioned record allows the low-frequency component of the configuration of pixel to reduce.

In addition in other forms, the manufacture method of the mask pattern that when generation is used for writing down the view data of multiple point respectively by scanning repeatedly, uses, it is characterized in that comprising: the deciding step of decision and the configuration of above-mentioned multiple corresponding a plurality of mask patterns record permission pixel separately, above-mentioned deciding step comprises: according to the interrelated predetermined rule of configuration that above-mentioned a plurality of mask patterns record is separately allowed pixel, make the record of above-mentioned a plurality of mask patterns allow the step of the configuration variation of pixel, make it carry out configuration that above-mentioned record after the above-mentioned variation allows pixel and allow configuration of pixel to compare with making its above-mentioned record that carries out before the above-mentioned variation, low-frequency component is few.

In addition in other forms, the manufacture method of the mask pattern that when generation is used for writing down the view data of multiple point of composing images respectively by scanning repeatedly, uses, it is characterized in that comprising: allow the configuration of pixel to be changed to second configuration status from first configuration status by making with above-mentioned multiple corresponding a plurality of mask patterns record separately, thereby determine the deciding step of above-mentioned a plurality of mask pattern configuration separately, the record that the logic product of the above-mentioned a plurality of mask patterns of the configuration pattern that the record that the logic product of the above-mentioned a plurality of mask patterns during according to above-mentioned second configuration status obtains allows pixel with according to above-mentioned first configuration status time obtains allows the configuration pattern of pixel to compare, and low-frequency component is few.

In addition in other forms, the manufacture method of the mask pattern that when generation is used for writing down the view data of multiple point of composing images respectively by scanning repeatedly, uses, it is characterized in that comprising: allow the configuration of pixel to be changed to second configuration status from first configuration status by making with above-mentioned multiple corresponding a plurality of mask patterns record separately, thereby determine the deciding step of above-mentioned a plurality of mask pattern configuration separately, the logic of the above-mentioned a plurality of mask patterns of the configuration pattern that the logic of the above-mentioned a plurality of mask patterns during according to above-mentioned second configuration status and the record that obtains allow pixel with according to above-mentioned first configuration status time and the record that obtains allow the configuration pattern of pixel to compare, the low-frequency component minimizing.

In addition, generation be used for making a plurality of nozzle groups of the multiple point of record the regulation zone of recording medium is repeatedly scanned and write down in the data processing method of this each view data of using that repeatedly scans, it is characterized in that comprising: use the multiple mask pattern corresponding respectively with above-mentioned multiple point, to be divided into the step of the view data of in above-mentioned repeatedly scanning, using respectively with above-mentioned multiple corresponding view data, in above-mentioned multiple mask pattern, at least it is different allowing the arrangement of pixel and allow the arrangement of pixel with the record of corresponding a plurality of second mask patterns of the above-mentioned repeatedly scanning that is used for writing down second kind of point with the record of corresponding a plurality of first mask patterns of the above-mentioned repeatedly scanning that is used for writing down first kind of point, and the low-frequency component of the Pareto diagram of the record permission pixel that obtains according to the logic product of second mask pattern of the regulation in first mask pattern of the regulation in above-mentioned a plurality of first mask patterns and above-mentioned a plurality of second mask patterns staggers with respect to first mask pattern of afore mentioned rules than second mask pattern by making afore mentioned rules and the low-frequency component that carries out the Pareto diagram of the record permission pixel that logic product obtains lacks.

In other forms, generation be used for making a plurality of nozzle groups of the multiple point of record the regulation zone of recording medium is repeatedly scanned and write down in the data processing method of this each view data of using that repeatedly scans, it is characterized in that comprising: use the multiple mask pattern corresponding respectively with above-mentioned multiple point, to be divided into the step of the view data of in above-mentioned repeatedly scanning, using respectively with above-mentioned multiple corresponding view data, in above-mentioned multiple mask pattern, at least it is different allowing the arrangement of pixel and allow the arrangement of pixel with the record of corresponding a plurality of second mask patterns of the above-mentioned repeatedly scanning that is used for writing down second kind of point with the record of corresponding a plurality of first mask patterns of the above-mentioned repeatedly scanning that is used for writing down first kind of point, and the low-frequency component that on regular position second mask pattern of the regulation in first mask pattern of the regulation in above-mentioned a plurality of first mask patterns and above-mentioned a plurality of second mask patterns is carried out the Pareto diagram of the record permission pixel that obtains under the situation of logic product lacks than the low-frequency component that on the position different with above-mentioned regular position second mask pattern of the mat woven of fine bamboo strips one mask pattern of afore mentioned rules and afore mentioned rules is carried out the Pareto diagram of the record permission pixel that obtains under the situation of logic product.

And then in other forms, generation be used for making a plurality of nozzle groups of the multiple point of record the regulation zone of recording medium is repeatedly scanned and write down in the data processing method of this each view data of using that repeatedly scans, it is characterized in that comprising: use the multiple mask pattern corresponding respectively with above-mentioned multiple point, to be divided into the step of the view data of in above-mentioned repeatedly scanning, using respectively with above-mentioned multiple corresponding view data, in above-mentioned multiple mask pattern, at least with the record of corresponding a plurality of first mask patterns of the above-mentioned repeatedly scanning that is used for writing down first kind of point allow pixel arrangement and with the arrangement of the record permission pixel of corresponding a plurality of second mask patterns of the above-mentioned repeatedly scanning that is used for writing down second kind of point be different, second mask pattern record separately of arranging first mask pattern of the regulation in above-mentioned a plurality of first mask pattern and the regulation in above-mentioned a plurality of second mask pattern allows pixel interrelatedly, makes that having record that the logic product according to second mask pattern of first mask pattern of afore mentioned rules and afore mentioned rules obtains allows the low-frequency component characteristic littler than radio-frequency component in the Pareto diagram of pixel.

And then in other forms, generation be used for making a plurality of nozzle groups of the multiple point of record the regulation zone of recording medium is repeatedly scanned and write down in the data processing method of this each view data of using that repeatedly scans, it is characterized in that comprising: use the multiple mask pattern corresponding respectively with above-mentioned multiple point, to be divided into the step of the view data of in above-mentioned repeatedly scanning, using respectively with above-mentioned multiple corresponding view data, in above-mentioned multiple mask pattern, at least with the record of corresponding a plurality of first mask patterns of the above-mentioned repeatedly scanning that is used for writing down first kind of point allow pixel arrangement and with the arrangement of the record permission pixel of corresponding a plurality of second mask patterns of the above-mentioned repeatedly scanning that is used for writing down second kind of point be different, the Pareto diagram of the record permission pixel that obtains according to the logic product of second mask pattern of first mask pattern of the regulation in above-mentioned a plurality of first mask patterns and the regulation in above-mentioned a plurality of second mask pattern be aperiodic and low-frequency component few.

And then in other forms, generation be used for making a plurality of nozzle groups of the multiple point of record the regulation zone of recording medium is repeatedly scanned and write down in the data processing method of this each view data of using that repeatedly scans, it is characterized in that comprising: use the multiple mask pattern corresponding respectively with above-mentioned multiple point, to be divided into the step of the view data of in above-mentioned repeatedly scanning, using respectively with above-mentioned multiple corresponding view data, in above-mentioned multiple mask pattern, at least it is different allowing the arrangement of pixel and allow the arrangement of pixel with the record of corresponding a plurality of second mask patterns of the above-mentioned repeatedly scanning that is used for writing down second kind of point with the record of corresponding a plurality of first mask patterns of the above-mentioned repeatedly scanning that is used for writing down first kind of point, allows the low-frequency component of the Pareto diagram of pixel to stagger with respect to first mask pattern of afore mentioned rules than second mask pattern by making afore mentioned rules according to the logic of second mask pattern of the regulation in first mask pattern of the regulation in above-mentioned a plurality of first mask patterns and above-mentioned a plurality of second mask patterns and the record that obtains and carries out logic and the low-frequency component of the Pareto diagram of the record permission pixel that obtains lacks.

And then in other forms, generation be used for making a plurality of nozzle groups of the multiple point of record the regulation zone of recording medium is repeatedly scanned and write down in the data processing method of this each view data of using that repeatedly scans, it is characterized in that comprising: use the multiple mask pattern corresponding respectively with above-mentioned multiple point, to be divided into the step of the view data of in above-mentioned repeatedly scanning, using respectively with above-mentioned multiple corresponding view data, in above-mentioned multiple mask pattern, at least it is different allowing the arrangement of pixel and allow the arrangement of pixel with the record of corresponding a plurality of second mask patterns of the above-mentioned repeatedly scanning that is used for writing down second kind of point with the record of corresponding a plurality of first mask patterns of the above-mentioned repeatedly scanning that is used for writing down first kind of point, on regular position to second mask pattern of the regulation in first mask pattern of the regulation in above-mentioned a plurality of first mask patterns and above-mentioned a plurality of second mask patterns carry out logic with situation under the record permission pixel that obtains Pareto diagram low-frequency component than on the position different second mask pattern of first mask pattern of afore mentioned rules and afore mentioned rules carried out with above-mentioned regular position logic and situation under the low-frequency component of Pareto diagram of the record permission pixel that obtains lack.

And then in other forms, generation be used for making a plurality of nozzle groups of the multiple point of record the regulation zone of recording medium is repeatedly scanned and write down in the data processing method of this each view data of using that repeatedly scans, it is characterized in that comprising: use the multiple mask pattern corresponding respectively with above-mentioned multiple point, to be divided into the step of the view data of in above-mentioned repeatedly scanning, using respectively with above-mentioned multiple corresponding view data, in above-mentioned multiple mask pattern, at least with the record of corresponding a plurality of first mask patterns of the above-mentioned repeatedly scanning that is used for writing down first kind of point allow pixel arrangement and with the arrangement of the record permission pixel of corresponding a plurality of second mask patterns of the above-mentioned repeatedly scanning that is used for writing down second kind of point be different, second mask pattern record separately of arranging first mask pattern of the regulation in above-mentioned a plurality of first mask pattern and the regulation in above-mentioned a plurality of second mask pattern allows pixel interrelatedly, makes to have according to the logic of second mask pattern of first mask pattern of afore mentioned rules and afore mentioned rules and the record that obtains to allow the low-frequency component characteristic littler than radio-frequency component in the Pareto diagram of pixel.

And then in other forms, generation be used for making a plurality of nozzle groups of the multiple point of record the regulation zone of recording medium is repeatedly scanned and write down in the data processing method of this each view data of using that repeatedly scans, it is characterized in that comprising: use the multiple mask pattern corresponding respectively with above-mentioned multiple point, to be divided into the step of the view data of in above-mentioned repeatedly scanning, using respectively with above-mentioned multiple corresponding view data, in above-mentioned multiple mask pattern, at least it is different allowing the arrangement of pixel and allow the arrangement of pixel with the record of corresponding a plurality of second mask patterns of the above-mentioned repeatedly scanning that is used for writing down second kind of point with the record of corresponding a plurality of first mask patterns of the above-mentioned repeatedly scanning that is used for writing down first kind of point, according to the Pareto diagram of the logic of second mask pattern of first mask pattern of the regulation in above-mentioned a plurality of first mask patterns and the regulation in above-mentioned a plurality of second mask pattern and the record permission pixel that obtains be aperiodic and low-frequency component few.

And then in other forms, generation be used for making a plurality of nozzle groups of the multiple point of record the regulation zone of recording medium is repeatedly scanned and write down in the data processing method of this each view data of using that repeatedly scans, it is characterized in that comprising: use the multiple mask pattern corresponding respectively with above-mentioned multiple point, to be divided into the step of the view data of in above-mentioned repeatedly scanning, using respectively with above-mentioned multiple corresponding view data, in above-mentioned multiple mask pattern, at least with the record of corresponding a plurality of first mask patterns of the above-mentioned repeatedly scanning that is used for writing down first kind of point allow pixel arrangement and with the arrangement of the record permission pixel of corresponding a plurality of second mask patterns of the above-mentioned repeatedly scanning that is used for writing down second kind of point be different, the record that obtains according to the logic product of second mask pattern of the regulation in first mask pattern of the regulation in above-mentioned a plurality of first mask patterns and above-mentioned a plurality of second mask patterns allows the low-frequency component of the Pareto diagram of pixel to stagger with respect to first mask pattern of afore mentioned rules than second mask pattern by making afore mentioned rules and carries out the record that logic product obtains to allow the low-frequency component of the Pareto diagram of pixel to lack, and allows the low-frequency component of the Pareto diagram of pixel to stagger with respect to first mask pattern of afore mentioned rules than second mask pattern by making afore mentioned rules according to the logic of first mask pattern of afore mentioned rules and second mask pattern of afore mentioned rules and the record that obtains and carry out logic and the low-frequency component of the Pareto diagram of the record permission pixel that obtains lacks.

And then in other forms, generation be used for making a plurality of nozzle groups of the multiple point of record the regulation zone of recording medium is repeatedly scanned and write down in the data processing method of this each view data of using that repeatedly scans, it is characterized in that comprising: use the multiple mask pattern corresponding respectively with above-mentioned multiple point, to be divided into the step of the view data of in above-mentioned repeatedly scanning, using respectively with above-mentioned multiple corresponding view data, in above-mentioned multiple mask pattern, at least with the record of corresponding a plurality of first mask patterns of the above-mentioned repeatedly scanning that is used for writing down first kind of point allow pixel arrangement and with the arrangement of the record permission pixel of corresponding a plurality of second mask patterns of the above-mentioned repeatedly scanning that is used for writing down second kind of point be different, the record that on regular position second mask pattern of the regulation in first mask pattern of the regulation in above-mentioned a plurality of first mask patterns and above-mentioned a plurality of second mask patterns is carried out obtaining under the situation of logic product allows the low-frequency component of the Pareto diagram of pixel to allow the low-frequency component of the Pareto diagram of pixel to lack than the record that on the position different with above-mentioned regular position second mask pattern of first mask pattern of afore mentioned rules and afore mentioned rules is carried out obtaining under the situation of logic product, and on the regular position second mask pattern of first mask pattern of afore mentioned rules and afore mentioned rules carried out logic with situation under the record that obtains allow pixel Pareto diagram low-frequency component than on the position different second mask pattern of first mask pattern of afore mentioned rules and afore mentioned rules carried out with above-mentioned regular position logic and situation under the low-frequency component of Pareto diagram of the record permission pixel that obtains lack.

And then in other forms, generation be used for making a plurality of nozzle groups of the multiple point of record the regulation zone of recording medium is repeatedly scanned and write down in the data processing method of this each view data of using that repeatedly scans, it is characterized in that comprising: use the multiple mask pattern corresponding respectively with above-mentioned multiple point, to be divided into the step of the view data of in above-mentioned repeatedly scanning, using respectively with above-mentioned multiple corresponding view data, in above-mentioned multiple mask pattern, at least with the record of corresponding a plurality of first mask patterns of the above-mentioned repeatedly scanning that is used for writing down first kind of point allow pixel arrangement and with the arrangement of the record permission pixel of corresponding a plurality of second mask patterns of the above-mentioned repeatedly scanning that is used for writing down second kind of point be different, arrange first mask pattern of the regulation in above-mentioned a plurality of first mask pattern and second mask pattern record separately of the regulation in above-mentioned a plurality of second mask pattern interrelatedly and allow pixel, make that have record that the logic product according to second mask pattern of first mask pattern of afore mentioned rules and afore mentioned rules obtains allows the low-frequency component characteristic littler than radio-frequency component in the Pareto diagram of pixel, and have according to the logic of second mask pattern of first mask pattern of afore mentioned rules and afore mentioned rules and the record that obtains and allow the low-frequency component characteristic littler in the Pareto diagram of pixel than radio-frequency component.

And then in other forms, generation be used for making a plurality of nozzle groups of the multiple point of record the regulation zone of recording medium is repeatedly scanned and write down in the data processing method of this each view data of using that repeatedly scans, it is characterized in that comprising: use the multiple mask pattern corresponding respectively with above-mentioned multiple point, to be divided into the step of the view data of in above-mentioned repeatedly scanning, using respectively with above-mentioned multiple corresponding view data, in above-mentioned multiple mask pattern, at least with the record of corresponding a plurality of first mask patterns of the above-mentioned repeatedly scanning that is used for writing down first kind of point allow pixel arrangement and with the arrangement of the record permission pixel of corresponding a plurality of second mask patterns of the above-mentioned repeatedly scanning that is used for writing down second kind of point be different, arrange first mask pattern of the regulation in above-mentioned a plurality of first mask pattern and second mask pattern record separately of the regulation in above-mentioned a plurality of second mask pattern interrelatedly and allow pixel, the record that makes logic product according to second mask pattern of first mask pattern of afore mentioned rules and afore mentioned rules obtain allow the Pareto diagram of pixel be aperiodic and low-frequency component few, and according to the logic of second mask pattern of first mask pattern of afore mentioned rules and afore mentioned rules and the record that obtains allow the Pareto diagram of pixel be aperiodic and low-frequency component few.

And then in other forms, generation be used for making a plurality of nozzle groups of the multiple point of record the regulation zone of recording medium is repeatedly scanned and write down in the data processing method of this each view data of using that repeatedly scans, it is characterized in that comprising: use the multiple mask pattern corresponding respectively with above-mentioned multiple point, to be divided into the step of the view data of in above-mentioned repeatedly scanning, using respectively with above-mentioned multiple corresponding view data, above-mentioned multiple mask pattern has respectively and the corresponding a plurality of mask patterns of above-mentioned repeatedly scanning, and the record that the logic product of at least 2 mask patterns of the regulation of using in the same one scan according to the regulation in above-mentioned repeatedly scanning obtains allows the low-frequency component of the Pareto diagram of pixel to stagger than at least 2 mask patterns that make afore mentioned rules and the low-frequency component that carries out the Pareto diagram of the record permission pixel that logic product obtains lacks.

And then in other forms, generation be used for making a plurality of nozzle groups of the multiple point of record the regulation zone of recording medium is repeatedly scanned and write down in the data processing method of this each view data of using that repeatedly scans, it is characterized in that comprising: use the multiple mask pattern corresponding respectively with above-mentioned multiple point, to be divided into the step of the view data of in above-mentioned repeatedly scanning, using respectively with above-mentioned multiple corresponding view data, above-mentioned multiple mask pattern has respectively and the corresponding a plurality of mask patterns of above-mentioned repeatedly scanning, and the logic of at least 2 mask patterns of the regulation of using in the same one scan according to the regulation in above-mentioned repeatedly scanning and the record that obtains allow the low-frequency component of the Pareto diagram of pixel to stagger than at least 2 mask patterns that make afore mentioned rules and carry out logic to allow the low-frequency component of the Pareto diagram of pixel to lack with the record that obtains.

And then in other forms, generation be used for making a plurality of nozzle groups of the multiple point of record the regulation zone of recording medium is repeatedly scanned and write down in the data processing method of this each view data of using that repeatedly scans, it is characterized in that comprising: use the multiple mask pattern corresponding respectively with above-mentioned multiple point, to be divided into the step of the view data of in above-mentioned repeatedly scanning, using respectively with above-mentioned multiple corresponding view data, above-mentioned multiple mask pattern has respectively and the corresponding a plurality of mask patterns of above-mentioned repeatedly scanning, the record that obtains according to the logic product of at least 2 mask patterns of the regulation of using in the same one scan of regulation in above-mentioned repeatedly scanning allows the low-frequency component of the Pareto diagram of pixel to stagger than at least 2 mask patterns that make afore mentioned rules and carries out the record that logic product obtains to allow the low-frequency component of the Pareto diagram of pixel to lack, and allows the low-frequency component of the Pareto diagram of pixel to stagger than at least 2 mask patterns that make afore mentioned rules and carry out logic and the low-frequency component of the Pareto diagram of the record permission pixel that obtains lacks according to the logic of at least 2 mask patterns of afore mentioned rules and the record that obtains.

Generation be used for making a plurality of nozzle groups of the multiple point of record the regulation zone of recording medium is repeatedly scanned and write down in the data processing method of this each view data of using that repeatedly scans, it is characterized in that comprising: use the multiple mask pattern corresponding respectively with above-mentioned multiple point, to be divided into the step of the view data of in above-mentioned repeatedly scanning, using respectively with above-mentioned multiple corresponding view data, above-mentioned multiple mask pattern has respectively and the corresponding a plurality of mask patterns of above-mentioned repeatedly scanning, and the record that obtains according to the logic product of the individual mask pattern of the N of the regulation in a plurality of mask patterns that constitute above-mentioned multiple mask pattern (N for more than or equal to 2 integer) allows the low-frequency component of the Pareto diagram of pixel to stagger than the N that makes an afore mentioned rules mask pattern and the low-frequency component that carries out the Pareto diagram of the record permission pixel that logic product obtains lacks.

And then in other forms, generation be used for making a plurality of nozzle groups of the multiple point of record the regulation zone of recording medium is repeatedly scanned and write down in the data processing method of this each view data of using that repeatedly scans, it is characterized in that comprising: use the multiple mask pattern corresponding respectively with above-mentioned multiple point, to be divided into the step of the view data of in above-mentioned repeatedly scanning, using respectively with above-mentioned multiple corresponding view data, above-mentioned multiple mask pattern has respectively and the corresponding a plurality of mask patterns of above-mentioned repeatedly scanning, and the record that obtains according to the logic product of the individual mask pattern of the N of the regulation in a plurality of mask patterns that constitute above-mentioned multiple mask pattern (N for more than or equal to 2 integer) allows the low-frequency component of the Pareto diagram of pixel to stagger than the N that makes an afore mentioned rules mask pattern and the low-frequency component that carries out the Pareto diagram of the record permission pixel that logic product obtains lacks.

And then in other forms, generation be used for making a plurality of nozzle groups of the multiple point of record the regulation zone of recording medium is repeatedly scanned and write down in the data processing method of this each view data of using that repeatedly scans, it is characterized in that comprising: use the multiple mask pattern corresponding respectively with above-mentioned multiple point, to be divided into the step of the view data of in above-mentioned repeatedly scanning, using respectively with above-mentioned multiple corresponding view data, above-mentioned multiple mask pattern has respectively and the corresponding a plurality of mask patterns of above-mentioned repeatedly scanning, the record that obtains according to the logic product of the individual mask pattern of the N of the regulation in a plurality of mask patterns that constitute above-mentioned multiple mask pattern (N for more than or equal to 2 integer) allows the low-frequency component of the Pareto diagram of pixel to stagger than the N that makes an afore mentioned rules mask pattern and carries out the record that logic product obtains to allow the low-frequency component of the Pareto diagram of pixel to lack, and staggers than the N that makes an afore mentioned rules mask pattern and the low-frequency component that carries out the Pareto diagram of the record permission pixel that logic product obtains lacks according to the low-frequency component of the Pareto diagram of the logic of N mask pattern of afore mentioned rules and the record permission pixel that obtains.

And then, in a plurality of mask patterns that when the view data of the multiple point of each record that generation is used for repeatedly scanning, use, it is characterized in that: for above-mentioned a plurality of mask patterns, make they 2 or above overlapping situation under, the pattern that this record allows pixel allows the pattern of pixel to compare with record under the situation that is staggered in the lap position, and low-frequency component is few.

According to the present invention, can alleviate the granular image quality aggravation that the particle midway because of cutting recording produces.

Description of drawings

Fig. 1 is the block diagram as the structure of the hardware and software of the PC of image processing apparatus of mainly representing one embodiment of the present of invention.

Fig. 2 is the block diagram of flow process of view data conversion process that is used for illustrating the ink-jet recording system of one embodiment of the present of invention.

Fig. 3 is an oblique view of representing the ink-jet recording apparatus that can be suitable in an embodiment of the present invention.

Fig. 4 is the figure of the expression of pattern ground record head, mask pattern and recording medium for 2 paths record is described.

Fig. 5 is the figure of pattern ground expression record head and recording figure forming for the multipath record that 2 paths are described.

The figure of 2 Value Datas of 6 faces (plane) that Fig. 6 A is the expression of pattern ground C, M, Y 2 cutting recordings separately are relevant.

The figure of 2 Value Datas of 6 faces that Fig. 6 B is the expression of pattern ground C, M, Y 2 cutting recordings separately are relevant.

Fig. 7 is the figure of the mask method for making of explanation embodiments of the invention 1.

Fig. 8 is the flow chart of step of the mask method for making of expression embodiments of the invention 1.

Fig. 9 is the figure of function of the basic repulsion potential energy E (r) of pattern ground expression embodiments of the invention.

Figure 10 A is the giving and the figure of the attenuation processing of gross energy (energy) of repulsion potential energy of pattern ground explanation embodiments of the invention 1.

Figure 10 B be pattern ground explanation embodiments of the invention 1 repulsion potential energy give figure with the attenuation processing of gross energy.

Figure 10 C be pattern ground explanation embodiments of the invention 1 repulsion potential energy give figure with the attenuation processing of gross energy.

Figure 10 D be pattern ground explanation embodiments of the invention 1 repulsion potential energy give figure with the attenuation processing of gross energy.

Figure 11 is the flow chart of step of other mask method for makings of expression embodiments of the invention 1.

Figure 12 is the figure of the logic product of explanation mask pattern.

Figure 13 be the explanation mask pattern logic and figure.

Figure 14 is the figure that the record of the mask pattern of expression embodiments of the invention 1 allows the configuration of pixel.

Figure 15 is the figure that the record of the mask pattern of expression embodiments of the invention 1 allows the configuration of pixel.

Figure 16 is the figure that the record of the mask pattern of expression embodiments of the invention 1 allows the configuration of pixel.

Figure 17 is the figure that the record of the mask pattern of expression comparative example allows the configuration of pixel.

Figure 18 is the figure that the record of the mask pattern of other comparative example of expression allows the configuration of pixel.

Figure 19 be expression embodiments of the invention 12 mask patterns logic and record allow the figure of the configuration of pixel.

Figure 20 is the figure that the record of logic product of 2 mask patterns of expression embodiments of the invention 1 allows the configuration of pixel.

Figure 21 be expression embodiments of the invention 13 mask patterns logic and record allow the figure of the configuration of pixel.

Figure 22 is the figure that the record of logic product of 3 mask patterns of expression embodiments of the invention 1 allows the configuration of pixel.

Figure 23 be the expression comparative example 2 mask patterns logic and record allow the figure of the configuration of pixel.

Figure 24 is the figure that the record of logic product of 2 mask patterns of expression comparative example allows the configuration of pixel.

Figure 25 be other comparative example of expression 2 mask patterns logic and record allow the figure of the configuration of pixel.

Figure 26 is the figure that the record of logic product of 2 mask patterns of other comparative example of expression allows the configuration of pixel.

Figure 27 is the figure of " stack " pattern of explanation mask pattern.

Figure 28 is the figure of configuration of record permission pixel of " stack " of 2 mask patterns of expression embodiments of the invention 1.

Figure 29 is the figure of configuration of record permission pixel of " stack " of 3 mask patterns of expression embodiments of the invention 1.

Figure 30 is the figure of configuration of record permission pixel of " stack " of 2 mask patterns of expression comparative example.

Figure 31 is the figure of configuration of record permission pixel of " stack " of 2 mask patterns of other comparative example of expression.

Figure 32 is respectively at the figure of the frequency characteristic of 1 mask of mask explanation of the mask of embodiments of the invention 1 and existing example.

Figure 33 be respectively at the logic of 2 masks of mask explanation of the mask of embodiments of the invention 1 and existing example and the figure of frequency characteristic.

Figure 34 is respectively at the figure of the frequency characteristic of the logic product of 2 masks of mask explanation of the mask of embodiments of the invention 1 and existing example.

Figure 35 is respectively at the figure of the frequency characteristic of " stack " of 2 masks of mask explanation of the mask of embodiments of the invention 1 and existing example.

Figure 36 is respectively at the figure of the frequency characteristic of " stack " of 3 masks of mask explanation of the mask of embodiments of the invention 1 and existing example.

Figure 37 be expression embodiments of the invention 1 mask is staggered the time 2 mask patterns logic and record allow the figure of the configuration of pixel.

Figure 38 be expression embodiments of the invention 1 mask is staggered the time the record of logic product of 2 mask patterns allow the figure of the configuration of pixel.

Figure 39 be expression embodiments of the invention 1 mask is staggered the time the figure of configuration of record permission pixel of " stack " of 2 mask patterns.

Figure 40 be the mask of expression embodiments of the invention 1 and the logic that makes its mask 2 mask patterns separately that staggered and the figure of energy frequency spectrum.

Figure 41 be the mask of expression comparative example and the logic that makes its mask 2 mask patterns separately that staggered and the figure of energy frequency spectrum.

Figure 42 be the mask of other comparative example of expression and the logic that makes its mask 2 mask patterns separately that staggered and the figure of energy frequency spectrum.

Figure 43 is the figure of the energy frequency spectrum of the mask of expression embodiments of the invention 1 and the logic product that makes its mask 2 mask patterns separately that staggered.

Figure 44 is the figure of the energy frequency spectrum of the mask of expression comparative example and the logic product that makes its mask 2 mask patterns separately that staggered.

Figure 45 is the figure of the energy frequency spectrum of the mask of other comparative example of expression and the logic product that makes its mask 2 mask patterns separately that staggered.

Figure 46 is the figure of the energy frequency spectrum of the mask of expression embodiments of the invention 1 and " stack " that makes its mask 2 mask patterns separately that staggered.

Figure 47 is the figure of the energy frequency spectrum of the mask of expression comparative example and " stack " that makes its mask 2 mask patterns separately that staggered.

Figure 48 is the figure of the energy frequency spectrum of the mask of other comparative example of expression and " stack " that makes its mask 2 mask patterns separately that staggered.

Figure 49 is the figure of the energy frequency spectrum of the mask of expression embodiments of the invention 1 and " stack " that makes its mask 3 mask patterns separately that staggered.

Figure 50 is the mask and the different figure that makes its mask logic separately that has staggered with the low-frequency component of, logic product and " stack " of expression embodiments of the invention 1.

Figure 51 is the mask and the different figure that makes its mask logic separately that has staggered with the low-frequency component of, logic product and " stack " of expression comparative example.

Figure 52 is the mask and the different figure that makes its mask logic separately that has staggered with the low-frequency component of, logic product and " stack " of other comparative example of expression.

Figure 53 is the figure of the mask method for making of explanation embodiments of the invention 2.

Figure 54 is the figure of the mask method for making of explanation embodiments of the invention 2.

Figure 55 is the figure that the record of the mask pattern of expression embodiments of the invention 2 allows the configuration of pixel.

Figure 56 is the figure that the record of the mask pattern of expression embodiments of the invention 2 allows the configuration of pixel.

Figure 57 is the figure that the record of the mask pattern of expression embodiments of the invention 2 allows the configuration of pixel.

Figure 58 is the figure of configuration of record permission pixel of " stack " of 3 mask patterns of expression embodiments of the invention 2.

Figure 59 is the figure of configuration of record permission pixel of " stack " of 6 mask patterns of expression embodiments of the invention 1.

Figure 60 is the figure of configuration of record permission pixel of " stack " of 9 mask patterns of expression embodiments of the invention 2.

Figure 61 be expression embodiments of the invention 2 mask is staggered the time the figure of configuration of record permission pixel of " stack " of 3 mask patterns.

Figure 62 be expression embodiments of the invention 2 mask is staggered the time the figure of configuration of record permission pixel of " stack " of 6 mask patterns.

Figure 63 be expression embodiments of the invention 2 mask is staggered the time the figure of configuration of record permission pixel of " stack " of 9 mask patterns.

Figure 64 be expression embodiments of the invention 2 mask with it is staggered after the different figure of low-frequency component of mask " stack " separately.

Figure 65 A is the figure of the mask of explanation embodiments of the invention 3.

Figure 65 B is the figure of the mask of explanation embodiments of the invention 3.

Figure 66 is the flow chart of step of the mask method for making of expression embodiments of the invention 3.

Figure 67 is the flow chart of step of other mask method for makings of expression embodiments of the invention 3.

Figure 68 is the figure that the record of the mask pattern of expression embodiments of the invention 3 allows the configuration of pixel.

Figure 69 is the figure that the record of the mask pattern of expression embodiments of the invention 3 allows the configuration of pixel.

Figure 70 is the figure that the record of the mask pattern of expression embodiments of the invention 3 allows the configuration of pixel.

Figure 71 be expression embodiments of the invention 32 mask patterns logic and record allow the figure of the configuration of pixel.

Figure 72 is the figure that the record of logic product of 2 mask patterns of expression embodiments of the invention 3 allows the configuration of pixel.

Figure 73 is the figure of configuration of record permission pixel of " stack " of 2 mask patterns of expression embodiments of the invention 3.

Figure 74 is the figure of configuration of record permission pixel of " stack " of 3 mask patterns of expression embodiments of the invention 3.

Figure 75 be expression embodiments of the invention 3 mask is staggered the time 2 mask patterns logic and record allow the figure of the configuration of pixel.

Figure 76 be expression embodiments of the invention 3 mask is staggered the time the record of logic product of 2 mask patterns allow the figure of the configuration of pixel.

Figure 77 be expression embodiments of the invention 3 mask is staggered the time the figure of configuration of record permission pixel of " stack " of 2 mask patterns.

Figure 78 be expression embodiments of the invention 3 mask is staggered the time the figure of configuration of record permission pixel of " stack " of 3 mask patterns.

Figure 79 be the mask of expression embodiments of the invention 3 and the logic that makes its mask 2 mask patterns separately that staggered and the figure of energy frequency spectrum.

Figure 80 is the figure of the energy frequency spectrum of the mask of expression embodiments of the invention 3 and the logic product that makes its mask 2 mask patterns separately that staggered.

Figure 81 is the figure of the energy frequency spectrum of the mask of expression embodiments of the invention 3 and " stack " that makes its mask 2 mask patterns separately that staggered.

Figure 82 is the figure of the energy frequency spectrum of the mask of expression embodiments of the invention 3 and " stack " that makes its mask 3 mask patterns separately that staggered.

Figure 83 is the mask and the different figure that makes its mask logic separately that has staggered with the low-frequency component of, logic product and " stack " of expression embodiments of the invention 3.

Figure 84 is the figure of the mask that uses in the multipath record in 2 paths of explanation embodiments of the invention 4.

Figure 85 is the figure of the mask that uses in the multipath record in 2 paths of explanation embodiments of the invention 5.

Figure 86 is the figure of explanation prior art problems point.

The specific embodiment

Below, describe embodiments of the invention with reference to the accompanying drawings in detail.

Embodiments of the invention relate to manufacturing and even this mask pattern of mask of the some record data of 2 values that each scanning of being used for being created on the multipath record uses.Before explanation concrete several embodiment of the present invention, explanation earlier is used to make mask pattern or uses mask pattern to generate the structure of some record data.At this, in this manual, " some record data " are meant the data of the record of expression point.

Fig. 1 is the block diagram of the structure of the main hardware of the personal computer (being designated hereinafter simply as PC) of bringing into play function as main equipment of expression one embodiment of the present of invention and software.This main equipment generates the view data with printer 104 records.

In Fig. 1, make each software operation of application software 101, printed driver 103, watchdog driver 105 by operating system (OS) 102 as the PC100 of master computer.Application software 101 carries out and relevant processing such as word processing, table calculating, internet browsing.Watchdog driver 105 is carried out the processing that makes the view data that shows etc. on monitor 106.

103 couples of various drawing instruction groups that send to OS102 from application software 101 of printed driver (image displaying instruction, text drawing instruction, figure drawing instruction etc.) describe to handle, and finally are created on the view data of 2 values of using in the printer 104.In detail, by carrying out image processing described later in Fig. 2, be created on the view data of a plurality of ink colors 2 values separately of using in the printer 104.

As the various hardware that are used to make above software operation, master computer 100 possesses CPU108, hard disk (HD) 107, RAM109, ROM110 etc.That is, CPU108 carries out its processing according to the above-mentioned software program that is stored among hard disk 107 or the ROM110, and RAM109 is used as the working region when carrying out this processing.

The printer 104 of present embodiment is that the record head of ejection ink is scanned recording medium, sprays the printer of the so-called serial mode that ink writes down betwixt.Prepare record head accordingly with each ink of C, M, Y, K,, can scan recording mediums such as paper used for recording by they being installed on the carriage (carriage).The arranging density of the ejiction opening of each record head is 1200dpi, sprays the ink droplet of 3.0 picoliters from each ejiction opening.In addition, the number of the ejiction opening of each record head is 512.

Printer 104 is the tape decks that can carry out the multipath record.Therefore, the mask that each embodiment described later is illustrated is stored in the memory of regulation in advance, when record, carries out following processing, promptly uses the divided image data that the mask that each scans and ink color is determined is generated 2 values.

In addition, in advance mask pattern be not stored in the memory of regulation, when PC100 brings into play function as being used for the data processing equipment of mask manufacturing, is carrying out the mask manufacturing of explanation processing respectively in each embodiment described later.In addition, the mask data of having made is stored in the memory of regulation of printer 104.

Fig. 2 is the block diagram of explanation key data processing procedure of the PC100 when writing down with printer 104 and printer 104 in structure shown in Figure 1.The ink-jet printer 104 of present embodiment carries out record by 4 chromatic inks of cyan, carmetta, yellow, black as described above, therefore, possesses the record head J0010 of the ink of this 4 look of ejection.

The user can make the view data with printer 104 records via the application program 101 of main PC100.In addition, when writing down, will send to printed driver 103 by the view data that application program 101 makes.

As its processing, printed driver 103 is carried out leading portion respectively and is handled J0002, back segment and handle J0003, γ and revise that J0004,2 values handle J0005, printed data makes J0006.Handle among the J0002 at leading portion, carry out the colour gamut conversion, the colour gamut that display had that is about to the picture of display application program is transformed to the colour gamut of printer 104.Specifically, will be with each view data R, G, 8 Bit data R, G, the B in the colour gamut that B is transformed to printer of 8 bits performances R, G, B by 3 dimension LUT.Then, in back segment is handled J0003, the color of reproducing the colour gamut after the conversion is decomposed into ink color.Specifically, handle and obtain and be used for being reproduced in leading portion and handle corresponding 8 Bit data C, M, Y, the K of combination of inks of the represented color of 8 Bit data R, G, B that J0002 obtains.Revise among the J0004 at γ, each data of decomposing the CMYK that obtains by color are carried out γ revise.Specifically, carry out following such conversion, promptly make each color range characteristic of the 8 Bit data CMYK that obtain by the color decomposition corresponding linearly with printer.Then, in J0005 is handled in 2 values, carry out quantification treatment and will carry out the revised 8 Bit data C of γ, M, Y, K and be transformed to 1 Bit data C, M, Y, K respectively.At last, make at printed data and to handle among the J0006, to 2 values 1 Bit data C, M, K, Y be the view data overprinting control data etc. of 2 values of content, make printed data.At this, the view data of 2 values comprises the non-record data of point of non-record of some record data, the expression point of the record of expression point.In addition, the printing control data is made of " recording medium information ", " recording quality information ", form feeding method etc. such " other control informations ".The printed data of Sheng Chenging is provided for printer 4 as described above.

On the other hand, 104 pairs of the printers view data that is included in 2 values in the printed data that input comes is carried out mask data conversion process J0008.In mask data conversion process J0008, use the mask pattern that in each embodiment described later, illustrates in the memory of the regulation be stored in printer in advance, the view data of importing 2 values of coming is implemented the AND processing.Thus, in the divided image data of 2 values of using in each scanning in being created on the multipath record, the timing of the actual ejection of decision ink.In addition, in the divided image data of 2 values, comprise a record data and the non-record data of point.

Fig. 3 is the oblique view of expression ink-jet printer 104.Carriage M4000 is installing record head and is providing to it that the directions X (main scanning direction) to figure moves under each state of ink tank H1900 of ink of cyan (C), carmetta (M), yellow (Y), black (K), each nozzle of record head sprays ink according to the divided image data of 2 values under predetermined timing.If 1 main scanning of record head finishes, then recording medium is only carried ormal weight to the Y of figure direction (sub scanning direction).Carry out above record main scanning and subscan by alternate cycles, sequentially form image based on the multipath record.

Below, illustrate that scanning by the image of finishing the multipath record that uses or make (below be also referred to as the path) number of times and record allow the manufacture method of the mask pattern that the ratio of pixel distinguishes and based on its several embodiment of mask pattern in above-mentioned register system.

[write down with 100% impartial mask in embodiment 1:2 path]

(1) summary of present embodiment

Present embodiment relates to finishes the multipath record in 2 paths of image to each ink of cyan (C), carmetta (M), yellow (Y), black (K) by 2 scanning.In addition, for each of the ink color that in the record of this 2 path, uses, the mask that just in each of the scanning of repeatedly (being 2 times in the present embodiment), uses (below, the mask that is called " 1 face ") disperse well, any a plurality of the mask that has made up these masks also disperses well.

Fig. 4 is the figure of the expression of pattern ground record head, mask pattern and recording medium for 2 paths record is described.In addition, in the figure,, the situation of carrying out 2 paths record with cyan, carmetta, 3 yellow looks is described for simplicity of illustration and explanation.Below, for illustrated mask too.

Cyan, carmetta, each yellow color nozzle group are split into 2 groups of first group and second group, respectively comprise 256 nozzles in each group.Each group is corresponding with the mask pattern (C1, C2, M1, M2, Y1, Y2) of present embodiment, and the size of the sub scanning direction of each mask pattern (throughput direction) is 256 amount of pixels identical with the nozzle number of each group.In addition, the size of scanning direction also is 256 amount of pixels.In addition, and with the relation of corresponding 2 mask patterns (C1 and C2 or M1 and M2 or Y1 and Y2) of the nozzle group of chromatic ink, if make them overlapping then become the structure of the record of finishing the zone corresponding with 256 * 256 pixels for supplying mutually.

Each color nozzle group is scanned to the direction (" scanning direction " shown in the arrow of figure) with nozzle arrangement direction approximate vertical on one side, on one side to recording medium ejection ink.In the present example, each zone is carried out the ink ejection of C, M, Y.In addition, at each end of scan, all recording medium is carried at every turn 1 group width extent (is 256 amount of pixels at this) to the direction vertical with the scanning direction (" recording medium transporting direction " shown in the arrow of figure).Thus, come image is finished in the zone of the size corresponding with width each group recording medium by 2 scanning.

If further specifically describe, in first scanning,, use first group of C nozzle group, first group of M nozzle group, first group of Y nozzle group to the regional A on the recording medium, carry out record according to the order of CMY.In addition, in this first scanning, regional A is used mask pattern C1, mask pattern M1, mask pattern Y1.

Then, in second scanning, at first scanning in record end regional A, carry out remaining record with second group of the C nozzle group that uses in order of YMC, second group of M nozzle group, second group of Y nozzle group, simultaneously to the area B of recording status not, use first group of C nozzle group, first group of M nozzle group, first group of order of Y nozzle group to carry out record with YMC.Therefore, in second scanning, regional A is used mask pattern C2, mask pattern M2, mask pattern Y2, simultaneously area B is used mask pattern C1, mask pattern M1, mask pattern Y1.And then, by proceeding such action, record is carried out in each zone with the order of C1M1Y1Y2M2C2 or the order of Y1M1C1C2M2Y2.

Fig. 5 conceptually illustrates the mask that uses in the 2 paths record that has illustrated and supplies the ideograph of relation in Fig. 4.In Fig. 5, P0001 represents the record head of a color among C shown in Figure 4, M, the Y, at this, for simplicity of illustration, has 8 nozzles and be expressed as.Nozzle is split into 2 groups of first and second as described above, comprises 4 nozzles in each nozzle sets respectively.P0002A and P0002B represent respectively and this nozzle rows corresponding mask pattern of first and second groups.That is, be the mask pattern P0002A pattern of downside (in the figure as) that in first scanning, uses and the mask pattern P0002B that in second scans, the uses pattern of upside (in the figure as).They are respectively 1 mask.Each mask pattern represents that with blacking record allows pixel, represents that with white non-record allows pixel.The mask pattern P0002B of the mask pattern P0002A of the first scanning usefulness and the second scanning usefulness is in the relation of supplying mutually, therefore, if they are overlapping, then become record and allows pixel to comprise the pattern in whole 4 * 4 zone.In addition, for easy explanation, illustrated pattern table is shown the pattern different with the mask pattern of present embodiment shown below.In the figure, record allows being configured to sawtooth and falling sawtooth of pixel, but the mask pattern of configuration is not comprised in the scope of the present invention like this.

At this, " record allows pixel " and " non-record permission pixel " are defined.As mentioned above, " record allows pixel " is meant the pixel of the record (ejection of ink) that allows point.If the view data of 2 values corresponding with this recording pixel is data of expression ejection, then carry out a record, if represent the data of non-ejection, then do not carry out a record.On the other hand, " non-record permission pixel " is that view data with 2 values does not irrespectively allow the pixel that writes down.Therefore, are data of expression ink ejection even hypothesis allows the view data of 2 corresponding values of pixel with this non-record, do not carry out record yet.

P0003 and P0004 represent to write down the image of finishing by 2 paths with the some configuration that constitutes it.In addition, in order to describe easily, this image is the so-called full images that all forms in whole pixels a little, and therefore the record of the mask P0002 that uses in the generation of these record data point that allows the configuration of pixel to reflect disposes with representing former state.In first scanning, use mask pattern P0002A to generate first group some record data.In addition, the direction of arrow in figure is the width ground conveying recording medium of nozzle sets at every turn.In next second scanning, the same mask pattern P0002A that uses generates and the first group regional corresponding some record data that have been offset above-mentioned conveying capacity, use mask pattern P0002A generation with above-mentioned first group record second group regional corresponding some record data.Finish image by this 2 writing scans.

Fig. 6 A～B is the ink (as mentioned above, having omitted black K for the purpose of simplifying the description) that C, M, Y are used in explanation, the figure of the situation of the 2 paths record that has carried out illustrating in Fig. 4 and Fig. 5.As shown in Figure 6, use mask C1, M1, Y1, C2, M2, Y2, by each ink of 2 scanning (in the example shown in Fig. 6 A～B) ejection C, M, Y, record color image for going scanning and flyback retrace.

Fig. 6 A has represented to finish the situation of the image in the zone of being write down with the order of going scanning (scanning to right of Fig. 4), flyback retrace (scanning of the direction left of Fig. 4).As going in the scanning of scanning for the first time, initial, according to the some record data of the cyan of using first path with the divided image data of the cyan of mask (mask C1) generation, record cyan image.In with one scan, some record data according to the divided image data that uses carmetta and yellow mask (mask M1, Y1) separately to generate, sequentially earlier write down the carmetta image overlappingly, then with the cyan, the carmetta doubling of the image ground record yellow image that have write down before with the cyan image that has write down before.Recording medium carried behind the ormal weight as the flyback retrace that scans for the second time in, equally sequentially according to the some record data of each yellow, carmetta and the cyan of using mask Y2, M2, C2 to generate, carry out record with the doubling of the image ground that has write down before.

On the other hand, Fig. 6 B has represented with flyback retrace (scanning of the direction left of Fig. 4), has gone the order of scanning (scanning to right of Fig. 4) to finish the situation of the image in the zone of being write down.In flyback retrace as the scanning first time, initial, according to the some record data of the yellow of using first path with the divided image data of the yellow of mask (mask Y1) generation, record yellow image.In with one scan, some record data according to the divided image data that uses carmetta and cyan mask (mask M1, C1) separately to generate, sequentially earlier write down the carmetta image overlappingly, then with the yellow, the carmetta doubling of the image ground record cyan image that have write down before with the yellow image that has write down before.Recording medium carried behind the ormal weight as going in the scanning of scanning for the second time, equally sequentially according to each cyan of using mask C2, M2, Y2 to generate, carmetta and yellow some record data, carry out record with the doubling of the image ground that has write down before.

Like this, when 3 looks that use C, M, Y use 2 scanning to finish the 2 paths record of image, existence made up the image of the carmetta image in the cyan image in first path and first path, on this image and then the image of the yellow image in overlapping first path and then the intermediate image of the image of each face of the figure overlapping mask like this of the yellow image in overlapping second path on the image in these first paths.In such intermediate image, the situation that is created in the particle that has illustrated among Figure 86 (a)～(c) is arranged.Special variation in the kind that is accompanied by the high speed of record, densification, employed ink, and under the situation that the amount of the ink that the per unit area of quantity of ink that time per unit is paid and recording medium is paid increases, it is remarkable that the generation of this particle in the intermediate image becomes.In addition, be identified as the granulating of irregular blotches pattern etc. in the image that the particle that produces has been finished in the photographic fixing of former state ground in intermediate image.

In the present embodiment, the generation of the particle in such intermediate image, and make the record when the overlapping mask of each face allow the configuration of pixel to have the few characteristic of low-frequency component.Because low-frequency component is few, so the deviation of the inkspot in the intermediate image in each stage can be remained few state.In addition, as important characteristic, in order to prevent the interference with view data or other noises etc., and make it have aperiodic pattern properties.That is, the record when the overlapping mask of face allows the configuration of pixel to have aperiodic and the few characteristic of low-frequency component, and is dispersed superior.Thus, get rid of as far as possible point in the intermediate image in each stage till image is finished near so that in abutting connection with and point overlapping.In addition, even in hypothesis fully under the situation of the overlapping or adjacency of elimination point, the dispersiveness of such position overlapped etc. is also very high.

In addition, " low-frequency component " is meant the composition than half also low frequency side that is arranged in the existing spatial frequency of frequency content (energy frequency spectrum) zone.

(2) method for making of mask

The manufacture method of the mask of embodiments of the invention roughly can be implemented any one in 2 following methods: the method (generating simultaneously) that generates the mask in a plurality of paths simultaneously; Each path order ground is generated the method (to the generation in each path) of mask.The former the time generation method generate the mask in (number of path (scanning times)-1 of finishing image) individual path simultaneously, and the mask that generates a remaining path make its record allow pixel with respect to the record of the mask that has generated simultaneously allow pixel be configured to exclusive.The latter's the generation method to each path is that each of a plurality of paths (scanning) of finishing image sequentially generated the method for mask, the mask in last path is the same with the former method, generate its record allow pixel make record with respect to the mask that has generated so far allow pixel be configured to exclusive.In addition, under the situation of present embodiment, owing to be the mask that in 2 paths records, uses, be the same so generate simultaneously with generation to each path.

And then, for each of above-mentioned 2 generation methods, allow the method for the configuration of pixel as the concrete decision record, can carry out following method: allow pixel as the configuration of predesignating whole records of mask, they are moved on one side, the mask that generated all on improve dispersed method (hereinafter referred to as " dispose mobile method ") on one side; On the mask that is generated is all, improve on one side dispersed, the method (hereinafter referred to as " arranged in order method ") of configuration record permission pixel seriatim on one side.

Fig. 7 is the figure of method for making that conceptually represents the mask that uses of present embodiment in 2 paths records.

As the step 1 that mask generates, be created on mask C1, M1, the Y1 of each face that uses in first path.In addition,, be created on mask C2, M2, the Y2 of each face that uses in second path, make that respectively mask C1, M1, the Y1 with above-mentioned first path has the relation of supplying as step 2.That is, for each color, the mask that generates second path make configuration that its record allows pixel and the mask in first path record permission pixel be configured as exclusive relation.

In the method for making of above mask, carry out mask C1, the M1 in first path, the configuration that Y1 record separately allows pixel as follows.The mobile method of initial explanation configuration, then declaration order collocation method.In addition, certainly use any one of these collocation methods.

Dispose mobile method

Fig. 8 is the flow chart that the record of the mask that uses in the record of 2 paths of expression present embodiment allows the configuration decision based on the mobile method of configuration of pixel to handle.

At first, in step S801, obtain and mask C1, the M1 in first path, big or small corresponding C, the M of Y1 face separately, the image of Y 50% concentration separately.Then, in step S802, at each image, 2 value methods such as use error diffusion method are carried out 2 values.Thus, for mask C1, M1, Y1 face separately, can access mask pixels all 50% in disposed 1 bit data are initial configuration that the record of " 1 " allows pixel.In addition, using this 2 value method to obtain writing down the initial configuration that allows pixel is owing to can obtain the method configuration of good dispersion under original state to a certain degree accordingly with employed 2 values, also owing to can shorten computing time and even convergence time till later final configuration decision thus.Change a kind of saying, be suitable on the basis of the present invention, the method that obtains initial configuration is not an essence, for example can be that the data that disposed 1 bit in the face of mask randomly are initial configuration that the record of " 1 " allows pixel yet.

Then, in step S803,, calculate repulsion potential energy at whole records permission pixels of above-mentioned mask C1, the M1 that obtains like that, Y1 face separately.Specifically,

(i) give the repulsion corresponding between the pixel to allowing with distance with the record in the one side.

(ii) and then, allow pixel also to give repulsion to the record between the different faces.

(iii) to simultaneously and between the different faces giving different repulsion together.

The record of (iv) confirming different faces allows the overlapping of pixel, to record allow pixel overlapping (2 records allow pixels overlapping, and 3 records allow pixels overlapping ...) between also give and make up corresponding repulsion.

Fig. 9 is the figure of function of the basic repulsion potential energy E (r) of pattern ground expression present embodiment.

As shown in the drawing, Gui Ding its repulsion of repulsion function scope in one's power is set to (the pixel up to r=16 in the present embodiment; Configuration record allows the pixel of the mask of pixel).By using the potential energy of decaying with such distance, if record allows pixel by near configuration then become the high state of energy basically, i.e. unsure state, as the convergence result calculated, can try one's best do not select near configuration.

In addition, better is to allow the pixel ratio all with respect to mask pixels to decide the shape of this repulsion according to record.

In addition, under the situation that the ink that uses multiple color writes down, more than or equal to the position that can dispose inkspot (under the situation of resolution ratio 1200,1200 * 1200 possible positions are arranged in 1 inch four directions) the overlay configuration inkspot, so when writing down permission pixel calculating repulsion potential energy at each, on the basis of record permission pixel, also to consider to write down the overlapping of permission pixel.Therefore, defined function makes to have limited repulsion potential energy when r=0.Thus, can consider also that record allows the overlapping dispersion of pixel.

In the present embodiment, for the repulsion potential energy that allows to give between the pixel α E (r) with the record of one side, allow to give between the pixel repulsion potential energy of β E (r) for the record between the different faces, repulsion potential energy for giving γ s (n) E (r) between the overlapping record permission pixel calculates.That is, owing to the potential energy that exists certain record to allow pixel to produce be be positioned at apart from r with the record of same one side of scope allow pixel, the record of coplanar allow pixel and not the overlapping record of coplanar allow the repulsion potential energy addition of pixel.

In addition, the size of mask pattern is limited (under the situation of present embodiment, being 256 * 256 pixels), but in potential energy calculates, and uses the identical patterns of 256 * 256 pixels such periodic boundary condition that just in time circulates.Therefore, the left end of mask pattern and right-hand member adjacency are down with last adjacency.

In above-mentioned repulsion potential energy, factor alpha, β, γ are weight coefficients, in the present embodiment, use α=3, β=1, the value of γ=3.According to the value of this α, β, γ, record allows the dispersiveness of pixel to be affected.For example can test by actual, the document image of consulting and using the mask record carries out optimization, and obtains the value of this α, β, γ.

In addition, coefficient s (n) adds γ and then the coefficient that carries out multiplying in order to make overlapping record allow the pixel dispersion.This coefficient s (n) is the overlapping corresponding value of the number with overlapping that makes these records allow pixel to disperse more at most.According to the present application people's test,, can access disperseing favourable result by using any one s that obtains (n) according to 2 following formulas.

[formula 1]

$s\left(n\right)=\underset{i=1}{\overset{n}{\mathrm{\Σ}}}\mathrm{nCi}$ Or $s\left(n\right)=\underset{i=1}{\overset{n-1}{\mathrm{\Σ}}}\mathrm{nCi}$

That is, when to establish n be overlapping number, the number of combination and be s (n).In detail, investigation and the concern record that calculates repulsion allow the record of pixel overlapping (identical faces or not the same position in the coplanar) to allow pixel, investigate simultaneously from paying close attention to the record that record allows pixel to be positioned at apart from r and allow pixel.In this case, pay close attention to record and allow that pixel and record at other faces of the location overlap identical with this pixel allow pixel, to allow the common overlapping number of pixel be n being positioned at the similarly overlapping record in this pixel place apart from each face of r.In addition, consider that overlapping record between these 2 pixels allows the repulsion between the pixel.

In this case, in two and the 3rd of first, the mat woven of fine bamboo strips, commonly exist record to allow the example of pixel, then n=3 between certain 2 pixel respectively if for example consider.In addition, between these pixels, make because of 3 records allow the overlapping repulsion that produces of pixel and work.At this, when considering to allow the overlapping repulsion that produces of pixels, think to allow the overlapping of pixels with 3 records because of 3 records, 2 records allow between pixels overlapping or 1 record permission pixel between the multiple effect of repulsion generation.Change a kind of saying, if consider the 3rd, 2 records that then may be thought of as first and second allow the overlapping of pixels, if do not consider second in addition, then also may be thought of as first and the 3rd 's 2 record permission pixels overlapping.If do not consider first, then may be thought of as the overlapping of second and the 3rd.Allow the overlapping multiple effect of pixel in order to calculate such record, definition is used s as described above (n) because of the repulsion of overlapping combination results.Thus, confirm that in test the record that can access good dispersion allows pixel arrangement.

If referring again to Fig. 8, then in step S803, obtain the gross energy behind the repulsion potential energy that has added up to whole records to allow pixel.In addition, make the processing of this gross energy decay.

In this is handled, allow pixel for whole records, be 4 sequentially will write down the permission pixel in interior pixel and move to the minimum pixel place of repulsion potential energy at distance r.Carry out such processing (step S804) by circulation, make as whole record to allow the gross energy of aggregate value of the repulsion potential energy of pixel to reduce.That is, the process that this gross energy reduces gradually in proper order is exactly that record allows the configuration sequence ground of pixel to improve the process of dispersiveness, and promptly record allows the process that the low-frequency component of pixel arrangement sequentially reduces.

In step S805, the reduced rate of the gross energy among the calculation procedure S804 if judge it smaller or equal to setting, then finishes energy attenuation and handles.In addition, for example can obtain this setting as the reduced rate that can write down the image that has suitably suppressed low-frequency component according to the actual result who carries out printing.

At last, in step S806, the reduced rate that gross energy as described above is set as mask C1, M1, the Y1 in first path is each face smaller or equal to the state of setting.And then, be provided with the record of these masks and allow each corresponding exclusive position of the configuration of pixel to be set to write down mask C2, M2, the Y2 in second path of the configuration that allows pixel.

In addition, in the present embodiment, whether the reduced rate of judging gross energy in step S805 is smaller or equal to setting, if reduced rate smaller or equal to setting, is then transferred to step S806.But present embodiment has more than and is limited to this example.For example, also can whether in step S805, judge gross energy, if gross energy smaller or equal to setting, is then transferred to step S806 smaller or equal to setting.

Figure 10 A～D is the figure of the attenuation processing of the calculating of the above-mentioned repulsion potential energy of pattern ground explanation and gross energy.In detail, be to represent C1, the M1 of present embodiment, 3 faces of Y1 with oblique view, allow the figure that moves of pixel in addition especially with the plan representation record.At this, minimum square is represented the pixel of mask, in 3 faces overlapping overlapping pixel be that identical location of pixels is corresponding between face.

Figure 10 A illustrates have the figure that gives (increase) potential energy under the situation that writes down the permission pixel owing to the repulsion between these record permission pixels in simultaneously.In the example shown in the figure, be with exist a record to allow the example of pixel during the record of the concerned pixel of face C1 allows leaving apart from the pixel of r in the identical face of pixel Do, in this case, be suitable for α=3, allow the potential energy of pixel Do and give 1 * α E the potential energy of (r) as record.

Figure 10 B is that explanation is allowing to exist in the different face (face M1, Y1) of pixel Do record to allow under the situation of pixel with paying close attention to record, according to the figure of the repulsion potential energy of giving with the relation of these 2 record permission pixels.Since be with different faces between record allow the relation of pixel, therefore be suitable for β=1, and allow the potential energy of pixel Do as record, give the potential energy that 2 records allow 2 * β E (r) of pixels.

Figure 10 C is that explanation allows on the basis of the situation of pixel and the situation that has record permission pixel in different faces at the existence record in one side as above-mentioned 2 situations, also exist record to allow pixel and exist record to allow under the overlapping situation of pixel, according to allowing the figure of the repulsion potential energy that relations of pixels give with these records at the same pixel place of different faces.On the basis of the situation of Figure 10 A and B, owing to allowing the same pixel place of the different face Y1 of the face C1 of pixel Do to exist record to allow pixel with paying close attention to record, and giving following potential energy: allowing repulsion potential energy 1 * β E (0) that pixel produces, allowing repulsion potential energy 2 * β E (r), overlapping several n=2 of pixels generation and the repulsion potential energy γ s (2) because of the overlapping generation * E (r) of suitable γ=3 because of 2 records of coplanar not because of a record of coplanar not with repulsion potential energy 1 * α E (r) of one side, same pixel.Consequently in the record shown in Figure 10 C allows pixel arrangement, because of exist pay close attention to that record allows repulsion potential energy that pixel Do produces add up to 1 * β E (0)+1 * α E (r)+2 * β E (r)+γ s (2) * E (r).

Figure 10 D illustrates at the record shown in Figure 10 C to allow in the pixel arrangement, by making the figure of the total variation of writing down the repulsion potential energy that allows pixel Do to move this record permission pixel.Shown in Figure 10 D, if record allows pixel Do (record of face C1 allows pixel) to move to the neighbor place of identical faces, the total of the repulsion potential energy that then exists this record to allow pixel Do and produce is because distance is 0 etc. for r2 and overlapping number n, and is changed to β E (1)+1 * α E (r2)+2 * β E (r2).In addition, record shown in Figure 10 C is allowed total 1 * β E (0)+2 * α E (r)+1 * β E (r)+γ s (the 2) * E (r) of the repulsion potential energy under the situation of pixel arrangement, because the total that the record of Figure 10 D allows pixel Do to move the repulsion that produces compares, can know the variation of the total of the repulsion potential energy that this moves front and back.

In addition, the total of this repulsion potential energy is in the above description for obtaining the total that allows the energy of pixel generation when making 2 pixels or record allow pixel to move because of the record of 3 pixels, but this just for the purpose of simplifying the description, in fact certainly as based on allowing the record at other pixel places that may exist beyond the pixel to allow the record of pixel to allow the integration of repulsion potential energy of the relation of pixel to obtain with having comprised at these records.

Each record in the total of calculating repulsion potential energy shown in Figure 10 A～C like that allows in the pixel, for example under the situation of the total maximum that writes down the repulsion potential energy that allows pixel Do, as illustrating among Figure 10 D, obtain the variation that it moves the repulsion potential energy of front and back, the pixel place that the total that makes record allow pixel Do to move to repulsion potential energy before and after moving becomes minimum.Carry out such processing by circulation, 3 all gross energies are reduced.That is, in the mask of 3 faces overlapping, record allows pixel distribution to become the few and dispersed well configuration of low-frequency component.

In addition and since like this in mask C1, the M1 of 3 faces, Y1 overlapping record allow pixel to disperse well, be in mask C2, the M2 of the relation of supplying respectively with them, each record permission pixel of Y2 has also been disperseed well.In addition, to allow the distribution of pixel also be that low-frequency component disperses less and well to the record in the face of any number (2,3,4 or 5) in these 6 faces overlapping.Zone for the preface document image of having rolled back and rationalized since under the situation of present embodiment, with the order of the mask C2 in the mask M2 in the mask Y2 in the mask Y1 in the mask M1 in the mask C1 in first path, first path, first path, second path, second path, second path, use each mask pattern to make it carry out record overlappingly.Therefore, each the distribution of inkspot becomes the few and good dispersion of low-frequency component as " M in C+ first path in first path ", " Y in M+ first path in C+ first path in first path " of intermediate image, " Y in Y+ second path in M+ first path in C+ first path in first path ", " M in Y+ second path in Y+ second path in M+ first path in C+ first path in first path ", " C in M+ second path in Y+ second path in Y+ second path in M+ first path in C+ first path in first path ".Equally, for zone with back and forth journal image, with the order of the mask Y2 in the mask M2 in the mask C2 in the mask C1 in the mask M1 in the mask Y1 in first path, first path, first path, second path, second path, second path, use each mask pattern to make it carry out record overlappingly.Therefore, each the distribution of inkspot becomes the few and good dispersion of low-frequency component as " M in Y+ first path in first path ", " C in M+ first path in Y+ first path in first path " of intermediate image, " C in C+ second path in M+ first path in Y+ first path in first path ", " M in C+ second path in C+ second path in M+ first path in Y+ first path in first path ", " Y in M+ second path in C+ second path in C+ second path in M+ first path in Y+ first path in first path ".In addition, the point according to the some record data record in each path of using such mask to generate also disperses well.That is, as described above, because the record of mask allows the low-frequency component of configuration pattern of pixel few, so, the deviation etc. in the some configuration pattern of the original image before the mask process also can not occur for the configuration pattern of the point that uses this mask record.That is, use each dot pattern of the mask record in each path also to become the few and favorable dispersibility of low-frequency component with mask pattern the samely.

Thus; relativeness according to ink and recording medium; fully do not carry out soaking into of ink even suppose in the stage of intermediate image; because inkspot disperses; the probability that produces particle so soak into contact between the inadequate ink is also low, can suppress the so-called granular generation that particle causes that becomes.In addition, even hypothesis has produced particle, because these particles are dispersed distribution well, so also can reduce of the influence of these particles to the quality of document image.

In addition, if consider also can so as a result of must fully not carry out ink-soaked in the stage of intermediate image, then in printer 104, the writing time that can shorten between each face is poor, promptly sprays the time difference.For example, can increase carriage velocities or ejection frequency, when perhaps the number of path of multipath record is set to 4 paths considering situation that ink for example fully soaks into, also can carry out the printing in 2 paths still less.

In addition, the mobile method of above-mentioned configuration relates to the situation of the mask of employed 3 faces in first path in the mask that is applicable to 2 paths, but this method has more than and be limited to this form, also goes for the configuration that whole face ground decision records allows pixel.Write down under the situation of employed mask in 2 paths of present embodiment, also the mobile method of configuration can be applicable to each the mask of 6 faces in 2 paths of C, M, Y.In this case, the scope that makes record allow pixel to move has more than and is limited to pixel nearby, according to allowing the relation of pixel with the record of other faces, also allows to replace moving of configuration pixel.Specifically, for example carry out following such replacement: the configuration record that do not have that makes the record of certain face allow pixel to move to identical faces allows the pixel place of pixel, make simultaneously be configured in allow with the record at the pixel place of corresponding other faces of this pixel that has moved that pixel moves to this identical face allow the corresponding pixel place of pixel of pixel with the record that the former has been arranged.Thus, the record in whole faces relevant with the calculating of repulsion potential energy allows the configuration relation of pixel to change, and can carry out the replacement of potential energy energy minimum and move.

The arranged in order method

This method is that the configuration record that also do not have at the face of mask allows in the part of pixel configuration record sequentially to allow the method for pixel as described above.

Figure 11 is the flow chart that the record of the arranged in order method of expression present embodiment allows the configuration decision of pixel to handle.

Processing shown in Figure 11 be in 3 faces sequentially one by one configuration record allow pixel, undertaken by circulation, and the record of configuration 50% allows pixel in each face.At first, in step S1101, when wanting configuration record to allow pixel, calculate the repulsion potential energy that between the record permission pixel that this record has allowed to be configured in pixel and each face at mask C1, M1, Y1, produces.

The calculating of repulsion potential energy self with in the mobile method of above-mentioned configuration, illustrated the same.Difference is: if for example describe with reference to the example shown in figure 10A～C, then with the mobile method of above-mentioned configuration differently, supposing that record allows pixel Do to place the pixel shown in this figure, but new the placement write down when allowing pixel Do, according to allowing the relation of pixel, calculate repulsion potential energy with the record of same one side C1 that has been configured or different face M1, Y1.As previously discussed as can be known, allow pixel also not have the initial period of configuration at a record, will write down the permission pixel and be placed on the optional position, repulsion potential energy all is identical value.

Then, in step S1102, in the repulsion potential energy that calculates in the time of behind the mask pixels place that is placed on separately, the mask pixels of the potential energy energy that decision is minimum.Then, in step S1103, judge whether the mask pixels of the energy that this is minimum has a plurality of.Having under a plurality of situations, in step S1107, use random number from these a plurality of pixels, to determine a mask pixels.In addition, in the present embodiment, in one side, be configured record and allowed under the not stacked condition in pixel place of pixel, the pixel of decision least energy.This be because: according to the parameter of weight coefficient and repulsion potential-energy function etc., overlapping situation is to allow the relation etc. of pixel to be the situation of energy minimum according to the record with other faces in one side in the calculating of repulsion potential energy, in this case, because mask only allows to allow pixel arrangement at a mask pixels place, so forbid overlapping a record.

In step S1104, allow pixel at the mask pixels place of determined minimum potential energy energy configuration record.That is, the mask data of this pixel is set to " 1 ".

In step S1105,, judge whether to have disposed seriatim respectively record and allow pixel for the face of C, M, Y.Under the situation that is not having configuration, the processing that begins from step S1101 is carried out in circulation.

If with the order of face C1, M1, Y1 seriatim configuration record allow pixel, then in step S1106,, judge whether that configuration record allows pixel to reach 50% at 3 faces whole mask pixels separately.Do not have configuration record to allow pixel to reach at 50% o'clock in each face, the processing that begins from step S1101 is carried out in circulation.Then, allow pixel, then finish this processing if in 3 faces whole, disposed 50% record.If as above be provided with mask C1, M1, the Y1 in first path like that, then then setting is in mask C2, M2, the Y2 of the relation of supplying with them.

According to the above arranged in order method that has illustrated, also can access mask with characteristic identical with the mobile method of above-mentioned configuration.That is, allow pixel to disperse well based on mask C1, the M1 of 3 faces of arranged in order method, Y1 record in they overlapping.In addition, thus, mask C2, M2, the Y2 that is in the relation of supplying respectively also is respectively that record allows pixel to disperse well.In addition, to allow the distribution of pixel also be that low-frequency component is few and disperse well to the record in the face of any number (2,3,4 or 5) in these 6 faces overlapping.

In addition, other features as the aforementioned mask method for making have: do not generate the periodic pattern that is configured to circulate regularly that record allows pixel.For example, do not generate circulation carry out the configuration of saw tooth pattern or Bayer type such have a periodic pattern.Even,, also can make it converge to the state of avoiding periodic pattern by resetting the parameter of repulsion potential energy just in case generated.The mask that generates according to the mask method for making of present embodiment is aperiodic pattern like this.

In addition, in the aforementioned mask method for making, in each face, do not carry out the special setting of not using the record permission pixel of a certain position.But, even in each face, be provided with not the pixel that allows pixel to use as record, skip this pixel, and meanwhile also can access the few and fine dispersion of low-frequency component mask.

(3) mask characteristic evaluation

The effect of weight coefficient α, the β of the repulsion potential energy in the mask, γ s (n)

At first, at the mask of making by the mask method for making of the above present embodiment that has illustrated, specify (distance not being discussed and the just influence of coefficient) weight coefficient α, β, γ s (n) that repulsion potential energy calculates and how exert an influence separately.As described above, factor alpha is to allowing the dispersion of pixel to exert an influence with the record in the one side, factor beta allows the dispersion of pixel to exert an influence to the record between the coplanar not, and γ s (n) allows pixel to be in the pixel place of same position to the record of coplanar not and this overlapping dispersion under the overlapping situation exerts an influence in addition.

In addition, in the present embodiment, all using identical function (Fig. 9) in the item as E (r), but also can in each, use different potential-energy functions.In this case, as with long-pending α E (r), β E (r) ` of corresponding each weight coefficient α of each function E (r), β, γ (n), the different differences that become the dispersion of following explanation in essence of γ E (r) ``, exert an influence certainly.

Only make energy attenuation in hypothesis to allowing definition repulsion potential energy between the pixel with the record in the one side, the decision record allows under the situation of pixel distribution, promptly in α E (r), establish α=1, under the situation of β=γ=0, record for 1 face allows pixel distribution, and the record in each face allows the good dispersion of the configuration of pixel.This is based on the effect of α E (r).But, allow under the situation of pattern of pixel (logic product, logic and) from 2 (a plurality of) faces overlapping, extracting overlapping record out, in record allows the configuration of pixel, deviation is arranged, and low-frequency component is many.This is because the record that can overlap once in a while between 2 faces allows pixel, perhaps owing to not having association to produce deviation between 2 faces.

In addition, as its title, " logic product " pattern is meant as shown in Figure 12, carries out the calculating of logic product and the pattern that obtains for the same pixel position between a plurality of.Specifically, when a plurality of (being 2 in illustrated embodiment) pairing location of pixels of face all existed record to allow pixel (" 1 "), the pattern of having extracted this position out was exactly the logic product pattern.This logic product pattern table is shown in the distribution under the overlapping situation that has record to allow pixel between the different faces.

In addition, as its title, " logic and " pattern is meant as shown in Figure 13, for the same pixel position between a plurality of carry out logic and calculating and the pattern that obtains.Specifically, when any one location of pixels of a plurality of (being 2 in illustrated embodiment) face existed record to allow pixel (" 1 "), the pattern of having extracted this position out was exactly logic and pattern.This logic is to represent that with a face different faces record separately allows the configuration of pixel with pattern.

Then, allow promptly to suppose in α E (r) and β E (r) α=β=1, the situation of γ=0 under the situation of pixel at whole records of identical repulsion potential energy having been given 3 faces.In this case, the record of each face allows pixel distribution to have certain big or small low-frequency component, and deviation is arranged in the distribution.On the other hand, though the overlapping face of above-mentioned 3 looks, record allows the scattered of pixel distribution (logic and).This be because: because α, β be identical value, the effect that makes the record with one side allow pixel to disperse is the same with the effect that the record that makes other faces allows pixel to disperse, so as a result of, in each face, the dispersion of record permission pixel distribution is insufficient.

Therefore, in order between simultaneously same and different faces, to change repulsion potential energy, for example establish α=3, β=1.Thus, can relatively reduce the influence of other faces, make with the dispersiveness in the one side to improve.And then though overlapping 2 faces, it is the few scattered distribution of low-frequency component that record allows pixel distribution (logic and pattern).Like this, the both sides with the dispersiveness of the record permission pixel of one side and different face improve.That is, make working of α E (r) and β E (r), and make the value of α and β different, thereby make with in the one side, the dispersiveness of the both sides in the coplanar does not all improve.

Then, exist record to allow under the overlapping situation of pixel, at first the situation of the item of γ s (n) E (r) is not used in consideration.The item that never makes γ s (n) E (r) works and will possess the record with low-frequency component and allow 2 faces of pixel distribution overlapping and record that obtain allows in the pixel distribution, has extracted the distribution that overlapping record allows the distribution (logic product) of pixel and poor dispersion many for low-frequency component out.

Relative therewith, under the situation of the item of having given γ s (n) E (r), at first for each face, the record that is not had low-frequency component allows pixel distribution.In addition, the record after making these faces overlapping allows to have extracted out the pixel distribution configuration that record that overlapping record allows (logic product) of pixel to be distributed as not have low-frequency component allows pixel.

Like this, the item of γ s (n) E (r) has produced basically and has made overlapping record allow the effect of disperseing well between the pixel, but as Figure 10 A～D is illustrated, by being set, this make overlapping potential energy more at most high more, with this potential energy accordingly seriatim moving recording allow pixel, perhaps be configured and reduce energy, thereby in the process of the processing that reduces energy, produce the effect that reduces overlapping number.This expression allows pixel for the record of adjacency in identical faces, and the effect that produces the number that reduces adjacent record permission pixel with α E (r) is identical.Like this, it is to make overlapping record allow to disperse between the pixel simply that the item of γ s (n) E (r) has more than as far as possible, but also produces the effect that reduces this overlapping number.In addition, by this effect, reduce the number that allows pixel because of the record in the piece of adjacency or the overlapping record permission pixel that produces, as a result of be can access the few record of low-frequency component to allow pixel distribution as far as possible.

From above viewpoint, in the present embodiment, as described above, use α=3, β=1, the value of γ=3.

In addition, for example establish α, β＜＜γ, the overlapping record that special concern is extracted out in a plurality of overlapping allows pixel, according to the effect of the item of above-mentioned γ s (n) E (r), can also make overlapping record allow pixel to become low-frequency component especially less and scattered.

In addition, in the present embodiment, the repulsion between the face all is β E (r), but considers interactional size etc., and interaction is not both effectively.For example, increase the repulsion potential energy between the face of the employed mask of ink that sprays in the approaching as far as possible time under the many situations of face number with respect to other repulsion potential energy, that is, between face, change the coefficient of β E (r) and the form of E (r) also is effective.In addition, for example, in the photographic fixing of using reaction system, with record head ejection reactant liquor or have under the situation of ink of such composition, with compare usually the face that further increases employed masks such as this reactant liquor, with the repulsion potential energy of the face of the big employed mask of ink of the reagentia of its reactant liquor etc. also be effective.As the object lesson of the function that changes repulsion potential energy, can enumerate the example that changes repulsion scope in one's power apart from r.For example, when the color range value of handling related view data is 50% color range, can establish r=16 as described above, the color range value is bigger or more little more than 50%, then increases r.

In addition, in this manual, record allows pixel and even its overlapping dispersion equably, then represents " better dispersion " or " disperseing better " more.In addition, " disperse uniformly " in the example of above-mentioned repulsion potential energy, be meant the state that for example as far as possible reduces gross energy, promptly allow the overlapping of pixel or during existing because of record in abutting connection with the piece that produces, reduce the state of number of their overlapping and adjacency as far as possible, and then under such state, configuration record allows pixel equably as far as possible.And then, when " low-frequency component tails off (reducing) " is illustrated in as described above good dispersion, to its distribution and the frequency content degree finely disseminated with it in highly sensitive zone in the energy frequency spectrum described later, human vision property (low frequency region) reduces (reducing) accordingly.

The mask of present embodiment and the mask of existing example

Figure 14～Figure 16 is that expression is by mask C1, the M1 of the present embodiment of above-mentioned method for making manufacturing, the figure that Y1 (hereinafter referred to as " stacked mask ") record separately allows the configuration pattern of pixel.In addition, Figure 17 and Figure 18 are the figure of same pattern of the mask of the existing example of expression.In detail, Figure 17 represents the pattern of the mask that makes (being called " the dispersion mask of this face oneself ") that can use in first path of cyan as patent documentation 1, and Figure 18 represents the pattern of the random mask of record in the patent documentation 2.Figure 14～each mask pattern shown in Figure 180 has the zone of 256 * 256 pixels.In each pattern, the pixel of white expression represents that non-record allows the pixel pixel of the view data crested irrespectively (masking) of this pixel (promptly with), and the pixel that black is represented represents that record allows pixel (promptly carrying out the pixel of a formation with the view data of this pixel accordingly).

Such as shown in these figures, have only random mask shown in Figure 180 to compare with other masks, the harsh feeling height of vision produces not enough impression on smooth degree.This is because when making the random mask pattern, does not consider the dependency relation configuration of the pixel of the record of commit point permission randomly (factor alpha) of the some configuration in this face especially.Relative therewith, " the dispersion mask of this face oneself " (Figure 17) and the pattern of the mask of present embodiment (Figure 14～Figure 16) is because the effect of factor alpha and consider especially with the dispersed ground configuration record in the one side and allow pixel, therefore in the dispersion of record permission pixel, there is not deviation, from the level and smooth impression of all generations.

Figure 19 and Figure 20 are each logic of stacked mask C1, M1 of expression Figure 14 and present embodiment shown in Figure 15 and the figure of pattern and logic product pattern.In addition, Figure 21 and Figure 22 are expression Figure 14, Figure 15 and stacked mask C1 shown in Figure 16, each logic of M1, Y1 and the figure of pattern and logic product pattern.And then Figure 23 and Figure 24 are each logic of dispersion mask of this face oneself of the existing example of expression and the figure of pattern and logic product pattern, and Figure 25 and Figure 26 are each logic of the expression random mask that has example now and the figure of pattern and logic product pattern equally.

As Figure 19 and as shown in Figure 20, with 2 mask overlaps of present embodiment situation under record allow the configuration (logic and) of pixel, from wherein having extracted configuration (logic product) all good dispersion, the not harsh feeling that overlapping record allows the part of pixel out.This is because as described above, reciprocally make record allow pixel to disperse considering (factor beta) 2 faces in, considered (coefficient gamma s (n)) overlapping self dispersion.

In addition, as shown in figure 21, the overlapping record under the situation of 3 masks of present embodiment allows the logic of pixel and pattern to dispose record all very close to each otherly and allows pixel.That is, present embodiment since consider 3 faces each other dispersed record allow pixel (factor beta), so 3 faces record each other allows pixel to disperse well, consequently all, dispose very close to each otherly.And then each face is owing to being the recording impartial masks in 2 paths, so disposed record permission pixel with 50% density.Therefore, the density behind overlapping 3 faces is 150%, can't get rid of overlappingly, but present embodiment is according to coefficient gamma s (n), should overlappingly be set to maximum 2 overlapping.Consequently as shown in figure 22, in having extracted 3 overlapping logic product patterns out, do not exist this overlapping.

Relative therewith, patent documentation 1 disclosed at " the dispersion mask of this face oneself " with the face of different colors the logic when overlapping and pattern and logic product pattern compare with the pattern (Figure 19, Figure 20) of present embodiment and to disperse and bad respectively and as shown in Figure 24 as Figure 23.This is because as mentioned above, though consider in patent documentation 1 with the dispersion in the one side, does not consider that face record each other allows the dispersion (factor beta) of pixel and the overlapping dispersion (coefficient gamma s (n)) that record allows pixel.Under the situation of the random mask that has example now, as Figure 25 and shown in Figure 26, similarly the dispersion of any one of logic and pattern and logic product pattern is all bad.

As other evaluation methods of mask pattern, " stack " method of patterning has been used in definition.Be somebody's turn to do " stack " pattern as shown in figure 27, be following such pattern: when existing record to allow pixel (" 1 ") at any one the mask pixels place of a plurality of (being 2 in illustrated embodiment) face, in corresponding with it pixel, exist the expression record to allow the data " 1 " of pixel, and record allows pixel when overlapping, to have the data corresponding with its number at identical mask pixels place.For example overlapping be to be " 2 " under 2 the situation, be to be " 3 " under 3 the situation.In addition, use the concentration corresponding to represent " stack pattern " described later with the number of this data representation.That is, record allows the overlapping many more of pixel, and it is dense more then to be expressed as black concentration.This stack pattern can be represented the not configuration of coplanar record permission pixel separately with a face, and the degree that can overlap represents to write down the overlapping configuration that allows pixel together.

Figure 28 and Figure 29 be expression with the stacked mask of present embodiment overlapping respectively the figure of " stack " pattern when 2 and 3.

The pattern of the inkspot of each intermediate image when these Figure 28 and pattern shown in Figure 29 are similar to the mask that uses present embodiment and write down.Therefore, can know also that according to these patterns inkspot and the overlapping of them in the intermediate image have disperseed well.

The figure of " stack " pattern when Figure 30 and Figure 31 are the dispersion mask of this face oneself of overlapping 2 the existing examples of expression and random mask.As shown in these figures as can be known, also bad based on the record permission pixel of " stack " pattern of the mask of existing example and overlapping dispersiveness thereof.

Evaluation based on energy frequency spectrum

Then, estimate the mask of present embodiment according to the energy frequency spectrum of the frequency characteristic of representing mask pattern.To write down the energy frequency spectrum that can access following explanation after allowing the configuration of pixel replacement, obtain energy frequency spectrum at the face of the size of 256 pixels * 256 pixels for point.At this, energy frequency spectrum is the radially averaged power spectrum that handles the record in " T.Mitsa and K.J.Parker; " Digital Halftoning using a Blue Noise Mask "; Proc.SPIE 1452, pp.47～56 (1991) " of 2 dimension space frequencies as one dimension.

Figure 32 is each of the dispersion mask of this face oneself of the stacked mask at present embodiment, existing example and random mask, and the figure of the frequency characteristic of independent mask pattern (C1) is described.Figure 33 is respectively at these 3 kinds of masks, and the figure of the frequency characteristic of the logic of 2 masks (C1, M1) and pattern is described.Figure 34 is respectively at these 3 kinds of masks, and the figure of frequency characteristic of the logic product pattern of 2 masks (C1, M1) is described.

In Figure 32, each curve is represented the energy frequency spectrum corresponding with spatial frequency of each mask pattern.Curve a represents the energy frequency spectrum of the mask pattern (Figure 14) of the stacked mask of present embodiment, and curve b represents the energy frequency spectrum of pattern (Figure 17) of the dispersion mask of this face oneself, and curve c represents the energy frequency spectrum of the pattern (Figure 18) of random mask.If these 3 curves are compared, then random mask (curve c) has roughly consistent energy to the Zone Full of spatial frequency as can be known.For the configuration of decision record permission pixel randomly, random mask does not have special feature on the interval that record allows pixel to disperse.Therefore, has much the same distribution from low-frequency region to the high-frequency zone.On the other hand, for the dispersion mask (curve a and b) of this face oneself of the overlapping mask of present embodiment and existing example, the energy in the low-frequency region is low, and the peak value of energy is present in high frequency.The distance that allows to keep between pixel is to a certain degree write down in this expression on one side, on one side the dispersion of approximate equality ground.

As the performance evaluation of mask pattern, " low-frequency component " that be positioned at roughly than half low frequency side that be conceived in the frequency field that has energy frequency spectrum of mask pattern is the feature of maximum of the present invention.Under the state that the low-frequency component with mask pattern suppresses lowly, be difficult to occur as mentioned above the granulating that the distribution because of particle causes, be difficult in addition identify.As a result of, the image that has write down does not visually have a harsh feeling.In addition, particularly the image that writes down 1 pattern is recycled mask pattern two-dimensionally.Under the situation that has recycled this certain mask pattern, the low-frequency component of mask pattern is many more, and figure that then should the circulation pattern is easy more to be identified by human eye.In addition, owing to this figure has a significant impact granular generation and observational technique, so produce the harsh feeling that is associated with mask period.Therefore, be conceived to the pattern that circulates, importantly be designed to suppress the low-frequency component side of mask pattern.That is, in the present invention, be focus with the low frequency region that visually can feel coarse grade, suppress the composition of this low-frequency range low.That is, mask pattern of the present invention is characterised in that and the energy of such low frequency can be suppressed low.

And then, the frequency characteristic relevant with the sensitivity of human eye exists with ... the distance of record object and human eye etc., many discussion for example in document (" R.P.Dooley:Prediction BrightnessAppearance at Edges Using Linear and Non-Liner Visual DescribingFunctions, SPES annual Meeting (1975) ") of Dooley etc., this have been carried out.Under the situation of various experimental observation record objects, we can say that the composition of roughly low than 10cycles/mm frequency field is identified by the human eye out easily.To this, the present inventor also confirms in test.Therefore, we can say the zone (low frequency region) that importantly is conceived to comprise the frequency side lower than 10cycles/mm.The situation that the more approaching eye of record object is in fact also arranged, so the present inventor thinks that importantly being conceived to roughly low than 20cycles/mm frequency side designs.In addition, the low frequency region of having in mind in the mask evaluation (for example Figure 50) of each embodiment described later is roughly overlapping with these scopes.

Figure 33 and shown in Figure 34 during with mask overlap logic and and the energy frequency spectrum of logic product pattern in, under situation arbitrarily, all (curve is a) many than the stacked mask of present embodiment for the low-frequency component that the taper mask of existing example disperses mask (curve b).That is, as Figure 23 and as shown in Figure 24, the configuration of the record permission pixel in the dispersion mask of this face oneself of existing example is compared its poor dispersion with the stacked mask of present embodiment.

Figure 35 and Figure 36 be represent respectively with the dispersion mask of this face oneself of the stacked mask of present embodiment, existing example and random mask overlapping the figure of energy frequency spectrum of " stack " pattern when 2 and 3.In each figure, curve a represents the energy frequency spectrum of the stack pattern (Figure 28, Figure 29) of the stacked mask of present embodiment, curve b represents the energy frequency spectrum of stack pattern (Figure 30) of dispersion mask of this face oneself of existing example, and the same expression of curve c has the energy frequency spectrum of stack pattern (Figure 31) of the random mask of example now.

If 3 curves are compared, then random mask is the same with the energy frequency spectrum of above-mentioned independent mask, logic and pattern and logic product pattern, has roughly consistent energy for the Zone Full of spatial frequency.On the other hand, the stack pattern of the dispersion mask of this face shown in the curve b oneself is compared with the dispersion mask of this single face oneself shown in Figure 32, and it is many that low-frequency component becomes.In addition, the stack pattern of the dispersion mask of this face shown in the curve b oneself is compared with the stack pattern of the lamination pattern of present embodiment, and it is many that low-frequency component becomes.That is, such as shown in figure 30, disperse variation, the harsh feeling of pattern increases.

Relative therewith, even the low-frequency component of the stack pattern of the stacked mask of the present embodiment shown in the curve a is compared with single stacked mask shown in Figure 32, almost do not change yet.Even this expression under the state of 3 faces that superposeed, also keeps distance to a certain degree on one side between the record permission pixel, on one side the dispersion of approximate equality ground.

Based on the evaluation of staggering

The mask of embodiments of the invention and existing consider a face and one of difference of the mask (the dispersion mask of this face oneself that patent documentation 1 is put down in writing) that obtains is: the situation of the mask overlap of coplanar and be not that the variation of the dispersiveness under the overlapping situation has been carried out in regular position not in regular position.The mask of embodiments of the invention is being incited somebody to action under the situation that overlap mode of the mask of coplanar does not stagger wittingly, and record allows the dispersiveness of pixel greatly to reduce.That is, in the present embodiment, owing between different faces, also consider dispersion, so if carry out the different overlap mode of regular overlap mode when considering its dispersion, then dispersiveness greatly reduces.On the other hand, under the situation of the dispersion mask of this face oneself of existing example, owing to not considering the not dispersiveness between the coplanar, so even carry out the overlap mode different with regular overlap mode, dispersiveness does not change yet.

Carry out the evaluation that this staggers as follows.Make the C1, the M1 that make by above-mentioned method for making, Y1 respectively from staggering to grating of all kinds (raster) direction separately.At this moment, mask self is owing to periodically arranging, so can stagger.

Figure 37～Figure 39 is illustrated in mask is staggered under the situation of carrying out overlapping, each logic when overlapping C1, M1 and, the figure of the pattern of logic product and " stack ".As knowing from these figure, the logic of the overlapping pattern that has been staggered in the lap position of stacked mask C1, the M1 of present embodiment and, any one all dispersed reduction of logic product, " stack ", the harsh feeling when observing pattern increases.

Figure 40～Figure 42 is the figure that the energy frequency spectrum to the situation (promptly having carried out overlapping situation in regular position) of the staggered situation of lap position and the lap position of not staggering compares, and is the figure of the energy frequency spectrum of the logic of the dispersion mask of this face oneself of the stacked mask of each present embodiment of expression, existing example and random mask and pattern.

For the stacked mask of present embodiment shown in Figure 40, the low-frequency component under the situation about having staggered is compared bigger with situation about not staggering.This is because as mentioned above, and stacked mask is also considered dispersion between different faces, and therefore when having carried out the different overlap mode of regular overlap mode when considering this dispersion, dispersiveness greatly reduces.

Relative therewith, dispersion mask of this face oneself of Figure 41 and existing example shown in Figure 42 and random mask are under situation about having staggered and situation about not staggering, and the low-frequency component of energy frequency spectrum almost do not change.This is to allow the dispersion of pixel because these masks are considered the record between different faces originally, even therefore stagger the lap position, the dispersion of having carried out the pattern when overlapping according to it does not produce a great difference yet.

The figure of Figure 43～Figure 45 and Figure 40～shown in Figure 42 is the same, is the staggered situation of lap position and the comparison diagram of the energy frequency spectrum under the situation about not staggering.Figure 43～Figure 45 is respectively the figure of energy frequency spectrum of the logic product pattern of the dispersion mask of this face oneself of the stacked mask of expression present embodiment, existing example and random mask.In addition, Figure 46～Figure 48 is the staggered situation of lap position and the comparison diagram of the energy frequency spectrum under the situation about not staggering, and is respectively the figure of energy frequency spectrum of " stack " pattern of the dispersion mask of this face oneself of the stacked mask of expression present embodiment, existing example and random mask.As from these figure as can be known, for the stacked mask of present embodiment, the low-frequency component under the situation about having staggered is compared with situation about not staggering greatly to be increased.On the other hand, for the dispersion mask and the random mask of this face oneself of existing example, under situation about having staggered and situation about not staggering, the low-frequency component of energy frequency spectrum is not variation almost.The energy frequency spectrum that has carried out " stack " pattern when overlapping at 3 stacked mask C1, M1, Y1 of the present embodiment shown in Figure 49 that staggers too when staggering, all as frequency field, energy increases.

Figure 50～Figure 52 is that the scale with low-frequency component shows above figure based on the evaluation of staggering, and represents the dispersion mask and the random mask of this face oneself of the stacked mask of present embodiment, existing example respectively.At this, the amount of low-frequency component is to having carried out the amount of integration with roughly half suitable composition below 90 in the existing spatial frequency of energy frequency spectrum zone.

As shown in figure 50, as can be known under the situation of the stacked mask of present embodiment, after staggering, each logic of mask C1, M1 and, " stack " pattern of the pattern of logic product, " stack " and mask C1, M1, Y1 any one in, compare with situation about not staggering, the quantitative change of low-frequency component is many.

Relative therewith, under any one situation and situation about not staggering of the dispersion mask of this face shown in Figure 51 oneself that staggered and the random mask shown in Figure 52, the amount of low-frequency component does not change.

As mentioned above, make under the situation of mask overlays, whether the evaluation of estimate to dispersiveness when having staggered its lap position becomes greatly, can judge whether it is to be suitable for mask of the present invention.It is that is, above-mentioned that to be suitable for mask of the present invention based on the evaluation of staggering proof be the dispersiveness of considering stack.

[embodiment 2:4 path recording 100% impartial mask]

(1) summary of present embodiment

Present embodiment relates at each ink of cyan (C), carmetta (M), yellow (Y), black (K) finishes the multipath record in 4 paths of image with 4 scanning.Then, at the ink color that in the record of 4 paths, uses each, be not that many (being 4 in the present embodiment) inferior employed separately mask of scanning does not disperse well, and make up the also dispersion well of any a plurality of mask of these masks.

Below, for simplicity of illustration and explanation, the situation of carrying out 4 paths record with cyan, carmetta, 3 yellow looks is described.

Cyan, carmetta, each yellow color nozzle group are split into 4 groups of first group～the 4th group, respectively comprise 128 nozzles in each group.Each group is corresponding with the mask pattern (C1, C2, C3, C4, M1, M2, M3, M4, Y1, Y2, Y3, Y4) of present embodiment, and the size of the sub scanning direction of each mask pattern (throughput direction) is 128 amount of pixels identical with the nozzle number of each group.On the other hand, the size of scanning direction is 256 amount of pixels.In addition, supply and the relation corresponding with being respectively with 4 patterns, if make their stacks then become the structure of the record of finishing the zone corresponding with 128 * 256 pixels with whole pixels with corresponding 4 mask patterns (C1, C2, C3 and C4, M1, M2, M3 and M4, Y1, Y2, Y3 and Y4) of the nozzle group of chromatic ink.

In the operation of recording of having used these masks, each color nozzle group on one side to the scanning direction of nozzle arrangement direction approximate vertical, on one side to recording medium ejection ink.For example, each zone is carried out the ink ejection of C, M, Y.In addition, at each end of scan, all with the width extent (i.e. 128 amount of pixels) of recording medium to 1 group of the each conveying of the direction vertical with the scanning direction.Thus, come image is finished in the zone of the size corresponding with width each group recording medium by 4 scanning.

If further specifically describe, when then on the throughput direction of recording medium, sequentially continuous 4 zones of corresponding with the width of the nozzle sets respectively size in the recording medium being made as regional A, B, C, D, in first scanning, to the regional A on the recording medium, use first group of C nozzle group, first group of M nozzle group, first group of Y nozzle group to carry out record.In addition, in this first scanning, regional A is used mask pattern C1, mask pattern M1, mask pattern Y1.

Then, in second scanning, regional A to the record in first scanning that is through with, use second group of C nozzle group, second group of M nozzle group, second group of Y nozzle group to carry out record, simultaneously to the area B of recording status not, use first group of C nozzle group, first group of M nozzle group, first group of Y nozzle group to carry out record.Therefore, in second scanning, regional A is used mask pattern C2, mask pattern M2, mask pattern Y2, simultaneously area B is used mask pattern C1, mask pattern M1, mask pattern Y1.

And then, in the 3rd scanning, regional A to the record in second scanning that is through with, use the 3rd group of C nozzle group, the 3rd group of M nozzle group, the 3rd group of Y nozzle group to carry out record, simultaneously to area B, use second group of C nozzle group, second group of M nozzle group, second group of Y nozzle group to carry out record, and then, to the zone C of recording status not, use first group of C nozzle group, first group of M nozzle group, first group of Y nozzle group to carry out record.Therefore, in the 3rd scanning, regional A is used mask pattern C3, mask pattern M3, mask pattern Y3, area B is used mask pattern C2, mask pattern M2, mask pattern Y2, zone C is used mask pattern C1, mask pattern M1, mask pattern Y1.

And then, in the 4th scanning, regional A to the 3rd record that scans that is through with, use C nozzle group the 4th group, the 4th group of M nozzle group, the 4th group of Y nozzle group is carried out record, simultaneously to area B, use C nozzle group the 3rd group, the 3rd group of M nozzle group, the 3rd group of Y nozzle group is carried out record, to zone C, use C nozzle group second group, second group of M nozzle group, second group of Y nozzle group is carried out record, and then, to the region D of recording status not, use C nozzle group first group, first group of M nozzle group, first group of Y nozzle group is carried out record.Therefore, in the 4th scanning, regional A is used mask pattern C4, mask pattern M4, mask pattern Y4, area B is used mask pattern C3, mask pattern M3, mask pattern Y3, zone C is used mask pattern C2, mask pattern M2, mask pattern Y2, and then, region D is used mask pattern C1, mask pattern M1, mask pattern Y1.

As described above, scan the image record of finishing the regional A on the recording medium by 4 times.In addition, carry out record too for area B and follow-up zone.

In the present embodiment, the same with the foregoing description 1, for fear of the particle that produces in the intermediate image, aperiodic ground overlapping the configuration of the record permission pixel the during mask of each face be set to the configuration of the few and favorable dispersibility of low-frequency component.Thus, get rid of as far as possible point in the intermediate image in each stage till image is finished near so that in abutting connection with and point overlapping.In addition, even do not have in hypothesis under the situation of overlapping or adjacency of complete elimination point, also very high for so overlapping its dispersiveness that waits.

(2) method for making of mask

In the present embodiment, as the manufacture method of mask, also can use method of formation when in embodiment 1, having illustrated and to any one of the method for formation in each path.But, in the present embodiment, while method of formation and also inequality to the method for formation in each path.Below, these methods sequentially are described.

Generate simultaneously

Figure 53 is the figure of method of formation when conceptually present embodiment being described.

As shown in the drawing, method of formation generates simultaneously as first path～Third Road directly mask of the mask of usefulness (C1, M1, Y1), (C2, M2, Y2) and (C3, M3, Y3) in step 1 in the time of present embodiment.In addition, as step 2, be created on the mask (C4, M4, Y4) of each face that uses in the 4th path, make each the color and mask (C1, M1, Y1), (C2, M2, the Y2) and (C3, M3, Y3) in above-mentioned first path～Third Road footpath have the relation of supplying.That is, for each color, the mask that generates the 4th path makes its record allow the configuration of pixel and the record of first path～Third Road mask directly to allow the configuration of pixel to have exclusive relation.

First path～Third Road directly the record in the generation of the mask of usefulness allow the concrete configuration method of pixel can be as follows like that, use " the disposing mobile method " and any one of " sequence moving method " that in embodiment 1, have illustrated.

(disposing mobile method)

Processing when using this method is basically with the same to the processing of embodiment 1 explanation in Fig. 8.That is, the same with the step S801 of Fig. 8, obtain and the mask (C1, M1, Y1) of first path～Third Road each color directly, big or small corresponding C, the M of (C2, M2, Y2) and (C3, M3, Y3) face separately, the image of Y 25% concentration separately.Then, S802 is the same with step, and for each image, 2 value methods such as use error diffusion method are carried out 2 values.Thus, for each mask (C1, M1, Y1), (C2, M2, Y2) and (C3, M3, Y3) face separately, can access record is allowed pixel arrangement is 25% all initial configuration of mask pixels.

Then, S803 is the same with step, and the mask (C1, M1, Y1) that obtains as described above, whole records of (C2, M2, Y2) and (C3, M3, Y3) face are separately allowed pixel, calculates repulsion potential energy.

In the calculating of this repulsion potential energy, as follows with the difference of the processing of embodiment 1.For example when certain that calculate face C2 allows the repulsion potential energy of pixel, to allow value and the embodiment 1 of the weight coefficient β that influences β E (r) of pixel the same be 1 to the record apart from r of being in of other faces of different colors.On the other hand, in not coplanar C1, the C3 of same color, to allow the value of the weight coefficient β that influences β E (r) of pixel apart from the record of r be 2 from being in.Thus, the record when having guaranteed the mask of same color overlapping allows the dispersion (β is 2) of pixel, has precedence over the dispersion (β is 1) that allows pixel with the record of different colours.

Then, the same with the step S804 of Fig. 8, as Figure 10 A～D is illustrated, carry out energy attenuation.At this, as follows with the difference of embodiment 1.Promptly, whole records at 9 faces that calculate in processing so far allow pixel, allow pixel from this record apart from r be 4 with interior pixel, sequentially will write down and allow pixel to move to the minimum pixel place of repulsion potential energy, but at this moment, forbid that the record in the same color (face) allows the overlapping of pixel.Thus, can access the relation of supplying mutually of the mask of the same color of using in 3 paths.

(arranged in order method)

The arranged in order method of Sheng Chenging is basic identical with the processing that in Figure 11 embodiment 1 has been illustrated simultaneously.Difference with in the mobile method of above-mentioned configuration, illustrated the same.Promptly, the record because of other faces of different colours when calculating repulsion potential energy allows the value of the weight coefficient β that influences β E (r) that pixel produces to be set to 1, is in not from same color that the record of coplanar allows the value of the weight coefficient β that influences β E (r) of pixel to be set to 2 simultaneously.In addition, in the time will paying close attention to record and allow pixel arrangement, forbid that the record in the same color (face) allows the overlapping of pixel at the minimum pixel place of repulsion potential energy.

Then, the processing of disposing the number of each face 25% finishes (with reference to the step S1106 of Figure 11).

Generation to each path

Figure 54 is the figure to the method for formation in each path that present embodiment conceptually is described.

As shown in the drawing, in present embodiment in the method for formation, in step 1, generate the mask of using in first path (C1, M1, Y1), in the step of following 2, generate the mask of using in second path (C2, M2, Y2), and then in step 3, generate the directly mask of usefulness (C3, M3, Y3) of Third Road.In addition, as step 4, generate the mask (C4, M4, Y4) of employed each face in the 4th path, make mask (C1, M1, Y1), (C2, M2, the Y2) and (C3, M3, Y3) in each color and above-mentioned first path that has generated～Third Road footpath have the relation of supplying.That is, for each color, the mask that generates the 4th path make configuration that its record allows pixel and the mask in first path～Third Road footpath record permission pixel be configured as exclusive relation.

First path～Third Road directly the record in the generation of the mask of usefulness allow the method for the concrete configuration of pixel can be as follows like that, use " the disposing mobile method " and any one of " sequence moving method " that in embodiment 1, have illustrated.

(disposing mobile method)

Processing when using this method is basically with the same to the processing of embodiment 1 explanation in Fig. 8.That is, the same with the step S801 of Fig. 8, obtain and big or small corresponding C, the M of mask (C1, M1, the Y1) face separately of each color in first path, the image of Y 25% concentration separately.Then, S802 is the same with step, and for each image, 2 value methods such as use error diffusion method are carried out 2 values.Thus, for each mask (C1, M1, Y1) face separately, can access record is allowed pixel arrangement is 25% all initial configuration of mask pixels.

Then, S803 is the same with step, and whole records of mask (C1, M1, the Y1) face separately that obtains are as described above allowed pixels, calculates repulsion potential energy.

In the calculating of this repulsion potential energy, the same with the mobile method of configuration in the above-mentioned generation simultaneously with the difference of giving processing of embodiment 1.That is, when calculating certain repulsion potential energy that allows pixel, to allow value and the embodiment 1 of the weight coefficient β that influences β E (r) of pixels the same be 1 to other records apart from r of being in of other faces of different colours.On the other hand, be in the not coplanar from same color that to allow the value of the weight coefficient β that influences β E (r) of pixel apart from the record of r be 3.Thus, the record when having guaranteed the mask of same color overlapping allows the dispersion (β is 3) of pixel, has precedence over the dispersion (β is 1) that allows pixel with the record of different colours.In addition since the same from the value of the factor beta that influences β E (r) of the face of different colours and embodiment 1 be 1, allow the set dispersiveness highland of pixel to be configured such pattern so for example can obtain C, M, Y record separately.

If the record that obtains the mask (C1, M1, Y1) in first path as mentioned above allows the configuration of pixel, similarly obtain second path (step 2), the Third Road footpath (mask pattern of step 3) below then.At this moment, when configuration record allows pixel (with reference to the step S804 of figure 8), the pattern in the path that generates so far, record allow the configuration of pixel to fix.Thus, can guarantee the mutual supplemental of the mask pattern in first path～Third Road footpath.

(arranged in order method)

The same with the processing that in Figure 11, embodiment 1 has been illustrated basically to the arranged in order method of the generation in each path.Difference with in the mobile method of above-mentioned configuration, illustrated the same.Promptly, the record because of other faces of different colours when calculating repulsion potential energy allows the value of the weight coefficient β that influences β E (r) that pixel produces to be set to 1, is in not from same color that the record of coplanar allows the value of the weight coefficient β that influences β E (r) of pixel to be set to 3 simultaneously.In addition, in the time will paying close attention to record and allow pixel arrangement at the minimum pixel place of repulsion potential energy, the pattern in the path that generates so far, record allow the configuration of pixel to fix.Thus, can guarantee the mutual supplemental of the mask pattern in first path～Third Road footpath.

Then, the processing of disposing the number of each face 25% finishes (with reference to the step S1106 of Figure 11).

(3) mask characteristic evaluation

Figure 55～Figure 57 is that expression is according to the stacked mask C1 of 1 face of the present embodiment of the above-mentioned manufacturing of method for making arbitrarily, the figure that M1, Y1 record separately allows the configuration pattern of pixel.Each mask pattern has the zone of 128 * 256 pixels.

Such as shown in these figures, the mask pattern of present embodiment has disposed the record of considering with the interior dispersiveness of one side and has allowed pixel especially according to the effect of factor alpha, therefore as the smooth impression of all generations.

Figure 58～Figure 60 be illustrated in regular position overlapping respectively the figure of " stack " pattern during 3 (C1, M1, Y1), 6 (C1, M1, Y1, C2, M2, the Y2) and 9 (C1, M1, Y1, C2, M2, Y2, C3, M3, Y3) of stacked mask of present embodiment." stack " pattern during these are overlapping a plurality of stacked mask is represented the logic and the pattern of these masks with light concentration, with the long-pending pattern of denseer concentration presentation logic.

The pattern of the inkspot of each intermediate image when pattern of " stack " shown in these figure approaches to use the mask of present embodiment to write down.Therefore, can know also that according to these patterns inkspot and the overlapping of them in the intermediate image have disperseed well.

Based on the evaluation of staggering

For the stacked mask in 4 paths of present embodiment, carry out the same with the foregoing description 1 based on the evaluation of staggering.

Figure 61 be expression make 3 the stacked masks (C1, M1, Y1) shown in Figure 58 each stagger and carried out the figure of the pattern of " stack " when overlapping.In addition, Figure 62 be expression make 6 the stacked masks (C1, M1, Y1, C2, M2, Y2) shown in Figure 59 each stagger and carried out the figure of the pattern of " stack " when overlapping.And then, Figure 63 be expression make 9 the stacked masks (C1, M1, Y1, C2, M2, Y2, C3, M3, Y3) shown in Figure 60 each stagger and carried out the figure of the pattern of " stack " when overlapping.

As according to these figure as can be known, ((Figure 58～Figure 60) compare dispersed the reduction, the harsh feeling when observing pattern increases the stack pattern that has staggered in the lap position with stacked mask of present embodiment with the pattern of the lap position of not staggering for Figure 61～Figure 63) any one.

Figure 64 is that the scale with low-frequency component shows above figure based on the evaluation of staggering.At this, at each of the stacked mask of above-mentioned 3 (C1, M1, Y1), 6 (C1, M1, Y1, C2, M2, Y2) and 9 (C1, M1, Y1, C2, M2, Y2, C3, M3, Y3), the situation of " stack " pattern that relatively staggered ((represent for Figure 61～Figure 63) and situation about not staggering by the amount of the low-frequency component under Figure 58～Figure 60).

As can be known as shown in the drawing, under the situation of the stacked mask of present embodiment, in any one pattern, to compare when staggering with situation about not staggering (promptly carrying out overlapping situation) in regular position, the amount of low-frequency component all increases.

As mentioned above, make under the situation of mask overlays, whether the evaluation of estimate to dispersiveness when staggering its lap position becomes greatly, can judge whether it is to be suitable for mask of the present invention.

In addition, the mask pattern of present embodiment is the size of horizontal 256 pixels * vertical 128 pixels, varying in size in length and breadth.When obtaining frequency content, unify to obtain frequency content again after the size in length and breadth of mask pattern for such pattern.In the present embodiment, be the size of length direction (under the situation of present embodiment, being 256 pixels of transverse direction), become the pattern of 256 pixels * 256 pixels so make the pattern circulation in the vertical, estimate frequency content because size is unified in length and breadth.

Under other big or small situations, too, estimate frequency content for the pattern after the size of length direction at inciting somebody to action size unification in length and breadth.Specifically, on width, make pattern circulation,, this pattern that cuts out is estimated from wherein cutting out pattern up to the size of the width of pattern size more than or equal to length direction.At this moment, it is desirable to size in length and breadth is that 2 n power (n is a positive integer) makes and can use the high speed Fourier transform when carrying out frequency transformation.Under the situation that is not 2 n power, determine to approach most 2 n power of length direction size, in length and breadth, make the pattern circulation, make that the size with this n power of determining of 2 cuts.In addition, from the pattern that generates by this circulation, cut out the pattern of above-mentioned 2 the n power size of having determined, this pattern that cuts out is estimated.For example consider that mask pattern is the situation of horizontal 500 pixels * vertical 320 pixels.In this case, the size of length direction is " 500 ", therefore determines and the n power that is somebody's turn to do " 500 " immediate 2.Be defined as immediate 2 n power and be " 512 ".Therefore, in order to cut out the pattern of 512 pixels * 512 pixels, and on transverse direction and longitudinal direction, make the pattern circulation one by one, generate the pattern of 1000 pixels * 640 pixels.From the pattern of 1000 pixels * 640 pixels of such generation, cut out the pattern of 512 pixels * 512 pixels, the pattern that cuts out is estimated.

[write down with 100% gradation (gradation) mask in embodiment 3:2 path]

Present embodiment relates to so-called gradation mask.For example can know the gradation mask according to patent documentation 3.The gradation mask is meant that the recording ratio that is set to the nozzle rows end is low, the recording ratio of middle body high such and the nozzle location different mask of recording ratio accordingly.According to this mask, relatively reduce in multipath record the frequency of ejection of the end nozzle of the reason that becomes harm on the border of the posting field in each path easily, the effect of the picture quality that can be improved.

At this, " recording ratio " of aforementioned mask pattern be meant record allow pixel count with respect to the whole pixel counts that comprise in the certain zone in mask pattern (record allow pixel and non-record allow pixel and) ratio.For example be meant that with the recording ratio of single nozzle corresponding mask pattern record allows the ratio of whole pixel counts that pixel comprised with respect to the zone corresponding with this single nozzle (single grating region).

Under the situation of such mask, when observing with spatial frequency, can see the increase of the low-frequency component that the variation because of each regional recording ratio causes with all corresponding mask pattern of nozzle rows.But, if the record that allows such recording ratio to gradually change such allows the configuration ground of pixel to realize having suppressed the mask pattern of unnecessary low-frequency component in addition, the effect of the present invention of the generation of the particle that then can be inhibited.Therefore, by with each corresponding a plurality of zones of the recording ratio that in mask, changes in keep polymolecularity ground respectively, between each zone, be configured such that simultaneously the gradation mask that recording ratio changes, can access the effect of the both sides of record in the present invention and the patent documentation 3.

Figure 65 A and B are the figure of mutual exclusive mask pattern that makes the recording ratio corresponding with nozzle location and 2 faces of the gradation mask of expression present embodiment.

Under the situation of present embodiment, the mask of these 2 faces is mask M1, the M2 of mask C1, the C2 of 2 faces of cyan, carmine 2 faces or mask Y1, the Y2 of yellow 2 faces.In these masks, represented mask C1, the C2 of cyan in the drawings typically.In addition, as explanation in the foregoing description 1, it is to disperse mutually that the record of these 6 masks allows the configuration of pixel.

Such as shown in these figures, in each scanning, the nozzle of numbering 0～255 is corresponding with mask C2, and the nozzle of numbering 256～511 is corresponding with mask C1, carries out record.In addition, as described above, mask C1 and mask C2 are in the relation of supplying.In addition, between scanning and scanning, recording medium is only carried the amount corresponding with the length of 256 nozzle arrangement.Scan like this and carry by circulating, supply corresponding with above-mentioned 256 nozzle arrangement 2 path records that carry out regionally with mask C1 and mask C2.

Like that, mask C1 and mask C2 recording ratio separately change for each grating (nozzle) from 0.3 to 0.7 ground shown in Figure 65 A, in each face is all, have the recording ratio of total 50% simultaneously.Thus, determine that according to above-mentioned recording ratio the record of each grating of mask allows the number of pixel.In recording ratio is 0.4 (40%) grating, be 1000 pixels for example, then dispose about 400 records and allow pixels if establish the grating orientation size of this mask.

(2) method for making of mask

The manufacture method of the mask of present embodiment can be used basically and the same method of method that has illustrated in embodiment 1.That is method that, can be by generating whole faces simultaneously, each path order ground generated in 2 methods of method of mask any one implement.Under the situation of 2 paths of present embodiment record, as described in the embodiment 1, generation simultaneously is the same with method to the generation in each path.In addition, for each of above-mentioned 2 generation methods, can implement by any one that disposes mobile method and arranged in order method equally.Below, the mobile method of configuration and the arranged in order method of present embodiment sequentially are described.

Dispose mobile method

Figure 66 is that the flow chart that the record of employed gradation mask allows the configuration decision based on the mobile method of configuration of pixel to handle is write down in 2 paths of expression present embodiment.Processing shown in this figure is basically with the same in the processing shown in Fig. 8 to embodiment 1.Below, difference mainly is described.

The processing of step S6601, S6602 is the same with the processing of step S801 shown in Figure 8, S802.In addition, the processing of step S6603 is also the same with the processing of step S803, allows pixels at the whole records that in mask C1, M1, Y1 face separately each grating disposed as described above, calculates repulsion potential energy.

Then, the same with the step S804 of Fig. 8 in step S6604, allow pixel at the record of each face, 3 face C1, M1, Y1 are carried out the total of the repulsion potential energy that can obtain as described above, obtain gross energy.In addition, shown in Figure 10 A～D, like that, make record allow the configuration of pixel to move.

At this moment, if when moving it the minimum position of potential energy energy then surpassing the restriction of above-mentioned configurable number of this grating, it is moved to this grating, and configurable number for restriction with interior grating in, move it the low pixel place of this energy of grating with time low-energy pixel.Thus, on one side can keep the recording ratio of each grating, Yi Bian obtain the configuration that dispersed high record allows pixel.

Below, the same with the processing of Fig. 8, the reduced rate of calculating gross energy if judge it smaller or equal to setting, then finishes energy attenuation and handles.In addition, the reduced rate of gross energy is set to mask C1, M1, the Y1 in first path smaller or equal to each face of the state of setting.And then, mask C2, M2, the Y2 in second path are set, make and will allow each corresponding exclusive position of the configuration of pixel to allow the configuration of pixel as record with the record of these masks.In addition, also the same at this with the foregoing description 1, also can not the attenuation processing that judges whether to finish energy according to the reduced rate of gross energy, and whether become judge smaller or equal to setting according to gross energy.

The arranged in order method

This method is also the same with the method to embodiment 1 explanation in Figure 11 basically.Figure 67 is the flow chart that the record based on the arranged in order method of expression present embodiment allows the configuration decision of pixel to handle.

The processing of the step S6701 of Figure 67～S6703, S6705, S6706 and S6707 is the same with the processing of S1101～S1103 of Figure 11, S1105, S1106 and S1107.

Difference is: in step S6704, in face, will write down when allowing pixel to be placed on the pixel place of energy minimum, when having surpassed as described above the configurable number of each grating that determines accordingly with recording ratio, for in limiting with interior grating, be configured in the low pixel place of this energy of grating in configurable number with time low-energy pixel.Thus, can to each grating recording ratio be changed on one side, Yi Bian obtain dispersed high gradation mask.

In addition, in the example of above-mentioned any one method for making, all, be limited to this but have more than to each grating administration configuration number.For example under at the situation of mask pattern, each of this a plurality of gratings is configured several restrictions to each decision recording ratio of stipulating a plurality of gratings.

(3) mask characteristic evaluation

Figure 68～Figure 70 is that expression is by mask C1, the M1 of a face of the present embodiment of above-mentioned any one method for making manufacturing, the figure that Y1 record separately allows the configuration pattern of pixel.Each mask pattern has the zone of 256 * 256 pixel.

Such as shown in these figures, the pattern of the mask of present embodiment has disposed the record permission pixel of considering with the dispersiveness in the one side according to the effect of factor alpha especially, therefore removed the deviation of the record that gradation had permission pixel, record allows the dispersion of pixel not have deviation, as the smooth impression of all generations.

Figure 71 and Figure 72 are each logic of stacked mask C1, M1 of the present embodiment shown in expression Figure 68 and Figure 69 and the figure of pattern and logic product pattern.

Shown in Figure 71 and Figure 72, the overlapping record under the situation of 2 masks of present embodiment allow pixel configuration (logic and), from wherein extracted out record allow pixel overlapping situation under configuration (logic product) removed deviation, and good dispersion and do not have harsh feeling based on the dispersion of gradation.This is because such as mentioned above, considers each other to write down the dispersion (factor beta) that allows pixel at 2 faces, has considered overlapping self dispersion (coefficient gamma s (n)) simultaneously.

Figure 73 and Figure 74 be the difference of expression present embodiment overlapping the figure of " stack " pattern during the stacked mask of 2 and 3." stack " pattern when overlapping stacked mask C1, M1 is represented the logic and the pattern (Figure 71) of these 2 masks with light concentration, with the long-pending pattern (Figure 72) of denseer concentration presentation logic.In addition, " stack " pattern when overlapping stacked mask C1, M1, Y1 is represented the logic and the pattern of these 3 masks with light concentration, with the long-pending pattern of denseer concentration presentation logic.

The pattern of the inkspot of each intermediate image when " stack " pattern shown in Figure 73 and Figure 74 is similar to the mask that uses present embodiment and writes down.Therefore, can know also that according to these patterns inkspot and the overlapping of them in the intermediate image have disperseed well.

Based on the evaluation of staggering

For the gradation mask of present embodiment, also carry out the same with the various embodiments described above based on the evaluation of staggering.

Figure 75～Figure 77 be expression mask C1, the M1 shown in Figure 68, Figure 69 staggered and logic when overlapping and, the figure of the pattern of logic product and " stack ".As from these figure as can be known, logic under the situation that has been staggered in the lap position of stacked mask C1, the M1 of present embodiment and the pattern of, logic product and " stack " with at regular location overlap various patterns (Figure 71～Figure 73) compare, the dispersed reduction, the harsh feeling when observing pattern increases.

Figure 78 is that expression is staggered stacked mask C1, M1, Y1 and the figure of the pattern of " stack " when overlapping.As from this figure as can be known, " stack " pattern under the situation that has been staggered in the lap position of the stacked mask C1 of present embodiment, M1, Y1 with at regular location overlap pattern (Figure 74) compare, the dispersed reduction, the harsh feeling when observing pattern increases.

Figure 79～Figure 81 is the figure that the energy frequency spectrum to the situation (promptly having carried out overlapping situation in regular position) of the situation of the lap position of staggering and the lap position of not staggering compares.In detail, be expression with the logic of 2 stacked mask C1, M1 of present embodiment and, the figure of energy frequency spectrum under situation that logic product and " stack " pattern have staggered and the situation about not staggering.In addition, the figure of the energy frequency spectrum under Figure 82 situation that to be expression staggered " stack " patterns of 3 stacked masks of present embodiment and the situation about not staggering.

Such as shown in these figures, the stacked mask of present embodiment logic and, under any one the situation of logic product and " stack ", the low-frequency component under the situation about having staggered is all big than situation about not staggering.This is because as mentioned above, and stacked mask is not also being considered dispersion between the coplanar, and therefore when having carried out the different overlap mode of regular overlap mode when considering this dispersion, dispersiveness greatly reduces.

In addition, in the energy frequency spectrum that does not stagger of each figure, the energy quantitative change of per 1 to 20 ground of spatial frequency is big.This is because make the reason of recording ratio variation as the gradation mask.That is, smaller like this spatial frequency, promptly the record of large period allows the deviation of pixel arrangement just to be identified as gradation, and is not identified as the deviation of the unnecessary low-frequency component that will control in the present invention.

Figure 83 is that the scale with low-frequency component shows above figure based on the evaluation of staggering.At this, for the logic of 2 stacked mask C1, M1 of present embodiment and, " stack " pattern of the pattern of logic product, " stack " and mask C1, M1, Y1, the amount of the low-frequency component under situation about relatively having staggered and the situation about not staggering is represented.

As can be known as shown in the drawing, under the situation of the stacked mask of present embodiment, when staggering each logic of mask C1, M1 and, " stack " pattern of the pattern of logic product and " stack " and mask C1, M1, Y1 any one in, compare with situation about not staggering, the amount of low-frequency component all increases.

As mentioned above, make under the situation of mask overlays, whether the evaluation of estimate to dispersiveness when staggering its lap position becomes greatly, can judge whether it is to be suitable for mask of the present invention.

[write down with 150% impartial mask in embodiment 4:2 path]

In the various embodiments described above, a plurality of mask of same color is in the relation of supplying mutually, and it is exclusive that record allows being configured between the face of pixel.The scope of application of the present invention has more than and is limited to such mask.To when each recording ratio of a plurality of masks that make same color is unified, surpassing 100% a plurality of mask, also can be suitable for the present invention.If use to surpass 100% mask,, also can increase maximum ink emitted dose even then under the low situation of the resolution ratio of view data.

Embodiments of the invention 4 relate to 2 paths and write down employed 2 homochromy faces and have 75% recording ratio respectively, are combined as the mask of 150% recording ratio.

Figure 84 illustrates that conceptually this 2 path writes down the ideograph of employed mask.In Figure 84, P0001 represents the record head of a color among C, M, the Y, at this, for simplicity of illustration, describes as having 8 nozzles.Nozzle is split into 2 groups of first group and second group, comprises 4 nozzles in each nozzle sets respectively.P0002A and P0002B represent respectively and this nozzle rows corresponding mask pattern of first and second groups.That is, be the mask pattern P0002A pattern of downside (in the figure as) that in first scanning, uses and the mask pattern P0002B that in second scans, the uses pattern of upside (in the figure as).They are respectively the mask of 1 face.Each mask pattern represents that with blacking record allows pixel, represents that with white non-record allows pixel.The mask pattern P0002B of the mask pattern P0002A of the first scanning usefulness and the second scanning usefulness is respectively 75% recording ratio, and promptly the record number that allows pixel is 75% pattern with respect to the ratio of the whole mask pixels in each pattern.Therefore, if make their stacks, then becoming record, to allow pixel be 150% with respect to 4 * 4 zone, promptly comprised overlapping pattern.In addition, for illustrated pattern is described easily, be assumed to be different and pattern that conceptually represent with the mask pattern of present embodiment shown below.

P0003 and P0004 represent to write down the image of finishing by 2 paths with the some configuration that constitutes it.Information slip at a point of pixel place configuration is shown " 1 ", and the information slip of 2 points of configuration is shown " 2 ".In addition, in order to describe easily, this image is the so-called full images that forms point in whole pixels, and therefore the record of the mask P0002 that uses in the generation of these record data allows the configuration of pixel to represent the some configuration that former state ground has reflected.In first scanning, use mask pattern P0002A to generate first group some record data.Thus, under the situation of full images, form the image of 75% the point comprise whole pixels.In addition, the top in figure is with the width ground conveying recording medium of nozzle sets.

In next second scanning, the same mask pattern P0002A that uses generates first group regional corresponding some record data with the above-mentioned conveying capacity that staggered, use mask pattern P0002B generation with above-mentioned first group record second group regional corresponding some record data.Finish image by this 2 writing scans.At this moment, under the situation of full images, the image of having finished forms the image of 150% the point that comprises whole pixels.

Can carry out the manufacture method of the mask of present embodiment basically with embodiment 1 the samely.

Difference is: method of formation and under any one the situation of the generation in each path (with reference to figure 7) at the same time, after in step 1, having generated 75% mask pattern in first path, in step 2, not as embodiment 1, will write down to allow pixel arrangement on exclusive position, but the processing the same with step 1 carried out in circulation, the mask pattern in second path of generation 75%.Below, further, specify difference with embodiment 1 to as mobile method of the configuration of collocation method and arranged in order method.

Dispose mobile method

The mobile method of the configuration of present embodiment is also carried out the same basically processing of processing with Fig. 8 of embodiment 1.Different is in the processing the same with step S801, in any one generation of above-mentioned steps 1 and 2, at each face, obtains 75% 2 Value Datas as initial configuration.In addition, in the generation of step 2, in the processing the same, when moving recording allows pixel, do not forbid allowing the overlapping of pixel with the record of the not coplanar of same color with the step S804 of Fig. 8.That is, when moving it the minimum position of energy,, also be configured in this place even allow pixel overlapping at the record of other faces of this position and same color.The mask that thus, can generate 2 masks overlapping has surpassed the mask of 150% recording ratio of 100% recording ratio.

The arranged in order method

For the arranged in order method, also carry out and the basic the same processing of the processing shown in Figure 11 of embodiment 1.Different is in the processing the same with step S1106, in any one generation of above-mentioned steps 1 and 2, judges whether that having disposed record up to 75% allows pixel.In addition, during the mask of using in second path of above-mentioned steps 2 generates, in the processing the same, when configuration record allows pixel, do not forbid allowing the overlapping of pixel with the record of the not coplanar of same color with the step S1104 of Figure 11.That is, in the time will being configured in the minimum position of energy,, also be configured in this place even allow pixel overlapping at the record of other faces of this position and same color.The mask that thus, can generate 2 masks overlapping has surpassed the mask of 150% recording ratio of 100% recording ratio.

If use the mask of having made according to above method for making, then can improve the dispersiveness of the position (locations of pixels) that has disposed 2 points.

[embodiment 5: point group (cluster) size is the mask of m * n]

The present invention also goes for allowing the so-called point group mask of pixel as 1 unit with m * n record.

Figure 85 is that explanation 2 paths recording point group size is the figure of the notion of 1 * 2 100% impartial mask.In Figure 85, P0001 represents the record head of a color among C, M, the Y, at this, for simplicity of illustration, describes as having 8 nozzles.Nozzle is split into 2 groups of first group and second group, comprises 4 nozzles in each nozzle sets respectively.P0002A and P0002B represent respectively and this nozzle rows corresponding mask pattern of first and second groups.That is, be the mask pattern P0002A pattern of downside (in the figure as) that in first scanning, uses and the mask pattern P0002B that in second scans, the uses pattern of upside (in the figure as).They are respectively the mask of 1 face.Each mask pattern represents that with blacking the point group records of 1 * 2 size allow pixel, represents that with white the non-record of point group of 1 * 2 size allows pixel.The mask pattern P0002B of the mask pattern P0002A of the first scanning usefulness and the second scanning usefulness is respectively the pattern of 50% recording ratio.Therefore, if make their stacks, then becoming some group records, to allow pixel be 100% pattern with respect to 4 * 4 zone.

The image finished by 2 paths record is represented in the configuration that P0003 and P0004 are unit in order to 1 * 2 point constituting it.In addition, in order to describe easily, this image is the so-called full images that forms point in whole pixels, and therefore the record of the mask P0002 that uses in the generation of these record data allows the some configuration that former state has reflected that is configured as of pixel.In first scanning, use mask pattern P0002A to generate first group some record data.Thus, under the situation of full images, form the image of 50% the point comprise whole pixels.In addition, the top in figure is with the amount conveying recording medium of the width of nozzle sets.In next second scanning, the same mask pattern P0002A that uses generates first group regional corresponding some record data with the above-mentioned conveying capacity that staggered, use mask pattern P0002B generation and second group regional corresponding some record data with above-mentioned first group record.Finish image by this 2 writing scans.At this moment, under the situation of full images, the image of having finished be formed on whole pixels 100% in comprise the image of the point of 1 * 2 unit.

As seen from the above description, when the record with the size of m * n (being 1 * 2 in the present embodiment) allows pixel to be a unit, can easily be interpreted as can with in embodiment 1, illustrated make mask the samely.In addition, the mask of present embodiment can access and the effect much the same effect that has illustrated in embodiment 1.

[other embodiment]

Beyond the foregoing description, for example also can be respectively form and embodiment 3, embodiment 4, the embodiment 5 in 4 paths shown in the embodiment 2 be made up, in addition also can be respectively form and embodiment 4, the embodiment 5 of the gradation shown in the embodiment 3 be made up.And then, embodiment 4 and embodiment 5 can also be made up, can as each embodiment is illustrated, implement these combinations.

In addition, the kind of the ink that can be suitable among the present invention has more than the kind that is limited to the said clear ink of the foregoing description.For example also can so that the working concentration thin ink (nattierblue ink, light magenta ink) lower, red (red), blue (blue), grey characteristic inks such as (gray) than the Essential colour of CMY.

In addition, whole for the multiple ink that in tape deck, uses, the present invention also can be suitable for the stacked mask that has illustrated in the above-described embodiments, perhaps for the combination of a part of ink of the multiple ink that uses, also can be suitable for stacked mask in tape deck.

For example, under the situation of 6 chromatic inks that use cyan (C), carmetta (M), yellow (Y), black (K), nattierblue (Lc), light magenta (Lm), also can all be suitable for stacked mask at this 6 look.In this case, generate the stacked mask of 6 looks by the said clear method for making of the foregoing description.

On the other hand, also can be suitable for stacked mask at the combination of a part of color in this 6 look (2 looks, 3 looks, 4 looks, 5 looks).In this case, can consider 2 kinds of forms.First form is the stacked mask that only generates above-mentioned a part of color, and no matter the form of the mask method for making of color in addition.For example, generate stacked mask by the said clear method for making of the foregoing description,, generate mask by known method for making for 3 looks (KLcLm) in addition at 3 looks in 6 looks (for example CMY).Second form is the stacked mask that only generates above-mentioned a part of color, for color in addition, distributes the form of the mask of selecting from the stacked mask that generates for above-mentioned a part of color.For example, for 3 looks of the CMY in 6 looks, the method for making that has illustrated by the foregoing description generates stacked mask, for 3 looks (KLcLm) in addition, is suitable for the mask of selecting from the stacked mask that generates for CMY.

In addition, in the above-described embodiments, the situation that the combination of different ink colors is suitable for stacked mask has been described, but the present invention has more than and is limited to this form.Also go for the form that the point (the different same chromatic ink of ejection volume) with same color use different-diameter writes down.In this case, also point that can be different to homochromy diameter (for example a little bigger, point) is suitable for above-mentioned stacked mask.For example consider the situation of 6 kinds of points of use smalt blue, little cyan, big carmetta, little carmetta, yellow, black.In this case, for smalt blue and little cyan or big carmetta and little carmetta, the method for making by the foregoing description has illustrated generates stacked mask.

And then, in the form of the point that uses homochromy different-diameter (for example a little bigger, point), also can be the suitable above-mentioned stacked mask of combination to the point of different colours, the combination of the different same color dot of diameter is suitable for the form of identical mask.For example, state in the use under the situation of 6 kinds of points, for smalt blue and big carmetta, the method for making that has illustrated by the foregoing description generates stacked mask, and for little cyan, be suitable for the mask the same, be suitable for and the big the same mask of carmetta for little carmetta with smalt blue.

In addition, the species number of the point of homochromy different-diameter has more than and is limited to 2 kinds of sizes, also can be large, medium and small 3 kinds, can also be more than it.In addition, the present invention has more than under the situation that is applicable to the point that color is different with at least one side of size and brings into play effect, for example is applicable to from the nozzle group who leaves also to bring into play effect with the same chromatic ink of different timing ejections.For example arranging with the order of CMYMC in nozzle group's the form, be suitable for stacked mask by above-mentioned method for making manufacturing at the same chromatic nozzle group (C nozzle group, M nozzle group) who has left along the main scanning direction of head.

In addition, as mentioned above, the present invention also can be suitable in the form of the liquid beyond using ink.As the liquid beyond the ink, can enumerate that the color material that makes in the ink is condensed or thawless reactant liquor.In this case, at least to a certain ink and reactant liquor, the method for making that has illustrated by the foregoing description generates stacked mask.

In addition, in the present invention, also go for as color material contain dyestuff dye ink, contain the paint ink of pigment, contain any one of mixed ink of dyestuff and pigment as color material as color material.

The application advocates priority based on Japanese patent application 2005-197873 number of the Japanese patent application of asking in 6 days July in 2004 2004-199623 number and on July 6th, 2005 application, and above-mentioned Japanese patent application is by with reference to comprising in this manual.

Claims (49)

1. mask manufacture method is the manufacture method of the mask pattern that uses when generation is used for writing down the view data of multiple point respectively by scanning repeatedly, it is characterized in that comprising:

The deciding step of decision and the configuration of above-mentioned multiple corresponding a plurality of mask patterns record permission pixel separately, wherein

Above-mentioned deciding step comprises: determine that record allows the configuration of pixel, the feasible step that allows the low-frequency component of the configuration decision of pixel to reduce simultaneously in a plurality of mask patterns of correspondence by above-mentioned a plurality of mask patterns record separately.

2. mask manufacture method is the manufacture method of the mask pattern that uses when generation is used for writing down the view data of multiple point respectively by scanning repeatedly, it is characterized in that comprising:

The deciding step of decision and the configuration of above-mentioned multiple corresponding a plurality of mask patterns record permission pixel separately, wherein

Above-mentioned deciding step comprises: make the step of the configuration variation of above-mentioned a plurality of mask pattern record permission pixel separately,

In this conversion step, make the configuration variation of the record permission pixel of above-mentioned a plurality of mask patterns, make that existing with ... above-mentioned record allows the low-frequency component of the configuration of pixel to reduce.

3. mask manufacture method is the manufacture method of the mask pattern that uses when generation is used for writing down the view data of multiple point respectively by scanning repeatedly, it is characterized in that comprising:

The deciding step of decision and the configuration of above-mentioned multiple corresponding a plurality of mask patterns record permission pixel separately, wherein

Above-mentioned deciding step comprises: according to the interrelated predetermined rule of configuration that above-mentioned a plurality of mask patterns record is separately allowed pixel, make the record of above-mentioned a plurality of mask patterns allow the step of the configuration variation of pixel,

Make it carry out configuration that above-mentioned record after the above-mentioned variation allows pixel and allow configuration of pixel to compare with making its above-mentioned record that carries out before the above-mentioned variation, low-frequency component reduces.

4. mask manufacture method is the manufacture method of the mask pattern that uses when generation is used for writing down the view data of multiple point of composing images respectively by scanning repeatedly, it is characterized in that comprising:

Allow the configuration of pixel to be changed to second configuration status by making, thereby determine the deciding step of above-mentioned a plurality of mask pattern configuration separately, wherein from first configuration status with above-mentioned multiple corresponding a plurality of mask patterns record separately

The record that the logic product of the above-mentioned a plurality of mask patterns of the configuration pattern that the record that the logic product of the above-mentioned a plurality of mask patterns during according to above-mentioned second configuration status obtains allows pixel with according to above-mentioned first configuration status time obtains allows the configuration pattern of pixel to compare, and low-frequency component reduces.

5. mask manufacture method is the manufacture method of the mask pattern that uses when generation is used for writing down the view data of multiple point of composing images respectively by scanning repeatedly, it is characterized in that comprising:

Allow the configuration of pixel to be changed to second configuration status by making, thereby determine the deciding step of above-mentioned a plurality of mask pattern configuration separately, wherein from first configuration status with above-mentioned multiple corresponding a plurality of mask patterns record separately

The logic of the above-mentioned a plurality of mask patterns of the configuration pattern that the logic of the above-mentioned a plurality of mask patterns during according to above-mentioned second configuration status and the record that obtains allow pixel with according to above-mentioned first configuration status time and the record that obtains allow the configuration pattern of pixel to compare, the low-frequency component minimizing.

6. according to any one described mask manufacture method of claim 1～5, it is characterized in that:

Above-mentioned a plurality of mask pattern is and above-mentioned multiple point and the above-mentioned repeatedly corresponding a plurality of mask patterns of combination of scanning.

7. according to any one described mask manufacture method of claim 1～6, it is characterized in that:

Above-mentioned deciding step comprises:

At each of above-mentioned a plurality of mask patterns, the first step of the record permission pixel of the configuration number corresponding in initial pattern with the recording ratio of this pattern;

Allow each of pixel at being configured in record in each of above-mentioned a plurality of mask patterns, allow pixel and other records that are configured in the above-mentioned a plurality of mask patterns that include its mask pattern of configuration to allow calculating repulsion potential energy between pixels at this record, obtain second step as total potential energy energy of its total;

Make each record that calculates above-mentioned repulsion potential energy allow pixel to move to the third step of the lower position of repulsion potential energy;

Carry out above-mentioned second step and above-mentioned third step by circulation, the 4th step that above-mentioned total potential energy energy is reduced.

8. mask manufacture method according to claim 7 is characterized in that also comprising:

During smaller or equal to setting, the record in each mask pattern is allowed five step of the configuration decision of pixel for final configuration at above-mentioned total potential energy energy.

9. according to claim 7 or 8 described mask manufacture methods, it is characterized in that:

Above-mentioned third step surpasses at the grating under this position in the lower position of repulsion potential energy, promptly the grating of stipulating accordingly with the direction of the above-mentioned scanning of mask pattern and definite when can configuration record allowing the number of pixel makes record allow pixel to move to repulsion potential energy time low position in other gratings.

10. according to any one described mask manufacture method of claim 1～6, it is characterized in that:

Above-mentioned deciding step comprises:

Record of each configuration at above-mentioned a plurality of mask patterns allows pixel, promptly when this record of configuration allows pixel, allow pixel and be configured in other records that comprise in above-mentioned a plurality of mask patterns of mask pattern that this record allows pixel to allow between pixels the first step of calculating repulsion potential energy at the record of this position;

At aforementioned calculation each record of repulsion potential energy allow pixel, it be second step of the position of minimum at repulsion potential energy that this record is allowed pixel arrangement;

Above-mentioned first step and above-mentioned second step are carried out in circulation, and at above-mentioned a plurality of mask patterns each, the record that disposes the number corresponding with the recording ratio of this pattern allows the third step of pixel.

11. mask manufacture method according to claim 10 is characterized in that:

Above-mentioned second step surpasses at the grating under this position in the position of repulsion potential energy minimum, the i.e. grating of stipulating accordingly with the direction of the above-mentioned scanning of mask pattern and definite when can configuration record allowing the number of pixel will write down in other gratings and allow pixel arrangement in the inferior little position of repulsion potential energy.

12. any one the described mask manufacture method according to claim 1～11 is characterized in that:

For above-mentioned multiple point, at least one of the color of point and size is different.

13. a data processing method is characterized in that comprising:

The mask pattern that the mask manufacture method of use by any one record of claim 1～12 produces generates and is used for writing down the step of the view data of above-mentioned multiple point by each of above-mentioned repeatedly scanning.

14. a data processing equipment is characterized in that comprising:

The mask pattern that the mask manufacture method of use by any one record of claim 1～12 produces generates and is used for writing down the device of the view data of above-mentioned multiple point by each of above-mentioned repeatedly scanning.

15. data processing method, be generation be used for making a plurality of nozzle groups of the multiple point of record the regulation zone of recording medium is repeatedly scanned and write down in the data processing method of this each view data of using that repeatedly scans, it is characterized in that comprising:

Use the multiple mask pattern corresponding respectively with above-mentioned multiple point, will with above-mentioned multiple corresponding view data be divided into above-mentioned repeatedly scan in the step of the view data of use respectively, wherein

In above-mentioned multiple mask pattern, at least with the record of corresponding a plurality of first mask patterns of the above-mentioned repeatedly scanning that is used for writing down first kind of point allow pixel arrangement and with the arrangement of the record permission pixel of corresponding a plurality of second mask patterns of the above-mentioned repeatedly scanning that is used for writing down second kind of point be different

The record that obtains according to the logic product of second mask pattern of the regulation in first mask pattern of the regulation in above-mentioned a plurality of first mask patterns and above-mentioned a plurality of second mask patterns allows the low-frequency component of the Pareto diagram of pixel to stagger with respect to first mask pattern of afore mentioned rules than second mask pattern by making afore mentioned rules and the low-frequency component that carries out the Pareto diagram of the record permission pixel that logic product obtains lacks.

16. data processing method, be generation be used for making a plurality of nozzle groups of the multiple point of record the regulation zone of recording medium is repeatedly scanned and write down in the data processing method of this each view data of using that repeatedly scans, it is characterized in that comprising:

Use the multiple mask pattern corresponding respectively with above-mentioned multiple point, will with above-mentioned multiple corresponding view data be divided into above-mentioned repeatedly scan in the step of the view data of use respectively, wherein

In above-mentioned multiple mask pattern, at least with the record of corresponding a plurality of first mask patterns of the above-mentioned repeatedly scanning that is used for writing down first kind of point allow pixel arrangement and with the arrangement of the record permission pixel of corresponding a plurality of second mask patterns of the above-mentioned repeatedly scanning that is used for writing down second kind of point be different

The record that on regular position second mask pattern of the regulation in first mask pattern of the regulation in above-mentioned a plurality of first mask patterns and above-mentioned a plurality of second mask patterns is carried out obtaining under the situation of logic product allows the low-frequency component of the Pareto diagram of pixel to lack than the low-frequency component that on the position different with above-mentioned regular position second mask pattern of first mask pattern of afore mentioned rules and afore mentioned rules is carried out the Pareto diagram of the record permission pixel that obtains under the situation of logic product.

17. data processing method, be generation be used for making a plurality of nozzle groups of the multiple point of record the regulation zone of recording medium is repeatedly scanned and write down in the data processing method of this each view data of using that repeatedly scans, it is characterized in that comprising:

Use the multiple mask pattern corresponding respectively with above-mentioned multiple point, will with above-mentioned multiple corresponding view data be divided into above-mentioned repeatedly scan in the step of the view data of use respectively, wherein

In above-mentioned multiple mask pattern, at least with the record of corresponding a plurality of first mask patterns of the above-mentioned repeatedly scanning that is used for writing down first kind of point allow pixel arrangement and with the arrangement of the record permission pixel of corresponding a plurality of second mask patterns of the above-mentioned repeatedly scanning that is used for writing down second kind of point be different

Second mask pattern record separately of arranging first mask pattern of the regulation in above-mentioned a plurality of first mask pattern and the regulation in above-mentioned a plurality of second mask pattern allows pixel interrelatedly, makes that having record that the logic product according to second mask pattern of first mask pattern of afore mentioned rules and afore mentioned rules obtains allows the low-frequency component characteristic littler than radio-frequency component in the Pareto diagram of pixel.

18. data processing method, be generation be used for making a plurality of nozzle groups of the multiple point of record the regulation zone of recording medium is repeatedly scanned and write down in the data processing method of this each view data of using that repeatedly scans, it is characterized in that comprising:

Use the multiple mask pattern corresponding respectively with above-mentioned multiple point, will with above-mentioned multiple corresponding view data be divided into above-mentioned repeatedly scan in the step of the view data of use respectively, wherein

In above-mentioned multiple mask pattern, at least with the record of corresponding a plurality of first mask patterns of the above-mentioned repeatedly scanning that is used for writing down first kind of point allow pixel arrangement and with the arrangement of the record permission pixel of corresponding a plurality of second mask patterns of the above-mentioned repeatedly scanning that is used for writing down second kind of point be different

The record that obtains according to the logic product of second mask pattern of first mask pattern of the regulation in above-mentioned a plurality of first mask patterns and the regulation in above-mentioned a plurality of second mask pattern allow the Pareto diagram of pixel be aperiodic and low-frequency component few.

19. any one the described data processing method according to claim 15～17 is characterized in that:

The record that obtains according to the logic product of second mask pattern of first mask pattern of afore mentioned rules and afore mentioned rules allows the Pareto diagram of pixel to have aperiodic and the low-frequency component characteristic littler than radio-frequency component.

20. data processing method, be generation be used for making a plurality of nozzle groups of the multiple point of record the regulation zone of recording medium is repeatedly scanned and write down in the data processing method of this each view data of using that repeatedly scans, it is characterized in that comprising:

Use the multiple mask pattern corresponding respectively with above-mentioned multiple point, will with above-mentioned multiple corresponding view data be divided into above-mentioned repeatedly scan in the step of the view data of use respectively, wherein

In above-mentioned multiple mask pattern, at least with the record of corresponding a plurality of first mask patterns of the above-mentioned repeatedly scanning that is used for writing down first kind of point allow pixel arrangement and with the arrangement of the record permission pixel of corresponding a plurality of second mask patterns of the above-mentioned repeatedly scanning that is used for writing down second kind of point be different

Allow the low-frequency component of the Pareto diagram of pixel to stagger with respect to first mask pattern of afore mentioned rules according to the logic of second mask pattern of the regulation in first mask pattern of the regulation in above-mentioned a plurality of first mask patterns and above-mentioned a plurality of second mask patterns and the record that obtains and carry out logic and the low-frequency component of the Pareto diagram of the record permission pixel that obtains lacks than second mask pattern by making afore mentioned rules.

21. data processing method, be generation be used for making a plurality of nozzle groups of the multiple point of record the regulation zone of recording medium is repeatedly scanned and write down in the data processing method of this each view data of using that repeatedly scans, it is characterized in that comprising:

Use the multiple mask pattern corresponding respectively with above-mentioned multiple point, will with above-mentioned multiple corresponding view data be divided into above-mentioned repeatedly scan in the step of the view data of use respectively, wherein

In above-mentioned multiple mask pattern, at least with the record of corresponding a plurality of first mask patterns of the above-mentioned repeatedly scanning that is used for writing down first kind of point allow pixel arrangement and with the arrangement of the record permission pixel of corresponding a plurality of second mask patterns of the above-mentioned repeatedly scanning that is used for writing down second kind of point be different

On regular position to second mask pattern of the regulation in first mask pattern of the regulation in above-mentioned a plurality of first mask patterns and above-mentioned a plurality of second mask patterns carry out logic with situation under the record that obtains allow pixel Pareto diagram low-frequency component than on the position different second mask pattern of first mask pattern of afore mentioned rules and afore mentioned rules carried out with above-mentioned regular position logic and situation under the low-frequency component of Pareto diagram of the record permission pixel that obtains lack.

22. data processing method, be generation be used for making a plurality of nozzle groups of the multiple point of record the regulation zone of recording medium is repeatedly scanned and write down in the data processing method of this each view data of using that repeatedly scans, it is characterized in that comprising:

Use the multiple mask pattern corresponding respectively with above-mentioned multiple point, will with above-mentioned multiple corresponding view data be divided into above-mentioned repeatedly scan in the step of the view data of use respectively, wherein

In above-mentioned multiple mask pattern, at least with the record of corresponding a plurality of first mask patterns of the above-mentioned repeatedly scanning that is used for writing down first kind of point allow pixel arrangement and with the arrangement of the record permission pixel of corresponding a plurality of second mask patterns of the above-mentioned repeatedly scanning that is used for writing down second kind of point be different

Second mask pattern record separately of arranging first mask pattern of the regulation in above-mentioned a plurality of first mask pattern and the regulation in above-mentioned a plurality of second mask pattern allows pixel interrelatedly, makes to have according to the logic of second mask pattern of first mask pattern of afore mentioned rules and afore mentioned rules and the record that obtains to allow the low-frequency component characteristic littler than radio-frequency component in the Pareto diagram of pixel.

23. data processing method, be generation be used for making a plurality of nozzle groups of the multiple point of record the regulation zone of recording medium is repeatedly scanned and write down in the data processing method of this each view data of using that repeatedly scans, it is characterized in that comprising:

Use the multiple mask pattern corresponding respectively with above-mentioned multiple point, will with above-mentioned multiple corresponding view data be divided into above-mentioned repeatedly scan in the step of the view data of use respectively, wherein

In above-mentioned multiple mask pattern, at least with the record of corresponding a plurality of first mask patterns of the above-mentioned repeatedly scanning that is used for writing down first kind of point allow pixel arrangement and with the arrangement of the record permission pixel of corresponding a plurality of second mask patterns of the above-mentioned repeatedly scanning that is used for writing down second kind of point be different

According to the logic of second mask pattern of first mask pattern of the regulation in above-mentioned a plurality of first mask patterns and the regulation in above-mentioned a plurality of second mask pattern and the record that obtains allow the Pareto diagram of pixel be aperiodic and low-frequency component few.

24. any one the described data processing method according to claim 20～23 is characterized in that:

According to the logic of first mask pattern of afore mentioned rules and second mask pattern of afore mentioned rules and the record that obtains allow the Pareto diagram of pixel be aperiodic and have an above-mentioned low-frequency component characteristic littler than radio-frequency component.

25. data processing method, be generation be used for making a plurality of nozzle groups of the multiple point of record the regulation zone of recording medium is repeatedly scanned and write down in the data processing method of this each view data of using that repeatedly scans, it is characterized in that comprising:

Use the multiple mask pattern corresponding respectively with above-mentioned multiple point, will with above-mentioned multiple corresponding view data be divided into above-mentioned repeatedly scan in the step of the view data of use respectively, wherein

In above-mentioned multiple mask pattern, at least with the record of corresponding a plurality of first mask patterns of the above-mentioned repeatedly scanning that is used for writing down first kind of point allow pixel arrangement and with the arrangement of the record permission pixel of corresponding a plurality of second mask patterns of the above-mentioned repeatedly scanning that is used for writing down second kind of point be different

The record that obtains according to the logic product of second mask pattern of the regulation in first mask pattern of the regulation in above-mentioned a plurality of first mask patterns and above-mentioned a plurality of second mask patterns allows the low-frequency component of the Pareto diagram of pixel to stagger with respect to first mask pattern of afore mentioned rules than second mask pattern by making afore mentioned rules and the low-frequency component that carries out the Pareto diagram of the record permission pixel that logic product obtains lacks

And the low-frequency component that allows the Pareto diagram of pixel according to the logic of first mask pattern of afore mentioned rules and second mask pattern of afore mentioned rules and the record that obtains staggers with respect to first mask pattern of afore mentioned rules than second mask pattern by making afore mentioned rules and carries out logic and the low-frequency component of the Pareto diagram of the record permission pixel that obtains lacks.

26. data processing method, be generation be used for making a plurality of nozzle groups of the multiple point of record the regulation zone of recording medium is repeatedly scanned and write down in the data processing method of this each view data of using that repeatedly scans, it is characterized in that comprising:

Use the multiple mask pattern corresponding respectively with above-mentioned multiple point, will with above-mentioned multiple corresponding view data be divided into above-mentioned repeatedly scan in the step of the view data of use respectively, wherein

In above-mentioned multiple mask pattern, at least with the record of corresponding a plurality of first mask patterns of the above-mentioned repeatedly scanning that is used for writing down first kind of point allow pixel arrangement and with the arrangement of the record permission pixel of corresponding a plurality of second mask patterns of the above-mentioned repeatedly scanning that is used for writing down second kind of point be different

The record that on regular position second mask pattern of the regulation in first mask pattern of the regulation in above-mentioned a plurality of first mask patterns and above-mentioned a plurality of second mask patterns is carried out obtaining under the situation of logic product allows the low-frequency component of the Pareto diagram of pixel to lack than the low-frequency component that on the position different with above-mentioned regular position second mask pattern of first mask pattern of afore mentioned rules and afore mentioned rules is carried out the Pareto diagram of the record permission pixel that obtains under the situation of logic product

And on the regular position second mask pattern of first mask pattern of afore mentioned rules and afore mentioned rules carried out logic with situation under the record that obtains allow pixel Pareto diagram low-frequency component than on the position different second mask pattern of first mask pattern of afore mentioned rules and afore mentioned rules carried out with above-mentioned regular position logic and situation under the low-frequency component of Pareto diagram of the record permission pixel that obtains lack.

27. data processing method, be generation be used for making a plurality of nozzle groups of the multiple point of record the regulation zone of recording medium is repeatedly scanned and write down in the data processing method of this each view data of using that repeatedly scans, it is characterized in that comprising:

Use the multiple mask pattern corresponding respectively with above-mentioned multiple point, will with above-mentioned multiple corresponding view data be divided into above-mentioned repeatedly scan in the step of the view data of use respectively, wherein

In above-mentioned multiple mask pattern, at least with the record of corresponding a plurality of first mask patterns of the above-mentioned repeatedly scanning that is used for writing down first kind of point allow pixel arrangement and with the arrangement of the record permission pixel of corresponding a plurality of second mask patterns of the above-mentioned repeatedly scanning that is used for writing down second kind of point be different

Arrange first mask pattern of the regulation in above-mentioned a plurality of first mask pattern and second mask pattern record separately of the regulation in above-mentioned a plurality of second mask pattern interrelatedly and allow pixel; Allow the low-frequency component characteristic littler than radio-frequency component in the Pareto diagram of pixel so that have record that the logic product according to second mask pattern of first mask pattern of afore mentioned rules and afore mentioned rules obtains, and have according to the logic of second mask pattern of first mask pattern of afore mentioned rules and afore mentioned rules and the record that obtains and allow the low-frequency component characteristic littler than radio-frequency component in the Pareto diagram of pixel.

28. data processing method, be generation be used for making a plurality of nozzle groups of the multiple point of record the regulation zone of recording medium is repeatedly scanned and write down in the data processing method of this each view data of using that repeatedly scans, it is characterized in that comprising:

Use the multiple mask pattern corresponding respectively with above-mentioned multiple point, will with above-mentioned multiple corresponding view data be divided into above-mentioned repeatedly scan in the step of the view data of use respectively, wherein

In above-mentioned multiple mask pattern, at least with the record of corresponding a plurality of first mask patterns of the above-mentioned repeatedly scanning that is used for writing down first kind of point allow pixel arrangement and with the arrangement of the record permission pixel of corresponding a plurality of second mask patterns of the above-mentioned repeatedly scanning that is used for writing down second kind of point be different

Arrange first mask pattern of the regulation in above-mentioned a plurality of first mask pattern and second mask pattern record separately of the regulation in above-mentioned a plurality of second mask pattern interrelatedly and allow pixel, the record that makes logic product according to second mask pattern of first mask pattern of afore mentioned rules and afore mentioned rules obtain allow the Pareto diagram of pixel be aperiodic and low-frequency component few, and according to the logic of second mask pattern of first mask pattern of afore mentioned rules and afore mentioned rules and the record that obtains allow the Pareto diagram of pixel be aperiodic and low-frequency component few.

29. any one the described data processing method according to claim 25～28 is characterized in that:

The record that obtains according to the logic product of first mask pattern of afore mentioned rules and second mask pattern of afore mentioned rules allow the Pareto diagram of pixel be aperiodic and have an above-mentioned low-frequency component characteristic littler than radio-frequency component, and

According to the logic of first mask pattern of afore mentioned rules and second mask pattern of afore mentioned rules and the record that obtains allow the Pareto diagram of pixel be aperiodic and have an above-mentioned low-frequency component characteristic littler than radio-frequency component.

30. any one the described data processing method according to claim 15～29 is characterized in that:

In with one scan, use first mask pattern of afore mentioned rules and second mask pattern of afore mentioned rules.

31. any one the described data processing method according to claim 15～30 is characterized in that:

Above-mentioned first kind of point is the point of ink that contains the color material of specified color, and above-mentioned second kind of point is to contain the point of liquid that carries out the composition of chemical reaction with above-mentioned color material.

32. any one the described data processing method according to claim 15～31 is characterized in that:

Record in each of above-mentioned a plurality of first mask patterns allow the arrangement of pixel be aperiodic and have the characteristic of low-frequency component less than radio-frequency component, and

Record in each of above-mentioned a plurality of second mask patterns allow the arrangement of pixel be aperiodic and have the characteristic of low-frequency component less than radio-frequency component.

33. any one the described data processing method according to claim 15～32 is characterized in that:

Above-mentioned a plurality of first mask pattern is respectively to state the mask pattern that has the deviation of recording ratio on the first nozzle group's the nozzle arrangement direction of first kind of point documentarily,

Above-mentioned a plurality of second mask pattern is respectively to state the mask pattern that has the deviation of recording ratio on the second nozzle group's the nozzle arrangement direction of second kind of point documentarily.

34. any one the described data processing method according to claim 15～33 is characterized in that:

The group that above-mentioned a plurality of first mask pattern will be made of a plurality of pixels of adjacency at least one of above-mentioned scanning direction and the sub scanning direction vertical with this scanning direction is respectively arranged record as a unit and is allowed pixel or non-record to allow pixel,

The group that above-mentioned a plurality of second mask pattern will be made of a plurality of pixels of adjacency at least one of above-mentioned scanning direction and the sub scanning direction vertical with this scanning direction is respectively arranged record as a unit and is allowed pixel or non-record to allow pixel.

35. any one the described data processing method according to claim 15～20 is characterized in that:

By carrying out record with the order of regulation by above-mentioned a plurality of nozzle groups, finish the image in the regulation zone that record aforementioned recording medium interimly,

Respectively according to the Pareto diagram of the logic product of the record number corresponding continuous N (N for more than or equal to 2 integer) pairing above-mentioned N mask pattern of nozzle group and logic and the recording pixel that obtains with afore mentioned rules zone be respectively aperiodic and have a low-frequency component characteristic littler than radio-frequency component.

36. data processing method, be generation be used for making a plurality of nozzle groups of the multiple point of record the regulation zone of recording medium is repeatedly scanned and write down in the data processing method of this each view data of using that repeatedly scans, it is characterized in that comprising:

Use the multiple mask pattern corresponding respectively with above-mentioned multiple point, will with above-mentioned multiple corresponding view data be divided into above-mentioned repeatedly scan in the step of the view data of use respectively, wherein

Above-mentioned multiple mask pattern has respectively and the corresponding a plurality of mask patterns of above-mentioned repeatedly scanning,

The record that obtains according to the logic product of at least 2 mask patterns of the regulation of using in the same one scan of regulation in above-mentioned repeatedly scanning allows the low-frequency component of the Pareto diagram of pixel to stagger than at least 2 mask patterns that make afore mentioned rules and the low-frequency component that carries out the Pareto diagram of the record permission pixel that logic product obtains lacks.

37. data processing method, be generation be used for making a plurality of nozzle groups of the multiple point of record the regulation zone of recording medium is repeatedly scanned and write down in the data processing method of this each view data of using that repeatedly scans, it is characterized in that comprising:

Use the multiple mask pattern corresponding respectively with above-mentioned multiple point, will with above-mentioned multiple corresponding view data be divided into above-mentioned repeatedly scan in the step of the view data of use respectively, wherein

Above-mentioned multiple mask pattern has respectively and the corresponding a plurality of mask patterns of above-mentioned repeatedly scanning,

The logic of at least 2 mask patterns of the regulation of using in the same one scan according to the regulation in above-mentioned repeatedly scanning and the record that obtains allow the low-frequency component of the Pareto diagram of pixel to stagger than at least 2 mask patterns that make afore mentioned rules and carry out logic to allow the low-frequency component of the Pareto diagram of pixel to lack with the record that obtains.

38. data processing method, be generation be used for making a plurality of nozzle groups of the multiple point of record the regulation zone of recording medium is repeatedly scanned and write down in the data processing method of this each view data of using that repeatedly scans, it is characterized in that comprising:

Use the multiple mask pattern corresponding respectively with above-mentioned multiple point, will with above-mentioned multiple corresponding view data be divided into above-mentioned repeatedly scan in the step of the view data of use respectively, wherein

Above-mentioned multiple mask pattern has respectively and the corresponding a plurality of mask patterns of above-mentioned repeatedly scanning,

The record that obtains according to the logic product of at least 2 mask patterns of the regulation of using in the same one scan of regulation in above-mentioned repeatedly scanning allows the low-frequency component of the Pareto diagram of pixel to stagger than at least 2 mask patterns that make afore mentioned rules and the low-frequency component that carries out the Pareto diagram of the record permission pixel that logic product obtains lacks

And allow the low-frequency component of the Pareto diagram of pixel to stagger than at least 2 mask patterns that make afore mentioned rules and carry out logic and the low-frequency component of the Pareto diagram of the record permission pixel that obtains lacks according to the logic of at least 2 mask patterns of afore mentioned rules and the record that obtains.

39. data processing method, be generation be used for making a plurality of nozzle groups of the multiple point of record the regulation zone of recording medium is repeatedly scanned and write down in the data processing method of this each view data of using that repeatedly scans, it is characterized in that comprising:

Use the multiple mask pattern corresponding respectively with above-mentioned multiple point, will with above-mentioned multiple corresponding view data be divided into above-mentioned repeatedly scan in the step of the view data of use respectively, wherein

Above-mentioned multiple mask pattern has respectively and the corresponding a plurality of mask patterns of above-mentioned repeatedly scanning,

The record that obtains according to the logic product of the individual mask pattern of the N of the regulation in a plurality of mask patterns that constitute above-mentioned multiple mask pattern (N for more than or equal to 2 integer) allows the low-frequency component of the Pareto diagram of pixel to stagger than the N that makes an afore mentioned rules mask pattern and the low-frequency component that carries out the Pareto diagram of the record permission pixel that logic product obtains lacks.

40. data processing method, be generation be used for making a plurality of nozzle groups of the multiple point of record the regulation zone of recording medium is repeatedly scanned and write down in the data processing method of this each view data of using that repeatedly scans, it is characterized in that comprising:

Use the multiple mask pattern corresponding respectively with above-mentioned multiple point, will with above-mentioned multiple corresponding view data be divided into above-mentioned repeatedly scan in the step of the view data of use respectively, wherein

Above-mentioned multiple mask pattern has respectively and the corresponding a plurality of mask patterns of above-mentioned repeatedly scanning,

The record that obtains according to the logic product of the individual mask pattern of the N of the regulation in a plurality of mask patterns that constitute above-mentioned multiple mask pattern (N for more than or equal to 2 integer) allows the low-frequency component of the Pareto diagram of pixel to stagger than the N that makes an afore mentioned rules mask pattern and the low-frequency component that carries out the Pareto diagram of the record permission pixel that logic product obtains lacks.

41. data processing method, be generation be used for making a plurality of nozzle groups of the multiple point of record the regulation zone of recording medium is repeatedly scanned and write down in the data processing method of this each view data of using that repeatedly scans, it is characterized in that comprising:

Use the multiple mask pattern corresponding respectively with above-mentioned multiple point, will with above-mentioned multiple corresponding view data be divided into above-mentioned repeatedly scan in the step of the view data of use respectively, wherein

Above-mentioned multiple mask pattern has respectively and the corresponding a plurality of mask patterns of above-mentioned repeatedly scanning,

The record that obtains according to the logic product of the individual mask pattern of the N of the regulation in a plurality of mask patterns that constitute above-mentioned multiple mask pattern (N for more than or equal to 2 integer) allows the low-frequency component of the Pareto diagram of pixel to stagger than the N that makes an afore mentioned rules mask pattern and the low-frequency component that carries out the Pareto diagram of the record permission pixel that logic product obtains lacks

And allow the low-frequency component of the Pareto diagram of pixel to stagger and the low-frequency component that carries out the Pareto diagram of the record permission pixel that logic product obtains lacks than the N that makes an afore mentioned rules mask pattern according to the logic of N mask pattern of afore mentioned rules and the record that obtains.

42. any one the described data processing method according to claim 39～41 is characterized in that:

Extract image out by a plurality of intervals of using above-mentioned multiple mask pattern to generate, finish the image in the regulation zone that record aforementioned recording medium interimly with the journal of regulation,

Extract image at interval out in order to generate the record number corresponding continuous N (N is the integer more than or equal to 2), and use N mask pattern of afore mentioned rules with the afore mentioned rules zone.

43. any one the described data processing method according to claim 15～42 is characterized in that:

For above-mentioned multiple point, at least one of the color of point and size is different.

44. any one the described data processing method according to claim 15～43 is characterized in that:

Above-mentioned low-frequency component is the composition than half low frequency side of being positioned at that exists in the spatial frequency zone of frequency content.

45., it is characterized in that according to claim 30,36,37, any one described data processing method of 38:

Above-mentioned is the primary scanning that the afore mentioned rules zone is write down with one scan.

46. a data processing equipment is characterized in that comprising:

The image processing part spare of any one described data processing method of enforcement of rights requirement 15～45.

47., it is characterized in that according to the described data processing equipment of claim 46:

Above-mentioned data processing equipment is that a plurality of nozzle groups of the above-mentioned multiple point of record are repeatedly scanned the regulation zone of recording medium and the tape deck that writes down.

48., it is characterized in that according to the described data processing equipment of claim 46:

Above-mentioned data processing equipment is the host apparatus that is connected with tape deck, and this tape deck is that a plurality of nozzle groups of the above-mentioned multiple point of record are repeatedly scanned the regulation zone of recording medium and the tape deck that writes down.

49. a mask pattern is in a plurality of mask patterns that use when the view data of the multiple point of each record that generation is used for repeatedly scanning, and it is characterized in that:

For above-mentioned a plurality of mask patterns, make they 2 or above overlapping situation under, the pattern that this record allows pixel allows the pattern of pixel to compare with record under the situation that is staggered in the lap position, and low-frequency component is few.

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