CN1890779B - Exposure apparatus, exposure method, device producing method - Google Patents

Exposure apparatus, exposure method, device producing method Download PDF

Info

Publication number
CN1890779B
CN1890779B CN 200480035901 CN200480035901A CN1890779B CN 1890779 B CN1890779 B CN 1890779B CN 200480035901 CN200480035901 CN 200480035901 CN 200480035901 A CN200480035901 A CN 200480035901A CN 1890779 B CN1890779 B CN 1890779B
Authority
CN
China
Prior art keywords
substrate
liquid
member
surface
exposure
Prior art date
Application number
CN 200480035901
Other languages
Chinese (zh)
Other versions
CN1890779A (en
Inventor
星加隆一
石泽均
蛭川茂
长坂博之
高岩宏明
Original Assignee
株式会社尼康
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to JP2003404384 priority Critical
Priority to JP404384/2003 priority
Priority to JP042496/2004 priority
Priority to JP2004042496 priority
Application filed by 株式会社尼康 filed Critical 株式会社尼康
Priority to PCT/JP2004/018435 priority patent/WO2005055296A1/en
Publication of CN1890779A publication Critical patent/CN1890779A/en
Application granted granted Critical
Publication of CN1890779B publication Critical patent/CN1890779B/en

Links

Abstract

An exposure apparatus (EX) is an apparatus for exposing a substrate (P) by irradiating exposure light (EL) onto the substrate (P) through a projection optical system (PL) and a liquid (1). The exposure apparatus (EX) has a substrate table (PT) for holding the substrate (P). A plate member (30) having a liquid repellent flat surface (30A) is replaceably attached to the substrate table (PT) to prevent the liquid from remaining, maintaining excellent exposure accuracy.

Description

曝光装置、曝光方法和器件制造方法 Exposure apparatus, exposure method and device manufacturing method

技术领域 FIELD

[0001] 本发明涉及经液体在基片上照射曝光光以对基片曝光的曝光装置、曝光方法和器件制造方法。 [0001] The present invention relates to exposure light is irradiated to expose the substrate exposure apparatus, exposure method and device manufacturing method through the liquid on the substrate. 此外,本发明涉及使用了液浸法的投影曝光装置中使用的光学部件和使用了该光学部件的投影曝光装置。 Further, the present invention relates to an optical member using the projection exposure apparatus using the liquid immersion method and a projection exposure apparatus using the optical member. 再者,本发明涉及适合于在与液体或气体接触的环境下使用的光学部件。 Furthermore, the present invention relates to an optical member suitable for use in an environment in contact with the liquid or gas.

背景技术 Background technique

[0002] 利用将在掩模上形成的图案转印到感光性的基片上的所谓的光刻的方法来制造半导体器件或液晶显示器件。 Pattern [0002] using a mask formed on a so-called photolithography is transferred onto a photosensitive substrate on a method for manufacturing a semiconductor device or a liquid crystal display device. 在该光刻工序中使用的曝光装置具有支撑掩模的掩模台和支撑基片的基片台,一边逐次移动掩模台和基片台,一边经投影光学系统将掩模的图案转印到基片上。 Substrate stage of the exposure apparatus used in this photolithography process has a mask stage supporting the mask and a supporting substrate, while successively moving the mask stage and the substrate stage while the mask via a projection optical system to transfer the pattern to the substrate. 近年来,为了与器件图案的进一步的高集成化相对应,希望实现投影光学系统的进一步的高解像度化。 In recent years, further high integration of the device corresponding to the pattern, it is desirable to achieve further high resolution of the projection optical system. 所使用的曝光波长越短,此外投影光学系统的数值孔径越大,投影光学系统的解像度越高。 The exposure wavelength used is shorter, in addition to the larger numerical aperture of projection optical system, the higher the resolution of the projection optical system. 因此,在曝光装置中使用的曝光波长逐年缩短,投影光学系统的数值孔径也越来越增大。 Therefore, the exposure wavelength used in exposure apparatus shortened year by year, the numerical aperture of the projection optical system is increasing more and more. 而且,现在主流的曝光波长是KrF准分子激光器的M8nm,而波长更短的ArF准分子激光器的193nm也正在实现实用化。 Furthermore, the mainstream exposure wavelength is M8nm KrF excimer laser, and the shorter wavelength 193nm ArF excimer laser is also practically used. 此外,在进行曝光时,与解像度同样,聚焦深度(DOF)也变得重要。 Further, during the exposure, with the same resolution, depth of focus (DOF) is also important. 解像度R和聚焦深度δ分别用以下的式来表示。 Resolution R and depth of focus δ are represented by the following formula.

[0003] R = Ii1 · λ /NA · · . (1) [0003] R = Ii1 · λ / NA · ·. (1)

[0004] δ = ±k2 · λ/ΝΑ2 ... (2) [0004] δ = ± k2 · λ / ΝΑ2 ... (2)

[0005] 在此,λ是曝光波长,NA是投影光学系统的数值孔径,kp k2是工艺系数。 [0005] Here, λ is the exposure wavelength, NA is the numerical aperture of the projection optical system, kp k2 are process coefficients. 根据(1)式、(¾式可知,如果为了提高解像度R而缩短曝光波长λ及增大数值孔径ΝΑ,则聚焦深度S变窄。 According to (1), (¾ equation, in order to enhance the resolution R if the exposure wavelength λ is shortened and the numerical aperture is increased ΝΑ, S the depth of focus is narrowed.

[0006] 如果聚焦深度δ太窄,则难以使基片表面与投影光学系统的像面一致,存在曝光工作时的容限不足的危险。 [0006] If the depth of focus δ is too narrow, it is difficult to make the substrate surface coincide with the projection optical system of the image plane, the risk of insufficient margin during the exposure work. 此外,使对于短波长化的曝光光可使用的光学部件材料受到限定。 Further, the optical member so that the material of shorter wavelength exposure light can be used is limited. 根据这样的观点,作为实质上缩短通过投影光学系统后的曝光光的波长且扩展聚焦深度的方法,例如提出了在国际公开第99/49504号公报或特开平10-303114号公报中公开的液浸法。 According to this viewpoint, substantially shortening the exposure light through the projection optical system of a wavelength extended depth of focus and, for example, disclosed solution proposed in the International Publication No. 99/49504 Patent Publication No. 10-303114 or in JP leaching. 该液浸法是下述的方法:在投影光学系统的下面与基片表面之间充满水或有机溶媒等的液体以形成液浸区域,利用液体中的曝光光的波长为空气中的1/η(η是液体的折射率,通常约为1. 2〜1. 6)这一点来提高解像度,同时将聚焦深度扩大约η倍。 The liquid immersion method is the following method: filled with a liquid such as water or an organic solvent to form a liquid immersion area between the substrate surface below the projection optical system using exposure light having a wavelength of the liquid in air 1 / η (η is the refractive index of the liquid, typically about 1. 2~1. 6) to improve this resolution, while the depth of focus is magnified about [eta] times.

[0007] 但是,如图18中示出的示意图中所示,即使在采用液浸法的曝光装置中,有时也对基片P的边缘区域E曝光。 [0007] However, as shown in a schematic view shown, even in an exposure apparatus using the liquid immersion method, it is sometimes also the edge area E of the substrate P is exposed. 在该情况下,投影区域100的一部分伸出到基片P的外侧,曝光光也照射到保持基片P的基片台120上。 In this case, a portion of the projection area 100 protrudes to the outside of the substrate P, the exposure light is also irradiated to the stage holding the substrate P on the substrate 120. 在液浸曝光的情况下,形成液体的液浸区域,使其覆盖投影区域100,但在对边缘区域E曝光时,液体的液浸区域的一部分伸出到基片P的外侧,在基片台120上形成。 In the case of the liquid immersion exposure, the liquid immersion area is formed so as to cover the projection area 100, but in the edge area E of the exposed part of the liquid of the liquid immersion area protrudes to the outside of the substrate P, the substrate table 120 is formed. 此外,在基片台120上的基片P的周围配置各种检测构件或检测用传感器的情况下,为了使用这些检测构件或检测传感器,也有在基片台120上形成液浸区域的情况。 Further, around the substrate P on the substrate stage 120 arranged various detection means or the detection at the sensor, in order to use these detecting means or the detection sensor, but also the case of forming the liquid immersion area on the substrate stage 120. 如果在基片台120上形成液浸区域的一部分,则液体残留在基片台120上的可能性提高了,因其气化的缘故,例如放置基片P的环境(温度、湿度)发生变动或基片台120发生热变形或检测基片P的位置信息等的各种检测光的光路的环境发生变动等,存在曝光精度下降的可能性。 If the possibility of a portion of the liquid immersion area is formed on the substrate stage 120, the liquid remaining on the substrate stage 120 is increased, because of its vaporized, the substrate P is placed, for example, environmental (temperature, humidity) fluctuates , a possibility that the exposure accuracy is deteriorated or change of position information or the thermal deformation of the substrate P detected occurrence of such various ambient light path of the detection light occurs substrate stage 120 and the like. 此外,在残留的气体气化后,留下水迹,也存在成为基片P或液体等的污染的主要因素或成为各种检测的误差的主要因素的可能性。 Further, in the residual gas after the vaporized, leaving traces of water, there is also a major factor in pollution of the substrate P or the like, or a liquid becomes a major factor of the likelihood of various error detection.

发明内容 SUMMARY

[0008] 本发明是鉴于这样的情况而进行的,其第1目的在于提供可防止液体残留并可维持良好的曝光精度、检测精度的曝光装置、曝光方法和器件制造方法。 [0008] The present invention was made in view of such circumstances, and its object is to provide a first residue fluid may be prevented to maintain good exposure accuracy, the detection accuracy of the exposure apparatus, exposure method and device manufacturing method.

[0009] 此外,本发明的第2目的在于提供具有具备紫外激光照射耐久性的疏水性膜的光学部件和安装了该光学部件的投影曝光装置。 [0009] Further, a second object of the present invention is to provide an optical member having a water repellent film comprising an ultraviolet laser irradiation and durability of the optical member of the projection exposure apparatus is installed.

[0010] 为了解决上述的课题,本发明采用了与实施形态中示出的图1〜图21对应的以下的结构。 [0010] In order to solve the above problems, the present invention is used with the embodiment shown in FIG corresponding to the following structures 1 ~ 21 in FIG. 但是,对各要素所附的带有括号的符号不过是该要素的例示,不限定各要素。 However, the parenthesized symbol appended to each element of the element are merely examples and not limit the respective elements.

[0011] 按照本发明的第1形态,提供下述的曝光装置(EX):经液体(1)对基片(P)照射曝光光(EL)以对基片(P)曝光,具备:将图案的像投影在基片(P)上的投影光学系统(PL);以及用于保持基片(P)的基片台(PT),在基片台(PT)上以可更换的方式设置有其表面(30A) 的至少一部分呈疏液性的构件(30)。 [0011] According to a first aspect of the present invention provides the following exposure apparatus (EX): through the liquid (1) on the substrate (P) irradiated with the exposure light (EL) to expose the base sheet (P), comprising: a a projection image of a pattern on a substrate (P) of the projection optical system (PL); and the substrate table (PT) for holding the substrate (P) to be replaceably arranged on a substrate table (PT) there are at least a surface portion (30A) form a liquid-repellent member (30).

[0012] 此外,在本发明中,提供其特征在于使用上述形态的曝光装置的器件制造方法。 [0012] In the present invention, there is provided a device manufacturing method wherein the exposure apparatus using the above aspect.

[0013] 按照本发明,由于以可更换的方式设置在基片台上设置的疏液性的构件,故在该构件的疏液性恶化时,可与新的疏液性的构件更换。 [0013] According to the present invention, since the provided replaceable liquid-repellent member is provided on the substrate stage, so in the deterioration of the liquid-repellent member, can be replaced with a new liquid-repellent member. 因而,可抑制液体残留,例如即使发生残留,也能顺利地回收该液体。 Accordingly, the residual liquid can be suppressed, even if the occurrence of residues, can be smoothly recovered liquid. 因而,可防止因残留的液体引起的曝光精度、检测精度的恶化,可制造能发挥所希望的性能的器件。 Accordingly, the exposure accuracy can be prevented due to residual liquid due to deterioration of the detection accuracy can be produced to play the desired device performance.

[0014] 按照本发明的第2形态,提供下述的曝光方法:在经投影光学系统(PL)和液体(1)在基片(P)上照射曝光光(EL)以对上述基片(P)进行液浸曝光,用基片保持构件(30) 保持基片(P),基片保持构件(30)在基片(P)的周围具有其表面与该基片(P)表面大致为同一面的平坦部(30A),将保持基片(P)的基片保持构件(30)运入到基片台(PST、PT)上, 对运入到基片台(PST、PT)上的基片(P)进行液浸曝光,在液浸曝光的结束后,从基片台(PST、PT)运出保持基片(P)的基片保持构件(30)。 [0014] According to a second aspect of the present invention, there is provided an exposure method described below: (1) irradiating exposure light (EL) via a projection optical system (PL) and the liquid on the substrate (P) on to the base sheet ( P) for the liquid immersion exposure, holding member with the substrate (30) holding the substrate (P), the substrate holding member (30) having a surface of the substrate (P) in the periphery of the substrate (P) is a surface substantially flush flat portion (30A), the holding substrate on the substrate (P) of the holding member (30) is carried into the substrate stage (PST, PT), the op into the substrate stage (PST, PT) substrate (P) for the liquid immersion exposure, after liquid immersion exposure of the substrate stage (PST, PT) out of the substrate holding the substrate (P) of the holding member (30).

[0015] 此外,在本发明中,提供其特征在于使用上述曝光方法的器件制造方法。 [0015] In the present invention, there is provided a device manufacturing method characterized by using the above exposure method.

[0016] 按照本发明,通过对基片台与基片一起运入和运出在基片的周围具有平坦部的基片保持构件,可对基片台与基片一起容易地更换基片保持构件,例如在基片保持构件的疏液性恶化时,可容易地更换。 [0016] According to the present invention, by carrying in and out the substrate having a flat portion around the substrate together on the substrate table and the substrate holding member can be easily exchanged substrate holding together of the substrate table and the substrate member, for example, when the deterioration of the liquid repellence of the substrate holding member can be easily replaced. 此外,由于基片保持构件在基片的周围具有平坦部,故在与基片一起将该基片保持构件运入到基片台上对基片的边缘区域进行液浸曝光时,即使液体的液浸区域的一部分在基片的外侧伸出,也可利用平坦部维持液浸区域的形状,可在投影光学系统之下良好地保持液体的状态下进行液浸曝光而不导致液体的流出等。 Further, since the substrate holding member has a flat portion around the substrate, with the substrate so that the substrate holding member when the substrate stage transported into the edge region of the substrate for liquid immersion exposure, even if the liquid together part of the liquid immersion area extends outside the substrate, may be utilized to maintain the shape of the flat portion of the liquid immersion area can be satisfactorily maintained in the state of liquid immersion exposure is performed under the projection optical system without causing outflow of liquid and the like . 因而,可防止曝光精度的恶化,可制造能发挥所希望的性能的器件。 Thus, the deterioration of the exposure accuracy can be prevented, can be produced to play the desired device performance.

[0017] 按照本发明的第3形态,提供下述的曝光装置(EX),经液体(1)对基片(P)照射曝光光(EL)以对基片(P)曝光,具备:将图案的像投影在基片(P)上的投影光学系统(PL); 以及对于投影光学系统(PL)可移动的移动台(PST),在移动台(PST)上设置有至少一部分呈疏液性的疏液性构件(30、PH、300、400、500),该疏液性构件可更换。 [0017] According to a third aspect the present invention provides the following exposure apparatus (EX), through the liquid (1) on the substrate (P) irradiated with the exposure light (EL) to expose the base sheet (P), comprising: a pattern image projected on the substrate of the projection optical system (PL) on the (P); and the projection optical system (PL) movable mobile stations (PST), at the mobile station (PST) provided with at least a portion of the shape lyophobic of lyophobic member (30, PH, 300,400,500), the liquid-repellent member is exchangeable.

[0018] 在本发明的第3形态的曝光装置中,由于以可更换的方式设置在移动台上设置的疏液性的构件,故在该构件的疏液性恶化时,可与新的构件更换。 [0018] In the exposure apparatus of the third aspect of the present invention, since the provided replaceable liquid-repellent member is provided at a mobile station, so in the deterioration of the liquid repellence of the member, with the new members may be replace. 移动台可以是具备保持基片而移动的基片台或各种基准构件或检测传感器等的检测构件的检测系统。 The mobile station may be provided with the substrate holder moves the substrate stage or the various reference members or the like of the detection sensor detection system member. 或者,作为移动台可具备基片台和检测台这两者。 Alternatively, a mobile station may be provided with the substrate stage and the detection stage both. 进而,作为移动台,可具备多个基片台或多个检测台。 Further, as a mobile station, it may be provided with a plurality of substrate stage or a plurality of detection units.

[0019] 按照本发明的第4形态,提供下述步骤的曝光方法,经液体(1)对基片(P)照射曝光光(EL)以对上述基片(P)进行液浸曝光包含以下工序:对基片(P)上的至少一部分供给上述液体(1);经液体对基片(P)照射曝光光(EL)以对基片进行液浸曝光;与被供给液体的基片不同的曝光装置的部分(30、300、400、500)具有疏液性;以及根据该疏液性的恶化来更换具有该疏液性的曝光装置的部分(30、300、400、500)。 [0019] According to a fourth aspect of the present invention, there is provided an exposure method comprising the steps of, through the liquid (1) on the substrate (P) irradiated with the exposure light (EL) to the above-described substrate (P) for the liquid immersion exposure comprising steps of: supplying at least a portion on the substrate (P) the liquid (1); through the liquid on the substrate (P) irradiated with the exposure light (EL) to subjecting the substrate to immersion exposure; different substrates are supplied to the liquid portion of the exposure apparatus (30,300,400,500) having lyophobic property; and exposure apparatus having a replacing portion which is liquid-repellent (30,300,400,500) in accordance with the deterioration of the liquid-repellent.

[0020] 在本发明的第4形态的曝光方法中,由于即使具有疏液性的曝光装置的部分因紫外光的照射而性能恶化,也可根据其恶化来更换该部分,故可防止因恶化导致的液体的残留或漏泄等。 [0020] In the exposure method of the fourth aspect of the present invention, even when having a liquid-repellent part of the exposure apparatus performance deterioration due to ultraviolet light irradiation, can be replaced according to the portion of its deterioration, it is possible to prevent worsening of residual liquid leakage or the like caused. 可定期地或根据对各个部分推断或观察恶化状况的结果进行上述部分的更换。 Or it may be periodically replaced based on the partial results of the respective portions of deterioration observed or inferred.

[0021] 按照本发明的第5形态,提供一种在投影曝光装置(EX)的基片台上安装的光学部件(650、652、654),上述投影曝光装置(EX)用曝光束(EL)照明掩模(M),利用投影光学系统将掩模(M)的图案经液体(1)转印到由基片台上保持的基片(P)上,所述光学部件具备: 被上述曝光束照射的光照射面(660);利用由在光照射面(660)的表面上形成的二氧化硅、 氟化镁和氟化钙中的至少一种构成的微粒子层构成的粘接微粒子层(662);以及利用在粘接微粒子层的表面上形成的非晶质氟树脂构成的疏水性膜(664)。 [0021] According to a fifth aspect of the present invention, there is provided an optical member (650,652,654) A substrate stage projection exposure apparatus (EX) is installed, the projection exposure apparatus (EX) with an exposure light beam (EL ) illuminating a mask (M), a projection optical system using a mask (M) of a pattern through the liquid (1) onto the substrate (P) held by the substrate stage, the optical member comprising: by the above light irradiation surface irradiated with the exposure beam (660); the use of an adhesive layer made of silica fine particles is formed on the surface of the light illumination surface (660) of magnesium fluoride and calcium fluoride of at least one configuration composed of layer (662); and a hydrophobic membrane (664) using the amorphous fluororesin is formed on the surface of the adhesive layer is composed of fine particles.

[0022] 本发明者在分析氟烷基硅烷与基体材料玻璃的密接性时,得知由于氟烷基硅烷末端基-CF3在化学上稳定,故在与基体材料玻璃之间不能预期氢结合或缩合反应等的化学的结合。 [0022] In the analysis of the present inventors fluoroalkyl silane adhesion with the base material such as glass, that since the terminal group -CF3 of fluoroalkylsilane is chemically stable, it can not be expected in combination with hydrogen, or between the base material glass binding a chemical condensation reaction or the like. 因此,本发明者研究了不依靠化学的结合而是使分子间引力增大的方法。 Accordingly, the present inventors have studied a method does not rely on chemical binding, but rather increase the intermolecular attraction. 其结果,在下述方面取得成功:通过增加与基体材料玻璃粘接的粘接层的表面积,以首尾良好的方式使附着能量增大。 As a result, success in the following areas: the base material by increasing the surface area of ​​glass bonding adhesive layer, a good end-adhering manner energy increases. 按照本发明的光学部件,由形成粘接微粒子层的二氧化硅(SiO2)、氟化镁(MgF2)和氟化钙(CaF2)中的至少一种构成的微粒子层可得到与基体材料的玻璃(主要成分SiO2)的亲和性良好、与基体材料玻璃恰好的密接性。 The optical member according to the present invention, silicon dioxide (SiO2) particles forming an adhesive layer, fine particles of magnesium fluoride layers (MgF2) and calcium fluoride (in CaF2) at least one configuration of the obtained glass base material (main component of SiO2) good affinity with the base material of the glass just adhesiveness. 此外,在表面上产生来源于粒子的直径的凹凸。 Further, the diameter of the particle generation from irregularities on the surface. 再者,由于二氧化硅等是紫外线透射率非常高的材料,故其本身的激光照射耐久性也高。 Further, since silica is very high ultraviolet transmittance material itself, so the laser irradiation high durability. 因而,如果在形成了由二氧化硅(Si02)、氟化镁(MgF2)和氟化钙(CaF2)中的至少一种构成的微粒子层后形成由非晶质氟树脂构成的疏水性膜,则以非晶质氟树脂进入二氧化硅等的微粒子的空隙中而将其包围的方式干燥、固化。 Accordingly, if the formation of a hydrophobic film composed of the amorphous fluororesin made of silica (Si02), magnesium fluoride (MgF2) and calcium fluoride (in CaF2) at least one layer composed of fine particles, places the amorphous fluororesin enters voids silica fine particles and the like in the surrounding of drying and solidification. 由于非晶质氟树脂本身的机械的强度高,故与基体材料密接的疏水性膜的强度高。 Due to the high mechanical strength of the amorphous fluororesin itself, so the high strength of the hydrophobic membrane is in close contact with the base material.

[0023] 此外,按照本发明的第6形态,提供一种在投影曝光装置的基片台(PST)上安装的光学部件(650、652、654),上述投影曝光装置用曝光束(EL)照明掩模(M),利用投影光学系统(PL)将上述掩模的图案经液体(1)转印到由基片台(PST)上保持的基片上,所述光学部件具备:被上述曝光束照射的光照射面(660);在上述光照射面的表面上形成的粘接面(668);以及由在上述粘接面的表面上形成的非晶质氟树脂构成的疏水性膜(664)。 [0023] Further, according to a sixth aspect of the present invention, there is provided an optical member (650,652,654) one on a substrate stage (PST) mounted projection exposure apparatus, the projection exposure apparatus with an exposure light beam (EL) illuminating the mask (M), by the projection optical system (PL) to the mask pattern through the liquid (1) onto the substrate held by the substrate stage (PST) on the optical member comprises: the exposure is irradiation surface irradiated with the light beam (660); bonding surface (668) formed in the upper surface of the light illumination surface; and a hydrophobic film composed of the amorphous fluororesin is formed on the surface of the adhesive surface ( 664). 在该形态的光学部件中,上述粘接面最好是利用氟化氢刻蚀的面。 In this aspect of the optical member, the adhesive surface is preferably a surface etching with hydrogen fluoride.

[0024] 按照第6形态的光学部件,由于在光照射面上具有由利用氟化氢刻蚀的刻蚀面构成的粘接面,故如果在粘接面上形成由非晶质氟树脂构成的疏水性膜,则以非晶质氟树脂进入粘接面的空隙中而将其包围的方式干燥、固化。 [0024] The optical member according to the sixth aspect, since an adhesive surface composed of etching the surface with hydrogen fluoride in the etching of the light irradiated surface, if it is made of a hydrophobic form an amorphous fluororesin bonding surface film, places the amorphous fluororesin enters voids in the bonding surface, which surrounds the drying and solidification. 由于非晶质氟树脂本身的机械的强度高,故与基体材料密接的疏水性膜的强度高。 Due to the high mechanical strength of the amorphous fluororesin itself, so the high strength of the hydrophobic membrane is in close contact with the base material.

[0025] 此外,上述形态的光学部件的上述光照射面可具有基体材料玻璃。 [0025] Further, the light irradiated surface of the optical member may have the shape of a glass base material. 此外,上述形态的光学部件的上述光照射面可具有在基体材料玻璃的至少一部分上形成的金属膜。 Further, the light irradiated surface of the optical member may have the form of a metal film formed on at least a portion of the base material glass. 按照这些光学部件,因为在光照射面上形成的疏水性膜具有激光照射耐久性,故可在长时间内维持在投影曝光装置的基片台上安装的光学部件的光照射面的疏水性。 According to these optical members, since a laser irradiation durability of the hydrophobic film-forming surface of the light irradiation, we can maintain the hydrophobicity of the light irradiation surface of the optical member in the substrate stage of the projection exposure apparatus is installed for a long time.

[0026] 此外,在本发明中,也提供具备上述任一形态的光学部件的投影曝光装置。 [0026] In the present invention, an optical member is also provided comprising any of the above aspect of the projection exposure apparatus. 按照该投影曝光装置,由于在基片台上安装了能在长时间内维持光照射面的疏水性的光学部件, 故即使在重复进行液浸曝光的情况下,也能可靠地进行光学部件的光照射面上的排水。 According to the projection exposure apparatus, since the hydrophobicity of the substrate stage to maintain the optical member of the light irradiated surface for a long time the installation, so that even when the liquid immersion exposure is repeatedly performed, it is possible to reliably perform the optical member light irradiated surface drainage.

[0027] 此外,按照本发明的第7形态,提供一种投影曝光装置(EX),用曝光束(EL)照明掩模(M),利用投影光学系统(PL)将上述掩模的图案经液体转印到由基片台(PST)保持的基片上,上述基片台上:被上述曝光束照射的光照射面(660);在上述光照射面的表面上形成的粘接微粒子层(662);以及由在上述粘接微粒子层的表面上形成的非晶质氟树脂构成的疏水性膜(664)。 [0027] Further, according to a seventh aspect of the present invention, there is provided a projection exposure apparatus (EX), with an exposure light beam (EL) illumination mask (M), by the projection optical system (PL) of the pattern of the mask by a liquid onto the substrate held by the substrate stage (PST), the above-described substrate stage: the light irradiation surface irradiated with the exposure beam (660); adhesive particulate layer formed on the surface of the light illumination surface ( 662); and a hydrophobic film (664) composed of an amorphous fluororesin is formed on the surface of the adhesive particulate layer.

[0028] 按照第7形态的投影曝光装置,由于在基片台上安装的光学部件在光照射面上具有粘接微粒子层,故由非晶质氟树脂构成的疏水性膜与粘接微粒子层密接。 [0028] The projection exposure apparatus according to the seventh aspect, since the optical component mounting substrate stage having an adhesive layer on the light irradiation surface of the particles, so the hydrophobic film and the adhesive particulate layer composed of an amorphous fluororesin in close contact. 由于非晶质氟树脂本身的机械的强度高,故与基体材料密接的疏水性膜的强度高。 Due to the high mechanical strength of the amorphous fluororesin itself, so the high strength of the hydrophobic membrane is in close contact with the base material.

[0029] 此外,第7形态的投影曝光装置的上述光照射面可具有基体材料玻璃。 [0029] Further, the light irradiated surface projection exposure apparatus according to a seventh aspect of the matrix material may have a glass. 此外,第7 形态的投影曝光装置的上述光照射面可具有在基体材料玻璃的至少一部分上形成的金属膜。 Further, the light irradiated surface seventh aspect of the projection exposure apparatus may have a metal film formed on at least a portion of the base material glass. 按照这些投影曝光装置,因为在基片台上安装的光学部件的光照射面上形成的疏水性膜具有激光照射耐久性,故可在长时间内维持在投影曝光装置的基片台上安装的光学部件的光照射面的疏水性。 According to these projection exposure apparatus, a hydrophobic membrane because the light irradiated surface of an optical component mounted on the substrate stage formed by irradiating a laser durability, it can be maintained in the substrate mounted on the mounting projection exposure apparatus for a long time in hydrophobic light irradiated surface of the optical member.

[0030] 按照本发明的第8形态,提供一种光学部件(300、400、500、650、652、654),具备: 具有光照射面的部件主体(660);利用从由在上述光照射面的表面上形成的二氧化硅、氟化镁和氟化钙构成的一组中选择的至少一种微粒子形成的微粒子层(662);以及利用非晶质氟树脂形成的疏水性膜(664)。 [0030] According to an eighth aspect of the present invention, there is provided an optical component (300,400,500,650,652,654) comprising: a body member having a light irradiated surface (660); irradiated with light from above by the silicon dioxide formed on the surface side, a group of fine particles of magnesium fluoride and calcium fluoride layer consisting of at least one selected form the microparticles (662); and a hydrophobic film is formed by an amorphous fluororesin (664 ). 由于疏水性膜经微粒子层与光照射面牢固地连接,故本发明在液体或蒸汽气氛中使用的光学传感器或透镜等的用途中是极为有用的。 Since the hydrophobic membrane is firmly connected via a fine particle layer and the light irradiation surface, and so it uses an optical sensor or lens of the invention for use in the liquid or vapor atmosphere it is extremely useful.

[0031] 按照本发明的第8形态,是提供一种光学部件(300、400、500、650、652、654),具备:具有光照射面的部件主体(660);在上述光照射面的表面上利用刻蚀形成的粘接面(668);以及利用非晶质氟树脂在上述粘接面的表面上形成的疏水性膜(664)。 [0031] According to an eighth aspect of the present invention is to provide an optical component (300,400,500,650,652,654) comprising: a body member having a light irradiated surface (660); on the light irradiation surface by an adhesive surface on the surface (668) formed by etching; and a hydrophobic membrane (664) using the amorphous fluororesin is formed on the surface of the adhesive surface. 由于疏水性膜经微粒子层与光照射面牢固地连接,故本发明在液体或蒸汽气氛中使用的光学传感器或透镜等的用途中是极为有用的。 Since the hydrophobic membrane is firmly connected via a fine particle layer and the light irradiation surface, and so it uses an optical sensor or lens of the invention for use in the liquid or vapor atmosphere it is extremely useful.

附图说明 BRIEF DESCRIPTION

[0032] 图1是示出本发明的曝光装置的一实施形态的概略结构图。 [0032] FIG. 1 is a schematic configuration diagram of an embodiment of the exposure device according to the present invention.

[0033] 图2是示出液体供给机构和液体回收机构的概略平面图。 [0033] FIG. 2 is a schematic plan view of the liquid supply mechanism and the liquid recovery mechanism.

[0034] 图3是基片台的平面图。 [0034] FIG. 3 is a plan view of the substrate stage.

[0035] 图4是示出保持了基片的状态的基片台的平面图。 Plan view of the substrate table [0035] FIG. 4 is a diagram showing a holding state of the substrate.

[0036] 图5是基片台的剖面图。 [0036] FIG. 5 is a sectional view of the substrate stage.

[0037] 图6是示出各构件对基片台可装卸的示意图。 [0037] FIG. 6 is a diagram illustrating the respective members of the substrate table may be removable. [0038] 图7(a)〜(d)是示出本发明的曝光装置的工作的一例的示意图。 [0038] FIG. 7 (a) ~ (d) are schematic views showing an example of the work of an exposure apparatus according to the present invention.

[0039] 图8(a)〜(d)是示出本发明的曝光装置的工作的一例的示意图。 [0039] FIG. 8 (a) ~ (d) are schematic views showing an example of the work of an exposure apparatus according to the present invention.

[0040] 图9是示出运送到运送装置上的基片保持构件的平面图。 [0040] FIG. 9 is a diagram illustrating the substrate transported to the transport means of the holding member plan.

[0041] 图10是示出基片台的另一实施形态的剖面图。 [0041] FIG. 10 is a sectional view showing another embodiment of the substrate stage.

[0042] 图11(a)和(b)是示出本发明的曝光装置的另一实施形态的概略结构图。 [0042] FIG. 11 (a) and (b) is a schematic view illustrating another embodiment of an exposure apparatus according to the present invention.

[0043] 图12(a)和(b)是示出基片保持构件的另一实施形态的图。 [0043] FIG. 12 (a) and (b) are diagrams illustrating the substrate holding another embodiment of FIG member.

[0044] 图13(a)〜(d)是示出本发明的曝光装置的工作的另一例的示意图。 [0044] FIG. 13 (a) ~ (d) is a schematic diagram showing the operation of another embodiment of an exposure apparatus according to the present invention.

[0045] 图14是示出本发明的曝光装置的另一实施形态的概略结构图。 [0045] FIG. 14 is a schematic structural view of another embodiment of the exposure device according to the present invention.

[0046] 图15是示出本发明的曝光装置的另一实施形态的概略结构图。 [0046] FIG. 15 is a schematic structural view of another embodiment of the exposure device according to the present invention.

[0047] 图16是示出本发明的曝光装置的另一实施形态的概略结构图。 [0047] FIG. 16 is a schematic structural view of another embodiment of the exposure device according to the present invention.

[0048] 图17是示出半导体器件的制造工序的一例的流程图。 [0048] FIG 17 is a flowchart showing an example of a manufacturing process of a semiconductor device.

[0049] 图18是用于说明以前的课题的示意图。 [0049] FIG. 18 is a schematic diagram for explaining a problem previously.

[0050] 图19是示出在与实施形态有关的晶片台上安装的光学部件的图。 [0050] FIG. 19 is a diagram illustrating an optical member on the wafer stage with the embodiment related to installation of FIG.

[0051] 图20是在与实施形态有关的晶片台上安装的光学部件的结构图。 [0051] FIG. 20 is a configuration diagram of an optical member on the wafer stage with the embodiment related to installation.

[0052] 图21是在与实施形态有关的晶片台上安装的光学部件的结构图。 [0052] The configuration diagram of the optical components on the wafer stage 21 is associated with the embodiment of the installation.

具体实施方式 Detailed ways

[0053] 以下,一边参照附图,一边说明本发明的曝光装置,但本发明不限定于此。 [0053] Hereinafter, with reference to the drawings, an exposure apparatus of the present invention is described, but the present invention is not limited thereto.

[0054] <第1实施形态> [0054] <First Embodiment>

[0055] 图1是示出本发明的曝光装置的一实施形态的概略结构图。 [0055] FIG. 1 is a schematic configuration diagram of an embodiment of the exposure device according to the present invention. 在图1中,曝光装置EX具备:支撑掩模M的掩模台MST ;经基片架PT支撑基片P的基片台PST ;用曝光光EL照明由掩模台MST支撑的掩模M的照明光学系统IL ;将用曝光光EL照明的掩模M的图案像投影到由基片台PST支撑的基片P上以进行曝光的投影光学系统PL ;以及总括地控制曝光装置EX整体的工作的控制装置C0NT。 In FIG 1, the exposure apparatus EX includes: a mask stage MST supports the mask M; a substrate holder by the substrate stage PST PT supporting substrate P; illuminated with an exposure light EL the mask stage MST is supported by the mask M of IL illumination optical system; the mask M illuminated with the exposure light beam EL pattern image projected by the projection optical system PL on the substrate stage PST supporting the substrate P to perform the exposure; and overall control of the entire exposure apparatus EX control means C0NT work.

[0056] 为了在实质上缩短曝光波长以提高解像度的同时实质上扩展聚焦深度,将液浸法应用于本实施形态的曝光装置EX。 [0056] In order to substantially extend substantially shortening the exposure wavelength to improve resolution while the depth of focus, the exposure apparatus EX of the present embodiment is applied to form the liquid immersion method. 该液浸曝光装置具备向基片P供给液体1的液体供给机构10和回收基片P上的液体1的液体回收机构20。 The liquid immersion exposure apparatus includes a liquid supply mechanism supplies the liquid 1 of the liquid recovery mechanism 10 and recovering the liquid 1 on the substrate P 20 to P substrate. 在本实施形态中,使用纯水作为液体1。 In the present embodiment, pure water is used as the liquid 1. 至少在将掩模M的图案像转印到基片P上的期间内,曝光装置EX利用从液体供给机构10供给的液体1在包含投影光学系统PL的投影区域ARl的基片P上的至少一部分(局部地)上形成液浸区域AR2。 At least on the substrate P, at least in the region of the projection pattern of the mask M during the image onto the substrate P, the exposure apparatus EX using liquid supplied from the liquid supply mechanism 101 comprising the projection optical system PL of ARl part (locally) on the liquid immersion area AR2 is formed. 具体地说,对于曝光装置EX来说,在投影光学系统PL的前端部的光学元件2与基片P的表面(曝光面)之间充满液体1,经该投影光学系统PL与基片P之间的液体1和投影光学系统PL将掩模M的图案像投影到基片P上,对基片P曝光。 Specifically, the exposure apparatus EX, the surface of the optical element between the distal end portion 2 of the projection optical system PL and the substrate P (exposure surface) filled with liquid 1, through the projection optical system PL and the substrate P the liquid 1 between the projection optical system PL and the pattern image of the mask M is projected onto the substrate P, the exposure of the substrate P.

[0057] 在此,在本实施形态中,作为曝光装置EX,以一边在扫描方向上的彼此不同的方向(反方向)上同步地移动掩模M和基片P、一边在基片P上对在掩模M上形成的图案曝光的扫描型曝光装置(所谓扫描步进器)的情况为例来说明。 [0057] Here, in the present embodiment, the exposure apparatus EX, in order on one side of the scanning direction different from each other in a direction (reverse direction) moving the mask M and the substrate P synchronously, while the substrate P the case of a scanning exposure apparatus (a so-called scanning stepper) pattern formed on the mask M is exposed will be explained as an example. 在以下的说明中,将与投影光学系统PL的光轴AX —致的方向定为Z轴方向,将在与Z轴方向垂直的平面内掩模M和基片P 的同步移动方向(扫描方向)定为X轴方向,将与Z轴方向和X轴方向垂直的方向(非扫描方向)定为Y轴方向。 In the following description, the optical axis AX of projection optical system PL - induced a given direction is the Z axis direction, the mask M and the substrate P is the synchronous movement direction (scanning direction in a plane perpendicular to the Z-axis direction ) defined as X-axis direction, perpendicular to the Z-axis direction and the X axis direction (non-scanning direction) set as a Y-axis direction. 此外,分别将以X轴、Y轴和Z轴为中心进行的旋转(倾斜)方向定为ΘΧ、ΘΥ、ΘΖ方向。 In addition, the X-axis will be respectively, Y and Z axes of rotation as a center (tilt) direction as ΘΧ, ΘΥ, ΘΖ direction. 再有,这里所谓的「基片」包含在半导体晶片上涂敷了作为感光性材料的光刻胶的基片,「掩模」包含在基片上形成了缩小投影的器件图案的中间掩模。 Further, herein called "the substrate" includes a semiconductor wafer coated with a photoresist as a photosensitive material of the substrate "mask" includes a reticle formed of the reduction projection device pattern on the substrate.

[0058] 照明光学系统IL是用曝光光EL照明由掩模台MST支撑的掩模M的光学系统,具有:曝光用光源;使从曝光用光源射出的光束的照度变得均勻的光积分器(均质器);对来自光积分器的曝光光EL进行聚光的聚光透镜;中继透镜系统;以及将由曝光光EL产生的掩模M上的照明区域设定为狭缝状的可变视野光圈等。 [0058] The illumination optical system IL with the exposure light EL is an illumination optical system by a mask stage MST supports the mask M, having: an exposure light source; cause to become uniform light exposure from the integrator illumination light beam emitted from a light source (homogenizer); condensing lens for exposure light beam EL from the optical integrator condenses; a relay lens system; and the illumination area on the mask M with the exposure light EL generated can be set to a slit-like variable field stop and the like. 利用照明光学系统IL并用均勻的照度分布的曝光光EL照明掩模M上的规定的照明区域。 Predetermined illumination area on the illumination optical system IL and the use of a uniform illuminance distribution of the exposure illumination light EL the mask M. 作为从照明光学系统IL射出的曝光光EL,例如可使用从水银灯射出的亮线(g线、h线、i线)和KrF准分子激光(波长248nm)等的远紫外光(DUV光)或ArF准分子激光(波长193nm)和F2激光(波长157nm) 等的真空紫外光(VUV光)等。 As exposure light EL emitted from the illumination optical system IL, for example, using a bright line (g-ray, h-ray, i-ray) emitted from a mercury lamp and KrF excimer laser (wavelength of 248 nm) or the like far ultraviolet (DUV light), or ArF excimer laser (193 nm wavelength) and F2 laser (wavelength 157 nm) like vacuum ultraviolet light (VUV light) and the like. 在本实施形态中使用ArF准分子激光。 ArF excimer laser light in the present embodiment. 如上所述,本实施形态中的液体1是纯水,即使曝光光EL是ArF准分子激光也能透过。 As described above, in the present embodiment form the liquid 1 is pure water, even when the exposure light beam EL is the ArF excimer laser light can pass through. 此外,纯水也能透过亮线(g线、h线、i线)和KrF准分子激光(波长248nm)等的远紫外光(DUV光)。 Further, water can pass through the emission line (g-ray, h-ray, i-ray) and a KrF excimer laser (wavelength of 248 nm) or the like far ultraviolet (DUV light).

[0059] 掩模台MST —边支撑掩模M、一边能在与投影光学系统PL的光轴AX垂直的平面内、即XY平面内作2维移动,此外,在ΘΖ方向上可进行微小旋转。 [0059] The mask stage MST - supports the mask M side, while in a plane can projection optical system PL and the optical axis AX of the vertical, that is, for 2-dimensional movement within the XY plane, in addition, a minor rotation direction ΘΖ . 利用直线电机等的掩模台驱动装置MSTD来驱动掩模台MST。 Linear motor or the like to the mask stage-driving unit MSTD drives the mask stage MST. 利用控制装置CONT来控制掩模台驱动装置MSTD。 By the control unit CONT controls the mask stage drive apparatus MSTD. 在掩模台MST上设置移动镜50。 Movable mirror 50 is provided on the mask stage MST. 此外,在与移动镜50对置的位置上设置激光干涉计51。 Further, laser interferometer 51 is provided at a position opposed to the movement mirror 50 on. 利用激光干涉计51实时地检测掩模台MST上的掩模M的2维方向的位置和旋转角,将检测结果输出给控制装置C0NT。 Using a laser interferometer 51 in real time detect the position and rotation angle of the two-dimensional direction of the mask M on the mask stage MST, it outputs the detection result to the control device C0NT. 控制装置CONT通过根据激光干涉计51的检测结果驱动掩模台驱动装置MSTD,进行由掩模台MST支撑的掩模M的定位。 By interference control unit CONT based on the detection result of the laser meter 51 drives the mask stage drive apparatus MSTD, positioned by the mask stage MST supports the mask M.

[0060] 投影光学系统PL将掩模M的图案以规定的投影倍率β投影到基片P上并进行曝光。 [0060] The projection optical system PL pattern of the mask M at a predetermined projection magnification β is projected onto the substrate P and the exposure. 投影光学系统PL由包含在基片P—侧的前端部上设置的光学元件(透镜)2的多个光学元件构成,用镜筒PK支撑这些光学元件。 The optical element of projection optical system PL comprises the distal end portion side of the substrate provided P- (lens) constituting the plurality of optical elements 2, these optical elements supporting barrel PK. 在本实施形态中,投影光学系统PL是投影倍率β例如为1/4或1/5的缩小系统。 In the present embodiment, the projection optical system PL is the projection magnification β is, for example, 1/4 or 1/5 reduction system. 再有,投影光学系统PL可以是等倍系统和放大系统的任一种。 Further, the projection optical system PL may be any one of the 1x magnification system and the magnifying system. 此外,投影光学系统PL可以是不包含折射元件的反射系统、不包含反射元件的折射系统、包含折射元件和反射元件的反射折射系统的任一种。 Further, the projection optical system PL may be a reflecting system that does not contain a refractive element, a reflective element does not include a refractive system, comprising any one of refractive and reflective elements catadioptric system element. 此外,本实施形态的投影光学系统PL的前端部的光学元件2对于镜筒PK以可装卸(更换)的方式来设置,液浸区域AR2 的液体1与光学元件2接触。 Further, the front end portion of the optical element of the projection optical system PL of the present embodiment 2 in respect to the barrel PK may be detachable (replaceable) arranged manner, the liquid immersion area AR2 of the liquid 1 into contact with the optical element 2.

[0061] 用萤石形成光学元件2。 2 [0061] The optical element formed of fluorite. 由于水与萤石的亲和性高,故可使液体1与光学元件2的液体接触面2a的大致整个面密接。 Due to the high affinity for water and fluorite, and therefore allows the liquid 1 and the optical element 2 of the liquid contact surface 2a of the substantially the entire surface of the close contact. 即,在本实施形态中,由于将与光学元件2的液体接触面2a的亲和性高的水作为液体1来供给,故光学元件2的液体接触面2a与液体1的密接性高,能用液体1可靠地充满光学元件2与基片P之间的光路。 That is, in the present embodiment, since the high affinity for water with the liquid contact surface 2a of the optical element 2 is supplied as a liquid, so the liquid contact surface of the optical element 2 and the liquid 1 2a adhesion is high, can 1 is reliably filled with a liquid optical path between the optical element 2 and the substrate P. 再有,光学元件2的材料也可以是与水的亲和性高的石英。 Further, the material of the optical element 2 may be a high affinity for water and quartz. 此外,也可对光学元件2的液体接触面2a进行亲水化(亲液化)处理,进一步提高与液体1的亲和性。 Furthermore, also the liquid contact surface of the optical element 2 is hydrophilic (lyophilic) treatment 2a, to further enhance the affinity for the liquid 1. 此外,由于镜筒PK的前端附近与液体(水)1 相接,故用Ti (钛)等的具有抗锈性能的金属至少形成前端附近。 Further, since the vicinity of the front end of the barrel PK liquid (water) phase 1, it is formed at least near the front end with a Ti (titanium) or the like of a metal having anti-rust properties.

[0062] 基片台PST支撑基片P,具备:经基片架PT保持基片P的Z台52 ;支撑Z台52的XY台53 ;以及支撑XY台53的基座54。 [0062] The substrate stage PST supports the substrate P, comprising: holding the substrate P via a substrate holder the PT Z stage 52; supporting the Z stage 52 and XY stage 53; XY table 53 and support base 54. 基片架PT保持基片P,设置在基片台PST (Z台52) 上。 The substrate table PT holds the substrate P, is provided on the substrate stage PST (Z stage 52). 利用直线电机等的基片台驱动装置PSTD来驱动基片台PST。 Linear motor or the like of the substrate stage-driving unit PSTD to drive the substrate stage PST. 利用控制装置CONT来控制基片台驱动装置PSTD。 To control the substrate stage drive apparatus PSTD by the control unit CONT. 通过驱动Z台52来控制由基片架PT保持的基片P的Z轴方向上的位置(聚焦位置)和θ X、θ Y方向上的位置。 52 controls the position (focus position) in the Z-axis direction of the substrate P held by the substrate table PT by driving the Z stage and θ X, θ Y position on the direction. 此外,通过驱动XY台53来控制基片P的XY方向上的位置(与投影光学系统PL的像面实质上平行的方向的位置)。 Moreover, (the position and direction of the image plane of the projection optical system PL substantially parallel) to control the position of the substrate P in the XY direction by driving the XY stage 53. S卩,Z台52控制基片P的聚焦位置和倾斜角,用自动聚焦方式和自动矫正方式使基片P的表面与投影光学系统PL的像面重合,XY台53进行基片P的X轴方向和Y轴方向的定位。 52 controls S Jie, Z stage substrate P focus position and tilt angle, the automatic focusing and automatic correction mode so that the image plane surface of the projection optical system PL and the substrate P coincide, XY stage 53 for substrate P X axis direction and the Y-axis direction. 再有,当然可与Z台一体地设置,XY台。 Further, of course, may be provided integrally with the Z stage, XY stage. 再有,作为自动聚焦、矫正检测系统的结构,可使用例如在特开平8-37149号公报中公开的结构。 Further, as an autofocus, Surgery and detection system can be used, for example, the structure disclosed in Japanese Patent Publication No. 8-37149 in.

[0063] 在基片台PST (基片架PT)上设置与基片台PST —起相对于投影光学系统PL移动的移动镜55。 [0063] provided on the substrate stage PST (substrate table PT) and the substrate stage PST - from projection optical system PL with respect to the movement mirror 55. 此外,在与移动镜55对置的位置上设置激光干涉计56。 Further, laser interferometer 56 is provided at a position opposed to the movement mirror 55 on. 利用激光干涉计56 实时地检测基片台PST (基片架PT)上的基片P的2维方向的位置和旋转角,将检测结果输出给控制装置C0NT。 Using a laser interferometer 56 in real time detect the position and rotation angle of the two-dimensional direction of the substrate P on the substrate stage PST (substrate table PT), it outputs the detection result to the control device C0NT. 控制装置CONT通过根据激光干涉计56的检测结果驱动基片台驱动装置PSTD,进行由基片台PST支撑的基片P的定位。 The control unit CONT drives the substrate stage-driving unit PSTD meter by the detection result of the laser interferometer 56 for positioning the substrate P supported by the substrate stage PST.

[0064] 在基片台PST(基片架PT)的附近上方配置了检测基片P上的对准标记或在基片台PST (基片架PT)上设置的基准标记(后述)的基片对准系统350。 [0064] In the vicinity of the top of the substrate stage PST (substrate table PT) is arranged to detect the alignment mark on the substrate P or the reference mark on the substrate stage PST (substrate table PT) provided on (described later) substrate alignment system 350. 此外,在掩模台MST 的附近,设置了使用与曝光光EL为同一的波长的光经掩模M和投影光学系统PL检测基片台PST(基片架PT)上的的基准标记的掩模对准系统360。 Further, in the vicinity of the mask stage MST, is provided with the exposure light EL used as a reference on the substrate stage PST (substrate table PT) of the PL wavelengths of the detection light is the same mask M and the projection optical system of the mask mark die alignment system 360. 再有,作为基片对准系统350 的结构,可使用在特开平4-65603号公报(对应的美国专利第5,493,403号)中公开的结构,作为掩模对准系统360的结构,可使用在特开平7-176468号公报(对应的美国专利第5,646,413号)中公开的结构。 Further, as the structure of the substrate alignment system 350 may be used in the Publication Laid-Open Publication No. 4-65603 (corresponding to U.S. Pat. No. 5,493,403) of the structure, the structure as a mask alignment system 360 can be used in disclosed in Japanese Patent Publication No. 7-176468 (corresponding to U.S. Pat. No. 5,646,413) of the structure.

[0065] 在基片架PT上设置了包围由该基片架PT保持的基片P的板构件30。 [0065] provided to surround the substrate P held by the substrate table PT of the plate member 30 on the substrate table PT. 板构件30 是与基片架PT分开的构件,设置成对于基片架PT可装卸、可更换。 PT and the plate member 30 is separated from the substrate frame member, provided to the substrate table PT can be detachable, replaceable. 板构件30具有与由基片架PT保持的基片P的表面大致为同一面的平坦面(平坦部)30A。 Plate member 30 having the surface of the substrate P held by the substrate table PT is substantially flush with the flat surface (flat portion) 30A. 在由基片架PT保持的基片P的周围配置了平坦面30A。 Around the substrate P held by the substrate table PT arranged flat surface 30A. 再者,在基片架PT上并在板构件30的外侧设置了具有与板构件30的平坦面30A大致为同一面的平坦面32A的第2板构件32。 Further, on the substrate table PT and the plate member 30 is provided outside of the second plate member 32 has a flat surface 30A of the plate member 30 is substantially flush with the flat surface 32A. 第2板构件32 也设置成对于基片架PT可装卸、可更换。 The second plate member 32 is also provided to the substrate table PT can be detachable, replaceable.

[0066] 向基片P供给规定的液体1的液体供给机构10具备:可供给液体1的第1液体供给部11和第2液体供给部12 ;经在第1液体供给部11中具有流路的供给管IlA连接的、 具有向基片P供给从该第1液体供给部11送出的液体1的供给13A的第1供给构件13 ; 以及经在第2液体供给部12中具有流路的供给管12A连接的、具有向基片P供给从该第2 液体供给部12送出的液体1的供给口14A的第2供给构件14。 Liquid supply means [0066] a predetermined liquid to the P supplied to the substrate 1 10 includes: a first supply liquid supply portion liquid 1 11 and the second liquid supply portion 12; via a flow path of the first liquid supply portion 11 supply pipe IlA connected with the first supply member 13 is supplied is supplied 13A from the liquid of the first liquid supply portion 11 fed 1 to the substrate P; and by supplying a flow passage in the second liquid supply section 12 tube 12A connected with the second supply member is supplied to the base sheet P fed from the second liquid supply portion 12 of the liquid supply ports 14A 1 to 14. 接近于基片P的表面配置了第1、第2供给构件13、14,设置在基片P的面方向上互不相同的位置上。 Close to the surface of the substrate P arranged in the first and second supply members 13, 14 are provided in the surface direction of the substrate P in mutually different positions. 具体地说,液体供给机构10的第1供给构件13相对于投影区域ARl扫描方向的一侧(-X侧),第2供给构件14相对于投影区域ARl设置在扫描方向的另一侧(+X侧)。 Specifically, the other side of the first liquid supply mechanism 10 supplying member 13 of one side (-X side) of the projection region ARl scanning direction, the second supply member 14 with respect to the projection region ARl disposed in the scanning direction (+ X side).

[0067] 第1、第2液体供给部11、12分别具备容纳液体1的容器和加压泵等(都未图示), 分别经供给管11A、12A和供给构件13、14向基片P供给液体1。 [0067] The first and second liquid supply portions 11, 12 includes a pressure pump and the liquid receiving container 1 and the like (all not shown), respectively, via the supply tubes 11A, 12A and the supply members 13,14 P to the substrate supplying a liquid. 此外,利用控制装置CONT 来控制第1、第2液体供给部11、12的液体供给工作,控制装置CONT可独立地控制由第1、 第2液体供给部11、12对于基片P上的每单位时间的液体供给量。 Further, by the control unit CONT controls the first liquid supply operation of the second liquid supply portions 11, 12, the control unit CONT may be independently controlled by the first and second liquid supply portions 11, 12 for each of the substrate P the liquid supply amount per unit time. 此外,第1、第2液体供给部11、12分别具有液体的温度调整机构,利用该温度调整机构,可向基片P供给与容纳装置的箱体内的温度大致相同的温度(例如23°C)的液体1。 Further, the first and second liquid supply portions 11, 12 having a liquid temperature adjusting mechanism, with which temperature adjusting means, the temperature of cabinets can be supplied to the substrate P and the receiving means is substantially the same temperature (e.g. 23 ° C ) 1 liquid. 再有,曝光装置EX不一定需要具备第1、第2液体供给部11、12的容器、加压泵、温度调整机构,也可代替使用设置曝光装置EX的工厂等的设备。 Further, the exposure apparatus EX need not necessarily have a first container, the second liquid supply portions 11, 12, a pressurizing pump, a temperature adjusting mechanism, the device may be provided instead of using the exposure apparatus EX of the factory or the like.

[0068] 液体回收机构20回收基片P上的液体1,具备:具有接近于基片P的表面配置的回收口23A、24A的第1、第2回收构件23、24 ;以及分别经在该第1、第2回收构件23、24中具有流路的回收管21A、22A连接的第1、第2液体回收部21、22。 [0068] 1 on the liquid recovery mechanism 20 is recovering the liquid P substrate, comprising: a surface having a recovery port arranged close to the substrate P 23A, 24A of the first and second recovery members 23, 24; and respectively through the a first recovery tube 21A, the second recovery members 23, 24 having a flow passage, the first and second liquid recovery portion 21, 22A of the connector. 第1、第2液体回收部21、 22具备例如真空泵等的真空系统(吸引装置)、气液分离器和容纳回收的液体1的容器等(都未图示),经第1、第2回收构件23、24和回收管21A、22A回收基片P上的液体1。 The first and second liquid recovery unit 21, for example, a vacuum pump 22 includes a vacuum system (suction device), a gas-liquid separator and the recovered liquid receiving container 1 and the like (all not shown), through the first 1, second recovery members 23, 24 and the recovery tube 21A, 22A recover the liquid 1 on the substrate P. 利用控制装置CONT来控制第1、第2液体回收部21、22的液体回收工作。 Controlling the first and the second liquid recovery portion 21, the liquid recovery operation by the control unit CONT. 控制装置CONT可独立地控制由第1、第2液体回收部21、22的每单位时间的液体回收量。 The control unit CONT may be independently controlled by the first liquid recovery amount per unit time of the second liquid recovery portion 21, 22. 再有,曝光装置EX不一定需要具备第1、第2液体回收部21、22的真空系统、气液分离器、容器,也可代替使用设置曝光装置EX的工厂等的设备。 Further, the exposure apparatus EX does not necessarily need a vacuum system comprising first and second liquid recovery unit 21, the gas-liquid separator vessel, the device may be provided instead of using the exposure apparatus EX of the factory or the like.

[0069] 图2是示出液体供给机构10和液体回收机构20的概略结构的平面图。 [0069] FIG. 2 is a plan view showing the schematic configuration of the liquid supply mechanism 10 and the liquid recovery mechanism 20. 如图2中所示,将投影光学系统PL的投影区域ARl设定为以Y轴方向(非扫描方向)定为长度方向的狭缝状(矩形),在基片P的一部分上形成充满液体1的液浸区域AR2,使其包含投影区域AR1。 As shown, the projection region ARl projection optical system PL is set as the Y axis direction (non-scanning direction) as the longitudinal direction of the slit-like 2 (rectangle), filled with liquid is formed on a portion of the substrate P 1 of the liquid immersion area AR2, so that the projection area AR1. 而且,用于形成投影区域ARl的液浸区域AR2的液体供给机构10的第1供给构件13 相对于投影区域ARl设置在扫描方向的一侧(-X侧),第2供给构件14设置在另一侧(+X 侧)。 Further, the first supply member ARl liquid immersion area AR2 of the projection area of ​​the liquid supply mechanism 10 for forming the side 13 with respect to the (-X side) in the scanning direction, the second feed member 14 is disposed another projection region disposed ARl side (+ X side).

[0070] 将第1、第2供给构件13、14分别形成为平面视图上呈大致圆弧状,将其供给口13A、14A的Y轴方向上的尺寸设定为至少比投影区域ARl的Y轴方向上的尺寸大。 [0070] The first and second supply members 13, 14 are respectively formed in a substantially arc shape in plane view, the size setting the Y-axis direction of the supply port 13A, 14A is at least than the projected area of ​​the Y ARl large size in the axial direction. 而且,将形成为平面视图上呈大致圆弧状供给口13A、14A配置成在扫描方向(X轴方向)上夹住投影区域AR1。 Further, forming a substantially arc shape on the supply port 13A is a plan view, 14A configured to sandwich the projection area AR1 in the scanning direction (X axis direction). 液体供给机构10经第1、第2供给构件13、14的供给口13A、14A在投影区域ARl的两侧同时供给液体1。 Liquid supply mechanism 10 through the first, second supply means of the supply port 13A 13,14, 14A while supplying the liquid 1 on both sides of the projection region ARl.

[0071] 液体回收机构20的第1、第2回收构件23、24分别具有连续地形成为圆弧状使之朝向基片P的表面的回收口23A、24A。 [0071] The first and second recovery members 23, 24 of the liquid recovery mechanism 20 are formed as a continuous arcuate surface toward the substrate P so that the recovery port 23A, 24A. 而且,利用配置成彼此相对的第1、第2回收构件23、 24形成了大致圆环状的回收口。 Further, with the configuration as the first and second recovery members 23 opposed to each other, 24 is formed substantially annular recovery port. 将第1、第2回收构件23、24各自的回收口23A、24A配置成包围液体供给机构10的第1、第2供给构件13、14和投影区域ARl。 The first and second recovery members 23, 24 of each of the recovery port 23A, 24A arranged to first and second supply members 13, 14 and the projection area ARl surrounds the liquid supply mechanism 10.

[0072] 以下述的方式供给从第1、第2供给构件13、14的供给口13A、14A向基片P供给的液体1,使其在投影光学系统PL的前端部(光学元件2)的下端面与基片P之间润湿扩展。 [0072] In the following manner is supplied from the first and second supply ports 13, 14 of the feed member. 13A, 14A supplying the liquid to the substrate P 1, so that the projection optical system PL and the front end portion (optical element 2) wetting spread between the lower end surface of the substrate P. 此外,由相对于投影区域ARl配置在该第1、第2供给构件13、14外侧的第1、第2回收构件23,24的回收口23A、24A回收相对于投影区域ARl流到第1、第2供给构件13、14的外侧的液体1。 Further, the projection region ARl disposed in the first, the first and second recovery members 13, 14 are supplied to the outer side of the second member 23 of the recovery port 23A, 24A with respect to the projection region ARl recovery flows to the first phase, the outer member 13, the second liquid supply 1.

[0073] 在本实施形态中,在对基片P进行扫描曝光时,将在扫描方向上从投影区域ARl的跟前供给的每单位时间的液体供给量设定为比在其相反一侧供给的液体供给量多。 [0073] In the present embodiment, when the substrate P scanning exposure, the liquid supply amount per unit time in the scanning direction in front of the projection region ARl supplied from one side thereof is set to be opposite to the supply ratio of liquid supply amount. 例如, 在一边在+X方向上移动基片P、一边进行曝光处理的情况下,控制装置CONT使对于投影区域ARl来自-X—侧(即供给口13A)的液体量比来自+X—侧(即供给口14A)的液体量多,另一方面,在一边在-χ方向上移动基片P、一边进行曝光处理的情况下,使对于投影区域ARl来自+X—侧的液体量比来自-X—侧的液体量多。 For example, in a case where while moving the substrate P, while exposure processing is performed in the + X direction, the control unit CONT makes the projection region ARl from -X- side (i.e., the supply port 13A) of the liquid side than from the + X- the amount of liquid (i.e., the supply port 14A) is large, on the other hand, in a case where while moving the substrate P, while exposure processing on -χ direction so that the projection area from ARl + X- side of liquid from the ratio the amount of liquid more -X- side. 此外,在扫描方向上,将在投影区域ARl的跟前的每单位时间的液体回收量设定为比在其相反一侧的液体回收量少。 Further, in the scanning direction, which is set opposite to the liquid recovery side is less than in the liquid recovery amount per unit time in front of the projection region ARl. 例如, 在+X方向上移动了基片P时,使对于投影区域ARl来自+X—侧(即回收口24A)的回收量比来自-X—侧(即回收口23A)的回收量多。 For example, when the substrate P moves in the + X direction, the projection area of ​​the recovered amount of recovery compared ARl + X- from the side (i.e., the recovery port 24A) -X- from the side (i.e., the recovery port 23A) of the plurality.

[0074] 再有,在基片P(基片台PST)上用于局部地形成液浸区域AR2的机构不限于上述, 也可采用例如在美国专利公开第2004/020782号公报或国际公开第2004/055803号公报中公开了的机构,只要在本国际申请中指定或选择的国的法令中容许,引用这些文献的记载内容,作为本文的记载的一部分。 [0074] Further, for locally forming the liquid immersion area AR2 is not limited to the above-described mechanism may also be employed, for example, first disclosed in U.S. Patent Publication No. 2004/020782, or International Publication on the substrate P (substrate stage PST) No. 2004/055803 discloses institutions, laws State designated or selected in this international application in the permit, citing record contents of these documents, as part of the record of this article.

[0075] 图3是从上方看基片架PT的平面图,图4是从上方看保持了基片P的基片架PT的平面图。 [0075] FIG. 3 is a plan view of the substrate table PT as viewed from above, FIG. 4 is a plan view seen from above the substrate table holding the substrate P PT. 在图3和图4中,在平面视图为矩形的基片架PT的互相垂直的2个边缘部配置了移动镜55。 Two mutually perpendicular edge portions of the substrate table PT in FIG. 3 and FIG. 4, is rectangular in plan view the movement of mirror 55 is disposed. 此外,在基片架PT的大致中央部形成了凹部31,在该凹部31中配置了构成基片架PT的一部分的基片托PH,基片P由基片托PH来保持。 Further, at a substantially central portion of the substrate table PT is formed a recess 31, arranged constituting the substrate table PT part of the substrate holder PH in the recess 31, the substrate P held by the substrate holder PH. 在基片P(基片托PH)的周围, 设置了具有与基片P的表面大致为同一面的平坦面30A的板构件30。 In the periphery of the substrate P (substrate holder PH) is provided substantially flush with the flat surface 30A of the plate member 30 having a surface of the substrate P. 板构件30是环状构件,配置成包围基片托PH(基片P)。 Plate member 30 is an annular member, arranged to surround the substrate holder PH (substrate P). 利用例如聚四氟乙烯(特富隆(登录商标))那样的氟化物等的具有疏液性的材料形成板构件30。 Using, for example fluoride (Teflon (registered trademark)) such as a polytetrafluoroethylene material having the liquid repellence of the plate member 30 is formed. 由于在基片P的周围设置了具有与基片P表面大致为同一面的平坦面30A的板构件30,故即使在对基片P的边缘区域E进行液浸曝光时,在投影光学系统PL的像面一侧也能良好地形成液浸区域AR2。 Since the periphery of the substrate P is provided a plate member having a P-surface of the substrate is substantially flush with the flat surface 30A is 30, so that even in the edge area E of the substrate P is subjected to liquid immersion exposure, the projection optical system PL the image surface side can satisfactorily form the liquid immersion area AR2.

[0076] 再有,如果能以用液体1充满投影光学系统PL的像面一侧的光路空间的方式形成液浸区域AR2,则在基片P的表面与板构件30的平坦面30A中可存在台阶差,例如,在Z方向上,可使平坦面30A比基片P的表面低。 [0076] Note that, then in a flat surface of the substrate P and the surface of the plate member 30A of if capable of forming liquid immersion area AR2 in an optical path space of the surface side of the image filled the projection optical system PL with a liquid 1 may there is a step difference, e.g., in the Z direction, the flat surface 30A can be lower than the surface of the substrate P.

[0077] 如图1、3和4中所示,在基片架PT上的板构件30 (基片托PH)的外侧设置了第2 板构件32。 [0077] As shown in FIG. 1, 3 and 4, the outer plate member 30 on the substrate table PT (substrate holder PH) is provided the second plate member 32. 第2板构件32具有与基片P的表面或板构件30的平坦面30A大致为同一面的平坦面32A,设置成覆盖基片托PH(基片P)和板构件30以外的基片架PT的上面的大致整个区域。 The second plate member 32 has the flat surface 30A of the substrate P surface or plate member 30 is substantially flush with the flat surface 32A, is provided to cover the substrate holder PH (substrate P) and the plate member the substrate holder than 30 substantially the entire region above the PT. 也利用例如聚四氟乙烯等的具有疏液性的材料形成了第2板构件32。 Also using, for example polytetrafluoroethylene material having the lyophobic property are formed a second plate member 32.

[0078] 再有,板构件30的平坦面30A表面中的液体1的接触角和第2板构件32的平坦面32A表面中的液体1的接触角在照射曝光光EL前的初始状态下,分别大于等于110°。 [0078] Further, the initial state of the contact angle of the liquid 32A flat surface faces the liquid 30A surface of the flat surface of the plate member 30 in the contact angle 1 and the second plate member 32 in a prior irradiated with the exposure light beam EL, They are greater than or equal 110 °.

[0079] 此外,在第2板构件32的规定的位置上形成了多个开口部32K、32L、32N。 [0079] Further, at a predetermined position of the second plate member 32 is formed a plurality of openings 32K, 32L, 32N. 在开口部32K中配置了基准构件300。 32K are arranged in the opening portion of the reference member 300. 在基准构件300中以规定的位置关系设置了利用基片对准系统350检测的基准标记PFM和利用掩模对准系统360检测的基准标记MFM。 In the reference member 300 at a predetermined positional relationship is provided by using the substrate alignment system 350 for detecting the reference mark PFM and the reference mark MFM by the mask alignment system 360 for detection. 此外,基准构件300的上面301A大致成为平坦面,可作为聚焦、矫正检测系统的基准面来使用。 Further, the reference member 301A 300 above a substantially flat surface, may be used as a focus detection system correcting datum. 再者, 将基准构件300的上面30IA设置成与基片P表面、板构件30的表面(平坦面)30A和第2 板构件32的表面(平坦面)32A为大致同一面。 Further, the above reference member 300 is provided with 30IA surface of the substrate P, the surface (flat surface) of the surface (flat surface) 30A of the plate member 30 and the second plate member 32 is substantially flush 32A. 此外,将基准构件300形成为在平面视图中呈矩形,在开口部32K中配置的基准构件300与第2板构件32之间形成间隙K。 Further, the reference member 300 is formed in a rectangular shape in a plan view, a gap is formed between the reference member 32 is disposed in the opening portion 32K in the second plate member 300 K. 在本实施形态中,间隙K例如约为0. 3mm。 In this embodiment, the gap K, for example, about 0. 3mm.

[0080] 作为光传感器,在开口部32L中配置了照度不勻传感器400。 [0080] As the optical sensor, disposed in the opening portion 32L in the uneven illuminance sensor 400. 照度不勻传感器例如在特开昭57-117238号公报(对应的美国专利第4,465,368号)中公开了,只要在本国际申请中指定或选择的国的法令中容许,引用这些文献的记载内容,作为本文的记载的一部分。 Illuminance unevenness sensor, for example, disclosed in Laid-Open Publication No. Sho 57-117238 (corresponding to U.S. Pat. No. 4,465,368) is in the, laws and ordinances of the state designated or selected in this international application permit in China, these documents cited records contents, as described herein portion. 照度不勻传感器400的上板401的上面401A大致成为平坦面,设置成与基片P表面、板构件30的表面30A和第2板构件32的表面32A为大致同一面。 The above uneven illuminance sensor 400 on plate 401 is substantially a flat surface 401A, the P-disposed surface 30A of the substrate surface and the second surface 30 of the plate member 32, the plate member 32A is substantially flush. 在照度不勻传感器400的上面401A中设置了可通过光的针孔部470。 Above 400 401A provided in the pinhole portion 470 by the light illuminance unevenness sensor. 用铬等遮光性材料覆盖了光透过性的上板401的上面401A中针孔部470以外的部分。 It covers the light transmission of the upper plate 401 of the portion other than the pinhole portion 470 401A with a shielding material such as chromium. 此外,将照度不勻传感器400 (上板401)形成为在平面视图中呈矩形,在开口部32L中配置的照度不勻传感器400 (上板401)与第2板构件32 之间形成间隙L。 Furthermore, the uneven illuminance sensor 400 (upper plate 401) is formed in a rectangular shape in a plan view, the gap L is formed between the illuminance unevenness sensor 32 disposed in the opening portion 32L in 400 (upper plate 401) and the second plate member . 在本实施形态中,间隙L例如约为0. 3mm。 In the present embodiment, the gap L e.g. about 0. 3mm.

[0081] 在开口部32N中配置了空间像检测传感器500。 [0081] The spatial image detection sensor arranged in the opening portion 500 of 32N. 空间像检测传感器500例如在特开2002-14005号公报(对应的美国专利公开2002/0041377号)中公开了,只要在本国际申请中指定或选择的国的法令中容许,引用这些文献的记载内容,作为本文的记载的一部分。 Spatial image detection sensor 500, for example, in Laid-Open Patent Publication No. 2002-014005 (corresponding to U.S. Patent Publication No. 2002/0041377) discloses, laws and ordinances of designated or selected in this international application permit in China, according to these documents cited content, as part of the description herein. 空间像检测传感器500的上板501的上面501A大致成为平坦面,可作为聚焦、矫正检测系统的基准面来使用。 Like the space 501 above the upper plate 501A of the detection sensor 500 is substantially a flat surface, it may be used as a focus detection system correcting datum. 而且,设置成与基片P表面、板构件30的表面30A和第2板构件32的表面32A为大致同一面。 Further, the surface provided with the surface of the substrate P, the surface of the plate member 30A 30 and the second plate member 32 is substantially flush 32A. 在空间像检测传感器500的上面501A中设置了可通过光的狭缝部570。 Image detection sensor 501A 500 above the slit portion 570 may be provided by a light in the space. 用铬等遮光性材料覆盖了光透过性的上板501的上面501A中狭缝部570以外的部分。 Covering a portion other than the light 570 through the slit portion 501 of the upper plate 501A of a shielding material such as chromium. 此外,将空间像检测传感器500 (上板501)形成为在平面视图中呈矩形,在空间像检测传感器500 (上板501)与开口部32N之间形成间隙N。 Furthermore, the spatial image detection sensor 500 (upper plate 501) is formed in a rectangular shape in planar view, the detection sensor 500 as a gap is formed in the space between 32N (upper plate 501) and the opening portion N. 在本实施形态中,间隙N与基片P 的外形的制造公差为同等程度,例如约为0. 3mm。 In the present embodiment, the shape of the nip N manufacturing tolerances and the substrate P is the same level, for example, about 0. 3mm. 这样,保持基片P的基片架PT的上面在整个面上大致为同一面。 Thus, holding the substrate P above the substrate table PT on the entire surface substantially flush.

[0082] 再有,如果能以用液体1充满投影光学系统PL的像面一侧的光路空间的方式形成液浸区域AR2,则在板构件30的平坦面30A与第2板构件32的表面32A与基准构件300的上面301A与照度不勻传感器400的上面401A与空间像检测传感器500的上面501A之间彼此可存在台阶差。 [0082] Further, if the surface can be formed liquid immersion area AR2 in an optical path space of the surface side of the image filled the projection optical system PL with a liquid 1, the plate member having a flat surface 30A 30 and the second plate member 32 401A and upper space 32A above the reference member 300 and 301A of the uneven illuminance sensor 400 detects the image sensor between upper 501A 500 may be stepped from each other exist.

[0083] 此外,虽然未图示,但在基片架PT中也设置了照射量传感器(照度传感器),配置在第2板构件32中形成的开口部中。 [0083] Furthermore, although not shown, the substrate table PT is also provided a radiation amount sensor (illuminance sensor) disposed in the opening portion 32 is formed in the second plate member. 照射量传感器例如在特开平11-16816号公报(对应的美国专利公开2002/0061469号)中公开了,只要在本国际申请中指定或选择的国的法令中容许,引用这些文献的记载内容,作为本文的记载的一部分。 For example, the irradiation amount sensor JP 11-16816 (corresponding to U.S. Patent Publication No. 2002/0061469) discloses, laws and ordinances of designated or selected in this international application permit in China, references disclosed contents of these documents, as part described herein.

[0084] 再有,在基片架PT上安装的检测器不限于上述的传感器,可根据需要按照各种检测器。 [0084] Further, on the substrate table PT detectors installed not limited to the sensor, it may be required in accordance with various detectors. 例如,可在基片架PT上配置波面像差检测器。 For example, the wavefront aberration detector arranged on a substrate table PT. 波面像差检测器例如在国际公开99/60361号公报(对应的欧洲专利公开1,079,223号公报)或美国专利第6,650,399号中公开了,只要在本国际申请中指定或选择的国的法令中容许,引用这些文献的记载内容,作为本文的记载的一部分。 Wavefront aberration detector, for example, in International Publication Patent Publication No. 99/60361 (corresponding to European Patent Publication Patent Publication No. 1,079,223) or U.S. Pat. No. 6,650,399 discloses, as long as specified in the present international application or State laws allow selected references mention contents of these documents, as part of the record of this article. 当然,也可不在基片架PT上安装检测器。 Of course, the detector may not be mounted on the substrate table PT.

[0085] 此外,将板构件30中以圆环状形成的平坦面30A的宽度形成为至少比投影区域ARl大(参照图4)。 [0085] In addition, the width of the flat surface 30A of the plate member 30 to form an annular formed larger than at least the projection area AR1 (see FIG. 4). 因此,在对基片P的边缘区域E曝光时,曝光光EL不会照射到第2板构件32上。 Thus, when the edge area E of the substrate P is exposed, the exposure light EL is not irradiated to the second plate member 32. 由此,可抑制起因于曝光光的照射的第2板构件32的疏液性的恶化,可使第2 板构件32的更换频度少于板构件30的更换频度。 Thereby, deterioration of liquid-repellent plate member irradiated with the second light exposure can be suppressed due to the 32, it allows the second plate member 32 is less than the frequency of exchanging the exchange frequency of the plate member 30. 再者,最好将平坦面30A的宽度形成得比在投影光学系统PL的像面一侧形成的液浸区域AR2大。 Further, preferably the width of the flat surface 30A is formed larger than the liquid immersion area formed on the image plane side of the projection optical system PL is large AR2. 由此,在对基片P的边缘区域E 进行液浸曝光时,由于在板构件30的平坦面30A上配置液浸区域AR2而不在第2板构件32 上配置液浸区域AR2,故可防止液浸区域AR2的液体1侵入到作为板构件30与第2板构件32的间隙的间隙G中的不良情况。 Accordingly, when the edge area E of the substrate P is liquid immersion exposure, because the liquid immersion area disposed on the flat surface 30A of the plate member 30 without AR2 liquid immersion area AR2 arranged on the second plate member 32 can be prevented, liquid immersion area AR2 of the liquid 1 enters the gap G as a gap defects plate member 30 and the second plate member 32 in. 再有,板构件30的平坦面30A的宽度不限定于此,当然也可比液浸区域AR2小。 Further, the width of the flat surface 30A of the plate member 30 is not limited thereto, of course, smaller than the liquid immersion area AR2.

[0086] 如图3和作为保持基片P的基片架PT的主要部分放大剖面图的图5中所示,构成基片架PT的一部分的基片托PH具备:大致圆环状的周壁部33 ;在该周壁部33的内侧的基座部35上设置的、支撑基片P的多个支撑部34 ;以及在支撑部34之间配置的、用于吸附保持基片P的多个吸引口41。 5 As shown in [0086] FIGS. 3 and enlarged sectional view of a main part of the substrate table PT holds the substrate P of FIG substrate holder PH constituting a part of the substrate table PT includes: a substantially annular peripheral wall portion 33; in, a plurality of supporting portions supports the substrate P disposed on the inner side 35 of the peripheral wall portion 33 of the base portion 34; and a plurality of portions disposed between the support 34 for attracting and holding the substrate P the suction port 41. 在周壁部33的内侧一样地配置了支撑部34和吸引口41。 The inner circumferential wall portion 33 is arranged as the support portion 34 and the suction port 41. 再有,在图5中,周壁部33的上端面具有比较宽的宽度,但实际上只有约1〜2mm的宽度。 Note that, in FIG. 5, the upper end surface of the peripheral wall portion 33 has a relatively wide width, but in fact only a width of about 1~2mm. 此夕卜,在基座部35上设置了配置由升降基片P的销钉构件构成的升降构件70的孔部71。 Bu this evening, the base portion 35 is provided on the hole portion 71 formed of a configuration of the elevation member elevating pin member 70 of the substrate P. 在本实施形态中,在3个部位上设置了升降构件70。 In this embodiment, in three locations on the elevating member 70 is provided. 利用未图示的驱动装置来升降升降构件70,控制装置CONT经驱动装置控制升降构件70的升降工作。 By a driving means (not shown) to raise and lower the lift member 70, the control unit CONT controls the lift member via the drive means 70 of the lifting work. [0087] 此外,如图5中所示,在基片架PT上面中与板构件30的下面对置的位置上设置了多个用于对于基片架PT吸附保持该板构件30的吸附孔72。 [0087] Further, as shown in FIG. 5, the substrate table PT in the position below the upper plate member 30 is provided on the opposite plurality to the substrate table PT for holding the suction plate 30 of the suction member 72 holes. 再者,在基片架PT中,在多个位置(在此是3个部位)上设置了由对于基片架PT升降板构件30的销钉构件构成的升降构件74。 Further, in the substrate table PT, in a plurality of positions (three positions in this case) is provided on the lifting member 74 constituted by the substrate table PT for the lifting plate member 30 of the pin member. 利用未图示的驱动装置来升降升降构件74,控制装置CONT经驱动装置控制升降构件74的升降工作(参照图7(d))。 By a driving means (not shown) to raise and lower the lifting member 74, via drive means control unit CONT controls the elevation member elevating work (see FIG. 7 (d)) 74 of. 再者,虽然未图示,但在基片架PT上面中与第2板构件32的下面对置的位置上设置了多个用于对于基片架PT吸附保持该第2板构件32的吸附孔。 Furthermore, although not shown, but above the substrate table PT and below the second plate member 32 is provided for a plurality of adsorption to the substrate table PT holds the second plate member 32 on a position opposed to suction holes. 再者,在基片架PT中,在多个位置上设置了对于基片架PT升降第2板构件32的升降构件。 Further, in the substrate table PT, are provided at a plurality of positions on the lifting member for lifting the substrate table PT of the second plate member 32.

[0088] 再有,由于如前面所述,第2板构件32的更换频度少,故也可不将其吸附保持在基片架PT上,而是利用螺钉拧紧等来固定,用手动方式进行更换作业。 [0088] Furthermore, since as previously described, the frequency of replacement of at least the second plate member 32, it may not be sucked and held on a substrate table PT, but the use of tightening screws or the like is fixed, performed manually replacement work. 此外,也可不使第2板构件32成为能更换的构件。 Further, the second plate member may not be exchangeable member 32.

[0089] 但是,在使用基准构件300或照度不勻传感器400等时,在对第2板构件32照射了曝光光EL或与曝光光为同一波长的光的情况下,存在第2板构件32的表面的疏液性恶化的危险,存在与板构件30同样的更换频度为必要的可能性。 [0089] However, when using the reference member 300 or the uneven illuminance sensor 400, etc., of the second plate member 32 is irradiated with exposure light or exposure light EL is the case where the same wavelength of light, the presence of the second plate member 32 the risk of deterioration of the liquid repellence of the surface, the presence of the same frequency as necessary to replace the plate member 30 possibilities.

[0090] 此外,如图4和图5中所示,在由基片托PH(基片架PT)保持的基片P的侧面PB 与板构件30之间形成了规定的间隙A。 [0090] Further, as shown in FIG. 5 and FIG. 4, the side surface PB and the plate member between the substrate P by the substrate holder PH (substrate table PT) 30 is formed maintaining a predetermined gap A.

[0091] 在图5中,在基片架PT的凹部31内部配置了保持基片P的基片托PH。 [0091] In FIG. 5, the substrate table PT in the internal recess 31 of the substrate holder PH arranged holding substrate P. 在凹部31 中配置了基片托PH时,将基片架PT形成为该基片托PH的上端面34A比基片架PT的对于板构件30和第2板构件32的放置面PTa高。 When configuring the substrate holder PH in the recess 31, the substrate table PT is formed on the end surface 34A for the substrate holder PH than the placement surface of the substrate table PT for the plate member 30 and the second plate member 32 is PTa high. 在构成基片托PH的一部分的大致圆板状的基座部35上设置了周壁部33和支撑部34。 On the base portion constitutes a substantially disc-shaped portion of the substrate holder PH of the portion 35 of the peripheral wall 33 and the support portion 34 is provided. 支撑部34各自的剖面为梯形,由多个支撑部34的上端面34A保持基片P的背面PC。 The supporting portion 34 of each of trapezoidal cross section, the upper end surface 34A of the plurality of support portions 34 of the back surface of the substrate P held PC. 此外,周壁部33的上面33A为平坦面。 Further, the peripheral wall portion 33 of the upper flat surface 33A. 周壁部33 的高度比支撑部34的高度低。 The height of the peripheral wall portion 33 is lower than the height of the support portion 34. 在基片P与周壁部33之间形成了间隙B。 Between the substrate P and the circumferential wall portion 33 is formed a gap B. 间隙B比板构件30与基片P的侧面PB之间的间隙A小。 Gap B is smaller than the gap between the plate member 30 and the side surface PB of the substrate P A. 此外,在凹部31的内侧面36与对置于该内侧面36 的基片托PH的侧面37之间形成了间隙C。 Further, between the inner side surface of the concave portion 31 is disposed on the side surface 36 and inner surface 36 of the substrate holder 37 of the PH gap is formed C. 在此,将基片托PH的直径形成得比基片P的直径小,间隙A比间隙C小。 Here a small diameter, the substrate holder PH is formed larger than the diameter of the substrate P, the gap A is smaller than the gap C. 再有,在本实施形态中,在基片P中未形成位置对准用的缺口部(定位边、定位槽),基片P大致呈圆形,由于在其全部的圆周上间隙A为0. Imm〜1. Omm,在本实施形态中约为0. 3mm,故可防止液体的流入。 Further, in the present embodiment, the notch portion (orientation flat, the positioning groove) for positioning the substrate P is not formed, the substrate P is substantially circular, since the gap A in the entire circumference 0 . Imm~1. Omm, about 0. 3mm in the present embodiment, it is possible to prevent the inflow of the liquid. 再有,在基片P中形成缺口部的情况下,根据该缺口部在板构件30或周壁部33中设置凸起部等使板构件30或周壁部33成为与缺口部对应的形状即可。 Further, formed on the substrate P in a case where the notch portion, in accordance with the notch portion so that the plate member 30 or the circumferential wall portion 33 provided in the projection portion other plate member 30 or the circumferential wall portion 33 becomes a corresponding notch shape can . 通过这样做,即使在基片P的缺口部中,在基片P与板构件30之间也能确保间隙A。 By doing so, even if the notch portion of the substrate P between the substrate P and the plate member 30 can be secured a gap A.

[0092] 在板构件30的内侧形成了内侧台阶部30D,利用该内侧台阶部30D形成了与基片下面PC的边缘部对置的支撑面30S。 [0092] The inner stepped portion 30D is formed in the inner plate member 30, with which the inner stepped portion 30D is formed with a support surface 30S of the substrate below the edge portion facing the PC. 板构件30可利用支撑面30S支撑基片下面PC的边缘部。 Plate member 30 by the support surface 30S may be supported under the substrate edge portion PC. 在此,如图5中所示,在由基片托PH保持的基片下面PC的边缘部与由基片架PT的放置面PTa保持的板构件30的支撑面30S之间形成间隙D。 Here, as shown in FIG. 5, the supporting surface held by the substrate holder PH of the substrate below the edge portion of the PC plate member held by the mounting surface of the substrate table PT PTa 30 forming a gap between the 30S D. 由此,可避免因板构件30 (支撑面30S)与基片下面PC的边缘部接触而使该基片P的边缘部向上侧翘曲的不良情况的发生。 Thereby, the plate member 30 can be avoided because (support surface 30S) in contact with the edge portion of the substrate below the PC warping defects edge portion upwardly of the base sheet P side.

[0093] 此外,在第2板构件32的内侧形成了内侧台阶部32D,在板构件30的外侧形成了外侧台阶部30F,使其与第2板构件32的内侧台阶部32D的形状相对应。 [0093] Further, inside the second plate member 32 is formed of the inner stepped portion 32D, the plate member 30 outside the outer stepped portion 30F is formed, so that the shape of the inner stepped portion 32D of the second plate member 32 corresponding to . 由此,成为在第2 板构件32的一部分上放置板构件30的一部分的状态。 Accordingly, a state is placed on a portion of the plate member 32 of the second plate member portion 30. 此外,在板构件30的外侧面与第2板构件32的内侧面之间形成规定的间隙G。 Further the gap formed between the inner side surface of a predetermined outer side surface of the plate member and the second plate member 30 32 G. 本实施形态中的间隙G例如约为0. 3mm,由于用表面具有疏液性的聚四氟乙烯制的板构件30和第2板构件32来夹住,故即使在板构件30与第2板构件32的边界上形成了液浸区域,也可防止液体对间隙G的侵入。 The gap G in the present embodiment, for example, about 0. 3mm, since the liquid repellent surface of a polytetrafluoroethylene plate with the second plate member 30 and the clamping member 32, 30 so that even with the second plate member boundary plate member 32 forms a liquid immersion area, the liquid can be prevented from intrusion into the gap G.

[0094] 在作为基片P的曝光面的表面PA上涂敷了光刻胶(感光材料)90。 [0094] coated with a photoresist (photosensitive material) 90 on the surface PA as the exposure surface of the substrate P. 在本实施形态中,感光材料90是ArF准分子激光器用的感光材料(例如,东京应化工业株式会社制TARF-P6100),具有疏液性(疏水性),其接触角约为70〜80°。 In this embodiment, the photosensitive material 90 is a photosensitive material using an ArF excimer laser (e.g., Tokyo Ohka Kogyo Co., Ltd. TARF-P6100), having a liquid-repellent (hydrophobic), a contact angle of about 70~80 °.

[0095] 此外,在本实施形态中,对基片P的侧面PB进行了疏液处理(疏水处理)。 [0095] Further, in the present embodiment, the side surface PB of the substrate P is lyophobic treatment (hydrophobic treatment). 具体地说,在基片P的侧面PB上也涂敷了具有疏液性的上述感光材料90。 Specifically, the side surface PB of the substrate P is also coated with the photosensitive material 90 having the liquid repellence. 由此,可防止来自表面呈疏液性的板构件30与基片P侧面PB的间隙A的液体的侵入。 Thereby, the surface was penetrated liquid-repellent plate member 30 and the side surface PB of the substrate P gap A can be prevented from liquid. 再者,在基片P的背面PB 上也涂敷上述感光材料90,进行了疏液处理。 Further, on the back surface PB of the substrate P is also coated with the photosensitive material 90, a lyophobic treatment.

[0096] 在本实施形态中,在基片架PT中,放置面PTa和内侧面36具有疏液性。 [0096] In the present embodiment, the substrate table PT, the placing surface PTa and the inner side surface 36 is liquid-repellent. 再者,在基片托PH的一部分上也进行疏液处理,呈疏液性。 Further, on a portion of the substrate holder PH is also liquid-repellent treatment was lyophobic. 在本实施形态中,基片托PH中周壁部33 的上面33A和侧面37具有疏液性。 In the present embodiment, the substrate holder PH in the upper portion 33 of the peripheral wall 33A and the side surface 37 is liquid-repellent. 作为基片架PT和基片托PH的疏液处理,例如涂敷氟树脂材料或丙烯酸树脂材料等的疏液性材料或粘贴由上述疏液性材料构成的薄膜。 As the lyophobic process the substrate table PT and the substrate holder PH, for example, a fluororesin coating material or acrylic material or the like or paste material lyophobic thin film made of the liquid-repellent material. 作为用于使之呈疏液性的疏液性材料,可疏液非溶解性的材料。 As for the liquid repellency was lyophobic material, a material lyophobic insolubility. 再有,也可用具有疏液性的材料(氟树脂等)形成基片架PT和基片托PH的整体。 Further, those having a liquid-repellent material (a fluorine resin) the substrate table PT and the substrate holder PH whole.

[0097] 利用吸引装置40使由基片托PH的周壁部33包围的第1空间38呈负压。 [0097] With the suction apparatus 40 of the first circumferential wall portion 33 a space surrounded by the substrate holder PH of 38 negative pressure. 吸引装置40具备:在基片托PH的基座部35上面设置的多个吸引口41 ;包含在基片架PT外部设置的真空泵的真空部42 ;以及在基座部35内部形成的、连接多个吸引口41的每一个与真空部42的流路43。 Suction device 40 includes: a plurality of base portions 35 of the substrate holder PH disposed above the suction port 41; a vacuum pump contained in the portion disposed outside the substrate table PT 42; and a base portion formed in the interior 35, connector each of the plurality of suction ports 43 and the flow passage portion 42 of the vacuum 41. 分别在基座部35上面中支撑部34以外的多个规定位置上设置了吸引口41。 Above the base portion 35 are provided with suction ports 41 in a plurality of predetermined positions on the outside of the supporting portion 34. 吸引装置40通过吸引在周壁部33、基座部35与由支撑部34支撑的基片P之间形成的第1空间38内部的气体(空气)使该第1空间38呈负压,将基片P吸附保持在支撑部34上。 Suction means 40 so that the first suction space through the first space is formed between the peripheral wall portion 33, the base portion 35 and the substrate P supported by the support portion 34 of the interior 38 of gas (air) 38 a negative pressure, the base adsorption sheet P held on the support portion 34. 再有,由于基片P的背面PC与周壁部33上面33A的间隙B很微小,故维持了第1空间38的负压。 Further, since the top 33 of the back surface PC of the substrate P and the circumferential wall portion of the gap B 33A is very small, so that the negative pressure is maintained in the first space 38.

[0098] 此外,流入到凹部31的内侧面36与基片托PH的侧面37之间的第2空间39中的液体1被回收部60回收。 [0098] Moreover, it flows to the side of the inner surface 36 of the recess 31 and the substrate holder PH in the liquid 391 recovered by the recovery portion 60 between the second space 37. 在本实施形态中,回收部60具有:可容纳液体1的容器61 ;以及在基片架PT内部设置的、连接空间39与外部的容器61的流路62。 In the present embodiment, the recovery unit 60 has: a liquid storage container 61; and the interior of the substrate table PT is provided, connected to the outer space 39 of the container 61 flow passage 62. 而且,在该流路62的内壁面上也进行了疏液处理。 Further, the inner wall surface of the flow passage 62 is also a liquid-repellent treatment. 再有,也可在基片台PST(基片架PT)中暂时地保持流入到空间39中的液体,在规定的定时将其排出到与基片台PST分开地设置的外部容器等中。 Furthermore, it can be maintained in the liquid space 39 flows into the substrate stage PST (substrate table PT) are temporarily, in a predetermined outer container like timing discharged to the separately provided with the substrate stage PST.

[0099] 在基片架PT中形成了连接凹部31的内侧面36与基片托PH的侧面37之间的第2空间39与基片架PT外部的空间(大气空间)的流路45。 [0099] forming a side connecting recess side surfaces 31 36 of the substrate holder PH in the second space between the 3739 and the substrate table PT external space (atmospheric space) in the flow passage 45 in the substrate table PT in. 气体(空气)可经流路45在第2空间39和基片架PT外部流通,将第2空间39的气压大致设定为大气压。 Gas (air) 45 may be in the second space 39 and the substrate table PT outer flow through the flow passage, the second space 39 is substantially atmospheric pressure is set to atmospheric pressure.

[0100] 如图6中所示,基片托PH、板构件30和第2板构件32是独立的部件,设置成对于基片架PT可装卸。 [0100] As shown in FIG. 6, the substrate holder PH, the plate member 30 and the second plate member 32 is a separate component, provided to the substrate table PT can be detachable. 而且,对基片架PT中与基片托PH的接触面57进行疏液处理,使其呈疏液性,同时也对作为对于基片架PT的接触面的基片托PH的背面58进行疏液处理,使其具有疏液性。 Further, for the substrate table PT and the substrate holder PH in the contact surface 57 of liquid-repellent treatment, it was lyophobic property, but also on the contact surface as the substrate table PT of the back surface of the substrate holder PH 58 liquid-repellent treatment to have the liquid repellence. 作为对于接触面57或背面58的疏液处理,如上所述,可涂敷氟树脂材料或丙烯酸树脂材料等的疏液性材料等来进行。 As the lyophobic treatment to the contact surface 57 or back surface 58, as described above, it may be coated with a fluororesin material or a liquid repellent material such as acrylic material or the like.

[0101] 其次,一边参照图7和图8的示意图,一边说明使用具有上述的结构的曝光装置EX 对基片P曝光的方法。 [0101] Next, a schematic view of FIGS. 7 and 8 with reference, while the method described using the exposure apparatus EX having the above-described configuration of the substrate P exposed. [0102] 如图7(a)中所示,由基片架PT的放置面PTa吸附保持板构件30,同时也由基片架PT的放置面PTa吸附保持第2板构件32。 [0102] FIG. 7 (a), by the placement surface PTa of the substrate table PT suction holding plate member 30, while maintaining the second plate member 32 is disposed by the suction surface PTa of the substrate table PT. 而且,利用运送臂(运送装置)80将作为曝光处理对象的基片P运入到基片架PT上。 Further, by using the transport arm (conveying means) 80 as a target substrate P is transported into the exposure process onto the substrate table PT. 此时,升降构件70上升,运送臂80将基片P交给上升了的升降构件70。 In this case, the lifting member 70 rises, the arm 80 transporting the substrate P to the elevating member 70 rises. 再有,升降构件74未上升。 Further, the lifting member 74 does not increase. 升降构件70保持由从运送臂80交给的基片P并使其下降。 Elevating member 70 held by the lowered from the transport arm 80 to the substrate P and allowed. 如图7(b)中所示,在板构件30的内侧配置基片P,由基片架PT(基片托PH)来保持。 FIG 7 (b) in FIG., The substrate P disposed in the inner plate member 30 is held by the substrate table PT (substrate holder PH). 然后,如图7(c)中所示,控制装置CONT利用液体供给机构10和液体回收机构20进行液体1的供给和回收,在由基片架PT保持的基片P与投影光学系统PL之间形成液体1的液浸区域AR2。 Then, as shown in FIG. 7 (c), the control unit CONT by the liquid supply mechanism 10 and the liquid recovery mechanism 20 to supply and recover the liquid 1 on the substrate P by the projection optical system of holding the substrate table PT of PL formed between the liquid immersion area of ​​a liquid AR2. 然后,控制装置CONT经投影光学系统PL和液体1对基片P照射曝光光EL,一边移动支撑了基片P的基片台PST,一边进行液浸曝光。 Then, one pair of substrates irradiated with the exposure light beam EL P control unit CONT via projection optical system PL and the liquid, while moving the substrate stage PST supporting the substrate P, the liquid immersion exposure performed while.

[0103] 通过对基片P的边缘区域E曝光,曝光光EL照射到板构件30的平坦面30A上,由于该曝光光EL的照射的缘故,存在平坦面30A的疏液性恶化的可能性。 [0103] By the edge area E of the substrate P is exposed on the flat surface 30A exposure light beam EL is irradiated to the plate member 30, due to the irradiation of the exposure light beam EL, there is a deterioration of the liquid repellence of the flat surface 30A of the possibility of . 如果平坦面30A的疏液性恶化,则在平坦面30A上配置的液浸区域AR2的液体1容易残留,产生引起放置了基片P的环境变动等的不良情况。 Liquid immersion area AR2 of the liquid if the flat surface 30A of the deterioration of the liquid repellence is disposed on the flat surface 30A tends to remain. 1, generates environmental fluctuation caused placed substrate P such defects. 因此,控制装置CONT根据板构件30 (平坦面30A)的疏液性的恶化,将该疏液性恶化了的板构件30与新的(充分地具有疏液性)板构件30更换。 Thus, the control unit CONT deterioration of the liquid repellence of the plate member 30 (flat surface 30A) of the deterioration of the liquid repellence of the plate member 30 with the new (having sufficient liquid repellence) to replace the plate member 30.

[0104] 具体地说,在液浸曝光处理的结束后,在使用液体回收机构20等回收了在基片P 上或平坦面30A上残留的液体1后,如图7 (d)中所示,控制装置CONT在解除了对于板构件30的吸附保持后,使升降构件74上升。 [0104] Specifically, after the end of liquid immersion exposure process, the liquid recovery mechanism 20 recovers the like on the substrate P or on the flat surface 30A remaining liquid 1, FIG. 7 (d) in FIG. the control unit CONT is released for adsorption of the holding plate member 30, the lift member 74 is lifted. 此时,也解除由基片托PH进行的基片P的吸附保持。 In this case, releasing the adsorption of the substrate P by the substrate holder PH holding. 升降构件74在支撑了板构件30的下面的状态下上升。 Elevating member 74 is lifted in the underlying support plate member 30 in the state. 再有,此时,升降构件70未上升。 Further, at this time, the lifting member 70 does not increase. 由此,板构件30离开基片架PT。 Thereby, the plate member 30 away from the substrate table PT. 此时,由于板构件30的支撑面30S支撑了基片下面PC的边缘部,故基片P与板构件30 —起上升,离开基片架PT。 At this time, since the supporting surface 30S of the plate member 30 under the substrate supporting the edge portion of the PC, so that the substrate P and the plate member 30-- from rising away from the substrate table PT. 这样,构成对于基片架PT装卸板构件30的装卸机构的升降构件74可与基片P—起从基片架PT取下板构件30。 Thus, the lifting member configured for detachable mechanism of the substrate table PT detachable plate member 30 and the substrate 74 may be P- starting member 30 is removed from the substrate table PT board. 然后, 运送臂80进入利用升降构件74上升了的板构件30与基片架PT之间,支撑板构件30的下面。 Then, the transport arm 80 by the lifting member to enter between the plate member 74 is lifted and the substrate holder 30 PT, below the support plate member 30. 然后,运送臂80从基片架PT(基片台PST)运出保持了基片P的板构件30。 Then, the transport arm 80 from the substrate table PT (substrate stage PST) out of the substrate P held plate member 30.

[0105] 已运出的板构件30与新的板构件30更换。 [0105] has a plate member 30 out of the replacement with the new plate member 30. 然后,如图8(a)中所示,控制装置CONT使用运送臂80将保持了作为曝光处理对象的基片P的新的板构件30运入到基片架ΡΤ(基片台PST)上。 Then, as shown in (a), 8, the control unit CONT using the conveying arm 80 holding the new plate member 30 shipped as an exposure of the processed substrate P on the substrate holder into ΡΤ (substrate stage PST) . 此时,升降构件74上升,运送臂80将保持了基片P的板构件30交给上升了的升降构件74。 In this case, the lifting member 74 is lifted, the conveying arm 80 holding the plate member 30 of the substrate P to the lifting member 74 is increased. 再有,升降构件70未上升。 Further, the lifting member 70 does not increase. 升降构件74保持由从运送臂80交给的基片P并使其下降。 Elevating member 74 held by the lowered from the transport arm 80 to the substrate P and allowed. 由此,如图8(b)中所示,在板构件30的内侧配置保持了基片P的板构件30,由基片架PT(基片托PH)来保持。 Accordingly, as shown in (b), 8, inside the plate member 30 is disposed holding a substrate P of the plate member 30, is held by the substrate table PT (substrate holder PH). 然后,如图8(c)中所示,控制装置CONT利用液体供给机构10和液体回收机构20进行液体1的供给和回收,在由基片架PT保持的基片P 与投影光学系统PL之间形成液体1的液浸区域AR2。 Then, as shown in FIG. 8 (c), the control unit CONT by the liquid supply mechanism 10 and the liquid recovery mechanism 20 to supply and recover the liquid 1 on the substrate P by the projection optical system of holding the substrate table PT of PL formed between the liquid immersion area of ​​a liquid AR2. 然后,控制装置CONT经投影光学系统PL和液体1对基片P照射曝光光EL,一边移动支撑了基片P的基片台PST,一边进行液浸曝光。 Then, one pair of substrates irradiated with the exposure light beam EL P control unit CONT via projection optical system PL and the liquid, while moving the substrate stage PST supporting the substrate P, the liquid immersion exposure performed while.

[0106] 然后,在板构件30的疏液性还未恶化时,在液浸曝光的结束后,在使用液体回收机构20等回收了在基片P上或板构件30的平坦面30Α等上残留的液体1后,控制装置CONT 在解除了对于基片P的吸附保持后,如图8(d)中所示,使升降构件70上升。 [0106] Then, when the liquid-repellent plate member 30 has not deteriorated, after the liquid immersion exposure, the liquid recovery mechanism 20 and the like on the flat surface of the recovered substrate P or the like plate member 30 on the 30Α after remaining liquid 1, the control unit CONT is canceled, as shown in (d) for the adsorption 8 holding the substrate P, so that the lift member 70 rises. 此时,板构件30由基片架PT进行了吸附保持。 In this case, the plate member 30 is attracted and held by the substrate table PT. 升降构件70在支撑了基片P的下面的状态下上升。 Lifting the lower support member 70 following the rise in the substrate P state. 再有,此时,升降构件74不上升。 Further, at this time, the lifting member 74 does not rise. 由此,基片P从基片架PT离开。 Accordingly, the substrate P is separated from the substrate table PT. 然后,运送臂80进入利用升降构件70上升了的基片P与基片架PT之间,支撑基片P的下面。 Then, the arm 80 enters between the conveying member 70 by the lifting up of the substrate P and the substrate table PT, P is below the substrate support. 然后,运送臂80从基片架PT(基片台PST)运出基片P。 Then, the transport arm 80 from the substrate table PT (substrate stage PST) out of the substrate P.

[0107] 再有,作为运送臂80,可分别地设置用于运送板构件30的运送臂和用于运送基片P的运送臂,但如图9中所示,通过将运送臂80的支撑面80A形成得较大,可与基片P和板构件30这两者接触,由于可支撑基片P和板构件30这两者,故可用1个运送臂80运送基片P和板构件30这两者。 [0107] Further, as the conveyance arm 80, respectively, may be provided for transporting the plate member 30 and a transport arm for transporting the substrate P conveying arm, but shown in Figure 9, the support 80 by the transport arm surface 80A is formed to be large, 30 may be in contact with both the substrate P and the plate member, because both the 30 may support the substrate P and the plate member, it can be used a transport arm 80 transporting the substrate P and the plate member 30 both.

[0108] 如以上已说明的那样,由于设置成可更换在基片架PT上设置的疏液性的板构件30、32,故在该板构件30、32的疏液性恶化了时,只通过与新的板构件30、32更换,就可维持基片架PT上的疏液性。 When [0108] As already described above, since the liquid-repellent plate into a replaceable member disposed on the substrate table PT's 30 and 32, so that the liquid repellence of the plate member 30, 32 is deteriorated, only by replacement of the new plate member 30, 32, liquid repellency can be maintained on the substrate table PT.

[0109] 在为了使基片架PT上的板构件30、32的上面呈疏液性而涂敷疏液性材料或用疏液性材料形成板构件30、32的情况下,如果照射曝光光,则有时其疏液性恶化。 [0109] In order to make the plate member on the substrate table PT was 30, 32 above the case where the liquid repellency and liquid-repellent coating 30, 32 of material or a plate member formed with a liquid-repellent material, if the exposure light is irradiated , sometimes the liquid repellence thereof is deteriorated. 特别是在使用氟树脂作为疏液性材料、使用紫外光作为曝光光的情况下,该板构件30、32的疏液性容易恶化(容易亲液化)。 In particular, when the fluorine resin as a material lyophobic, ultraviolet light as the exposure light, the liquid repellence of the plate member 30, 32 tends to deteriorate (lyophilic easily). 于是,液体容易残留在板构件30、32上。 Thus, the liquid tends to remain on the plate member 30, 32.

[0110] 对次,在本实施形态中,在板构件30、32的疏液性恶化了时,与新的板构件30、32更换。 [0110] The time, in the present embodiment, when the liquid-repellent plate members 30, 32 is deteriorated, the plate member 30, 32 with new replacement.

[0111] 因而,可抑制液体1残留在基片架PT上,例如即使残留,也可使用液体回收机构20 等顺利地回收该液体1。 [0111] Accordingly, the liquid 1 can be suppressed remaining on the substrate table PT, for example, even residual, also may use liquid recovery mechanism 20 and other liquid 1 recovered smoothly. 因而,可防止起因于残留的液体1的曝光精度的恶化,制造出具有所需性能的器件。 Thus, the deterioration of the exposure accuracy can be prevented due to the residual liquid 1, for manufacturing a device having desired properties.

[0112] 此外,通过与基片P —起相对基片架PT运入和运出在基片P的周围具有平坦面30A的板构件30,可容易地与基片P —起对基片架PT更换板构件30。 [0112] Further, by the substrate P - from opposing substrate table PT transported into and out of the plate member having a flat surface 30A around the substrate P 30 can be easily and the substrate P - from the substrate holder to replace the plate member 30 PT. 此外,由于板构件30 在基片P的周围具有平坦面30A,故在与基片P —起将该板构件30运入到基片架PT上对基片P的边缘区域E进行液浸曝光时,即使液体1的液浸区域AR2的一部分在基片P的外侧伸出,也可利用平坦面30A维持液浸区域AR2的形状,可在投影光学系统PL的像面一侧良好地保持液体1的状态下进行液浸曝光而不导致液体1的流出等。 Further, since the plate member 30 has a flat surface 30A around the substrate P, and the substrate so that the P - from the plate member 30 is carried into the substrate table PT edge area E of the substrate P, liquid immersion lithography when a part of the liquid immersion area AR2, even when the liquid 1 at the outside of the substrate P is projected, may also be utilized to maintain the shape of the flat surface 30A of the liquid immersion area AR2, the liquid can be satisfactorily held on the image plane side of the projection optical system PL. liquid immersion exposure in a state without causing an outflow of the liquid 1 or the like.

[0113] 而且,由于在板构件30的内侧设置内侧台阶部30D,形成支撑面30S,可支撑基片下面PC的边缘部,故只保持并移动板构件30,就可与该板构件30 —起也移动基片P。 [0113] Further, since the plate member 30 is provided inside the inner stepped portion 3OD, forming a support surface 30S, the following PC may support the substrate edge portion, so that only the holding member 30 and the moving plate, the plate member 30 can - moving the substrate P. since also 此外, 由于因内侧台阶部30D的缘故,在板构件30与基片P之间的间隙中,在剖面视图中形成弯曲的角部,故即使假定液体1侵入到板构件30与基片P之间的间隙A中,弯曲的角部也起到密封部的功能,可防止该液体1侵入到基片P的背面PC —侧或基片台PST (基片托PH) 内部的不良情况。 Further, since the inner stepped portion 30D because of the reason, the gap between the plate member 30 and the substrate P to form a bent corner portions in the sectional view, so that even assuming the liquid 1 enters the plate member 30 and the substrate P a gap between the curved corner portion functions as a sealing portion is also prevented from entering a rear surface PC of the substrate P and the liquid - side or the substrate stage PST (substrate holder PH) of internal defects. 再者,由于对基片P的侧面PB也进行了疏液处理,故可更良好地防止来自基片P的侧面PB与板构件30之间的间隙A的液体1的侵入。 Further, since the side surface PB of the substrate P is liquid-repellent treatment is also performed, it can be more satisfactorily prevented from entering the gap A between the plate member from the side surface PB of the substrate P, the liquid 1 30.

[0114] 此外,通过使基片P的背面PC和与其对置的周壁部33的上面33A呈疏液性,可防止液体1经间隙B侵入到第1空间38中的不良情况。 [0114] Further, by making the back surface PC of the substrate P and its upper peripheral wall 33A of the opposing portion 33 as a liquid-repellent, the liquid 1 is prevented from entering through the gap B the first space 38 in the case of failure. 因而,可避免液体1流入到吸引口41中的不良情况的发生,可在良好地吸附保持基片P的状态下进行曝光处理。 Accordingly, the liquid 1 flows to avoid occurrence of problems in the suction port 41, the exposure process can be performed in a state holding the substrate P in a well adsorbed.

[0115] 此外,在本实施形态中,通过对可对于基片架PT装卸的基片托PH的背面58或基片架PT中与基片托PH的接触面57进行疏液处理,即使在液体1流入到第2空间39中的情况下,也可抑制液体1对于基片托PH的背面58与Z台52的接触面57之间的流入。 [0115] Further, in the present embodiment, the back surface can holder PH with respect to the substrate table PT detachably substrate 58 or the substrate table PT, and substrate holder PH contact surface liquid-repellent process 57, even in a case where the liquid 1 flows into the second space 39, can be suppressed to a back surface of the substrate holder PH liquid 57 flows between the Z stage 58 and the contact surface 52. 因而,可防止基片托PH的背面58或基片架PT的接触面57中的锈蚀的发生等。 Accordingly, the substrate holder PH is possible to prevent the back 58 of the contact surface 57 or the like occurs substrate table PT in corrosion. 此外,如果液体1流入到基片托PH的背面58与基片架PT的接触面57之间,则产生基片托PH与Z台52 粘接而难以分离的状况,但通过使其呈疏液性而容易分离。 Further, if the liquid 57 between the substrate 1 flows into the holder 58 and the contact surface of the back surface of the substrate table PT PH is generated if the substrate holder PH and the Z stage 52 is difficult to separate the bonding conditions, but it was by sparse easily separated from the liquid. [0116] 此外,作为用于对基片架PT装卸板构件30的装卸机构,由于设置了作为升降装置的升降构件74及作为吸附保持板构件30的吸附保持装置的吸附孔72,故可顺利地进行板构件30的更换作业,可在基片架PT上良好地保持更换后的新的板构件30。 [0116] Further, as a mechanism for handling the substrate table PT detachable plate member 30, since the elevation member is provided as a lifting device 74 and the suction as the suction opening 30 of the holding plate member holding means 72, it can be successfully replacement work of the plate member 30 can be satisfactorily held new plate member 30 after the exchange on a substrate table PT.

[0117] 此外,通过在第2板构件32的内侧形成内侧台阶部32D,在板构件30的外侧形成外侧台阶部30F,由于在板构件30与第2板构件32之间的间隙中在剖面视图中也形成弯曲的角部,故即使液体1从间隙G侵入,弯曲的角部也起到密封部的功能,可防止液体1到达基片架PT内部的不良情况。 [0117] Further, by forming the inner stepped portion 32D at the inner side of the second plate member 32, the outer stepped portion 30F is formed at the outer plate member 30, since the cross section of the gap 32 between the plate member 30 and the second plate member, view also forms a curved corner portion, so that even if the liquid 1 from entering the gap G, the bent corner portions also functions as a sealing portion, a liquid is prevented from reaching the substrate table PT to the internal defect.

[0118] 此外,由于用第2板构件32的内侧台阶部32D支撑板构件30的外侧台阶部30F, 故如果用基片架PT吸附保持第2板构件32,则因板构件30由第2板构件32来支撑,故可不由基片架PT来保持。 [0118] Further, since the plate member with the second inner stepped portion 32D of the support plate member 30 of the outer stepped portion 30F, so if the substrate table PT by suction holding member 32 of the second plate 32, due to the plate member 30 from the second to support the plate member 32, it may not be held by the substrate table PT. 因此,如图10中示出的示意图那样,可在基片架PT中与板构件30 对置的区域中形成空间部(槽)130,可谋求基片架PT(基片台PST)的轻量化。 Thus, in the schematic shown in FIG. 10 as the plate member 30 is formed with a space portion (groove) in the region opposed to the substrate table PT 130, may seek the substrate table PT (substrate stage PST) light quantify.

[0119] 此外,由于是在用板构件30保持了基片P的状态下用运送臂80运送的结构,故用板构件30支撑基片P的比较宽的区域。 [0119] Further, since the structure of the conveyance holding arm 80 conveyed in the state of the substrate P with the plate member 30, so that a relatively wide region 30 supports the substrate P with the plate member. 因而,即使例如基片P的尺寸较大,通过在用板构件30保持了的状态下来运送,也可抑制基片P的挠曲(翘曲)。 Thus, for example, even if the size of the substrate P is large, transport through the holding plate member 30 of the down state, the deflection can be suppressed substrate P (warpage).

[0120] 再有,在第2板构件32的平坦面32Α的疏液性恶化、更换第2板构件32的情况下, 由于第2板构件32支撑板构件30,故可在基片P的液浸曝光结束后使用运送臂80 —起运出基片P和板构件30。 [0120] Further, the lyophobic deteriorated second plate member having a flat surface 32 32Α, the replacement of the second plate member case 32, since the second plate member 32 supports the plate member 30, it can be in the substrate P after completion of the liquid immersion exposure using the transport arm 80-- departure that the substrate P and the plate member 30. 在该情况下,也可与升降构件74同样地设置用于升降第2板构件32 的升降构件。 In this case, also it is used for lifting the second plate member and the elevating member 32 elevating member 74 disposed in the same manner. 此外,也可分别运出和运入板构件30和第2板构件32而不设置第2板构件32的内侧台阶部32D。 Further, each may be transported into and out of the plate member 30 and the second plate member 32 without providing the second plate member 32 of the inner stepped portion 32D. 在该情况下,可再设置用于运出和运入第2板构件32的运送机构。 In this case, it can be provided for removal and then carried into the conveyance mechanism 32 of the second plate member.

[0121] 再有,如上所述,根据平坦面30Α、32Α的疏液性的恶化来决定板构件30、32的更换的定时。 [0121] Further, as described above, according to the flat surface 30Α, deterioration of liquid-repellent 32Α decided to replace the plate members 30, 32 of the timing. 作为更换板构件30、32的定时,例如可按每规定基片处理片数或每规定时间间隔等预先确定的规定间隔更换板构件30、32。 Predetermined as the predetermined timing of replacement of the plate member 30, 32, for example, every predetermined number of sheets or the substrate processing every predetermined time interval replace the plate members 30, 32 at equal intervals. 或者,可利用实验或模拟预先求出曝光光EL的照射量(照射时间、照度)与板构件30、32的疏液性水平的关系,根据该已求出的结果,设定更换板构件30、32的定时。 Alternatively, using an experiment or simulation obtaining a relationship between the level of liquid repellency of the exposure light beam EL irradiation dose (irradiation time, illuminance) of the plate member 30, 32, this result has been obtained, the plate member 30 is set to replace timing 32. 例如可通过用显微镜或目视来观察平坦面30Α、32Α等、在评价面上垂下液滴,用目视或显微镜观察液滴的状态、或测定液滴的接触角来进行疏液性的恶化的评价。 For example, a flat surface was observed by 30Α, 32Α visually or with a microscope and the like, suspended in the evaluation of surface droplets, droplet state was observed visually or by a microscope, or the contact angle of the droplet to the deterioration of the liquid repellence evaluation of. 通过用与曝光光等的紫外线的累积照射量的关系预先在控制装置CONT中记录了这样的评价,根据该关系,控制装置CONT可决定板构件30、32等的寿命、即更换时间(时期)。 The relationship of cumulative exposure to ultraviolet exposure light such as a previously recorded this evaluation in the control unit CONT in this relationship, the control unit CONT can determine the life of the plate like member 30, 32, i.e., replacement time (period) .

[0122] 此外,曝光装置EX使用可检测在投影光学系统PL的一侧照射的曝光光EL的强度的积分传感器(未图示),可求出对板构件30、32照射的曝光光EL的累积照射量。 [0122] Further, using the exposure apparatus EX integrator sensor (not shown) detects the intensity of the exposure light EL is irradiated side of the projection optical system PL, the exposure can be obtained on the plate member 30, 32 of the irradiation light beam EL cumulative exposure. 由于控制装置CONT根据使用激光干涉计56检测的基片台PST的位置信息和使用积分传感器检测的曝光光EL的强度信息,可检测对板构件30或第2板构件32照射的曝光光EL的强度与照射时间(照射脉冲数),故根据该检测结果可求出对板构件30或第2板构件32照射的曝光光EL的累积照射量。 Since the control unit CONT interference exposure position counter 56 detects the substrate stage PST and information using an integral sensor for detecting light EL intensity information in accordance with a laser, may detect the exposure plate member 30 or the second plate member 32 irradiated light beam EL intensity and irradiation time (irradiation pulse number), it is based on the detection result of the cumulative exposure of the plate member 30 or the irradiated with the exposure light EL 32 of the second plate member can be determined. 再有,检测曝光光EL的强度的积分传感器,例如在美国专利第5,728,495号公报或美国专利第5,591,958号公报中公开了,只要在本国际申请中指定或选择的国的法令中容许,引用这些文献的记载内容,作为本文的记载的一部分。 Further, the detection sensor integrated EL intensity of light exposure, for example, disclosed in U.S. Patent Publication No. 5,728,495 or U.S. Patent Publication No. 5,591,958, designated or selected in this international application is country's laws permit, citing record contents of these documents, as part of the record of this article.

[0123] 在本实施形态中,控制装置CONT根据板构件30、32的上面30Α、32Α中的液体的接触角来判断是否需要更换板构件30、32。 [0123] In the present embodiment, the control unit CONT judges The upper plate member 30, 32 30Α, the contact angle of the liquid in 32Α plate member 30, 32 needs to be replaced. 例如,根据板构件30、32的使用时间或紫外光的累积照射量等,在推断为液体的接触角下降到小于等于规定角度(例如100° )的情况下,判断为必须更换板构件30、32。 For example, the cumulative exposure time like the plate member 30, 32 or ultraviolet light, inferred in liquid contact angle decreased to a case where a predetermined angle or less (e.g., 100 °), it is determined necessary to replace the plate member 30, 32. 或者,根据板构件30、32的使用时间或紫外光的累积照射量等,在推断为板构件30、32的表面30A、32A中的液体1的接触角比初始状态下降了大于等于规定角度(例如10° )的情况下,判断为必须更换板构件30、32。 Alternatively, the cumulative exposure time like the plate member 30, 32 or ultraviolet light, the inference. 30A, 32A of the liquid contact angle of not less than 1 decreases the predetermined angle from the initial state of the surface of the plate member 30, 32 ( for example, 10 °), it is determined as the plate members 30, 32 must be replaced.

[0124] 再有,也可不用曝光装置EX的控制装置CONT来判断板构件30、32等的疏液性的恶化,例如将设置了曝光装置EX的工厂等的主计算机和曝光装置EX连接成可交换各种数据,用该主计算机来判断。 [0124] Further, the control unit CONT may need to determine the exposure apparatus EX deterioration of liquid-repellent plate members 30, 32 such as, for example, the exposure apparatus EX is provided a factory or the like and a host computer connected to the exposure apparatus EX exchangeable various data judged by the host computer.

[0125] 此外,在液体回收机构20的液体回收能力高的情况下,由于存在即使板构件30、 32的疏液性恶化也可充分地回收液体的可能性,因此在决定板构件30、32等的更换时期时,也可以考虑液体回收机构20的液体回收能力与疏液性的恶化(接触角的下降)的关系。 [0125] Further, at a high liquid recovery mechanism 20 of the liquid recovery capacity of the case, since there is the possibility of deterioration of liquid repellence even when the plate member 30, 32 can be sufficiently recovered liquid, therefore the decision in the plate member 30, 32 when the exchange time, etc., may also consider the relationship of the liquid recovery capacity of the liquid recovery mechanism 20 and the deterioration of the liquid repellence (decrease in contact angle) is.

[0126] 此外,由于疏液性的恶化的速度或恶化的程度不仅随曝光光EL的照射时间而不同,而且随付与疏液性的材料、液体、曝光波长温度等的要素而不同,故最好与这些要素一起准备评价数据。 [0126] Further, since the liquid repellency of the rate of deterioration or the degree of deterioration of not only the irradiation time of light beam EL with the exposure varies, and with imparting liquid-repellent material, a liquid, the exposure wavelength and temperature elements differ, so most and ready to evaluate data with these elements. 关于以下所述的被赋予疏液性的其它的构件的更换时期,也是同样的。 About exchange time of the other member of the liquid repellency is imparted, it is the same.

[0127] 再有,在本实施形态中,利用作为疏液性材料的聚四氟乙烯形成板构件30、32,但当然也可利用其它的具有疏液性的材料来形成。 [0127] Further, in the present embodiment, used as the lyophobic material is polytetrafluoroethylene plate member 30, 32 is formed, but of course also be formed using other material having the liquid repellence. 此外,也可例如用规定的金属等形成板构件30、32,在该金属制的板构件30的表面上涂敷具有疏液性的疏液性材料(聚四氟乙烯等的氟化物)。 Further, for example, may be a predetermined metal or the like with a plate member 30, 32 is formed, the coating liquid-repellent material (fluoride such as polytetrafluoroethylene) having a lyophobic property on the surface of the metal plate member 30. 此外,作为疏液性材料的覆盖区域,可涂敷在板构件30、32的全部表面,也可只涂敷例如平坦面30A等必须有疏液性的一部分的区域。 Further, as the coverage area of ​​the liquid-repellent material may be applied to the entire surface of the plate member 30, 32 may also be applied only to the flat surface 30A and the like, for example, be a region of a portion of the liquid repellence.

[0128] 当然,可用不同的构件设置板构件30和第2板构件32,也可使用不同的疏液性材料来涂敷。 [0128] Of course, using different plate member disposed member 30 and the second plate member 32, may be used various materials to coat the lyophobic. 此外,板构件30和第2板构件32的全部的表面没有必要以均勻的水平具有疏液性,可部分地设置疏液性强的部分。 Further, the entire surface of the plate member 30 and the second plate member 32 is not necessary to have a uniform level of the liquid repellence, it may be partially provided strong lyophobic part. 此外,板构件30和第2板构件32的全部的表面没有必要具有同样的疏液性的恶化耐久性,与其它的部分相比,可强化曝光光的照射量多的部分的恶化耐久性。 Further, the entire surface of the plate member 30 and the second plate member 32 need not have the same durability deterioration of the liquid repellence, as compared with other portions, can enhance the exposure light irradiation amount more deteriorated durability portion. 例如,板构件30的表面的恶化耐久性最好比第2板构件32的表面的恶化耐久性强。 For example, the deterioration of the durability deterioration of the surface of the plate member 30 is preferably longer than the surface of the second plate member 32 is strong durability.

[0129] 在本实施形态中,说明了在更换板构件30时与基片P —起运出板构件30,当然也可对于基片架PT只运入和运出板构件30。 [0129] In the present embodiment, the plate member described in the replacement with the substrate 30 when P - FOB plate member 30 a plate member, of course, may be provided only for carrying in and out of the substrate table PT 30.

[0130] 此外,在本实施形态中可使用升降构件74和运送臂80来更换板构件30,但升降构件74或能运送板构件30的运送臂80不是必须的,操作者可用手动来更换板构件30。 [0130] Further, in the present embodiment may be used in the lifting member 74 and the transport arm 80 to replace the plate member 30, the lifting member 74 and capable of transporting the plate member conveying arm 30 80 is not necessary, the operator can manually replace board member 30. 此夕卜,在上述的实施形态中,分别一体地设置了板构件30和第2板构件32,但也可分割该板构件30和第2板构件32,可部分地更换。 Bu this evening, in the embodiment described above, are integrally provided with plate member 30 and the second plate member 32, but also divides the plate member 30 and the second plate member 32, may be partially replaced. 由此,也可频繁地只更换疏液性的恶化剧烈的部分。 Thus, replacement may be only severe deterioration of liquid-repellent part frequently.

[0131] 或者,也可将板构件30和第2板构件32作为一个板构件来形成,保持在基片架PT上。 [0131] Alternatively, the plate member may be 30 and the second plate member 32 is formed as a plate member, held on the substrate table PT.

[0132] 再有,在本实施形态中,从图5可明白,基片托PH和基片架PT可装卸,但也可与基片架PT —体地设置基片托PH。 [0132] Further, in the present embodiment, it can be appreciated from FIG. 5, the substrate holder PH and the substrate table PT can be detachable, but may also be the substrate table PT - holder PH, the substrate body is provided.

[0133] 再有,在本实施形态中,在基片P的表面PA、侧面PB和背面PC的整个面上为了进行疏液处理而涂敷了感光材料90,但也可以是只对形成间隙A的区域、即基片P的侧面PB 和形成间隙B的区域、即基片P的背面PC中与周壁部33的上面33A对置的区域进行疏液处理的结构。 [0133] Further, in the present embodiment, the surface PA of the substrate P, the entire surface of the side surface PB and the back surface PC of the liquid-repellent treatment to the photosensitive material 90 is applied, but may be formed only on the gap region a, i.e., the side surface PB of the substrate P and the formation of a gap region B, i.e., the back surface PC of the substrate P in structural lyophobic treatment region opposed to the upper portion 33 of the peripheral wall 33A. 再者,如果间隙A充分小,此外为了进行疏液处理而涂敷的材料的疏液性(接触角)充分大,则由于液体1经间隙A流入到第2空间39中的可能性进一步降低,故也可以是不对形成间隙B的基片P的背面PC进行疏液处理而只对基片P的侧面PB进行疏液处理的结构。 Further, if the gap A is sufficiently small, in addition to liquid-repellent treatment liquid-repellent coating material (contact angle) is sufficiently large, the liquid 1 is further reduced due to the possibility of flowing into the second space 39 through the gap A , it may be a gap does not form a structure of the back surface PC of the substrate P is liquid-repellent treatment B only the side surface PB of the substrate P is liquid-repellent treatment. 当然,也可使用对表面PA、侧面PB和背面PC全都未进行疏液处理的基片P。 Of course, also possible to use the surface of the substrate P. PA, PB and the back surface side is not performed all PC lyophobic treatment

[0134] 再有,在本实施形态中,周壁部33的高度比支撑部34的高度低、在基片P的背面PC与周壁部33的上面33A之间形成了间隙B,但基片P的背面PC与周壁部33的上面33A 也可接触。 [0134] Further, in the present embodiment, the height of the peripheral wall portion 33 is lower than the height of the support portion 34, above the substrate P in the rear surface PC and the circumferential wall portion 33 is formed a gap B between. 33A, but the substrate P the back surface PC may be in contact with the upper portion 33 of the peripheral wall 33A.

[0135] 在本实施形态中,作为基片P的侧面PB和背面PC的疏液处理,涂敷了具有疏液性的感光材料90,但也可涂敷感光材料90以外的具有疏液性(疏水性)的规定的材料。 [0135] In the present embodiment, and a side surface PB of the substrate P liquid-repellent treatment to the back surface PC, coated with the photosensitive material 90 having the liquid repellence, but may also be coated with the photosensitive material 90 is other than a lyophobic predetermined material (hydrophobicity). 例如,有时在作为基片P的曝光面的表面PA上涂敷的感光材料90的上层涂敷称为顶部涂层的保护层(保护感光材料90使之不受液体的影响的膜),而该顶部涂层的形成材料(例如氟树脂材料)例如以接触角约110°具有疏液性(疏水性)。 For example, sometimes the upper layer coating is applied on the surface PA as the exposure surface of the substrate P is referred to as the photosensitive material 90 of the protective top coat layer (protective photosensitive material 90 so that the film is not affected by the liquid), and for example, a material (e.g., fluororesin material) of the top coat layer to have a contact angle of about 110 ° liquid repellent (hydrophobic). 因而,也可在基片P的侧面PB 和背面PC上涂敷该顶部涂层形成材料。 Thus, the top coat may be coated with material is formed on a side surface PB of the substrate P and the back surface PC. 当然,也可涂敷感光材料90或顶部涂层形成用材料以外的具有疏液性的材料。 Of course, also be coated with the photosensitive material 90 or top coat-forming material having the liquid repellence other than the material.

[0136] 此外,在本实施形态中,作为基片架PT或基片托PH的疏液处理,涂敷氟树脂材料或丙烯酸树脂材料等,但也可在基片架PT或基片托PH上涂敷上述感光材料或顶部涂层形成材料,相反,也可在基片P的侧面PB或背面PC上涂敷在基片台PST或基片托PH的疏液处理中使用的材料。 Lyophobic treatment, a fluorine resin coating material or an acrylic resin material or the like [0136] Further, in the present embodiment, as the substrate table PT or the substrate holder PH, but also the substrate holder PH, or the substrate table PT or a photosensitive material coated on the above top coat material is formed, on the contrary, it can be applied to liquid-repellent treatment of the substrate stage PST or the substrate holder PH in the material used in the side surface PB of the substrate P or the back surface PC.

[0137] 为了防止液浸区域AR2的液体1浸透到感光材料90中而设置上述顶部涂层的情况较多,但例如即使在顶部涂层上形成液体1的附着痕迹(所谓水迹),通过在液浸曝光后除去该顶部涂层,也可在与顶部涂层一起除去了水迹后进行显影处理等的规定的工艺处理。 [0137] in many cases in order to prevent the liquid immersion area AR2 of the liquid 1 impregnated into the photosensitive material 90 is provided above a top coat layer, but for example, a liquid forming an adhesion trace (so-called water mark) on top of the coating layer even, by removing the top coat after the liquid immersion exposure, it can be removed with a top coat for a predetermined treatment process or the like after the development processing with water stains. 在此,在由氟树脂材料形成顶部涂层的情况下,可使用氟类溶剂来除去。 Here, in the case where the material is formed of a fluororesin topcoat, can be removed using a fluorine-based solvent. 由此,不需要用于除去水迹的装置(例如水迹除去用基片清洗装置)等,用由溶剂除去顶部涂层这样的简易的方式,就可在除去了水迹后良好地进行规定的工艺处理。 This eliminates the need for means for removing traces of water (e.g., water washed to remove traces device substrate) and the like, the solvent was removed with a simple embodiment of such a topcoat, it can be removed after a predetermined good watermarks treatment process.

[0138] 再有,在上述的实施形态中,用真空吸附方式在基片架PT上保持了板构件30、32, 但也可使用电磁夹持机构等其它的夹持机构。 [0138] Further, in the embodiment described above, by the vacuum attraction holding plate member 30, 32 on the substrate table PT, it is also possible to use other clamping mechanism clamping an electromagnetic mechanism or the like.

[0139]〈第2实施形态〉 [0139] <Second Embodiment>

[0140] 其次,说明本发明的其它的实施形态。 [0140] Next, other embodiments of the present invention. 在以下的说明中,对于与上述的实施形态为同一或同等的结构部分附以同一符号,简化或省略其说明。 In the following description, the embodiment described above with the same or equivalent are denoted by the same reference numerals moiety simplified or omitted.

[0141] 图11是示出对基片架PT(基片台PST)装卸的基片托PH的图,图11(a)是侧剖面图,图11(b)是从上方看取下了基片托PH后的基片架PT的平面图。 [0141] FIG. 11 is a diagram for illustrating the substrate table PT (substrate stage PST) detachably substrate holder PH, and FIGS. 11 (a) is a side sectional view of FIG. 11 (b) is removed from above See after the substrate holder PH PT plan view of the substrate holder.

[0142] 如图11中所示,基片架PT在其上面(对于基片托PH的保持面)具备:可嵌合基片托PH的凹部157 ;在凹部157内部设置的、吸附保持在凹部157中配置的基片托PH的多个真空吸附孔158 ;以及在凹部157内部设置的后述的流路159。 [0142] As shown in FIG. 11, the substrate table PT thereon (substrate holder PH for holding surface) comprising: a substrate holder PH is fitted to the recess portion 157;, adsorbed and held inside the concave portion 157 provided a plurality of the substrate holder PH arranged in the recess portion 157 of the vacuum holes 158; and a rear concave portion 157 is provided in the interior of said flow path 159. 通过将基片托PH嵌合到凹部157中,对基片架PT和基片托PH进行定位。 , Of the substrate table PT and the substrate holder PH are positioned by the substrate holder PH is fitted into the recess 157. 真空吸附孔158构成了保持在凹部157 中配置的基片托PH的夹持机构的一部分,连接到未图示的真空装置上。 Vacuum suction hole 158 forms a part of the substrate holder PH is maintained at the clamping mechanism 157 disposed in the recess, connected to a vacuum device not shown. 利用控制装置CONT 来控制真空装置的驱动。 The drive control unit CONT controls the vacuum apparatus. 控制装置CONT控制真空装置,经真空吸附孔158进行基片架PT 的对于基片托PH的吸附保持和解除保持。 The control unit CONT controls the vacuum apparatus, the adsorption of the substrate table PT for the substrate holder PH is held by vacuum suction holes 158 and release the hold. 通过解除保持,可进行基片托PH与基片架PT的分离,可更换基片托ΡΗ。 By releasing the holding, the substrate holder PH may be separable from the substrate table PT and the substrate holder can be replaced ΡΗ.

[0143] 再有,在此,说明了基片架PT对基片托PH进行真空吸附保持,但也可利用电磁夹持机构等其它的夹持机构来保持基片托PH和解除基片托PH的保持。 [0143] Further, in this description the substrate table PT on the substrate holder PH for holding the vacuum suction, but may use other electromagnetic clamping mechanism clamping mechanism or the like holding the substrate holder PH and the substrate holder lifting PH is maintained. 此外,在此,说明了使用凹部157进行基片架PT和基片托PH的定位,但例如也可作成以光学的方式检测基片托PH和基片架PT的位置关系、根据该检测结果对于基片架PT将基片托PH定位在规定的位置上的结构。 Further, here, describes the use of recesses 157 positioned substrate table PT and the substrate holder PH, but for example, may be made to optically detect a positional relationship between the way the substrate holder PH and the substrate table PT, based on the detection result the substrate table PT for the substrate holder PH is positioned at a predetermined position on the structure of.

[0144] 此外,基片托PH具有:用于配置基片P的凹部150 ;以及与在凹部157中配置的基片P的表面大致为同一面的平坦面30A。 [0144] In addition, the substrate holder PH has: a recess 150 is disposed the substrate P; and a surface of the substrate P arranged in the recess 157 is substantially flush with the flat surface 30A. 在基片P的周围以环状设置了平坦面30A。 In the periphery of the substrate P is provided in an annular flat surface 30A. 在平坦面30A的周围,形成了比该平坦面30A高的侧壁部151。 Around the flat surface 30A is formed higher than the flat surface 30A of the side wall portion 151. 在平坦面30A的周围连续地以环状形成了侧壁部151,在该侧壁部151的内侧(基片P上或平坦面30A上)可保持液体1。 To form a continuous annular sidewall portion 151 around the flat surface 30A of the liquid 1 can be held inside the side wall portion 151 (on the substrate P or on the flat surface 30A).

[0145] 例如利用聚四氟乙烯等具有疏液性的材料形成了基片托PH。 [0145] For example, a substrate holder PH by using polytetrafluoroethylene material having the liquid repellence. 再有,也可例如用规定的金属形成基片托PH,在该金属制的基片托PH中至少对于平坦面30A涂敷具有疏液性的疏液性材料(聚四氟乙烯等)。 Further, for example, may be formed of metal with a predetermined substrate holder PH, is applied to the flat surface 30A having a liquid-repellent least lyophobic material (polytetrafluoroethylene) the metal of the substrate holder PH. 当然,也可在金属制的基片托PH的表面的整个区域中涂敷疏液性材料。 Of course, also the entire front surface of the holder PH liquid repellency of the coating material in the substrate metal.

[0146] 运送臂80可运送从基片架PT取下的基片托PH。 [0146] transport arm 80 can be removed from the substrate conveying the substrate table PT holder PH. 例如,运送臂80从基片架PT (基片台PST)运出(卸载)保持进行了曝光处理后的基片P的基片托PH,在将基片托PH与另夕卜的基片托PH进行了更换后,将该基片托PH运入(装载)到基片架PT上。 For example, the transport arm 80 from the substrate table PT (substrate stage PST) transported out (unloaded) was the substrate holder PH substrate P after the exposure process, when the substrate holder PH and the other Xi Bu substrate after holder PH were replaced, the carrying in the substrate holder PH (loaded) onto the substrate table PT. 此外,运送臂80在将基片托PH运入到基片架PT上时,可只运入基片托PH,也可运入保持了曝光处理之前的基片P的基片托PH。 In addition, the transport arm 80 when the substrate holder PH on the substrate carry-frame PT, may only be carried into the substrate holder PH, may be brought into the substrate holder PH holding a substrate P before the exposure processing.

[0147] 图12是示出基片托PH的图,图12(a)是侧剖面图,图12(b)是从上方看的平面图。 [0147] FIG. 12 is a diagram illustrating the substrate holder PH, and FIG. 12 (a) is a side sectional view of FIG. 12 (b) is a plan view from above.

[0148] 在图12中,基片托PH具备:可保持上述的液体1的侧壁部151 ;在凹部150的底面部PHT上形成的多个凸部161 ;以及在凸部161的上端面上形成的真空吸附孔162。 [0148] In FIG. 12, the substrate holder PH includes: holding said side wall portion 151 of the liquid 1; the plurality of protrusions 161 formed on the bottom surface portion PHT of the recess 150; and an upper end surface of the projecting portion 161 vacuum suction holes 162 formed. 凸部161的上端面是平坦面,基片托PH在用多个凸部161的上端面支撑基片P的同时,经真空吸附孔162吸附保持基片P。 Upper end surface of the convex portion 161 is a flat surface, the substrate holder PH on the end surface of the supporting substrate P simultaneously with a plurality of convex portions 161, suction through the vacuum holes 162 holding the substrate P. 在此,在基片托PH的凹部150的底面部PHT的多个规定位置上分别设置了凸部161,以使基片P不挠曲。 Here, a predetermined plurality of bottom surface portion PHT of the recess 150 of the portion of the substrate holder PH positions the convex portions 161 are provided, so that the substrate P is not flexed. 通过用凸部161支撑基片P,在基片P与基片托PH的底面部PHT之间形成分离部164。 By convex portion 161 supports the substrate P, between the substrate P and the substrate holder PH is separated from the bottom surface portion PHT 164 is formed. 再有,在本实施形态中,基片托PH的平面视图形状是大致圆形,但也可以是矩形。 Further, in the present embodiment, the plan view shape of the substrate holder PH is substantially circular, but may be rectangular.

[0149] 此外,在连接基片架PT与基片托PH时,基片托PH的真空吸附孔162经在基片托PH中形成的流路162A连接到在基片架PT的上面设置的流路159(参照图11(b))上。 [0149] Further, when connecting the substrate table PT and the substrate holder PH, the substrate holder vacuum holes PH 162 channel 162A via formed in the substrate holder PH are connected to a top of the substrate table PT is the flow passage 159 (see FIG. 11 (b)) on. 流路159连接到真空装置上,控制装置CONT通过驱动真空装置,经基片架PT的流路159、基片托PH的流路162A和真空吸附孔162吸附保持由凸部161支撑的基片P。 The flow passage 159 connected to a vacuum device, the control unit CONT drives the vacuum means through the flow path of the substrate table PT 159, the flow passages 162A of the substrate holder PH, and the vacuum suction holes 162 sucking and holding the substrate supported by the projecting portion 161 P. 在此,在流路162A 中分别设置了由根据控制装置CONT的控制来驱动的电磁阀等构成的阀部162B,可对流路162A的打开、关闭工作进行遥控操作。 Here, the flow path 162A are provided in the valve portion by a solenoid valve, etc. The control unit CONT drives constituted 162B, 162A of the flow path may be opened, closed, remote operation work. 控制装置CONT在驱动了真空装置时控制阀部162B 打开流路162A,在停止了真空装置时关闭流路162A。 The control unit CONT drives the control valve unit when the vacuum means 162A 162B open the flow passage, closes the flow channel 162A when the vacuum unit is stopped. 因而,在经真空吸附孔162的对于基片P的吸引工作后,通过在停止真空装置的驱动的同时利用阀部162B关闭流路162A,维持流路162A的负压。 Accordingly, the vacuum suction holes 162 of the suction operation for the substrate P, by stopping the vacuum device is driven simultaneously by the valve closes the flow passage portion 162B 162A, 162A of the flow path to maintain a negative pressure. 因而,在分离了基片架PT与基片托PH时,通过使流路162A为负压,也可维持基片托PH对于基片P的吸附保持。 Thus, when separating the substrate table PT and the substrate holder PH, the flow passages 162A by a negative pressure, can maintain the substrate holder PH for holding the substrate P adsorption.

[0150] 其次,一边参照图13的示意图,一边说明具有上述的结构的曝光装置EX的工作。 [0150] Next, with reference to the schematic diagram of FIG. 13, while the work described exposure apparatus EX having the above structure.

[0151] 如图13(a)中所示,利用运送臂(运送装置)80将保持了作为曝光处理对象的基片P的基片托PH与基片P—起运入到基片架PT上。 [0151] As shown in FIG. 13 (a), using a transfer arm (conveying means) 80 holding the processing object as the exposure of the substrate P and the substrate holder PH shipment P- substrate into the substrate table PT . 如图13(b)中所示,将基片托PH配置成与在基片架PT上设置的凹部157嵌合,保持在具有真空吸附孔158 (图11)的夹持机构上。 As shown in FIG. 13 (b), the substrate holder PH arranged in a concave portion 157 provided on the fitted substrate table PT, held by the clamping mechanism having the vacuum suction holes 158 (FIG. 11). 然后,控制装置CONT驱动真空装置,经流路159、流路162A和真空吸附孔162对基片P 进行真空吸附保持(再有,在图13中未图示)。 Then, the control unit CONT drives the vacuum unit, vacuum suction holder through the flow path 159, the flow path 162A and the vacuum suction hole 162 of substrates P (Further, not shown in FIG. 13). 此时,阀部162B打开流路162A。 At this time, the valve opens the flow passage portion 162B 162A. 然后,如图13 (c)中所示,控制装置CONT利用液体供给机构10和液体回收机构20进行液体1的供给和回收,在基片架PT上经基片托PH保持的基片P与投影光学系统PL之间形成液体1的液浸区域AR2。 Then, as shown in FIG. 13 (c), the control unit CONT by the liquid supply mechanism 10 and the liquid recovery mechanism 20 to supply and recover the liquid 1 on the substrate P held by the substrate table PT after the substrate holder PH and forming the liquid immersion area AR2 of the liquid 1 between the projection optical system PL. 然后,控制装置CONT经投影光学系统PL和液体1在基片P上照射曝光光EL, 一边移动在基片架PT (基片台PST)上经基片托PH保持的基片P,一边进行液浸曝光。 Then, the control unit CONT via a projection optical system PL and the liquid 1 is irradiated with the exposure light EL onto the substrate P, while moving the substrate P on substrate table PT (substrate stage PST) held by the substrate holder PH, while for liquid immersion exposure. 此时,由于利用吸附保持了的基片P堵塞真空吸附孔162,故即使供给液体1,也不会侵入到真空吸附孔162中。 At this time, since the suction holding a substrate P clogging the vacuum holes 162, so even if the supply of the liquid 1 will not intrude into the vacuum holes 162. 此外,由于基片托PH的侧壁部151的缘故,基片P上或平坦面30A上的液体1也不会流出到基片托PH的外侧。 Further, due to the substrate holder PH side wall portion 151, the liquid on the substrate P or on the flat surface 30A 1 does not flow to the outside of the substrate holder PH.

[0152] 基片P的液浸曝光结束后,控制装置CONT使用液体回收机构20 (参照图2)等回收在基片P上或平坦面30A上残留的液体1。 [0152] After completion of the liquid immersion exposure of the substrate P is recovered on the substrate P or on the flat surface 30A of the residual control unit CONT liquid using the liquid recovery mechanism 20 (refer to FIG. 2) 1. 其次,控制装置CONT解除由包含真空吸附孔158的夹持机构进行的对于基片托PH的保持,同时使用阀部162B堵塞流路162A。 Next, the control unit CONT releases the holding for the substrate holder PH by the clamp mechanism includes a vacuum suction holes 158 while using the valve portion 162B clogging the channel 162A. 然后,如图13(d)中所示,控制装置CONT利用运送臂80从基片架PT与基片P—起运出(卸载)保持了结束曝光处理的基片P的状态的基片托PH。 Then, as shown in (d) in FIG. 13, the control unit CONT by using the transport arm 80 from the substrate table PT and the substrate P- departure out (unloaded) state of the substrate holder PH of the end of exposure processing of the substrate P . 在分离基片托PH与基片架PT时,如参照图12已说明的那样,由于利用阀部162B堵塞连接到吸附保持基片P的真空吸附孔162上的流路162A而维持了负压状态,故维持由凸部161的上端面进行的对于基片P的吸附保持。 In that when separating the substrate holder PH and the substrate table PT, as already described with reference to FIG. 12, since the valve unit 162A 162B clogging the channel on the vacuum suction hole 162 is connected to the substrate P while holding the negative pressure is maintained state, so to maintain the adsorption of the substrate P held by the upper end surface of the convex portion 161. 此外,在与基片托PH—起运送基片P时,即使假定液体1残留在基片P上或平坦面30A上, 该残留的液体1也不会经流路162A流出。 Further, when the substrate holder transport PH- from the substrate P, even assuming that the liquid 1 remaining on the substrate P or on the flat surface. 30A, the remaining liquid 1 does not flow through the flow path 162A. 此外,由于残留的液体1保持在侧壁部151内部, 故也不会流出到基片托PH的外侧而在运送路径中飞散。 Further, since the remaining liquid holding portion in the inner side wall 151, it does not flow to the outside of the substrate holder PH is scattered in the feed path.

[0153] 已运出的基片托PH与新的基片托PH更换。 [0153] have been shipped out of the substrate holder PH and the substrate holder PH new replacement. 然后,控制装置CONT使用运送臂80 将保持了作为曝光处理对象的基片P的新的基片托PH与基片P —起运入到基片架PT(基片台PST)上(参照图13)。 Then, the control unit CONT using the transport arm 80 will remain as the substrate P, the exposure process object new substrate holder PH and the substrate P - FOB into the substrate table PT (substrate stage the PST) (see FIG. 13 ).

[0154] 这样,即使在本实施形态中,由于更换基片托PH,故也可用表面呈疏液性的基片托PH保持基片P。 [0154] Thus, even in the present embodiment, since the replacement of the substrate holder PH, it is also available as a liquid-repellent surface of the substrate holder PH holds the substrate P.

[0155]〈第3实施形态〉 [0155] <Third Embodiment>

[0156] 但是,在上述实施形态中,说明了根据其疏液性的恶化来更换在基片P的周围具有平坦面30A的构件(板构件30、第2板构件32、基片托PH),但优选在基片架PT上设置的板构件30、第2板构件32和基片托PH以外的构件的表面也呈疏液性,最好根据其疏液性的恶化可更换。 [0156] However, in the embodiment described according to its deterioration lyophobic to replace the member having a flat surface around the substrate P 30A (the plate member 30, the second plate member 32, substrate holder PH) , but the surface of the member other than the plate member is preferably disposed on the substrate table PT 30, the second plate member 32 and the substrate holder PH were also liquid-repellent, which preferably can be replaced in accordance with the deterioration of the liquid repellence. 特别是希望与液体1接触的构件的表面呈疏液性,最好根据其疏液性的恶化可更换。 And particularly desirable surface contact member form a liquid-repellent liquid, which preferably can be replaced in accordance with the deterioration of the liquid repellence. 具体地说,在表面上形成液浸区域使用的基准构件300的结构构件、光学传感器400,500的结构构件也可更换。 Specifically, a reference member used in the liquid immersion area on the surface of the structural member 300, the optical sensor structural member 400, 500 can be replaced.

[0157] 图14是示出在基片架PT上设置的基准构件300的剖面图。 [0157] FIG. 14 is a sectional view illustrating the reference member 300 provided on the substrate table PT. 在图14中,基准构件300具备由玻璃构成的光学构件301和在光学构件301的上面301A上形成的基准标记MFM、PFM。 In Figure 14, the reference member 300 includes an optical member 301 made of glass and the reference mark MFM formed on the upper surface 301A of the optical member 301, PFM. 基准构件300安装在基片架PT上,如上所述,配置在第2板构件32上设置的开口部32K中,露出上面301A。 Reference member 300 is mounted on substrate table PT, as described above, arranged in the opening portion 32K is provided on the second plate member 32 is exposed above 301A. 而且,基准构件300 (光学构件301)对于基片架PT可装卸, 可更换。 Further, the reference member 300 (optical member 301) to the substrate table PT can be detachable, replaceable. 可在基准构件300和基片架PT上设置将基准构件300再次安装在基片架PT的规定位置上时为了对于基片架PT使基准构件300定位而互相嵌合的凹凸或雌雄构件。 In order for the substrate table PT so that the reference member 300 is positioned and fitted to each other when the irregularities or the male and female members may be disposed on the reference member 300 and the substrate table PT, the reference member 300 is mounted at a predetermined position of the substrate table PT on again. 或者, 也可在基准构件300与基片架PT中埋入磁铁和被其吸引的材料,以便能用磁力使基准构件300对于基片架PT定位。 Alternatively, magnets may be embedded in a material, and is attracted by the reference member 300 and the substrate table PT so that the reference magnetic member 300 can be positioned with respect to the substrate table PT. 或者,也可用真空吸引力使基准构件定位在基片架PT上。 Alternatively, a vacuum may also be attractive to the reference member is positioned on the substrate table PT. 再有, 也可使用石英作为光学构件301。 Furthermore, quartz can also be used as the optical member 301.

[0158] 在基准构件300与开口部32K之间设置了例如约为0.3mm的间隙K。 [0158] between the reference member 300 is provided with an opening portion 32K for example, about 0.3mm gap of K. 光学构件301 (基准构件300)的上面301A大致为平坦面,将基片P表面、板构件30的表面30A和第2板构件32的表面32A设置成大致为同一面。 The above optical member 301 (reference member 300) is substantially flat surface 301A, the surface of the surface of the substrate P, the surface of the plate member 30A 30 and 32 of the second plate member 32A disposed substantially flush.

[0159] 第2板构件32中的基准构件300附近的厚度减薄了,该厚度减薄了的厚度薄的部分32S中的基准构件300 —侧的端部向下方弯曲形成了弯曲部32T。 [0159] The thickness of the reference member 300 in the vicinity of the second plate member 32 is thinned, the thickness of the reduced thickness of the thin portion 32S of the reference member 300 - terminal portion side bent downward bending portion 32T. 此外,在基片架PT 上形成了向上方突出的壁部310。 Further, on the substrate table PT is formed a wall portion 310 protruding upward. 壁部310对于基准构件300与弯曲部32T相比设置在外侧,连续地形成为包围基准构件300 (弯曲部32T)。 Wall portion 310 with respect to the reference member 300 as compared to the bent portion 32T is provided on the outside, is formed continuously to surround the reference member 300 (bent portion 32T). 而且,弯曲部32T的外侧面32Ta与壁部310的内侧面310A对置,弯曲部32T的内侧面32Tb与光学构件301 (基准构件300)的侧面301B对置。 Further, the outer side surface 32Ta of the bent portion 32T and the inner side surface 310A of side wall portions 310 opposite the inner side surface 32Tb of the bent portion 32T of the optical member 301 (reference member 300) of opposed 301B. 光学构件301的侧面301B、弯曲部32T的内侧面32Tb和外侧面32Ta、壁部310 的内侧面310A和上端面310B分别是平坦面。 Side of the optical member 301 and 301B, the inner side surface 32Tb of the bent portion 32T and the outer side surface 32Ta, the inner side wall portion 310A and the upper end surface 310 are flat surfaces 310B. 此外,包含第2板构件32的弯曲部32T的厚度薄的部分32S与壁部310稍微地分离,在其间形成了规定的间隙。 Further, the second plate member includes a first bent portion 32T of the thin thickness portion 32S and 32 is slightly separated from the wall portion 310, is formed in a predetermined gap therebetween.

[0160] 对光学构件301的上面301A、侧面301B中至少与弯曲部32T对置的区域、壁部310 的内侧面310A和上端面310B进行疏液处理,使其呈疏液性。 [0160] The 301A, 301B with the side surface of the bent portion 32T opposed to the upper region of at least the optical member 301, the inner side wall portion 310 of the end surface 310B and 310A for the liquid-repellent treatment, render it liquid repellent. 作为疏液处理,如上所述,可涂敷氟树脂材料或丙烯酸树脂材料等的疏液性材料等来进行。 Lyophobic materials such as lyophobic treatment, as described above, may be coated with an acrylic resin material, resin material or the like to a fluorine.

[0161] 此外,流入到第2板构件32的弯曲部32T(壁部310)与基准构件301之间的空间370中的液体1由回收部380回收。 [0161] In addition, the liquid flows into the space 370 between the second bent portion 32T of the plate member (wall 310 portion) 32 and the reference member 301 is recovered by the recovery section 1380. 在本实施形态中,回收部380具备:真空系统383 ;包含可容纳液体1的容器的气液分离器381 ;以及在基片架PT内部设置的、连接空间370与气液分离器381的流路382。 In the present embodiment, the recovery unit 380 includes: a vacuum system 383; the liquid storage container comprises a gas-liquid separator 381; as well as within the substrate table PT is provided, connection space 370 and the gas-liquid separator 381 flows Road 382. 对流路382的内壁面也进行了疏液处理。 Inner wall surface of the flow passage 382 is also a liquid-repellent treatment.

[0162] 在上述的基准构件300中,可考虑在例如在其上面301A上形成了液体1的液浸区域AR2的状态下进行基准标记检测工作的结构,而由于上面301A上呈疏液性,故在基准标记检测工作结束后,可良好地进行上面301A上的液浸区域AR2的液体1的回收,可防止液体1残留的不良情况。 [0162] In the reference member 300 may be considered structural reference mark detector operating at, for example, the state of forming a liquid immersion region 1 AR2 on its top 301A, and because as a liquid-repellent upper surface 301A, therefore, after the reference mark detecting operation can be satisfactorily recovered liquid immersion area on the upper face 301A AR2 of the liquid 1 to prevent the liquid 1 remaining defects. 此外,由于光学构件301的侧面301B呈疏液性,同时与该侧面301B 对置的弯曲部32T的内侧面32Tb也呈疏液性,故液体1难以侵入到间隙K中。 Further, since the side surface 301B of the optical member 301 in the form of liquid-repellent, and 301B while the inner surface of the bent portion 32T opposed to the side surface 32Tb also showed liquid-repellent, so the liquid 1 enters the gap K is difficult. 因此,可防止液体1侵入到空间370中的不良情况。 Accordingly, the liquid 1 is prevented from entering the space 370 in the defect. 此外,即使假定液体1侵入到空间370中,也可利用回收部380良好地回收液体1。 Moreover, even assuming that the liquid 1 enters the space 370, 380 may be recycled to recover the liquid 1 satisfactorily. 再者,即使液体1侵入到空间370中,由于壁部310的内侧面310A和上端面310B呈疏液性,同时与该壁部310对置的第2板构件32 (弯曲部32T) 也呈疏液性,故可防止侵入到空间370中的液体1越过壁部310侵入到基片架PT内部而产生锈蚀等的不良情况。 Further, even if the liquid 1 enters the space 370, since the inner surface form of liquid repellency of the wall portion 310 310A and 310B on the end face, and also correlated with the wall portion 310 facing the second plate member 32 (bent portion 32T of) liquid repellency, the liquid can be prevented from entering the space beyond 1 370 310 into the inside of the substrate table PT and the like rust wall defects. 这样,壁部310具有作为防止液体1的扩散的液体扩散防止壁的功能。 Thus, as the liquid having a wall portion 310 prevent the spread of the liquid diffusion preventing function 1 wall. 此外,在第2板构件32与壁部310的间隙中,利用弯曲部32T形成了在剖面视图中为弯曲的角部,由于该弯曲的角部起到密封部的功能,故能可靠地防止液体1对于基片架PT 内部的侵入。 Further, the gap of the second plate member 32 and the wall portion 310, the bent portion 32T of use in forming a cross-sectional view of a curved corner portion, since the curved corner portion functions as a seal portion, it can be reliably prevented invasion of the liquid 1 to the substrate table PT in the internal.

[0163] 而且,由于基准构件300 (光学构件301)可更换,故在其疏液性恶化了的情况下, 与板构件30同样,与新的(具有充分的疏液性的)基准构件300更换即可。 [0163] Further, since the reference member 300 (optical member 301) can be replaced, so in the case of the liquid repellence thereof deteriorated, the plate member is the same, with the new (having sufficient liquid repellence) reference member 30030 replaced.

[0164] 再有,在使用基准构件300的情况下,由于对标记部分局部地照射检测光,故在基准构件300上预先形成了多个同一的基准标记,如果标记部分的表面的疏液性恶化了,就可使用其它的基准标记,为了降低疏液性的恶化速度,也可在每次检测中交替地使用这些标记。 [0164] Further, in the case where the reference member 300, since the detection light is irradiated locally to the marking part, formed in advance so that a plurality of identical reference marks on the reference member 300, if the lyophobic portion of the surface of markers deteriorated, you can use other reference mark, in order to reduce the rate of deterioration of the liquid repellence, these markers can be used alternately in each test. 由此,可减少基准构件300的更换频度。 This reduces the frequency of replacement of the reference member 300. 由于包含使用与曝光波长为同一的检测光的基准标记MFM的部分的疏液性的恶化快,故这样做特别有效。 Since the exposure wavelength comprises using a faster deterioration of the liquid-repellent part of the same reference light detection mark MFM, it is especially effective to do so.

[0165] 图15是示出在基片架PT上设置的照度不勻传感器400的剖面图。 [0165] FIG. 15 is a cross-sectional view illustrating the uneven illuminance sensor is provided on the substrate table PT 400. 在图15中,照度不勻传感器400具备由石英玻璃等构成的上板401和在上板401下设置的由石英玻璃等构成的光学元件402。 In Figure 15, the uneven illuminance sensor 400 includes an upper plate made of quartz glass or the like and an optical element 401 made of quartz glass or the like is provided on the plate 401 at 402. 在本实施形态中,一体地设置了上板401和光学元件402。 In the present embodiment, it is integrally provided on the plate 401 and the optical element 402. 在以下的说明中,将上板401和光学元件402合在一起适当地称为「光学构件404」。 In the following description, the upper plate 401 and the optical element 402 together appropriately referred to as "optical member 404." 此外,经支撑部403在基片架PT上支撑了上板401和光学元件402。 Further, the support portion 403 on the substrate table PT supporting the upper plate 401 and the optical element 402. 支撑部403具有包围光学构件404的连续的壁部。 Support portion 403 has a continuous wall portion surrounding the optical member 404. 照度不勻传感器400如上所述,配置在第2板构件32上设置的开口部32L 中,露出上面401A。 Illuminance unevenness sensor 400 as described above, arranged in the opening portion 32L provided on the second plate member 32 is exposed above 401A. 包含上板401和光学元件402的光学构件404对于基片架PT可装卸, 可更换。 The optical member 401 comprises an upper plate 402 and the optical element 404 to the substrate table PT can be detachable, replaceable. 可在光学构件404和基片架PT上设置将光学构件404再次安装在基片架PT的规定位置上时为了对于基片架PT使光学构件404定位而互相嵌合的凹凸或雌雄构件。 In order for the substrate table PT so that the optical member 404 is positioned and fitted to each other may be convex or male and female member when the optical member 404 disposed on the substrate table PT and the optical member 404 is mounted at a predetermined position of the substrate table PT on again. 或者, 也可在光学构件404与基片架PT中埋入磁铁和被其吸引的材料,以便能用磁力使光学构件404对于基片架PT定位。 Alternatively, magnets may be embedded in a material, and is attracted by the optical member 404 and the substrate table PT so that the optical member 404 can be a magnetic force for positioning the substrate table PT. 或者,也可用真空吸引力使基准构件定位在基片架PT上。 Alternatively, a vacuum may also be attractive to the reference member is positioned on the substrate table PT.

[0166] 在上板401上设置了可通过光的针孔部470。 [0166] portion of the light through the pinhole 470 is provided on the upper plate 401. 此外,在上板401上的针孔部470以外的部分上设置了包含铬等的遮光性材料的薄膜460。 In addition, the portion other than the pinhole portion 470 of the upper plate 401 is provided comprising a light-shielding film 460 of chromium or the like on the material. 在本实施形态中,在针孔部470内部也设置了由石英玻璃等构成的光学构件,由此,薄膜460与针孔部470为同一面,上面401A 成为平坦面。 In the present embodiment, in the interior of the pinhole portion 470 is also provided an optical member made of quartz glass or the like, whereby the thin film 460 is flush with the pinhole 470, 401A above a flat surface.

[0167] 在光学构件404的下方配置了接受通过了针孔部470的光的光传感器450。 [0167] In the optical member 404 is disposed below the light sensor receiving light passing through the pinhole portion 470 450. 在基片架PT上安装了光传感器450。 The substrate table PT on the light sensor 450 is mounted. 光传感器450对控制装置CONT输出受光信号。 A light sensor 450 a control means receiving the output optical signal CONT. 在此,用支撑部403、基片架PT和光学构件404包围的空间405是大致密闭的空间,液体1不侵入到空间405中。 Here, the support space portion 403, the substrate table PT and the optical member 404 is substantially enclosed closed space 405, the liquid 1 does not intrude into the space 405. 再有,也可在光学构件404与光传感器450之间配置光学系统(光学元件)。 Further, the optical system can also be configured (optical element) between the optical member 404 and the light sensor 450.

[0168] 在包含光学构件404和支撑部403的照度不勻传感器400与开口部32L之间,设置了例如约为0. 3mm的间隙L。 [0168] 404 between the optical member and the support portion comprising an illuminance unevenness sensor 403 and the opening portion 400 of 32L, a gap is provided for example, about 0. 3mm to L. 照度不勻传感器400的上面401A大致为平坦面,将基片P 表面、板构件30的表面30A和第2板构件32的表面32A设置成大致为同一面。 The above 401A of the uneven illuminance sensor 400 is a substantially flat surface, the surface of the surface of the substrate P, the surface of the plate member 30A 30 and 32 of the second plate member 32A disposed substantially flush.

[0169] 第2板构件32中的照度不勻传感器400附近的厚度减薄了,该厚度减薄了的厚度薄的部分32S中的照度不勻传感器400 —侧的端部向下方弯曲形成了弯曲部32T。 [0169] 400 near the thickness 32 of the second illuminance unevenness sensor plate member thinning, the thickness of the reduced thickness of the thin portion 32S of the illuminance unevenness sensor 400 - terminal portion side bent downward is formed the bent portion 32T. 此外, 在基片架PT上形成了向上方突出的壁部310。 Further, on the substrate table PT is formed a wall portion 310 protruding upward. 壁部310对于照度不勻传感器400与弯曲部32T相比设置在外侧,连续地形成为包围照度不勻传感器400 (弯曲部32T)。 For wall portion 310 and the illuminance unevenness sensor 400 as compared to the bent portion 32T is provided on the outer side formed as a continuous 400 (bent portion 32T) surrounding the illuminance unevenness sensor. 而且,弯曲部32T的外侧面32Ta与壁部310的内侧面310A对置,弯曲部32T的内侧面32Tb与照度不勻传感器400的光学构件404和支撑部403的侧面401B对置。 Further, the outer side surface 32Ta of the bent portion 32T and the inner side surface 310A of the wall portion 310 opposite the inner side surface 32Tb of the bent portion 32T side surface 404 and the illuminance of the supporting portion 403 opposed to the optical member 401B unevenness sensor 400. 侧面401B、弯曲部32T的内侧面32Tb和外侧面32Ta、壁部310的内侧面310A和上端面310B分别是平坦面。 Side surface 401B, the inner side surface 32Tb of the bent portion 32T and the outer side surface 32Ta, the inner end surface 310A side of the wall portion 310 and an upper flat surface 310B, respectively. 此外, 包含第2板构件32的弯曲部32T的厚度薄的部分32S与壁部310稍微地分离,在其间形成了规定的间隙。 Further, the second plate member includes a first bent portion 32T of the thin thickness portion 32S and 32 is slightly separated from the wall portion 310, is formed in a predetermined gap therebetween.

[0170] 对照度不勻传感器400的上面401A、侧面401B中至少与弯曲部32T对置的区域、 壁部310的内侧面310A和上端面310B进行疏液处理,使其呈疏液性。 [0170] illuminance unevenness sensor 401A, 401B of the side surface of at least the bent portion 32T opposed upper region 400, the inner side wall portion 310 of the end surface 310B and 310A for the liquid-repellent treatment, render it liquid repellent. 作为疏液处理,如上所述,可涂敷氟树脂材料或丙烯酸树脂材料等的疏液性材料等来进行。 Lyophobic materials such as lyophobic treatment, as described above, may be coated with an acrylic resin material, resin material or the like to a fluorine.

[0171] 此外,流入到第2板构件32的弯曲部32T(壁部310)与照度不勻传感器400之间的空间470中的液体1由回收部480回收。 [0171] In addition, the liquid flows into the space 400 between the second bent portion 32T of the plate member (wall portions 310) of the illuminance unevenness sensor 32 4,701,480 recovered by the recovery unit. 在本实施形态中,回收部480具备:真空系统483 ;包含可容纳液体1的容器的气液分离器481 ;以及在基片架PT内部设置的、连接空间470与气液分离器481的流路482。 In the present embodiment, the recovery unit 480 includes: a vacuum system 483; containing a fluid comprising a gas-liquid separator 1 481; and disposed in the interior of the substrate table PT, the connection space 470 and the gas-liquid separator 481 Road 482. 对流路482的内壁面也进行了疏液处理。 Inner wall surface of the flow passage 482 is also a liquid-repellent treatment. [0172] 在上述的照度不勻传感器400中,在例如在其上面401A上形成了液体1的液浸区域AR2的状态下,在照射曝光光EL的照射区域(投影区域)内的多个位置上依次使针孔部470移动。 [0172] In the above-described uneven illuminance sensor 400, for example, is formed in a state of the liquid in the liquid immersion area AR2 on 1 thereon 401A, a plurality of positions in the irradiation area irradiated with the exposure light beam EL (projection area) the pinhole portion 470 are sequentially moved. 由于上面40IA呈疏液性,故在照度不勻检测结束后,可良好地进行上面40IA上的液浸区域AR2的液体1的回收,可防止液体1残留的不良情况。 Since the liquid repellency was 40IA above, it is detected after the illuminance unevenness can be satisfactorily recovered liquid immersion area on the upper face of the liquid 1 40IA AR2, the liquid 1 is prevented residual defects. 此外,由于照度不勻传感器400 (光学构件404、支撑部403)的侧面401B呈疏液性,同时与该侧面401B对置的弯曲部32T的内侧面32Tb也呈疏液性,故液体1难以侵入到间隙L中。 Further, since the uneven illuminance sensor 400 (optical member 404, support section 403) of the side surface 401B as a liquid-repellent, while the inner side surface of the bent portion 32T opposed to the side surface 401B of the liquid-repellent 32Tb also showed, it is difficult to liquid 1 intrude into the gap L. 因此,可防止液体1侵入到空间470中的不良情况。 Accordingly, the liquid 1 is prevented from entering the space 470 in the defect. 此外,即使假定液体1侵入到空间470中,也可利用回收部480 良好地回收液体1。 Moreover, even assuming that the liquid 1 enters the space 470, the recovery unit 480 may be utilized to recover the liquid 1 satisfactorily. 再者,即使液体1侵入到空间470中,由于壁部310的内侧面310A和上端面310B呈疏液性,同时与该壁部310对置的第2板构件32 (弯曲部32T)也呈疏液性,故可防止侵入到空间470中的液体1越过壁部310侵入到基片架PT内部而产生锈蚀等的不良情况。 Further, even if the liquid 1 enters the space 470, since the end face 310 of the inner surface of the wall portion 310A and 310B form the liquid-repellent, and was also 32 (bent portion 32T of) the wall portion 310 facing the second plate member liquid repellency, the liquid can be prevented from entering the space 4701 beyond the wall portion 310 into the inside of the substrate table PT and such defects as rust. 此外,在第2板构件32与壁部310的间隙中,利用弯曲部32T形成了在剖面视图中为弯曲的角部,由于该弯曲的角部起到密封部的功能,故能可靠地防止液体1对于基片架PT内部的侵入。 Further, the gap of the second plate member 32 and the wall portion 310, the bent portion 32T of use in forming a cross-sectional view of a curved corner portion, since the curved corner portion functions as a seal portion, it can be reliably prevented invasion of the liquid 1 to the substrate table PT in the internal.

[0173] 而且,由于光学构件404可更换,故与板构件30同样,在其疏液性恶化了的情况下,与新的(具有充分的疏液性的)光学构件404更换即可。 [0173] Further, since the optical member 404 can be replaced, so that the plate member 30 Similarly, in the case where the liquid repellence thereof is deteriorated, with a new optical member (having sufficient liquid repellence) 404 and replace.

[0174] 再有,由于空间像检测传感器500具有与照度不勻传感器400大致同等的结构,故省略其详细的说明,但空间像检测传感器500也具有在基片架PT上经支撑部支撑的上板和由光学元件构成的光学构件,在其上面501A上设置了可通过光的狭缝部570和覆盖该狭缝部以外的部分的由遮光性材料构成的薄膜。 [0174] Further, since the spatial image detection sensor 500 and the illuminance unevenness sensor 400 having substantially the same structure, so the detailed description is omitted, but also the spatial image detection sensor 500 is supported by a support portion on the substrate table PT the upper plate and an optical member formed of an optical element, on its upper portion 501A of the slit 570 is provided by the film and the light cover portion other than the slit portion is made of a light shielding material. 而且,在光学构件下配置了接受通过了狭缝部570的光的光传感器。 Further, the optical member disposed at the light receiving sensor through the light slit portion 570. 具有狭缝部570的光学构件根据其疏液性的恶化可更换。 An optical member having a slit portion 570 may be replaced as the deterioration of the liquid repellence thereof.

[0175] 再有,在参照上述的图14、图15已说明的实施形态中,通过使形成间隙K、L的构件表面具有疏液性来防止液体1的侵入,但不限于检测构件或传感器周围的间隙,通过使在基片架PT的上面存在的间隙同样地具有疏液性,可防止液体1对该间隙的侵入。 [0175] Further, in the embodiments with reference to the aforementioned FIG. 14, FIG. 15 has been illustrated, by forming gap K, member surface L of liquid repellency to prevent the intrusion of the liquid 1, but is not limited to the detection means or sensor around the gap, in the same manner by having a gap in the presence of liquid repellency of the upper substrate table PT, the liquid 1 can be prevented intrusion of the gap. 此外, 在间隙K、L中配置由树脂等形成的密封构件,可防止液体1的侵入,也可在间隙K、L中充填液体(例如真空油或磁性流体等)使之具有液体密封剂的功能来防止液体1的侵入。 Further, the sealing member in the gap K, L configuration formed by a resin or the like, intrusion of the liquid 1 can be prevented, but also the gap K, L filled liquid (e.g. oil or vacuum magnetic fluid, etc.) so that it has a liquid sealant function to prevent the invasion of the liquid 1. 在该情况下,密封用的液体最好是难以在液体1中溶出的液体。 In this case, the sealing liquid is preferably dissolved in the liquid is difficult to liquid. 当然,也可合并使用这些防止液体侵入的对策。 Of course, these responses may be used in combination to prevent intrusion of liquid.

[0176] 此外,没有必要使在基片台PST(基片架PT)上安装的全部的检测构件(基准构件300的光学构件301、光学传感器400的上板401、光学传感器500的上板501等)的表面(液体接触面)呈疏液性,可只使这些表面的一部分具有疏液性。 [0176] Further, it is not necessary to make all of the detecting member on the substrate stage PST (substrate table PT) mounted (reference member of the optical member 300, 301, the optical sensor plate 401 400, the optical sensor plate 501 500 etc.) surface (liquid contact surface) as a liquid-repellent, it can be only a portion of these surfaces with liquid repellency.

[0177] 此外,在上述的实施形态中,在构件表面的疏液性恶化了的情况下进行更换,但也可在更换某一个构件时,同时也更换更换时期接近的构件。 [0177] Further, in the embodiment described above, in the case of replacement liquid-repellent member of the surface deteriorated, but also when replacing one member, but also close to the replacement time for replacement member.

[0178] 此外,为了更可靠地进行液体(水)的回收,希望基片架PT的表面、即板构件30 和第2板构件32的表面、基准构件300等的表面的对于液体(水)的接触角比80°大,最好大于等于100° (上述的四氟乙烯的对于液体(水)的接触角约为110° )。 [0178] Further, in order to more reliably recover the liquid (water), it is desirable the surface of the surface of the substrate table PT, i.e., the surface of the plate member 30 and the second plate member 32, the reference member 300 and the like to the liquid (water) contact angle greater than 80 °, preferably not less than 100 ° (tetrafluoroethylene above the liquid (water) a contact angle of about 110 °).

[0179] 此外,关于在基片P的表面上涂敷的感光材料(ArF曝光光用的光刻胶),也希望使用对于液体(水)的接触角比80°大的材料。 [0179] Further, regarding the coated surface of the substrate on the photosensitive material P (ArF resist exposure light), is also desirable to use the contact angle of the liquid (water) is larger than 80 ° the material. 当然,在使用KrF准分子激光作为曝光光的情况下,希望使用对于液体的接触角比80°大的光刻胶作为KrF曝光光用的光刻胶。 Of course, in the case where KrF excimer laser as the exposure light, it is desirable for the photoresist liquid contact angle greater than 80 ° KrF resist as the exposure light.

[0180] 在上述的具体例中例示了同时具备基片架、基准构件300、照度不勻传感器400或空间像检测传感器500等的检测工具的基片台,但也可将本发明适用于保持基片并进行曝光的台和检测用的台不在一起的曝光装置。 [0180] In the particular embodiment illustrated the same time with the substrate holder, the reference member 300, the uneven illuminance sensor 400 or spatial image detection sensor 500 like the detection tool substrate stage, but may present invention is adapted to hold and exposing the substrate stage and the detection stage of the exposure apparatus are not found together. 即,本发明也可应用于具备保持晶片等的被处理基片并可移动的曝光台和备有各种基准构件或检测传感器等的检测构件的检测台的曝光装置。 That is, the present invention may also be applied to a substrate to be processed such as a wafer holding means for moving the exposure stage and the exposure stage and with a variety of detection means or a reference sensor for detecting the detection member. 在该情况下,可将在上述的实施形态中在基片台PST上配置了的基准构件或各种检测传感器中的至少一部分配置在检测台上。 In this case, in the embodiment described above may be the substrate stage PST on the configuration of the reference member or the various detection sensors disposed in at least a portion of the inspection station. 具备曝光台和检测台的曝光装置例如在特开平11-135400号公报中记载了,只要在本国际申请中指定或选择的国的法令中容许,引用这些文献的记载内容,作为本文的记载的一部分。 Exposure station and the inspection station includes an exposure apparatus, for example, disclosed in Japanese Unexamined Patent Publication No. 11-135400 in the Decree of the country designated or selected in this international application permit, references disclosed contents of these documents, as described herein portion.

[0181] 在本实施形态中,也可适用于安装了2个保持基片P的基片台(基片架)的双台型的曝光装置。 [0181] In the present embodiment, the exposure apparatus can also be applied to a dual stage type installed two holding the substrate P, the substrate stage (substrate holder) is. 双台型的曝光装置的结构和曝光工作,例如在特开平10-163099号和特开平10-214783 号(对应的美国专利6,341,007,6, 400,441,6, 549,269 和6,590,634)、特表2000-505958号(对应的美国专利5,969,441)或美国专利6,208,407中公开了,只要在本国际申请中指定或选择的国的法令中容许,引用这些文献的记载内容,作为本文的记载的一部分。 Structure and the exposure operation Dual stage type exposure apparatus, for example, (corresponding to U.S. Patent No. 6,341,007,6 Laid Open No. 10-163099 and Hei 10-214783, 400,441,6, 549,269 and 6,590,634), No. 2000-505958 (corresponding to US Patent No. 5,969,441) or US Patent 6,208,407 discloses a decree designated or selected in this international application in China allowing references disclosed contents of these documents as part described herein.

[0182]〈第4实施形态〉 [0182] <Fourth Embodiment>

[0183] 图16是应用了本发明的双台型曝光装置的概略结构图。 [0183] FIG. 16 is a schematic configuration diagram of a dual stage type exposure apparatus according to the present invention. 双台型曝光装置具备可在共同的基座54上分别独立地移动的第1、第2基片台PST1、PST2。 Twin-stage type exposure apparatus may be provided independently movable on a common base 54 of the first and second substrate stage PST1, PST2. 第1、第2基片台PST1、 PST2是具备用与图1〜15的关系说明了的那样的结构和功能的基片台,分别具有第1、第2基片架PT1、PT2,在第1、第2基片架ΡΤ1、ΡΤ2上分别以可更换的方式设置了板构件30和第2板构件32。 1, the second substrate stage PST1, PST2 is a substrate stage includes described with relation to FIG. 1~15 as the structure and function, each having a first and second substrate holder PT1, PT2, the first 1, the second substrate holder ΡΤ1, the ΡΤ2 respectively provided a replaceable plate member 30 and the second plate member 32. 此外,双台型曝光装置具有曝光工位STl和检测、更换工位ST2,在曝光工位STl上设置投影光学系统PL,在检测、更换工位ST2上安装了基片对准系统、聚焦、矫正检测系统等(在图16中未图示)。 Further, dual stage type exposure apparatus having an exposure station STl and detection, exchange station ST2, the projection optical system PL disposed on the exposure station STl, detection, replacement and installation of the substrate alignment system, the focus on the station ST2, correcting the detection system (not shown in FIG. 16). 而且,在曝光工位STl中在对在第1基片架PTl上保持的基片P进行液浸曝光的期间内,在检测、更换工位ST2中对于第2基片台PST2(第2基片架PT2)与板构件30 —起装载、卸载基片P。 Further, in the exposure station STl in of the substrate P held on the first substrate holder PTl performed during the liquid immersion exposure in the detection, exchange station ST2, to the second substrate stage PST2 is (the second group PT2 is sheet holder) and the plate member 30-- from loading and unloading the substrate P. 此外,在检测、更换工位ST2中,与曝光工位STl 中的液浸曝光并行地进行第2基片台PST2上的对于基片P的检测工作(聚焦检测工作、对准工作),在该检测工作结束了后,第2基片台PST2移动到曝光工位ST2上,对第2基片台PST上的基片P进行液浸曝光处理。 Further, in the detection, the exchange station ST2, the work detection (focus detection operation, the alignment operation) for the substrate P on the second substrate stage PST2 and the exposure station STl liquid immersion exposure in parallel, in after detecting the end of work, the second substrate stage PST2 is moved to the exposure station ST2, on the substrate P on the substrate stage PST second liquid immersion exposure process.

[0184] 这样,在双台型曝光装置的情况下,由于在一个台上的液浸曝光处理中,在另一个台上不仅可进行基片更换或检测处理,而且可进行板构件30的更换,故可提高曝光处理的单位时间的产量。 [0184] Thus, in the case of twin-stage type exposure apparatus, since the liquid immersion exposure process in a table, not only in a further stage the substrate may be replaced or detection process, and may be carried out to replace the plate member 30 , it can improve the yield per unit time of the exposure process.

[0185] 再有,在上述的各实施形态中,说明了根据其疏液性来更换板构件30等,但在例如因某种原因损伤了或污染了的情况下等,当然也可根据疏液性的恶化以外的其它的理由来更换。 [0185] Further, in each of the embodiments described above, which illustrates a lyophobic property to replace the plate member 30 or the like, in the case for some reason, for example, damaged or contaminated, of course, also be based on sparse other reason than to replace the deterioration of the liquid. 例如,在板构件30等在长时间内与液体1接触的情况下,由于存在其表面的性能恶化、物质溶出从而污染液体1的可能性,故也可考虑伴随物质溶出的板构件30等的表面性能恶化来决定更换时期。 For example, in a case where a long time in contact with the liquid and other plate members 30 1, its performance due to deterioration of the surface, so that the possibility of contamination substance dissolution liquid 1, it is also conceivable plate member 30 accompanying material eluted like the surface properties deteriorate to determine the replacement time.

[0186] 在上述实施形态中,用萤石形成了光学元件2,但例如可使用该萤石的表面的结晶方位为(111)面的萤石。 [0186] In the above embodiment, the optical element 2 formed in a crystal, but may be used for example with the surface of the fluorite fluorite fluorite orientation of (111) plane. 此外,在图1中示出的光学元件2的前端部2a、即与液体1接触的部分中,可利用真空蒸镀法形成氟化镁(MgF2膜作为由单层膜构成的防止溶解膜。 Further, in FIG. 1 illustrating the distal end portion of the optical element 2 shown in 2a, i.e., the portion contacting the liquid 1 may be formed of magnesium fluoride (MgF2 film by a vacuum deposition method for preventing dissolution of a film of a single layer film.

[0187]〈第5实施形态〉 [0187] <Embodiment 5>

[0188] 如在上述的第1实施形态中已说明的那样,在基片台PST上安装了构成照射量监视器、照度不勻传感器等的装置的光学部件、空间像检测装置的指标板、中间掩模的对准时使用的基准标记(基准构件)的情况下,希望这些光学部件的光照射面(液体接触面) 具有疏液性。 [0188] As in the first embodiment described above has been described above, the substrate stage PST on the optical members constituting the exposure apparatus monitor, the uneven illuminance sensor or the like is mounted, the spatial image of the index plate detecting means, the case where the reticle reference mark (reference member) of the time use, it is desirable light irradiated surface of the optical member (liquid contact surface) having the liquid repellence. 在不能完全地进行照射量监视器、照度不勻传感器等的光照射面上的排水的情况下,存在不能准确地进行光照射量或光照度的检测的危险。 In the case of not completely drained irradiated surface of light irradiation amount monitor, the uneven illuminance sensor or the like, there can not be accurately detected hazard light irradiation amount or illuminance. 此外,在不能完全地进行空间像检测装置的指标板上的排水的情况下,存在由于指标板上的液体蒸发、指标板的面形状变化从而在由空间像检测装置进行的检测中产生误差的可能性。 Further, the image is spatially not fully drain a case where an index plate detecting apparatus, since the presence of the liquid evaporation index plate, a change in shape index plate surface to create an error detection means for detecting an image of the space possibility. 此外,在不能完全地进行基准标记上的排水的情况下,存在由于基准标记上的液体蒸发、基准标记的形状变化从而不能准确地进行中间掩模对准的可能性。 Further, in the case of not completely drained on the reference mark, since the presence of the liquid on the reference mark evaporation, change in shape of the reference mark and thus can not accurately possibility reticle alignment. 因此,要求在基片台上配置的光学部件的表面在长时间内具有疏水性。 Accordingly, the substrate stage arranged in the required surface of the optical member having a hydrophobic for a long time.

[0189] 在该情况下,可考虑通过在光学部件的表面上涂敷非晶质氟树脂并形成薄膜来作成光学性能高的疏水性光学薄膜。 [0189] In this case, it may be considered by applying an amorphous fluororesin on the surface of the optical member and forming a thin film made of a hydrophobic high optical performance of the optical film. 即,非晶质氟树脂是树脂中特别透明且紫外线透射率高的材料,而且,由于因树脂表面上配位的-CF3键的缘故,是在有机物中显示出最小的表面张力的树脂,故是具有优良的疏水性能的材料。 That is, the amorphous fluororesin is especially transparent and resin material with high ultraviolet transmittance, and, due to the surface of the resin due to the -CF3 bond coordinated, is a minimum surface tension of the resin in the organic substance, so is a material having excellent hydrophobic properties.

[0190] 但是,如果对在光学部件的表面上施加的疏水性光学薄膜在液浸状态下照射能量高的紫外激光,则薄膜吸收的微量的光的能量变换为温度,在比较短的期间内薄膜膨胀,水侵入到膜中。 [0190] However, if the energy of the hydrophobic optical film applied on the surface of the optical member in the liquid immersion state high irradiation energy ultraviolet laser, is absorbed by the film a slight amount of light is converted into temperature, within a relatively short period expanded film, intrusion of water into the film. 在该情况下,如果氟树脂薄膜与光学部件表面的密接性恶化,则膜剥离,对光学性能产生不良影响,由于疏水性能恶化,存在水滴残留在基片台上的危险。 In this case, if the fluororesin film and the optical member adhesion surface deteriorates, the film is peeled off, adversely affect the optical performance deterioration due to the hydrophobic properties, there is a risk of water droplets remaining on the substrate stage.

[0191] 一般来说,已知如果使氟烷基硅烷那样的偶合剂与光学部件表面反应来形成粘接层并在其上形成氟树脂薄膜,则可得到密接性良好的薄膜,但按照本发明者的调查,由于氟烷基硅烷吸收紫外激光而分解,故可知不能得到激光照射后的密接性。 [0191] Generally, it is known so that if a coupling agent such as silane surface-reacted with a fluoroalkyl group to form the optical member and an adhesive layer formed on the fluororesin film which can be obtained with good adhesion of the film, but according to the present investigation by the inventors, because fluoroalkylsilane absorbs ultraviolet laser decomposition, it was found that adhesion can not be obtained after the laser irradiation.

[0192] 在本实施形态中,一边参照附图,一边说明适合于在长时间内可维持疏水性的液浸型投影曝光装置的光学部件。 [0192] In the present embodiment, with reference to the drawings, description is adapted to maintain the optical member may be a hydrophobic liquid immersion type projection exposure apparatus for a long time. 图19是示出在晶片台上安装的光学部件的图。 19 is a diagram illustrating an optical member mounted on the wafer stage in FIG. 图20是示出在晶片台上安装的光学部件的结构的图。 FIG 20 is a diagram illustrating a configuration of an optical component installed on the wafer stage.

[0193] 在图19中示出的晶片台609上安装了用于监视曝光光的照射量的照射量监视器的光入射窗(光照射面)650和用于检测曝光光的照度不勻的照度不勻传感器的光入射窗(光照射面)652等的光学部件。 [0193] mounting light entrance window irradiation amount monitor for monitoring the amount of irradiation of the exposure light (light irradiated surface) on a wafer stage 609 shown in FIG. 19, and 650 for detecting the uneven illuminance of the exposure light illuminance unevenness sensor light entrance window of the optical member 652 and the like (light irradiated surface). 此外,安装了进行投影光学系统的光学特性等的检测的空间像检测装置(AIS系统)的指标板(光照射面)654和中间掩模的对准时使用的基准标记(FM)(光照射面)656等的光学部件。 In addition, the installation space of the detecting optical characteristics of the projection optical system indicator board image detecting means (AIS system) (light irradiated surface) 654 and the reference mark on the reticle aligned used (the FM) (light irradiated surface ) the optical member 656 and the like. 在此,如图20中所示,利用石英玻璃660构成照射量监视器的光入射窗(光照射面)650 (和照度不勻传感器的光入射窗(光照射面)652),在其表面上形成由二氧化硅(SiO2)形成的微粒子层(粘接微粒子层)662,在微粒子层的表面上形成由非晶质氟树脂构成的疏水性膜664。 Here, as shown in FIG. 20, of quartz glass 660650 (and the light entrance window (light irradiated surface of the uneven illuminance sensor) 652) the light entrance window (light irradiated surface) constituting the exposure monitor, on its surface fine particle layer is formed (adhesive particulate layer) formed of silicon dioxide (SiO2) 662, 664 form a water repellent film composed of an amorphous fluororesin layer on the surface of fine particles.

[0194] 此外,利用石英玻璃和在该石英玻璃的表面上形成的铬(金属)图案构成空间像检测装置(AIS系统)的指标板654和基准标记(FM)656,在其表面上形成由二氧化硅(SiO2)形成的微粒子层(粘接微粒子层),在微粒子层的表面上形成由非晶质氟树脂构成的疏水性膜。 [0194] In addition, the use of quartz glass and formed on the surface of the quartz glass chromium (metal) pattern of the spatial image detection means (AIS system) index plate 654 and the reference mark (FM) 656, is formed by the upper surface thereof fine particle layer (adhesive particulate layer), silicon dioxide (SiO2) is formed, forming a hydrophobic film composed of the amorphous fluororesin layer on the surface of fine particles.

[0195] 按照与本实施形态有关的光学部件,由形成粘接微粒子层的二氧化硅(SiO2)构成的的微粒子层与基体材料的玻璃(主要成分SiO2)的亲和性良好,可得到与基体材料的玻璃良好的密接性。 [0195] The optical member relating to the present embodiment, the affinity with the glass base material by a fine layer of silicon dioxide (SiO2) forming an adhesive layer made of fine particles (whose main component SiO2) good, and obtained good glass adhesion properties of the base material. 此外,在表面上产生来源于粒子的直径的凹凸。 Further, the diameter of the particle generation from irregularities on the surface. 再者,二氧化硅等是紫外线透射率非常高的材料,其本身的激光照射耐久性也高。 Furthermore, silica and the like is very high ultraviolet transmittance of the material itself higher durability laser irradiation. 在本实施形态中,在形成了由二氧化硅(SiO2)构成的微粒子层后在该微粒子层上形成由非晶质氟树脂构成的疏水性膜。 In the present embodiment, in the fine particle layer is formed of silicon dioxide (SiO2) formed of a hydrophobic film composed of the amorphous fluororesin layer on the particles. 以非晶质氟树脂进入二氧化硅等的微粒子的空隙中而将其包围的方式干燥、固化。 Void in an amorphous fluororesin enters the silica fine particles and the like in the surrounding of drying and solidification. 由于非晶质氟树脂本身的机械的强度高,故与基体材料密接的疏水性膜的强度高。 Due to the high mechanical strength of the amorphous fluororesin itself, so the high strength of the hydrophobic membrane is in close contact with the base material.

[0196] 此外,因为在光照射面上形成的疏水性膜具有高的激光照射耐久性,故可在长时间内维持在投影曝光装置上安装的光学部件的光照射面的疏水性。 [0196] Further, since the laser irradiation having a high durability of the hydrophobic film formed in the light irradiation surface, it can maintain the hydrophobicity of the optical member on the light irradiated surface projection exposure apparatus installed in a long time.

[0197] 此外,按照与本实施形态有关的投影曝光装置,由于在基片台上安装了可在长时间内维持光照射面的疏水性的光学部件,故即使在重复进行液浸曝光的情况下,也能可靠地进行光学部件的光照射面上的排水。 [0197] Moreover, according to the projection exposure apparatus relating to the present embodiment, since the hydrophobicity of the substrate stage optical member can be maintained light irradiated surface for a long time the installation, so that even in a case where repeated liquid immersion exposure next, can be reliably drained light irradiated surface of the optical member.

[0198] 再有,在上述的实施形态中,在光学部件的光照射面上形成了由用二氧化硅(SiO2)构成的微粒子层构成的粘接微粒子层的基础上形成了由非晶质氟树脂构成的疏水性膜,但也可在光照射面上代替二氧化硅(SiO2)形成了由氟化镁(MgF2)或氟化钙(CaF2)构成的粘接微粒子层的基础上形成由非晶质氟树脂构成的疏水性膜。 [0198] Further, in the embodiment described above, the light irradiation surface of the optical member is formed by forming an amorphous layer of fine particles based adhesive layer composed of silicon dioxide (SiO2) constituting the hydrophobic membrane made of a fluororesin, but may be replaced by silicon dioxide (SiO2) is formed on the light irradiated surface by the magnesium fluoride (MgF2) or calcium fluoride (in CaF2) is formed from an adhesive base layer made of the fine particles the amorphous fluororesin is hydrophobic membrane. 或者,可混合或层叠二氧化硅(SiO2)、氟化镁(MgF2)和氟化钙(CaF2)中的任意的二种来构成粘接微粒子层,也可混合或层叠这些材料的三种来构成粘接微粒子层。 Alternatively, the silica may be mixed or laminated (SiO2), magnesium fluoride (MgF2) and calcium fluoride (in CaF2), arbitrary two kinds of fine particles to form the adhesive layer, may be mixed or laminated to three of these materials fine particles constituting the adhesive layer. 即使在该情况下,与在形成了由周二氧化硅(SiO2)构成的微粒子层构成的粘接微粒子层的基础上形成了由非晶质氟树脂构成的疏水性膜的情况同样,可作成在激光照射耐久性方面优良的疏水性膜。 Even in this case, formed with the case of forming a fine layer of an adhesive base layer made of the circumferential fine silica (SiO2) constituting the hydrophobic film composed of the amorphous fluororesin likewise, may be made in laser light irradiation aspect hydrophobic membrane excellent in durability.

[0199] 此外,在上述的实施形态中,在光学部件(例如光入射窗650)的光照射面上形成了由用二氧化硅(SiO2)构成的微粒子层构成的粘接微粒子层的基础上形成了由非晶质氟树脂构成的疏水性膜,但也可如图21中所示,通过例如使用氟化氢(或将氟化氢溶解于水的氢氟酸)刻蚀由石英玻璃666形成的光照射面的表面来形成粘接面(刻蚀面)668,在粘接面668的表面上形成由非晶质氟树脂构成的疏水性膜670。 [0199] Further, in the embodiment described above, the optical components (e.g. light entrance window 650) formed on the surface of a light irradiated adhesive base layer made of fine particle layer with silica (SiO2) constituting the forming a water-repellent film composed of an amorphous fluororesin, but may be as shown in FIG. 21, for example by using hydrogen fluoride (the hydrogen fluoride or hydrofluoric acid dissolved in water) irradiation light 666 formed by the etching of quartz glass surface of the face to form an adhesive surface (etching surface) 668, forming a hydrophobic film 670 made of amorphous fluorine resin on the surface of the adhesive surface 668. 在该情况下,由于具有用在光照射面上使用氟化氢刻蚀了的刻蚀面构成的粘接面,故如果在粘接面上形成由非晶质氟树脂构成的疏水性膜,则以非晶质氟树脂进入微粒子的空隙中而将其包围的方式干燥、固化。 In this case, since the adhesive surface of the surface illuminated with light of hydrogen fluoride etched surface is formed by etching in, if it is forming a hydrophobic film composed of the amorphous fluororesin bonding surface, places amorphous fluororesin enters voids in the fine particles, which surrounds the drying and solidification. 由于非晶质氟树脂本身的机械的强度高,故与基体材料密接的疏水性膜的强度高。 Due to the high mechanical strength of the amorphous fluororesin itself, so the high strength of the hydrophobic membrane is in close contact with the base material.

[0200] 此外,在本实施形态中,光照射面在基体材料玻璃和基体材料玻璃的表面的一部分上具有用于形成图案的金属膜(铬等),在其上形成了由非晶质氟树脂构成的疏水性膜, 但也可具有在基体材料玻璃和基体材料玻璃的整个面上形成的金属膜,在其上形成由非晶质氟树脂构成的疏水性膜。 [0200] Further, in the present embodiment, the light irradiation surface having on a portion of the glass and the surface of the base material as a glass matrix metal film (chromium or the like) for forming a pattern, formed by an amorphous fluorine on its hydrophobic membrane made of a resin, but may also have a metal film formed on the glass base material and the entire surface of the glass base material, forming a hydrophobic film composed of the amorphous fluororesin thereon. 这样的光学部件用作在监视投影透镜的透射率等时使用的高反射片。 Such an optical component used as a high reflection sheet for use in monitoring the transmittance of the projection lens and the like.

[0201] 此外,在本实施形态中,使用了以石英玻璃作为基体材料玻璃,但也可使用低膨胀的玻璃。 [0201] Further, in the present embodiment, quartz glass was used as the base material glass, low expansion glass but may also be used.

[0202] 以下,利用实施例具体地说明本实施形态的光学部件的制造方法。 [0202] Hereinafter, the manufacturing method according to the present embodiment is specifically described embodiment of the optical component.

[0203] 实施例A [0203] Example A

[0204] 通过利用照射超声波的自动清洗装置清洗或通过用浸透乙醇的布等擦拭进行成膜的光学部件(石英玻璃)的光照射面的表面,将表面清洗成高度清洁的表面。 [0204] By irradiation of ultrasonic cleaning or automatic cleaning apparatus for the deposition surface of the light irradiated surface of the optical part (quartz glass) by wiping with a cloth saturated with ethanol, the surface cleaning a surface highly clean.

[0205] 其次,在光学部件的表面上滴下相当量的将平均粒径为SOnm的MgF2的微粒子稳定地分散在碱溶液中的涂液,用高速旋转装置进行旋转涂敷。 [0205] Next, on the surface of the optical member dropped a considerable amount of fine particles of MgF2 having an average particle diameter of SOnm stably dispersed in the coating solution of the alkali solution by spin coating using a high speed rotating means. 干燥到涂液丧失流动性为止后,从高速旋转装置取下光学部件,为了使涂液完全干燥,使其在约150°C的干燥炉中进行1〜2小时的干燥。 After the coating liquid was dried until the loss of mobility, the device is removed from the high speed rotation of the optical member, in order to completely dry the coat solution, it was dried for 1 to 2 hours at approximately 150 ° C in a drying oven. 进而在冷却到室温的光学部件上滴下相当量的溶解了非晶质氟树脂(旭硝子(株)的「寸4卜W」)的涂液,用高速旋转装置进行旋转涂敷。 Further dropping a considerable amount of dissolved amorphous fluororesin on the optical member was cooled to room temperature (Asahi Glass (strain), "Bu 4 inch W") of the coating liquid by spin coating using a high speed rotating means. 干燥到涂液丧失流动性为止后,从高速旋转装置取下光学部件,为了使涂液完全干燥,使其在约100°c的干燥炉中进行1〜2小时的干燥。 After the coating liquid was dried until the loss of mobility, the device is removed from the high speed rotation of the optical member, in order to completely dry the coat solution, it was dried for 1 to 2 hours at about 100 ° c in a drying oven. 利用上述的工序,制造在基体材料玻璃(石英玻璃)上具有MgF2膜和非晶质氟树脂膜的光学部件。 With the above steps, an optical member for producing MgF2 film and an amorphous fluororesin film on the base material glass (quartz glass).

[0206] 实施例B [0206] Example B

[0207] 通过利用照射超声波的自动清洗装置清洗或通过用浸透乙醇的布等擦拭进行成膜的光学部件(石英玻璃)的光照射面的表面,将表面清洗成高度清洁的表面。 [0207] By irradiation of ultrasonic cleaning or automatic cleaning apparatus for the deposition surface of the light irradiated surface of the optical part (quartz glass) by wiping with a cloth saturated with ethanol, the surface cleaning a surface highly clean.

[0208] 其次,在光学部件的表面上滴下相当量的将平均粒径为SOnm的SiO2的微粒子稳定地分散在碱溶液中的涂液,用高速旋转装置进行旋转涂敷。 [0208] Next, on the surface of the optical member dropped a considerable amount of SOnm of the average particle diameter of SiO2 fine particles stably dispersed in the coating solution of the alkali solution by spin coating using a high speed rotating means. 干燥到涂液丧失流动性为止后,从高速旋转装置取下光学部件,为了使涂液完全干燥,使其在约150°C的干燥炉中进行1〜2小时的干燥。 After the coating liquid was dried until the loss of mobility, the device is removed from the high speed rotation of the optical member, in order to completely dry the coat solution, it was dried for 1 to 2 hours at approximately 150 ° C in a drying oven. 进而在冷却到室温的光学部件上滴下相当量的溶解了非晶质氟树脂(旭硝子(株)的「寸4卜W」)的涂液,用高速旋转装置进行旋转涂敷。 Further dropping a considerable amount of dissolved amorphous fluororesin on the optical member was cooled to room temperature (Asahi Glass (strain), "Bu 4 inch W") of the coating liquid by spin coating using a high speed rotating means. 干燥到涂液丧失流动性为止后,从高速旋转装置取下光学部件,为了使涂液完全干燥,使其在约100°C的干燥炉中进行1〜2小时的干燥。 After the coating liquid was dried until the loss of mobility, the device is removed from the high speed rotation of the optical member, in order to completely dry the coat solution, it was dried for 1 to 2 hours at about of 100 ° C drying oven. 利用上述的工序,制造在基体材料玻璃(石英玻璃)上具有SiO2膜和非晶质氟树脂膜的光学部件。 With the above steps, an optical member for producing an SiO2 film and an amorphous fluororesin film on the base material glass (quartz glass).

[0209] 实施例C [0209] Example C

[0210] 在将高精度地研磨到约0. 2nmRMS的粗糙度的光学部件(石英玻璃)的表面在5 秒间浸渍于稀释为5%的氢氟酸中后,用纯水洗涮氢氟酸,用浸透乙醇的布等擦拭。 [0210] In polishing the surface roughness with high accuracy of about 0. 2nmRMS optical member (quartz glass) in 5% hydrofluoric acid after 5 seconds between is immersed in a diluted, hydrofluoric acid with pure water Xishuan wiping with a cloth soaked in ethanol, and the like. 在该表面上滴下相当量的溶解了非晶质氟树脂(旭硝子(株)的「寸< 卜W」)的涂液,用高速旋转装置进行旋转涂敷。 It dropped onto the surface of a considerable amount of dissolved amorphous fluororesin (manufactured by Asahi Glass (strain) "inch <Pu W") of the coating liquid by spin coating using a high speed rotating means. 干燥到涂液丧失流动性为止后,从高速旋转装置取下光学部件,为了使涂液完全干燥,使其在约100°C的干燥炉中进行1〜2小时的干燥。 After the coating liquid was dried until the loss of mobility, the device is removed from the high speed rotation of the optical member, in order to completely dry the coat solution, it was dried for 1 to 2 hours at about of 100 ° C drying oven. 利用上述的工序, 制造在基体材料玻璃(石英玻璃)上具有非晶质氟树脂膜的光学部件。 With the above steps, manufacturing the optical member has an amorphous fluororesin film on the base material glass (quartz glass).

[0211] 比较例 [0211] Comparative Example

[0212] 通过利用照射超声波的自动清洗装置清洗或通过用浸透乙醇的布等擦拭进行成膜的光学部件(石英玻璃)的光照射面的表面,将表面清洗成高度清洁的表面。 [0212] By irradiation of ultrasonic cleaning or automatic cleaning apparatus for the deposition surface of the light irradiated surface of the optical part (quartz glass) by wiping with a cloth saturated with ethanol, the surface cleaning a surface highly clean. 其次,滴下相当量的溶解了非晶质氟树脂(旭硝子(株)的「寸< 卜W」)的涂液,用高速旋转装置进行旋转涂敷。 Secondly, a considerable amount of dissolved dropping an amorphous fluororesin (manufactured by Asahi Glass (strain) "inch <Pu W") of the coating liquid by spin coating using a high speed rotating means.

[0213] 干燥到涂液丧失流动性为止后,从高速旋转装置取下光学部件,为了使涂液完全干燥,使其在约100°c的干燥炉中进行1〜2小时的干燥。 [0213] the coating liquid was dried until the loss of mobility, the device is removed from the high speed rotation of the optical member, in order to completely dry the coat solution, it was dried for 1 to 2 hours at about 100 ° c in a drying oven. 利用上述的工序,制造在基体材料玻璃(石英玻璃)上具有非晶质氟树脂膜的光学部件。 With the above steps, manufacturing the optical member has an amorphous fluororesin film on the base material glass (quartz glass).

[0214](剥离测试) [0214] (peel test)

[0215] 对于用上述的实施例A〜C和比较例得到的光学部件,进行了使用透明绞带的剥离测试(带测试)。 [0215] For an optical member using the above Examples and Comparative Examples A~C obtained were transparent twisted tape peel test (tape test). 关于带测试,使用宽度为18mm的二★ 〃 >株式会社的透明绞带,在粘贴带时,用手指用力地抹平3次,通过迅速地垂直地剥离,判断了膜的剥离的程度。 About tape test, a width of 18mm is two ★ 〃> Corporation transparent twisted tape, when the adhesive tape with a finger three times forced to smooth, quickly peeled vertically by determining the extent of the release film. 将在各例子中得到的光学部件作为样品,各准备3个样品,分别进行了测试。 The optical members obtained in the examples as a sample, prepare three samples of each were tested.

[0216] 作为评价值的基准,将在疏水层中有大于等于Φ 5mm的剥离的情况定为「发生剥离」,将除此以外的情况定为「没有剥离」。 [0216] As a reference evaluation value, there will be in the hydrophobic layer is greater than or equal to 5mm Φ case as peeling "peeled off" the other cases as "no peeling." 3/3表示3个样品中都剥离了。 3/3 represents a 3 samples were peeled off.

[0217](试验结果) [0217] (Test Results)

[0218] 实施例A 0/3个没有剥离[0219] 实施例B 0/3个没有剥离 [0218] Example A 0/3 months no peeling [0219] Example B 0/3 one embodiment no peeling

[0220] 实施例C 0/3个没有剥离 [0220] Example C 0/3 a No peeling

[0221] 比较例3/3个发生剥离 [0221] peeling occurred Comparative Example 3/3

[0222] 从该试验结果可明白,对于实施例A〜实施例C的疏水性膜来说,由于设置了粘接层或刻蚀面,故牢固地粘接到基体材料玻璃上。 [0222] may be apparent from the test results, Examples of the hydrophobic film of Example C A~ embodiment, since an adhesive layer is provided or etching the surface, so that the material is firmly bonded to the glass substrate. 因而,可知本发明的光学构件在液浸曝光那样的与液体接触的环境下,耐液性(耐水性)高。 Accordingly, the optical member of the present invention is found in an environment such as a liquid immersion lithography in contact with the liquid, liquid resistance (water resistance) high.

[0223] 在本实施例中,以疏水性膜粘接到基体材料玻璃上的情况为例进行了说明,根据该结果可知,能将本发明使用于任意的广泛的光学部件。 [0223] In the present embodiment, the hydrophobic film material adhered to the case where a glass substrate has been described as an example, based on the results, can be used in any of a wide range of the optical component of the present invention. 即,不限定于使用于在液浸曝光装置的基片台上设置的基准构件或各种传感器,也可使用于在与液体或气体接触那样的环境下使用的所有的光学透镜、光学传感器。 That is, not limited to the use of various sensors to the reference member or the liquid immersion exposure apparatus is disposed on the substrate stage, also can be used for all optical lenses used in an environment such as contacting with a liquid or gas, the optical sensor. 此外,也可适用于在曝光装置中使用的投影光学系统、特别是在基片一侧的前端安装的透镜或照明光学系统中使用的透镜或传感器。 Furthermore, also applicable to the projection optical system used in an exposure apparatus, a lens or a sensor is used particularly in the illumination optical system or a lens attached to an end of one side of the substrate.

[0224] 再有,在上述的实施形态中记载的「接触角」,不仅包含静态的接触角,而且包含动态的接触角。 [0224] Further, the above embodiment described in the "contact angle", includes not only the static contact angle, dynamic contact angle and includes.

[0225] 在上述曝光装置的实施形态中使用了纯水作为液体1。 [0225] In the embodiment of the pure water is used in the exposure apparatus 1 as a liquid. 纯水具有下述的优点:在半导体制造工厂等中可容易地大量地得到,同时没有对于基片P上的光刻胶或光学元件(透镜)等的不良影响。 Water has the following advantages: a large amount can be obtained in a semiconductor manufacturing factory or the like easily, and there is no adverse effect on the photoresist or the optical element on the substrate P (lens) and the like. 此外,由于纯水没有对于环境的不良影响,同时杂质的含量极低,故也可预期清洗基片P的表面和投影光学系统PL的前端面上设置的光学元件的表面的作用。 Further, since the pure water for no adverse environmental impact, while a very low content of impurities, it is also contemplated that the cleaning action of the surface of the optical element provided front face surface of the substrate P and the projection optical system PL. 再有,在从工厂等供给的纯水的纯度低的情况下,也可使曝光装置具有超纯水制造器。 Furthermore, in the purity of pure water supplied from the factory or the like is low, the exposure apparatus can also have ultra-pure water production unit.

[0226] 上述各实施形态的液体1是水,但也可以是水以外的液体。 [0226] the above-described embodiment the liquid 1 is water, but may be a liquid other than water. 例如,在曝光光EL的光源是F2激光的情况下,由于该F2激光不透过水,故可以是能透过F2激光的例如过氟化聚醚(PFPE)或氟油等氟类流体作为液体1。 For example, exposure light beam EL in the case where the light source is the F2 laser, the F2 laser light does not pass through since the water, it may be able to pass through as perfluorinated polyether (the PFPE) or fluorine oil, fluorine-based fluid F2 laser light e.g. liquid 1. 在该情况下,通过例如用包含氟的极性小的分子结构的物质形成薄膜,对与液体1接触的部分进行亲液化处理。 In this case, on the part in contact with the liquid 1, for example, lyophilic treatment by forming a thin film with a small polar substances molecular structure containing fluorine. 除此以外,也可使用具有对曝光光EL的透过性且折射率尽可能高、对投影光学系统PL或在基片P的表面上涂敷的光刻胶稳定的液体(例如雪松油)作为液体1。 In addition, also be used for the exposure light beam EL having a transmittance and a refractive index as high as possible, the projection optical system PL and the photoresist stable liquid applied on the surface of the substrate P (for example, cedar oil) 1 as the liquid. 在该情况下,可根据所使用的液体1的极性来进行表面处理。 In this case, the surface treatment can be performed depending on the polarity of the liquid 1 used.

[0227] 纯水(水)对于波长约为193nm的曝光光EL的折射率η可以说大致约为1. 44, 在使用了ArF准分子激光(波长193nm)作为曝光光EL的光源的情况下,在基片P上波长降低为1/n、即约134nm,可得到高的解像度。 In the case [0227] of pure water (water) refractive index of a wavelength of about 193nm η exposure light beam EL can be said generally about 1.44, the use of ArF excimer laser (wavelength 193nm) as the light source of the exposure light beam EL , the wavelength on the substrate P is reduced to 1 / n, i.e., approximately 134 nm, a high resolution can be obtained. 再者,由于与空气中相比,聚焦深度扩大为约η倍、即约1.44倍,故在能确保与在空气中使用的情况为同等程度的聚焦深度即可的情况下,可进一步增加投影光学系统PL的数值孔径,在这一点上,解像度也提高了。 Further, as compared with the air, to expand the depth of focus of about η times, i.e., about 1.44 times, it can be secured in use in a case where the air is the same level as the case where the depth of focus can be further increased projection the numerical aperture of the optical system PL, on this point, the resolution is also improved.

[0228] 再有,在如上所述那样使用液浸法的情况下,投影光学系统的数值孔径NA有时为0. 9〜1. 3。 [0228] Further, the case of using the liquid immersion method as described above, the numerical aperture NA of the projection optical system is sometimes 0. 9~1. 3. 这样,在投影光学系统的数值孔径NA变大的情况下,由于在迄今为止作为曝光光使用的随机偏振光中成像性能有时因偏振效应而恶化,故希望使用偏振光照明。 Thus, in the case where the numerical aperture NA of the projection optical system becomes large, because the image formation performance is sometimes deteriorated by the polarization effect of the random polarized light hitherto used in the exposure, it is desirable to use polarized illumination. 在该情况下,最好进行与掩模(中间掩模)的「线和间隔」图案的线图案的长边方向一致的直线偏振光照明,从掩模(中间掩模)的图案较多地射出S偏振光分量(TE偏振光分量)、即沿线图案的长边方向的偏振光方向分量的衍射光。 In this case, the longitudinal direction is preferably uniform with a mask (reticle) is "line and space" pattern line pattern linearly polarized light illumination, the mask (reticle) pattern of more to emits S-polarized component (TE-polarized component), i.e., diffracted light polarization direction along the longitudinal direction of the component pattern. 在用液体充满投影光学系统PL与在基片P的表面上涂敷的光刻胶之间的情况下,与用空气充满投影光学系统PL与在基片P的表面上涂敷的光刻胶之间的情况相比,由于有助于对比度的提高的S偏振光分量(TE偏振光分量)的衍射光的在光刻胶表面上的透射率变高,故即使在投影光学系统的数值孔径NA超过1. 0的情况下,也能得到高的成像性能。 In the case of the liquid between the projection optical system PL is filled with the coating on the surface of the resist of the substrate P, and the projection optical system PL is filled with the coating on the surface of the substrate P photoresist air comparison between the case, since the S-polarized component contributes to improving contrast (TE-polarized light component) diffracted light transmittance on the resist surface becomes high, so the numerical aperture of projection optical system even in a case where the NA more than 1.0, it is possible to obtain high imaging performance. 此外,如果适当地组合移相掩模或在特开平6-188169号公报中公开了那样的与线图案的长边方向一致的斜入射照明法(特别是偶极照明法)等, 则会更加有效。 In addition, if properly combined or discloses a phase-shifting mask as the longitudinal direction coincides with the line pattern of the oblique incidence illumination method (especially the dipole illumination method) or the like in JP-A-6-188169, it will be more effective.

[0229] 此外,例如在将ArF准分子激光作为曝光光、使用约1/4的缩小倍率的投影光学系统PL、在基片P上曝光微细的「线和间隔」图案(例如约25〜50nm的「线和间隔」)那样的情况下,根据掩模M的结构(例如图案的微细度或铬的厚度),由于利用波导(Wave guide)效应掩模M起到偏振片的作用,与使对比度下降的P偏振光分量(TM偏振光分量) 的衍射光相比,从掩模M较多地射出S偏振光分量(TE偏振光分量)的衍射光,故希望使用上述的直线偏振光照明,但即使用随机偏振光照明掩模M,即使在投影光学系统PL的数值孔径NA大到0. 9〜1. 3的情况下,也能得到高的成像性能。 [0229] Further, for example, when the ArF excimer laser as the exposure light, using a reduction magnification of about 1/4 of the projection optical system PL, the substrate P is exposed in a fine "line and space" pattern (e.g. about 25~50nm the "line and space") such a case, the structure of mask M (e.g., thickness or fineness of a pattern of chrome), since the waveguide (Wave guide) effect of the mask M acts as a polarizing plate, and so that P-polarized component (TM-polarized light component) diffracted light of the reduction in contrast as compared to more emits S-polarized component (TE-polarized light component) diffracted light from the mask M, it is desirable to use the above-described linearly polarized light illumination but that the use of the random polarized light illuminating the mask M, even if the numerical aperture NA of the projection optical system PL is as large as 0.5 9~1. 3 a case, a high imaging performance can be obtained. 此外,在基片P上曝光掩模M 上的极微细的「线和间隔」图案那样的情况下,由于WireGrid效应的缘故,也存在P偏振光分量(TM偏振光分量)比S偏振光分量(TE偏振光分量)大的可能性,但在将ArF准分子激光作为曝光光、使用约1/4的缩小倍率的投影光学系统PL、在基片P上曝光比25nm大的「线和间隔」图案那样的情况下,由于从掩模M射出比P偏振光分量(TM偏振光分量)的衍射光多的S偏振光分量(TE偏振光分量)的衍射光,故即使在投影光学系统的数值孔径NA 为0. 9〜1. 3那样大的情况下,也能得到高的成像性能。 Under those Moreover, extremely fine exposure on the mask M on the substrate P "line and space" pattern where, due WireGrid effect, there is also P-polarized component (TM-polarized light component) than the S-polarized component (TE-polarized component) high probability, but the ArF excimer laser as the exposure light, using a reduction magnification of about 1/4 of the projection optical system PL, the exposure on the substrate P 25nm greater than "line and space such a case, "the pattern, since the emitted light more than the P-polarized component (TM-polarized light component) diffracted S-polarized component (TE-polarized component) diffracted light from the mask M, so that even when the projection optical system the numerical aperture NA of 0. 9~1. 3 that is large, it is possible to obtain high imaging performance.

[0230] 再者,不仅与掩模(中间掩模)的线图案的长边方向一致的直线偏振光照明(S偏振光照明)是有效的,而且如在特开平6-53120号公报中公开了的那样,在以光轴为中心的圆的切线(周)方向上呈直线偏振光的偏振光照明法与斜入射照明法的组合也是有效的。 Consistent with the longitudinal direction [0230] Furthermore, not only the line pattern of the mask (reticle) is linearly polarized light illumination (S polarized light illumination) is effective, and as disclosed in Japanese Patent Publication No. 6-53120 in as a combination of linearly polarized light on the optical axis of the circle tangential (circumferential) direction of the polarized illumination method and the oblique incident illumination method is also effective. 特别是,不仅是掩模(中间掩模)的图案在规定的一个方向上延伸的线图案、而且在混合地存在在多个不同的方向上延伸的线图案的情况下,如在相同的特开平6-53120号公报中公开了的那样,通过合并使用在以光轴为中心的圆的切线(周)方向上呈直线偏振光的偏振光照明法和轮带照明法,即使在投影光学系统的数值孔径NA大的情况下,也能得到高的成像性能。 In particular, not only the line pattern mask (reticle) pattern extending in a predetermined direction, and the case where the line pattern extending in a plurality of different directions, such as in the presence of the same Patent mixedly Patent Publication No. 6-53120 disclosed above, by combining the use of the optical axis of the tangent to the circle (circumference) linearly polarized illumination method and the polarized illumination method belt direction, even when the projection optical system the numerical aperture NA larger case, a high imaging performance can be obtained.

[0231] 在上述各实施形态中,在投影光学系统PL的前端安装了光学元件2,利用该透镜, 可进行投影光学系统PL的光学特性、例如像差(球面像差、彗形像差等)的调整。 [0231] In the above embodiment, the front end of the projection optical system PL of the optical element 2 is mounted by the lens, the optical characteristics of the projection optical system PL, for example, the aberration (spherical aberration, comatic ) adjustment. 再有,作为在投影光学系统PL的前端安装的光学元件,可以是在投影光学系统PL的光学特性的调整中使用的光学板。 Further, as the optical element attached to the tip of the projection optical system PL, it may be an optical plate used to adjust the optical characteristics of the projection optical system PL. 或者可以是能透过曝光光EL的平行平面板。 Or it may be a plane-parallel plates transparent to the exposure light EL. 通过将与液体1接触的光学元件作成比透镜廉价的平行平面板,即使在曝光装置EX的运输、组装、调整时等使投影光学系统PL的透射率、基片P上的曝光光EL的照度和照度分布的均勻性下降的物质(例如硅类有机物)附着于该平行平面板上,在供给液体1之前只更换该平行平面板也就可以了,与将与液体1接触的光学元件作成透镜的情况相比,具有其更换成本降低的优点。 By creating the optical element the liquid 1 contact cheaper than the lens plane-parallel plate, even in the exposure apparatus EX of transportation, assembly, transmittance of the projection optical system PL is adjusted such exposure light beam EL on the substrate P illuminance and material (e.g., silicon-based organic matter) uniformly lowered illuminance distribution plate adhered to the parallel plane, the liquid is supplied prior to replacement of the parallel plate 1 will be able, with the contact with the liquid optical element made of a lens compared with a case, which has the advantage that the exchange cost is lowered. 艮口, 由于因曝光光EL的照射的缘故,起因于从光刻胶发生的飞散粒子或液体1中的杂质的附着等,与液体1接触的光学元件的表面受到污染,必须定期地更换该光学元件,但通过将该光学元件作成廉价的平行平面板,与透镜相比,更换部件的成本降低而且可缩短在更换中需要的时间,可抑制维护成本(运行成本)的上升或单位时间产量的下降。 Gen mouth, because for the sake of exposure light EL is irradiated, scattering due to liquid adhesion of particles or impurity from the resist occurs, the liquid surface in contact with the optical element 1 is contaminated, must be periodically replaced the optical element, but cheap plane parallel plate made by the optical element, as compared with the lens, and decrease the cost of replacement parts can shorten the time required for the replacement can be suppressed maintenance cost (running cost) increase the yield per unit time, or Decline.

[0232] 再有,在因液体1的流动产生的投影光学系统PL的前端的光学元件与基片P之间的压力大的情况下,不将该光学元件作成可更换的元件,而是可将其牢固地固定,以免光学元件因该压力而移动。 [0232] Further, at a pressure between the end of the projection optical system 1 by the flow of the liquid generated by the optical element PL and the substrate P is large, the element is not an optical element made replaceable, but may it is firmly fixed, lest the optical elements because of the pressure and movement. [0233] 再有,在上述的各实施形态中,投影光学系统PL与基片P的表面之间是用液体1 充满的结构,但例如也可以是在基片P的表面上安装了由平行平面板构成的覆盖玻璃的状态下充满液体1的结构。 [0233] Further, in each of the embodiments described above, between the surface of the projection optical system PL and the substrate P is filled with the liquid 1 structure, but, for example, may be mounted on a surface of the parallel substrate P structure of the liquid 1 is filled in a state of the cover glass flat plates.

[0234] 此外,应用了上述的液浸法的曝光装置成为用液体(纯水)充满投影光学系统PL的终端光学元件2的射出侧的光路空间来曝光基片P的结构,但也可如国际公开第2004/019128号中公开了的那样,也可用液体(纯水)充满投影光学系统PL的终端光学元件2的入射侧的光路空间。 [0234] In addition, the application of the exposure apparatus of the liquid immersion method has the structure of the final optical element filled with the projection optical system PL with the liquid (pure water) emits the optical path space side 2 of the exposing substrate P, but can also be as international Publication No. 2004/019128 disclosed above, the terminal of the optical element may also be a liquid (water) projection optical system PL is filled with the optical path space 2 of the incident side.

[0235] 再有,作为上述各实施形态的基片P,不仅可应用半导体器件制造用的半导体晶片,而且可应用于显示器件用的玻璃基片或薄膜磁头用的陶瓷晶片或在曝光装置中使用的掩模或中间掩模的原版(合成石英、硅晶片)等。 [0235] Further, as the above-described embodiment of the substrate P, can be applied to not only a semiconductor wafer for manufacturing a semiconductor device, but may be applied to a ceramic wafer or glass substrate with the thin film magnetic head used in the display device in the exposure apparatus or a mask or reticle using the original plate (synthetic quartz, silicon wafer) and the like.

[0236] 作为曝光装置EX,除了同步移动掩模M和基片P以对掩模M的图案进行扫描曝光的「步进和扫描」方式的扫描型曝光装置(扫描步进器)外,也可适用于在使掩模M和基片P静止了的状态下一并曝光掩模M的图案、依次使基片步进地移动的「步进和重复」方式的投影曝光装置(步进器)。 [0236] As the exposure apparatus EX, in addition to the synchronous movement of the mask M and the substrate P in a pattern on the mask M scanning type exposure apparatus (scanning stepper) scanning exposure "step-and-scan" manner, but also applied to the mask M and the substrate P in a stationary state of the next pattern, and an exposure mask M, a substrate sequentially moved step by step in the "step and repeat" manner projection exposure apparatus (stepper ). 本发明也可适用于在基片上部分地重复至少2个图案来转印的「步进和重叠」方式的曝光装置。 The present invention is also applicable to an exposure apparatus is repeated at least two patterns on the substrate is partially transferred to "step-and-overlapping" manner.

[0237] 此外,在上述的实施形态中,采用了用液体局部地充满投影光学系统PL与基片P 之间的曝光装置,但也可将本发明适用于用液体覆盖曝光对象的基片的全部表面的液浸曝光装置。 [0237] Further, in the embodiment described above, the use of the exposure apparatus between the projection optical system PL is filled with liquid and the substrate is locally to P, but the present invention can also be applied to the substrate to cover the exposure of the object with a liquid entire surface liquid immersion exposure apparatus. 用液体覆盖曝光对象的基片的全部表面的液浸曝光装置的结构和曝光工作,例如在特开平6-124873号公报、特开平10-303114号公报、美国专利第5,825,043号中详细地记载了,只要在本国际申请中指定或选择的国的法令中容许,引用这些文献的记载内容,作为本文的记载的一部分。 Structure and an exposure work to cover the entire surface of the substrate exposed objects with a liquid immersion exposure apparatus, for example, in Japanese Unexamined Patent Publication No. 6-124873, Laid-Open No. 10-303114, in U.S. Patent No. 5,825,043 described in detail, laws and ordinances of designated or selected in this international application permit in China, references disclosed contents of these documents as part described herein.

[0238] 作为曝光装置EX的种类,不限于在基片P上曝光半导体元件图案的制造半导体元件用的曝光装置,也可广泛地适用于液晶显示元件制造用或显示器制造用的曝光装置或用于制造薄膜磁头、摄像元件(CXD)或中间掩模或掩模等的曝光装置等。 An exposure apparatus for manufacturing a semiconductor device using [0238] The type of the exposure apparatus EX is not limited to the exposure of the semiconductor device pattern on the substrate P, is also widely applicable to the liquid crystal display exposure apparatus element manufacturing or display manufacturing, or with in the manufacture of thin film magnetic heads, image pickup elements (CXD) mask or reticle, or the like of an exposure apparatus or the like.

[0239] 在基片台PST(晶片台609)或掩模台MST中使用直线电机的情况下,可使用采用了空气轴承的空气上浮型和采用了洛仑兹力或电抗力的磁浮型的任一种。 [0239] In the mask stage MST in the case of using a linear motor substrate stage PST (wafer stage 609) or, may be employed using the air and the air bearing floating type using Lorentz force or reactance force type maglev either. 此外,关于各台PST(609)、MST,可以是沿导轨移动的类型,也可以是不设置导轨的无导轨的类型。 Further, regarding each stage PST (609), MST, may be moved along the rail type, or may be not provided free rail type rail. 在台中使用了直线电机的例子,在美国专利5,623,853和5,528,118中公开了,只要在本国际申请中指定或选择的国的法令中容许,分别引用这些文献的记载内容,作为本文的记载的一部分。 Using a linear motor in Taichung example, it is disclosed in U.S. Patent Nos. 5,623,853 and 5,528,118, laws and ordinances of designated or selected in this international application permit in China were described by reference to the contents of these documents as described herein portion.

[0240] 作为各台PST(609)、MST的驱动机构,可使用以二维方式配置了磁铁的磁铁单元、利用与以二维方式配置了线圈的电枢单元对置的电磁力来驱动台PST(609)、MST的平面电机。 [0240] As each stage PST (609), MST drive mechanism may be used in a two-dimensionally arranged magnets of the magnet unit, a two-dimensional electromagnetic force and an armature coil disposed facing the driven unit table PST (609), MST planar motor. 在该情况下,将磁铁单元和电枢单元的某一方连接到台PST(609)、MST上、在台PST(609)、MST的移动面一侧设置磁铁单元和电枢单元的另一方即可。 In this case, either the magnet unit and the armature unit is connected to the stage PST (609), the MST, the stage PST (609), MST is movable surface side of the magnet unit and the armature unit is provided to the other i.e. can.

[0241] 可使用框构件以机械的方式将因基片台PST(609)的移动而发生的反力散逸到地面(大地),以免传递给投影光学系统PL。 [0241] member may be used to mechanically block the reaction force by the movement of the substrate stage PST (609), which occurs dissipated to ground (earth), so as to pass the projection optical system PL. 例如在美国专利5,528,118 (特开平8-166475 号公报)中详细地公开了该反力的处理方法,只要在本国际申请中指定或选择的国的法令中容许,引用这些文献的记载内容,作为本文的记载的一部分。 For example, in U.S. Patent No. 5,528,118 (Laid-Open No. 8-166475) are disclosed in detail in the method for handling the reaction force, State laws in designated or selected in this international application permit, these documents cited All specifications described herein as part of.

[0242] 也可使用框构件以机械的方式将因掩模台MST的移动而发生的反力散逸到地面(大地),以免传递给投影光学系统PL。 [0242] Also the frame member may be used in the reaction force mechanically by movement of the mask stage MST occurs dissipated to ground (earth), so as to pass the projection optical system PL. 例如在美国专利5,874,820 (特开平8-330224号公报)中详细地公开了该反力的处理方法,只要在本国际申请中指定或选择的国的法令中容许,引用这些文献的记载内容,作为本文的记载的一部分。 For example, in U.S. Patent No. 5,874,820 (Laid-Open No. 8-330224) is disclosed in detail in the method for handling the reaction force, State laws in designated or selected in this international application permit, these documents cited All specifications described herein as part of.

[0243] 如上所述,通过组装包含在本申请的权利要求的范围内举出的各构成要素的各种子系统来制造本申请的实施形态的曝光装置EX,以便保证规定的机械的精度、电的精度、光学的精度。 [0243] As described above, by assembling the exposure apparatus EX includes various subsystems manufactured embodiment of the present application include each component in the range of the claims of the present application, in order to ensure a predetermined mechanical precision, precision, accuracy of the optical power. 为了确保这些各种精度,在该组装的前后,关于各种光学系统进行用于达到光学的精度的调整、关于各种机械系统进行用于达到机械的精度的调整、关于各种电的系统进行用于达到电的精度的调整。 To ensure these various accuracies, before and after the assembling include the adjustment for various optical systems for achieving precision optical, mechanical systems for various adjustment for achieving the mechanical accuracy for various electric systems adjustment for achieving the electric accuracy. 从各种子系统到曝光装置的组装工序包含各种子系统相互的机械的连接、电路的布线连接、气压管路的管线连接等。 The assembly process from the various subsystems to the exposure apparatus comprises a wiring connecting the various subsystems to each other mechanical connections, the circuit, the line pressure line connections. 在从该各种子系统到曝光装置的组装工序之前,当然有各子系统各自的组装工序。 Prior to assembling the various subsystems of the process from the exposure apparatus, each of the subsystems of course the assembly process. 若各种子系统到曝光装置的组装工序结束后,进行综合调整,以确保作为曝光装置整体的各种精度。 When the process of assembling the various subsystems into the exposure apparatus, overall adjustment is performed to ensure the various accuracies as the entire exposure apparatus. 再有,希望在温度和清洁度得到管理的清洁室中进行曝光装置的制造。 Further, it is desirable to obtain an exposure apparatus for producing the management of the clean room at a temperature and cleanliness.

[0244] 如图17中所示,经过进行微器件的功能、性能设计的步骤201、制作基于该设计步骤的掩模(中间掩模)的步骤202、制造作为器件的基体材料的基片的步骤203、利用上述的实施形态的曝光装置EX在基片上曝光掩模的图案的曝光处理步骤204、器件组装步骤(包含划片工序、键合工序、封装工序)205和检查步骤206等来制造半导体器件等的微器件。 [0244] In the step shown in FIG. 17, through the micro device functions and performance design 201, the step of making a mask based on the design step (reticle) 202, as a base material for producing a device substrate step 203, the exposure processing step using the above-described embodiment of the exposure apparatus EX on the substrate exposure mask pattern 204, the device assembly step (including a dicing step, a bonding step, a packaging step) 205 and the inspection step 206, etc. manufactured micro devices such as semiconductor devices.

[0245] 产业上利用的可能性 [0245] possibility INDUSTRIAL

[0246] 按照本发明的曝光装置,由于可抑制液体的流出来进行曝光处理,可防止液体的残留,故能以高的曝光精度来进行液浸曝光。 [0246] The exposure apparatus according to the present invention, since the flow of the liquid is suppressed out of the exposure process, the residual liquid can be prevented, it can with high accuracy exposure to liquid immersion exposure.

[0247] 按照本发明的光学部件,由形成粘接微粒子层的二氧化硅(SiO2)、氟化镁(MgF2) 和氟化钙(CaF2)中的至少一种构成的微粒子层可得到与基体材料的玻璃(主要成分SiO2) 的亲和性良好、与基体材料玻璃恰好的密接性。 [0247] The optical member according to the present invention, silicon dioxide (SiO2) particles forming an adhesive layer, magnesium fluoride (MgF2) and calcium fluoride (in CaF2) at least one layer composed of fine particles and the matrix obtained affinity glass material (main component SiO2) good, the base material of the glass just adhesiveness. 此外,在表面上产生来源于粒子的直径的凹凸。 Further, the diameter of the particle generation from irregularities on the surface. 再者,由于二氧化硅等是紫外线透射率非常高的材料,故其本身的激光照射耐久性也高。 Further, since silica is very high ultraviolet transmittance material itself, so the laser irradiation high durability. 因而,在形成了由二氧化硅(Si02)、氟化镁(MgF2)和氟化钙(CaF2)中的至少一种构成的微粒子层后形成由非晶质氟树脂构成的疏水性膜。 Accordingly, a water repellent film formed silica (Si02), magnesium fluoride (MgF2) and calcium fluoride (in CaF2) at least one layer composed of the fine particles is formed of formed of an amorphous fluororesin. 以非晶质氟树脂进入二氧化硅等的微粒子的空隙中而将其包围的方式干燥、固化。 Void in an amorphous fluororesin enters the silica fine particles and the like in the surrounding of drying and solidification. 由于非晶质氟树脂本身的机械的强度高,故与基体材料密接的疏水性膜的强度高。 Due to the high mechanical strength of the amorphous fluororesin itself, so the high strength of the hydrophobic membrane is in close contact with the base material. 因此,可适用于与液体相接的广泛的环境中使用的光学部件或光学传感器。 Thus, the optical member or an optical sensor adapted for use in a wide range of environments in contact with the liquid.

[0248] 此外,按照本发明的光学部件,由于在光照射面上具有由利用氟化氢刻蚀的刻蚀面构成的粘接面,故如果在粘接面上形成由非晶质氟树脂构成的疏水性膜,则以非晶质氟树脂进入粘接面的空隙中而将其包围的方式干燥、固化。 [0248] Further, the optical member according to the present invention, since an adhesive surface composed of etching the surface with hydrogen fluoride in the etching of the light irradiated surface, if it is formed by the bonding surface of the amorphous fluororesin hydrophobic membrane, places the amorphous fluororesin enters voids in the bonding surface, which surrounds the drying and solidification. 由于非晶质氟树脂本身的机械的强度高,故与基体材料密接的疏水性膜的强度高。 Due to the high mechanical strength of the amorphous fluororesin itself, so the high strength of the hydrophobic membrane is in close contact with the base material. 因此,可适用于与液体相接的广泛的环境中使用的光学部件或光学传感器。 Thus, the optical member or an optical sensor adapted for use in a wide range of environments in contact with the liquid.

[0249] 此外,按照本发明的投影曝光装置,由于在基片台上安装了能在长时间内维持光照射面的疏水性的光学部件,故即使在重复进行液浸曝光的情况下,也能可靠地进行光学部件的光照射面上的排水。 In the case [0249] Moreover, projection exposure apparatus according to the present invention, since the hydrophobicity of the substrate stage to maintain the optical member of the light irradiated surface for a long time the installation, so that even if the liquid immersion exposure is repeatedly performed, and can be reliably drained light irradiated surface of the optical member.

Claims (36)

1. 一种经液体对基片照射曝光光以对基片曝光的曝光装置,其特征在于: 具备:将图案的像投影在基片上的投影光学系统;以及面对上述投影光学系统的像面设置的用于保持基片的基片台,该基片台具有基片托, 以包围被保持在上述基片托上的上述基片的方式并以可更换的方式设置在基片台上的构件,该构件的表面的至少一部分呈疏液性。 An exposure apparatus through the liquid light exposure on the substrate, wherein the substrate is irradiated for exposure: comprising: a projection image of a pattern in the projection optical system on the substrate; and the image plane of the projection optical system facing for holding the substrate disposed in the substrate table, the substrate table having a substrate holder, to surround said substrate to be held on the substrate holder and is replaceably disposed in the substrate stage member, at least a portion of the surface of the liquid-repellent member of the form.
2.如权利要求1中所述的曝光装置,其特征在于:根据与其疏液性的恶化有对应关系的上述基片的曝光片数、上述构件的使用时间、以及曝光光的照射量中的至少一个来更换上述构件。 2. The exposure apparatus according to claim 1, wherein: said substrate has a number of sheets according to a correspondence relationship deteriorating its exposure lyophobic property, the time of the member, and the amount of exposure light is irradiated in at least one of a replacement of the member.
3.如权利要求1中所述的曝光装置,其特征在于:上述构件具有其表面与由上述基片台保持的基片表面为同一面的平坦部。 The exposure apparatus as claimed in claim 1, wherein: said member having a surface of the substrate surface held by the substrate stage is flush with a flat portion.
4.如权利要求3中所述的曝光装置,其特征在于: 在上述基片的周围配置了上述平坦部。 The exposure apparatus as claimed in claim 3, wherein: said substrate around the flat portion arranged.
5.如权利要求4中所述的曝光装置,其特征在于: 具备用于对上述基片台装卸上述构件的装卸机构。 The exposure apparatus according to claim 4, further comprising: a detachable means for detachably above the base member of the substrate stage.
6.如权利要求5中所述的曝光装置,其特征在于:上述装卸机构可将上述构件与上述基片一起从上述基片台取下。 6. The exposure apparatus according to claim 5, wherein: said loader means may be removed from the substrate together with the stage member and the above-described substrate.
7.如权利要求1中所述的曝光装置,其特征在于: 上述构件的至少其疏液性部分由聚四氟乙烯形成。 7. The exposure apparatus according to claim 1, wherein: at least a portion of the liquid-repellent member is formed of polytetrafluoroethylene.
8. 一种器件制造方法,其特征在于: 使用权利要求1中所述的曝光装置进行曝光, 对器件进行组装。 A device manufacturing method comprising: an exposure apparatus 1. The exposure used in the claims, the device is assembled.
9. 一种经投影光学系统和液体在基片上照射曝光光以对上述基片进行液浸曝光的曝光方法,其特征在于:用基片保持构件保持上述基片,上述基片保持构件在上述基片的周围具有其表面与该基片表面为同一面的平坦部, 将保持上述基片的上述基片保持构件运入到基片台上, 对运入到上述基片台上的上述基片进行液浸曝光,在上述液浸曝光结束后,从上述基片台运出保持上述基片的上述基片保持构件, 其中,上述基片保持构件的平坦部的表面呈疏液性。 A is irradiated on the substrate by exposing the projection optical system and the liquid light exposure method of the above-described substrate for liquid immersion exposure, wherein: the substrate holding member for holding said substrate, said substrate holding member in the above periphery of the substrate having its surface and the substrate surface is flush with the flat portion of the substrate holding member holding said substrate is carried into the substrate stage, is carried into the base of said substrate stage sheet for liquid immersion exposure, after the liquid immersion exposure, out of the above-described substrate holding member holding said substrate from said substrate stage, wherein the flat surface portion of the substrate holding member as a liquid-repellent.
10. 一种器件制造方法,其特征在于: 使用权利要求9中所述的曝光方法进行曝光, 对器件进行组装。 10. A device manufacturing method comprising: an exposure method of claim 9, used in the claims is exposed, the device is assembled.
11. 一种经液体对基片照射曝光光以对基片曝光的曝光装置,其特征在于: 具备:将图案的像投影在基片上的投影光学系统;以及可相对投影光学系统移动的移动台,设置在上述移动台上的疏液性构件,其具有通过移动而与上述投影光学系统相对的表面,上述表面的至少一部分呈疏液性,并且在上述投影光学系统与上述表面之间形成有液浸区域,其中,该疏液性构件是可更换的。 11. An exposure apparatus through the liquid light exposure on the substrate, wherein the substrate is irradiated for exposure: comprising: a projection image of a pattern on a substrate, a projection optical system; movement relative to the projection optical system and a mobile station liquid-repellent member is provided on the movable table having the above-described projection optical system by moving the opposing surfaces, at least a portion of the surface as a liquid-repellent and is formed between the projection optical system and the surface the liquid immersion area, wherein the liquid-repellent member is exchangeable.
12.如权利要求11中所述的曝光装置,其特征在于: 移动台具有保持基片的基片台和检测台的至少一个。 12. The exposure apparatus according to claim 11, wherein: the mobile station having a substrate stage holding the substrate, and detecting at least one station.
13.如权利要求11中所述的曝光装置,其特征在于: 移动台具有多个台。 13. The exposure apparatus according to claim 11, wherein: the mobile station having a plurality of stations.
14.如权利要求11中所述的曝光装置,其特征在于:根据与其疏液性的恶化有对应关系的上述基片的曝光片数、上述疏液性构件的使用时间、以及曝光光的照射量中的至少一个来更换上述疏液性构件。 14. The exposure apparatus according to claim 11, wherein: said substrate has a number of sheets according to a correspondence relationship deteriorating its exposure lyophobic, the irradiation time of the above-described liquid-repellent member, and the exposure light in an amount of at least one of a replacement of the liquid-repellent member.
15.如权利要求11中所述的曝光装置,其特征在于:移动台是保持基片的基片台,上述基片台具备保持上述构件的保持部和在上述保持部上以可装卸的方式安装上述构件的吸附装置。 15. The exposure apparatus according to claim 11, wherein: the mobile station is holding the substrate the substrate table, the base station includes a substrate holding portion for holding the member and on the holding portion so as to be detachably suction means mounting said member.
16.如权利要求15中所述的曝光装置,其特征在于:上述疏液性构件是具有与基片的背面对置的第1面和沿基片的表面在基片外侧延伸的第2面的台阶状构件。 16. The exposure apparatus according to claim 15, wherein: the above-described liquid-repellent member having a second surface and the back surface of the substrate opposite the first surface and along the surface of the substrate extending on the outside of the substrate He stepped member.
17.如权利要求16中所述的曝光装置,其特征在于: 至少第2面具有疏液性。 17. The exposure apparatus according to claim 16, wherein: at least the second surface is liquid-repellent.
18.如权利要求16中所述的曝光装置,其特征在于:还具备沿基片的表面在上述疏液性构件外侧延伸的第3面且与上述疏液性构件嵌合的外侧构件,至少第3面呈疏液性。 18. The exposure apparatus according to claim 16, characterized in that: further comprising a third surface along the surface of the substrate outside of the liquid-repellent member extends above and is liquid-repellent member is fitted the outer member, at least 3-section lyophobic.
19.如权利要求16中所述的曝光装置,其特征在于:还具备使上述疏液性构件相对上述保持部升降的升降装置。 19. The exposure apparatus according to claim 16, characterized in that: further comprising a liquid-repellent member so that the holding portion relative to the elevation of the lifting device.
20.如权利要求19中所述的曝光装置,其特征在于:上述升降装置在上述疏液性构件支撑基片的状态下使上述疏液性构件从上述保持部上升。 Exposure apparatus according to claim 20. 19, wherein: said elevating means so that the liquid-repellent member in the above-described liquid-repellent member supports the substrate holding portion from the rising state.
21.如权利要求15中所述的曝光装置,其特征在于:上述疏液性构件是具有支撑基片的背面的边缘部的支撑部、沿基片的表面在基片外侧延伸的平坦面和与平坦面连接且比平坦面高的侧壁的基片托。 21. The exposure apparatus according to claim 15, wherein: the above-described liquid-repellent member is a supporting portion having an edge portion of the back surface of the support substrate, the flat surface along the surface of the substrate on the outside of the substrate and extending connecting the flat surface and the flat surface of the holder is higher than the side walls of the substrate.
22.如权利要求21中所述的曝光装置,其特征在于:还具备放置基片托的基片台,基片托与基片台分别具有互相连通的流路。 22. The exposure apparatus according to claim 21, characterized in that: further comprising a substrate stage disposed in the substrate holder, the substrate holder and the substrate table have flow paths communicating with each other.
23.如权利要求11中所述的曝光装置,其特征在于: 上述构件的呈疏液性的部分由氟化物形成。 The exposure apparatus as claimed in claim 23. 11, characterized in that: as a portion of the liquid-repellent member is formed of a fluoride.
24.如权利要求11中所述的曝光装置,其特征在于: 上述疏液性的构件包含基准构件和光学传感器的至少一部分。 The exposure apparatus as claimed in claim 11. 24., wherein: the above-described liquid-repellent member includes at least a portion of the reference member and the optical sensor.
25.如权利要求M中所述的曝光装置,其特征在于:基准构件和光学传感器的至少一部分的光照射面呈疏液性。 25. The exposure apparatus M according to claim, wherein: a light irradiation at least a part-section of the liquid-repellent optical sensor and the reference member.
26.如权利要求11中所述的曝光装置,其特征在于:基片是没有缺口的圆形基片,在基片的表面和侧部上涂敷感光性材料。 26. The exposure apparatus according to claim 11, wherein: the substrate is not circular cutout substrate coated with a photosensitive material on the surface and the side portion of the substrate.
27.如权利要求11中所述的曝光装置,其特征在于:根据上述构件的疏液性部分中的上述液体的接触角的下降来决定上述构件的更换时期。 27. The exposure apparatus according to claim 11, wherein: said member to determine the replacement time according to the contact angle decreased portion of the liquid-repellent member of the liquid.
28.如权利要求27中所述的曝光装置,其特征在于:在上述接触角下降到小于等于100°的情况下更换上述构件。 The exposure apparatus as claimed in claim 28. 27, characterized in that: the contact angle decreased to less than or equal in replacement of said case member 100 °.
29.如权利要求27中所述的曝光装置,其特征在于:在上述接触角从初始状态下降了大于等于10°的情况下更换上述构件。 The exposure apparatus as claimed in claim 27, 29, wherein: in the case where the contact angle decreased by greater than or equal to 10 ° from the initial state of the replacement of said lower member.
30.如权利要求11中所述的曝光装置,其特征在于:上述移动台包含保持上述基片的基片台,上述构件在由上述基片台保持的基片的周围形成平坦面。 The exposure apparatus as claimed in claim 30. 11, wherein: said mobile station comprising a substrate stage holding said substrate, said member is formed around the flat surface of the substrate held by the substrate stage.
31.如权利要求30中所述的曝光装置,其特征在于:由上述基片台保持的基片的表面与其周围的平坦面为同一面。 The exposure apparatus 30 according to claim 31, wherein: the surface with the surrounding substrate held by the substrate stage flush flat surface.
32.如权利要求11中所述的曝光装置,其特征在于: 上述移动台具有用于吸附保持上述构件的吸附装置。 The exposure apparatus as claimed in claim 32. 11, wherein: said mobile station having a suction means for holding the suction member.
33.如权利要求11中所述的曝光装置,其特征在于:用其性能会因紫外光的照射而下降的材料形成上述构件的疏液性部分。 The exposure apparatus as claimed in claim 33. 11, characterized in that: portions of the liquid-repellent member material performance due to ultraviolet light irradiation decreases.
34. 一种经液体对基片照射曝光光以对上述基片进行液浸曝光的曝光方法,其特征在于,包含下述步骤:对基片上的至少一部分供给上述液体;经上述液体对基片照射曝光光以对上述基片进行液浸曝光;以及除被供给了液体的基片以外的曝光装置的部分具有疏液性,根据与其疏液性的恶化有对应关系的上述基片的曝光片数、上述疏液性的部分的使用时间、以及曝光光的照射量中的至少一个来更换上述具有疏液性的曝光装置的部分。 34. A method of exposing to light through the liquid above the substrate for the liquid immersion exposure, wherein the base sheet exposed to radiation, comprising the steps of: supplying at least a portion of the liquid on the substrate; a liquid through said pair of substrates irradiated with the exposure light on said substrate for immersion exposure; and the other is supplied with part of the exposure apparatus other than the substrate a liquid having a liquid-repellent, has a corresponding relationship according to the deterioration of its liquid repellency of the substrate in the exposure sheet the number of the time use a liquid-repellent portion, and at least a portion of the exposure apparatus to replace the quantity of liquid repellency of the exposure light is irradiated in.
35.如权利要求34中所述的曝光方法,其特征在于:上述曝光装置的部分是上述曝光装置所具有的基片台的一部分或检测台的一部分,基片台的一部分或检测台的一部分是上述液体的形成液浸区域的部分的至少一部分。 35. The exposure method according to claim 34, wherein: the exposure apparatus is a part of a portion of the inspection station or the exposure apparatus having a substrate stage, a portion of the inspection station or the substrate stage at least part of the portion forming the liquid immersion area of ​​the liquid.
36.如权利要求35中所述的曝光方法,其特征在于: 与基片一起更换上述基片台的一部分。 The exposure method as claimed in claim 36. 35, characterized in that: a portion of said substrate stage is exchanged together with the substrate.
CN 200480035901 2003-12-03 2004-12-03 Exposure apparatus, exposure method, device producing method CN1890779B (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2003404384 2003-12-03
JP404384/2003 2003-12-03
JP042496/2004 2004-02-19
JP2004042496 2004-02-19
PCT/JP2004/018435 WO2005055296A1 (en) 2003-12-03 2004-12-03 Exposure apparatus, exposure method, device producing method, and optical component

Publications (2)

Publication Number Publication Date
CN1890779A CN1890779A (en) 2007-01-03
CN1890779B true CN1890779B (en) 2011-06-08

Family

ID=37579192

Family Applications (1)

Application Number Title Priority Date Filing Date
CN 200480035901 CN1890779B (en) 2003-12-03 2004-12-03 Exposure apparatus, exposure method, device producing method

Country Status (2)

Country Link
JP (2) JP5131297B2 (en)
CN (1) CN1890779B (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL2008751A (en) * 2011-06-06 2012-12-10 Asml Netherlands Bv Temperature sensing probe, burl plate, lithographic apparatus and method.

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6191429B1 (en) 1996-10-07 2001-02-20 Nikon Precision Inc. Projection exposure apparatus and method with workpiece area detection
CN1501175A (en) 2002-11-12 2004-06-02 Asml荷兰有限公司 Lithographic apparatus and device manufacturing method

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3747566B2 (en) * 1997-04-23 2006-02-22 株式会社ニコン The liquid immersion type exposure apparatus
JPH11176727A (en) * 1997-12-11 1999-07-02 Nikon Corp Projection aligner
AU2747999A (en) * 1998-03-26 1999-10-18 Nikon Corporation Projection exposure method and system
US7213963B2 (en) * 2003-06-09 2007-05-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP3862678B2 (en) * 2003-06-27 2006-12-27 キヤノン株式会社 Exposure apparatus and device manufacturing method
US7528929B2 (en) * 2003-11-14 2009-05-05 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6191429B1 (en) 1996-10-07 2001-02-20 Nikon Precision Inc. Projection exposure apparatus and method with workpiece area detection
CN1501175A (en) 2002-11-12 2004-06-02 Asml荷兰有限公司 Lithographic apparatus and device manufacturing method

Non-Patent Citations (3)

* Cited by examiner, † Cited by third party
Title
JP特开2003-240906A 2003.08.27
JP特开平10-303114A 1998.11.13
JP特开平11-176727A 1999.07.02

Also Published As

Publication number Publication date
JP5131297B2 (en) 2013-01-30
JP5445612B2 (en) 2014-03-19
JP2010141355A (en) 2010-06-24
CN1890779A (en) 2007-01-03
JP2012142610A (en) 2012-07-26

Similar Documents

Publication Publication Date Title
JP5152143B2 (en) A substrate stage, the exposure apparatus, and device manufacturing method
US7385674B2 (en) Exposure apparatus and device manufacturing method
KR101681101B1 (en) Substrate holding device, exposure apparatus having same, exposure method, method for producing device, and liquid repellent plate
US9223224B2 (en) Exposure apparatus with component from which liquid is protected and/or removed and device fabricating method
KR101209539B1 (en) Exposure apparatus and method for manufacturing device
JP5270743B2 (en) Exposure apparatus
EP1713114B1 (en) Exposure apparatus and device manufacturing method
US8089611B2 (en) Exposure apparatus and method for producing device
CN1954408B (en) Exposure apparatus, exposure method, and method for producing device
JP5353856B2 (en) Exposure apparatus, the stage device, the nozzle member, and a device manufacturing method
US8488099B2 (en) Exposure apparatus and device manufacturing method
EP2466618A2 (en) Exposure apparatus and method for producing device
EP3093873B1 (en) Exposure apparatus, exposure method, and method for producing a device
US9224632B2 (en) Substrate holding apparatus, exposure apparatus, and device fabricating method
CN101410948B (en) Exposure method and apparatus, maintenance method and device manufacturing method
JP4548341B2 (en) Exposure apparatus and device manufacturing method, maintenance method and exposure method
EP1801850B1 (en) Substrate holding apparatus, exposure apparatus and device manufacturing method
JP5609899B2 (en) Exposure apparatus, the stage control method, and device manufacturing method
KR101318037B1 (en) Exposure apparatus and device producing method
US8698998B2 (en) Exposure apparatus, method for cleaning member thereof, maintenance method for exposure apparatus, maintenance device, and method for producing device
JP5811169B2 (en) Exposure apparatus and an exposure method, a device manufacturing method
JP4529433B2 (en) Exposure apparatus and an exposure method, a device manufacturing method
JP4752473B2 (en) Exposure apparatus, exposure method and device manufacturing method
EP1814144B1 (en) Substrate processing method and device production system
CN101385125B (en) Exposure method and apparatus, maintenance method, and device manufacturing method

Legal Events

Date Code Title Description
C06 Publication
C10 Request of examination as to substance
C14 Granted