CN1885167A - Exposure device and graphic forming method - Google Patents
Exposure device and graphic forming method Download PDFInfo
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- CN1885167A CN1885167A CN 200510081105 CN200510081105A CN1885167A CN 1885167 A CN1885167 A CN 1885167A CN 200510081105 CN200510081105 CN 200510081105 CN 200510081105 A CN200510081105 A CN 200510081105A CN 1885167 A CN1885167 A CN 1885167A
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Abstract
The invention relates to an exposure device which uses exposure light system to use laser to scan the glass base plate to expose the function image on the glass base plate, wherein said device comprises: at the transmission direction of ratio base plate, a camera device using the face side of scanning position of laser beam as the camera position to shoot the black pixel preformed on the glass base plate; a lighting device for lighting the black pixel to make said camera shoot; and a control part for checking the reference position preset on the pixel shot by the camera, and using said reference position to control the laser beam to light or stop lighting. The invention can improve the layer accuracy of functional image, with low cost.
Description
Technical field
The present invention relates at the exposure device and the pattern forming method that are exposed direct exposure function figure on the body, relate in detail with the shooting means take and detect be set in be pre-formed in above-mentioned be exposed body as the reference position on the functional graphic of benchmark, by with this reference position being beginning irradiation or stopping irradiation of benchmark control bundle, can also suppress the exposure device and the pattern forming method of the increase of exposure device cost simultaneously in the precision that coincides that improves functional graphic.
Background technology
Existing exposure device, there is use on glass substrate, to be pre-formed the mask of the mask graph suitable with functional graphic, and aforementioned mask graph copying exposure is being exposed on the body for example portable one by one exposure device (Stepper), catoptron sciagraphy (Mirror Projection) or proximity effect various devices such as (Proximity).But in these existing exposure devices, under the situation with the stacking formation of functional graphic of multilayer, the precision that coincides of the functional graphic of each interlayer will become a problem.Particularly under the situation of the large-scale mask that is used to form TFT that large-scale liquid crystal display uses or color filter, require the quite high absolute dimension precision of being arranged with of mask graph, make the cost of mask increase.In addition, in order to obtain the above-mentioned precision that coincides, will aim between the functional graphic of bottom and the mask graph, on large-scale mask, this aligning is quite difficult especially.
On the other hand, also have, use electron beam or laser beam directly at the exposure device that is exposed the figure of drawing out cad data on the body without mask.This exposure device comprises: LASER Light Source, make this LASER Light Source emission laser beam come the exposure optical system of flyback retrace, and the carrying this be exposed the transportation means of carrying under the state of body, emission state limit according to cad data limit control LASER Light Source makes laser beam come flyback retrace, the direction of edge and laser beam direction of scanning quadrature is carried and is exposed body simultaneously, thereby just is being exposed the figure (for example with reference to TOHKEMY 2001-144415 communique) that forms the cad data that is equivalent to functional graphic on the body two-dimensionally.
But, in the existing exposure device of such type of directly drawing, require the pattern arrangement of cad data that higher absolute dimension precision is arranged, this point is the same with the exposure device that uses mask, in addition, utilizing many exposure devices to form in the manufacturing process of functional graphic, there is the problem of the deterioration in accuracy that coincides of functional graphic when between exposure device accuracy error being arranged.Therefore, disposing such problem for correspondence just needs high-precision exposure device, and the cost of exposure device also just improves.
Have again, must will aim in advance between the figure of the functional graphic of bottom and cad data, this point and use other exposure device of mask the same, existence and same problem noted earlier.
Summary of the invention
The present invention proposes for addressing the above problem, and its purpose is to provide a kind of precision that coincides that improves functional graphic can also suppress exposure device and the pattern forming method that the exposure device cost increases simultaneously.
In order to achieve the above object, exposure device of the present invention is that a kind of exposure optical system that utilizes makes light beam to being exposed the body relative scanning, functional graphic is directly exposed to being exposed on the body, this device comprises: on the described throughput direction that is exposed body with the scanning position of described light beam in face of a side as camera position, take in advance in the described shooting means that are exposed the functional graphic of the benchmark that becomes exposure position that forms on the body; To the lighting means that throws light on described shooting means can be made a video recording as the functional graphic of described benchmark; And detect with described shooting means take the photograph be set in advance in as the reference position on the functional graphic of described benchmark, and be the optical system control device of shining or stopping to shine of beginning that benchmark is controlled described light beam with this reference position.
Utilize such formation, illuminate the functional graphic that is pre-formed in the benchmark that becomes exposure position that is exposed body with lighting means, on the described throughput direction that is exposed body with the scanning position of light beam in face of a side take the functional graphic that becomes said reference as camera position utilization shooting means, utilize the optical system control device to detect and be set in advance in reference position on the functional graphic that becomes described benchmark, and be beginning irradiation or stopping to shine of the benchmark light beam of controlling flyback retrace with this reference position with what described shooting means were taken.With this functional graphic that improves regulation with respect to being exposed the preformed precision that coincides that becomes the functional graphic of benchmark on the body.Therefore, when stacking formation multilayer functional graphic, also can improve the precision that coincides of each layer function figure.So when using many exposure devices to form stacking figure, also can eliminate the problem that precision worsens, suppress the increase of exposure device cost because the functional graphic that the trueness error between exposure device causes coincides.
In addition, the detection that utilizes described optical system control device that described reference position is carried out, be the image of the functional graphic that becomes described benchmark that obtains with described shooting means to be done 2 values handle, compare with the view data of the described reference position that is equivalent to preset, detect the part of two data unanimities.By like this, with the optical system control device to the shooting means take the photograph the image of the functional graphic that becomes benchmark do 2 values and handle, compare with the view data of the reference position that is equivalent to preset, the part of two data unanimities is detected as the reference position.So can be with the detection of real-time mode high speed processing reference position.
Have, described shooting means are means that a kind of light-receiving module forms a line again.By means of this, the shooting means that form a line with light-receiving module are taken the photograph to such an extent that become a dimensional data image of the functional graphic of benchmark.So can improve data processing speed suppressing the increase of shooting means cost simultaneously.
In addition, described lighting means is arranged on the described back side one side that is exposed body.By like this, lighting means throws light on from the back side one side that is exposed body.Therefore, can improve the shooting means take the photograph the contrast of image, and improve the precision that obtains of view data.Thereby, can realize high-precision exposure.Have again, described exposure optical system is for being provided with the optical system of photoswitch on the optical axis of described light beam, this photoswitch has two polarization components of polarizing axis mutually orthogonal, separate configuration and is arranged between these two polarization components, by applying the electrooptic modulator that voltage makes the plane of polarization variation of polarized light.By like this, control setting is with the configuration of polarizing axis mutually orthogonal
The impressed voltage of the electrooptic modulator between two polarization components makes light beam begin irradiation or stops irradiation.Therefore, can carry out the irradiation of light beam and the change action that stops at a high speed.So can improve the formation precision of exposure figure.
And the described physical efficiency direction tilted configuration that relatively moves that is exposed makes to the track while scan of the described described light beam that is exposed the body relative scanning parallel with the orientation of the functional graphic that becomes described benchmark.By like this, the direction that relatively moves will be exposed the body tilted configuration, make that the track while scan of light beam is parallel with the orientation of the functional graphic that becomes benchmark.Therefore, can eliminate the skew between exposure starting position and end exposure position on as the orientation of the functional graphic of described benchmark, form exposure figure exactly.
In addition, pattern forming method of the present invention is that a kind of exposure optical system that utilizes makes light beam to being exposed the body relative scanning, functional graphic is directly exposed to being exposed on the body, illuminate with lighting means and to be pre-formed the functional graphic that is exposed the benchmark that becomes exposure position on the body described, on the described throughput direction that is exposed body, a side in face of the scanning position of described light beam, utilize the functional graphic that the shooting means are taken becomes described benchmark, utilize the optical system control device to detect to be preset in the reference position on the image of the functional graphic that becomes described benchmark of described shooting means shooting, with this reference position is that benchmark is controlled beginning irradiation or stopping irradiation of described light beam, on assigned position the functional graphic of regulation is exposed.
Utilize this method, be exposed on the throughput direction of body the functional graphic that on the position of a side in face of the scanning position of light beam, becomes benchmark with the shooting of shooting means, utilize the optical system control device to detect to be preset in the reference position on the image of the described functional graphic of taking with the shooting hand, with this reference position is that benchmark is controlled beginning irradiation or stopping irradiation of described light beam, makes other functional graphic exposure on the position corresponding with described functional graphic.By like this, the functional graphic that can improve regulation is with respect to being exposed the preformed precision that coincides that becomes the functional graphic of benchmark on the body.Therefore, under the situation of the functional graphic of stacking formation multilayer, the precision that coincides of each layer function figure also is improved.So, when using many exposure devices to form stacking figure, also can eliminate because the problem that the precision that coincides of the functional graphic that the precision difference between exposure device causes worsens suppresses the increase of exposure device cost.
In addition, the detection that utilizes described optical system control device that described reference position is carried out, be the image of the functional graphic that becomes described benchmark that obtains with described shooting means to be done 2 values handle, compare with the view data of the described reference position that is equivalent to preset, detect the part of two data unanimities.By like this, with the optical system control device to the shooting means take the photograph the image of the functional graphic that becomes benchmark do 2 values and handle, compare with the view data of the reference position that is equivalent to preset, the part of two data unanimities is detected as the reference position.So can be with the detection of real-time mode high speed processing reference position.
Have, described shooting means are means that a kind of light-receiving module forms a line again.Take the photograph to such an extent that become a dimensional data image of the functional graphic of benchmark with these shooting means that form a line with light-receiving module.So can improve data processing speed suppressing only to make a video recording the increase of means cost simultaneously.
In addition, described lighting means is arranged on the described back side one side that is exposed body.By like this, lighting means throws light on from the back side one side that is exposed body.Therefore, improved shooting means take the photograph the contrast of image, and improve the precision that obtains of view data.Thereby, can realize high-precision exposure.
Have again, described exposure optical system is for being provided with the optical system of photoswitch on the optical axis of described light beam, it is mutually orthogonal and keep two polarization components of arranged spaced and be arranged between these two polarization components that this photoswitch has polarization axle, by applying the electrooptic modulator that plane of polarization that voltage makes polarized light changes.By like this, the impressed voltage of the electrooptic modulator of control setting between two polarization components of the mutually orthogonal configuration of polarization axle makes light beam begin irradiation or stops irradiation.Therefore, can carry out the irradiation of light beam and the change action that stops at a high speed.So can improve the formation precision of exposure figure.
And the described physical efficiency direction tilted configuration that relatively moves that is exposed makes to the track while scan of the described described light beam that is exposed the body relative scanning parallel with the orientation of the functional graphic that becomes described benchmark.By like this, the direction that relatively moves will be exposed the body tilted configuration, make that the track while scan of light beam is parallel with the orientation of the functional graphic that becomes benchmark.Therefore, can eliminate, form exposure figure exactly in the deviation between exposure starting position and end exposure position in the orientation of the functional graphic that becomes described benchmark.
Description of drawings
Fig. 1 is the synoptic diagram of expression exposure device the 1st embodiment of the present invention.
Fig. 2 is the stereographic map of the formation and the action usefulness of explanation photoswitch.
Concern the key diagram of usefulness between the camera position of Fig. 3 for the scanning position of expression laser beam and shooting means.
Fig. 4 is the block scheme of disposal system first half in the inner formation of presentation video handling part.
Fig. 5 is the latter half of block scheme of disposal system in the inner formation of presentation video handling part.
Fig. 6 for expression along and the track while scan of the black matrix (black matrix) that moves of the direction of the direction of scanning quadrature of laser beam and laser beam between the key diagram that concerns usefulness.
The process flow diagram that Fig. 7 uses for the step of explanation pattern forming method of the present invention.
Fig. 8 makes the key diagram that state that 2 values handle is used for expression to the output of ring buffer memory.
Fig. 9 is illustrated in the image of exposure starting position default on the pixel of black matrix and the key diagram of look-up table thereof.
Figure 10 is the inter-module relation key diagram that is illustrated in reference position default on the pixel of black matrix and shooting means.
Figure 11 is illustrated in the image of end exposure position default on the pixel of black matrix and the key diagram of look-up table thereof.
Figure 12 is the key diagram of expression detection to the state of the exposure position of the above-mentioned pixel of the throughput direction of glass substrate.
Figure 13 is the key diagram of the state of the scanning position of expression calibration of laser light beam.
Figure 14 skips the key diagram of the state that the pixel column of black matrix exposes for expression.
Figure 15 is the synoptic diagram of the major part of expression exposure device the 2nd embodiment of the present invention.
Figure 16 is the key diagram that benchmark forms the state of complex-shaped exposure figure for expression with the reference position on the pixel that is preset in black matrix.
Embodiment
Fig. 1 is the synoptic diagram of expression exposure device the 1st embodiment of the present invention.This exposure device 1 is to be exposed on the body directly the device of functional graphic exposure, comprises LASER Light Source 2, exposure optical system 3, transportation means 4, shooting means 5, as the backlight illumination means 6 and the optical system control device 7 of lighting means.Also have, above-mentioned called function figure is the figure that goods have, carry out the required component part of the action of original purpose, for example, and on color filter, the pixel graphics of black matrix or figure red, blue, green color filter of all kinds are wiring figure or various electrode patterns etc. on semiconductor device.In the following description, being exposed the glass substrate that body uses with color filter is that example describes.
Above-mentioned LASER Light Source 2 is light sources of emission light beam, is to generate for example 355nm, that ultraviolet ray output is exported more than or equal to the height of 4W total solids mode-locked laser light source.
Light beam ejaculation direction the place ahead in above-mentioned LASER Light Source 2 is provided with exposure optical system 3.This exposure optical system 3 is with the optical system as laser beam flyback retrace on glass substrate 8 of light beam, front from laser beam ejaculation direction has photoswitch 9, light deflection means the 10, the 1st catoptron 11, polygonal mirror 12, f θ lens 13 and the 2nd lens 14.
Above-mentioned photoswitch 9 is used for the irradiation of switched laser light beam and stops irradiating state, for example, has structure as shown in Figure 2, be about to the 1st and the 2nd polarization components 15A, 15B separate configuration, make the polarizing axis p mutually orthogonal of this each polarization components 15A, 15B (among Fig. 2, the polarizing axis p of polarization components 15A is set in vertical direction, and the polarizing axis p of polarization components 15B is set in horizontal direction), between the 1st and the 2nd polarization components 15A and 15B, electrooptic modulator 16 is set.In a single day above-mentioned electrooptic modulator 16 adds just action of voltage, and the plane of polarization that makes polarized light (linearly polarized light) is to count the high speed rotating of nsec.When for example impressed voltage was zero, among Fig. 2 (a), the linearly polarized light of the plane of polarization that for example has vertical direction that is seen through selectively by the 1st polarization components 15A saw through above-mentioned electrooptic modulator 16 with keeping intact, arrives the 2nd polarization components 15B.The 2nd polarization components 15B is configured to see through selectively the linearly polarized light of the plane of polarization with horizontal direction, so there is the above-mentioned linearly polarized light of the plane of polarization of vertical direction not see through, at this moment laser beam becomes the state that stops to shine.
On the other hand, shown in Fig. 2 (b), voltage is added on the electrooptic modulator 16, and rotated 90 when spending at the plane of polarization of the linearly polarized light of injecting this electrooptic modulator 16, the linearly polarized light of plane of polarization with above-mentioned vertical direction is when electrooptic modulator 16 penetrates, become the linearly polarized light of the plane of polarization with horizontal direction, this rectilinearly polarized light sees through the 2nd polarization components 15B.By like this, laser beam becomes irradiating state.
Above-mentioned smooth deflection means 10 are to make the scanning position of laser beam to being offset with the direction (consistent with the arrow A direction shown in Fig. 1 on the moving direction of glass substrate 8) of its direction of scanning quadrature, being adjusted to the means of the correct position of scanning, is sound equipment optical module (AO assembly) for example.
In addition, the 1st catoptron 11 is to be used to make the direct of travel of the laser beam by light deflection means 10 to bend towards the catoptron that direction is set of polygonal mirror 12 described later, is plane mirror.Have, polygonal mirror 12 is to make laser beam come the catoptron of flyback retrace again, for example forms the octahedral catoptron on the side of the column-shape rotator of polygon-octagonal.At this moment, by a face laser light reflected light beam in the above-mentioned catoptron along with the rotation of polygonal mirror 12 the scanning direction that goes along the one-dimensional space, get back to the direction of coming in the moment that the irradiation position of laser beam is shifted to a following mirror mirror, once more along with the rotation of polygonal mirror 12 begins scanning to the direction of going of the one-dimensional space.
In addition, f θ lens 13 become the lens of constant speed for the sweep velocity that makes laser beam on glass substrate 8, and the mirror position that is configured to focal position and above-mentioned polygonal mirror 12 is approximate consistent.And the 2nd catoptron 14 is laser beams of reflecting ﹠ transmitting f θ lens 13, makes it inject the catoptron of usefulness to the face of glass substrate 8 along almost vertical direction, is plane mirror.In addition, near the face of the emitting side of above-mentioned f θ lens 13, come the scanning of the laser beam of flyback retrace to begin on the part of side, with the direction of scanning line sensor 17 is set orthogonally, the regulation scanning position of detection laser light beam and the departure between the actual scanning position, the scanning zero hour of detection laser light beam simultaneously.Also have, line sensor 17 can not be in f θ lens 13 1 sides, so long as scanning starting point that can the detection laser light beam where no matter be located at all can, for example, can be located at worktable 18 1 sides of used for glass basal plate conveyance.
The below of above-mentioned the 2nd catoptron 14 is provided with transportation means 4.This transportation means 4 is that glass substrate 8 is placed on the worktable 18, along the means of carrying with the speed of regulation with the direction of the direction of scanning quadrature of above-mentioned laser beam, have for example conveying roller 19 that above-mentioned worktable 18 moves and the feed drive portions 20 such as for example motor that this conveying roller 19 are rotated driving of making.
A side in face of the scanning position of the above-mentioned laser beam of the throughput direction of representing with arrow A above above-mentioned transportation means 4 is provided with shooting means 5.These shooting means 5 are the means of pixel of black matrix of taking the functional graphic of the benchmark that the conduct be pre-formed on glass substrate 8 becomes exposure position, are for example wire ccd sensors that photosensory assembly forms a line.Here as shown in Figure 3, set the integral multiple (n doubly) of throughput direction arrangement pitches P that distance D between the scanning position F of the camera position E of above-mentioned shooting means 5 and above-mentioned laser beam is the pixel 22 of black matrix 21.Make when consistent at the center of carrying the above-mentioned pixels 22 in glass substrate 8 backs with this and to scan the moment and as one man begin the scanning of laser beam with the scanning position of laser beam.In addition, above-mentioned distance D is the smaller the better.By like this, can reduce the displacement error of glass substrate 8, to above-mentioned pixel 22 can be with the scanning position of laser beam more accurate location.Also have, among Fig. 1, the example that three shooting means 5 are set is shown, but when the sweep limit of laser beam is narrower than the Flame Image Process zone of shooting means 5, shooting means 5 can be one, when above-mentioned sweep limit is wideer than the Flame Image Process of shooting means 5 zone, can with many shooting means 5 of its relative set.
Downside in described transportation means 4 is provided with backlight illumination means 6.These backlight illumination means 6 are to illuminate the means that above-mentioned pixel 22 can be made a video recording shooting means 5, for example are area sources.
Optical system control device 7 is set is connected in above-mentioned LASER Light Source 2, photoswitch 9, light deflection means 10, polygonal mirror 12, line sensor 17, transportation means 4 and shooting means 5.This optical system control device 7 detects the reference position on the graph image of taking with shooting means 5 that is preset in above-mentioned pixel 22, with this reference position the beginning irradiation or stop irradiation of laser beam of benchmark control LASER Light Source 2, control the voltage that is added on the light deflection means 10 according to the output of line sensor 17 simultaneously, make the ejaculation direction deflection of laser beam, the rotating speed of control polygonal mirror 12 makes the sweep velocity of laser beam remain in fixing speed, and the speed of control transportation means 4 conveying glass substrates 8.And possess: the light source drive part 23 that LASER Light Source 2 is lighted; The control laser beam begin the photoswitch controller 24 that shines or stop to shine; The light deflection means drive division 25A of the amount of deflection of the laser beam of control light deflection means 10; The conveying control part 26 of the polygonal mirror drive division 25B that control polygonal mirror 12 drives, control transportation means 4 transporting velocities; Backlight illumination means 6 are lighted and the backlight control portion 27 of the control of extinguishing; The image of shooting means 5 shootings is made the A/D transformation component 28 of A/D conversion; Judge the beginning irradiation position of laser beam and stop the image processing part 29 of irradiation position according to the view data of A/D conversion; Memory image handling part 29 is handled the beginning irradiation position (record and narrate later on and be " exposure starting position ") of the laser beam of gained and is stopped the data of irradiation position (record and narrate later on and be " end exposure position "), also stores the storage part 30 of the look-up table etc. of exposure described later starting position and end exposure position simultaneously; Data according to exposure starting position of reading from this storage part 30 and end exposure position generate the modulating data generation handling part 31 that photoswitch 9 open/close modulating datas are used; And the control part of suitably controlling in order to make device integral body do the action of regulation purpose 32.
Fig. 4 and Fig. 5 are the block scheme of a configuration example of presentation video handling part 29.As shown in Figure 4, image processing part 29 comprises: three ring buffer memory 33A, 33B, 33C that are connected in parallel for example; With each of this ring buffer memory 33A, 33B, 33C for example be connected in parallel respectively three wire memory buffer 34A, 34B, 34C; Be connected in this wire memory buffer 34A, 34B, 34C and and fixed threshold ratio the data of gray level are made the comparator circuit 35 that back output is handled in 2 values; Compare the output exposure starting position decision circuit 36 of starting position result of determination that exposes when two data are consistent to the output data of above-mentioned nine wire memory buffer 34A, 34B, 34C with from the look-up table (exposure starting position LUT) of the storage part shown in Fig. 1 30 view data suitable that obtain with the 1st reference position of decision exposure starting position; Compare to the output data of above-mentioned nine wire memory buffer 34A, 34B, 34C with from the look-up table (end exposure position LUT) of the storage part shown in Fig. 1 30 view data suitable that obtain, when two data are consistent, export end exposure location determination result's end exposure location determination circuit 37 with the 2nd reference position of decision end exposure position.
In addition, as shown in Figure 5, image processing part 29 possesses: import above-mentioned exposure starting position result of determination, the counting circuit 38A that the consistent number of times of the view data suitable with the 1st reference position is counted; Compare to the output of this counting circuit 38A with from the exposure starting pixel numbering that the storage part shown in Fig. 1 30 obtains, when two numerical value are consistent, generate the comparator circuit 39A of handling part 31 output exposure commencing signals to the modulating data shown in Fig. 1; Import above-mentioned end exposure location determination result, the counting circuit 38B that the consistent number of times of the view data suitable with the 2nd reference position is counted; Compare to the output of this counting circuit 38B with from the end exposure pixel number that the storage part shown in Fig. 1 30 obtains, when two numerical value are consistent, generate the comparator circuit 39B of handling part 31 output end exposure signals to the modulating data shown in Fig. 1; The initial pixel counts circuit of the quantity of initial pixel being counted according to the output of above-mentioned counting circuit 38A 40; Compare with the output of this initial pixel counts circuit 40 with from the exposure pixel column numbering that the storage part shown in Fig. 1 30 obtains, when both numerical value are consistent, generate the comparator circuit 41 of handling part 31 output exposure pixel column specification signals to the modulating data shown in Fig. 1.Also have, when shooting means 5 read action at the beginning, above-mentioned counting circuit 38A, 38B just utilize this read start signal to reset.In addition, when the formation one of the exposure figure of preassigned regulation finishes, initial pixel counts electricity network 40 just utilizes the exposure figure end signal to reset.
The action and the pattern forming method of the 1st embodiment that constitutes as mentioned above below are described.At first, connect the power supply of exposure device 1, just drive optical system control device 7.By like this, LASER Light Source 2 startings, emission laser beam.Polygonal mirror 12 begins rotation simultaneously, and laser beam just can scan.So but at this moment can not shine owing to photoswitch 9 also disconnects laser beam.
Then, glass substrate 8 is placed on the worktable 18 of transportation means 4.Also have, transportation means 4 is because of carrying glass substrate 8 with certain speed, so as shown in Figure 6, the track while scan of laser beam (arrow B) becomes moving direction (arrow A) relative tilt for worktable 18.Therefore, under the situation that glass substrate 8 be arranged in parallel along above-mentioned moving direction (arrow A), shown in Fig. 6 (a), the situation that exposure position at the scanning starting pixel 22a and the end of scan pixel 22b of black matrix 21 skew takes place takes place.In this case, shown in Fig. 6 (b), glass substrate 8 can be obliquely installed with respect to throughput direction (arrow A direction), make the orientation of above-mentioned pixel 22 consistent with the track while scan of laser beam (arrow B).But, in fact because the sweep velocity of laser beam is fast more than the transporting velocity of glass substrate 8, so above-mentioned side-play amount is very little.Thereby the direction that relatively moves is provided with glass substrate 8 abreast, according to shooting means 5 take the photograph the above-mentioned bias of data computation, can control light deflection means 10 correction offset of exposure optical system 3.Also have, in the following description, suppose that above-mentioned side-play amount can slightly not disregarded to describe.
Then, drive the arrow A direction travelling table 18 of feed drive portion 20 along Fig. 1.At this moment, utilize the delivery controller 26 control feed drive portions 20 of optical system control device 7 to be certain speed.
Then, when the black matrix 21 that is formed at glass substrate 8 arrived the camera position of shooting means 5, shooting means 5 just began shooting, according to take the photograph the view data of black matrix 21 detect exposure starting position and end exposure position.Following with reference to the flowchart text pattern forming method shown in Fig. 7.
At first at step S1, with shooting means 5 take the photograph the image of pixel 22 of black matrix 21.This take the photograph view data three ring buffer memory 33A, 33B, 33C being taken into the image processing part 29 shown in Fig. 4 handle.Then, export three up-to-date data from each ring buffer memory 33A, 33B, 33C.At this moment, for example from two data of ring buffer memory 33A output data before, from data of ring buffer memory 33B output data before, from the up-to-date data of ring buffer memory 33C output.Have again, above-mentioned each data utilize respectively three wire memory buffer 34A, 34B, 34C for example the image configurations of 3 * 3 CCD pixels on same clock (time shaft).Consequently, can obtain for example image shown in Fig. 8 (a).As processing that this image is quantized, just shown in Fig. 8 (b), become corresponding with 3 * 3 numerical value.These images that quantize after handling are arranged side by side on same clock, so compare in comparator circuit 35 and threshold value, carry out 2 values and handle.For example, be " 45 " if establish threshold value, then the image of Fig. 8 (a) just carries out the 2 values processing shown in Fig. 8 (C).
Then, at step S2, detect that exposure begins and the reference position of end exposure.Specifically, in exposure starting position decision circuit 36, use the data of LUT to compare, carry out the reference position and detect with above-mentioned 2 value data and from the exposure starting position that the storage part shown in Fig. 1 30 is obtained.
For example, be set in shown in Fig. 9 (a) in the 1st reference position of specifying the exposure starting position under the situation in the upper left corner of pixel 22 of black matrix 21, above-mentioned exposure begins to become shown in Fig. 9 (b) with LUT, and the data that exposure at this moment begins with LUT are " 000011011 ".Thereby, above-mentioned 2 value data and above-mentioned exposure begin to compare with the data " 000011011 " of LUT, when two data are consistent, judge with shooting means 5 take the photograph view data be the 1st reference position, from the exposure starting position decision circuit 36 outputs starting position result of determination of exposing.Also have, as shown in figure 10, side by side the time, each pixel 22 upper left corner is with regard to suitable the 1st reference position 6 pixels 22.
According to above-mentioned result of determination, in the counting circuit 38A shown in Fig. 5, above-mentioned consistent number of times is counted.And the number of this counting begins to compare as the number numbering with the exposure that obtains from the storage part shown in Fig. 1 30 in comparator circuit 39A, when two numerical value are consistent, generates handling part 31 output exposure commencing signals to the modulating data shown in Fig. 1.At this moment, as shown in figure 10, for example, in the direction of scanning of laser beam as with the 1st pixel 22
1And the 4th pixel 22
4The upper left corner be decided to be the 1st reference position, the component address of the wire CCD of shooting means 5 that just will be corresponding number with the 1st reference position, for example " 1000 ", " 4000 " deposit photoswitch controller 24 in.
On the other hand, above-mentioned 2 value data compare with the data of the end exposure position of obtaining from the storage part shown in Fig. 1 30 with LUT in end exposure location determination circuit 37.For example, be set in shown in Figure 11 (a) in the 2nd reference position of specifying the end exposure position under the situation in the upper right corner of pixel 22 of black matrix 21, above-mentioned end exposure position becomes shown in Figure 11 (b) with LUT, and the end exposure position of this moment is " 110110000 " with the LUT data.So compare with the data " 110110000 " of LUT above-mentioned 2 value data and end exposure position, when two data are consistent, judge that the view data that shooting means 5 obtain is the reference position of end exposure.From end exposure location determination circuit 37 end of output location determination results.Also have, with noted earlier the same, as shown in figure 10, for example six pixels 226 side by side the time, the upper right corner of each pixel 22 is with regard to suitable the 2nd reference position.
According to above-mentioned result of determination, among the counting circuit 38B shown in Fig. 5, above-mentioned consistent number of times is counted.Then, at comparator circuit 39B, this count number compares with the end exposure pixel number that obtains from the storage part shown in Fig. 1 30, when two numerical value are consistent, generates handling part 31 output end exposure signals to the modulating data shown in Fig. 1.At this moment, as shown in figure 10, for example on the direction of scanning of laser beam as with the 1st pixel 22
1And the 4th pixel 22
4The upper right corner be decided to be the 2nd reference position, the component address of the wire CCD of shooting means 5 that will be corresponding number so just with younger brother 2 reference positions, for example " 1900 ", " 4900 " deposit photoswitch controller 24 in.Then, as mentioned above,, enter step S3 in case detect the reference position of exposure starting position and end exposure position.
At step S3, detect the exposure position of glass substrate 8 on moving direction.Here, as shown in Figure 3, distance D between the scanning position F of laser beam and the camera position E of shooting means 5 is set at along the integral multiple of the arrangement pitches P of the moving direction of above-mentioned pixel 22 (n doubly), so count by scan period, can calculate above-mentioned exposure position to laser beam.For example as shown in figure 12, distance D between the camera position of the scanning position of laser beam and shooting means 5 is set at for example 3 times time of arrangement pitches P of pixel 22, at step S2, after detecting the 1st and the 2nd reference position (with reference to Figure 12 (a)), glass substrate 8 moves to the end of pixel 22, when the pixel column center line arrives the camera position of shooting means 5 (with reference to Figure 12 (b)), consistent the zero hour with the scanning of laser beam.Here, laser beam with the period T scan condition under, the transporting velocity of glass substrate 8 and the period T of laser beam are synchronously controlled, and are made a spacing of only mobile pixel 22.So pixel 22 moves on to the position that Figure 12 (C) illustrates during next T.Behind 2T, pixel 22 moves on to the position that Figure 12 (d) illustrates again.Then, after 3T, shown in Figure 11 (e), the row center line of pixel 22 just arrives the scanning position of laser beam.Like this, can detect exposure position.
Then, at step S4, the scan edge laser beam, above-mentioned exposure position is adjusted on the limit.Specifically, the adjustment of exposure position is carried out as illustrated in fig. 13, to make comparisons with scanning position that is located at the line sensor 17 detected current laser beams on the f θ lens 13 (component address number) and predetermined fiducial address number, detect side-play amount, and control light deflection means 10 make the scanning position of laser beam consistent with fiducial address number (reference scan position).
Then, begin exposure at step S5.Connection with light on-off controller 24 control photoswitches 9 begins exposure constantly.At this moment, at first photoswitch 9 is placed on-state, laser beam is scanned,, just disconnect photoswitch 9 at once in case above-mentioned line sensor 17 detects the scanning zero hour of laser beam.At this moment, generate handling part 31 from modulating data and read the component address number " 1000 " of the shooting means 5 corresponding with the exposure starting position of for example Figure 10, and at the time t of control part 32 calculating from scanning zero hour of laser beam to the starting position of exposing
1
At this moment in advance instrumentation good scanning zero hour from laser beam to t sweep time of the component address number " 1 " of shooting means 5
0, in addition, make the clock CLK of wire CCD of the sweep velocity of laser beam and shooting means 5 synchronous, then by the clock number till component address number " 1000 " is counted, obtain the scanning t zero hour easily
1Be t
1=t
0+ 1000CLK.By like this, from scanning zero hour of laser beam through t
1Photoswitch 9 is connected in the back, begins to expose.
Then, detect the end exposure position at step S6.The end exposure position is with top described the same, for example the end exposure of component address number " 1900 " t constantly
2Easily as t
2=t
0+ 1900CLK obtains.By like this, from scanning zero hour of laser beam through t
2Back photoswitch 9 disconnects, and makes end exposure.
Then, at step S7, judge whether the single pass of laser beam finishes.Here, as be judged to be " NO ", then return step S2 and repeat above-mentioned action.Then, at step S2, as shown in figure 10, for example, when detecting the 2nd exposure starting position " 4000 " and the 2nd end exposure position " 4900 ", just proceed to step S5 through step S4, equally begin exposure with above-mentioned, finish exposure at component address number " 4900 " from component address number " 4000 ".
In addition,,, just return step S1, change the action that detects new exposure position in case be judged to be " YES " at step S7.Then, by carrying out above-mentioned action repeatedly, desired zone is formed exposure figure.
Also have, if the numbering of the exposure pixel column shown in Fig. 5 is appointed as for example " L
1, L
4... ", then as shown in figure 14, at pixel column L to the 1st row
1After exposing, can skip the pixel column L of the 2nd and the 3rd row to the 4th row
4Expose.Can be with this only to exposing with red blue or green corresponding zone.Also have, also can not be meant the plain column number of fixation, jump over number and specify.
Like this, utilize the exposure device and the pattern forming method of the 1st embodiment, the pixel 22 of the black matrix 21 that on glass substrate 8, forms in advance that shooting means 5 for shooting are taken, detection be preset in the reference position on plain 22 the image of making a video recording, and be beginning irradiation or stopping irradiation of benchmark control laser beam with this reference position, thereby the formation exposure figure, so can improve exposure accuracy for above-mentioned pixel 22.
In addition, owing to form exposure figure, can eliminate because the problem that the low precision between exposure device causes the precision that coincides of functional graphic to worsen according to reference position predetermined on the above-mentioned pixel 22.Therefore, in the time of on the operation that the present invention is applied to use a plurality of exposure devices 1 to form stacking figure, also can guarantee the quite high precision that coincides.Can suppress the increase of the cost of exposure device 1 with this.
Having, owing to read on the above-mentioned pixel 22 predetermined reference position with shooting means 5, and is that benchmark exposes and stops exposure with this reference position again, thus in advance will above-mentioned pixel 22 and exposure figure aligning, make exposure work become easy.
Then, it is that the data of the MIN exposure figure of benchmark exposure get final product that the cad data of exposure figure has with the reference positions of setting in the pixel 22, can reduce to store the capacity of the storage part of cad data.Thereby the increase of energy restraining device cost simultaneously, can improve data processing speed.
Figure 15 is the synoptic diagram of the major part of the 2nd embodiment of expression exposure device of the present invention.The exposure device of the 2nd embodiment is made, promptly have emission and be different from for example wavelength of wavelength of LASER Light Source 2 more than or equal to the guiding light source 42 of the direct light of 550nm, direct light direct of travel the place ahead configuration of penetrating at this guiding light source 42 makes the course of direct light bend towards the catoptron 43 of light path one side of laser beam, on the light path of laser beam, configuration semi-transparent semi-reflecting lens 44 between photoswitch 9 and the light deflection means 10, above-mentioned direct light penetrate with laser beam overlapping back on same optical axis.By like this, laser beam and direct light overlap mutually and scan.In this case, laser beam utilizes photoswitch 9 to carry out switch control, but direct light is always conducting state (irradiating state) under the state of device action.
The exposure actions of the 2nd embodiment of Gou Chenging at first detects direct light the zero hour as scanning by the moment of line sensor 17 like this.Then, with this scanning zero hour be that benchmark connects photoswitch 9 through utilizing photoswitch controller 24 after the stipulated time, the emission laser beam is radiated at and begins exposure on the glass substrate 8.Then, after the above-mentioned scanning process stipulated time zero hour, disconnect photoswitch 9, stop the emission of laser beam, finish exposure.At this moment, though direct light is in irradiating state all the time, as mentioned above, direct light is long redness of ripple or infrared light, can not expose so be coated on for example diaphragm on the glass substrate 8 etc.
Utilize above-mentioned the 2nd embodiment, can obtain and effect that the 1st embodiment is same, can cancel the useless exposure of the detection that is used to scan the zero hour in the 1st embodiment simultaneously, can only expose the position of regulation.
Also having, as shown in figure 16, is benchmark control exposure start time t with reference position predetermined on the above-mentioned pixel 22
3, t
5And end exposure time t
4, as also controlling the transporting velocity of glass substrate 8, so also can expose simultaneously to the complex-shaped figure shown in Figure 16.
In addition, in the above-mentioned embodiment, lighting means adopts back lighting, but also can be indirect illumination.
And exposure device of the present invention is not limited to the used exposure device of large substrates such as color filter of liquid crystal display, also can be applicable to the exposure device of semiconductor etc.
Claims (12)
1. an exposure device utilizes exposure optical system to make light beam to being exposed the body relative scanning, and functional graphic is directly exposed to being exposed on the body, it is characterized in that this device comprises:
On the described throughput direction that is exposed body with the scanning position of described light beam in face of a side as camera position, take in advance in the described shooting means that are exposed the functional graphic of the benchmark that becomes exposure position that forms on the body;
The functional graphic that becomes described benchmark is thrown light on the lighting means that described shooting means can be made a video recording; And
Detect with described shooting means take the photograph be set in advance in reference position on the functional graphic that becomes described benchmark, and be the optical system control device of shining or stopping to shine of beginning that benchmark is controlled described light beam with this reference position.
2. exposure device as claimed in claim 1 is characterized in that,
The detection that utilizes described optical system control device that described reference position is carried out, exactly the image of the functional graphic that becomes described benchmark that obtains with described shooting means being done 2 values handles, compare with the corresponding view data in predefined described reference position, detect the part of two kinds of data consistents.
3. exposure device as claimed in claim 1 or 2 is characterized in that,
Described its photo detector of shooting means is arranged in row.
4. as any one described exposure device in the claim 1 to 3, it is characterized in that,
Described lighting means is located at the described back side one side that is exposed body.
5. as any one described exposure device in the claim 1 to 4, it is characterized in that,
Described exposure optical system is for being provided with photoswitch on the optical axis of described light beam, it is mutually orthogonal and leave two polarizers of configuration that this photoswitch has polarization axle, and be arranged between these two polarizers, by applying the electrooptic modulator that plane of polarization that voltage makes polarized light changes.
6. as any one described exposure device in the claim 1 to 5, it is characterized in that,
The described physical efficiency that is exposed is with respect to the moving direction tilted configuration, makes this to be exposed body to carry out the track while scan of described light beam of relative scanning parallel with the orientation of the functional graphic that becomes described benchmark.
7. a pattern forming method utilizes exposure optical system to make light beam carry out relative scanning to being exposed body, and functional graphic is directly exposed to being exposed on the body, it is characterized in that,
Illuminate with lighting means and to be pre-formed the functional graphic that is exposed the benchmark that becomes exposure position on the body described;
A side in face of the scanning position of described the above light beam of throughput direction that is exposed body is utilized the functional graphic that the shooting means are taken becomes described benchmark;
Utilize the optical system control device to detect the reference position on the functional graphic that becomes described benchmark of being set in advance in described shooting means shooting, with this reference position is that benchmark is controlled beginning irradiation or stopping irradiation of described light beam, and the functional graphic of regulation is exposed to the position of regulation.
8. pattern forming method as claimed in claim 7 is characterized in that,
The detection that utilizes described optical system control device that described reference position is carried out, exactly the image of the functional graphic that becomes described benchmark that obtains with described shooting means being done 2 values handles, compare with the default corresponding view data in described reference position, detect the part of two kinds of data consistents.
9. as claim 7 or 8 described pattern forming methods, it is characterized in that,
Described its photo detector of shooting means is arranged in row.
10. as any one described pattern forming method in the claim 7 to 9, it is characterized in that,
Described lighting means is located at the described back side one side that is exposed body.
11. as any one described pattern forming method in the claim 7 to 10, it is characterized in that,
The optical axis of the described light beam of described exposure optical system is provided with photoswitch, this photoswitch have the polarization axle mutually orthogonal and leave two polarizers of configuration and be arranged between these two polarizers, by applying the electrooptic modulator that plane of polarization that voltage makes polarized light changes.
12. as any one described pattern forming method in the claim 7 to 11, it is characterized in that, the described physical efficiency that is exposed is with respect to the moving direction tilted configuration, makes to this track while scan of described light beam that is exposed the body relative scanning parallel with the orientation of the functional graphic that becomes described benchmark.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2005100811055A CN1885167B (en) | 2005-06-20 | 2005-06-20 | Exposure device and graphic forming method |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2005100811055A CN1885167B (en) | 2005-06-20 | 2005-06-20 | Exposure device and graphic forming method |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2010101575027A Division CN101840162B (en) | 2005-06-20 | 2005-06-20 | Exposure unit and pattern forming method |
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| CN1885167A true CN1885167A (en) | 2006-12-27 |
| CN1885167B CN1885167B (en) | 2010-06-02 |
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| JP2005035235A (en) * | 2003-07-18 | 2005-02-10 | Noritsu Koki Co Ltd | Image exposing apparatus |
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