CN1858632A - Method and device for accurately determining optical system focus plane by interferometer - Google Patents
Method and device for accurately determining optical system focus plane by interferometer Download PDFInfo
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Abstract
A method and apparatus for accurately determining the focal plane of an optical system using an interferometer is suitable for tuning and detecting optical systems of finite focal length. The working principle of the invention is that standard light emitted by the laser interferometer is reflected back to the interferometer after passing through the optical system to be measured. And the focusing surface of the optical system is determined by utilizing the reason that the interferometer can easily obtain interference fringes at the cat eye position. The invention uses the detection light of the laser interferometer, thereby obviously improving the positioning precision of the focusing surface of the optical system. The invention can realize the precise adjustment and detection of optical systems such as photographic objective, microscope, projector objective, slide projector objective, film projection objective and the like, and precisely determine the focus plane of the optical systems. The method can obviously improve the accuracy of adjustment and detection, is easy to implement and adjust, and effectively solves the problem of blindness in determining the focusing surface of the optical system.
Description
Technical field
The present invention relates to the measurement of optical system, particularly a kind of interferometer is accurately determined the method and apparatus of optical system focusing surface.
Technical background
Along with the raising of science and technology development and computer technology, more and more higher to the requirement of optical system, thereby also more and more higher to the requirement of various optical elements, interfere to detect to be improved constantly thereupon.The measuring accuracy of interferometer is improving constantly now, and has obtained application more and more widely in optics is debug.
In order to improve the optical system precision, many patents relate to the assembling optical system, CN00130721.5 for example, CN200420012162.9, CN99251361.8.CN00130721.5 debugs optical system with spectrometer, debugs the light that needs in the process with other wavelength, and can not determine the focal plane of system; Comprised too many element among the CN200420012162.9, the experience of debuging personnel seems even more important, and system is difficult to carry out to be debug; Relate among the CN99251361.8 and debug focusing surface, but also need rely on high-accuracy mechanical processing, and lack versatility.
Summary of the invention
The technical problem to be solved in the present invention is to overcome above-mentioned the deficiencies in the prior art, a kind of method and apparatus that adopts interferometer accurately to determine the optical system focusing surface is provided, be applicable to the debuging and detecting of the optical system of limited focal length, with assembly precision and the burnt long measuring accuracy that improves optical system to be measured.
In order to achieve the above object and relevant purpose, principle of work of the present invention be standard light with the interferometer emission by tested optical system after, make light reflected back interferometer.And utilize interferometer to be easy to the reason that at it " opal " position obtains interference fringe, determine the focusing surface of optical system.
Technical solution of the present invention is as follows:
A kind of method that adopts interferometer accurately to determine the optical system focusing surface is characterized in that this method comprises the following steps:
(1) select for use the Fizeau laser interferometer as the detecting instrument of determining the optical system focusing surface, the index plane of this interferometer and tested optical system are complementary;
(2) the detection light beam of described laser interferometer emission is incided photometry to be measured system, the emergent light center of adjusting described laser interferometer overlaps with the center of photometry to be measured system; Continuing to adjust optical system to be measured makes the beam convergence hot spot for minimum;
(3) after described optical system to be measured, add a standard reflection mirror, make light beam return optical system, return described laser interferometer again along original optical path;
(4) adjust described standard reflection mirror, and finely tune photometry to be measured system, make described laser interferometer produce interference fringe, and the defocusing amount that makes the tested optical system that described laser interferometer records is for minimum;
(5) plane mirror is inserted in any one light beam focus point position behind described laser interferometer emergent light, the reflecting surface of this plane mirror overlaps with the reference field of an adjustment rack, adjust the position of described adjustment rack, the reflected light of this plane mirror is returned in the described laser interferometer, produce interference fringe, and make the defocusing amount minimum, be " opal " position herein, take described plane mirror away, then the reference field of described adjustment rack is exactly the focusing surface of described optical system to be measured.
A kind of device that adopts laser interferometer accurately to determine the optical system focusing surface, it is characterized in that comprising a laser interferometer, on the emitting light path of this laser interferometer with optical axis be provided with one and have the adjustment rack of reference field, a plane mirror and a standard reflection mirror that is complementary with optical system to be measured, described plane mirror places on the reference field of described adjustment rack, and the reflecting surface of described plane mirror is perpendicular to described optical axis.
The coherent light of described laser interferometer emission incides in the tested optical system with parallel mode or with certain angle of divergence or with certain convergent angle.
Described tested optical system is refractive optical system or reflective optical system or refractive and reflective optical system.
The reflecting surface of described standard reflection mirror is plane or sphere.
Technique effect of the present invention:
Adopt the present invention to significantly improve the bearing accuracy of optical system focusing surface to be measured, and make total system debug precision and accuracy of detection is improved.The structure of this definite focusing surface is easy to implement, is easy to adjust, and has solved the blindness of definite optical system focusing surface effectively.Can effectively improve the precision of debuging of photographic lens, microscope, projector object lens, slide projector object lens, film projective objective and other optical systems, accurately determine its focusing surface.The present invention is not only applicable to the accurate location of optical system focusing surface, and is applicable to Jiao's length of accurately determining the focal position of optical system and accurately measuring optical system, can also detect the situation of debuging and the residual aberration thereof of optical system.
Interferometer of the present invention is launched coherent light beam and is incided in the tested optical system, has the ability that reflects the optical system aberration delicately.
Tested optical system described in the invention is a refractive optical system, or reflective optical system, or refractive and reflective optical system.This optical system has limited focal length.
Description of drawings
Fig. 1 is the basic functional principle figure that the present invention accurately determines the focusing surface method and apparatus of optical system, and plane mirror is in the focus point position
Fig. 2 (a) and 2 (b) accurately determine the focusing surface method and apparatus embodiment 1 structural principle synoptic diagram of optical system for the present invention
Fig. 3 (a) and 3 (b) accurately determine the focusing surface method and apparatus embodiment 2 structural principle synoptic diagram of optical system for the present invention
Fig. 4 (a), 4 (b) and 4 (c) accurately determine the focusing surface method and apparatus embodiment 3 structural principle synoptic diagram of optical system for the present invention
Fig. 5 accurately determines the focusing surface method and apparatus embodiment 4 structural principle synoptic diagram of optical system for the present invention
Fig. 6 accurately determines the focusing surface method and apparatus embodiment 5 structural principle synoptic diagram of optical system for the present invention
Fig. 7 accurately determines the focusing surface method and apparatus embodiment 6 structural principle synoptic diagram of optical system for the present invention
Embodiment
The invention will be further described below in conjunction with embodiment and accompanying drawing, but should not limit protection scope of the present invention with this.
See also Fig. 1 earlier, Fig. 1 has illustrated the basic functional principle of accurately determining the focusing surface method and apparatus of optical system.As seen from the figure, the present invention adopts interferometer accurately to determine the method for optical system focusing surface, it is characterized in that this method comprises the following steps:
(1) select for use Fizeau laser interferometer 1 as the detecting instrument of determining optical system 2 focusing surfaces, the index plane of this interferometer and tested optical system 2 are complementary;
(2) the detection light beam with described laser interferometer 1 emission incides tested optical system 2, and the emergent light center of adjusting described laser interferometer 1 overlaps with the center of tested optical system 2; Continue to adjust optical system 2 to be measured, make the beam convergence hot spot for minimum;
(3) add a standard reflection mirror 3 in described optical system to be measured 2 backs, make light beam return optical system 2, return described laser interferometer 1 again along original optical path;
(4) adjust described standard reflection mirror 3, and finely tune tested optical system 2, make on the laser interferometer 1 and produce interference fringe, and the defocusing amount that makes the tested optical system 2 that described laser interferometer 1 records is for minimum;
(5) plane mirror 4 is inserted in any one light beam focus point position behind described laser interferometer 1 emergent light, the reflecting surface of this plane mirror 4 overlaps with the reference field 6 of an adjustment rack 5, adjust the position of described adjustment rack 5, the reflected light of this plane mirror 4 is returned in the described laser interferometer 1, produce interference fringe, and make the defocusing amount minimum, be " opal " position herein, take described plane mirror 4 away, the reference field 6 of then described adjustment rack 5 is exactly the focusing surface of described optical system to be measured 2.
A kind of device that adopts laser interferometer accurately to determine the optical system focusing surface, it is characterized in that comprising a laser interferometer 1, on the emitting light path of this laser interferometer 1 with optical axis be provided with one and have the adjustment rack 5 of reference field 6, a plane mirror 4 and a standard reflection mirror 3 that is complementary with optical system 2 to be measured, described plane mirror 4 places on the reference field 6 of described adjustment rack 5, and the reflecting surface of described plane mirror 4 is perpendicular to described optical axis.
The coherent light of described laser interferometer 1 emission incides in the tested optical system 2 with parallel mode or with certain angle of divergence or with certain convergent angle.
Described tested optical system 2 is refractive optical system or reflective optical system or refractive and reflective optical system.
The reflecting surface of described standard reflection mirror 3 is plane or sphere.
From the coherent light beam 7 that laser interferometer 1 is sent, incide in the tested optical system 2, and make beam convergence on the focusing surface 6 of optical system 2.Behind the outgoing beam of optical system, add the spherical reflector 3 of a standard, outgoing beam is reflected back along original optical path 8, in laser interferometer 1, produce interference fringe, adjust light path and make the defocusing amount minimum.All beam focusing positions of laser interferometer 1 outgoing beam back all can be thought " opal ".Insert a plane mirror 4 that has reference field 6 adjustment racks 5 in any one " opal " position, and make plane mirror 4 on the reference field 6 of adjustment rack 5.Adjust adjustment rack 5, plane mirror 4 is returned light beam 7 in the interferometer along light path 9, produce the interference fringe that " opal " located, and make the defocusing amount minimum.Take plane mirror 4 away, then the reference field 6 of adjustment rack is exactly the focusing surface of optical system to be measured.
Fig. 2 (a) and 2 (b) accurately determine the embodiment 1 structural principle synoptic diagram of optical system focusing surface method and apparatus for the present invention.In Fig. 2 (a), the coherent light beam 7 that sends from interferometer 1 is directional lights, incide in the tested optical system 2, adding a standard reflection mirror 3 in outgoing beam 7 backs of optical system 2 is the spherical reflector of concave surface, outgoing beam 7 is reflected back along original optical path 8, in laser interferometer 1, can obtain interference fringe, adjust the aberration minimum that light path makes system.In Fig. 2 (b), a plane mirror 4 is inserted in " opal " position between this tested optical system 2 and standard concave spherical reflector 3, this plane mirror 4 places on the adjustment rack 5, and the plane of reflection of described plane mirror 4 is overlapped with described reference field 6.Adjust adjustment rack 5, plane mirror 4 is returned light beam 7 in the interferometer along light path 9, produce interference fringe, and make the defocusing amount minimum.Take plane mirror 4 away, then the reference field 6 of adjustment rack is exactly the focusing surface of optical system 2 to be measured.This focusing surface is the focal plane of optical system just.By recording the entrance pupil size of optical system, the relative aperture of known standard spherical wave catoptron, Jiao that can obtain system is long.
Fig. 3 (a) and 3 (b) accurately determine the embodiment 2 structural principle synoptic diagram of optical system focusing surface method and apparatus for the present invention.In Fig. 3 (a), convergent point is on the optical system front focal plane.Implementation process and example 1 are similar.Just the coherent light beam 7 that sends from laser interferometer 1 is converging lights, converges at earlier on the prefocusing face of optical system 2, and emergent light is a directional light, is reflected back along original optical path 8 by a standard flat catoptron 14.The focusing surface of optical system has been determined in the prefocusing face of this tested optical system 2 " opal " position on this position as shown in Fig. 3 (b).
Fig. 4 (a), 4 (b) and 4 (c) accurately determine the embodiment 3 structural principle synoptic diagram of optical system focusing surface method and apparatus for the present invention.In Fig. 4 (a), a convergent point is arranged respectively before and after optical system.Implementation process and example 1 and example 2 are similar.The coherent light beam 7 that sends from interferometer 1 at first converges at the prefocusing face of optical system, incide tested optical system 2 after, converge on the back focal plane again.Adding a standard reflection mirror 3 behind the outgoing beam of optical system is the concave surface spherical reflector, and outgoing beam is reflected back along original optical path 8.The back focal plane of optical system 2 has been determined in the back focal plane of this tested optical system 2 " opal " position on this position as shown in Fig. 4 (b).After having determined back focal plane, can also insert a plane mirror 10 that has reference field 12 and adjustment rack 11 in prefocusing face " opal " position of this tested optical system 2.Adjust adjustment rack 11, plane mirror 10 is returned light beam 7 in the interferometer along light path 13, produce interference fringe, and make the defocusing amount minimum.As shown in Fig. 4 (c), on this position, determined the prefocusing face of optical system, so just determined former and later two conjugation focusing surfaces of optical system simultaneously.
Fig. 5 accurately determines the embodiment 4 structural principle synoptic diagram of optical system focusing surface method and apparatus for the present invention.In Fig. 5, standard reflection mirror of the present invention is a convex reflecting mirror 15, this just requires when determining its focusing surface, at first convex reflecting mirror 15 is taken away, insert a plane mirror 4 that has reference field 6 adjustment racks 5 in back focal plane " opal " position of this tested optical system 2 then, on this position, determine the focusing surface of optical system.
Fig. 6 accurately determines the embodiment 5 structural principle synoptic diagram of optical system focusing surface method and apparatus for the present invention.In Fig. 6, tested optical system of the present invention is made up of a plurality of systems, a plurality of focusing surfaces are arranged, as focusing surface 6, focusing surface 18, focusing surface 19 etc., can insert a plane mirror that has the reference field adjustment rack in the focusing surface position, so just on the relevant position, determine the focusing surface of optical system.
Jiao who accurately adjusts optical system and definite optical system is long:
Fig. 2 (a) and 2 (b) also can accurately adjust optical system and burnt long embodiment 1 principle schematic of definite optical system as the present invention.In Fig. 2 (a), make the aberration minimum of the system that records according to above-mentioned adjustment light path, at this moment the size of aberration has shown that tested optical system 2 debugs situation, has also embodied the booster action that method of adjustment of the present invention and device are debug optical system.In Fig. 2 (b), the focusing surface that obtains according to above-mentioned adjustment light path is the back focal plane of tested optical system just.By recording the entrance pupil size of optical system, can obtain the back focal length of system.
Fig. 3 (a) and 3 (b) also can accurately adjust optical system and burnt long embodiment 2 principle schematic of definite optical system as the present invention.In Fig. 3 (a), also can obtain tested optical system 2 and debug situation by aberration.In Fig. 3 (b), the focusing surface that obtains according to above-mentioned adjustment light path is the front focal plane of tested optical system just.By recording the emergent pupil size of optical system, can obtain the preceding burnt long of system.
Fig. 4 (a), 4 (b) and 4 (c) also can accurately adjust the embodiment principle schematic of optical system and definite optical system conjugate distance as the present invention.Adjust light path shown in above-mentioned Fig. 4 (a), make the aberration minimum of the system that records, at this moment the size of aberration has shown that tested optical system 2 debugs situation.Adjust former and later two conjugation focusing surfaces of having determined optical system according to 4 (b) and 4 (c), can record conjugate distance.
Fig. 5 also can accurately adjust the embodiment principle schematic of optical system and definite optical system conjugate distance as the present invention.At first place the standard convex reflecting mirror in Fig. 5, adjust light path, make the aberration minimum of the system of recording, at this moment the size of aberration has shown the situation of debuging of tested optical system 2.Remove the standard convex reflecting mirror then, insert the plane mirror 4 that has reference field 6 adjustment racks 5 respectively, can determine the conjugation focusing surface of optical system in position, the front and back of this tested optical system 2 focusing surface " opal ".
Fig. 6 also can accurately adjust the embodiment principle schematic of optical system and definite optical system conjugate distance as the present invention.This principle of device is similar with Fig. 1, be that with the difference of Fig. 1 this device is made up of two groups of optical systems 2 and 17, opal position 6,18 and 19 corresponding in light path is placed the plane mirror that has reference field and adjustment rack respectively, the measurement of two groups of conjugate distances can be realized, and the test of situation that optical system 2 and 17 is debug can be realized.
Claims (5)
1. a method that adopts interferometer accurately to determine the optical system focusing surface is characterized in that this method comprises the following steps:
(1) select for use Fizeau laser interferometer (1) as the detecting instrument of determining optical system (2) focusing surface, the index plane of this interferometer and tested optical system (2) are complementary;
(2) the detection light beam with described laser interferometer (1) emission incides tested optical system (2), and the emergent light center of adjusting described laser interferometer (1) overlaps with the center of tested optical system (2); Continue to adjust optical system to be measured (2), make the beam convergence hot spot for minimum;
(3) add a standard reflection mirror (3) in described optical system to be measured (2) back, make light beam return optical system (2), return described laser interferometer (1) again along original optical path;
(4) adjust described standard reflection mirror (3), and finely tune tested optical system (2), laser interferometer (1) is gone up produce interference fringe, and the defocusing amount that makes the tested optical system (2) that described laser interferometer (1) records is for minimum;
(5) plane mirror (4) is inserted in any one light beam focus point position behind described laser interferometer (1) emergent light, the reflecting surface of this plane mirror (4) overlaps with the reference field (6) of an adjustment rack (5), adjust the position of described adjustment rack (5), the reflected light of this plane mirror (4) is returned in the described laser interferometer (1), produce interference fringe, and make the defocusing amount minimum, be " opal " position herein, take described plane mirror (4) away, the reference field (6) of then described adjustment rack (5) is exactly the focusing surface of described optical system to be measured (2).
2. one kind is adopted the accurately device of definite optical system focusing surface of laser interferometer, it is characterized in that comprising a laser interferometer (1), on the emitting light path of this laser interferometer (1) with optical axis be provided with adjustment rack (5), a plane mirror (4) and the standard reflection mirror (3) that is complementary with optical system to be measured (2) with reference field (6), described plane mirror (4) places on the reference field (6) of described adjustment rack (5), and the reflecting surface of described plane mirror (4) is perpendicular to described optical axis.
3. employing laser interferometer according to claim 2 is accurately determined the device of optical system focusing surface, it is characterized in that the coherent light of described laser interferometer (1) emission incides in the tested optical system (2) with parallel mode or with certain angle of divergence or with certain convergent angle.
4. employing interferometer according to claim 2 is accurately determined the device of optical system focusing surface, it is characterized in that described tested optical system (2) is refractive optical system or reflective optical system or refractive and reflective optical system.
5, employing interferometer according to claim 2 is accurately determined the device of optical system focusing surface, and the reflecting surface that it is characterized in that described standard reflection mirror (3) is plane or sphere.
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Cited By (8)
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| CN100449260C (en) * | 2007-01-17 | 2009-01-07 | 哈尔滨工业大学 | Method for precision measuring space offset of telephotolens and eyepiece using interferometer |
| CN102073122A (en) * | 2010-12-24 | 2011-05-25 | 中国科学院长春光学精密机械与物理研究所 | Concentric assembly method for concentric optical element in off-axis concentric optical system |
| CN102507153A (en) * | 2011-10-31 | 2012-06-20 | 北京空间机电研究所 | Focal plane calibration method for infrared lens of astronautic camera |
| CN106443642A (en) * | 2016-09-29 | 2017-02-22 | 中国科学技术大学 | Method for assembling a coherent laser radar FC/APC fiber coupling off-axis transmitting-receiving telescope |
| CN108426699A (en) * | 2018-01-29 | 2018-08-21 | 中国科学院长春光学精密机械与物理研究所 | A kind of detection method of optical system image planes defocusing amount |
| CN110146965A (en) * | 2018-06-05 | 2019-08-20 | 中国科学技术大学 | Diaphotoscope focused light passages assembling & adjusting system and diaphotoscope focused light passages Method of Adjustment |
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| JP2019537726A (en) * | 2016-11-18 | 2019-12-26 | ザイゴ コーポレーションＺｙｇｏ Ｃｏｒｐｏｒａｔｉｏｎ | Method and apparatus for optimizing optical performance of an interferometer |
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| DE3933057A1 (en) * | 1989-10-04 | 1991-04-18 | Doerries Scharmann Gmbh | METHOD AND DEVICE FOR DETERMINING THE POSITION AND DIAMETER OF THE FOCUS (FOCUS) OF A LASER BEAM, ESPECIALLY FOR USE FOR THE PROCESSING OF MATERIALS WITH A HIGH-PERFORMANCE LASER BEAM |
| CN1124473C (en) * | 2000-10-11 | 2003-10-15 | 中国科学院长春光学精密机械与物理研究所 | Method of utilizing digital interferometer to regulate vacuum ultraviolet interference spectrometer |
| JP4613340B2 (en) * | 2001-04-04 | 2011-01-19 | 株式会社ニコン | Measuring method of focal position of optical system under test |
| GB0200844D0 (en) * | 2002-01-15 | 2002-03-06 | Solexa Ltd | Linear response auto focussing device and method |
| EP1524491A1 (en) * | 2003-10-16 | 2005-04-20 | Universite Libre De Bruxelles | Apparatus coupling an interferometer and a microscope |
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| CN102073122A (en) * | 2010-12-24 | 2011-05-25 | 中国科学院长春光学精密机械与物理研究所 | Concentric assembly method for concentric optical element in off-axis concentric optical system |
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| CN102507153A (en) * | 2011-10-31 | 2012-06-20 | 北京空间机电研究所 | Focal plane calibration method for infrared lens of astronautic camera |
| CN102507153B (en) * | 2011-10-31 | 2014-11-19 | 北京空间机电研究所 | Focal plane calibration method for infrared lens of astronautic camera |
| CN106443642A (en) * | 2016-09-29 | 2017-02-22 | 中国科学技术大学 | Method for assembling a coherent laser radar FC/APC fiber coupling off-axis transmitting-receiving telescope |
| CN106443642B (en) * | 2016-09-29 | 2019-02-12 | 中国科学技术大学 | Coherent laser radar FC/APC fiber coupling receives and dispatches the Method of Adjustment of telescope off axis |
| JP2019537726A (en) * | 2016-11-18 | 2019-12-26 | ザイゴ コーポレーションＺｙｇｏ Ｃｏｒｐｏｒａｔｉｏｎ | Method and apparatus for optimizing optical performance of an interferometer |
| JP7027422B2 (en) | 2016-11-18 | 2022-03-01 | ザイゴ コーポレーション | Methods and equipment for optimizing the optical performance of interferometers |
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| CN110501142A (en) * | 2019-08-27 | 2019-11-26 | 中国人民解放军国防科技大学 | Detection device and detection method for optical system |
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