CN1838492A - Q-modulation semiconductor laser - Google Patents
Q-modulation semiconductor laser Download PDFInfo
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- CN1838492A CN1838492A CN 200610050484 CN200610050484A CN1838492A CN 1838492 A CN1838492 A CN 1838492A CN 200610050484 CN200610050484 CN 200610050484 CN 200610050484 A CN200610050484 A CN 200610050484A CN 1838492 A CN1838492 A CN 1838492A
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Abstract
This invention discloses a Q-modulation semiconductor laser, which includes the first optics cavity and the second cavity, wherein the first optics cavity is a resonator with gain zone, the second optics cavity is a resonator with modulation zone; and the second optics cavity couples with the first optics cavity by the separation element reflected by a section, and the second optics cavity is used as the back reflector of the laser; and the modulation zone's absorption coefficient is modulated by a electrolytic method, which affects the back reflector's reflection rate and laser Q value, which changes the threshold value and output energy of the laser transmitting. The Q-modulation semiconductor laser in this invention has many advantages such as high integration, high speed, high delustring ratio, lower wavelength chirp.
Description
Technical field
The present invention relates to semiconductor laser and modulator, relate in particular to a kind of with utilize electric current to inject or the electric absorption effect changes the single chip integrated Q-semiconductor laser modulation of Q-modulator of laser back reflector reflectivity.
Background technology
High speed semiconductor laser and modulator are the key elements of current optical fibre communication system.Increasing sharply of internet transmission amount requires these optical elements can handle the bit rate that more strengthens.Directly carrying out the light signal strength modulation by the bias current that changes laser is the simplest method, and it does not need an external modulator.But directly the laser of modulation has basic speed limit, and shows building up, and its frequency equals its relaxation oscillation frequency.Wavelength chirp is another problem of direct modulated laser.When the input drive current of laser changed, carrying object density and refractive index be all along with variation, thereby make wavelength also along with change.Optical maser wavelength changes respectively round about when pulse is risen and descend.Bit rate is high more, and it is obvious to warble, and its effect is widened laser linewidth.Phenomenon is serious under wideer laser linewidth situation because CHROMATIC DISPERSION IN FIBER OPTICS effect, pulse broaden, thus the restriction transmission range.
People wish very that also tunable wave length or switchable semiconductor laser are arranged, and are used for the optical-fiber network that can dynamically recombinate.But directly modulated laser is followed intrinsic phase change and laser stability machine-processed with wavelength tuning is disturbed mutually through regular meeting, make tunable laser usually can not with direct chopping phase compatibility.
People can allow laser works at continuous wave (CW) state, and modulate it with an external modulator.Can eliminate the problem of above-mentioned building up like this, and reduce and warble.Electroabsorption modulator (EAM) is a fine selection as external modulator, and it is by applying the absorption coefficient that a signal of telecommunication changes it.When modulator is that the output beam of laser during at the state of opening can pass to low-loss modulator, and when modulator be that light energy will be by portion's absorption greatly during at the state that closes.The advantage of this electroabsorption modulator and other modulator comparison is: low driving voltage, and small size, and can be integrated with distributed feed-back (DFB) or distributed Bragg reflector (DBR) laser monolithic.The structure and the laser of electroabsorption modulator are closely similar, and just its active layer forbidden band band gap is slightly different.Another difference is that it is to be operated in reverse bias condition.When the reverse biased of input data signal change modulator, the absorption coefficient of modulator waveguide changes, thus the variation that causes exporting optical power.
Though relatively directly the modulated laser electroabsorption modulator has significantly improved the performance of warbling, the problem of warbling still exists, because variations in refractive index is accompanied by the modulation of absorption coefficient inevitably.And modulator to warble be dynamic, change along with the variation of actual driving voltage.Can now electroabsorption modulator can provide the modulation rate of about 10Gb/s, reach higher speed (more than 40Gb/s) and do not cause that sizable parasitic phase modulation can't affirm simultaneously.And its extinction ratio performance is undesirable, and inserts to exist between the performances such as loss and speed and meet each other half way.In addition, single chip integrated Electroabsorption Modulated Laser (EML) needs repeatedly epitaxial growth, so complex process, the manufacturing cost costliness.
The method of another kind of light modulated is to use Mach-Ceng Te (Mach-Zehnder is called for short MZ) interferometer, makes of the material (as lithium niobate LiNbO3 crystal) with strong electro optic effect.Change refractive index and optical path length by applying voltage, the phase contraposition that makes optical signalling propagate in every road of MZ interferometer is mutually modulated.The light beam of two out of phase modulation is just combined and can convert phase modulated to intensity modulated.If the phase modulated in two light paths is equal and opposite in direction but opposite in sign just in time, this modulator will not have any warbling, and this means that output signal has only intensity modulated and do not have parasitic phase place or frequency modulation(FM).But this external modulator is very expensive, and be difficult to and the laser monolithic integrated, only be used at present in long distance and the extra long distance transmission system.
Along with the popularization at metropolitan area and local area network (LAN) of the development that is used for broadband access Fiber to the home (FTTP) technology and high-density wavelength division multiplexer spare (DWDM), it is more and more important that low-cost semiconductor laser and modulator have become.Fabry Perot (Fabry-Perot) laser is widely used in Access Network and enterprise network, and the optical-fibre channel of storage area network.The dynamic wavelength stability of Fabry Perot laser has significant impact to transmission range, and is all the more so when especially using multimode fiber.Therefore press for a kind of high speed, modulator cheaply, can reduce the dynamic stability that optical maser wavelength is warbled and kept laser, it is not only to long Distance Transmission and metropolitan area network, and also significant to Access Network and enterprise network.
Summary of the invention
The objective of the invention is at the deficiencies in the prior art, propose a kind of Q-semiconductor laser modulation, solved conventional semiconductor laser and modulator cost height, not easy of integration, wavelength chirp is made problems such as complexity.
The objective of the invention is to be achieved through the following technical solutions: a kind of Q-semiconductor laser modulation, comprise first optics cavity and second optics cavity, described first optics cavity is a resonant cavity that comprises gain regions, and described second optics cavity is an antiresonance chamber that comprises modulator region; Described second optics cavity is coupled by dividing element and first optics cavity of a partial reflection, and as the back reflector of laser; Thereby it is modulated and cause the modulation of described back reflector reflectivity and laser Q value to change the threshold value and the output energy of Laser emission that the absorption coefficient of described modulator region causes method by an electricity.
Described dividing element is a deep erosion air groove that the limit wall is vertical.
The width dimensions of described deep erosion air groove equals quarter-wave odd-multiple.
Described dividing element is a distributed Bragg grating.
The absorption coefficient of described modulator region injects by forward biased electric current to be modulated.
The absorption coefficient of described modulator region is modulated by back-biased electric absorption effect.
First kind of concrete technical scheme is: described first optics cavity comprises gain regions, described gain regions is made up of first section fiber waveguide in top electrode that is clipped in gain regions and the grounding electrode, and the top electrode of described gain regions and grounding electrode are to be used in first section fiber waveguide injection current so that the pair of electrodes of the gain of light to be provided; Described modulator region is made up of second section fiber waveguide in top electrode that is clipped in modulator region and the grounding electrode, the top electrode of described modulator region and grounding electrode are to be used to provide a signal of telecommunication modulating the optical loss of described second section fiber waveguide, thus the pair of electrodes of the threshold value of modulated laser and output energy.
The upper surface that the upper surface of the waveguide core layer of described first section fiber waveguide comprises the waveguide core layer of distributed feedback grating or described first section fiber waveguide and second section fiber waveguide all comprises distributed feedback grating.
Second kind of concrete technical scheme is: described first optics cavity comprises gain regions and phase place zone, described gain regions is made up of first section fiber waveguide in top electrode that is clipped in gain regions and the grounding electrode, the upper surface of the waveguide core layer of described first section fiber waveguide comprises a distributed feedback grating, and the top electrode of described gain regions and grounding electrode are to be used in first section fiber waveguide injection current so that the pair of electrodes of the gain of light to be provided; Described phase place zone is made up of the 3rd section fiber waveguide in top electrode that is clipped in the phase place zone and the grounding electrode, and the top electrode in described phase place zone and grounding electrode are to cause the pair of electrodes that method is regulated the effective refractive index of described the 3rd section fiber waveguide with a kind of electricity; Described modulator region is made up of second section fiber waveguide in top electrode that is clipped in modulator region and the grounding electrode, the top electrode of described modulator region and grounding electrode are to be used to provide a signal of telecommunication modulating the optical loss of described second section fiber waveguide, thus the pair of electrodes of the threshold value of modulated laser and output energy.
Described first section fiber waveguide, the upper surface of the waveguide core layer of second section fiber waveguide and the 3rd section fiber waveguide all comprises distributed feedback grating.
The beneficial effect that the present invention has is:
1. Q-semiconductor laser modulation of the present invention utilize a new principle mechanisms with semiconductor laser with at a high speed, the low Q-modulator monolithic of warbling is integrated, realize high-performance, undersized generating laser, have low cost and the making simple advantage similar simultaneously with direct modulated laser.
2. Q-semiconductor laser modulation of the present invention has multiple different specific constructive form, comprises based on different structures such as distributed feedback laser, Fabry Perot laser, distributed Bragg grating laser and wavelength-tunable composite chamber lasers.
3. Q-semiconductor laser modulation of the present invention is separated modulation function and gain regions, the latter is by the constant current pumping, this has not only reduced wavelength chirp, also improved modulating speed, therefore with respect to direct modulation or external electroabsorption modulator, modulator length of the present invention is wanted much shorter, thereby littler electric capacity is arranged, higher speed.
4. Q-semiconductor laser modulation of the present invention, under the integrated situation of Q-modulator and Fabry Perot laser or Wavelength variable multi-cavity laser, the phase change of being brought by modulator is very little, make that like this wavelength stability is fine, the pattern frequency hopping reduces, thereby has also reduced relative intensity noise.
5. that Q-semiconductor laser modulation of the present invention has is integrated, at a high speed, advantages such as High Extinction Ratio, low wavelength chirp and low cost.
Description of drawings
Fig. 1 be the present invention that propose with a schematic block diagram single chip integrated semiconductor laser of Q-modulator.
Fig. 2 is based on the schematic diagram of the Q-semiconductor laser modulation of first kind of implementation method of the present invention.
Fig. 3 is the reflectivity of air groove and the function that transmission coefficient changes with the air groove width dimensions at the 1550nm wavelength.
Fig. 4 is for two different normalization absorption coefficient L=0 and α L=2.4, changes (b) spectral function with wavelength change by the reflectivity (a) of the laser cavity back reflector that places two modulator regions between the etching air groove to form and reflected phase will.
Fig. 5 is under the modulator state of two different normalization absorption coefficient L=0 and α L=2.4, the small signal gain spectral function of laser structure.
Fig. 6 is the function that laser threshold gain coefficient (a) and wavelength change (b) change with normalization modulator absorption coefficient L.
Fig. 7 is for different modulating device zone absorption value, the reflectance spectrum function of laser back reflector.Suppose that the waveguide effective refractive index real part of modulator region and the ratio of imaginary part are 1.5.
Fig. 8 is the different operating point of corresponding modulating device zone antiresonance optics cavity, the function that gain for threshold value coefficient (a) and wavelength change (b) change with normalization modulator absorption coefficient L.
Fig. 9 is based on the schematic diagram of the Q-semiconductor laser modulation of second kind of implementation method of the present invention, and its structure has comprised distributed feedback grating.
Figure 10 is the function that laser threshold gain (a) and wavelength (b) change with phase place zone variations in refractive index, corresponding grating is by air groove four four kinds of situations that diverse location blocks in a grating periodic regime: in the middle of the high index of refraction section, low-refraction section end, the middle and high index of refraction section end of low-refraction section.
Figure 11 is under normalization absorption coefficient L=0 and two kinds of modulator state of α L=2.4, all includes the small signal gain spectral function of the laser structure of DFB grating in three zones.
Figure 12 is under normalization modulator absorption coefficient L=0 and two kinds of situations of α L=2.4, the gain for threshold value of several different modes (being marked by sign) around the laser holotype.
Figure 13 is based on the schematic diagram of the Q-semiconductor laser modulation of the third implementation method of the present invention, and this laser is a simple Fabry Perot laser (a) or the Fabry Perot laser (b) that additionally has the mode selector of making by deep erosion.
Figure 14 opens (α L=0) and closes back reflector reflectivity under (α L=1.2) two states and the spectral function of mode selector reflectivity at modulator.
Figure 15 opens at modulator under (α L=0) and pass (α L=1.2) two states, around the centre wavelength 1550nm of design, and the Laser emission threshold value of different longitudinal modes.
Figure 16 is under normalization modulator absorption coefficient L=0 and two kinds of situations of α L=1.2, the small signal gain spectral function of the laser structure of Figure 13 (b).
Figure 17 absorbs the function that changes at the laser threshold gain coefficient (a) of Figure 13 (b) laser structure and wavelength change (b) with the normalization modulator.
Figure 18 is based on the schematic diagram of the Q-semiconductor laser modulation of the 4th kind of implementation method of the present invention, and this laser is to comprise the multi-cavity wavelength variable laser that a channel is selected the zone.
Figure 19 is based on the schematic diagram of the Q-semiconductor laser modulation of the 5th kind of implementation method of the present invention, and this laser comprises the distributed Bragg grating.
Among the figure: 100, the front end face of emitting output light bundle, 101, gain regions, 102, the phase place zone, 103, modulator region, 104, photo-detector, 105, the dividing element of separating modulator region 103 and phase place zone 102,106, the dividing element of separating photo-detector 104 and modulator region 103,107, the dividing element of compartmented mode selector 108 and gain regions 101,108, mode selector, 110, dividing element or cleavage surface, 112, surface coating, 114, waveguide core layer, 116, resilient coating, 118, substrate, 120, grounding electrode, 201, the top electrode of gain regions 101,202, the top electrode in phase place zone 102,203, the top electrode of modulator region 103,204, the top electrode of photo-detector 104,208, the top electrode of mode selector 108,301, distributed feedback grating, 404, the dividing element of separating coupled waveguide zone 409 and gain regions 101,406, separate channel and select the dividing element in zone 408 and coupled waveguide zone 409,407, separate channel and select the dividing element of zone 408 and gain regions 101,408, channel is selected the zone, 409, the coupled waveguide zone, 500,505,510, the distributed Bragg grating, 508, channel is selected the top electrode in zone 408
Embodiment
Below with reference to the accompanying drawings and embodiment, describe the present invention in detail.
As shown in Figure 1, a kind of Q-semiconductor laser modulation comprises first optics cavity and second optics cavity, and described first optics cavity is a resonant cavity that comprises gain regions, and described second optics cavity is an antiresonance chamber that comprises modulator region; Described second optics cavity is coupled by dividing element and first optics cavity of a partial reflection, and as the back reflector of laser; Thereby the absorption coefficient of described modulator region injects by electric current or the electric absorption effect is modulated and cause the modulation of described back reflector reflectivity and laser Q value to change the threshold value of Laser emission and export energy.Q-semiconductor laser modulation of the present invention has multiple different concrete structure, and wherein first optics cavity can be respectively based on distributed feedback grating, Fabry Perot resonant cavity, distributed Bragg grating and wavelength variable composite resonant cavity configuration.
The Q factor of laser optical resonant cavity or claim that quality factor is what to be used for weighing be fed by optical resonator from the light of laser gain medium, the high Q factor mean that light propagates each and be subjected to less loss back and forth in resonant cavity.The principle of Q-modulation is to utilize a device that can change the resonant cavity Q factor to change the laser Output optical power, and this has been applied in the accent Q dyestuff or solid state laser that produces periodic short pulse.Usually realize transferring the art methods of Q to comprise: in optical resonator, use revolving mirror, or use electric light or acousto-optic modulator.But these methods are all infeasible for small semiconductor laser.
For the modulation of semiconductor laser, reducing wavelength chirp is the aspect that very important needs are considered.The United States Patent (USP) 4 of authorizing on May 19th, 1,667, R.C.Alferness etc. has described the method for placing electric modulator in laserresonator in 331, but this method is insuperior feasible, because make the complexity, also can introduce and the similarly significant wavelength chirp of direct modulated laser except increasing.
2003 on February 11, authorize United States Patent (USP) 6,519,270 in, H.B.Kim and J.J.Hong has described a composite chamber laser that is shaped as by distribution as unimodal feedback laser and passive optical waveguide set of regions.Refractive index by the modulation passive wave guide, thereby the phase place of cleavage surface effective reflectivity after the modulation passive wave guide, and then the modulated laser frequency, resemble the narrow-band optical filter that constitutes by the Mach-Zehnder interferometer by placing one then in the laser front, frequency modulation(FM) is converted into intensity modulated.Though this modulator also is the rear end that is placed on laser, what it changed is not the Q value of laser, and is phase place, causes the modulation rather than the intensity modulated of frequency.Frequency modulation(FM) is converted into the needed narrow band filter of intensity modulated makes it be difficult to be applied to common communication system, needed active-the integrated making that also makes device of the passive wave guide difficulty and expensive that becomes.
One piece is entitled as " Q-modulation of a surface emitting laser and an integrated detunedcavity ", S.R.A.Dods, and M.Ogura, IEEE Journal of Quantum Electronics, vol.30, pp.1204-1211,1994 paper describe and have analyzed and the vertical integrated surface emitting vertical cavity laser of an off resonance cavity, can realize the modulation of laser intensity by the refractive index in the change off resonance cavity.Same principle is used in the United States Patent (USP) 6,215,805 of the B.Sartorius and M.Moehrle that authorizes 2004 on April 10.In above two prior aries, a resonant cavity that reflector is a micro-off resonance of laser chamber, its reflectivity highly dispersed on the laser works wavelength that is to say that reflectance spectrum shows a sharp-pointed undershoot near optical maser wavelength.High reflectivity chromatic dispersion is essential, and small variations in refractive index just can cause the very big change of reflector reflectivity in the resonant cavity of off resonance like this, thus modulated laser output.Yet, this art methods has very big defective: 1) under nearly condition of resonance, the reflectivity height depends on wavelength, therefore need require accurately to proofread and correct their resonance wavelength according to the off resonance between pre-determined two resonant cavitys, this is difficulty very, and is also very sensitive to making.2) reflectivity change that refraction index changing causes in the off resonance cavity is accompanied by very big phase change, and this will cause the very high-chip of optical maser wavelength.
The present invention has overcome the defective of prior art approach, and by using the back reflector of an antiresonance chamber as semiconductor laser, the reflectivity of this reflector can change by the optical absorption that changes antiresonance chamber inner waveguide material.Compare with resonant cavity, the reflectivity in antiresonance chamber and the reflectance varies that caused by optical loss modulation weaken greatly to the dependence of wavelength, and caused phase change is also quite little during reflectivity change, so wavelength chirp is very low.Change to inject by electric current as the antiresonance chamber inner waveguide optical loss of modulator and realize, can use and the gain medium identical materials, therefore simplified making greatly.To describe the details of the monolithic Q-semiconductor laser modulation structure that realizes above mechanism below in detail.
Fig. 2 is first kind of concrete structure of implementing of the present invention, and it is one and the single chip integrated distribution as unimodal feedback semiconductor laser of electric absorption Q-modulator.This laser has comprised the front end face 100 of emitting output light bundle, as the modulator region 103 of laser back reflector, is etched in distributed feed-back (DFB) grating 301 that gain regions 101 is used for stablizing the single-mode laser operating frequency, and phase place zone 102.The Q-modulator comprises the dividing element 105 (being an air groove) of separating modulator region 103 and phase place zone 102 here, another dividing element or cleavage surface 110 and the electric absorption waveguide between the two at modulator region 103.Air groove 105 and dividing element or cleavage surface 110 have been formed antiresonance Fabry Perot Fabry-Perot chamber, and its reflectivity can absorb by the waveguide in the change chamber and change.The operation principle and the J.-J.He and M.Cada that remove the laser of modulator part are entitled as " Phase-matched combineddistributed-feedback/Fabry-Perot structure for semiconductor lasers " at one piece, OpticsCommunications, vol.110, pp.115-119, the similar of describing in 1994 the paper.Distributed feedback grating can be that the fractionated gain coupled structure is to improve the single mode selectivity of laser.In general (but and nonessential), front end face 100 is cleavage surfaces, can plate anti-reflection film the random reflected phase effect is reduced to minimum.
Waveguiding structure generally comprises resilient coating 116, and the waveguide core layer 114 and the surface coating 112 of the gain of light is provided during the electric pump Pu, and they all are deposited in the substrate 118.Waveguide core layer 114 preferably comprises multi-quantum pit structure, and resembles suitable doping the conventional laser structure sheaf in each layer.On cross section, waveguide is processed to the ridge waveguide of standard, also to obtain the restriction of optical mode in the horizontal direction.Top electrode 201,202,203 are deposited on gain regions 101 respectively, phase place zone 102, modulator region 103 trizonal upper epidermis, the back side of substrate has also deposited another grounding electrode 120 as ground plane.Can produce the gain of light at gain regions 101 injection currents by electrode, utilize a kind of electricity to cause method (injecting) at modulator region 103 and change the absorption coefficient of waveguide, thereby change the reflection coefficient of laser back reflector by reversed bias voltage or electric current.In phase place zone 102, using a kind of electricity to cause method makes this section waveguide fully transparent and regulate its effective refractive index, make that for zlasing mode, the reflected phase will and the raster phase of back reflector are complementary, so just can reach minimum Laser emission threshold value and the highest side mode suppression ratio rate.
Above-mentioned trizonal waveguide material can be different, feasible structure independent optimization with each individual region of difference in functionality.This can utilize the etching regrowth techniques or achieve the above object such as band gap engineering method after the growth of quantum well hybrid technology.Another simpler method is all to utilize the layer structure of identical laser in three zones, but applies different voltage or electric current, to obtain three performances that the zone is different.
An important structure component of device of the present invention is the vertically deep erosion air groove as dividing element, and it has formed the antiresonance chamber of electric absorption Q-modulator and has formed the back reflector of laser.In several years of past, make vertically, the mummification lithographic technique of level and smooth dark etched surface has been obtained huge advance made, for example, at one piece " Monolithic integrated wavelength demultiplexer based on a waveguide Rowlandcircle grating in InGaAsP/InP " by name, J.Lightwave Tech.Vol.16, pp.631-638, in 1998 the paper, J.-J.He, B.Lamontagne, A.Delage, L.Erickson, M.Davies, and E.S.Koteles have obtained extraordinary etched surface quality on the material system based on InP.An application of high-quality etched surface is based on the echelon device of waveguide, and it is by business development.Vertically, the maturation of smooth etching limit wall and air groove manufacturing technology also provides the foundation for the technical feasibility of device of the present invention.
Air groove has played partially reflecting mirror in this device architecture.When the air groove width dimensions is quarter-wave odd-multiple, λ/4,3 λ/4,5 λ/4 just ... the time, can access high reflectivity.Fig. 3 is the reflectivity of air groove and the transmissivity function with change width on the 1550nm wavelength.When width dimensions is quarter-wave even-multiple (λ/2 just, λ, 3 λ/2 ... or the like), the reflectivity of air groove almost can be ignored.
In theory, when the air groove width hour, just about λ/4, can reach optimum performance.This is because dispersing of light beam makes the loss of air groove become big and become big along with width dimensions.Therefore, as shown in Figure 4, reflectance peak descends gradually.Simultaneously, along with width dimensions increases, the wavelength dependency of reflectivity is more and more stronger.But then, if width dimensions reduces, the making difficulty that will become more is because for the wavelength of 1550nm, the width of λ/4 has only 0.3875 μ m.5 λ/4 are to the width of 9 λ/4, and correspondence is of a size of 1.94 μ m to 3.49 μ m, are that a good compromise is selected.Regardless of the air groove width dimensions, be ± 0.1 μ m magnitude based on the tolerance of air groove on width of InP material system, this can reach for present technology manufacturing technology.Along with development of technology, we can expect that the width dimensions that can reach can be more and more littler.For the operation principle of device of the present invention is described, temporarily ignore the air groove loss that causes by beam divergence in our numerical example below.
The design of air groove width dimensions also can depart from the principle of quarter-wave odd-multiple, makes air groove that optimum reflectivity can be arranged.In this case, the reflection of air groove can produce the phase change Φ of a non-zero.
According to an embodiment of the invention, the waveguide of electroabsorption modulator is placed in the antiresonance chamber of being made up of two etching air grooves (or an etching air groove and a cleavage surface).When optics cavity is operated in high reflective condition, chamber self-energy density hour is called the antiresonance chamber.Modulator region and air groove constitute the back reflector of laser, and its reflectivity can be changed by the electric absorption effect.The electric absorption effect here is to causing the common name that method changes the absorption coefficient of waveguide by electricity such as reverse bias voltage or electric current injections.The optical path length of modulator region is designed near following antiresonance condition:
Wherein L is the length of modulator region, and n is an effective refractive index, and λ is the vacuum medium wavelength, and Φ is the phase place of air groove reflectivity, and m is an integer.
As numerical example, we suppose λ=1550nm, n=3.215, and m=50.The width dimensions of air groove is chosen as 1.15 λ=1.7825 μ m.The reflectivity of the air groove that calculates is 0.85, and phase place is-0.3943.According to formula (1), obtaining the modulator region length of field is L=12.2 μ m.Fig. 4 (a) has shown that the absorption coefficient when modulator region is α=0 and α=2000cm
-1When (corresponding respectively to normalization absorption coefficient L=0 and α L=2.4), two reflectance spectrum functions of back reflector.Fig. 4 (b) has shown corresponding reflectivity phase change with wavelength change, and these two curve intersections corresponding to different modulating device absorption value are at λ=1550.5nm.We can see that near 1550nm, reflectivity alters a great deal along with the change of modulator absorption coefficient, and the respective phase variation is little as can to ignore.To show that as our back the change of reflectivity will cause the change of laser cavity Q value, thereby change the Laser emission threshold value.In theory, except the antiresonance condition, modulator also can be operated in condition of resonance, just
This is corresponding to the reflectivity minimum value among Fig. 4 (a), just λ=1536.1nm or λ=1565.3nm.In this case, reflectivity is with the variation of modulator absorption coefficient also have significant change (change direction is opposite with the antiresonance situation), but can find out that the phase change of its correspondence is also very big from Fig. 4 (b), will make the degradation of warbling of laser like this.In addition, wavelength dependency is also very strong near condition of resonance, causes very narrow operation wavelength bandwidth and very little making admissible error.
Fig. 5 has shown the small signal gain spectral function at the complete laser structure of Fig. 2.The length in distributed feedback grating DFB zone is 400 μ m, supposes that the grating effective refractive index is distributed as rectangular function, high index of refraction section n1=3.215, and low-refraction section n2=3.21 (Δ n=0.005), the cycle is Λ=0.2412 μ m.Its normalized coupling coefficient is calculated by following formula
We suppose that further grating is the fractionated gain coupling, and gain only is created in the high index of refraction section.G.P.Li, T.Makino, and H.Lu is at " Simulation and interpretation of longitudinal-modebehavior in partly gain-coupled InGaAsP/InP multiquantum-well DFB lasers ", IEEEPhotonics Technology Letters, vol.4, no.4 has described the example of a gain coupled distributed feedback laser in pp.386～388,1993 this piece papers.In our numerical example, the length of phase region is set to L
p=50.2 μ m.Two spectral functions among Fig. 6 be when gain coefficient be g=9.1cm
-1And the normalization absorption coefficient calculates when being respectively α L=0 and α L=2.4.
In view of optical gain produces in grating high index of refraction section, so the distributed feed-back zlasing mode of the long wavelength side in grating forbidden band has lowest threshold.When modulator was in pellucidity (α=0), (the gain for threshold value coefficient of λ=1550.25nm) was 9.1cm at the laser master mould of forbidden band long wavelength side
-1, simultaneously (threshold value of λ=1548.51nm) is 65cm at first mould of forbidden band short wavelength side
-1So big threshold difference assurance laser works is at the single mode state and have very high limit mould supression rate.When modulator was in absorbing state α L=2.4, the wavelength of above-mentioned two patterns was constant and the gain for threshold value coefficient rises to 37.6cm respectively
-1And 71.3cm
-1Laser master mould is big threshold value difference (9.1cm like this under two modulator state
-1And 37.6cm
-1) illustrated that modulator has produced effectively Q modulation to laser.When the laser gain zone by the constant current pumping, when the gain of light of its generation was lower than the laser threshold of modulator absorbing state and is higher than the laser threshold of transparent (or low absorption) state, the signal that laser output just can be applied on the modulator was effectively modulated.With the Q-chopping phase with phase change can ignore that thereby to cause very little wavelength chirp be the significant advantage of Laser Modulation device of the present invention.
Fig. 6 (a) is the curve that the laser gain coefficient changes with the modulator absorption coefficient.We can see that the modulator absorption coefficient only needs 500cm
-1(corresponding to α L=0.6) just can obtain 100% threshold difference.If the optical path length of modulator design make optical maser wavelength be in the intersection point place of two curves of Fig. 4 (b) (λ=1550.5nm) just, the optical maser wavelength of total since the skew that the modulator absorption value changes can be little ignore.When optical maser wavelength during away from this best operating point, skew will increase.However, side-play amount is still than the little several magnitudes of direct modulated laser.Fig. 6 (b) has shown the function that optical maser wavelength changes with the modulation absorption coefficient in the last routine structure.This laser work wavelength is λ=1550.25nm, skew best operating point 0.25nm.When normalization modulation absorbs α L when 0 changes to 2.4, changes of threshold four times (from 9.1cm
-1To 37.6cm
-1), and wavelength variable quantity is less than 0.007nm.By contrast, the direct modulated laser device with distributed feedback of tradition has the wavelength chirp up to several nanometer scale.
In semi-conducting material, according to the Kramer-Kronig relation, the change of absorption is accompanied by the change of refractive index, and this variations in refractive index can be very big under certain condition of work.By suitably select the running parameter in modulator chamber near the antiresonance condition, refraction index changing can be used to strengthen the modulation of laser threshold.Fig. 7 has shown with respect to different modulator absorption coefficient L=0, α L=0.24, α L=0.6, α L=1.2 and α L=2.4, the reflectance spectrum function of back reflector.We have supposed that the ratio of modulator waveguide effective refractive index real part and imaginary part change is 1.5.We can see that near operation wavelength 1550nm along with the increase of absorption value, the spectral shift that refraction index changing causes has further reduced reflectivity.
The condition of work in modulator chamber can be described by a mark parameter f (0≤f＜1), and when modulator is absorbed as zero when (pellucidity), this parameter is by following equation definition:
Fig. 8 has shown laser threshold gain coefficient (a) and corresponding wavelength change (b) in f=0.5 (correspondence antiresonance condition accurately), the function that changes along with the modulator absorption coefficient under the condition of f=0.6 and f=0.73.We can see that changes of threshold slope ratio Fig. 6 (a) is big, has illustrated that variations in refractive index has increased the variation of laser threshold.When the f parameter when 0.5 rises, the needed modulator absorption coefficient of given changes of threshold changed reduced.For example, for f=0.73, from 0 to 500cm
-1The modulator absorption coefficient of (changing to 0.6 from 0 corresponding to α L) changes can cause that the gain for threshold value coefficient is from 12.8cm
-1Increase to 52.3cm
-1, surpass four times variable quantity.And corresponding wavelength change only is 0.039nm.
In above execution mode of the present invention, work is very important to the optical path length in phase place zone for device, needs to adjust it so that the field distribution of the field distribution of Fabry Perot Fabry-Perot resonant mode and distributed feedback grating DFB resonant mode is constructive interference.Therefore, in order to obtain complete adjusting range, the length in phase place zone wants long enough can produce the phase change of π by the curtage that change applies.During real work, can be under the state that modulator is set at out, maybe will export the energy maximization and decide needed direct voltage or the electric current that is applied to phase region by the Laser emission threshold value is minimized.Be applied to this regional Dc bias and also can be used for fine regulating the operation wavelength of laser.
In the above embodiment, distributed feedback grating only is fabricated on the gain regions 101 of laser, and phase place zone 102 and modulator region 103 do not have grating.For traditional distributed feedback laser, grating is to portray by the holographic exposure method of utilizing two beam interferences.If only can improve the complexity of making at the specific subregion portrayal grating of wafer.Fortunately, as follows, the existence of grating in phase place and modulation areas do not influence the work of device.So just allow us to simplify manufacturing process by portrayal grating on entire wafer.
Fig. 9 has shown second kind of execution mode of the present invention.It comprises three zones: gain regions 101, phase place zone 102 and modulator region 103.This device is by making portraying uniformly distributed feedback grating 301 on the wafer.There is the top electrode (being respectively 201,202 and 203) of a separation in each zone and at the common grounding electrode 120 of bottom surface.Modulator region and phase place zone are separated by dividing element 105, be a vertically deep erosion air groove that passes waveguide core layer here, and the waveguide in gain regions 101 and phase place zone 102 are to be connected continuously.Gain regions 101 is injected into a large amount of electric currents and provides optical gain for laser.Phase place zone 102 to the substantially transparent state, is provided phase control by being adjusted to by the light wave of dividing element 105 (being an air groove) and modulator region 103 reflections of bias current to it here by pumping simultaneously.Apply the signal of telecommunication on the modulator region 103, made its waveguide material character change in oscillation between substantially transparent (or little gain) and basic absorption state.The other end of modulator region is blocked by another dividing element 106, and 106 can be etching air groove or a cleavage surface.A photo-detector 104 that has independent top electrode 204 also can be integrated on the same device.
Because the length of modulator region 103 is shorter relatively, the effect of grating almost can be ignored.Except adding on the modulator waveguide that the cycle is the grating of Λ=0.2412 μ m, Δ n=0.005, we have used the calculation of parameter identical with Fig. 4 reflectance spectrum of back reflector, the result is almost completely consistent with the spectrum of Fig. 4.
Figure 11 has shown that at gain coefficient be g=9.8cm
-1, the small signal gain spectrum of the above-mentioned laser structure that normalization modulator absorption coefficient calculates when being respectively α L=0 and α L=2.4.We can see their almost completely identical with Fig. 5, and the almost not influence of grating pair device work in modulator region and phase place zone is described.
The gain for threshold value of pattern around Laser emission master mould 1550.4nm when we have provided and have been respectively α L=0 and α L=2.4 with respect to normalization modulator absorption coefficient in Figure 12, the position of different mode marks with mark.Because use fractionated gain coupling distributed feedback grating DFB, the threshold value difference is very big, this has guaranteed the dynamic single mode operation of laser.The change of modulator absorption coefficient causes the basic mode threshold value from 9.8cm
-1Rise to 32cm
-1, shown effective Q modulation scheme.
It is evident that for the expert an of this area if air groove can accurately be controlled with respect to the phase position of distributed feedback grating during fabrication, the phase place zone can be removed so in above two kinds of execution modes.On the other hand, can add a phase place zone in the antiresonance chamber as modulator, to adjust the working point of Q modulator.The equally also wavelength tunability that can replace DFB in the previous example and phase place zone to improve laser with the multizone distributed feed-back that has three or more electrodes.
Figure 13 (a) has shown the third execution mode of the present invention, and wherein Q-modulator and a Fabry Perot laser integrate, and it has comprised gain regions 101 and modulator region 103.There is an independent top electrode (being respectively 201 and 203) in each zone and at the common grounding electrode 120 of bottom.Modulator region 103 and gain regions 102 are separated by dividing element 105, are a vertically deep erosion air groove that passes waveguide core layer here.In addition, shown in Figure 13 (b), we also can be integrated in the single mode operation that obtains laser on the same chip with the mode selector 108 that is made of one or more Fabry Perot chamber.Mode selector 108 plays the effect of optically filtering, can separate mutually with gain regions 101 by dividing element 107 (being that another one is lost air groove deeply here).The top in mode selector zone can deposit a top electrode 208, makes following waveguide substantially transparent with injection current, and changes its refractive index so that regulate the centre wavelength of mode selector.Owing to do not need distributed feedback grating, this element manufacturing is very simple, is much better than the directly Fabry Perot laser of modulation simultaneously on wavelength stability and modulating speed.Its application in metropolitan area and access network has very big potentiality, because components and parts are very important to the application of this respect cheaply.
It should be noted that the Fabry Perot laser is always operating under the condition of resonance for laser emission wavelength, therefore have high energy density in the chamber, and the optics cavity of modulator region among the present invention and mode selector preferably is operated in the antiresonance condition that approaches.As an example, the waveguide length that we establish modulator region, gain regions and mode selector is respectively 12.2 μ m, and 200 μ m and 24.5 μ m, air groove are 1.78 μ m.Figure 14 has shown at the modulator region state for opening (α L=0) and closing the situation modulated device optics cavity reflectivity of (α L=1.2) and the spectral function (from gain regions incident) of mode selector optics cavity reflectivity.The product of mode selector and modulator optics cavity reflectance spectrum has determined to select the filter function of zlasing mode.The peak position of this spectral filtering function generally is to be designed to overlap substantially with the peak position of material gain spectral function, and near the active cavity pattern this peak position will have minimum Laser emission threshold value like this.Figure 15 has shown for two states of modulator Push And Release, near the corresponding Laser emission threshold value of the different longitudinal modes centre wavelength 1550nm of design.In the aforementioned calculation, do not consider that the gain spectra of waveguide material distributes, and the distribution of the gain spectra of material will further improve the selectivity of pattern.When modulator when opening state exchange to off status, lowest threshold is from 8.8cm
-1Rise to 21cm
-1
Figure 16 has shown that gain coefficient is g=8.8cm
-1, the small signal gain spectrum that normalization modulator absorption coefficient calculates when being respectively α L=0 and α L=1.2 as Figure 13 (b) laser structure.Laser works is at the single mode state, and when modulated, its wavelength shift amount is very little.
Figure 17 has shown the function that laser threshold gain coefficient (a) and corresponding wavelength change (b) change with the modulator absorption coefficient.When normalization modulator absorption coefficient L when 0 changes to 1.2, threshold value is from 8.8cm
-1Be changed to 21cm
-1, wavelength variable quantity is less than 0.02nm simultaneously.
Q modulator of the present invention also can integrate with an adjustable wavelength laser based on multiple Fabry Perot chamber, the U.S. Patent application No.10/908 of the visible J.-J.He of this laser, 362, be entitled as " Wavelength switchable semiconductor laser ".Figure 18 has described the 4th kind of execution mode of the present invention.It comprises that the gain regions 101 of 103, one resonance of modulator region of a nearly antiresonance and the channel of a resonance select zone 408.Modulator region 103 and gain regions 101 are separated by a dividing element 105 (being the deep erosion air groove of partial reflection here), and its size is quarter-wave odd-multiple basically.Channel selects zone 408 to link to each other with gain regions 101 by another dividing element 407 (being a lossy air chamber) here, and the size of air chamber just in time is the multiple of half-wavelength.Modulator region 103 is in the optics cavity of a nearly antiresonance as the execution mode of front, and the zone of gain regions 101 and channel selection simultaneously 408 is in the optics cavity of resonance and comes by the electric pump Pu is that laser produces optical gain.By the length in designing gain zone 101 and the free spectrum width that obtains thus, can make the just in time equally spaced working channel of corresponding series of discrete of its resonance wavelength.Channel selects the length and gain regions 101 length in zone 408 slightly different, make in the spectrum gain window of active waveguide material, its optics cavity has only a resonance wavelength of the optics cavity of resonance wavelength and gain regions 101 to coincide, and Laser emission will occur on this common resonance wavelength like this.These two chambeies link to each other by a dividing element 407, are one here and introduce certain coupling loss and make adjacent two resonant cavity light fields that the air groove of superimposed phase relation be arranged.During work, gain regions 101 is injected into the electric current of basic fixed, selects the electric current in zone to change and inject channel, thereby optical maser wavelength can be switched to selected by a channel in the series of discrete operation wavelength of gain regions 101 decisions.As a kind of alter mode, air groove 407 can by one shown in Figure 18 (b) coupled waveguide zone 409 substitute, the air groove 404 and 406 that size just in time equals the quarter-wave odd-multiple is used to gain regions 101, coupled waveguide zone 409 and the channel of separating adjacent and selects zone 408, wherein the optical path length in coupled waveguide zone 409 just in time equals the multiple of half-wavelength, and gain regions 101 and channel selection zone 408 can phase matched under condition of resonance like this.The waveguide of coupling regime is normally absorbefacient, to improve unimodular property.It can apply bias voltage so that adjustable loss to be provided, thereby is that adjustable wavelength laser obtains optimum single mode selectivity.
Figure 19 has shown the 5th kind of execution mode of the present invention, and wherein Q-modulator and distributed Bragg reflection optical grid (DBR) laser integrate.It comprises gain regions 101, modulator region 103 and three DBR gratings 500,505 and 510.The back reflector that it can be regarded as a traditional DBR laser has been divided into two zones (505 and 510), then a modulator region 103 is embedded between them.The length of Q-modulator waveguide makes Q-modulator chamber satisfy (1) formula by design and forms antiresonance.The DBR grating provides good wavelength selectivity for laser, the waveguide material of these DBR grating regions is preferably transparent, different with the material of gain and modulator region, this can realize by the etching regrowth techniques or such as energy gap method of adjustment after the growth of quantum well hybrid technology.Gain regions 101 and modulator region 103 respectively have an independent top electrode (being respectively 201 and 203), and shared grounding electrode 120 is deposited on the bottom.Electrode at gain regions 101 provides injection current and has produced the gain of light, be used for applying a kind of electricity at the electrode of modulator region 103 and cause method (electric current injects or reversed bias voltage) to change the absorption coefficient of waveguide, thereby change the reflectivity of back reflector (distributed Blatt reflective grating 505 and 510 just), cause modulation at last laser threshold and output energy.
Laser Modulation integrated device of the present invention has many good qualities.Because modulation function and gain regions are separated, the latter is by the constant current pumping, this has not only reduced wavelength chirp, also improved modulating speed, therefore with respect to direct modulation or external electroabsorption modulator, modulator length of the present invention is wanted much shorter, thereby the speed of littler electric capacity and Geng Gao is arranged.With respect to the electroabsorption modulator that is placed on the outgoing laser beam path, owing to use the extinction ratio of Q switching mechanism modulator of the present invention also to want high many, and do not need very long modulator length.And it also inevitably can the produce power loss unlike external electroabsorption modulator.Under the integrated situation of Q-modulator and Fabry Perot laser or wavelength-tunable multi-cavity laser, the phase change of being brought by modulator is very little, makes wavelength stability fine like this, and the pattern frequency hopping reduces, thereby has also reduced relative intensity noise.
The modulation mechanism that should be noted that device of the present invention is to form the back reflector of semiconductor laser and introduce the loss modulation therein with an antiresonance cavity configuration.Specification of the present invention for example in we mainly use electric absorption or electric current to inject mechanism as the loss modulation, but other prior art that is used for making variable optical attenuator and optical switch can be used to do same function, and this does not deviate from thought of the present invention and scope.
Can also envision many other embodiments, the single air groove of for example separating each zone can substitute with multiple air groove, and these air grooves also can be with coming filling such as silica or the such material with middle refractive index of silicon nitride.
Embodiments of the invention just are used for the present invention that explains, rather than limit the invention, and in the protection range of spirit of the present invention and claim, any modification and change to the present invention makes all fall into protection scope of the present invention.
Claims (10)
1. Q-semiconductor laser modulation, it is characterized in that comprising first optics cavity and second optics cavity, described first optics cavity is a resonant cavity that comprises gain regions, and described second optics cavity is an antiresonance chamber that comprises modulator region; Described second optics cavity is coupled by dividing element and first optics cavity of a partial reflection, and as the back reflector of laser; Thereby it is modulated and cause the modulation of described back reflector reflectivity and laser Q value to change the threshold value and the output energy of Laser emission that the absorption coefficient of described modulator region causes method by an electricity.
2. a kind of Q-semiconductor laser modulation according to claim 1 is characterized in that described dividing element is a deep erosion air groove that the limit wall is vertical.
3. a kind of Q-semiconductor laser modulation according to claim 2 is characterized in that the width dimensions of described deep erosion air groove equals quarter-wave odd-multiple.
4. a kind of Q-semiconductor laser modulation according to claim 1 is characterized in that described dividing element is a distributed Bragg grating.
5. a kind of Q-semiconductor laser modulation according to claim 1, the absorption coefficient that it is characterized in that described modulator region injects by forward biased electric current to be modulated.
6. a kind of Q-semiconductor laser modulation according to claim 1 is characterized in that the absorption coefficient of described modulator region is modulated by back-biased electric absorption effect.
7. a kind of Q-semiconductor laser modulation according to claim 1, it is characterized in that described first optics cavity comprises gain regions (101), described gain regions (101) is made up of first section fiber waveguide in top electrode that is clipped in gain regions (201) and the grounding electrode (120), and top electrode of described gain regions (201) and grounding electrode (120) are to be used in first section fiber waveguide injection current so that the pair of electrodes of the gain of light to be provided; Described modulator region (103) is made up of second section fiber waveguide in top electrode that is clipped in modulator region (103) (203) and the grounding electrode (120), the top electrode (203) of described modulator region (103) and grounding electrode (120) they are to be used to provide a signal of telecommunication modulating the optical loss of described second section fiber waveguide, thus the pair of electrodes of the threshold value of modulated laser and output energy.
8. a kind of Q-semiconductor laser modulation according to claim 7, the upper surface that the upper surface that it is characterized in that the waveguide core layer of described first section fiber waveguide comprises the waveguide core layer of distributed feedback grating or described first section fiber waveguide and second section fiber waveguide all comprises distributed feedback grating.
9. a kind of Q-semiconductor laser modulation according to claim 1, it is characterized in that described first optics cavity comprises gain regions (101) and phase place zone (102), described gain regions (101) is made up of first section fiber waveguide in top electrode that is clipped in gain regions (201) and the grounding electrode (120), the upper surface of the waveguide core layer of described first section fiber waveguide comprises a distributed feedback grating, and top electrode of described gain regions (201) and grounding electrode (120) are to be used in first section fiber waveguide injection current so that the pair of electrodes of the gain of light to be provided; Described phase place zone (102) is made up of the 3rd section fiber waveguide in top electrode that is clipped in phase place zone (102) (202) and the grounding electrode (120), and the top electrode (202) in described phase place zone (102) and grounding electrode (120) are to cause the pair of electrodes that method is regulated the effective refractive index of described the 3rd section fiber waveguide with a kind of electricity; Described modulator region (103) is made up of second section fiber waveguide in top electrode that is clipped in modulator region (103) (203) and the grounding electrode (120), the top electrode (203) of described modulator region (103) and grounding electrode (120) they are to be used to provide a signal of telecommunication modulating the optical loss of described second section fiber waveguide, thus the pair of electrodes of the threshold value of modulated laser and output energy.
10. a kind of Q-semiconductor laser modulation according to claim 9 is characterized in that described first section fiber waveguide, and the upper surface of the waveguide core layer of second section fiber waveguide and the 3rd section fiber waveguide all comprises distributed feedback grating.
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