CN1834748A - Method of mfg. color filter - Google Patents
Method of mfg. color filter Download PDFInfo
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- CN1834748A CN1834748A CN 200510033747 CN200510033747A CN1834748A CN 1834748 A CN1834748 A CN 1834748A CN 200510033747 CN200510033747 CN 200510033747 CN 200510033747 A CN200510033747 A CN 200510033747A CN 1834748 A CN1834748 A CN 1834748A
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Abstract
The invention is a method for making a color filter, comprising the steps of: forming a black matrix layer on a substrate; adopting a multihead ink jet device to colorize the black matrix layer to form a colorized layer; and forming an indium-tin oxide film on the surface of the colorized layer.
Description
[technical field]
The present invention is about a kind of manufacturing method of color filters.
[background technology]
LCD is a kind of passive type display device, for reaching the colored effect that shows, need provide a colored filter for it, its effect is that the white light that will pass through is converted into the Red Green Blue light beam, and (Thin Film Transistor, TFT) layer and other elements such as liquid crystal therebetween are to reach the effect that shows the different color image to cooperate thin film transistor (TFT).Colored filter generally places upper substrate and tin indium oxide, and (Indium Tin Oxide ITO) between the electrode, mainly comprises a black matrix and a dyed layer.
Colored filter is a most important key part and component of forming liquid crystal panel, accounts for the material cost proportion maximum of TFT-LCD panel, is about 28%, so can the cost that the manufacturing cost of colored filter is related to whole liquid crystal panel reduce.
At present, the processing procedure of making colored filter mainly contains following several method: decoration method (Dyeing), etching method (Etching), pigment dispersing method (Pigment Dispersion), electricity method, print process and dry film reprint method.
Decoration method and etching method are to be main optical filtering material with dyestuff, dyestuff has the advantage that kind is many, form and aspect are even, dyeing capacity is high, color saturation is high and penetration is high, but anti-optical activity and thermotolerance are not good, thus these two kinds of methods have gradually by with pigment by the pigment dispersing method of main filter and electricity method replaced.
The material of pigment dispersing method is the pigment photoresistor of dispersible pigment dispersion and photoresist formation that solution mixes after the grinding, and the pigment dispersing method utilizes little shadow imaging technique to reach the purpose that high resolving power and pixel freely dispose.The photostability and the thermotolerance of pigment are preferable, but its flatness and homogeneity are wayward, the production cost height.
The electricity method, be the aqueous solution of ionic resin and pigment by electrophoresis mode electricity be deposited on the substrate, surface is good, but is subject to electrode, can't freely dispose pixel.
Print process is in modes such as wire mark, lithographic plate, relief printing plate or intaglio plates with printing ink, be printed directly on the glass substrate, cost is low, but accuracy to size is poor, flatness is not good, generally the printing process that need carry out more than three times could obtain required Red Green Blue, causes the printing ink cost waste.
The dry film reprint method be will contain pigment the photoresist solution coat on plastic film, drying forms dry film, through exposure, develop, hard step such as roasting obtains monochromatic pattern.
See also Fig. 1, (a) to (h) is the TaiWan, China patent announcement the 419th of bulletin on January 21 calendar year 2001 among the figure, a kind of manufacturing method of color filters that is disclosed for No. 597, this manufacture method be the electricity method, comprise following steps: on a base material, make a black shading matrix layer in advance, as Fig. 1 (a); Coating one photoresist layer on the above-mentioned substrate that contains black shading matrix layer, utilize a light shield with pattern of pixels that this photoresist layer is carried out the contraposition exposure, make regional A, B, the C of the different exposures of corresponding three each tools of district's formation of each pixel on the photoresistance, as Fig. 1 (b); Utilize developer to remove exposure area A on this photoresist layer, up to exposing the surface 10 of this base material, as Fig. 1 (c) corresponding to this zone A; This exposed surface 10 is carried out electricity program, electricity last one be scheduled to colour-wash, as redness, form first color filter film 101, as Fig. 1 (d); Utilize developer to remove exposure area B on this photoresist layer, up to exposing the surface 11 of this base material, as Fig. 1 (e) corresponding to this area B; This exposed surface 11 is carried out electricity program, electricity last one be scheduled to colour-wash, as green, form second color filter film 111, as Fig. 1 (f); Utilize developer to remove exposure area C on this photoresist layer, up to exposing the surface 12 of this base material, as Fig. 1 (g) corresponding to this zone C; This exposed surface 12 is carried out electricity program, electricity last one be scheduled to colour-wash, as blueness, form the 3rd color filter film 121, as Fig. 1 (h).And then at its surperficial sputter one deck indium tin oxide (Indium TinOxide, ITO) film after cutting, grind, obtain colored filter.
But above-mentioned prior art manufacturing method of color filters need repeatedly repeat this electricity and program, and production efficiency is low, and need repeatedly use starting material such as developer, causes wastage of material, manufacturing cost to raise.
In view of this, the manufacturing method of color filters that provides a kind of and economize in raw materials, reduce cost, raise the efficiency is real in essential.
[summary of the invention]
Below, will a kind of manufacturing method of color filters that economizes in raw materials, reduces cost, raises the efficiency be described with some embodiment.
For realizing foregoing, a kind of manufacturing method of color filters is provided, it may further comprise the steps: form a black matrix layer on a substrate; It is painted to adopt a bull ink-jet apparatus that this black matrix layer is carried out, and forms dyed layer; Form one deck indium tin oxide film on this dyed layer surface.
Further, this black matrix layer adopts nano impression or hot forming processing procedure to be made.
Must print compared to offset printing method of the prior art and could obtain Red Green Blue more than three times, it is painted that the present invention adopts the bull ink-jet apparatus to carry out, and only need once drip China ink can obtain, and can save 2/3rds black cost.Compared to electricity of the prior art method must repeatedly use starting material such as developer and need repeatedly repeat electricity program, manufacturing method of color filters of the present invention adopts nano impression or the black matrix of hot forming fabrication techniques, but quick copy is deceived matrix, economize in raw materials, its efficient improves greatly and cost of manufacture reduces.Therefore, manufacturing method of color filters of the present invention can economize in raw materials, reduces cost, raise the efficiency.
[description of drawings]
Fig. 1 is a prior art manufacturing method of color filters synoptic diagram.
Fig. 2 is the making principle schematic of the black matrix layer of manufacturing method of color filters first embodiment of the present invention.
Fig. 3 is the schematic top plan view of the black matrix layer structure of manufacturing method of color filters first embodiment of the present invention.
Fig. 4 is the structural representation of the used bull ink-jet apparatus of manufacturing method of color filters first embodiment of the present invention.
Fig. 5 is the structural representation of the dyed layer of manufacturing method of color filters first embodiment formation of the present invention.
Fig. 6 is the structural representation of the colored filter of manufacturing method of color filters first embodiment formation of the present invention.
Fig. 7 is that the black matrix of manufacturing method of color filters second embodiment of the present invention is made synoptic diagram.
Fig. 8 is that the black matrix of manufacturing method of color filters the 3rd embodiment of the present invention is made synoptic diagram.
[embodiment]
Above-mentioned manufacturing method of color filters is described in detail as follows:
Seeing also Fig. 2, is the making principle schematic of the black matrix layer 240 of first embodiment of the invention.The making that should deceive matrix layer 240 is to adopt nanometer embossing (nano-imprinting technology) or hot forming technology (hot embossingtechnology) to be made.Shown in Fig. 2 (a), one substrate 210 at first is provided, its material can be glass, also can be polymethylmethacrylate (polymethylmethacrylate, PMMA) or polycarbonate (polycarbonate, plastic cement such as PC), in addition, any high transparent material all can be used as the substrate of present embodiment.Clean this substrate 210, remove the inorganic or organic substance on its surface; On this substrate 210, revolve equably and cover (spin coating) photoresist layer 220, also can adopt even coating (uniform coat), precoating (pre-coat) and chemical vapour deposition technique modes such as (CVD), the material of this photoresist layer 220 is a thermoplastic macromolecule material, as polymethylmethacrylate (PMMA).
Provide one with the corresponding die 230 of required black matrix shape (mold), or pressing mold (stamper), this die or press mold can be nickel-phosphorus alloy (NiP), wherein the content of phosphorus is between 5%～15%.The present invention adopts die 230, and it has long serviceable life and good fracture toughness, can use under the elevated pressures of mold pressing processing.The nanostructured of this die 230 adopts LIGA, and (German Lithograph Galvanformung undAbformug writes a Chinese character in simplified form, being the eighties is utilized X-ray lithography, electroforming and injection moulding after mid-term technology) processing procedure, the little shadow of electron beam are directly write, the little shadow of X-ray or ion photolithographic techniques etc. are made, the nickel layer thickness of this die 230 is 500 μ m～2mm, defectives such as surperficial free of pinholes.
Shown in Fig. 2 (b), temperature is increased to more than the glass transition temperature (Tg), impress or the hot pressing processing procedure, the photoresist layer 220 that makes this thermoplastic macromolecule material constitute is shaped with die 230 surface structures, then exposes to the sun according to making the structure curing molding with ultraviolet light.
Shown in Fig. 2 (c), die 230 is removed, carry out demoulding program.
Shown in Fig. 2 (d), remove the glimmer resistance layer 2201 of the remnants shown in Fig. 2 (c) with the dry ecthing agent, and then with the pattern transfer on the die 230 to substrate 210, this etch process adopts reactive ion etch, and (reactive ion etching, RIE) mode is carried out.
So, forming a black matrix layer 240 on these substrate 210 surfaces, as shown in Figure 3, is the schematic top plan view of black matrix layer 240 structures.
(Multi-Head Ink-Jet Array MHIJA) carries out painted to black matrix layer 240 with bull ink-jet apparatus 300.Seeing also Fig. 4, is that the present embodiment colored filter is made used bull ink-jet apparatus 300 structural representations.This bull ink-jet apparatus 300 has a plurality of print cartridges 310, heater coil 320, (Charge Coupled Device, CCD) 330 and one is positioned at bull ink-jet apparatus 300 micro controller 340 inner and that be connected with the reaction control loop to high-resolution charge-coupled device (CCD).This first print cartridge 311 is equipped with that redness (Red) China ink, second print cartridge 312 are equipped with green (Green) China ink, the 3rd print cartridge 313 is equipped with blueness (Blue) China ink, each print cartridge 310 end has a nozzle 350 respectively, first print cartridge, 311 corresponding first nozzles 351, second print cartridge, 312 corresponding second nozzles 352, the 3rd print cartridge 313 corresponding the 3rd nozzles 353, red, green, blue look China ink drips respectively.Each nozzle 350 is aimed at a sub-pixel 241 of black matrix layer 240 respectively.This heater coil 320 is around in the periphery of each print cartridge 310 respectively, is used to control the formation of ink droplet.Whether this micro controller 340 is in order to control each heater coil work.During heater coil 320 work, this ink droplet is dripped by nozzle 350 places of each print cartridge 310, just in time splash into black matrix layer 240 each sub-pixel 241 corresponding with it, thereby on black matrix layer 240, form dyed layer 250 with Red Green Blue, seeing also Fig. 5, is the structural representation of dyed layer 250 of the present invention.
This charge-coupled device (CCD) 330 shows in order to the high resolution graphic of realizing each R, G, B sub-pixel 241.This bull ink-jet apparatus 300 has the accurate positioning control of three-dimensional, and each nozzle 350 moves to the precision of specifying sub-pixel 241 positions and is ± 0.5mm.
Formed dyed layer 250 is carried out preliminary drying, after making its drying, form one deck indium tin oxide (Indium Tin Oxide on its surface again, ITO) film 260, after cutting, grind, obtain colored filter 200, wherein indium tin oxide film 260 can adopt sputter (sputtering), spin coating (spin coating), chemical vapour deposition technique (CVD) etc. to be made.See also Fig. 6, be the structural representation of present embodiment colored filter 200, when white light passes this colored filter 200, because of substrate 210 and ITO film 260 are transparent material, after the effect by dyed layer 250, be convertible into the colored display light that comprises Red Green Blue.
Fig. 7 is that the black matrix layer of second embodiment of the invention is made synoptic diagram.Itself and the first embodiment difference are the method for making of black matrix layer.This die 400 is a roller shape, and a plurality of equally distributed sawtooth 401 are arranged on it, and it rolls across on photoresist layer 420, promptly forms black matrix layer 410.
Fig. 8 is that the black matrix layer of third embodiment of the invention is made synoptic diagram.Itself and the first embodiment difference still are the method for making of black matrix layer.This die 500 has and required black matrix shape respective saw teeth 501, and a ganoid roller 510 is set on it, and this roller 510 forms black matrix layer (figure does not show) from these die 500 surface pressure mistakes on photoresist layer 520.
Must print compared to offset printing method of the prior art and could obtain Red Green Blue more than three times, it is painted that the present invention adopts the bull ink-jet apparatus to carry out, and only need once drip China ink can obtain, and can save 2/3rds black cost.
Compared to electricity of the prior art method must repeatedly use starting material such as developer and need repeatedly repeat electricity program, manufacturing method of color filters of the present invention adopts nano impression or the black matrix of hot forming fabrication techniques, but quick copy is deceived matrix, economize in raw materials, its efficient improves greatly and cost of manufacture reduces.
Therefore, manufacturing method of color filters of the present invention can economize in raw materials, reduces cost, raise the efficiency.
Claims (20)
1. manufacturing method of color filters, it may further comprise the steps:
On a substrate, form a black matrix layer;
It is painted to adopt a bull ink-jet apparatus that this black matrix layer is carried out, and forms dyed layer;
Form one deck indium tin oxide film on this dyed layer surface.
2. manufacturing method of color filters as claimed in claim 1 is characterized in that: this black matrix layer adopts nano impression or hot forming processing procedure to be made.
3. manufacturing method of color filters as claimed in claim 1 is characterized in that: the manufacturing of this black matrix layer comprises the steps:
One substrate is provided;
One photoresist layer is set on this substrate;
The die of one reservation shape is provided;
Impress or hot pressing;
The demoulding;
Etching.
4. manufacturing method of color filters as claimed in claim 3 is characterized in that: this substrate is glass substrate, plastic substrate or other transparency carrier.
5. manufacturing method of color filters as claimed in claim 4 is characterized in that: this plastic substrate is polymethylmethacrylate or polycarbonate.
6. manufacturing method of color filters as claimed in claim 3 is characterized in that: this die is a tabular, has and the opposite pattern of required black matrix shape.
7. manufacturing method of color filters as claimed in claim 6 is characterized in that: this impression adopts dull and stereotyped evenly impression to form.
8. manufacturing method of color filters as claimed in claim 6 is characterized in that: this impression is the roller that a surface smoothing is set on die, and rolling to impress through this roller forms.
9. manufacturing method of color filters as claimed in claim 3 is characterized in that: this die is the roller shape, has equally distributed sawtooth on it.
10. manufacturing method of color filters as claimed in claim 9 is characterized in that: this impression is to roll on photoresist layer by this die to finish.
11. manufacturing method of color filters as claimed in claim 3 is characterized in that: this photoresist layer adopt revolve cover, modes such as coating, precoating or chemical vapor deposition are made.
12. manufacturing method of color filters as claimed in claim 3 is characterized in that: this die is a nickel-phosphorus alloy, and its phosphorus content is 5%～15%.
13. manufacturing method of color filters as claimed in claim 3 is characterized in that: this die adopts that LIGA processing procedure, the little shadow of electron beam are directly write, the little shadow of X-ray or ion photolithographic techniques etc. are made.
14. manufacturing method of color filters as claimed in claim 3 is characterized in that: reactive ion etching is adopted in this etching.
15. manufacturing method of color filters as claimed in claim 1 is characterized in that: this indium tin oxide film is to adopt sputter, spin coating, chemical vapour deposition technique to be made.
16. manufacturing method of color filters as claimed in claim 1 is characterized in that: can carry out preliminary drying to this dyed layer after forming dyed layer.
17. manufacturing method of color filters as claimed in claim 1 is characterized in that: this bull ink-jet apparatus comprises:
A plurality of print cartridges are equipped with the China ink of red, green, blue look respectively;
Heater coil, this heater coil is around in the print cartridge periphery;
Charge-coupled device (CCD) shows in order to realize high resolution graphic; And
Whether micro controller is in order to control each heater coil work.
18. manufacturing method of color filters as claimed in claim 17 is characterized in that: the nozzle that this print cartridge respectively has an ink supply to drip.
19. manufacturing method of color filters as claimed in claim 18 is characterized in that: a sub-pixel of the corresponding black matrix layer of this each nozzle.
20. manufacturing method of color filters as claimed in claim 17 is characterized in that: this nozzle moves to the precision of specifying sub-pixel position and is ± 0.5mm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2005100337478A CN100529875C (en) | 2005-03-19 | 2005-03-19 | Method of manufacturing color filter |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2005100337478A CN100529875C (en) | 2005-03-19 | 2005-03-19 | Method of manufacturing color filter |
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| Publication Number | Publication Date |
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| CN1834748A true CN1834748A (en) | 2006-09-20 |
| CN100529875C CN100529875C (en) | 2009-08-19 |
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| Application Number | Title | Priority Date | Filing Date |
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| CNB2005100337478A Expired - Fee Related CN100529875C (en) | 2005-03-19 | 2005-03-19 | Method of manufacturing color filter |
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101191857B (en) * | 2006-11-27 | 2010-04-21 | Icf科技有限公司 | Film pattern layer and its making method thereof |
| CN101178455B (en) * | 2006-11-06 | 2010-06-16 | 鸿富锦精密工业（深圳）有限公司 | Thin film pattern layer and manufacturing method therefor |
| CN102164733A (en) * | 2008-09-25 | 2011-08-24 | 国立大学法人东京工业大学 | Mold for nanoimprint |
| WO2013166752A1 (en) * | 2012-05-11 | 2013-11-14 | 深圳市华星光电技术有限公司 | Color filter and manufacturing method thereof |
| CN104890426A (en) * | 2015-06-29 | 2015-09-09 | 福建省诺希科技园发展有限公司 | Manufacturing method of embossed glass and product of manufacturing method |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5514503A (en) * | 1994-10-17 | 1996-05-07 | Corning Incorporated | Apparatus and method for printing a color filter |
| KR100261961B1 (en) * | 1996-02-16 | 2000-07-15 | 미다라이 후지오 | Color filter manufacturing method and apparatus, color filter, display device, apparatus having display device, and printing method |
-
2005
- 2005-03-19 CN CNB2005100337478A patent/CN100529875C/en not_active Expired - Fee Related
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101178455B (en) * | 2006-11-06 | 2010-06-16 | 鸿富锦精密工业（深圳）有限公司 | Thin film pattern layer and manufacturing method therefor |
| CN101191857B (en) * | 2006-11-27 | 2010-04-21 | Icf科技有限公司 | Film pattern layer and its making method thereof |
| CN102164733A (en) * | 2008-09-25 | 2011-08-24 | 国立大学法人东京工业大学 | Mold for nanoimprint |
| CN102164733B (en) * | 2008-09-25 | 2015-03-11 | 国立大学法人东京工业大学 | Mold for nanoimprint |
| WO2013166752A1 (en) * | 2012-05-11 | 2013-11-14 | 深圳市华星光电技术有限公司 | Color filter and manufacturing method thereof |
| CN104890426A (en) * | 2015-06-29 | 2015-09-09 | 福建省诺希科技园发展有限公司 | Manufacturing method of embossed glass and product of manufacturing method |
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| Publication number | Publication date |
|---|---|
| CN100529875C (en) | 2009-08-19 |
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