CN1830627A - 水基抛光垫及其制造方法 - Google Patents

水基抛光垫及其制造方法 Download PDF

Info

Publication number
CN1830627A
CN1830627A CNA2006100595578A CN200610059557A CN1830627A CN 1830627 A CN1830627 A CN 1830627A CN A2006100595578 A CNA2006100595578 A CN A2006100595578A CN 200610059557 A CN200610059557 A CN 200610059557A CN 1830627 A CN1830627 A CN 1830627A
Authority
CN
China
Prior art keywords
polishing pad
polishing
water
polymer matrix
dispersion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CNA2006100595578A
Other languages
English (en)
Chinese (zh)
Inventor
C·H·杜翁
D·B·詹姆斯
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ROHM AND HAAS ELECTRONIC MATER
Original Assignee
ROHM AND HAAS ELECTRONIC MATER
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ROHM AND HAAS ELECTRONIC MATER filed Critical ROHM AND HAAS ELECTRONIC MATER
Publication of CN1830627A publication Critical patent/CN1830627A/zh
Pending legal-status Critical Current

Links

Images

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/11—Lapping tools
    • B24B37/20—Lapping pads for working plane surfaces
    • B24B37/24—Lapping pads for working plane surfaces characterised by the composition or properties of the pad materials
    • A—HUMAN NECESSITIES
    • A01—AGRICULTURE; FORESTRY; ANIMAL HUSBANDRY; HUNTING; TRAPPING; FISHING
    • A01K—ANIMAL HUSBANDRY; AVICULTURE; APICULTURE; PISCICULTURE; FISHING; REARING OR BREEDING ANIMALS, NOT OTHERWISE PROVIDED FOR; NEW BREEDS OF ANIMALS
    • A01K47/00—Beehives
    • A01K47/02—Construction or arrangement of frames for honeycombs
    • A—HUMAN NECESSITIES
    • A01—AGRICULTURE; FORESTRY; ANIMAL HUSBANDRY; HUNTING; TRAPPING; FISHING
    • A01K—ANIMAL HUSBANDRY; AVICULTURE; APICULTURE; PISCICULTURE; FISHING; REARING OR BREEDING ANIMALS, NOT OTHERWISE PROVIDED FOR; NEW BREEDS OF ANIMALS
    • A01K47/00—Beehives
    • A01K47/04—Artificial honeycombs
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D11/00—Constructional features of flexible abrasive materials; Special features in the manufacture of such materials
    • B24D11/001—Manufacture of flexible abrasive materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D3/00—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents
    • B24D3/02—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent
    • B24D3/20—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent and being essentially organic
    • B24D3/28—Resins or natural or synthetic macromolecular compounds
    • B24D3/32—Resins or natural or synthetic macromolecular compounds for porous or cellular structure
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C39/00—Shaping by casting, i.e. introducing the moulding material into a mould or between confining surfaces without significant moulding pressure; Apparatus therefor
    • B29C39/14—Shaping by casting, i.e. introducing the moulding material into a mould or between confining surfaces without significant moulding pressure; Apparatus therefor for making articles of indefinite length
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C39/00—Shaping by casting, i.e. introducing the moulding material into a mould or between confining surfaces without significant moulding pressure; Apparatus therefor
    • B29C39/14—Shaping by casting, i.e. introducing the moulding material into a mould or between confining surfaces without significant moulding pressure; Apparatus therefor for making articles of indefinite length
    • B29C39/18—Shaping by casting, i.e. introducing the moulding material into a mould or between confining surfaces without significant moulding pressure; Apparatus therefor for making articles of indefinite length incorporating preformed parts or layers, e.g. casting around inserts or for coating articles

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Environmental Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Animal Husbandry (AREA)
  • Biodiversity & Conservation Biology (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
CNA2006100595578A 2005-03-08 2006-03-06 水基抛光垫及其制造方法 Pending CN1830627A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US65983305P 2005-03-08 2005-03-08
US60/659,833 2005-03-08

Publications (1)

Publication Number Publication Date
CN1830627A true CN1830627A (zh) 2006-09-13

Family

ID=36928528

Family Applications (1)

Application Number Title Priority Date Filing Date
CNA2006100595578A Pending CN1830627A (zh) 2005-03-08 2006-03-06 水基抛光垫及其制造方法

Country Status (7)

Country Link
US (1) US20060202384A1 (enExample)
JP (1) JP2006253691A (enExample)
KR (1) KR20060099398A (enExample)
CN (1) CN1830627A (enExample)
DE (1) DE102006010503A1 (enExample)
FR (1) FR2882952A1 (enExample)
TW (1) TW200635703A (enExample)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100506487C (zh) * 2007-06-29 2009-07-01 南京航空航天大学 具有自修正功能的固结磨料研磨抛光垫及制备方法
CN101850539A (zh) * 2009-03-06 2010-10-06 株式会社Lg化学 用于玻璃抛光系统的下部件和使用该下部件的玻璃抛光方法
CN101616773B (zh) * 2007-03-27 2011-09-14 东洋橡胶工业株式会社 聚氨酯发泡体的制造方法
CN103072099A (zh) * 2011-09-29 2013-05-01 罗门哈斯电子材料Cmp控股股份有限公司 丙烯酸酯聚氨酯化学机械抛光层
CN107350978A (zh) * 2017-07-26 2017-11-17 天津市职业大学 一种绿色固定磨料抛光片及其制备方法
CN111482892A (zh) * 2019-01-29 2020-08-04 三星电子株式会社 循环使用的抛光垫
CN114574107A (zh) * 2022-03-18 2022-06-03 北京通美晶体技术股份有限公司 一种研磨抛光液的清洗剂及其制备方法
CN115431175A (zh) * 2022-09-16 2022-12-06 湖北鼎汇微电子材料有限公司 一种自修整抛光垫及其制备方法和应用

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200720017A (en) 2005-09-19 2007-06-01 Rohm & Haas Elect Mat Water-based polishing pads having improved adhesion properties and methods of manufacture
US20080063856A1 (en) * 2006-09-11 2008-03-13 Duong Chau H Water-based polishing pads having improved contact area
US20100112919A1 (en) * 2008-11-03 2010-05-06 Applied Materials, Inc. Monolithic linear polishing sheet
US20110287698A1 (en) * 2010-05-18 2011-11-24 Hitachi Global Storage Technologies Netherlands B.V. System, method and apparatus for elastomer pad for fabricating magnetic recording disks
JP5844189B2 (ja) * 2012-03-26 2016-01-13 富士紡ホールディングス株式会社 研磨パッド及び研磨パッドの製造方法
US10449710B2 (en) 2017-02-17 2019-10-22 Thermwood Corporation Methods and apparatus for compressing material during additive manufacturing
US11667061B2 (en) * 2020-04-18 2023-06-06 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Method of forming leveraged poromeric polishing pad

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
MY114512A (en) * 1992-08-19 2002-11-30 Rodel Inc Polymeric substrate with polymeric microelements
US6099394A (en) * 1998-02-10 2000-08-08 Rodel Holdings, Inc. Polishing system having a multi-phase polishing substrate and methods relating thereto
US6069080A (en) * 1992-08-19 2000-05-30 Rodel Holdings, Inc. Fixed abrasive polishing system for the manufacture of semiconductor devices, memory disks and the like
US6099954A (en) * 1995-04-24 2000-08-08 Rodel Holdings, Inc. Polishing material and method of polishing a surface
WO1999065677A1 (en) * 1998-06-17 1999-12-23 Milliken & Company Polyurethane/polyacrylate dispersion coating for airbag fabrics
EP1161322A4 (en) * 1999-01-21 2003-09-24 Rodel Inc IMPROVED POLISHING CUSHIONS AND RELATED METHODS
JP4450337B2 (ja) * 1999-02-22 2010-04-14 大日本印刷株式会社 化粧シート
EP1268134A1 (en) * 1999-12-14 2003-01-02 Rodel Holdings, Inc. Method of manufacturing a polymer or polymer composite polishing pad
US20020098789A1 (en) * 2001-01-19 2002-07-25 Peter A. Burke Polishing pad and methods for improved pad surface and pad interior characteristics
US7066801B2 (en) * 2003-02-21 2006-06-27 Dow Global Technologies, Inc. Method of manufacturing a fixed abrasive material
US6910951B2 (en) * 2003-02-24 2005-06-28 Dow Global Technologies, Inc. Materials and methods for chemical-mechanical planarization
US6918821B2 (en) * 2003-11-12 2005-07-19 Dow Global Technologies, Inc. Materials and methods for low pressure chemical-mechanical planarization
US20050171224A1 (en) * 2004-02-03 2005-08-04 Kulp Mary J. Polyurethane polishing pad

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101616773B (zh) * 2007-03-27 2011-09-14 东洋橡胶工业株式会社 聚氨酯发泡体的制造方法
CN100506487C (zh) * 2007-06-29 2009-07-01 南京航空航天大学 具有自修正功能的固结磨料研磨抛光垫及制备方法
CN101850539A (zh) * 2009-03-06 2010-10-06 株式会社Lg化学 用于玻璃抛光系统的下部件和使用该下部件的玻璃抛光方法
CN101850539B (zh) * 2009-03-06 2014-10-01 株式会社Lg化学 用于玻璃抛光系统的下部件和使用该下部件的玻璃抛光方法
CN103072099A (zh) * 2011-09-29 2013-05-01 罗门哈斯电子材料Cmp控股股份有限公司 丙烯酸酯聚氨酯化学机械抛光层
CN103072099B (zh) * 2011-09-29 2015-06-17 罗门哈斯电子材料Cmp控股股份有限公司 丙烯酸酯聚氨酯化学机械抛光层
CN107350978A (zh) * 2017-07-26 2017-11-17 天津市职业大学 一种绿色固定磨料抛光片及其制备方法
CN111482892A (zh) * 2019-01-29 2020-08-04 三星电子株式会社 循环使用的抛光垫
CN114574107A (zh) * 2022-03-18 2022-06-03 北京通美晶体技术股份有限公司 一种研磨抛光液的清洗剂及其制备方法
CN115431175A (zh) * 2022-09-16 2022-12-06 湖北鼎汇微电子材料有限公司 一种自修整抛光垫及其制备方法和应用
CN115431175B (zh) * 2022-09-16 2024-03-22 湖北鼎汇微电子材料有限公司 一种自修整抛光垫及其制备方法和应用

Also Published As

Publication number Publication date
FR2882952A1 (fr) 2006-09-15
US20060202384A1 (en) 2006-09-14
KR20060099398A (ko) 2006-09-19
TW200635703A (en) 2006-10-16
DE102006010503A1 (de) 2006-09-21
JP2006253691A (ja) 2006-09-21

Similar Documents

Publication Publication Date Title
US8272922B2 (en) Method of polishing a substrate
CN1830627A (zh) 水基抛光垫及其制造方法
US10086500B2 (en) Method of manufacturing a UV curable CMP polishing pad
JP4344083B2 (ja) ウエハ表面改質用にフルオロケミカル剤を含有する研磨物品
CN1986162A (zh) 改进缺陷度的多层抛光垫及其制造方法
KR20010076351A (ko) 기판 연마 장치
JP5501722B2 (ja) 研磨パッドおよび研磨パッドの製造方法
CN1265618A (zh) 改进的抛光垫及其相关的方法
US20020197946A1 (en) Multi-phase polishing pad
JP2006253691A5 (enExample)
TW200534960A (en) Polishing pad and method of making same
CN109475995B (zh) 研磨体及其制造方法
US20080063856A1 (en) Water-based polishing pads having improved contact area
CN107877360A (zh) 具有一致的垫表面微纹理的化学机械抛光垫
TWI516340B (zh) 用於化學機械平坦化之拋光墊及／或其他拋光方法
CN1814410A (zh) 研磨片材及其制造方法与抛光装置
KR20010055971A (ko) 연마 패드
JP2011036979A (ja) 研磨パッド
JP7644642B2 (ja) 研磨パッド及び研磨パッドの製造方法
JP2020157429A (ja) 研磨パッド
KR20110009988A (ko) 무방향성이고, 불균일한 표면 거칠기를 갖는 연마패드, 그 연마패드 제조방법 및 제조장치
WO2025025746A1 (zh) 多层材料及其使用的研磨材料和应用
KR101666477B1 (ko) 폴리우레탄 지지 패드의 제조 방법 및 폴리우레탄 지지 패드
KR20250066273A (ko) 슬러리 유동성이 개선된 연마패드 및 이를 이용한 반도체 소자의 제조방법
TW201506140A (zh) 化學機械硏磨墊及使用其之化學機械硏磨方法

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C02 Deemed withdrawal of patent application after publication (patent law 2001)
WD01 Invention patent application deemed withdrawn after publication

Open date: 20060913