CN1818148A - Combined anode for trivalent chromium plating technology - Google Patents
Combined anode for trivalent chromium plating technology Download PDFInfo
- Publication number
- CN1818148A CN1818148A CN 200610037775 CN200610037775A CN1818148A CN 1818148 A CN1818148 A CN 1818148A CN 200610037775 CN200610037775 CN 200610037775 CN 200610037775 A CN200610037775 A CN 200610037775A CN 1818148 A CN1818148 A CN 1818148A
- Authority
- CN
- China
- Prior art keywords
- anode
- trivalent chromium
- chromium plating
- plating technology
- coating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Electrodes For Compound Or Non-Metal Manufacture (AREA)
Abstract
The combination anode for the trivalent chromium-plating process is made up of the titanium plate or the titanium net, the basal body coat, the organic anion membrane isolating cover out of the insoluble anode. So the combination anode can inhibit the Cr3+ oxidizing to Cr6+. So the process has the low cost and high operability.
Description
Technical field
The present invention relates to electroplate and use anode, refer in particular to a kind of combined anode that is applied to use in the trivalent chromium plating technology.
Background technology
Electrodeposited chromium is divided into sexavalent chrome and trivalent chromium chrome plating, and sexavalent chrome is a technology generally commonly used at present, but hexavalent chromium is strong carcinogens, and toxicity is very big, and it is serious to electroplate the waste gas and the waste water environmental pollution that produce; Though trivalent chromic ion plating toxicity is low, harm and pollution to environment only are 1% of hexavalent chromium, but existing trivalent chromium plating technology and material price are very expensive, operation is extremely complicated, generally do not promote in the world yet, application cost is low, the key that workable trivalent chromium depositing process technology is difficult to break through is, trivalent chromic ion in the trivalent chromium bath, when energising, be easy to trivalent chromic ion is oxidized to hexavalent chromium because of anodic reaction, and the existence of 5/10000ths hexavalent chromium in the plating bath, chromium plating liquid " is poisoned ", and chrome-plated process just can't carry out, and solves with chemical process, high material consumption not only, expense is big, and processing condition are also very harsh, and the utmost point is not easy to operate.
Summary of the invention
The present invention is just in order to overcome above-mentioned deficiency, a kind of combined anode is provided, stop the anodic oxidation reactions of trivalent chromic ion, avoided the chromium plating liquid of trivalent chromic ion " to be poisoned " fully by hexavalent chromium, the main improvement is insoluble anode and the organic anion film spacer sleeve combination of combined anode by titanium base ruthenium coating, insoluble anode is under the effect of organic anion film spacer sleeve, separate fully with trivalent chromic ion and don't influence electroplating effect, in addition, in titanium base ruthenium coating anodic coating, use rare earth element, improve the anode conductance rate, reduce current density, improve current efficiency, guarantee normally carrying out of trivalent chromium plating technology more.Specifically implement like this: combined anode for trivalent chromium plating technology, comprise as the titanium plate of anode substrate or titanium net, basal body coating layer, it is characterized in that the insoluble anode of titanium base ruthenium coating is equipped with an organic anion film spacer sleeve outward.By this organic anion film spacer sleeve, in the trivalent chromium coating bath, the plating bath that can make conductive anode and contain trivalent chromic ion separates fully and does not influence passing of electric current power line, thereby avoids trivalent chromium to be oxidized to sexavalent chrome.
In order to improve the anode conductance rate, reduce current density, improve current efficiency, guarantee normally carrying out of trivalent chromium plating technology, the insoluble anode that the present invention is used is added with the rare-earth chlorination cerium in its coating, and coating component and weight proportion on the anode substrate are:
Cerium II Chloride 20-35%
Ruthenium chloride 50-65%
Iridium chloride 10-25%
Tantalum chloride 5-15%
The making method of this insoluble anode is: the each component of coating is dissolved in the ethanol, coating component and alcoholic acid weight ratio are 1: 1.5-2.5, the furnishing pulpous state, brushing is on anode substrate, in process furnace behind the preliminary drying in 450 ℃ of-500 ℃ of calcination, the cooling, brushing again, preliminary drying, calcination, cooling, the several times that circulate repeatedly are at last in stove more than calcining half an hour.
Generally, preliminary drying, calcination time are without particular limitation, from production cycle and cost consideration, the preliminary drying time was generally 8-15 minute in the process furnace, the calcination time is 5-30 minute, and cycle index is 10-20 time, and last calcination time in stove is 30-60 minute.
The present invention is by this combined anode, can suppress the phenomenon that trivalent chromic ion in the trivalent chromium bath is oxidized to hexavalent chromium produces, having overcome the trivalent chromium bath anode " is poisoned " by hexavalent chromium, thereby the trivalent chromium chrome plating process stabilizing is carried out smoothly, and the technology cost is low, workable, environmental pollution significantly reduces, and can generally promote.
Embodiment
Embodiment 1, and combined anode for trivalent chromium plating technology is equipped with an organic anion film spacer sleeve outside the insoluble anode of titanium base ruthenium coating, and the insoluble anode matrix of titanium base ruthenium coating is titanium plate or titanium net.
Embodiment 2, reference example 1, and the insoluble anode matrix of titanium base ruthenium coating is titanium net or titanium net, is added with the rare-earth chlorination cerium in the coating on it, the component of this coating and weight proportion are:
Cerium II Chloride 25%
Ruthenium chloride 60%
Iridium chloride 10%
Tantalum chloride 5%
The making method of this insoluble anode is: it is (coating wt: ethanol weight) in 1: 2 the ethanol that the each component of coating is dissolved in weight ratio, the furnishing pulpous state, brushing is on anode substrate, in process furnace preliminary drying after 10 minutes in 450 ℃ of-500 ℃ of calcination 10 minutes, cooling, brushing again, preliminary drying, calcination, cooling circulate 15 times repeatedly, calcine 1 hour in stove at last.
Embodiment 3, reference example 2, and the component of coating and weight proportion are:
Cerium II Chloride 20%
Ruthenium chloride 65%
Iridium chloride 10%
Tantalum chloride 5%
Making method is with embodiment 2, wherein the making method floating coat component weight of insoluble anode and ethanol weight ratio are 1: 1.5-2.5, and the preliminary drying time is controlled to be 8-15 minute, and the calcination time is controlled to be 5-30 minute, cycle index is 10-20 time, and last calcination time in stove is 30-60 minute.
Embodiment 4, reference example 2, and the component of coating and weight proportion are:
Cerium II Chloride 35%
Ruthenium chloride 50%
Iridium chloride 10%
Tantalum chloride 5%
Making method is with embodiment 3.
Embodiment 5, reference example 2, and the component of coating and weight proportion are:
Cerium II Chloride 20%
Ruthenium chloride 50%
Iridium chloride 25%
Tantalum chloride 5%
Making method is with embodiment 3.
Embodiment 6, reference example 2, and the component of coating and weight proportion are:
Cerium II Chloride 20%
Ruthenium chloride 50%
Iridium chloride 15%
Tantalum chloride 15%
Making method is with embodiment 3.
Claims (7)
1. combined anode for trivalent chromium plating technology comprises as the titanium plate of anode substrate or titanium net, basal body coating layer, it is characterized in that the insoluble anode of titanium base ruthenium coating is equipped with an organic anion film spacer sleeve outward.
2. combined anode for trivalent chromium plating technology according to claim 1 is characterized in that being added with the rare-earth chlorination cerium in the coating of insoluble anode, and coating component and weight proportion on the anode substrate are:
Cerium II Chloride 20-35%
Ruthenium chloride 50-65%
Iridium chloride 10-25%
Tantalum chloride 5-15%.
3. combined anode for trivalent chromium plating technology according to claim 2, the making method that it is characterized in that insoluble anode is that the each component with coating is dissolved in the ethanol, coating component and alcoholic acid weight ratio are 1: 1.5-2.5, the furnishing pulpous state is brushed on anode substrate, in process furnace behind the preliminary drying in 450 ℃ of-500 ℃ of calcination, cooling, brushing again, preliminary drying, calcination, cooling, the several times that circulate are repeatedly calcined more than half an hour in stove at last.
4. combined anode for trivalent chromium plating technology according to claim 3 is characterized in that the preliminary drying time is 8-15 minute in the insoluble anode making method.
5. combined anode for trivalent chromium plating technology according to claim 3 is characterized in that the calcination time is 5-30 minute in the insoluble anode making method.
6. combined anode for trivalent chromium plating technology according to claim 3 is characterized in that cycle index is 10-20 time in the insoluble anode making method.
7. combined anode for trivalent chromium plating technology according to claim 3 is characterized in that last calcination time in stove is 30-60 minute in the insoluble anode making method.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200610037775 CN1818148A (en) | 2006-01-13 | 2006-01-13 | Combined anode for trivalent chromium plating technology |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200610037775 CN1818148A (en) | 2006-01-13 | 2006-01-13 | Combined anode for trivalent chromium plating technology |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN1818148A true CN1818148A (en) | 2006-08-16 |
Family
ID=36918336
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 200610037775 Pending CN1818148A (en) | 2006-01-13 | 2006-01-13 | Combined anode for trivalent chromium plating technology |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN1818148A (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101280453B (en) * | 2008-01-31 | 2010-06-09 | 顿力集团有限公司 | Preparation of anode with trivalent chromium chrome plating coating |
| CN102400203A (en) * | 2011-11-09 | 2012-04-04 | 广东达志环保科技股份有限公司 | Chromium plating anode of trivalent chromium chloride system |
| CN102719859A (en) * | 2012-07-07 | 2012-10-10 | 西安泰金工业电化学技术有限公司 | Titanium mesh anode for electrodeposited nickel and preparing method thereof |
| CN104562162A (en) * | 2013-10-21 | 2015-04-29 | 欣兴电子股份有限公司 | Diaphragm device |
| CN106319577A (en) * | 2015-07-02 | 2017-01-11 | 阿克陶科邦锰业制造有限公司 | Energy-saving and environment-friendly anode plate |
| CN113957493A (en) * | 2021-10-19 | 2022-01-21 | 安徽华威铜箔科技有限公司 | Preparation method of 3-micron electrolytic copper foil anode coating, product and application thereof |
-
2006
- 2006-01-13 CN CN 200610037775 patent/CN1818148A/en active Pending
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101280453B (en) * | 2008-01-31 | 2010-06-09 | 顿力集团有限公司 | Preparation of anode with trivalent chromium chrome plating coating |
| CN102400203A (en) * | 2011-11-09 | 2012-04-04 | 广东达志环保科技股份有限公司 | Chromium plating anode of trivalent chromium chloride system |
| CN102400203B (en) * | 2011-11-09 | 2014-06-18 | 广东达志环保科技股份有限公司 | Chromium plating anode of trivalent chromium chloride system |
| CN102719859A (en) * | 2012-07-07 | 2012-10-10 | 西安泰金工业电化学技术有限公司 | Titanium mesh anode for electrodeposited nickel and preparing method thereof |
| CN104562162A (en) * | 2013-10-21 | 2015-04-29 | 欣兴电子股份有限公司 | Diaphragm device |
| CN104562162B (en) * | 2013-10-21 | 2018-03-23 | 欣兴电子股份有限公司 | Diaphragm apparatus |
| CN106319577A (en) * | 2015-07-02 | 2017-01-11 | 阿克陶科邦锰业制造有限公司 | Energy-saving and environment-friendly anode plate |
| CN113957493A (en) * | 2021-10-19 | 2022-01-21 | 安徽华威铜箔科技有限公司 | Preparation method of 3-micron electrolytic copper foil anode coating, product and application thereof |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN1818148A (en) | Combined anode for trivalent chromium plating technology | |
| KR100858711B1 (en) | Trivalent chromium galvanizing solution | |
| CN112941581B (en) | Method for treating concrete by using copper plating wastewater | |
| CN1772950A (en) | No-palladium activating recipe for chemical nickel plating on plastic surface and its technological process | |
| JP2011140700A5 (en) | ||
| CN101660188A (en) | Method for embedding nano metal at inside and surface of anodic oxide film hole of aluminum and alloy of aluminum | |
| Manolova et al. | Electrodeposition of Pd from a deep eutectic solvent system: effect of additives and hydrodynamic conditions | |
| CN1793433A (en) | Process for preparing invor alloy foil | |
| CN101045996A (en) | Process of clossing anode coating of aluminium or aluminium alloy with Ce-Mo salt | |
| CN1294642A (en) | Ductility agents for nickel-tungsten alloys | |
| WO2006036252A3 (en) | Controlling the hardness of electrodeposited copper coatings by variation of current profile | |
| CN1138637A (en) | Brightening additive for tungsten alloy electroplate | |
| CN103046037A (en) | High corrosion resistance trivalent chromium blue and white passivating liquid as well as preparation method and application of blue and white passivating liquid | |
| GB2109815A (en) | Electrodepositing chromium | |
| CN103436921A (en) | Method for forming aluminum-manganese-titanium alloy through electrodeposition of ionic liquid | |
| CN109553162B (en) | Stainless steel-based nano-array beta-PbO with ordered porous ZnO as template2Method for preparing electrode | |
| Liang et al. | Preparation of crystalline chromium coating on cu substrate directly by DC electrodepositing from wholly environmentally acceptable Cr (III) electrolyte | |
| CN117480280A (en) | Method for adjusting brightness L of chromium-plated layer | |
| CN103173828A (en) | Method for improving electro-catalytic property by depositing Fe3O4 on surface of titanium doped nanocrystalline iron oxide thin film | |
| CN1118589C (en) | Method for electrolytically coloring aluminum material and gray-colored aluminum material obtained thereby | |
| CN103993337A (en) | Directly electrolytic deposition method of crystal chromium plating layer in hydrosulphate ionic liquid | |
| CN104313664B (en) | Surface treatment method for rare earth magnesium alloy product | |
| CN102534627A (en) | SiC/Al composite material surface blackening method | |
| CN1888136A (en) | No-chromium chemical converting agent | |
| CN1740399A (en) | Method for the electrolytic deposition of copper |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C02 | Deemed withdrawal of patent application after publication (patent law 2001) | ||
| WD01 | Invention patent application deemed withdrawn after publication |