CN1782833A

CN1782833A - Liquid crystal display device, manufacturing method and electronic apparatus

Info

Publication number: CN1782833A
Application number: CNA2005101242827A
Authority: CN
Inventors: 仓岛健
Original assignee: Seiko Epson Corp
Current assignee: BOE Technology Group Co Ltd; BOE Technology HK Ltd
Priority date: 2004-12-01
Filing date: 2005-11-29
Publication date: 2006-06-07
Anticipated expiration: 2025-11-29
Also published as: KR20060061262A; JP2006154599A; JP4158763B2; KR100677015B1; CN100412666C

Abstract

To provide a liquid crystal display device which has less display defects due to a multi-gap step, a manufacturing method for a liquid crystal display device, and electronic equipment. A transflective type liquid crystal display device having a display region including a plurality of pixels having reflection region and transmission regions, is characterized in that: the reflection regions and transmission regions are arranged in stripes across pixel arrays of pixels arrayed in the display region in one direction; a 1st substrate has thick layer portions arranged in the reflection regions and thin layer portions arranged in the transmission regions, and also has step portions formed having oblique surfaces on borders between the thick layer portions and thin layer portions in the display region and layer thickness regulating layers having specified relaxation portions outside the display region; and 1st electrodes are formed on the layer thickness regulating layers and extended to outside the display regions respectively, and at least, 1st electrodes formed in reflection regions and transmission regions of the same pixel array are connected on relaxation portions.

Description

Liquid crystal indicator, its manufacture method and electronic equipment

Technical field

The present invention relates to liquid crystal indicator, its manufacture method and electronic equipment.Specially refer to the liquid crystal indicator that has reduced the poor display that causes because of multiple gap step, the manufacture method of liquid crystal indicator and the electronic equipment that possesses this liquid crystal indicator.

Background technology

In the past, as image display device, liquid crystal indicator is widely used, this liquid crystal indicator will be formed with a pair of substrate subtend configuration of electrode respectively, and by making voltage conducting selectively, the disconnection that imposes on as a plurality of pixels in each electrode crossing zone, modulate light, make it the picture of display image, literal etc. by the liquid crystal material of this pixel region.

As such liquid crystal indicator, a kind of transflective liquid crystal display device that reflection-type shows and transmission-type shows that carries out is arranged.That is to say, on regional transmission, incide on the liquid crystal panel, and externally can recognize by liquid crystal material layer from the light that backlight shone that is disposed at substrate back side.On the other hand, on reflector space, incide exterior light on the liquid crystal panel from the outside, reflect by optical reflection film, and externally can recognize by liquid crystal material layer once more by after the liquid crystal material layer.Owing to possess this regional transmission and reflector space, thereby by day or bright place, can utilize the exterior light of sunshine etc. to watch image to show, therefore the minimizing that can seek to consume electric power, even and, also can utilize backlight to watch image to show in darker places such as nights.

In such transflective liquid crystal display device, show that in order to make reflection-type demonstration and transmission-type colour rendering separately is improved, and seek to postpone the optimization of (optical path difference), proposed to be provided with the liquid crystal indicator in so-called multiple gap.More particularly, as shown in figure 23, transflective liquid crystal display device is formed with reflection layer 604 on pixel 603, be used for regulation reflector space 631 and regional transmission 632, and the square one-tenth bed thickness of layer adjusted layer 606 thereon, its zone that is equivalent to regional transmission 632 becomes opening (for example, referring to patent documentation 1).

Patent documentation 1: the spy open the 2003-270627 communique (claim, Fig. 1)

But, in the described liquid crystal indicator that is provided with multiple gap of patent documentation 1, because the bed thickness suitable with the boundary member of reflector space and regional transmission adjusted the step part of layer, on any of reflector space and regional transmission its postpone also all different, so become the reason that poor display takes place always.

In addition, the step wall of this step part, because make between itself and the real estate angulation steep more, the closely bonding property such as electrode that are formed on the step part descend, so become the dip plane generally speaking.Thereby, reflect following problems, promptly, predetermined width is arranged on this step part, and the zone suitable with this step part become the poor display zone when vertical direction is seen real estate, the result descends the display characteristic of contrast etc.

Summary of the invention

Therefore, the present inventor etc. are through wholwe-hearted effort, discovery is in the liquid crystal indicator of multiple clearance type, the different bed thickness of bed thickness of the liquid crystal material layer by will being used for making reflector space and regional transmission is adjusted layer, in the viewing area, form band shape, and adjust the electrode on layer upper strata, outside the viewing area, guarantee conduction reliably being formed at this bed thickness along predetermined direction, and can address this is that, finished the present invention thus.

That is to say, purpose of the present invention is, a kind of liquid crystal indicator is provided, this liquid crystal indicator is by form the step on the border of reflector space and regional transmission precipitously in the viewing area, and outside the viewing area, guarantee the conducting property of electrode, guarantee formed electrode conduction on the reflector space of a pixel and the regional transmission, reduce the area in poor display zone simultaneously, display characteristic is improved.In addition, other purposes of the present invention are the electronic equipment that the manufacture method of this liquid crystal indicator is provided and possesses this liquid crystal indicator.

According to the present invention, can provide a kind of liquid crystal indicator to solve the problems referred to above, this liquid crystal indicator is a kind of liquid crystal indicator of Transflective, possesses: the 1st substrate possesses the 1st electrode; The 2nd substrate possesses the 2nd electrode; And liquid crystal material, be held between the 1st substrate and the 2nd substrate; And possess the viewing area that comprises a plurality of pixels, these a plurality of pixels have reflector space and regional transmission respectively, it is characterized by,

The pixel column that pixel constituted that reflector space and regional transmission are arranged along a direction at the viewing area interior span is configured to band shape,

The 1st substrate possesses bed thickness and adjusts layer for adjusting the delay of reflector space and regional transmission, and this bed thickness adjustment layer has: thick-layer portion is disposed on the reflector space; With thin layer portion, be disposed on the regional transmission; This bed thickness is adjusted layer, in the viewing area, has the vertically formed step part in dip plane with thick-layer portion and thin layer portion border, and have mitigation portion outside the viewing area, is used for making the step on thick-layer portion and thin layer portion border to relax,

The 1st electrode is striden pixel column on the upper strata of bed thickness adjustment layer and is formed, and extension is set to outside the viewing area respectively, and formed the 1st electrode connects in mitigation portion on the reflector space of same pixel row and the regional transmission at least.

That is to say, owing in the viewing area, form the dip plane on thick-layer portion and thin layer portion border suddenly, reduce the width of the step on thick-layer portion when real estate vertically seen and thin layer portion border, thereby can reduce the area in poor display zone.In addition, outside the viewing area, can prevent the 1st electrode broken string that the step because of thick-layer portion and thin layer portion border causes, guarantee the conducting property of formed the 1st electrode on the reflector space of same pixel row and the regional transmission.Thereby, a kind of liquid crystal indicator can effectively be provided, no matter whether this liquid crystal indicator exist the 1st electrode broken string that causes because of step part etc. in the viewing area, all guarantee to be present in the conduction of the 1st electrode in the pixel, reduce the area in poor display zone simultaneously, display characteristic is improved.

In addition, when constituting in the liquid crystal indicator of the present invention preferably, with the dip plane in the viewing area during as the 1st dip plane, mitigation portion comprises 2nd dip plane milder than angulation between the 1st dip plane and the real estate.

Owing to constitute as stated above, thereby in the viewing area, can reduce the width of the step of thick-layer portion and thin layer portion border when real estate vertically seen, reduce the area in poor display zone, and outside the viewing area, can prevent effectively that the 1st electrode that forms on the dip plane of mitigation portion from breaking, and guarantees conducting property.

Also have, angulation is meant between so-called dip plane 15 and the real estate 31a, among two angle θ A, the θ B that become between dip plane shown in Figure 8 and the real estate in 0～90 ° scope fixed angle.Thereby, in Fig. 8 (a), refer to θ B, in Fig. 8 (b), refer to θ A.

In addition, when constituting in the liquid crystal indicator of the present invention preferably, mitigation portion comprises a plurality of steps that thick-layer portion and thin layer portion are coupled together.

By constituting as stated above, can reduce the height of each included in mitigation portion step, can effectively prevent the broken string of the 1st electrode that forms in the mitigation portion.

In addition, other forms of the present invention are a kind of transflective liquid crystal display devices, possess: the 1st substrate possesses the 1st electrode; The 2nd substrate possesses the 2nd electrode; And liquid crystal material, be held between the 1st substrate and the 2nd substrate; And possess the viewing area that comprises a plurality of pixels, these a plurality of pixels have reflector space and regional transmission respectively, it is characterized by,

The pixel column that pixel constituted that reflector space and regional transmission are arranged by a direction at the viewing area interior span is configured to band shape,

The 1st substrate possesses bed thickness and adjusts layer in order to adjust the delay on reflector space and the regional transmission, and this bed thickness adjustment layer has: thick-layer portion is disposed on the reflector space; With thin layer portion, be disposed on the regional transmission; This bed thickness adjustment layer comprises the vertically formed step part in dip plane with thick-layer portion in the viewing area and thin layer portion border,

The 1st electrode is striden pixel column on the upper strata of bed thickness adjustment layer and is formed, and extension is set to outside the viewing area respectively,

Stride formed the 1st electrode on the reflector space of the row of same pixel at least and the regional transmission, extend the position that is set to the viewing area outside, dispose the conducting parts.

That is to say, in the viewing area, the width of the thick-layer portion when reducing real estate vertically seen and the step on thin layer portion border, and can reduce the area in poor display zone.In addition, outside the viewing area, can be by means of being cross over the predetermined conducting parts that disposed on the 1st electrode that extends setting, guarantee the conducting property of formed the 1st electrode on the reflector space of same pixel row and the regional transmission.Thereby, a kind of liquid crystal indicator can effectively be provided, no matter whether this liquid crystal indicator exist broken string of the 1st electrode that causes because of step part etc. in the viewing area, all guarantees the conduction of the 1st electrode on the pixel, reduces the area in poor display zone simultaneously.

In addition, when constituting in the liquid crystal indicator of the present invention preferably, make that angulation is the interior values of 60～90 ° of scopes between the dip plane viewing area in and the real estate.

By constituting as stated above, can in the viewing area, reduce the width of the step on the border of thick-layer portion and thin layer portion when real estate vertically seen, can reduce the area in poor display zone.

In addition, when constituting in the liquid crystal indicator of the present invention preferably, with the 1st electrode of reflector space and regional transmission, in the conducting of the both sides of viewing area.

By constituting as stated above, the pixel column that the pixel that can guarantee more reliably to arrange by a direction at the viewing area interior span constitutes forms, the conducting property of the 1st electrode of reflector space and regional transmission.

In addition, when constituting in the liquid crystal indicator of the present invention preferably, on the 1st electrode, with pixel in the suitable position of step part on the slit is set.

By constituting as stated above, can make the step part on the border of thick-layer portion and thin layer portion in the viewing area become the non-electric field zone, can prevent the generation of poor display more reliably.

In addition, when constituting in the liquid crystal indicator of the present invention preferably, the 2nd substrate is the device substrate of a kind of TFD of possessing element or TFT element.

By constituting as stated above, even if possess the liquid crystal indicator of any on-off element, also can make it become following liquid crystal indicator, this liquid crystal indicator both can have been guaranteed the conduction of formed the 1st electrode on the reflector space of a pixel in the viewing area and the regional transmission, also can reduce the area in the poor display zone that produces because of the multiple gap that is formed on the subtend substrate.

In addition, other forms of the present invention are manufacture methods of a kind of liquid crystal indicator, and this liquid crystal indicator possesses: the 1st substrate possesses the 1st electrode; The 2nd substrate possesses the 2nd electrode; And liquid crystal material, be held between the 1st substrate and the 2nd substrate; And possess the viewing area that comprises a plurality of pixels, these a plurality of pixels have reflector space and regional transmission respectively; Reflector space and regional transmission are striden the pixel column of the pixel formation of arranging by a direction in the viewing area, be configured to band shape, and being characterized as of this manufacture method comprises:

On the 1st substrate, form the operation of photoresist material layer;

In order to adjust the delay on reflector space and the regional transmission, form bed thickness and adjust the operation of layer, this bed thickness is adjusted layer configuration thick-layer portion on reflector space, configuration thin layer portion on regional transmission, in the viewing area, has the step part that the dip plane with thick-layer portion and thin layer portion border vertically forms, and outside the viewing area, have mitigation portion, be used for making the step on the border of thick-layer portion and thin layer portion to relax; And

Form the operation of the 1st electrode on the upper strata of bed thickness adjustment layer, so that this reflector space and the 1st electrode on the regional transmission that forms on the reflector space of same pixel row and the regional transmission connects in mitigation portion at least, the 1st electrode is striden pixel column, and extends and to be set to the other places, viewing area and to be configured.

That is to say, when formation possesses the bed thickness adjustment layer of following thick-layer portion and thin layer portion, in the viewing area, by vertically forming the dip plane on thick-layer portion and thin layer portion border, can reduce the area in poor display zone, above-mentioned thick-layer portion and thin layer portion are used for forming multiple gap.In addition, when forming such bed thickness and adjust layer, outside the viewing area,, can guarantee electrode in the thick-layer portion and the conducting property between the electrode in the thin layer portion by the mitigation portion that formation relaxes the step on thick-layer portion and thin layer portion border.Thereby, can effectively make and both prevent to wait the liquid crystal indicator that work is not good and display characteristic is good produce because of broken string.

On the 1st substrate, form the operation of photoresist material layer;

In order to adjust the delay on reflector space and the regional transmission, form bed thickness and adjust the operation of layer, this bed thickness is adjusted layer configuration thick-layer portion on reflector space, configuration thin layer portion has the vertically formed step part in dip plane with thick-layer portion and thin layer portion border in the viewing area on regional transmission;

On the upper strata of bed thickness adjustment layer, stride pixel column, and extend the operation that is set to other places, viewing area formation the 1st electrode; And

Stride formed the 1st electrode on the reflector space of the row of same pixel at least and the regional transmission, extend the ground, position that is set to the viewing area outside, dispose the operation of conducting parts.

That is to say, when the bed thickness that possesses following thick-layer portion and thin layer portion when formation is adjusted layer, in the viewing area, the dip plane on the border by vertically forming thick-layer portion and thin layer portion, can reduce the area in poor display zone, above-mentioned thick-layer portion and thin layer portion are used for forming multiple gap.In addition, outside the viewing area,, can guarantee the conducting property of those electrodes by disposing predetermined conducting parts.Thereby, can effectively make and both prevent to wait the liquid crystal indicator that work is not good and display characteristic is good produce because of broken string.

In addition, another other forms of the present invention are a kind of electronic equipments, have above-mentioned any liquid crystal indicator.

That is to say, owing to possess following liquid crystal indicator, thereby a kind of electronic equipment of having realized that display characteristic improves can effectively be provided, this liquid crystal indicator had both been guaranteed formed the 1st electrode conduction on the reflector space of a pixel and the regional transmission, had reduced the poor display zone again.

Description of drawings

Fig. 1 is the approximate three-dimensional map of the liquid crystal indicator of the 1st embodiment.

Fig. 2 is the summary section of the liquid crystal indicator of the 1st embodiment.

Fig. 3 (a)～(b) is used for describing the accompanying drawing that is provided for the configuration of reflector space.

What Fig. 4 represented is the variation of reflector space configuration.

Fig. 5 (a)～(c) is respectively the planimetric map and the sectional view of the employed color filter substrate of liquid crystal indicator of the 1st embodiment.

Fig. 6 (a)～(c) is used for describing the accompanying drawing that is provided for the flat shape of optical reflection film.

Fig. 7 (a) expression be poor display zone in the past the liquid crystal indicator, (b) expression is poor display zone in the liquid crystal indicator of the 1st embodiment.

Fig. 8 (a)～(b) is used for describing the accompanying drawing that is provided for angulation between dip plane and the real estate.

Fig. 9 is the accompanying drawing that is used for illustrating that the mitigation portion that comprises the pre-determined tilt face is provided.

Figure 10 is the accompanying drawing that is used for illustrating that the mitigation portion that comprises a plurality of steps is provided.

Figure 11 (a) expression be the color filter substrate that mitigation portion is arranged in a side's of viewing area arranged outside, (b) expression is the color filter substrate that is provided with mitigation portion in the both sides of viewing area.

Figure 12 (a)～(c) is respectively that an expression reflector space is provided with planimetric map and the sectional view that bed thickness is adjusted the color filter substrate of layer.

Figure 13 (a)～(c) is respectively expression forms apertured color filter substrate to electrode planimetric map and a sectional view.

Figure 14 (a)～(b) is used for illustrating planimetric map and the sectional view that device substrate provides.

Figure 15 (a)～(d) is the accompanying drawing that manufacture method provided (one) that is used for illustrating the employed color filter substrate of liquid crystal indicator of the 1st embodiment.

Figure 16 (a)～(e) is the accompanying drawing that manufacture method provided (its two) that is used for illustrating the employed color filter substrate of liquid crystal indicator of the 1st embodiment.

Figure 17 (a)～(e) is used for illustrating the accompanying drawing that the device substrate manufacture method is provided.

Figure 18 is the accompanying drawing that is used for illustrating that the conducting parts in the employed color filter substrate of liquid crystal indicator of the 3rd embodiment are provided.

Figure 19 is the accompanying drawing that is used for illustrating that the employed color filter substrate manufacture method of liquid crystal indicator of the 3rd embodiment is provided.

Figure 20 (a)～(b) is respectively the sectional view and the planimetric map of the liquid crystal indicator of expression the 5th embodiment.

Figure 21 (a)～(b) is respectively the planimetric map and the sectional view of the employed subtend substrate of liquid crystal indicator of the 5th embodiment.

Figure 22 is the block diagram of schematic configuration of the electronic equipment of expression the 6th embodiment.

What Figure 23 (A)～(C) illustrated respectively is the structure of the liquid crystal indicator of multiple interstitial structure in the past.

Symbol description

10: liquid crystal indicator, 11: mitigation portion, 12: step, 13: poor display zone, 15: dip plane, 40c: the 1st dip plane, 18: the 2 dip plane, 23: encapsulant, 30: color filter substrate, 31: glass substrate, 33: scan electrode, 33a: the scan electrode of thick-layer portion, 33b: the scan electrode of thin layer portion, 35: optical reflection film, 35a: peristome, 40: bed thickness is adjusted layer, 40a: heavy section, 40b: thinner wall section, 40 ': photoresist material layer, 45: alignment films, 60: device substrate, 61: glass substrate, 63: pixel electrode, 65: data line, 69:TFD element, 75: alignment films, 140: conducting parts, 210: liquid crystal indicator, 233: planar electrode, 233a: the planar electrode in the thick-layer portion, 233b: the planar electrode in the thin layer portion, 240: bed thickness is adjusted layer, 240a: thick-layer portion, 240b: thin layer portion, 269:TFT element

Embodiment

Below, with reference to accompanying drawing,, be specifically described for the manufacture method of liquid crystal indicator of the present invention, liquid crystal indicator and comprise the relevant embodiment of electronic equipment of liquid crystal indicator.But such embodiment is used for representing a form of the present invention, is not used for limiting the present invention, and can be within the scope of the invention in addition change arbitrarily.

[the 1st embodiment]

The 1st embodiment is a kind of transflective liquid crystal display device, possesses: the 1st substrate possesses the 1st electrode; The 2nd substrate possesses the 2nd electrode; And liquid crystal material, be held between the 1st substrate and the 2nd substrate; And possess the viewing area that comprises a plurality of pixels, these a plurality of pixels have reflector space and regional transmission respectively.

And, it is characterized by, the pixel column that the pixel that reflector space and regional transmission are arranged by a direction at the viewing area interior span constitutes is configured to band shape; The 1st substrate possesses bed thickness and adjusts layer in order to adjust the delay on reflector space and the regional transmission, and this bed thickness adjustment layer has: thick-layer portion is disposed on the reflector space; With thin layer portion, be disposed on the regional transmission; In the viewing area, have the vertically formed step part in dip plane, and outside the viewing area, have mitigation portion, be used for making the step on the border of thick-layer portion and thin layer portion to relax the border of thick-layer portion and thin layer portion; The 1st electrode is striden pixel column on the upper strata of bed thickness adjustment layer and is formed, and extension is set to outside the viewing area respectively, and formed the 1st electrode connects in mitigation portion on the reflector space of same pixel row and the regional transmission at least.

Below, by suitable with reference to Fig. 1～Figure 14, liquid crystal indicator for the present invention's the 1st embodiment, with the liquid crystal indicator that comprises following color filter substrate and device substrate is that example describes, this color filter substrate possesses predetermined bed thickness and adjusts layer, this device substrate possesses the TFD element (Thin Film Diode, thin film diode) as on-off element.Also have, in each accompanying drawing, the components list of enclosing same-sign illustrates identical parts, and suitably omits its explanation.

1. the basic structure of liquid crystal indicator

At first, with reference to Fig. 1 and Fig. 2, for the basic structure as the liquid crystal indicator 10 of the liquid crystal indicator of the 1st embodiment involved in the present invention, unit (cell) structure and wiring etc. just are specifically described.At this, Fig. 1 is the approximate three-dimensional map of the related liquid crystal indicator of present embodiment 10, and Fig. 2 is a summary section of seeing EE section among Fig. 1 along the direction of arrow.

This liquid crystal indicator 10 possesses device substrate 60, this device substrate 60 has to use and is the TFD element 69 of the two-terminal type nonlinear element active array type structure as on-off element, though it is not shown, but the lighting device of backlight or front light-source etc. and housing etc. can suitably be installed as required, be used.

In addition, liquid crystal indicator 10 is device substrate 60 and color filter substrate 30 subtends configurations and bonding by encapsulants such as bonding agent 23, and this device substrate is a matrix 61 with glass substrate etc., and this color filter substrate is a matrix 31 with glass substrate etc. equally.In addition, possess,, injected after the liquid crystal material 21, seal and the cellular construction that forms with closed material 25 by peristome 23a for the inside part of the encapsulant 23 in the space that forms by device substrate 60 and color filter substrate 30.That is to say filling liquid crystal material 21 between device substrate 60 and color filter substrate 30.

In addition, matrix 61 inner faces of device substrate 60 just with the surface of color filter substrate 30 subtends on, formation is by the rectangular a plurality of pixel electrodes 63 that dispose, and matrix 31 inner faces of color filter substrate 30 just with the surface of device substrate 60 subtends on, form a plurality of scan electrodes 33 by band shape disposed.In addition, pixel electrode 63 is by the TFD element 69 as on-off element, and relative data line 65 is electrically connected, and the encapsulant 23 of the opposing party's scan electrode 33 by comprising electroconductive particle, and drawing around wiring 66 on the opposed member substrate 60 is electrically connected.The pixel electrode 63 that is constituted like this and the intersection region between the scan electrode 33 constitute by rectangular a plurality of pixels of arranging (below, be sometimes referred to as pixel region.), the arrangement of these a plurality of pixels constitutes the viewing area as a whole.Thereby, can apply voltage by pixel to expection, make the liquid crystal material 21 of this pixel that electric field take place, make it the image of display text, figure etc. on the whole in the viewing area.

In addition, device substrate 60 has substrate extension 60T, compare laterally with the profile of color filter substrate 30 and to stretch out, and on this substrate extension 60T, form data line 65 a part, draw around the part of wiring 66 and the outside terminal for connecting 67 that constitutes by independent many wirings that form.

And, at data line 65 or draw, the driving that is built-in with liquid crystal display drive circuit etc. is installed with semiconductor element (drive and use IC) 91 around wiring 66 end.Moreover externally the end of the viewing area side among the terminal for connecting 67 is also installed and is driven with semiconductor element (drive and use IC) 91, and flexible circuit board 93 is installed on the opposing party's end.

2. reflector space and regional transmission

In addition, liquid crystal indicator involved in the present invention is a kind of transflective liquid crystal display device, and reflector space and regional transmission are striden the pixel column of the pixel formation of arranging by a direction in the viewing area, be configured to band shape.That is to say, present embodiment related possess the liquid crystal indicator of TFD element the time, shown in Fig. 3 (a)～(b), to each of a plurality of pixel columns of constituting by pixel G, respectively alternately and by banded configuration reflector space R and regional transmission T, this pixel G along with device substrate on the direction (directions X) of data line quadrature arrange.Also have, Fig. 3 and Fig. 4 are the part enlarged drawings when seeing liquid crystal indicator along relative display surface vertical direction.

At this, Fig. 3 (a) is that in each pixel G, configuration regional transmission T disposes reflector space R on the latter half on the first half, and disposes regional transmission T and reflector space R by band shape on the whole.In addition, Fig. 3 (b) is that in each pixel G, configuration reflector space R on top and bottom disposes regional transmission T and makes it to be inserted and put by this reflector space R, and disposes regional transmission T and reflector space R by band shape on the whole on central portion.

The configuration of this reflector space R and regional transmission T is owing on any of color filter substrate or device substrate, possess the optical reflection film that makes it to have formed accordingly with regional transmission T peristome, thereby these can be configured to the zone of expection.Also have, the illustrated liquid crystal indicator of present embodiment is formed with optical reflection film in color filter substrate side.

In addition, in configuration reflector space and the regional transmission preferably, as shown in Figure 4, at the avris configuration reflector space R of the mutual subtend of neighbor G.For example, in Fig. 4,, alternately arrange in every line at the first half configuration regional transmission T and at the pixel G of the latter half configuration reflector space R with at the first half configuration reflector space R and at the pixel G of the latter half configuration regional transmission T.

Even it is former because when having formed multiple gap, also can reduce the step that becomes the poor display reason in the pixel.

3. color filter substrate (the 1st substrate)

(1) basic structure

Below, with reference to Fig. 5～Figure 13, the liquid crystal indicator 10 employed color filter substrates 30 for present embodiment are described in more detail by suitable.

At first, the planimetric map of Fig. 5 (a) expression color filter substrate 30, the sectional view of PP section among Fig. 5 (a) is seen in Fig. 5 (b) expression in the direction of arrows, the sectional view of OO section among Fig. 5 (a) is seen in Fig. 5 (c) expression in the direction of arrows.The structure of this color filter substrate 30 basically shown in Fig. 5 (b), on the matrix 31 that constitutes by glass substrate etc., lamination optical reflection film 35, photomask 39, dyed layer 37, bed thickness adjustment layer 40 and scan electrode 33 and constitute successively.In addition, on scan electrode 33, possess alignment films 45, be used for controlling the orientation of liquid crystal material, and with the face that is formed with scan electrode 33 etc. mutually on negative side's the face, configuration phase difference plate (1/4 wavelength plate) 47 and polarization plates 49 show so that can distinguish distinct image.

(2) optical reflection film

In addition, formed optical reflection film 35 for example is made of the metal material of aluminium etc. on the color filter substrate 30, and formation and the regional transmission T corresponding opening 35a of portion on the other hand on reflector space R, are to be used for making external light reflection such as sunshine and can to carry out the parts that reflection-type shows.In liquid crystal indicator of the present invention because in the viewing area, stride the pixel column that the pixel of arranging by a direction constitutes and dispose reflector space R, so optical reflection film 35 for example as Fig. 6 (a)～(c) shown in by graphically.

Also have, Fig. 6 (a), Fig. 6 (b) and Fig. 6 (c) express respectively, disposed optical reflection film 35 on the color filter substrate of reflector space R and regional transmission T shown in Fig. 3 (a), disposed the optical reflection film 35 on the color filter substrate of reflector space R and regional transmission T and disposed optical reflection film 35 on the color filter substrate of reflector space R and regional transmission T as shown in Figure 4 shown in Fig. 3 (b).

(3) photomask

In addition, photomask 39 is to be used for preventing colour mixture occurring at neighbor G secondary color material, and obtains the film of the image demonstration of excellent contrast.As this photomask 39, for example can use the metal film of chromium (Cr) or molybdenum (Mo) etc. to be used as photomask 39, perhaps use following two kinds of films etc., a kind of is to make the coloured material of R (red), G (green), B (indigo plant) 3 looks be distributed to film in resin and other matrix materials in the lump, and another kind is to make the coloured material of black pigment, dyestuff etc. be distributed to film in resin and other matrix materials.Moreover the coloured material by overlapping R (red), G (green), B (indigo plant) 3 looks also can form photomask.

(4) dyed layer

In addition, dyed layer 37 makes the coloured material of pigment, dyestuff etc. disperse usually in transparent resin and presents predetermined tone.An example as dyed layer 37 tones, though the tone that constitutes by R (red), G (green), B (indigo plant) 3 looks is arranged as primary colors class color filter, but be not limited thereto, also can adopt the complementary color class of Y (Huang), M (peony), C (dark green) etc. and other various tones to form.

In addition,, arrange, except that this band shape is arranged, can also adopt the oblique various graphics shapes that inlay arrangement or rounded projections arranged etc. though more employing is banded as the spread geometry of dyed layer 37.

(5) bed thickness is adjusted layer

In addition, in the related liquid crystal indicator 10 of present embodiment, form bed thickness and adjust layer 40 on color filter substrate 30, this bed thickness is adjusted layer 40 organic developing photosensitive resin material, SiN or SiO by acryl resin or epoxy resin etc. ₂Deng inorganic material constitute.And shown in Fig. 5 (b)～(c), this bed thickness adjustment layer 40 has: the 40a of thick-layer portion is disposed on the reflector space R; With the 40b of thin layer portion, be disposed on the regional transmission T; It is characterized in that, in the A of viewing area, have the step part that the dip plane 40c with the step place on the border of 40a of thick-layer portion and the 40b of thin layer portion vertically forms, and outside the viewing area, have mitigation portion 11, be used for making the step on 40a of thick-layer portion and thin layer portion 40b border to relax.

That is to say, in order to make the delay on reflector space and the regional transmission be able to optimization, in with relative attenuation of reflector space bed thickness on the liquid crystal material layer and liquid crystal indicator with the multiple interstitial structure of regional transmission bed thickness thickening, it constitutes in the viewing area, and the bed thickness that reduces that real estate is seen from vertical direction is adjusted the step width on the border of the thick-layer portion of layer and thin layer portion.On the other hand, it constitutes outside the viewing area, form mitigation portion and guarantee that formed conducting property of scan electrode on the reflector space of a pixel and the regional transmission, this mitigation portion are used for preventing that bed thickness from adjusting the broken string of formed scan electrode on the step on border of the thick-layer portion of layer and thin layer portion.

Thereby, this liquid crystal indicator can prevent that the work that the broken string because of scan electrode produces is not good, and reduce the area in the poor display zone that causes because of step, the delay that simultaneously reflector space and regional transmission are gone up separately is able to optimization, and display characteristic is good.

More particularly, be used for constituting the bed thickness adjustment layer in the past in multiple gap, shown in Figure 23 (b), make in the viewing area, be disposed at the thick-layer portion on the reflector space R and be disposed at pitch angle on the step 660 on the border between the thin layer portion on the regional transmission T, comparatively gently form.Its former because, if the vertical dip plane that forms on this step, formed scan electrode then takes place on this step part forms not goodly, the possibility of broken string is arranged.But, because it is all improper that step part postpones on any of reflector space and regional transmission, thereby in this case shown in Fig. 7 (a), suitable relative increase of region area from the identifiable and dip plane that the real estate vertical direction is seen, it is big that the area in poor display zone 13 becomes.

On the other hand, in liquid crystal indicator involved in the present invention, owing to vertically form the dip plane on the border step of thick-layer portion and thin layer portion in the viewing area, thereby shown in Fig. 7 (b), suitable relative the diminishing of region area from the identifiable and dip plane that the real estate vertical direction is seen can reduce the area in poor display zone 13.In addition, Fig. 7 (a) and (b) expression are adjusted the state of dip plane 40C ' of layer 40 ' and the state of the demonstration bad 13 of the display surface that takes place corresponding to the bed thickness that forms respectively.

Like this, preferably, in order to reduce from the thick-layer portion that the real estate vertical direction is seen and the step width on thin layer portion border, making angulation between dip plane on this step and the real estate is values in 60～90 ° of scopes.

Its former because, if this angle becomes and do not reach 60 ° value, then also increase relatively sometimes because of the thickness of bed thickness adjustment layer produces, causes the width of the dip plane when the real estate vertical direction is seen, the area in poor display zone increases.On the other hand, if this angle is vertical (90 °), then can make from the width of dip plane that the real estate vertical direction is seen is 0, therefore can make the area in poor display zone become minimum.But this step generally is to form by multiple-exposure or halftone exposure to the photoresist material, exist since a little of the light by photomask around going into, the problem of repeatability deficiency sometimes.

Thereby comparatively preferably, making angulation between dip plane on thick-layer portion and the thin layer portion border step and the real estate is values in 70～88 ° of scopes, and more preferably, and making it is values in 80～85 ° of scopes.

Also have, angulation is meant between so-called dip plane 15 and the real estate 31a, the angle of determining in 0～90 ° scope among two angle θ A, the θ B that become between dip plane shown in Figure 8 and the real estate.Thereby, in Fig. 8 (a), refer to θ B, in Fig. 8 (b), refer to θ A.

But, under the situation that the dip plane on thick-layer portion and the thin layer portion border step is vertically formed, in the fabrication phase, when being formed with scan electrode, can not on this step part, be formed uniformly electrode sometimes on bed thickness adjustment layer upper strata.In this case, for example, the scan electrode of reflector space and the scan electrode of regional transmission become discontinuous state on pixel, can not guarantee conducting property, and become the not good reason of work.

Therefore, shown in Fig. 5 (a)～(c), outside the A of viewing area, the mitigation portion 11 that is used for making the step on 40a of thick-layer portion and thin layer portion 40b border to relax by formation, and can guarantee conducting property between the scan electrode 33b of the scan electrode 33a of reflector space on the pixel and regional transmission by this mitigation portion 11, can prevent that the work that the broken string because of scan electrode 33 produces is not good.That is to say, in a pixel, even for example under the situation that the scan electrode of the scan electrode of reflector space and regional transmission is not connected fully, owing to outside the viewing area, guarantee the conducting property of the scan electrode of this reflector space and regional transmission, thereby still can apply voltage on separately at the reflector space in the pixel and regional transmission.

As such mitigation portion, for example shown in Figure 9, when the dip plane in the A of viewing area was made as the 1st dip plane 40c, it was mild to form between 11, the 2 dip plane, 18 to the 1 dip plane 40c of mitigation portion that comprise the 2nd dip plane 18 and the real estate angulation θ 2.That is to say,, be formed at transparency electrode on this step part and be easy to take place to form not good, be easy to produce broken string along with the dip plane steepening on the border step between thick-layer portion and the thin layer portion.Therefore, by thick-layer portion outside the formation viewing area and the dip plane on the border step between the thin layer portion, make it milder, and can outside the viewing area, guarantee the conducting property of formed electrode on the reflector space of a pixel and the regional transmission than the step in the viewing area.

But, if this dip plane is too mild, the then area increase in outer so-called architrave zone, viewing area sometimes.Thereby, preferably, make that angulation more preferably, is the values in 40～50 ° of scopes for more than or equal to 30 and less than the value in 60 ° the scope between dip plane on the border step of thick-layer portion outside the viewing area and thin layer portion and the real estate.

In addition, for example shown in Figure 10 as other examples of this mitigation portion, can form the mitigation portion 11 that comprises a plurality of steps 12, these a plurality of steps are used for 40a of thick-layer portion and the 40b of thin layer portion are coupled together.That is to say that the difference of height of the thick-layer portion outside the viewing area and the border step of thin layer portion when being formed with electrode on this step part, possibility increase not good and that produce broken string takes place to form than under the big situation of the value of electrode thickness.Therefore, constitute the thick-layer portion outside the viewing area and the step on thin layer portion border by comprising a plurality of steps ground, and can reduce the difference of height of single step, prevent the broken string of electrode.

Thereby, for example when the thickness of scan electrode is about 50nm, preferably, the difference of height separately that makes a plurality of steps included in the mitigation portion is the value in 30～60nm scope, and this mitigation portion is used for making the step mitigation on the border of the thick-layer portion viewing area outside and thin layer portion.

In addition, shown in Figure 11 (a), by mitigation portion 11 being formed at viewing area A either party's the outside, for example be formed at device substrate on draw a side that obtains conducting around wiring, obtain scan electrode 33a on the 40a of thick-layer portion of bed thickness adjustment layer 40 and the conducting property of the scan electrode 33b on the 40b of thin layer portion, and can guarantee conducting property substantially.But, consider from the aspect of the conducting property that can guarantee

scan electrode

33a, 33b more reliably, shown in Figure 11 (b), preferably, form this mitigation portion 11 in the both sides of viewing area A.

Also have, postpone to be able to optimization in order to make, on liquid crystal material layer, constitute reflector space and make it thinner than regional transmission, for this reason, be not limited to as mentioned above, by corresponding to the thick-layer portion of reflector space with corresponding to the situation that the thin layer portion of regional transmission constitutes, also as shown in figure 12, also can constitute by only forming bed thickness adjustment layer 40 corresponding to reflector space R ground.In this case, for the dip plane on the step suitable with bed thickness adjustment layer 40 end, for the dip plane 40c in the A of viewing area, it is vertically formed, and outside the A of viewing area, setting comprises the mitigation portion 11 of dip plane 18, and this dip plane 18 is milder than angulation between dip plane 40c in the A of viewing area and the real estate.

In addition, as the example of mitigation portion, be not limited to above-mentioned form, so long as can guarantee the scan electrode in the thick-layer portion and the method for the conducting property between the scan electrode in the thin layer portion, other forms also are fine.

(6) scan electrode

In addition, adjust the scan electrode 33 that forms the transparent conductive body formation that waits by ITO (tin indium oxide) on the layer 40 at bed thickness.33 pairs of each pixel columns that pixel constituted of arranging by a direction of this scan electrode, the band shape that forms side by side by a plurality of transparency electrodes 33 constitutes.

Here, in the liquid crystal indicator of present embodiment, in the A of viewing area, adjust the dip plane on the border step of the 40a of thick-layer portion of layer 40 and the 40b of thin layer portion corresponding to the formed bed thickness of reflector space R and regional transmission T, vertically form.Thereby, the scan electrode 33a of the reflector space R in pixel and the discontinuous formation of scan electrode 33b of regional transmission T sometimes.

But, outside the viewing area, owing to extending, formed scan electrode on reflector space that makes the same pixel row and the regional transmission is provided with, in the mitigation portion of the border step of thick-layer portion and thin layer portion, the scan electrode that connects reflector space and regional transmission, even thereby when a pixel interscan electrode is discontinuous state, also can guarantee conducting property.

Thereby, even when in being included in the viewing area, vertically forming scan electrode on the step of formed dip plane, also can prevent to wait the not good generation of work that produces because of broken string.

In addition, when with the reflector space on the pixel and the scan electrode of regional transmission, outside the viewing area, guarantee in the conducting property, by either side in the viewing area, for example with device substrate on draw a side that obtains conducting around wiring, reach the conducting property of the scan electrode in the thin layer portion in the thick-layer portion of acquisition bed thickness adjustment layer, can guarantee conducting property substantially.But, consider from the conducting property aspect that can guarantee scan electrode more reliably, preferably, in the thick-layer portion of the both sides of viewing area acquisition bed thickness adjustment layer, reach the conducting property of the scan electrode in the thin layer portion.

In addition, as shown in figure 13 preferably, on scan electrode 33, adjusting on the suitable position of the step (the 1st dip plane 40c) on border of the 40a of thick-layer portion of layer 40 and the 40b of thin layer portion with bed thickness on each pixel in the A of viewing area is provided with slit 34.

Its former because, by on the dip plane that becomes the poor display reason, not forming scan electrode, and make it to become the non-electric field zone, do not make this part transmitted light, can further reduce the generation of poor display thus.

And because so long as the liquid crystal indicator of present embodiment, the reflector space in pixel and the scan electrode of regional transmission are just guaranteed its conducting property outside the viewing area, even thereby when being provided with this slit, it is not good that work can not take place yet.

(7) alignment films

In addition, on scan electrode 33, whole ground form the alignment films 45 that constitutes by polyimide resin etc.This alignment films be rub (rubbing) handle to wait the parts that are used for controlling the liquid crystal material orientation.

4. device substrate (the 2nd substrate)

(1) board structure

In addition, device substrate 60 consists essentially of shown in Figure 14 (a)～(b): matrix 61 is made of glass substrate etc.; Data line 65; TFD element 69 as on-off element; And pixel electrode 63.In addition, as shown in Figure 2, on pixel electrode 63, form the alignment films 75 that constitutes by polyimide resin etc., on the other hand, in the outside of matrix 61 configuration phase difference plate (1/4 wavelength plate) 77 and polarization plates 79.

Also have, Figure 14 (a) is the general view of device substrate 60, and Figure 14 (b) is the summary section of device substrate 60.In addition, for alignment films and polarization plates etc., suitably omit respectively.

(2) data line and drawing around wiring

Data line 65 on the device substrate 60 constitutes by the band shape that many wirings form side by side.In addition, though it is not shown, but along limit one side of extending, be provided with and draw around wiring for the vertical direction in the limit of installation regions such as driver one side, this draw around wiring by comprising electroconductive particle encapsulant and the scan electrode 33 on the color filter substrate 30 be electrically connected.

This data line 65 and drawing around wiring because from the viewpoint that manufacturing process oversimplifies and resistance reduces, form simultaneously with the formation of following both-end subtype nonlinear element so for example form tantalum layer, tantalum oxide layers and chromium layer successively, constitutes.

(3) pixel electrode

In addition, on each bar data line 65,, pixel electrode 63 is electrically connected by on-off element 69.In addition, pixel electrode 63 is configured to rectangular between each bar data line 65.

This pixel electrode 63 can use the transparent conductive material of ITO (tin indium oxide) or IZO (indium zinc oxide) etc. to form.

(4) on-off element

In addition, on device substrate 60, form TFD element 69, be used for data line 65 and pixel electrode 63 are electrically connected as on-off element 69.This TFD element 69 has sandwich construction generally speaking, and this sandwich construction is lamination successively: element the 1st electrode 71 that is made of tantalum (Ta) alloy, by tantalum oxide (Ta ₂O ₅) dielectric film 72 that constitutes and element the

2nd electrode

73,74 that constitutes by chromium (Cr).And, be a kind of active component, be used for representing the diode switch characteristic of positive negative direction, and be applied between the two-terminal of element the 1st electrode 71 and element the

2nd electrode

73,74 as if voltage more than or equal to threshold value, then become conducting state.

In addition, preferably, two

TFD element

69a, 69b form, and between data line 65 and pixel electrode 63, and are made of 1TFD element 69a with opposite diode characteristic and 2TFD element 69b.

It is former because owing to constitute as stated above, thereby as the voltage waveform that will apply, can use the pulse waveform of positive and negative symmetry, and can prevent the deterioration of the liquid crystal material in the liquid crystal indicator etc.That is to say that it is former because in order to prevent the deterioration of liquid crystal material, it is symmetrical that the diode switch characteristic is preferably on the positive negative direction, by two TFD element 69a, the 69b of oppositely being connected in series, can use the pulse waveform of positive and negative symmetry.

[the 2nd embodiment]

The 2nd embodiment of the present invention is the manufacture method of the liquid crystal indicator of the 1st embodiment, it is characterized by, and comprising:

On the 1st substrate, form the operation of photoresist material layer;

In order to adjust the delay on reflector space and the regional transmission, form bed thickness and adjust the operation of layer, this bed thickness is adjusted layer configuration thick-layer portion on reflector space, configuration thin layer portion on regional transmission, in the viewing area, has the step part that the dip plane with the border of thick-layer portion and thin layer portion vertically forms, and outside the viewing area, have mitigation portion, be used for making the step on thick-layer portion and thin layer portion border to relax; And

Form the operation of the 1st electrode on the upper strata of bed thickness adjustment layer, so that the 1st electrode in formed this reflector space and the regional transmission on the reflector space of same pixel row and the regional transmission at least, in mitigation portion, connect, the 1st electrode strides across pixel column, and extends and to be set to the other places, viewing area and to be configured.

Below, as example of manufacture method of the related liquid crystal indicator of the 2nd embodiment, be example with the method for the liquid crystal indicator of making the 1st embodiment,, describe with reference to Figure 15～Figure 17 by suitable.

1. the manufacturing process of color filter substrate (the 1st substrate)

(1) formation of optical reflection film

At first, shown in Figure 15 (a), form reflectance coating 35 on as the glass substrate 31 of the matrix material of the 1st substrate, this reflectance coating 35 is used for forming reflector space.This reflectance coating can form by using the photoetching process composition adopting plating method or sputtering method to make after metal material such as aluminium adheres on the mother substrate.

In addition, when making the Transflective color filter substrate, make it the corresponding reflectance coating 35 that forms with each pixel, this reflectance coating 35 possesses the peristome 35a that is used for forming regional transmission.

(2) formation of dyed layer

Next, shown in Figure 15 (b), corresponding to each pixel, the dyed layer 37 of arbitrary look among formation R, G, the B.This dyed layer can be by being coated to photoresist on the mother substrate and this photoresist implemented graph exposure and development treatment forms successively, and above-mentioned photoresist is by transparent resin after painted material such as pigment or dyestuff looses etc. is constituted.Also have, this exposure and development treatment are for to carry out repeatedly R, G, every kind of look of B.

(3) formation of photomask

Next, shown in Figure 15 (c), on each inter-pixel areas, form photomask 39.As this photomask, for example can use the metal film of chromium (Cr) or molybdenum (Mo) etc. to be used as photomask, perhaps use following two kinds of films etc., a kind of is to make the coloured material of R (red), G (green), B (indigo plant) 3 looks be distributed to film in resin and other matrix materials in the lump, and another kind is to make the coloured material of the pigment of black or dyestuff etc. be distributed to film in resin and other matrix materials.

For example, when adopting metal film to form photomask, can after being laminated on the glass substrate, the metal material that utilizes plating method etc. with chromium (Cr) etc., form by carry out etch processes according to predetermined pattern.

(4) bed thickness is adjusted the formation of layer

Next, shown in Figure 15 (d),, for example adopt the applying device of spin coated machine etc. evenly to be coated on the substrate with the photoresist material, form photoresist material layer 40 '.At this moment, for example when using the spin coated machine, can be with 600～2, the coating time of the rotating speed of 000rpm and 5～20 seconds, the bed thickness that forms thickness and be 1～10 μ m is adjusted layer.

At this, constitute bed thickness and adjust the photoresist material category of layer and limit especially, but for example can enumerate acrylic resin, epikote, silicon resinoid, phenolic resinoid and oxetanes resinoid etc. a kind of single or more than the combination that equals two kinds.In addition, also inorganic fillers such as silicon dioxide granule, titanium dioxide, zirconia and aluminium oxide can be added in advance in the photoresist material, so that can form convex-concave pattern accurately.

In addition, eurymeric and minus are arranged as the photoresist material, this eurymeric, its position of having shone the light behind the transmitted light transmissive portions produces photolysis, to the developer solubilized; This minus, its position of having shone the light behind the transmitted light transmissive portions produces sclerosis, developer is not dissolved, but all can suitably use.

Also have, in the present embodiment, be example, describe with the situation of using the normal Photosensitive resin material.

Next, shown in Figure 16 (a)～(c), in order to adjust the delay on reflector space and the regional transmission, form bed thickness and adjust layer, this bed thickness is adjusted layer configuration thick-layer 40a of portion on reflector space, the configuration thin layer 40b of portion on regional transmission, in the A of viewing area, has the step part that the dip plane on the border step of 40a of thick-layer portion and the 40b of thin layer portion is vertically formed, and outside the A of viewing area, have mitigation portion 11, be used for making the step on the border of 40a of thick-layer portion and the 40b of thin layer portion to relax.

More particularly, mounting substrate on the stepping worktable for example, and shown in Figure 16 (a), after configuration the 1st photomask 111, irradiation is with the i line homenergic line shown in the symbol L, to the photoresist material layer 40 after the even coating ' enforcement graph exposure (the 1st exposure).

Then, after on the exposure device that substrate is for example moved in the lump exposure usefulness from the stepping worktable, dispose the 2nd photomask 113, and shown in Figure 16 (b), same irradiation energy line is adjusted layer to bed thickness and is implemented graph exposure (the 2nd exposure).

Then, for example, by using developer solution to the photoresist material layer 40 on the substrate ' develop, make irradiation have the part of the light behind the light transmission department of transmission the 1st and the 2nd photomask to develop, shown in Figure 16 (c), can form bed thickness and adjust layer 40, this bed thickness adjustment layer 40 comprises thick-layer portion 40a corresponding with reflector space and the thin layer portion 40b corresponding with regional transmission.

At this moment, outside the viewing area,, can form the step part of the dip plane that possesses expection by making the 1st photomask 111 different with the mask graph of the 2nd photomask 113.On the other hand, in the viewing area, by carrying out arbitrary exposure of the 1st exposure or the 2nd exposure, perhaps making the mask graph of the 1st photomask 111 and the 2nd photomask 113 is identical figure, can vertically form the dip plane, on step part, not form the gradient as far as possible.Thereby, can form following bed thickness and adjust layer 40, this bed thickness is adjusted layer 40 in the A of viewing area, vertically forms the dip plane (the 1st dip plane 40c) on the step on border of 40a of thick-layer portion and the 40b of thin layer portion; Outside the A of viewing area, make the dip plane (the 2nd dip plane 18) on the step on border of 40a of thick-layer portion and the 40b of thin layer portion, milder than angulation between the 1st dip plane 40c in the A of viewing area and the real estate.

Also have, the formation method of the thick-layer portion of above-mentioned bed thickness adjustment layer, thin layer portion and dip plane etc. is a kind of method of utilizing so-called multiple-exposure, and this multiple-exposure uses a plurality of photomasks of different graphic.But, also can pass through following halftone exposure in addition, form the bed thickness that possesses thick-layer portion, thin layer portion and dip plane etc. and adjust layer, this halftone exposure uses and partly makes the different half-tone mask of optical transmission rate.

(5) formation of scan electrode and alignment films

Next, shown in Figure 16 (d), on comprising the bed thickness adjustment layer of thick-layer portion and thin layer portion, for example adopt whole ground of sputtering method to form after the transparency conducting layer, use photoetching process to implement composition, form the electrode 33 of predetermined pattern shape, the transparent conductive material formation that above-mentioned transparency conducting layer is waited by ITO (tin indium oxide).

For example, at the color filter substrate that will make is to be used for the passive matrix liquid-crystal apparatus or to possess TFD element (Thin Film Diode, during color filter substrate in active array type LCD thin film diode), come composition by the mode that a plurality of electrodes become band side by side.In addition, when the color filter substrate that will make is the color filter substrate that is used to possess in the active array type LCD of TFT element (Thin Film Transistor, thin film transistor (TFT)), come its composition as the planar electrode corresponding with each unit area.

At this moment, in the viewing area, because the thick-layer portion of bed thickness adjustment layer and the step on thin layer portion border vertically form, thereby the scan electrode of this step part is easy to take place to form not good, but, the bed thickness outside the viewing area forms mitigation portion on the layer because adjusting, can form, the scan electrode of interior reflector space of a pixel and regional transmission be connected reliably, in mitigation portion so can guarantee conducting property.Thereby, can make and both prevented to wait the not good generation of the work produce, reduced the liquid crystal indicator of poor display region area simultaneously because of broken string.

Next, shown in Figure 16 (e),, each unit area is formed the alignment films 45 that is made of polyimide resin etc., just can make color filter substrate 30 by on the substrate that is formed with transparency electrode 33.

2. the manufacturing process of device substrate

(1) formation of element the 1st electrode

Device substrate 60 at first shown in Figure 17 (a), forms element the 1st electrode 71 on the matrix 61 that is made of glass substrate.This element the 1st electrode 71 for example is made of tantalum alloy, can adopt sputtering method or electron beam plating method to form.At this moment, be significantly improved from the power that closely bonds that can make 71 pairs the 2nd glass substrates 61 of element the 1st electrode, and can effectively suppress impurity considers to the aspect of the diffusion of element the 1st electrode 71 from the 2nd glass substrate 61, still preferred, before forming element the 1st electrode 71, on matrix 61, form by tantalum oxide (Ta ₂O ₅) wait the dielectric film of formation.

At this moment, preferably, in order to make element the 1st electrode shared in the TFD element, form and stride two adjacent pixel ground, this TFD element is with adjacent along data line or corresponding by oblique two adjacent pixel electrodes along data line.It is former because because can reduce the formation zone of TFD element, increase pixel electrode on the other hand, so can effectively make the liquid crystal indicator that each elemental area is enlarged and display characteristic such as contrast is improved.

Next, shown in Figure 17 (b), oxidation is carried out on the surface of element the 1st electrode 71, formed oxide film 72 by adopting anodizing.More particularly, can be impregnated in the electrolytic solution such as citric acid solution at the substrate that will form element the 1st electrode 71 after, to applying predetermined voltage between this electrolytic solution and element the 1st electrode 71, oxidation is carried out on the surface of element the 1st electrode 71.

(2) formation of element the 2nd electrode and data line

Next, adopt sputtering method etc. once more, whole forms metal film on the substrate that comprises element the 1st electrode 71, and adopts photoetching process to its composition, whereby shown in Figure 17 (c), forms element the

2nd electrode

73,74 and data line 65.So, just can form TFD element 69 and data line 65.

(3) formation of pixel electrode

Next, shown in Figure 17 (d), after the transparency conducting layer that the transparent conductor material that adopts sputtering method etc. to form to be waited by ITO (tin indium oxide etc.) constitutes, use photoetching process to come composition, whereby the pixel electrode 63 that is electrically connected with TFD element 69 of formation.

(4) formation of alignment films

Next, shown in Figure 17 (e), on the device substrate 60 that is formed with pixel electrode 63 grades, form the alignment films 75 that constitutes by polyimide resin etc., just can make device substrate 60 whereby.

3. stickup operation

Next, though not shown, on any of color filter substrate 30 or device substrate 60, after surrounding the stacked encapsulant 23 in ground, viewing area, by another substrate being overlapped and heating crimping, paste color filter substrate 30 and device substrate 60, form cellular construction.

4. assembling procedure etc.

Then, in to the unit, the inlet on being arranged at an encapsulant part injects after the liquid crystal material, utilizes closed material to wait and seals.

And then, in color filter substrate 30 and device substrate 60 outside separately such as configuration phase difference plate (1/4 λ plate) and polarization plates, and installation of driver, and and backlight etc. be assembled in the lump in the housing, just can make liquid crystal indicator whereby.

[the 3rd embodiment]

The 3rd embodiment is a kind of transflective liquid crystal display device, and it possesses: the 1st substrate possesses the 1st electrode; The 2nd substrate possesses the 2nd electrode; And liquid crystal material, be held between the 1st substrate and the 2nd substrate; And possess the viewing area that comprises a plurality of pixels, these a plurality of pixels have reflector space and regional transmission respectively.

And, it is characterized by, the pixel column that pixel constituted that reflector space and regional transmission are arranged by a direction at the viewing area interior span, and be configured to band shape,

The 1st substrate possesses bed thickness and adjusts layer in order to adjust the delay on reflector space and the regional transmission, and this bed thickness adjustment layer has: thick-layer portion is disposed on the reflector space; With thin layer portion, be disposed on the regional transmission; Comprise the step part that the dip plane with thick-layer portion in the viewing area and thin layer portion border vertically forms,

The 1st electrode strides across pixel column on the upper strata of bed thickness adjustment layer and forms, and extension is set to outside the viewing area respectively,

Stride formed the 1st electrode on the reflector space of the row of same pixel at least and the regional transmission, extend the ground, position that is set to the viewing area outside, dispose the conducting parts.

Below, the limit is suitably with reference to Figure 18～Figure 19, and the limit is for the liquid crystal indicator of the present invention's the 3rd embodiment, is that the center describes with the structure of the color filter substrate different with the liquid crystal indicator of the 1st embodiment, and, suitably omit its explanation for something in common.

1. color filter substrate (the 1st substrate)

(1) basic structure

The structure of employed color filter substrate 30 in the liquid crystal indicator 10 of present embodiment, basically as shown in figure 18, identical with the color filter substrate of the 1st embodiment, lamination optical reflection film 35, photomask 39, dyed layer 37, bed thickness are adjusted layer 40 and scan electrode 33 successively on the matrix 31 that is made of glass substrate etc.In addition, on scan electrode 33, possesses the alignment films 45 that is used for controlling the liquid crystal material orientation, and with the face of the face opposition side that is formed with scan electrode 33 etc. on configuration phase difference plate (1/4 wavelength plate) 47 and polarization plates 49 show so that can see distinct image.

In addition, for optical reflection film 35, photomask 39, dyed layer 37 and alignment films 45 etc., because can be identical, so explanation is herein omitted with employed color filter substrate in the liquid crystal indicator of the 1st embodiment.

(2) bed thickness is adjusted layer

In addition, in the related liquid crystal indicator 10 of present embodiment, form bed thickness and adjust layer 40 on color filter substrate 30, this bed thickness adjustment layer 40 is made of the photoresist material of acryl resin or epoxy resin etc.And, it is characterized by, this bed thickness adjustment layer 40 has: the 40a of thick-layer portion is disposed on the reflector space; With the 40b of thin layer portion, be disposed on the regional transmission; In the A of viewing area, possesses the step part that the dip plane 17 on the border step of 40a of thick-layer portion and the 40b of thin layer portion is vertically formed.

That is to say, in order to make the delay on reflector space and the regional transmission be able to optimization, the relative attenuation of reflector space bed thickness in making liquid crystal material layer and making in the liquid crystal indicator of multiple interstitial structure of bed thickness thickening of regional transmission, it constitutes, in the viewing area, reduce from the width of the step on thick-layer portion that the real estate vertical direction is seen, bed thickness adjustment layer and the border between the thin layer portion.

Thereby, illustrated as the 1st embodiment, can form following liquid crystal indicator, this liquid crystal indicator can reduce the area in the poor display zone that causes because of step, the delay that reflector space and regional transmission are gone up separately is able to optimization, and display characteristic is good.

But, under the situation of the dip plane on the step on the border that vertically forms thick-layer portion and thin layer portion, in the fabrication phase, when on this bed thickness adjustment layer, being formed with scan electrode, can not on this step part, evenly form electrode sometimes.At this moment, the conducting property decline between the scan electrode of the reflector space of a pixel and the scan electrode of regional transmission becomes the not good reason of work.

Thereby, different, as described below with the mitigation portion in the 1st embodiment in the liquid crystal indicator of present embodiment, outside the viewing area, use the conducting parts, guarantee the conducting property of the scan electrode of the reflector space of a pixel and regional transmission.

(3) scan electrode and conducting parts

In addition, adjust the scan electrode 33 that forms on the layer 40 by ITO transparent conductive bodies such as (tin indium oxides) formation at bed thickness.33 pairs of each pixel columns that pixel constituted of arranging by a direction of this scan electrode, the band shape arranged side by side by a plurality of transparency electrodes constitutes.

At this, in the liquid crystal indicator of present embodiment, in the viewing area, vertically form corresponding to the dip plane on the border step of the thick-layer portion of reflector space and the formed bed thickness adjustment of regional transmission layer and thin layer portion.Thereby the scan electrode of the reflector space in pixel and the scan electrode of regional transmission become discontinuous state sometimes.

Therefore, in the liquid crystal indicator of present embodiment, scan electrode 33a on the 40a of thick-layer portion of a pixel and the extension of the scan electrode 33b on the 40b of thin layer portion are set to outside the A of viewing area, and use conducting parts 140, come conducting formed scan electrode 33 on the reflector space of same pixel row and the regional transmission at least, above-mentioned conducting parts 140 are striden and are extended scan electrode 33 ground that are set to the outer position of viewing area A and be configured.Thereby, even when the scan electrode 33b of the scan electrode 33a in a pixel internal reflection zone and regional transmission is discontinuous, also can guarantee conducting property, can reflector space in the pixel and regional transmission separately on apply voltage.

Thereby bed thickness in the viewing area is adjusted on the layer, although form scan electrode comprising on the step part of formed dip plane vertically, still can prevent to wait the not good generation of work that produces because of broken string.

As the example of this conducting parts as shown in figure 18, can use following conductive material 140, the thickness of this conductive material is more than or equal to the difference of height of 40a of thick-layer portion and thin layer portion 40b border step.That is to say, be set to the mode at the position outside the viewing area by extension with scan electrode 33a on the 40a of thick-layer portion that strides bed thickness adjustment layer 40 and the scan electrode 33b on the 40b of thin layer portion, the conductive material 140 of configuration or the predetermined thickness of formation, can consider the broken string on this step part and form not goodly, can guarantee scan electrode 33a on the 40a of thick-layer portion and the conducting property of the scan electrode 33b on the 40b of thin layer portion.

As this conductive material, for example can enumerate Al (aluminium), Ta (tantalum), Cr (chromium), Ag (silver), ITO (tin indium oxide) and IZO (indium zinc oxide) etc.But, not being defined as these, so long as bring effect may command thickness, thickness and dispose or be formed at material on the substrate, just can suitably use with the cell gap of not giving liquid crystal panel.

In addition, for obtain in the both sides of viewing area two end conductings of scan electrode aspect, and be provided with on the position suitable in the viewing area with the step (the 1st dip plane) on border thick-layer portion and thin layer portion the slit aspect, then can be identical with the 1st embodiment.

[the 4th embodiment]

The 4th embodiment of the present invention is a kind of manufacture method of liquid crystal indicator of the 3rd embodiment, it is characterized by, and comprising:

On the 1st substrate, form the operation of photoresist material layer;

In order to adjust the delay on reflector space and the regional transmission, form bed thickness and adjust the operation of layer, this bed thickness is adjusted layer configuration thick-layer portion on reflector space, configuration thin layer portion on regional transmission has the step part that the dip plane with the border of thick-layer portion and thin layer portion vertically forms in the viewing area;

On the upper strata of bed thickness adjustment layer, stride across pixel column and extension and be set to the operation that the other places, viewing area forms the 1st electrode; And

Below, as example of manufacture method of the related liquid crystal indicator of the 4th embodiment, be the center with the color filter substrate manufacturing process different with the 2nd embodiment, the limit suitably describes with reference to Figure 19 limit, and, suitably omit its explanation for same aspect.

1. the manufacturing process of color filter substrate (the 1st substrate)

(1) formation of optical reflection film, dyed layer and photomask

At first, shown in Figure 19 (a), adopt the method identical, on glass substrate 31, form optical reflection film 35, dyed layer 37 and photomask 39 with the 2nd embodiment.

(2) bed thickness is adjusted the formation of layer

Next, shown in Figure 19 (b), identical with the 2nd embodiment, after carrying out multiple-exposure or halftone exposure, by using developer solution to develop, form and comprise the thick-layer portion 40a corresponding with reflector space and adjust layer 40 with the bed thickness of the corresponding 40b of thin layer portion of regional transmission, above-mentioned multiple-exposure uses a plurality of photomasks of different graphic, and above-mentioned halftone exposure use partly makes the different half-tone mask of optical transmission rate.

And, owing to the dip plane on the border step that vertically forms thick-layer portion and thin layer portion, thereby can reduce to reduce the area in poor display zone from the width of this step part that the real estate vertical direction is seen.Thereby, in the liquid crystal indicator of manufacturing, the display characteristic of contrast etc. is improved.

(3) formation of scan electrode and conducting parts

Next, identical with the 2nd embodiment shown in Figure 19 (c), on the 40a of thick-layer portion of bed thickness adjustment layer and on the 40b of thin layer portion, form scan electrode 33.

After this, shown in Figure 19 (d), configuration is as the conductive material 140 of conducting parts, so that the scan electrode 33b on scan electrode 33a on the 40a of thick-layer portion and the 40b of thin layer portion conducts outside the viewing area outside the A of viewing area.For example, when using the aluminium film, can similarly form with the formation method of above-mentioned reflectance coating as the conducting parts.

2. other operation

For other device substrate manufacturing process, paste operation and liquid crystal material injection process etc., because can be identical, so omit herein explanation with the 2nd embodiment.

[the 5th embodiment]

The 5th embodiment is the example of liquid crystal indicator that the transflective liquid crystal display device with the 1st embodiment is used for adopting as on-off element the active matrix mode of TFT element, and this TFT element is a kind of three terminal type active components.

The sectional view of the liquid crystal indicator 210 that Figure 20 (a) expression the 5th embodiment is related, the planimetric map of Figure 20 (b) expression liquid crystal indicator 210.Shown in this Figure 20 (a), liquid crystal indicator 210, its subtend substrate (the 1st substrate) 230 and device substrate (the 2nd substrate) 260 utilize encapsulant (not shown) to paste on their peripheral part, and form enclosing liquid crystal material 221 in the gap that is surrounded by subtend substrate 230, device substrate 260 and encapsulant.

In addition, subtend substrate 230 is formed by glass, plastics etc., and possesses on this subtend substrate 230: color filter is dyed layer 237 just; Counter electrode 233 is formed on this dyed layer 237; And alignment films 245, be formed on this counter electrode 233.In addition, between the dyed layer 237 and counter electrode 233 of reflector space R, possess to be used for making and postpone to be able to optimized bed thickness and adjust layer 240.

At this, counter electrode 233 is that a kind of 1TO of employing etc. is formed at the planar electrode on the whole zone on subtend substrate 230 surfaces.In addition, dyed layer 237 with the position of pixel electrode 263 subtends of device substrate 260 sides on, possess any color-filter element of all kinds of R (red), G (green), B (indigo plant) or C (dark green), M (peony), Y (yellow) etc. and so on.And, near the dyed layer 237 and with pixel electrode 263 not on the position of subtend, black mask or black matrix" photomask 239 just is set.

In addition, formed by glass, plastics etc. with the device substrate 260 of subtend substrate 230 subtends, and possess on this device substrate 260: the TFT element 269 as active component plays a role as on-off element; With pixel electrode 263, clip the upper strata that transparent dielectric film 280 ground are formed at TFT element 269.

At this, the optical reflection film 295 (263a) that pixel electrode 263 double as on reflector space R is used for reflecting demonstration forms, and utilizes ITO etc. to form as transparency electrode 263b on regional transmission T.In addition, as the optical reflection film 295 of pixel electrode 263a, for example the light reflective material by Al (aluminium), Ag (silver) etc. and so on forms.And, on pixel electrode 263, form alignment films 285, and this alignment films 285 is implemented to handle as the friction of orientation process.

In addition, on surface, the outside of subtend substrate 230 (just, the upside of Figure 20 (a)), form polarizer 247, and on it, form polarization plates 249.Equally, on surface, the outside of device substrate 260 (just, the downside of Figure 20 (a)), form polarizer 287, and under it, form polarization plates 289.And then, below device substrate 260, dispose backlight assembly (not shown).

In addition, TFT element 269 has: gate electrode 271 is formed on the device substrate 260; Gate insulating film 272 is formed on the whole zone of device substrate 260 on this gate electrode 271; Semiconductor layer 291 clips this gate insulating film 272 and is formed on the top position of gate electrode 271; Source electrode 273 inserts and puts contact electrode 277 in a side of this semiconductor layer 291 and forms; And drain electrode 266, being situated between at the opposite side of semiconductor layer 291 is formed by contact electrode 277.

In addition, gate electrode 271 extends from grid route bus (not shown), and source electrode 273 extends from source bus wiring (not shown).In addition, the grid route bus is along the horizontal expansion of device substrate 260 and to vertically forming many abreast with equal intervals, and source bus wiring clips gate insulating film 272 and grid route bus across to longitudinal extension, and to laterally forming many abreast with equal intervals.

This grid route bus is connected with IC (not shown) with liquid crystal drive, for example works as sweep trace, and the source bus wiring is connected with IC (not shown) with other driving on the other hand, for example works as signal wire.

In addition, pixel electrode 263 is formed at, on the zone except that the part corresponding with TFT element 269 among the square region of being divided by the wiring of cross one another grid route bus and source bus.

At this, grid route bus and gate electrode for example can be waited by chromium, tantalum and form.In addition, gate insulating film 272 is for example waited and is formed by silicon nitride (SiNx), monox (SiOx).Semiconductor layer 291 for example can be waited by doping a-Si, polysilicon, CdSe and form.Moreover contact electrode 277 for example can be waited by a-Si and form, source electrode 273 and for example can adopt titanium, molybdenum, aluminium to wait with its all-in-one-piece source bus wiring and drain electrode 266 to form.

In addition, organic insulating film 280 covering gate route bus, source bus wiring and TFT element 269 are formed on the whole zone on the device substrate 260.But, on the part corresponding of organic insulating film 280, form contact hole 283, and carry out the conducting between the drain electrode 266 of pixel electrode 263 and TFT element 269 at the position of this contact hole 283 with drain electrode 266.

In addition, this organic insulating film 280 on the zone corresponding with reflector space R, has convex-concave pattern as shape at random, and this convex-concave pattern is formed by the rule or the irregular repetitive pattern of teat and low-lying portion.Its result is, causes the optical reflection film 295 (263a) at organic insulating film 280 superimposed layers, has the light reflective graphics that is formed by convex-concave pattern too.But this convex-concave pattern is not formed on the regional transmission T.

On have in the liquid crystal indicator 210 of the sort of structure, when reflecting demonstration, the exterior light of sunshine, room lighting light etc. incides the liquid crystal indicator 210 from subtend substrate 230 sides, and arrive on the optical reflection film 295 by dyed layer 237 and liquid crystal material 221 etc., and reflect once more by liquid crystal material 221 and dyed layer 237 etc. at this, penetrate to the outside from liquid crystal indicator 210, reflect demonstration whereby.

On the other hand, when carrying out the transmission demonstration, backlight assembly (not shown) is lighted, and pass through the transparency electrode 263b part of light transmission from the light of backlight assembly institute outgoing, and pass through dyed layer 237, liquid crystal material 221 etc. and penetrate to the outside of display panels 220, carry out transmission whereby and show.

In addition, the liquid crystal indicator of present embodiment, the pixel column that the pixel that reflector space and regional transmission are arranged by a direction at the viewing area interior span constitutes and be configured to band shape.In addition, shown in Figure 20 (a), on subtend substrate 230, have bed thickness in order to adjust the delay in reflector space and the regional transmission and adjust layer 240, this bed thickness adjustment layer has: the 240a of thick-layer portion is disposed on the reflector space; With the 240b of thin layer portion, be disposed on the regional transmission.

And, bed thickness is adjusted layer 240 in the viewing area, by having the step part that the dip plane 217 on the border step of 240a of thick-layer portion and the 240b of thin layer portion is vertically formed, can reduce the width of this step part when the real estate vertical direction is seen, and reduce the area in poor display zone.

In addition, outside the viewing area, shown in Figure 21 (a)～(b), owing to have mitigation portion 211, be used for making the step on thick-layer portion and thin layer portion border to relax, and in this mitigation portion 211, the electrode 233a in the thick-layer portion is connected with electrode 233b in the thin layer portion, thereby guaranteed conducting property, perhaps, the extension of the electrode in electrode in the thick-layer portion and the thin layer portion is set to outside the viewing area, and strides those electrode ground configuration conducting parts, guarantee conducting property, the aftermentioned situation is not shown.Thereby, even in the viewing area, make the step on thick-layer portion and thin layer portion border steeper, there is generating electrodes to form not good danger, also because outside the viewing area, the conducting property of electrode can be guaranteed, thereby the not good generation of work that produces because of broken string etc. can be prevented.

Thereby, can form following liquid crystal indicator, this liquid crystal indicator can reduce the area in poor display zone, and the optimization of seeking to postpone, and display characteristic is good.

The planimetric map and the sectional view of the subtend substrate that Figure 21 (a)～(b) expression is as above constituted.Subtend substrate 230 in the liquid crystal indicator of present embodiment, its planar electrode 233 is disposed at above-mentioned bed thickness and adjusts on the layer 240, in the viewing area, the formation that broken string etc. takes place on bed thickness is adjusted the step on border of the thick-layer portion of layer 240 and thin layer portion sometimes is not good.But, outside the viewing area, owing to utilize above-mentioned mitigation portion 211, conducting parts, can guarantee the conducting property of planar electrode 233 integral body, thereby can prevent, and reduce the area in the poor display zone that the step because of the border of thick-layer portion and thin layer portion causes because of the not good generations of work that produce such as broken strings.

Thereby, even in the liquid crystal indicator that possesses the TFT element, display characteristic is improved.

[the 6th embodiment]

As the 6th embodiment involved in the present invention, the electronic equipment for possessing any liquid crystal indicator among the 1st, the 3rd and the 5th embodiment is specifically described.

Figure 22 is the integrally-built summary construction diagram of electronic equipment of expression present embodiment.This electronic equipment has: liquid crystal panel 20 possesses in liquid crystal indicator; With control gear 200, be used for electronic equipment is controlled.In addition, in Figure 22, the driving circuit 20b with liquid crystal panel 20 conceptually is divided into panel structure 20a and is made of semiconductor element (IC) etc. describes.In addition, preferably, control gear 200 has display message output source 201, display process circuit 202, power circuit 203 and timing generator 204.

In addition, preferably, display message output source 201 possesses: storer, by ROM (ReadOnly Memory, ROM (read-only memory)) or RAM formations such as (Random Access Memory, random access memory); Memory module is made of magnetic recording disk or optical recording etc.; And tuned circuit, be used for data image signal is carried out tuning output; It constitutes, and according to the various clock signals that generated by timing generator 204, with the forms such as picture signal of predetermined format display message is supplied to display process circuit 202.

In addition, preferably, display process circuit 202 possesses the serial-to-parallel change-over circuit, amplifies well-known various circuit such as negative circuit, rotation circuit, gamma circuit and clamp circuit, and carry out the processing of the display message of being imported, this image information and clock signal clk are supplied with driving circuit 20b together.Moreover preferably, driving circuit 20b comprises the 1st electrode drive circuit, the 2nd electrode drive circuit and check circuit.In addition, power circuit 203 has the function of supplying with predetermined voltage to above-mentioned each constitutive requirements respectively.

And, because so long as the electronic equipment of present embodiment, just possesses following liquid crystal indicator, thereby can realize that the display characteristic excellent images shows, above-mentioned liquid crystal indicator, in the viewing area, vertically form the dip plane on the border step of the thick-layer portion be used for constituting multiple gap and thin layer portion, and outside the viewing area, guarantee the conducting property of the electrode in thick-layer portion and the thin layer portion.

According to the present invention, because in the viewing area, vertically form the dip plane on the border step of the thick-layer portion be used for constituting multiple gap and thin layer portion, and outside the viewing area, guarantee the conducting property of the electrode in thick-layer portion and the thin layer portion, thereby can form following liquid crystal indicator, it is not good that this liquid crystal indicator can reduce work, and reduce the area in poor display zone, display characteristic is improved.Thereby, headed by liquid crystal indicator and electronic equipment such as pocket telephone and personal computer etc., can be used in LCD TV, view finder formula or monitor video tape recorder, automobile navigation apparatus, pager, electronic notebook, desk-top electronic calculator, word processor, workstation, videophone, the POS terminal of direct viewing type and possess in the electronic equipment etc. of touch panel.

Claims

1. the liquid crystal indicator of a Transflective, it possesses: the 1st substrate, it possesses the 1st electrode; The 2nd substrate, it possesses the 2nd electrode; And liquid crystal material, it is held between the 1st substrate and the 2nd substrate; And possess the viewing area that comprises a plurality of pixels, these a plurality of pixels have reflector space and regional transmission respectively, being characterized as of this liquid crystal indicator:

Above-mentioned reflector space and regional transmission in above-mentioned viewing area, are striden the pixel column of arranging by a direction that above-mentioned pixel constituted, and are configured to band shape,

Above-mentioned the 1st substrate possesses bed thickness and adjusts layer in order to adjust the delay in above-mentioned reflector space and the regional transmission, and this bed thickness is adjusted layer, has: thick-layer portion, and it is disposed in the above-mentioned reflector space; With thin layer portion, it is disposed in the above-mentioned regional transmission; It is in above-mentioned viewing area, have the step part that the dip plane with the border of above-mentioned thick-layer portion and thin layer portion vertically forms, and outside above-mentioned viewing area, have mitigation portion, this mitigation portion is used for making the step on the border of above-mentioned thick-layer portion and thin layer portion to relax

Above-mentioned the 1st electrode, adjust the upper strata of layer at above-mentioned bed thickness, step up and state pixel column ground and form, and extend respectively and be set to outside the above-mentioned viewing area, formed the 1st electrode connects in above-mentioned mitigation portion in the reflector space of identical at least above-mentioned pixel column and the regional transmission.

2. liquid crystal indicator according to claim 1 is characterized by:

With the dip plane in the above-mentioned viewing area during as the 1st dip plane, above-mentioned mitigation portion comprises than above-mentioned the 1st dip plane and the 2nd mild dip plane of real estate angulation.

3. liquid crystal indicator according to claim 1 is characterized by:

Above-mentioned mitigation portion comprises a plurality of steps that connect above-mentioned thick-layer portion and thin layer portion.

4. the liquid crystal indicator of a Transflective, it possesses: the 1st substrate, it possesses the 1st electrode; The 2nd substrate, it possesses the 2nd electrode; And liquid crystal material, it is held between the 1st substrate and the 2nd substrate; And possess the viewing area that comprises a plurality of pixels, these a plurality of pixels have reflector space and regional transmission respectively, being characterized as of this liquid crystal indicator:

Above-mentioned the 1st substrate possesses bed thickness and adjusts layer in order to adjust the delay in above-mentioned reflector space and the regional transmission, and this bed thickness is adjusted layer, has: thick-layer portion, and it is disposed in the above-mentioned reflector space; With thin layer portion, it is disposed in the above-mentioned regional transmission; It comprises, the step part that the dip plane on the border of above-mentioned thick-layer portion in the above-mentioned viewing area and thin layer portion is vertically formed,

Above-mentioned the 1st electrode on the upper strata of above-mentioned bed thickness adjustment layer, steps up and state the formation of pixel column ground, and extension is set to outside the above-mentioned viewing area respectively,

Stride formed above-mentioned the 1st electrode in the reflector space of identical at least above-mentioned pixel column and the regional transmission, above-mentioned the viewing area outside with extending the position that is set to, dispose the conducting parts.

5. according to each described liquid crystal indicator in the claim 1～4, it is characterized by:

Above-mentioned dip plane in the above-mentioned viewing area and real estate angulation are the value in 60～90 ° of scopes.

6. according to each described liquid crystal indicator in the claim 1～5, it is characterized by:

The 1st electrode of above-mentioned reflector space and regional transmission is in the conducting of the both sides of above-mentioned viewing area.

7. according to each described liquid crystal indicator in the claim 1～6, it is characterized by:

On above-mentioned the 1st electrode, the position suitable with above-mentioned step part in the above-mentioned pixel is provided with the slit.

8. according to each described liquid crystal indicator in the claim 1～7, it is characterized by:

Above-mentioned the 2nd substrate is the device substrate of a kind of TFD of possessing element or TFT element.

9. the manufacture method of a liquid crystal indicator, this liquid crystal indicator possesses: the 1st substrate, it possesses the 1st electrode; The 2nd substrate, it possesses the 2nd electrode; And liquid crystal material, it is held between the 1st substrate and the 2nd substrate; And possess the viewing area that comprises a plurality of pixels, these a plurality of pixels have reflector space and regional transmission respectively; Above-mentioned reflector space and regional transmission in above-mentioned viewing area, are striden the pixel column of arranging by a direction that above-mentioned pixel constituted and are configured to band shape, being characterized as of this manufacture method,

Comprise:

On above-mentioned the 1st substrate, form the operation of photoresist material layer;

In order to adjust the delay in above-mentioned reflector space and the regional transmission, form bed thickness and adjust the operation of layer, this bed thickness is adjusted layer, configuration thick-layer portion in above-mentioned reflector space, configuration thin layer portion in above-mentioned regional transmission in above-mentioned viewing area, has the step part that the dip plane with the border of above-mentioned thick-layer portion and thin layer portion vertically forms, and have mitigation portion outside above-mentioned viewing area, this mitigation portion is used for making the step on the border of above-mentioned thick-layer portion and thin layer portion to relax; And

Form the operation of the 1st electrode on the upper strata of above-mentioned bed thickness adjustment layer, so that the 1st electrode in the reflector space of identical at least above-mentioned pixel column and the regional transmission in formed this reflector space and the regional transmission, connect in above-mentioned mitigation portion, the 1st electrode is stepped up to state pixel column and extend and is set to other places, above-mentioned viewing area and is configured.

10. the manufacture method of a liquid crystal indicator, this liquid crystal indicator possesses: the 1st substrate, it possesses the 1st electrode; The 2nd substrate, it possesses the 2nd electrode; And liquid crystal material, it is held between the 1st substrate and the 2nd substrate; And possess the viewing area that comprises a plurality of pixels, these a plurality of pixels have reflector space and regional transmission respectively; Above-mentioned reflector space and regional transmission in above-mentioned viewing area, are striden the pixel column of arranging by a direction that above-mentioned pixel constituted and are configured to band shape, being characterized as of this manufacture method,

Comprise:

In order to adjust the delay in above-mentioned reflector space and the regional transmission, form bed thickness and adjust the operation of layer, this bed thickness is adjusted layer, in above-mentioned reflector space, dispose thick-layer portion, in above-mentioned regional transmission, dispose thin layer portion, in above-mentioned viewing area, has the step part that the dip plane with the border of above-mentioned thick-layer portion and thin layer portion vertically forms;

Adjust the upper strata of layer at above-mentioned bed thickness, step up to state pixel column and extend and be set to other places, above-mentioned viewing area, form the operation of above-mentioned the 1st electrode; And

Stride formed above-mentioned the 1st electrode in the reflector space of identical at least above-mentioned pixel column and the regional transmission, extend the ground, position that is set to above-mentioned the viewing area outside, dispose the operation of conducting parts.

11. an electronic equipment is characterized by:

Possesses any liquid crystal indicator described in the claim 1～8.