CN1776476A - Electrostatic cimple-beam interference light modulator - Google Patents
Electrostatic cimple-beam interference light modulator Download PDFInfo
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- CN1776476A CN1776476A CN 200510057391 CN200510057391A CN1776476A CN 1776476 A CN1776476 A CN 1776476A CN 200510057391 CN200510057391 CN 200510057391 CN 200510057391 A CN200510057391 A CN 200510057391A CN 1776476 A CN1776476 A CN 1776476A
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- moving reflector
- flat board
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- fixing glass
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Abstract
The modulator is composed of substrate, control circuit, low electrodes layer, simply supported beam, movable reflector and fixed glass plate. Being formed on the substrate, low electrodes layer is contacted to control ends of each electrode in control circuit. The simply supported beam and support anchor are formed on the insulating layer, which is deposited on the low electrodes layer. Array of movable reflector is supported by the support anchor. The said array and the low electrodes layer constitutes parallel plate condenser with variable gap. There is certain gap between the fixed glass plate and the movable reflector. Shape of aircraft wing is adopted in the beam in order to reduce topographic effect and increase flatness of surface of movable reflector. Vertical up/down motion of the movable reflector happens under action of electrostatic force. Thus, the modulator modulates phase of light to realize switching state. Features are: quick response and simple structure.
Description
Technical field
The present invention relates to a kind of spatial light modulation device, in particular, the present invention is a kind of by distance between static driven change glass plate and the moving reflector, make incident light by the time optical path difference change, utilize the interference of light principle to realize static interference light modulator to the incident light modulation.
Background technology
Prior art discloses the multiple photomodulator based on MEMS technology that can use separately or use with other modulators, and these modulators comprise digital micro-mirror device (DMD) and grating light valve (GLV) etc.
DMD is up to a million the modulators that deflectable reflection micro mirror constitutes by the manufacturing of MEMS technology.Total light extraction efficiency of DMD image device improves greatly, and modulating speed is fast, and contrast, brightness and homogeneity are all very outstanding, and the image of the close clearance order projection of micro mirror produces finer seamless picture, and it is not high to analyze Z-TEK.But still there is complex manufacturing process in it, the shortcoming that yields is low.
GLV is that the movable grizzly bar in a series of intervals constitutes, and it is to utilize the optical grating diffraction principle to realize the light signal modulation, and its manufacturing process is simple, and response speed is faster, and control circuit is simple, the yield rate height.Its shortcoming is: cannot say for sure to demonstrate,prove the grizzly bar that constitutes grating and be in the same plane; Gap affects diffraction efficiency between the grizzly bar; Real useful area is too little on the removable slit, and therefore single elemental area is big, makes GLV only be fit to do linear array, must add optical scanning mechanism and just can be used for optical imaging system.
Summary of the invention
Low for the useful area of the shortcoming that overcomes the DMD complex process and GLV, as to be difficult to be integrated into face battle array shortcoming, the object of the present invention is to provide a kind of electrostatic cimple-beam interference light modulator, free beam adopts the class wing shapes, can reduce orographic effect, increases the moving reflector surface smoothness.Adopt the interference of light principle that incident light is modulated, the technology of device is made simply, the yields height, modulating speed is fast, and optics effectively utilizes area big.
The technical solution adopted in the present invention is as follows:
The present invention discloses a kind of electrostatic cimple-beam interference light modulator, and it mainly comprises following structure:
1, substrate;
2, be manufactured on control circuit on the substrate;
3, the lower electrode layer that on substrate, forms, each cell electrode control end of lower electrode layer and control circuit contacts;
4, be deposited on insulation course on the lower electrode layer;
5, free beam that on insulation course, forms and support anchor, free beam adopts the class wing shapes;
6, be connected the moving reflector array that is supported on the support anchor, moving reflector array and lower electrode layer constitute the air chamber of gap variable, each moving reflector is by the top electrode that is connected to form between the free beam, and common ground, a pixel of a corresponding light modulator arrays of moving reflector, the corresponding photomodulator unit that forms of each moving reflector all can independently apply bias voltage, make moving reflector do vertical movement up and down, the flat board that constitutes phase variable is interfered device, forms the dot matrix of different interference effects;
7, cover the fixing glass flat board of all moving reflector tops by the bonding mode, four angles of fixing glass flat board are supported on the substrate, leave certain spacing between fixing glass flat board and the moving reflector, the dull and stereotyped upper and lower surface plated film of fixing glass is realized effective transmission and reflection.
Distance can change by the bottom electrode change in voltage between described fixed flat planar glass and the moving reflector, between not during making alive when being biased voltage V, incident light is π through the out-of-date phase differential that will form.
This photomodulator adopts static driven, its principle of work is: reflect on the glass plate surface when incident light incides device surface, transmitted light incides moving reflector behind glass plate simultaneously, through producing certain phase difference with reflected light behind the glass plate, the phase differential size is by the distance decision between glass plate and the movable reflecting surface, when phase differential is zero, light beam interferes long mutually, behind lens, form bright spot, and phase differential is when being π, light beam interferes mutually and disappears, and forms dim spot behind lens, thereby realizes incident light is carried out phase modulation (PM).
This optical modulation device can adopt the manufacturing of MEMS technology, and it and existing IC technology are compatible, at silicon chip higher slice structure device.
Advantage of the present invention is: device is a two-dimensional array, be used for need not to add optical scanning mechanism when image shows, therefore simplified optical system, because it is its simple double-decker, simple in structure, yields is high, can realize with general IC surface processing technique fully, solved the DMD complex process, the problem that yields is low adopts the static driven moving reflector simultaneously, modulating speed is fast, and simultaneously optics effectively utilizes area to compare GLV to improve a lot; The simple beam structure that adopts has adopted the structure of class wing, has improved the depth of parallelism of moving reflector.
This modulator can be widely used on high definition digital television, Projection Display, printer, optical communication, the spectrometer.
Description of drawings
Fig. 1: electrostatic cimple-beam interference light modulator structural drawing
Fig. 2: the partial structurtes figure that removes the electrostatic cimple-beam interference light modulator behind the fixing glass flat board
Fig. 3: the cellular construction figure that removes the electrostatic cimple-beam interference light modulator behind the fixing glass flat board
Fig. 4: the structural drawing after removing moving reflector on Fig. 4 basis
Fig. 5 A and Fig. 5 B: the sectional view of electrostatic cimple-beam interference light modulator list pixel under the different operating state
Fig. 6: during the light beam oblique incidence, electrostatic cimple-beam interference light modulator is based on the shear interference optical schematic diagram
Fig. 7: during light beam normal incidence, electrostatic cimple-beam interference light modulator is based on the shear interference optical schematic diagram
Among the figure, 1 substrate; 2 lower electrode layers; 3 insulation courses; The gap of 4 free beams and bottom electrode; 5 free beams; 6 support anchor; 7 moving reflectors; 8 fixing glass flat boards
Embodiment
The invention will be further described below in conjunction with the drawings and specific embodiments:
Referring to Fig. 1, Fig. 3 and Fig. 4, the manufacturing process of this modulator is as follows: production control circuit on substrate 1, splash-proofing sputtering metal and photoetching thereon forms lower electrode layer 2, each cell electrode control end of lower electrode layer 2 and control circuit contacts, the certain thickness insulation course 3 of deposit, splash-proofing sputtering metal aluminium forms the free beam 5 of class wing shapes and supports anchor 6, supporting deposit formation moving reflector 7 on the anchor again, the fixing glass flat board 8 (can be stationary mirror again) that will be coated with semi-permeable diaphragm at lower surface covers moving reflector 7 tops by the mode of bonding at last, four angles of fixing glass flat board 8 are supported on the substrate 1, dull and stereotyped 8 lower surfaces of fixing glass and moving reflector 7 spacings make incident light by the back from fixing glass planar surface reflected light and by the moving reflector reflection again between fixing glass flat board transmitted light phase differential be π.
By Fig. 2 as seen, a pixel of each moving reflector 7 respective devices, all moving reflectors 7 are whole as public top electrode by being connected to form between the free beam 5, but each moving reflector 7 can realize independently moving up and down, and control the light and shade attitude of this pixel.
Fig. 5 A and Fig. 5 B are the change in location situations of the moving reflector 7 of device under the different operating state, among the figure, and h
1Be electrostatic cimple-beam interference light modulator list pixel in dark attitude be distance between fixing glass flat board and the moving reflector; h
2Be electrostatic cimple-beam interference light modulator list pixel in bright attitude be distance between fixing glass flat board and the moving reflector; V is the voltage that drives the moving reflector motion.When bottom electrode does not apply voltage, incident light impinges perpendicularly on device array, because from the light of fixing glass flat board 8 reflection with have the optical path difference of odd-multiple half-wavelength from the light of moving reflector 7 reflections, be that phase differential is n π (n=1,3,5 ...), disappear by interfering mutually after dull and stereotyped 8 outgoing of fixing glass, correspond to the dark attitude of device this moment; And after bottom electrode applied suitable voltage, phase differential was zero, and is long mutually by interfering after dull and stereotyped 8 outgoing of fixing glass, corresponds to the bright attitude of device this moment; Vertical movement up and down takes place to the phase modulation (PM) of incident light in moving reflector 7 under the effect of electrostatic force, realize the switch attitude of light, when the light beam oblique incidence its optical schematic diagram as shown in Figure 6, incident beam A is through twice refraction and primary event, P point outgoing from figure, be light beam A ', incident beam B is through primary event, the also outgoing of P point, i.e. light beam B ' from figure, light beam A ' and B, the P point interferes again; H represents the distance between the fixing glass flat board and moving reflector in the electrostatic cimple-beam interference light modulator list pixel.When the oblique normal incidence of light beam, its optical schematic diagram as shown in Figure 7, incident beam A reflects at upper surface, P from figure
1Point outgoing, i.e. light beam A '; Incident beam A is through twice refraction, and primary event is also from the outgoing of P point, i.e. light beam A ", light beam A so ' and A " P in the drawings
1Point interferes.Same principle, light beam B ' and B " in the drawings P
2Point interferes.Change by distance h realizes that the phase appearance of interfering disappears.(dotted line of Fig. 7 is just in order clearly to see the path of light, and in fact incident light, reflected light, refract light do not have horizontal displacement)
Bias voltage among the present invention applies and adopts this area existing mature technology, adopts driven more.According to different array requests, adopt active driving or passive drive mode.The electrode outlet line of driving circuit can obtain when making this structure simultaneously.
Invention has been described more than to adopt example.But those those skilled in the art have read become after the disclosure file open-and-shut improvement and modification, still belong to the application's spirit and category.
Claims (4)
1. electrostatic cimple-beam interference light modulator is characterized in that it comprises:
A. substrate;
B. be manufactured on the control circuit on the substrate;
C. the lower electrode layer that on substrate, forms, each cell electrode control end of lower electrode layer and control circuit contacts;
D. be deposited on the insulation course on the lower electrode layer;
E. free beam that on insulation course, forms and support anchor;
F. be connected and be supported on the moving reflector array that supports on the anchor, moving reflector array and lower electrode layer constitute the air chamber of gap variable, each moving reflector is by the top electrode that is connected to form between the free beam, and common ground, a pixel of a corresponding light modulator arrays of moving reflector, the corresponding photomodulator unit that forms of each moving reflector independently applies bias voltage, make moving reflector do vertical movement up and down, the flat board that constitutes phase variable is interfered device, forms the dot matrix of different interference effects;
G. cover the fixing glass flat board of moving reflector top by the bonding mode, four angles of fixing glass flat board are supported on the substrate, leave spacing between fixing glass flat board and the moving reflector, the dull and stereotyped upper and lower surface plated film of fixing glass is realized effective transmission and reflection.
2. photomodulator according to claim 1, it is characterized in that: distance can change by the bottom electrode change in voltage between fixing glass flat board and the moving reflector, between not during making alive when being biased voltage V, incident light through out-of-date be π with the phase differential that forms.
3. photomodulator according to claim 1 is characterized in that: moving reflector adopts static driven.
4. photomodulator according to claim 1 is characterized in that: free beam adopts the class wing shapes.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2005100573911A CN100362387C (en) | 2005-11-18 | 2005-11-18 | Electrostatic cimple-beam interference light modulator |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2005100573911A CN100362387C (en) | 2005-11-18 | 2005-11-18 | Electrostatic cimple-beam interference light modulator |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1776476A true CN1776476A (en) | 2006-05-24 |
| CN100362387C CN100362387C (en) | 2008-01-16 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB2005100573911A Expired - Fee Related CN100362387C (en) | 2005-11-18 | 2005-11-18 | Electrostatic cimple-beam interference light modulator |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104730709A (en) * | 2015-04-15 | 2015-06-24 | 重庆大学 | Phase modulation type micromirror array programmable fresnel zone plate and zooming method thereof |
| CN110392857A (en) * | 2017-03-14 | 2019-10-29 | 浜松光子学株式会社 | Optical assembly |
| CN110799885A (en) * | 2017-07-06 | 2020-02-14 | 浜松光子学株式会社 | Optical assembly |
| CN114556185A (en) * | 2019-10-15 | 2022-05-27 | 德克萨斯仪器股份有限公司 | Phase space light modulation architecture based on MEMS |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5170283A (en) * | 1991-07-24 | 1992-12-08 | Northrop Corporation | Silicon spatial light modulator |
| JPH10260328A (en) * | 1997-03-19 | 1998-09-29 | Tokin Corp | Optical modulating element |
| SE9800665D0 (en) * | 1998-03-02 | 1998-03-02 | Micronic Laser Systems Ab | Improved method for projection printing using a micromirror SLM |
| JP2002277771A (en) * | 2001-03-21 | 2002-09-25 | Ricoh Co Ltd | Optical modulator |
| JP2004219843A (en) * | 2003-01-16 | 2004-08-05 | Seiko Epson Corp | Optical modulator, and display device and their manufacturing methods |
-
2005
- 2005-11-18 CN CNB2005100573911A patent/CN100362387C/en not_active Expired - Fee Related
Cited By (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104730709A (en) * | 2015-04-15 | 2015-06-24 | 重庆大学 | Phase modulation type micromirror array programmable fresnel zone plate and zooming method thereof |
| CN110392857B (en) * | 2017-03-14 | 2021-09-21 | 浜松光子学株式会社 | Optical assembly |
| CN110392857A (en) * | 2017-03-14 | 2019-10-29 | 浜松光子学株式会社 | Optical assembly |
| US11579438B2 (en) | 2017-03-14 | 2023-02-14 | Hamamatsu Photonics K.K. | Optical module |
| CN110799885B (en) * | 2017-07-06 | 2022-02-25 | 浜松光子学株式会社 | Optical assembly |
| US11067380B2 (en) | 2017-07-06 | 2021-07-20 | Hamamatsu Photonics K.K. | Optical module |
| US11187579B2 (en) | 2017-07-06 | 2021-11-30 | Hamamatsu Photonics K.K. | Optical device |
| US11209260B2 (en) | 2017-07-06 | 2021-12-28 | Hamamatsu Photonics K.K. | Optical module having high-accuracy spectral analysis |
| US11054309B2 (en) | 2017-07-06 | 2021-07-06 | Hamamatsu Photonics K.K. | Optical module |
| CN110799885A (en) * | 2017-07-06 | 2020-02-14 | 浜松光子学株式会社 | Optical assembly |
| US11624605B2 (en) | 2017-07-06 | 2023-04-11 | Hamamatsu Photonics K.K. | Mirror unit and optical module |
| US11629946B2 (en) | 2017-07-06 | 2023-04-18 | Hamamatsu Photonics K.K. | Mirror unit and optical module |
| US11629947B2 (en) | 2017-07-06 | 2023-04-18 | Hamamatsu Photonics K.K. | Optical device |
| US11635290B2 (en) | 2017-07-06 | 2023-04-25 | Hamamatsu Photonics K.K. | Optical module |
| US11879731B2 (en) | 2017-07-06 | 2024-01-23 | Hamamatsu Photonics K.K. | Mirror unit and optical module |
| CN114556185A (en) * | 2019-10-15 | 2022-05-27 | 德克萨斯仪器股份有限公司 | Phase space light modulation architecture based on MEMS |
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| Publication number | Publication date |
|---|---|
| CN100362387C (en) | 2008-01-16 |
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Granted publication date: 20080116 Termination date: 20101118 |