CN1776015A - Nano superhard composite film tool with high adhesion and its deposition method - Google Patents
Nano superhard composite film tool with high adhesion and its deposition method Download PDFInfo
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- CN1776015A CN1776015A CN 200510019890 CN200510019890A CN1776015A CN 1776015 A CN1776015 A CN 1776015A CN 200510019890 CN200510019890 CN 200510019890 CN 200510019890 A CN200510019890 A CN 200510019890A CN 1776015 A CN1776015 A CN 1776015A
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Abstract
The invention relates to a high adhesion nm super-hard compounding film cutting tool and the depositing. It is deposited nitride case, basal film, super-hard film, and self- lubricating film on the cutting tool. The invention has an entire metal cutting tool high quality coating blooming technology. It takes high efficiency plasma nitride-treat to enhance cutting tool basal body, and taking coating super-hard compounding film to make the film has high adhesive force. The invention could be used in kinds of mould and cutting tools.
Description
Technical field
The present invention relates to surface recombination reinforcing method in the field of new, particularly a kind of deposition method of nano super-lattice structured superhard composite film.
Background technology
Carry out ionitriding on the metal cutting tool surface earlier and handle, the composite treatment technology that plates hard films then is a kind of novel material surface strengthening technology, is to improve the highly effective method of coatings sticking power.If adopt the ionitriding of ordinary hot activated, need the temperature environment more than 500 ℃, nitriding time 5～6 hours, and also plated film and nitriding can not be finished in an equipment.Such process efficiency is low, and industrial production is difficult to accept.Dalian University of Technology Lee state minister in ancient times adopts the heated filament plasma source to improve ionitriding efficient, and 380 ℃ of following nitridings 3 hours, the surface formed the thick nitrided case of 10mm; Soft body material such as stainless steel is handled through nitriding, and the microhardness of material is increased to 7.3GPa.([J]
1Li Guoqing, Guan Bingyu, international vacuum and film, 2004 the 2nd phases, 67-73.) Japanese Nachi-fujikoshi company adopts hollow cathode rifle divergent bundle, improves gas ionization efficient, ionitriding was foreshortened to below 60 minutes, and the nitriding effect is fine.([J]
2T.Sato，K.Sugai，S.Ueda et al，Surf.Coat.Technol.169-170(2003)45-48。)
TiAlN (TiAlN) is widely used cutter hard coat, its microhardness 28GPa, and 700 ℃ of resistance to oxidation temperature also need further its performance of raising now.Chromium nitride aluminium (CrAlN) hard films and TiAlN (TiAlN) hard films have suitable microhardness, but its resistance to oxidation and wear-resistant is more used still not extensive at present.
The design of ganoine thin film in recent years develops towards the direction of multicomponent membrane and multilayer film, and the frontier of ganoine thin film development has been opened up in the appearance of nano super-lattice structured superhard film and nano-amorphous superhard composite film.([J]
3, Wu Dawei, vacuum, 2003 the 6th phases, 1～5.)
But, the cutter of suitableization plating superhard film, microhardness is technical indicator wherein, for the heavy lift cutting of difficult-to-machine material, adhesive force of coatings or even than the prior technical indicator of microhardness of coating.Yet improving coating adhesion is a technology that technical difficulty is very big, China is for the technical specifications national Specification of titanium nitride coating, titanium nitride coating adhere to depth test value, critical load LC 〉=40N, industry standard JB/ 8554-1997 stipulates lowlyer, LC 〉=30N.It is not enough that attached intensity technical indicator is like this felt adhesive force of coatings aborning deeply.The sedimentary cutter coat of overseas equipment generally can reach adhesion strength, LC＞70N.
Take a broad view of in recent years vacuum ion membrane plating equipment from the import of external famous producer, as from German CemeCon company, Britain Teer company, Switzerland Platit company, the PVD vaccum ion coater of imports such as Holland Hauzer company, though the configuration of equipment is not high, many advanced persons' coating technique is not all used, yet the price of equipment is very expensive.These equipment have common characteristics: design perfect, process meticulous, working stability, thereby coating quality is very good.The cutter plating ganoine thin film technology of China is very big with external advanced level gap.Famous Balzers company has designed the novel nano coated tool coating equipment of being made up of eight cover magnetron sputtering targets, and this advanced person's coating equipment misaligns state's outlet at present.
Summary of the invention
Purpose of the present invention just is to overcome the shortcoming and defect that prior art exists, and a kind of nano superhard composite film tool with high adhesive force and deposition method thereof of suitable suitability for industrialized production is provided.
The object of the present invention is achieved like this:
1, chromium nitride aluminium (CrAlN) and TiAlN (TiAlN) hard coat are combined into the superstructure composite membrane, the microhardness of composite membrane is expected to reach more than the 40GPa, and the resistance to oxidation temperature is brought up to 950 ℃.
2, adopt ion to strengthen ionitriding and handle and other technical measures, can make adhesive force of coatings reach LC＞80N, depositing operation is expected to reach LC＞90N after grasping skillfully.
3, durable cutter coat preferably can reach more than the 10 μ m, and this need solve the stress of film growth.In addition, the toughness of film and compactness, the scale resistance of film and chemical stability etc. have a significant impact the durability of coated cutting tool; The frictional coefficient of film and wear rate all have very high technical requirements.Single obviously thin-film material can't satisfy above-mentioned many technical requirementss, and the coating of the complex optimum that the present invention adopts can stand the test of production practice.
In a word, the superhard compound coating of plating among the present invention, start with from the configuration and the perfect and harmonious coating process of formulation of the design of film system, coating equipment working target, adopt advanced coating technique as far as possible, to improve every performance index of compound coating, this is a suitable suitability for industrialized production, and the high-quality that adapts to the modern manufacturing industry needs is coated with deposition method, tries hard to dwindle the gap of China's metal cutting tool plating superhard film and external advanced level.
By superhard composite film deposition method provided by the invention, can guarantee that coating quality is good, production efficiency height, production cost are low.
One, the film of composite membrane system design
The superhard composite film that metal cutting tool and mould use requires to have " superhard, tough, high temperature resistant, low abrasion, self-lubricating " and very high sticking power.Obviously, any single-material all can not satisfy above-mentioned technical requirements comprehensively.The deposition superhard composite film should develop towards the direction of diversification, multilayer film.With the metal cutting tool is example, and the present invention deposits following film successively at tool surface and is:
As Fig. 1, the first layer is to form nitrided case A on tool matrix on cutter 9, and the second layer has been the Ranvier's membrane B of adhesive attraction, and the 3rd layer is superhard film C, and the 4th layer is the self-lubricating film D of low-friction coefficient, and all membrane pump is once finished on a vacuum plating unit;
Described nitrided case A is the efficient nitrided case of plasma, depth of nitration 20～40 μ m.
Described Ranvier's membrane B is titanium nitride (TiN) or a titanium carbide (TiC) of mixing yttrium;
Described superhard film C is n layer TiAlN (TiAlN) C
1With chromium nitride aluminium (CrAlN) C
2Alternating growth, 1000≤n≤9000.
Described self-lubricating film D is a kind of diamond-film-like (DLC-Si) of mixing silicon (Si).
Two, the deposition method of composite membrane
1, the allocation plan of coating equipment
The present invention deposits superhard composite film on many target position vaccum ion coater, this coating equipment is made up of electrothermal tube 7, bleeding point 8 and supporting power supply, the Controlling System etc. of vacuum chamber 4, fire door 5, work rest 6, baking workpiece;
As Fig. 2, the present invention is provided with electric arc target 1, magnetic controlling target 2, ion source 3 altogether in vacuum chamber 4.
Specifically,, the cylindrical electric arc target 1 of a cover is set, installs perpendicular to the chassis in the central authorities of vacuum chamber 4;
Outer wall place in vacuum chamber 4, counter clockwise, be disposed with magnetic control one target 2.1, magnetic control two targets 2.2, magnetic control three targets 2.3, magnetic control four targets 2.4, magnetic control five targets 2.5, magnetic control six targets 2.6, wherein magnetic control one target 2.1, magnetic control three targets 2.3, magnetic control four targets 2.4,2.6 liang of adjacent target of magnetic control six targets are 90 ° each other, are symmetric arrangement;
In vacuum chamber fire door 5 and the position relative, be respectively arranged with 3,1 and No. 2 ion source 3,2 of No. 1 ion source with fire door 5;
Electric arc target 1, magnetic controlling target 2, ion source 3 and work rest 6 are connected with arc target power supply, magnetic controlling target power supply, ion source power supply, the grid bias power supply of auxiliary work separately respectively.
The target of electric arc target 1 is a titanium alloy of mixing yttrium, alloying constituent 95Ti-5y at.%;
The target of magnetic control one target 2.1, magnetic control three targets 2.3, magnetic control four targets 2.4, magnetic control six targets 2.6 is titanium aluminium (Ti-AI) alloy, alloying element ratio ranges 50Ti-50AI～30Ti-70AI at.%;
The target of magnetic control two targets 2.2 and magnetic control five targets 2.5 is a high purity graphite.
2, the step of deposition composite membrane
(1) deposition nitrided case A
Carry out the ionitriding processing on the metal cutting tool surface earlier and plate superhard composite film then, in coating equipment, once finish.This composite treatment technology is a kind of novel material surface strengthening technology, is to improve the highly effective method of coating adhesion.The present invention adopts the efficient nitriding treatment technology of plasma, and the workpiece baking is heated to 450 ± 5 ℃, and control air pressure is 1.0Pa, adds negative bias-150 ± 5V on workpiece 9, opens ion source 3 and produces Ar-N
2The plasma body of gas mixture, control anode voltage 150 ± 10V, plasma current 20 ± 2A, workpiece 9 is carried out plasma nitriding to be handled, through 30～60 minutes, the nitrogen iontophoretic injection degree of depth 20～40 μ m, the microhardness of rapid steel substrate is brought up to 12-14GPa from 7.5GPa.The characteristics of this technology are that the nitriding quality is good, and surface strengthening is remarkably productive, and workpiece deformation is little.
(2) deposition basis film B
At the single phase film of workpiece surface deposition 0.3-0.5 μ m thickness, the stress that helps further improving adhesive force of coatings and reduce deep layer.It is basal layer that rapid steel class cutter adopts titanium-nitride (TiN) usually; And Wimet class cutter should adopt titanium carbide (TiC) is basal layer, can improve the matching of deposited film and body material like this, helps the raising of coating adhesion.The titanium alloy target of yttrium is mixed in employing, and doped rare earth element yttrium (y) can impel the titanium nitride (TiN) or titanium carbide (TiC) grain refining of generation, thereby improves the wetting property of deposited film and body material.Adopting electric arc target 1 to come the deposition basis layer, is the ionization level height of the titanium particle of generation because electric arc target 1 is worked, and growth velocity is fast, and these measures all help the raising of coating adhesion.
In a word, adopt a cover electric arc target 1 to work independently and finish, the argon nitrogen mixed gas is a working gas, ratio of mixture Ar: N
2=1: 8; The film thickness that control is mixed the titanium nitride (TiN) of yttrium or mixed the titanium carbide (TiC) of yttrium is 0.3～0.5 μ m.In the deposition process, carrying that ion source produces can be bombarded the growth rete by ionic fluid in good time, can improve film adhesion.
(3) deposition superhard film C
Utilize quadruplet magnetic controlling target 2 deposition superhard film C.Still adopt ionic fluid that deposited film is played the assistant depositing effect.
Wherein the target of magnetic control one target 2.1 and magnetic control four targets 2.4 is titanium aluminium (TiAI) alloy, and its chemical element ratio ranges is 50Ti-50AI～30Ti-70AI at.%;
The target of magnetic control three targets 2.3 and magnetic control six targets 2.6 is chromium aluminium (CrAI) alloys, and its chemical element ratio ranges is the (at.% of 40Cr-60AI～30Cr-70AI).
During the deposition superhard film, above-mentioned quadruplet magnetic controlling target starts simultaneously, argon nitrogen (Ar-N
2) gas mixture is working gas, ratio of mixture Ar: N
2=3: 1.The workpiece 9 that loads on the work rest 6 is done planetary revolution and is added rotatablely moving of rotation in vacuum chamber 4.When its public affairs circles, on workpiece 9, plated four tunics successively, they are TiAIN/CrAIN/TiAIN/CrAIN successively.Because the chemical ingredients of TiAlN (TiAIN) and chromium nitride aluminium (CrAIN) is different and the difference of lattice parameter, make them when alternating growth, form tangible interface.Along with the continuous rotary plating of workpiece, periodicity is repeated to deposit above-mentioned rete.If the plated film time is 2-3 hour, deposited film is with superimposed several thousand layers of above-mentioned film, this structure is exactly superstructure superhard film C, it super model graded effect and exceptional hardness effect will occur being referred to as on the physics, and superhard film C will obtain to form its ultrahigh hardness of the conventional microhardness of rete more than 2 times.The film thickness that superhard film C must control deposition cycle is the nanoscale magnitude, is 2～6nm if control each deposition cycle film thickness of this film, and maximum value will appear in the microhardness of superhard film C.The crystal particle scale that also need control metal nitride among the superhard film C is less than 10nm in addition, and the total thickness of control superhard film C is 3～5 μ m.This nano superhard composite film has excellent performance, and its microhardness surpasses 40GPa, and the resistance to oxidation temperature is higher than 950 ℃, and has good toughness and low wear rate.
(4) deposition self-lubricating film D
Deposit the self-lubricating film D of certain low frictional factor on the surface of superhard film C again, can reduce the cutting force of metal cutting tool, reduce the abrasion in the mould use, for being of great importance the work-ing life of improving cutter and mould.
The present invention utilizes magnetic control two targets 2.2, magnetic control five targets, 2.5, the first ion sources 3.1 and second ion source, 3.2 cooperatings, deposition self-lubricating film; This is a kind of diamond-film-like (DLC-Si) of mixing silicon (Si).The target of two cover magnetic controlling targets 2 is a high purity graphite, starts simultaneously, and argon (Ar) is a working gas.Feed argon (Ar)-silane (SiH in the ion source 3
4) gas mixture, doping gas SiH
4Decomposition and ionization are the silicon ion (Si that has certain energy behind ion source 3
+), when ion bombarded the carbon film of growth in good time, two kinds of elements of carbon and silicon generated silicon carbide (SiC), when generating crystalline film, around the Siliciumatom and the four carbon atom cooperation, with covalent bonds, impelled carbon atom with SP
3Hybrid electron track Cheng Jian.Improved the diamond phase ratio in the film.The siliceous ratio of control rete is 3～6at.%, and this moment, self-lubricating film had minimum frictional coefficient and wear rate, and they are respectively: μ＜0.06, K
c=1 * 10
-17m
3/ Nm, its microhardness Hv=25GPa.
The present invention has the following advantages and positively effect:
(1) the present invention is the complete metal cutting tool high-quality coating coating technique of a cover, and it at first carries out plasma nitriding processing efficiently to tool matrix, has strengthened tool matrix, plates superhard composite film then, makes composite membrane have very high sticking power.
(2) the present invention will play the basal layer B of adhesive attraction, main wearing layer C and surface self-lubricating layer D very ideally combines, and make the function of cutter coat obtain complex optimum and improve.
(3) the nano super-lattice structured superhard film C that deposits of the present invention is a kind of novel super-hard film, has higher microhardness, scale resistance and abrasion resistance properties, has substantially exceeded the performance of conventional cutter coat.
(4) coating equipment allocation plan provided by the invention is simply efficient, and perfect in shape and function has production efficiency height, coating quality is good, production cost is low characteristics.For all kinds of speedy steel cutting-tools, inserted tool, sintex, and various mould all has a wide range of applications.
Description of drawings
The film of Fig. 1---composite membrane is a design diagram;
Fig. 2---vaccum ion coater vacuum chamber cross sectional representation.
Wherein:
1---electric arc target.
2---magnetron sputtering target, be called for short magnetic controlling target, comprising:
2.1---first magnetron sputtering target, be called for short magnetic control one target, target is the TiAI alloy;
2.2---second magnetron sputtering target, be called for short magnetic control two targets, target is a high purity graphite;
2.3---the 3rd magnetron sputtering target, be called for short magnetic control three targets, target is the CrAI alloy;
2.4---the 4th magnetron sputtering target, be called for short magnetic control four targets, target is the TiAI alloy;
2.5---the 5th magnetron sputtering target, be called for short magnetic control five targets, target is a high purity graphite;
2.6---the 6th magnetron sputtering target, be called for short magnetic control six targets, target is the CrAI alloy.
3---ion source comprises:
3.1---first ion source;
3.2---second ion source.
4---vacuum chamber.5---fire door.6---work rest.
7---electric heating tube.8---bleeding point.9---workpiece.
A---nitrided case.
B---Ranvier's membrane.
C---superhard film, promptly nano super-lattice structured superhard film comprises:
C
1---TiAlN (TiAIN);
C
2---chromium nitride aluminium (CrAIN).
C
1, C
2Alternating growth is total to the n layer, 1000＜n＜9000.
D---self-lubricating film.
Embodiment
1. the depositing operation of superhard composite film
1. workpiece shove charge
2. vacuumize and the workpiece baking
After workpiece 9 clampings finish, close the fire door 5 of vacuum chamber 4, by the use rules startup vacuum unit of vacuum unit, to vacuum chamber 4 pumping high vacuums to 3 * 10
-3Pa opens the baking heating power supply then, control workpiece revolution speed 4-6 circle/minute, storing temperature keeps 450 ± 5 ℃, and vacuum tightness keeps (3 ± 0.5) * 10
-3Pa keeps after 30 minutes and enters next-step operation.
3. glow ion cleans
Feed argon (Ar) gas, control air pressure is 2Pa, and the unbalanced pulse grid bias power supply slowly increases voltage to 1200V, and dutycycle is 80%, and workpiece rotational frequency and workpiece temperature are the same.This moment, workpiece was in the glow ion cleaning, the pollutent and the adsorbed gas of further removing workpiece surface, scavenging period 20 minutes.
4. the energetic ion nitriding is handled
Feed argon nitrogen (Ar-N
2) gas mixture enters ion source 3, ratio of mixture is Ar: N
2=1: 1, adjustment air pressure is 1Pa; Grid bias power supply voltage 150 ± 5V, dutycycle is 50%; Workpiece rotational frequency and storing temperature are the same.Open the control power supply of ion source 3, increase anode voltage V
b=150 ± 5V, plasma body line 20 ± 2A.Workpiece 9 is carried out plasma nitriding handle, through 30～60 minutes, the depth of penetration of nitrogen element entered next step operation after reaching 20～40 μ m.
5. deposition basis film B
Grid bias power supply is transferred to 200-250V, and dutycycle 40-50% feeds vacuum chamber Ar-N
2Gas mixture, Ar: N
2=1: 8, ion source 3 logical Ar: N
2=1: 1 gas mixture, keeping air pressure is 0.5Pa, workpiece rotational frequency 4-6 circle/minute; The anode voltage V of ion source 3
b=250 ± 5V, plasma body line 15～20A; The electric arc target 1 at unlatching center is kept arc current 150～160A, depositing Ti yN Ranvier's membrane, depositing time 30 minutes.Reduce storing temperature to 280～300 ℃.
6. deposit superhard film C
Changing the ratio of mixture that feeds vacuum chamber 4 is Ar: N
2=3: 1, operating air pressure, workpiece rotational frequency, grid bias power supply and ionogenic working parameter are all constant.The quadruplet magnetic controlling target 2 of open vacuum chamber 4 perisporiums: magnetic control one target 2.1, magnetic control three targets 2.3, magnetic control four targets 2.4, magnetic control six targets 2.6, the adjustment sputtering power is 18-20KW, deposition superhard film C reduces the electric current of electric arc target 1 gradually until shutoff simultaneously.According to the actual requirement of different workpieces, depositing time was controlled at 2～4 hours, superhard film thickness 2-5 μ m.
7. deposit self-lubricating film D
Open magnetic control two targets 2,2 and magnetic control five targets 2,5, the regulation and control sputtering power is 20KW, and ion source 3 feeds argon-silane mixture gas, Ar: SiH
4=5: 1, reduce N gradually
2Flow is until shutoff; The sputtering power that reduces magnetic control one target 2.1, magnetic control three targets 2.3, magnetic control four targets 2.4, magnetic control six targets 2.6 gradually is until shutoff.The time of deposition DLC-Si self-lubricating film is 1～2 hour, and controlling its thickness is 1～2 μ m.
8. blowing out
The sputtering power that reduces magnetic control two targets 2.2 and magnetic control five targets 2.5 is until shutoff, turn-off grid bias power supply, ion source power supply, baking power supply, workpiece 9 rotations continued to keep 30 minutes, close high vacuum valve and high-vacuum pump power supply again, regulation according to working specification, stop the vacuum unit, close water coolant and equipment general supply.
2, experimental result
1. on a vacuum plating unit, adopt hollow cathode electron beam gun divergent bundle, allow Ar-N
2Gas mixture ionization; The substrate baking is heated to 450 ℃, and biasing-150V, and control air pressure 1.0Pa handles through ionitriding in 30 minutes, and the microhardness of SKH57 material (rapid steel) reaches 12.7GPa, records nitrogen element depth of penetration 40 μ m.The print TiN coating of growing then, the result is compared as follows with not nitriding:
| Thickness (μ m) | HV 50(GPa) | LC(N) | Roughness R a(nm) | |
| Plasma oozes N+TiN TiN | 2.9 2.8 | 19.9 15.0 | 86 66 | 0.22 0.26 |
2. on a homemade CK-1250 type coating equipment, three cover unbalanced magnetic field magnetron sputtering targets are set, the target of two cover targets is the TiAI alloy, another set of target is pure chromium target, deposit superlattice composite membrane TiAIN/CrN, thickness 3～4 μ m, surperficial avy blue, smooth, its microhardness is up to 48～55GPa.
3, sedimenting chromium chloride aluminium (CrAIN) superlattice film on a dead front type non-stationary magnetic field magnetic control film coating machine
The aluminium target adopts pulse direct current shielding power supply, frequency 19KHz, dutycycle 65%.The chromium target adopts dc sputtering power, sputtering power 0.5～1.0KW.Chromium nitride aluminium (CrAIN) film that obtains is the hexagonal system wurtzite structure, crystallization direction＜111 〉,＜200 〉,＜311〉preferential growth, the highest microhardness Hp:37.3GPa.
4, adopt ion beam bombardment to mix the diamond-film-like (DLC-Si) of silicon (Si)
In a coating equipment, background pressure is 2.66 * 10
-4Pa, deposition pressure are 4 * 10
-3Pa.It is ion implantation to adopt Zymet 100 types not have mass analysis, ion energy 40KeV Ar
++ Si
+, the DLC film of bombardment growth, the diamond-film-like (DLC-Si) of silicon (Si) is mixed in acquisition.The experience wear experiment records coefficientoffriction≤0.1, and wearing and tearing length is 1300m.
Claims (3)
1, a kind of nano superhard composite film tool with high adhesive force is characterized in that:
On cutter (9), deposit nitrided case (A), Ranvier's membrane (B), superhard film (C), self-lubricating film (D) successively;
Described nitrided case (A) is the efficient nitrided case of plasma, depth of nitration 20～40 μ m;
Described Ranvier's membrane (B) is for mixing the titanium nitride or the titanium carbide of yttrium;
Described superhard film (C) is n layer TiAlN (C
1) and chromium nitride aluminium (C
2) alternating growth, 1000≤n≤9000;
Described self-lubricating film (D) is a kind of diamond-film-like of mixing silicon.
2, a kind of nano superhard composite film tool deposition apparatus with high adhesive force, comprise many target position vaccum ion coater, this coating equipment is made up of electrothermal tube (7), bleeding point (8) and supporting power supply, the Controlling System etc. of vacuum chamber (4), fire door (5), work rest (6), baking workpiece; It is characterized in that:
Central authorities in vacuum chamber (4) are provided with a cover cylindrical electric arc target (1), perpendicular to the chassis;
Outer wall place in vacuum chamber (4), counter clockwise, be disposed with magnetic control one target (2.1), magnetic control two targets (2.2), magnetic control three targets (2.3), magnetic control four targets (2.4), magnetic control five targets (2.5), magnetic control six targets (2.6), wherein magnetic control one target (2.1), magnetic control three targets (2.3), magnetic control four targets (2.4), magnetic control six targets (2.6) two adjacent target are 90 ° each other, are symmetric arrangement;
Vacuum chamber fire door (5) with the relative position of fire door (5), be respectively arranged with No. 1 ion source (3.1) and No. 2 ion sources (3.2);
Electric arc target (1), magnetic controlling target (2), ion source (3), work rest (6) are connected with arc target power supply, magnetic controlling target power supply, ion source power supply, the grid bias power supply of auxiliary work separately respectively;
The target of electric arc target (1) is a titanium alloy of mixing yttrium, alloying constituent 95Ti-5y at.%;
The target of magnetic control one target (2.1), magnetic control three targets (2.3), magnetic control four targets (2.4), magnetic control six targets (2.6) is a titanium aluminum alloy, alloying element ratio ranges 50Ti-50AI～30Ti-70AI at.%;
The target of magnetic control two targets (2.2) and magnetic control five targets (2.5) is a high purity graphite.
3, a kind of nano superhard composite film tool deposition method with high adhesive force is characterized in that:
1. deposit nitrided case (A)
The workpiece baking is heated to 450 ± 5 ℃, and control air pressure is 1.0Pa, adds negative bias-150 ± 5V on workpiece (9), opens ion source (3) and produces Ar-N
2The plasma body of gas mixture, control anode voltage 150 ± 10V, plasma current 20 ± 2A, workpiece (9) is carried out plasma nitriding to be handled, through 30～60 minutes, the nitrogen iontophoretic injection degree of depth 20～40 μ m, the microhardness of rapid steel substrate is brought up to 12-14GPa from 7.5GPa;
2. deposition basis film (B)
Adopt electric arc target (1), the argon nitrogen mixed gas is a working gas, ratio of mixture Ar: N
2=1: 8; The film thickness that control is mixed the titanium nitride of yttrium or mixed the titanium carbide of yttrium is 0.3～0.5 μ m;
3. deposit superhard film (C)
Utilize quadruplet magnetic controlling target (2) deposition superhard film (C);
Wherein the target of magnetic control one target (2.1) and magnetic control four targets (2.4) is a titanium aluminum alloy, and its chemical element ratio ranges is 50Ti-50AI～30Ti-70AI at.%;
The target of magnetic control three targets (2.3) and magnetic control six targets (2.6) is an Ohmax, and its chemical element ratio ranges is 40Cr-60AI～30Cr-70AI at.%;
The total thickness of control superhard film C is 3～5 μ m;
4. deposit self-lubricating film (D)
Utilize magnetic control two targets (2.2), magnetic control five targets (2.5), first ion source (3.1) and second ion source (3.2) cooperating, deposition self-lubricating film; The target of two cover magnetic controlling targets (2) is a high purity graphite, starts simultaneously, and argon is a working gas; Feed argon-silane mixture gas in the ion source (3).
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| CN100363530C (en) * | 2005-02-16 | 2008-01-23 | 吴大维 | Nano super-lattice structured superhard composite film cutting tool and deposition method therefor |
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