CN1719560A - Method for mfg. crystal boundary layer ceramic medium material and substrate for single layer capacitor and substrate thereof - Google Patents
Method for mfg. crystal boundary layer ceramic medium material and substrate for single layer capacitor and substrate thereof Download PDFInfo
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- CN1719560A CN1719560A CN 200510034827 CN200510034827A CN1719560A CN 1719560 A CN1719560 A CN 1719560A CN 200510034827 CN200510034827 CN 200510034827 CN 200510034827 A CN200510034827 A CN 200510034827A CN 1719560 A CN1719560 A CN 1719560A
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Abstract
Description
Embodiment | Embodiment 2 | Embodiment 3 | Embodiment 4 | Embodiment 5 | Embodiment 6 | |
Dielectric ceramic composition is formed and weight portion | SrCO 3 | 65.95 | 64.85 | 65.00 | 65.20 | 64.66 |
TiO 2 | 34.99 | 35.69 | 35.12 | 35.25 | 35.43 | |
Nb 2O 5 | 0.20 | 0.25 | 0.38 | 0.42 | 0.45 | |
Property-modifying additive | 0.1 part SiO 20.3 part Al 2O 30.2 part MnO 25 parts of CaCO 3 | 0.5 part CuO | 2 parts of SiO 211 parts of CaCO 33 parts of CuO | 3 parts of SiO 2 | 0.3 part Al 2O 33.2 part MnO 2 | |
Composition and weight portion every stick | SrCO 3 | 65 | 63 | 64 | 62 | 60 |
TiO 2 | 35 | 37 | 36 | 38 | 40 | |
Every the stick property-modifying additive | 80 parts of ZrO 2 | 85 parts of Al of 15 parts of flour 2O 3 | 90 parts of Al 2O 3 | 25 parts of ZrO of 40 parts of flour 225 parts of Al 2O 3 | 95 parts of flour | |
The composition of oxidant and weight portion | Pb 3O 4 | 0 | 52 | 48 | 12 | 34 |
Bi 2O 3 | 37 | 34 | 36 | 35 | 36 | |
B 2O 3 | 18 | 16 | 15 | 17 | 17 | |
The oxidant property-modifying additive | 5 parts of SiO 2 | 3 parts of Ni of 3 parts of CuO 2O 33 parts of MnO 2 | 4 parts of Ni 2O 33 parts of SiO 20.5 part NaF | 3 parts of SiO of 2 parts of CuO 23 parts of Ni 2O 32 parts of MnO 2 | 6 parts of CuO | |
Synthesis temperature (℃) | 1200 | 1260 | 1240 | 1230 | 1250 | |
The moulding diaphragm approach (℃) | Roll film | Curtain coating | Curtain coating | Roll film | Curtain coating | |
Dump temperature (℃) | 1100 | 1200 | 1180 | 1160 | 1130 | |
Sintering temperature (℃) | 1350 | 1500 | 1400 | 1380 | 1450 | |
Compose flat temperature (℃) | 1250 | 1150 | 1200 | 1230 | 1170 | |
Oxidizing temperature (℃) | 1250 | 1050 | 1100 | 1150 | 1180 |
Embodiment | 25 ℃ of following electric properties | Mechanical performance | ||||||
K | tgδ (×10 -4) | ρ 50V(× 10 10Ω cm) | Temperature characterisitic Δ C/C (%) (25~+ 125 ℃) | Puncture voltage V/mm (DC) | Rough surface Ra (um) | Flatness (mm) | Size (mm) (L * B * T) | |
1 | 2.6 ten thousand | ≤50 | ≥100 | ≤12 | ≥1000 | ≤2.0 | ≤0.4 | 52×52× 0.22 |
2 | 2.3 ten thousand | ≤40 | ≥150 | ≤7.5 | ≥1300 | ≤1.8 | ≤0.25 | 38×38× 0.50 |
3 | 4.8 ten thousand | ≤60 | ≥80 | ≤22 | ≥800 | ≤1.7 | ≤0.2 | 26×26× 0.10 |
4 | 2.0 ten thousand | ≤35 | ≥150 | ≤3.0 | ≥1500 | ≤1.7 | ≤0.2 | 26×26× 0.10 |
5 | 3.0 ten thousand | ≤30 | ≥100 | ≤12 | ≥1000 | ≤1.8 | ≤0.3 | 38×38× 0.38 |
6 | 3.3 ten thousand | ≤45 | ≥100 | ≤10 | ≥1000 | ≤1.9 | ≤0.2 | 38×38× 0.17 |
Claims (6)
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CNB2005100348275A CN100418167C (en) | 2005-05-31 | 2005-05-31 | Method for mfg. crystal boundary layer ceramic medium material and substrate for single layer capacitor and substrate thereof |
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CNB2005100348275A CN100418167C (en) | 2005-05-31 | 2005-05-31 | Method for mfg. crystal boundary layer ceramic medium material and substrate for single layer capacitor and substrate thereof |
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CN1719560A true CN1719560A (en) | 2006-01-11 |
CN100418167C CN100418167C (en) | 2008-09-10 |
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Cited By (14)
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CN101295635B (en) * | 2007-04-29 | 2010-05-19 | 中芯国际集成电路制造(上海)有限公司 | Method and device for improving capacity of MIM capacitance |
CN1975943B (en) * | 2006-12-20 | 2010-11-03 | 天津大学 | Doped copper titanium oxide capacitor ceramic dielectric and producing method thereof |
CN102013320A (en) * | 2010-10-22 | 2011-04-13 | 广东风华高新科技股份有限公司 | Single-layer capacitor and preparation method thereof |
CN102491738A (en) * | 2011-11-24 | 2012-06-13 | 江苏省晶石磁性材料与器件工程技术研究有限公司 | Method for producing high permeability mangan zinc ferrite |
CN102491759A (en) * | 2011-11-24 | 2012-06-13 | 江苏省晶石磁性材料与器件工程技术研究有限公司 | Superimposition sintering technology of manganese zinc ferrite |
CN102515758A (en) * | 2011-12-12 | 2012-06-27 | 中国振华集团红云器材厂 | Preparation method of piezoelectric ceramic atomizer medium |
CN102853669A (en) * | 2011-06-30 | 2013-01-02 | 史祖法 | Box pot for sintering ceramic homocentric sphere |
CN103265293A (en) * | 2013-05-14 | 2013-08-28 | 广东风华高新科技股份有限公司 | Preparation method of ceramic substrate |
CN103500655A (en) * | 2013-10-12 | 2014-01-08 | 成都宏明电子科大新材料有限公司 | Manufacturing method for high-flatness microwave single-layer ceramic capacitor |
CN105185490A (en) * | 2015-08-11 | 2015-12-23 | 太仓市高泰机械有限公司 | Negative temperature coefficient (NTC) thermistor element sintering and loading laminating technology |
CN105777112A (en) * | 2016-04-12 | 2016-07-20 | 武汉理工大学 | Ti-bit donor-acceptor co-doping SrTiO3 base high-dielectric ceramic and preparation method thereof |
CN108439975A (en) * | 2018-05-18 | 2018-08-24 | 武汉理工大学 | It is a kind of have stablize strontium titanates calcium base energy storage ceramic of defect sturcture and preparation method thereof |
CN113072376A (en) * | 2021-04-12 | 2021-07-06 | 中国振华集团云科电子有限公司 | Oxidizing agent for grain boundary layer semiconductor ceramic substrate and coating method thereof |
CN115974547A (en) * | 2023-02-01 | 2023-04-18 | 中国振华集团云科电子有限公司 | SrTiO for grain boundary layer capacitor 3 Method for preparing base ceramic substrate |
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US4889837A (en) * | 1986-09-02 | 1989-12-26 | Tdk Corporation | Semiconductive ceramic composition |
CN1063732C (en) * | 1994-05-06 | 2001-03-28 | 清华大学 | Method for making strontium titanate base grain-boundary layer capacitor material |
CN1305193A (en) * | 2000-10-30 | 2001-07-25 | 广东肇庆风华电子工程开发有限公司 | Middle-temp sintered ceramics for laminated magnetodielectric capacitor |
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2005
- 2005-05-31 CN CNB2005100348275A patent/CN100418167C/en active Active
Cited By (22)
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CN1975943B (en) * | 2006-12-20 | 2010-11-03 | 天津大学 | Doped copper titanium oxide capacitor ceramic dielectric and producing method thereof |
CN101295635B (en) * | 2007-04-29 | 2010-05-19 | 中芯国际集成电路制造(上海)有限公司 | Method and device for improving capacity of MIM capacitance |
CN102013320A (en) * | 2010-10-22 | 2011-04-13 | 广东风华高新科技股份有限公司 | Single-layer capacitor and preparation method thereof |
CN102013320B (en) * | 2010-10-22 | 2012-09-05 | 广东风华高新科技股份有限公司 | Single-layer capacitor and preparation method thereof |
CN102853669A (en) * | 2011-06-30 | 2013-01-02 | 史祖法 | Box pot for sintering ceramic homocentric sphere |
CN102853669B (en) * | 2011-06-30 | 2016-01-20 | 史祖法 | For the box alms bowl of sintered ceramic homocentric sphere |
CN102491738B (en) * | 2011-11-24 | 2014-03-12 | 江苏省晶石磁性材料与器件工程技术研究有限公司 | Method for producing high permeability mangan zinc ferrite |
CN102491738A (en) * | 2011-11-24 | 2012-06-13 | 江苏省晶石磁性材料与器件工程技术研究有限公司 | Method for producing high permeability mangan zinc ferrite |
CN102491759A (en) * | 2011-11-24 | 2012-06-13 | 江苏省晶石磁性材料与器件工程技术研究有限公司 | Superimposition sintering technology of manganese zinc ferrite |
CN102515758A (en) * | 2011-12-12 | 2012-06-27 | 中国振华集团红云器材厂 | Preparation method of piezoelectric ceramic atomizer medium |
CN103265293B (en) * | 2013-05-14 | 2014-09-17 | 广东风华高新科技股份有限公司 | Preparation method of ceramic substrate |
CN103265293A (en) * | 2013-05-14 | 2013-08-28 | 广东风华高新科技股份有限公司 | Preparation method of ceramic substrate |
CN103500655A (en) * | 2013-10-12 | 2014-01-08 | 成都宏明电子科大新材料有限公司 | Manufacturing method for high-flatness microwave single-layer ceramic capacitor |
CN105185490A (en) * | 2015-08-11 | 2015-12-23 | 太仓市高泰机械有限公司 | Negative temperature coefficient (NTC) thermistor element sintering and loading laminating technology |
CN105185490B (en) * | 2015-08-11 | 2018-04-17 | 太仓市高泰机械有限公司 | A kind of NTC thermistor element burns till dress alms bowl stacking technique |
CN105777112A (en) * | 2016-04-12 | 2016-07-20 | 武汉理工大学 | Ti-bit donor-acceptor co-doping SrTiO3 base high-dielectric ceramic and preparation method thereof |
CN105777112B (en) * | 2016-04-12 | 2018-10-09 | 武汉理工大学 | A kind of Ti is applied acceptor and is co-doped with SrTiO3Base high dielectric ceramic and preparation method thereof |
CN108439975A (en) * | 2018-05-18 | 2018-08-24 | 武汉理工大学 | It is a kind of have stablize strontium titanates calcium base energy storage ceramic of defect sturcture and preparation method thereof |
CN108439975B (en) * | 2018-05-18 | 2021-04-20 | 武汉理工大学 | Strontium calcium titanate-based energy storage ceramic with stable defect structure and preparation method thereof |
CN113072376A (en) * | 2021-04-12 | 2021-07-06 | 中国振华集团云科电子有限公司 | Oxidizing agent for grain boundary layer semiconductor ceramic substrate and coating method thereof |
CN115974547A (en) * | 2023-02-01 | 2023-04-18 | 中国振华集团云科电子有限公司 | SrTiO for grain boundary layer capacitor 3 Method for preparing base ceramic substrate |
CN115974547B (en) * | 2023-02-01 | 2024-01-05 | 中国振华集团云科电子有限公司 | SrTiO for crystal boundary layer capacitor 3 Preparation method of base ceramic substrate |
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