CN1713967B - Chemical-solution supplying apparatus - Google Patents
Chemical-solution supplying apparatus Download PDFInfo
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- CN1713967B CN1713967B CN038255790A CN03825579A CN1713967B CN 1713967 B CN1713967 B CN 1713967B CN 038255790 A CN038255790 A CN 038255790A CN 03825579 A CN03825579 A CN 03825579A CN 1713967 B CN1713967 B CN 1713967B
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- liquid
- flow
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
- B01F35/80—Forming a predetermined ratio of the substances to be mixed
- B01F35/83—Forming a predetermined ratio of the substances to be mixed by controlling the ratio of two or more flows, e.g. using flow sensing or flow controlling devices
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B57/00—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents
- B24B57/02—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents for feeding of fluid, sprayed, pulverised, or liquefied grinding, polishing or lapping agents
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
- B01F25/50—Circulation mixers, e.g. wherein at least part of the mixture is discharged from and reintroduced into a receptacle
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- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Grinding-Machine Dressing And Accessory Apparatuses (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
A chemical-solution supplying apparatus (100) for supplying slurry to an exterior device (7) includes a supply route (A) in which abrasive suspension flows at a predetermined flow rate and a return route (C) connecting the supply route and a storage tank (1). When the supply of the slurry to the exterior device is stopped, the abrasive suspension is returned from the supply route to the storage tank through the return route. This is done in order to maintain the flow of the abrasive suspension in the supply route so that abrasive is prevented from coagulating and settling.
Description
Technical field
The present invention relates to chemicals feeder, particularly relate to the chemicals feeder that the ratio of supplying with is in accordance with regulations mixed the soup of multiple composition in the manufacturing installation of electronic devices such as semiconductor-fabricating device or flat-panel monitor (FDP) manufacturing installation.
Background technology
In recent years, in electronic device manufacturing installations such as semiconductor-fabricating device or FDP manufacturing installation, use various soups in a large number and continually, for example, use multiple stoste is mixed the admixing medical solutions of making.For example, in manufacturing process, in so-called CMP (chemically mechanical polishing) operation, use various slurries as lapping liquid.Slurries are multiple stoste to be mixed allotment form, and carry out sedimentation, cohesion with the short time.Therefore, require to supply with the admixing medical solutions of slurries class with the concentration stabilize ground of regulation.
Supply with hold-up tank after existing each stoste of chemicals feeder weighing, in hold-up tank, stoste is mixed the allotment admixing medical solutions, deployed admixing medical solutions is supplied with the electronic device manufacturing installation.Volume and weight by detecting the soup in the hold-up tank also calculates mixing ratio, controls the concentration of admixing medical solutions, also utilizes concentration detection apparatus directly to measure the concentration of the admixing medical solutions in the hold-up tank sometimes.With inert gas such as nitrogen or pump the soup that is adjusted to normal concentration in hold-up tank is mixed and to mix well, supply with the electronic device manufacturing installation then.
For example, in order to improve the flatness of silicon wafer surface, in wafer smooth grinding operation, use slurries by the chemicals feeder allotment.Utilization is coated on the mechanical stress and the chemical action of the slurries between grinding pad and the wafer and comes the grinding wafers surface.
Be included in abrasive particle in the slurries etc. not dissolved substance passing flocking settling in time get off, in the manufacturing of electronic device, this cohesion and sedimentation become problem.For example,, will form trickle scratch, thereby reduce the yield rate of wafer in wafer surface in case the slurries of cohesion are applied on the wafer.
Cohesion, the sedimentation of the not dissolved substance in the slurries change the concentration of admixing medical solutions.When the not dissolved substance in the slurries during sedimentation, is supplied with just unstable in liquid distribution pipe to the slurries of electronic device manufacturing installation.In addition, for the not dissolved substance that prevents to condense, settle down stops up liquid distribution pipe, the operation that remove the not dissolved substance of cohesion, sedimentation, this removing operation meeting postpone to supply with to the slurries of electronic device manufacturing installation.
For cohesion, the sedimentation that prevents slurries, consider slurries are stirred always.But the stirring of slurries can be increased not dissolved substance collision frequency to each other, may promote cohesion on the contrary.
In certain admixing medical solutions,, be limited at short notice from its time that is fabricated onto use.In hold-up tank, make under the situation of this admixing medical solutions, exist the problem that obtains inner liquid medicine during till supplying with the electronic device manufacturing installation can condense and sedimentation.
Disclosure of an invention
The object of the present invention is to provide a kind of chemicals feeder that can stably supply with the admixing medical solutions of easy cohesion or sedimentation.
According to first kind of mode of the present invention, provide a kind of soup that will be stored in the hold-up tank to supply with the chemicals feeder of external device (ED).This device comprises: make described soup with flow through wherein feed path of the flow of regulation; With stopping when described external device (ED) is supplied with described soup, to make described soup to be back to return flow path the described hold-up tank from described feed path.
According to the second way of the present invention, provide a kind of will be stored in respectively multiple stoste in a plurality of hold-up tanks mix and generate admixing medical solutions and this device of chemicals feeder that described admixing medical solutions is supplied with external device (ED) is comprised: make described multiple stoste respectively with flow through wherein many feed paths of the flow of regulation; With stopping when described external device (ED) is supplied with described admixing medical solutions, to make described multiple stoste to be back to many return flow paths described a plurality of hold-up tank from described many feed paths respectively.
According to the third mode of the present invention, provide a kind of chemicals feeder of slurries being supplied with external device (ED).This device comprises: make be included as the described slurries of allotment and first liquid of the abrasive particle that uses with flow through wherein first feed path of the flow of regulation; Make to allocating second liquid that described slurries mix with described first liquid with flow through wherein second feed path of the flow of regulation; With the return flow path that is connected on described first feed path, this return flow path is stopping when described external device (ED) is supplied with described slurries, makes described first liquid be back to described first hold-up tank from described first feed path.
According to the 4th kind of mode of the present invention, a kind of liquid feed device of mixed liquor being supplied with external device (ED) is provided, this liquid feed device is connected with second hold-up tank of first hold-up tank of storing first liquid and storage second liquid respectively, described first liquid and described second liquid is mixed allocate described mixed liquor.This liquid feed device comprises: make flow through wherein first feed path of described first liquid; Make flow through wherein second feed path of described second liquid; Be connected with described second path with described first feed path and be used for mixing the blender of described first liquid and described second liquid; Be arranged on and be used for cutting off selectively first cut-off valve from described first liquid to described blender that supply with on described first feed path; On described first feed path, connect the upstream position of described first cut-off valve and first return flow path of described first hold-up tank; Be arranged on first return valve midway of described first return flow path; And control device, this control device is stopping when described external device (ED) is supplied with described mixed liquor, close described first cut-off valve and open described first return valve, so that keep flowing of described first liquid in described first feed path, described first liquid turned back in described first hold-up tank via described first return flow path.
In addition, the present invention also provides a kind of chemicals feeder, be that first and second stoste that is stored in respectively in first and second hold-up tank is mixed and the generation admixing medical solutions, and described admixing medical solutions is supplied to the chemicals feeder of external device (ED), it is characterized in that comprising: first and second feed path, described first and second stoste flow in described first and second feed path with the flow of regulation respectively; First and second flow regulator, it is separately positioned on described first and second feed path, regulates described first and the flow of second feed path; First and second return flow path, it is connected to described first and second flow regulator on described first and second feed path and the position between the described external device (ED), stopping when described external device (ED) is supplied with described admixing medical solutions, described first and second stoste is back to described first and second hold-up tank from described first and second feed path respectively, and the flow that will stop described first and second stoste in described first and second feed path when described external device (ED) is supplied with described admixing medical solutions is maintained the identical flow of flow when supplying with described admixing medical solutions.
In addition, the present invention also provides a kind of chemicals feeder, be that first liquid and second liquid that will be stored in respectively in first and second hold-up tank mixes slurries, slurries are supplied to the chemicals feeder of external device (ED), it is characterized in that comprising: first feed path, described first liquid that comprises the abrasive particle that is used to allocate described slurries flows therein with the flow of regulation; Second feed path flows with the flow of regulation therein for allocating described second liquid that described slurries mix with described first liquid; First and second flow regulator, it is separately positioned on described first and second feed path, is used for being controlled at mobile described first liquid of described first and second feed path and the flow of second liquid; First and second return flow path, it is connected to described first and second flow regulator on described first and second feed path and the position between the described external device (ED), stopping when described external device (ED) is supplied with described slurries, make described first liquid and second liquid be back to described first and second hold-up tank from described first and second feed path respectively, and the flow that will stop when described external device (ED) is supplied with described slurries described first liquid in described first and second feed path and second liquid is maintained and the identical flow of flow when described external device (ED) is supplied with described slurries.
In addition, the present invention also provides a kind of liquid feed device of mixed liquor being supplied with external device (ED), this liquid feed device is connected with second hold-up tank of first hold-up tank of storing first liquid and storage second liquid respectively, described first liquid and described second liquid is mixed allocate described mixed liquor; It is characterized in that comprising: make described first liquid with flow through wherein first feed path of the flow of regulation; Make described second liquid with flow through wherein second feed path of the flow of regulation; Be connected with described second path with described first feed path and be used for mixing the blender of described first liquid and described second liquid; Be arranged on and be used for cutting off selectively first cut-off valve from described first liquid to described blender that supply with on described first feed path; Be arranged on and be used for cutting off selectively second cut-off valve from described second liquid to described blender that supply with on described second feed path; Be separately positioned on the upstream position of described first and second cut-off valve on described first and second feed path, be used for being controlled at first and second flow regulator of the flow of described first liquid that described first and second feed path flows and second liquid; First return flow path, it links together upstream that is positioned at described first cut-off valve on described first feed path and the position and described first hold-up tank that are in the downstream of described first flow adjusting device, stopping when described external device (ED) is supplied with described mixed liquor, will be maintained and the identical flow of flow when described external device (ED) is supplied with the flow of described first liquid in described first feed path before described second liquid mixes; Be arranged on first return valve midway of described first return flow path; And control device, this control device is stopping when described external device (ED) is supplied with described mixed liquor, close described first cut-off valve and open described first return valve, so that the flow of described first liquid in described first feed path is maintained and the identical flow of flow when described external device (ED) is supplied with, and makes described first liquid in described first feed path turn back to described first hold-up tank via described first return flow path.
The simple declaration of accompanying drawing
Fig. 1 is the sketch map of the chemicals feeder of first embodiment of the present invention.
Fig. 2 is a graph of relation of adjusting the flow of the air pressure of constant pressure valve and damping hole.
Fig. 3 is the curve map of prior art example of the flow of the damping hole when beginning to supply with abrasive particle.
Fig. 4 be first embodiment begin to supply with abrasive particle the time the key diagram of flow of damping hole.
Fig. 5 is the sketch map of the chemicals feeder of second embodiment of the present invention.
Fig. 6 is the sketch map of the chemicals feeder of the 3rd embodiment of the present invention.
Fig. 7 is the sketch map of the chemicals feeder of the 4th embodiment of the present invention.
The best mode that carries out an invention
As shown in Figure 1, the chemicals feeder 100 of first embodiment of the present invention is by the medicine allocation soup that is stored in respectively in first hold-up tank 1 and second hold-up tank 2; Then deployed soup is supplied with electronic device manufacturing installation 7.
Drain out first medicine (for example, the slurries stoste that the abrasive particle suspension is such) that is stored in first hold-up tank 1 with first pump 3, and be sent to soup mixing arrangement 4.In order in first hold-up tank 1, to stir first medicine, the part of first medicine that is come by first pump, 3 force feeds is turned back in first hold-up tank 1.
Drain out second medicine that is stored in second hold-up tank 2 (for example, mix allocate the dilution decentralized medium that slurries are used with the abrasive particle suspension) with second pump 5, and be sent to soup mixing arrangement 4.In order in second hold-up tank 2, to stir second medicine, the part of second medicine that is come by second pump, 5 force feeds is turned back in second hold-up tank 2.
Soup mixing arrangement 4 comprises: with the first feed path A of the first drug supply blender 6 with the second feed path B of the second drug supply blender 6.Blender 6 suitably mixes first and second medicine, supplies with electronic device manufacturing installation 7 then.Blender 6 for example is a static mixer.
The first feed path A comprises: upstream valve 8, downstream valve 9, upstream pressure meter 10, downstream pressure meter 11, first constant pressure valve 12, the first segment discharge orifice (flow control device) 13 and the first flow meter 14 that are made of needle-valve; The control device 15 controls first feed path A by control soup mixing arrangement 4.
When upstream valve 8 is unlocked, the first drug supply upstream pressure meter 10 that first pump, 3 force feeds are next; Upstream pressure meter 10 is measured the pressure of first medicine of being supplied with by upstream valve 8, then with first drug supply, first constant pressure valve 12.Measured value apparatus for controlling of supply 15 with upstream pressure meter 10.
The pressure of first medicine that first constant pressure valve 12 is next with first pump, 3 force feeds is depressured to after the pressure of regulation, with the first drug supply downstream pressure meter 11.
For the pressure of first medicine that will supply with first segment discharge orifice 13 maintains setting, control device 15 is used for controlling the air pressure of first constant pressure valve 12 according to the measured value adjustment of upstream and downstream pressure gauge 10,11.
First segment discharge orifice 13 is after the flow of adjusting first medicine of being supplied with by downstream pressure meter 11, with the first drug supply first flow meter 14.First flow meter 14 detects the flow of first medicine of being supplied with by first segment discharge orifice 13, and this detected value is offered control device 15.
Take place easily in allotment under the situation of cerium slurries of the sedimentation of abrasive particle and cohesion, promptly, comprise at first medicine under the situation of suspension of the such abrasive particle of cerium oxide, preferably the delivery flow of first pump 13 is set at 0～10L/min, the discharge pressure of first constant pressure valve 12 is set at 0～0.5MPa, the flow velocity at first segment discharge orifice 13 places is set at 0～0.5L/min.
The graphical representation of Fig. 2 is used for adjusting the air pressure (transverse axis) of first constant pressure valve 12 and the relation of the medicine flow (longitudinal axis) of the first segment discharge orifice 13 of flowing through.The relation of air pressure and flow becomes with the open degree of first segment discharge orifice 13.For example, the relation when straight line X represents that first segment discharge orifice 13 is all opened, straight line Y represents the open degree of first segment discharge orifice 13 is narrowed down to the relation of a half, the relation when straight line Z represents that the flow with first segment discharge orifice 13 further dwindles.
As shown in Figure 2, when operation first constant pressure valve 12 was adjusted the pressure of first medicine, the open degree of first segment discharge orifice 13 was big more, is accompanied by the increase of pressure, and the variation of flow is big more.
In the way of the first feed path A, be connected with first medicine that makes the first feed path A that flows through and be back to the first return flow path C in first hold-up tank 1.That is, the first return flow path C couples together the outlet side (downstream position) and the hold-up tank 1 of first flow meter 14.The return valve 16 that control device 15 is controlled in the way that is arranged on the first return flow path C is opened it when downstream valve 9 is closed.Thereby when downstream valve 9 was closed, first medicine of the first feed path A that flows through was back in first hold-up tank 1 through after the first return flow path C.
The first feed path A is by bypass path D bypass.In detail, bypass path D is with outlet side (downstream position) bypass of the input side (upstream position) and first return valve 16 of upstream valve 8.When downstream valve 9 was closed, the by-passing valve 17 that is arranged in the way of bypass path D was unlocked, and perhaps remains on normally open.Adjust the open degree of by-passing valve 17, make the flow velocity at first segment discharge orifice 13 places remain on 0～5L/min.
The second feed path B includes: upstream valve 18, downstream valve 19, upstream pressure meter 20, downstream pressure meter 21, second constant pressure valve 22, second throttle orifice (flow control device) 23 and second flowmeter 24; Control device 15 this second feed path of control B of control soup mixing arrangement 4.
Under the situation of allotment cerium slurries, preferably the discharge pressure with second constant pressure valve 22 is set at 0～0.5MPa, is 0～0.5L/min with the flow set of second medicine of second throttle orifice 23 of flowing through.
In the way of the second feed path B, be connected with the similar second return flow path E with the first return flow path C.In the way of the second return flow path E, be provided with second return valve of when downstream valve 19 is closed, opening 25.
Below, the action of chemicals feeder 100 is described.
When admixing medical solutions was supplied with electronic device manufacturing installation 7, control device 15 was opened upstream valve 8,19 and downstream valve 9,19.So first medicine is from being sent to blender 6 with regard to first hold-up tank 1 via first pump 3 and the first feed path A; First constant pressure valve 12 and first segment discharge orifice 13 with the pressure of first medicine and flow-control at setting.
In addition, second medicine is sent to blender 6 from second hold-up tank 2 via second pump 5 and the first feed path B; Second constant pressure valve 22 and second throttle orifice 23 with the pressure of second medicine and flow-control at setting.
Blender 6 is delivered to electronic device manufacturing installation 7 after first medicine and second medicine are mixed.Control device 15 is controlled the mixing ratio of this admixing medical solutions according to first and second flowmeters, 14,24 detected flows.
On the other hand, when stopping when electronic device manufacturing installation 7 is supplied with admixing medical solutions, closing downstream valve 9,19, open first and second return valves 16,25 simultaneously.Like this, flow through first medicine of the first feed path A just is back to first hold-up tank 1 through the first return flow path C.In other words, first medicine continues to flow in the circulating path that is made of first hold-up tank 1, the first feed path A and the first return flow path C.Similarly, flow through second medicine of the second feed path B is back in second hold-up tank 2 through the second return flow path E.In other words, second medicine continues to flow in the circulating path that is made of second hold-up tank 2, the first feed path B and the second return flow path E.
Owing in the first feed path A, keep first medicine all the time and flow, so prevented the cohesion and the sedimentation of first medicine.In addition, in the second feed path B, the cohesion and the sedimentation of second medicine have been prevented.
Cerium abrasive particle in the cerium suspension is cohesion and sedimentation easily, therefore, when the part of the cerium suspension of the first feed path A that only will flow through is supplied with the first return flow path C, because the underfed among the first return flow path C, in the first return flow path C, the cohesion or the sedimentation of cerium abrasive particle might take place.In first kind of embodiment, the cerium suspension is supplied with the first return flow path C via bypass path D.Thereby, increase the flow of the first return flow path C, prevented the cohesion of the cerium abrasive particle in the first return flow path C or the generation of sedimentation.
According to first kind of embodiment, obtain following effect.
(1), supplies with abrasive particle suspensions and decentralized medium and it is mixed to blender 6 with the flow of regulation and be deployed into slurries according to medicine feeding apparatus 100.Deployed slurries directly delivered to electronic device manufacturing installation 7, so can prevent the sedimentation and the cohesion of slurries, stay-in-grade slurries can be supplied with the electronic device manufacturing installation.
(2) when not when electronic device manufacturing installation 7 is supplied with slurries, by the liquid stream of abrasive particle suspension being remained in the first feed path A via the backflow of the first return flow path C and the identical flow of flow when the electronic device manufacturing installation 7 supply slurries.Therefore, can prevent the sedimentation and the cohesion of the abrasive particle in the first feed path A, simultaneously, when beginning to supply with slurries once more, can promptly supply with stay-in-grade slurries to electronic device manufacturing installation 7.In addition, in the second feed path B, can utilize the second return flow path E to prevent the sedimentation and the cohesion of second medicine.
(3) under the few situation of the flow of the first return flow path C, supply with the abrasive particle suspension to the first return flow path C via bypass path D.Thereby, can prevent the sedimentation and the cohesion of the abrasive particle in the first return flow path C.
(4) not when electronic device manufacturing installation 7 is supplied with slurries, by the backflow of first and second return flow path C, E, the liquid stream of abrasive particle suspension among first and second feed path A, the B and decentralized medium is remained on and the identical flow of flow when electronic device manufacturing installation 7 is supplied with slurries.Thereby, when beginning to supply with slurries once more, can shorten from opening downstream valve 9 and downstream valve 19 and reach time till stable to the flow that makes the abrasive particle suspension that supplies to blender 6 and decentralized medium.Below, the shortening of this time started once more is described with reference to Fig. 3, Fig. 4.
What the curve map of Fig. 3 was represented is a comparative example, is illustrated among first and second feed path A, the B variation of the state that stops to supply with slurries to electronic device 7 because of the liquid stream that makes first and second medicine flow when beginning to supply with slurries once more.Fig. 4 represents is to remain unchanged and the variation of state from slurries to electronic device manufacturing installation 7 that stop the to supply with flow when beginning to supply with slurries once more from the liquid stream that keeps first and second medicine among first and second feed path A, B.
Under the situation of the comparative example of Fig. 3, reach supply flow rate and stablize the required time, for example, in the time will being set at 200mL/min from the supply flow rate of the first feed path A, from supply with once more begin to the error with supply flow rate narrow down to ± the required time of 10mL/min is about 11 seconds.This time is used for adjusting constant pressure valve and throttle orifice at the detected value that supply begins to take into account flowmeter according to pressure in the back once more, adjusts flow.
With respect to this, in the present embodiment, as shown in Figure 4, from beginning to supply with just stabilisation of about 2 flows in second once more.This is because keep the cause of the liquid stream among first and second feed path A, the B.
Secondly, the chemicals feeder 200 of second embodiment of the present invention is described with reference to Fig. 5.The difference of second embodiment and first embodiment is to be provided with the 3rd pump 26 between blender 6 and electronic device manufacturing installation 7.The 3rd pump 26 preferably can suitably be adjusted the pump of delivery flow.
By the 3rd pump 26, under the situation of distance, can supply with slurries with pressure stable with the 3rd pump 26 from blender 6 to electronic device manufacturing installation 7.
Secondly, the chemicals feeder 300 of the 3rd embodiment of the present invention is described with reference to Fig. 6.The 3rd square formula of enforcement and the first embodiment difference are additional first and second cleaning valve 27,28 that has.
Open downstream valve 9 if close second cleaning valve 28, also can carry out the cleaning of blender 6 and electronic device manufacturing installation 7.
Supply with cleaning fluid from second cleaning valve 28 to first cleaning valve 27, cleaning fluid is flowed along the liquid stream rightabout with the abrasive particle suspension, can further improve cleaning performance.
Below, the chemicals feeder 400 of the 4th embodiment of the present invention is described with reference to Fig. 7.The 4th embodiment is that two feed path A1, A2 are set side by side, replaces the feed path A of first embodiment.The same with the 3rd embodiment, on two feed path A1, A2, cleaning valve 29～32 is set.
In the 4th embodiment, can supply with the abrasive particle suspension to electronic device manufacturing installation 7 with one of two feed path A1, A2, carry out the cleaning of another paths simultaneously.Because clean two feed path A1, A2 every the stipulated time, so, can carry out the supply action of abrasive particle suspension continuously.In addition, even in feed path A1, A2, take place also can remove the abrasive particle of cohesion termly under the situation of the sedimentation of abrasive particle and cohesion, can continuously slurries be supplied with electronic device manufacturing installation 7.
First to fourth embodiment also can carry out following change.
Be under the situation of uniform fluid of not sedimentations such as pure water and cohesion at second medicine that flows through the second feed path B, also can omit the second return flow path E.
Be under the situation of inhomogeneous fluid of easy sedimentation and cohesion at second medicine of the second feed path B that flows through, also can on the second feed path B, bypass path be set.
Claims (13)
1. chemicals feeder is will be stored in first and second stoste in first and second hold-up tank respectively to mix and generate admixing medical solutions, and described admixing medical solutions is supplied to the chemicals feeder of external device (ED), it is characterized in that comprising:
First and second feed path, described first and second stoste flow in described first and second feed path with the flow of regulation respectively;
First and second flow regulator, it is separately positioned on described first and second feed path, regulates described first and the flow of second feed path;
First and second return flow path, it is connected to described first and second flow regulator on described first and second feed path and the position between the described external device (ED), stopping when described external device (ED) is supplied with described admixing medical solutions, described first and second stoste is back to described first and second hold-up tank from described first and second feed path respectively, and the flow that will stop described first and second stoste in described first and second feed path when described external device (ED) is supplied with described admixing medical solutions is maintained the identical flow of flow when supplying with described admixing medical solutions.
2. chemicals feeder is will be stored in first liquid in first and second hold-up tank and second liquid respectively to mix and generate slurries, and described slurries are supplied to the chemicals feeder of external device (ED), it is characterized in that comprising:
First feed path, described first liquid that comprises the abrasive particle that is used to allocate described slurries flows therein with the flow of regulation;
Second feed path flows with the flow of regulation therein for allocating described second liquid that described slurries mix with described first liquid;
First and second flow regulator, it is separately positioned on described first and second feed path, is used for being controlled at mobile described first liquid of described first and second feed path and the flow of second liquid;
First and second return flow path, it is connected to described first and second flow regulator on described first and second feed path and the position between the described external device (ED), stopping when described external device (ED) is supplied with described slurries, make described first liquid and second liquid be back to described first and second hold-up tank from described first and second feed path respectively, and the flow that will stop when described external device (ED) is supplied with described slurries described first liquid in described first and second feed path and second liquid is maintained and the identical flow of flow when described external device (ED) is supplied with described slurries.
3. chemicals feeder as claimed in claim 2 is characterized in that also comprising: parallel and supply with the bypass path of described first liquid to described return flow path from described first hold-up tank with described first feed path.
4. as claim 2 or 3 described chemicals feeders, it is characterized in that the path separately of described first and second feed path is provided with:
The upstream valve of opening selectively in order to introduce relevant described liquid from relevant described hold-up tank;
Set the pressure regulation device of the discharge pressure of each feed path; And
In order to supply with the described liquid of being correlated with and the downstream valve of opening selectively to described external device (ED) from each feed path.
5. chemicals feeder as claimed in claim 4 is characterized in that also comprising: operate the control device that described upstream valve, described pressure regulation device and described flow regulator are controlled the flow of described first liquid and described second liquid.
6. as any one described chemicals feeder in the claim 2 to 5, it is characterized in that also comprising: first cleaning valve from cleaning fluid to described first feed path that supply with; With second cleaning valve of discharging described cleaning fluid from described first feed path.
7. chemicals feeder as claimed in claim 6 is characterized in that described first feed path is at least two feed paths that walk abreast; Described first and second cleaning valve is arranged on the path separately of described two feed paths at least.
8. chemicals feeder as claimed in claim 5 is characterized in that described pressure regulation device comprises: detect the pressure in the relevant described feed path and its detected value is offered the pressure gauge of described control device; With the constant pressure valve of controlling according to this manometric detected value by described control device.
9. chemicals feeder as claimed in claim 5 is characterized in that described flow regulator comprises: detect the flow in described each path and its detected value is offered the flowmeter of described control device; With the throttle orifice of controlling according to the detected value of this flowmeter by described control device.
10. one kind mixed liquor supplied with the liquid feed device of external device (ED), this liquid feed device is connected with second hold-up tank of first hold-up tank of storing first liquid and storage second liquid respectively, described first liquid and described second liquid is mixed allocate described mixed liquor; It is characterized in that comprising:
First feed path, described first liquid is flowed through wherein with the flow of regulation;
Second feed path, described second liquid is flowed through wherein with the flow of regulation;
Blender, it is connected with described second path with described first feed path and is used for mixing described first liquid and described second liquid;
First cut-off valve, it is arranged on to be used for cutting off selectively to described blender on described first feed path supplies with described first liquid;
Second cut-off valve, it is arranged on to be used for cutting off selectively to described blender on described second feed path supplies with described second liquid;
First and second flow regulator, the upstream position that it is separately positioned on described first and second cut-off valve on described first and second feed path is used for being controlled at mobile described first liquid of described first and second feed path and the flow of second liquid;
First return flow path, it links together upstream that is positioned at described first cut-off valve on described first feed path and the position and described first hold-up tank that are in the downstream of described first flow adjusting device, stopping when described external device (ED) is supplied with described mixed liquor, will be maintained and the identical flow of flow when described external device (ED) is supplied with the flow of described first liquid in described first feed path before described second liquid mixes;
First return valve, it is arranged on described first return flow path midway;
Control device, this control device is stopping when described external device (ED) is supplied with described mixed liquor, close described first cut-off valve and open described first return valve, so that the flow of described first liquid in described first feed path is maintained and the identical flow of flow when described external device (ED) is supplied with, and makes described first liquid in described first feed path turn back to described first hold-up tank via described first return flow path.
11. liquid feed device as claimed in claim 10 is characterized in that also being included in the upstream position of described second cut-off valve of connection on described second feed path and second return flow path of described second hold-up tank; And second return valve midway that is arranged on described second return flow path, described control device is stopping when described external device (ED) is supplied with described mixed liquor, close described second cut-off valve, and open described second return valve, so that make described second liquid return second hold-up tank via described second return flow path.
12. liquid feed device as claimed in claim 11 is characterized in that when described external device (ED) is supplied with described mixed liquor, described control device is opened described first and second cut-off valve, and closes described first and second return valve.
13. liquid feed device as claimed in claim 12 is characterized in that described first liquid is the suspension that contains abrasive particle; Described second liquid is the dilution that the described suspension of dilution is used; Described mixed liquor is to grind to use slurries.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/JP2003/007858 WO2004113023A1 (en) | 2003-06-20 | 2003-06-20 | Chemical-solution supplying apparatus |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1713967A CN1713967A (en) | 2005-12-28 |
| CN1713967B true CN1713967B (en) | 2011-10-19 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN038255790A Expired - Fee Related CN1713967B (en) | 2003-06-20 | 2003-06-20 | Chemical-solution supplying apparatus |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP4362473B2 (en) |
| CN (1) | CN1713967B (en) |
| WO (1) | WO2004113023A1 (en) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009543691A (en) * | 2006-07-17 | 2009-12-10 | セレリティー，インク． | System and method for processing high purity materials |
| US7799115B2 (en) | 2006-07-17 | 2010-09-21 | Mega Fluid Systems, Inc. | System and method for processing high purity materials |
| CN102082200A (en) * | 2010-11-29 | 2011-06-01 | 常州亿晶光电科技有限公司 | Device for filling chemical reagent with uniform concentration into texturing groove |
| JP2014000644A (en) * | 2012-06-19 | 2014-01-09 | Disco Abrasive Syst Ltd | Liquid mixture supply system |
| TWI574789B (en) * | 2012-11-13 | 2017-03-21 | 氣體產品及化學品股份公司 | Slurry supply and/or chemical blend supply apparatuses, processes, methods of use and methods of manufacture |
| JP6295107B2 (en) * | 2014-03-07 | 2018-03-14 | 株式会社荏原製作所 | Substrate processing system and substrate processing method |
| WO2016057797A1 (en) * | 2014-10-08 | 2016-04-14 | Air Products And Chemicals, Inc. | Low pressure fluctuation flow control apparatus and method |
| KR101900788B1 (en) | 2017-01-03 | 2018-09-20 | 에스케이실트론 주식회사 | Wafer polishing system |
| CN108145595B (en) * | 2017-12-22 | 2020-07-07 | 北京半导体专用设备研究所（中国电子科技集团公司第四十五研究所） | Polishing solution supply device and system |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6280300B1 (en) * | 1998-11-25 | 2001-08-28 | Ebara Corporation | Filter apparatus |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000218107A (en) * | 1998-11-25 | 2000-08-08 | Ebara Corp | Filter and grinding liquid supply apparatus |
| JP3179064B2 (en) * | 1999-01-18 | 2001-06-25 | 株式会社東京精密 | Slurry supply equipment |
| JP3778747B2 (en) * | 1999-11-29 | 2006-05-24 | 株式会社荏原製作所 | Abrasive fluid supply device |
| JP2001345296A (en) * | 2000-06-02 | 2001-12-14 | Reiton:Kk | Chemical supply system |
-
2003
- 2003-06-20 JP JP2005500911A patent/JP4362473B2/en not_active Expired - Fee Related
- 2003-06-20 WO PCT/JP2003/007858 patent/WO2004113023A1/en active Application Filing
- 2003-06-20 CN CN038255790A patent/CN1713967B/en not_active Expired - Fee Related
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6280300B1 (en) * | 1998-11-25 | 2001-08-28 | Ebara Corporation | Filter apparatus |
Non-Patent Citations (2)
| Title |
|---|
| JP特开-2000202774A 2000.07.25 |
| JP特开2001-150347A 2001.06.05 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP4362473B2 (en) | 2009-11-11 |
| CN1713967A (en) | 2005-12-28 |
| WO2004113023A1 (en) | 2004-12-29 |
| JPWO2004113023A1 (en) | 2006-07-20 |
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