CN1702495A - Static neutralization apparatus and machine thereof - Google Patents

Static neutralization apparatus and machine thereof Download PDF

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Publication number
CN1702495A
CN1702495A CN 200410038358 CN200410038358A CN1702495A CN 1702495 A CN1702495 A CN 1702495A CN 200410038358 CN200410038358 CN 200410038358 CN 200410038358 A CN200410038358 A CN 200410038358A CN 1702495 A CN1702495 A CN 1702495A
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China
Prior art keywords
conduction
static
axostylus axostyle
static eraser
eraser according
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Granted
Application number
CN 200410038358
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Chinese (zh)
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CN100381883C (en
Inventor
倪厚耀
叶光秤
简荣皇
林金源
赖宏德
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TPO Displays Corp
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Toppoly Optoelectronics Corp
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Priority to CNB200410038358XA priority Critical patent/CN100381883C/en
Publication of CN1702495A publication Critical patent/CN1702495A/en
Application granted granted Critical
Publication of CN100381883C publication Critical patent/CN100381883C/en
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Abstract

A static elimination device and a corresponding machine are applied specially to the mechanism of which delivery things and mechanism have no conductivity and which generates electrostatic accumulation easily, for example base plate conductivity in liquid crystal display panel manufactory, wherein, said static elimination device comprises conductive shaft lever and a corresponding conductive elastic component, mercury joint, wire and earth terminal, which forms a conductive earthed circuit path and transfers static to earth terminal through conductive path to eliminate said static when conductive shaft lever and delivery matters frictioning and generating static.

Description

Static eraser and board thereof
Technical field
The present invention is relevant for a kind of static (Electro Static Damage, ESD) cancellation element and board thereof, but particularly be applied in the mechanism that transmission thing and the neither tool conductive capability of connecting gear are easy to generate buildup of static electricity, as the substrate transfer mechanism in the display panels manufacturing plant.
Background technology
The normal roller bearing load mode of using transmits the desire substrate processing in the flat-panel screens manufacture process at present, and cause dirty sticking or scratch for fear of contact area is excessive, the general made ring of rubber material or plastic material that all can add is regarded fender, and utilizes it and the friction of desiring substrate processing to reach the purpose of transmission.Because of being lower than X eliminators such as employed ionizer, soft X-ray in Celsius 600 connecting gears of spending, being higher than in Celsius 600 working environments of spending in temperature and can't bringing into play the function of eliminating static again at normal temperature or temperature.So, when the procedure for processing temperature is higher than the upper limit temperature of heat tolerance of the made roller bearing of the made ring of rubber material or plastic material and common metal (for example iron), then use the roller bearing of high temperature resistant material instead.
High temperature resistant material roller bearing commonly used at present is quartzy roller bearing; but because of general desire substrate processing mostly is glass substrate; itself and quartzy roller bearing are all megohmite insulant; causing static to be difficult for dissipating and accumulating easily, when buildup of static electricity extremely to a certain degree just can damage product by regular meeting in rubbing with the mechanism that reaches the transmission purpose.
With present low temperature polycrystalline silicon LCD (LTPS LCD) processing procedure is example, and wherein (Rapid Thermal Annealing Process RTP), is the most normal present a kind of technology that is applied to the high annealing process stage to the quick high-temp annealing technology.Typical quick high-temp annealing board 1 primary structure as shown in Figure 1, among the figure, 10 is preheating zone (Pre-heat Zones), and it is with infrared ray Halogen lamp LED (Infraredhalogen lamps), and glass substrate 42 is heated to specific preheat temperature by room temperature is progressive.20 is hot processing procedure district (Thermal Process), and it is with xenon lamp (Xenon Arc Lamp), and the polysilicon layer (silicon film layer) with being deposited on the glass substrate 42 quickly heats up to the process temperatures that sets from preheat temperature.30 is that heating processing procedures district, back (Post-process heating Zones) also is called the cooling zone, it is with infrared ray Halogen lamp LED (Infrared halogen lamps), glass substrate 42 is reduced to low temperature by condition of high temperature mitigation, avoid causing glass substrate 42 cracked because of rapid cooling.Transfer system (Conveyor System) the 50th utilizes motor to drive roller bearing 40 (quartzroller) through gear band, utilizes the rotation of roller bearing 40 that glass substrate 42 is transmitted by above-mentioned each heating zone.The schematic top plan view that promptly shows rapid heating chamber (RTP Chamber) 10 among Fig. 2, roller bearing 40 are fixed between the two side 41 (Side Chamber Wall), and glass substrate 42 places the top of roller bearing 40 to advance along the direction of arrow.
Fig. 3 is the structural representation that shows a traditional roller bearing 40, and it is made up of a quartzy roller bearing 400 and two stainless steel stop sleevees 402, because glass substrate 42 utilizes the purpose that reaches transmission continuously with quartzy roller bearing 400 frictions.But when glass substrate 42 rubs with quartzy roller bearing 400, glass substrate 42 all can produce static with the surface of quartzy roller bearing 400, and glass substrate 42 is megohmite insulant with quartzy roller bearing 400, cause static to be difficult for dissipating and accumulation easily, especially be accumulated in the static that transmits the quartzy roller surface of product in cooling zone and the heating chamber, when buildup of static electricity to a certain degree, just product is caused damage, for example in Fig. 4 A and choosing place of Fig. 4 B circle, the tip that is presented at product lead (or contact) can produce burnt trace because of static damage, thereby further causes the electric leakage situation to produce.
Summary of the invention
In view of this, fundamental purpose of the present invention is to provide a static eraser, is applicable to the conveyer that is easy to generate static, particularly carries out the machine or the device of procedure for processing in hot environment, for example is low temperature polycrystalline silicon tempering board.
Static eraser of the present invention is to comprise: a conduction axostylus axostyle; Two conductive support, respectively this conductive support has a sleeve and is arranged at this conduction axostylus axostyle two ends, and the other end then is located on the corresponding sidewall of this tempering board, formation one accommodation space between end and the corresponding sleeve of this conduction axostylus axostyle; Two electrically conductive elastic assemblies, respectively this electrically conductive elastic assembly is arranged in this correspondence accommodation space, and the two ends of this electrically conductive elastic assembly also contact with this conduction axostylus axostyle and sleeve; One conduction swivel adapter head comprises a joint body and a connection piece, and wherein this joint body is to be located at this conductive support one end, and can be with respect to this web member rotation, and this web member then is fixedly arranged in the wall of this tempering board; The ad-hoc location of this web member is provided with a lead and is coupled on the earth terminal.
Then, the invention provides a board, carry out a heating processing in order to the polysilicon layer with glass substrate, is to comprise: the two side; A plurality of roller bearings, respectively this roller bearing is to be located between this two side to carry at least one glass substrate in order to take advantage of, respectively this roller bearing comprises: a conduction axostylus axostyle; Two conductive support, respectively this conductive support has a sleeve and is arranged at this conduction axostylus axostyle two ends, formation one accommodation space between end and the corresponding sleeve of this conduction axostylus axostyle; Two electrically conductive elastic assemblies, respectively this electrically conductive elastic assembly is arranged in this correspondence accommodation space, and the two ends of this electrically conductive elastic assembly also contact with this conduction axostylus axostyle and sleeve; One conduction swivel adapter head comprises a joint body and a connection piece, and wherein this joint body is to be located at this conductive support one end, and can be with respect to this web member rotation, and this web member then is fixedly arranged in the side wall surface of this tempering board; The ad-hoc location of this web member is provided with a lead and is coupled on the earth terminal; And a transfer system, in order to drive these a plurality of conduction spindle rotation to transport this at least one glass substrate.
Description of drawings
Fig. 1 is the primary structure that shows a typical low temperature polycrystalline silicon tempering board;
Fig. 2 shows rapid heating chamber (RTP Chamber) schematic top plan view;
Fig. 3 is the structural representation that shows a traditional roller bearing;
Fig. 4 A and Fig. 4 B are presented at the burnt trace that product produces because of static damage.
Fig. 5 is the floor map that shows a preferred embodiment of the present invention roller bearing;
Fig. 6 is the floor map that shows a preferred embodiment of the present invention;
Fig. 7 is the floor map that shows another preferred embodiment of the present invention;
Fig. 8 shows static eraser of the present invention is arranged on the low temperature polycrystalline silicon tempering board;
Fig. 9 A and Fig. 9 B show an experimental data figure.
Symbol description:
Preheating zone~10; Hot processing procedure district~20; Back heating processing procedures district~30; Transfer system~50; Roller bearing~40; Glass substrate~42; Quartzy roller bearing~400; Stainless steel stop sleeve~402; Quick high-temp annealing board~1; Static eraser~2; Roller bearing~3; Low temperature polycrystalline silicon tempering board~4; Conduction axostylus axostyle~30; Conductive support~32; Electrically conductive elastic assembly~34; Conduction swivel adapter head~36; Sleeve~320; Sidewall~41; 0 type ring~324; Joint body~360; Web member~362; Earth terminal~GND.
Embodiment
For above and other objects of the present invention, feature and advantage can be become apparent, a preferred embodiment cited below particularly, and cooperate appended diagram, be described in detail below:
Fig. 5 shows that the present invention is applied in the structural representation of roller bearing, and it is to be suitable for being arranged in the conveyer of a board (figure does not show).
Conduction axostylus axostyle 30 is the axostylus axostyle of stainless steel or silicon carbide material, wherein silicon carbide material can be high temperature resistant, for example be suitable for being applied in the heating chamber of tempering board (heater chamber), can also other resistant to elevated temperatures conductive material make, for example molybdenum silicide, graphite, metal carbide etc. can anti-conductive material more than 600 ℃.
By the conduction roller bearing 30 of present embodiment, when when transmitting glass substrate, the static that glass substrate and roller bearing produce because of friction can transmit and be scattered on the roller bearing axis body, so can reduce the particulate and the static that produce because of friction, and the yield of product is promoted.
Fig. 6 is the floor map that shows static eraser one preferred embodiment of the present invention, it is to be applicable in the transfer system of board of a high temperature process environment, it for example is low temperature polycrystalline silicon tempering board, this static eraser 2 comprises a plurality of roller bearings 3 to carry at least one glass substrate (figure does not show), and roller bearing 3 comprises conduction axostylus axostyle 30, conductive support 32, electrically conductive elastic assembly 34 and a conduction swivel adapter head 36.
Conduction axostylus axostyle 30 is the axostylus axostyle of stainless steel or silicon carbide material, wherein silicon carbide material can be high temperature resistant, be suitable for being applied in the heating chamber (heater chamber) of tempering board, can also other resistant to elevated temperatures conductive material make, for example the conductive material that molybdenum silicide, graphite, metal carbide etc. can high temperature resistant (more than 600 ℃).And therefore the stainless steel axostylus axostyle can only be used for heating chamber transit area in addition because of non-refractory.
Two ends at conduction axostylus axostyle 30 are provided with conductive support 32, each conductive support 32 has the two ends that sleeve 320 is arranged at conduction axostylus axostyle 30, the other end of conductive support 32 then is located on the corresponding sidewall 41 of board, end and 320 in sleeve at this conduction axostylus axostyle 30 are formed with accommodation space 322, in each sleeve 320, be provided with two O type rings 324 in order to fixing conduction axostylus axostyle 30, in stainless steel sleeve 320, be provided with electrically conductive elastic assembly 34, metal spring for example, contact is contacted with between the bottom and conduction axostylus axostyle 30 of stainless steel sleeve 320, wherein, this electrically conductive elastic assembly 34 also can be metal clips or other electrically conductive elastic assembly.
Conduction swivel adapter head 36 for example is a mercury joint, comprise a joint body 360 and a connection piece 362, wherein joint body 360 is arranged at an end of conductive support 32, and can be with respect to web member 362 rotations, 362 of web members are fixedly installed in the sidewall 41, more be provided with a lead 38 and be coupled to earth terminal GND on web member 362.
Therefore, can form a conductive path ground connection by electrically conductive elastic assembly 34, mercury joint 36, lead 38 and the earth terminal of conduction axostylus axostyle 3 through connecting, when in transport process, producing static because of friction with glass substrate, static promptly can be sent to earth terminal GND via above-mentioned conductive path, to eliminate the generation that static discharge damages situation.
Fig. 7 is another preferred embodiment of roller bearing in the displayed map 6, most of assembly of roller bearing 3 ' for example conductive support 32, electrically conductive elastic assembly 34 and conduction swivel adapter head 36 is all identical with Fig. 6 does not repeat them here, its main difference place is that this conduction axostylus axostyle 30 ' has concavo-convex outside surface, to reduce particulate and the static that produces because of friction.
See also Fig. 6 and Fig. 8, Fig. 8 shows static eraser 2 of the present invention is arranged on the low temperature polycrystalline silicon tempering board 4, it is that many roller bearings 3 are arranged between the two side, roller bearing 3 can drive belt interlock roller bearing 3 by the motor in the connecting gear 50 and rotate glass substrate 42 is transmitted by above-mentioned preheating zone 10, hot processing procedure district 20, heating processing procedures district, back 30, when producing static because of friction, static can reach earth terminal GND via conduction axostylus axostyle 30, electrically conductive elastic assembly 34, conductive support 32, conduction swivel adapter head 36, lead 38, and static is eliminated.
Fig. 9 A and Fig. 9 B show an experimental data figure, the diverse location of its transverse axis representative in heating chamber, and the electrostatic potential that longitudinal axis representative measures, wherein family curve A is the electrostatic potential value that representative is measured when implementing with traditional quartzy roller bearing; Electrostatic potential value after family curve B representative is implemented with static eraser of the present invention utilizes its magnitude of voltage of static eraser of the present invention more stable by experimental data figure as can be known, and preferable static is eliminated usefulness and also can be demonstrate,proved thus.
Though the present invention discloses as above with preferred embodiment; right its is not in order to limit the present invention; anyly have the knack of this skill person; without departing from the spirit and scope of the present invention; when can doing a little change and retouching, so protection scope of the present invention is as the criterion when looking appended the claim scope person of defining.

Claims (10)

1. a static eraser comprises at least:
One conduction axostylus axostyle;
Two conductive support are in order to support this conduction axostylus axostyle; And
One earth terminal is electrically connected to this conduction axostylus axostyle.
2. static eraser according to claim 1, wherein this conductive support has a sleeve, formation one accommodation space between end and this sleeve of this conduction axostylus axostyle.
3. static eraser according to claim 1, wherein further comprise a conduction swivel adapter head, this conduction swivel adapter head comprises a joint body and a connection piece that is connected with this joint body, wherein this joint body is arranged at an end of this conductive support, and can be with respect to this web member rotation, wherein this web member is electrically connected to this earth terminal.
4. static eraser according to claim 1, wherein the material of this conduction axostylus axostyle is to be selected from following group: silit, molybdenum silicon, graphite, metal carbide, stainless steel, with above-mentioned composition.
5. static eraser according to claim 3, wherein this conduction swivel adapter head is the mercury joint.
6. static eraser according to claim 1, wherein this conductive support is a stainless steel.
7. static eraser according to claim 2 comprises more that wherein an electrically conductive elastic assembly places this accommodation space, and this electrically conductive elastic assembly connects this conduction axostylus axostyle and this sleeve.
8. static eraser according to claim 7, wherein this electrically conductive elastic assembly is a metal spring.
9. static eraser according to claim 1, wherein this conduction axostylus axostyle further has non-isodiametric concavo-convex outside surface.
10. a board in order to substrate is carried out a heating processing, is characterized by: have the static eraser of putting down in writing as claim 1.
CNB200410038358XA 2004-05-24 2004-05-24 Static neutralization apparatus and machine thereof Expired - Fee Related CN100381883C (en)

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Application Number Priority Date Filing Date Title
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Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CNB200410038358XA CN100381883C (en) 2004-05-24 2004-05-24 Static neutralization apparatus and machine thereof

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CN1702495A true CN1702495A (en) 2005-11-30
CN100381883C CN100381883C (en) 2008-04-16

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Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100458517C (en) * 2007-03-01 2009-02-04 友达光电股份有限公司 Base plate carrying device and supporting apparatus
CN101175362B (en) * 2006-11-01 2011-12-14 东京毅力科创株式会社 Charge eliminating apparatus and method, and program storage medium
US8085052B2 (en) 2006-11-01 2011-12-27 Tokyo Electron Limited Charge eliminating apparatus and method, and program storage medium for removing static electricity from a target object such as a wafer
CN104603926A (en) * 2012-08-29 2015-05-06 夏普株式会社 Substrate processing device and device for producing liquid crystal display panel
CN105530750A (en) * 2014-09-29 2016-04-27 盛美半导体设备(上海)有限公司 Wafer static conductive apparatus
CN106783724A (en) * 2017-01-11 2017-05-31 惠科股份有限公司 Substrate bearing device
CN107113956A (en) * 2014-10-31 2017-08-29 维也纳顺克股份有限公司 Static discharge device
CN108190412A (en) * 2018-02-08 2018-06-22 申翔宇 Dual anti-high-polymer supporting roller bearing block
CN109987414A (en) * 2019-05-08 2019-07-09 广州林恩静电科学技术应用有限公司 A kind of flat panel display product roller transmissioning device with static safety technology scheme
CN110238816A (en) * 2019-05-09 2019-09-17 京东方科技集团股份有限公司 Mechanical arm, manipulator and transmission equipment
CN110872000A (en) * 2018-08-29 2020-03-10 日本电产三协株式会社 Transfer robot
CN110997337A (en) * 2017-08-10 2020-04-10 精工爱普生株式会社 Printing device
CN114696120A (en) * 2020-12-25 2022-07-01 颀邦科技股份有限公司 Grounding structure

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0449841A (en) * 1990-06-14 1992-02-19 Mitsubishi Electric Corp Cylindrical linear transfer system
KR940005459Y1 (en) * 1991-05-15 1994-08-13 주식회사 에스. 케이. 씨 Roll for resin film producing
FR2678925B1 (en) * 1991-07-11 1996-12-13 Saint Gobain Vitrage Int COATING FOR CONVEYOR ROLLS.

Cited By (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101175362B (en) * 2006-11-01 2011-12-14 东京毅力科创株式会社 Charge eliminating apparatus and method, and program storage medium
US8085052B2 (en) 2006-11-01 2011-12-27 Tokyo Electron Limited Charge eliminating apparatus and method, and program storage medium for removing static electricity from a target object such as a wafer
CN100458517C (en) * 2007-03-01 2009-02-04 友达光电股份有限公司 Base plate carrying device and supporting apparatus
CN104603926A (en) * 2012-08-29 2015-05-06 夏普株式会社 Substrate processing device and device for producing liquid crystal display panel
CN105530750A (en) * 2014-09-29 2016-04-27 盛美半导体设备(上海)有限公司 Wafer static conductive apparatus
US10660188B2 (en) 2014-10-31 2020-05-19 Schunk Wien Gesellschaft M.B.H. Electrostatic discharging device
CN107113956A (en) * 2014-10-31 2017-08-29 维也纳顺克股份有限公司 Static discharge device
CN107113956B (en) * 2014-10-31 2019-01-18 维也纳顺克股份有限公司 Static discharge device
WO2018129881A1 (en) * 2017-01-11 2018-07-19 惠科股份有限公司 Substrate bearing device and liquid crystal display fabricating device
CN106783724A (en) * 2017-01-11 2017-05-31 惠科股份有限公司 Substrate bearing device
US10766713B2 (en) 2017-01-11 2020-09-08 HKC Corporation Limited Substrate carrier apparatus and liquid crystal display manufacturing device
CN110997337A (en) * 2017-08-10 2020-04-10 精工爱普生株式会社 Printing device
CN108190412A (en) * 2018-02-08 2018-06-22 申翔宇 Dual anti-high-polymer supporting roller bearing block
CN110872000A (en) * 2018-08-29 2020-03-10 日本电产三协株式会社 Transfer robot
CN109987414A (en) * 2019-05-08 2019-07-09 广州林恩静电科学技术应用有限公司 A kind of flat panel display product roller transmissioning device with static safety technology scheme
CN110238816A (en) * 2019-05-09 2019-09-17 京东方科技集团股份有限公司 Mechanical arm, manipulator and transmission equipment
CN114696120A (en) * 2020-12-25 2022-07-01 颀邦科技股份有限公司 Grounding structure

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