CN1701248A - Photosensitive composition, photosensitive color composition, color filter, and liquid crystal display equipemnt - Google Patents

Abstract

A photosensitive composition capable of forming pixels having good edge shapes, that is, a photosensitive composition comprising a binder resin (A) obtained by reacting a product of reaction of an epoxy resin (a) with an unsaturated carboxylic acid (b) with a polybasic carboxylic acid or an anhydride thereof (c) and a photopolymerization initiator (B), characterized in that the epoxy resin (a) is one obtained by reacting a product of polyaddition of a cyclic hydrocarbon compound having two or more unsaturated groups per molecule with a phenol with an epihalohydrin.

Description

Photosensitive composition, photosensitive colored composition, color filter and liquid crystal display

Invention field

The present invention relates to photosensitive composition (photosensitive composition), photosensitive colored composition (photosensitive colored composition), color filter (color filter) and liquid crystal display (liquid crystal display device).More specifically, the present invention relates to following photosensitive composition, less background dyeing when it has guaranteed excellent liquid stability, high-fire resistance, development, to the good adhesion of substrate, and good pixel (pixel) edge contour, and be fit to the preparation color filter.

Background technology

As for by using the method for pigment prepared color filter, decoration method, electrodeposition process, gunite, pigment dispersing method etc. have been known so far.

In the pigment dispersing method, usually by adhesive resin, Photoepolymerizationinitiater initiater, photo polymerization monomer etc. are added in the coloured composition, and photoactivate said composition and the photosensitive colored composition that obtains are coated on the substrate of glass, dry, by mask exposure, develop formation multicolour pattern and heating are with the photographic fixing pattern, thus the formation pixel, wherein in described coloured composition, pigment disperses by spreading agent.Color filter prepares by each color is repeated these steps.In the imaging of the color filter that passes through the use photosensitive colored composition, for example, need abundant high resolution, bounding force and the low development remnants (residue) good to substrate.In addition, in recent years, require to have the pixel of high color density or have at the bottom of the resin black of high optical density (OD), and the content as painted materials such as pigment or carbon blacks tends to increase in the photosensitive colored composition.

On the other hand,, comprise above-mentioned photosensitive colored composition, comprise the photoetching process of coating, drying, exposure and development step usually to comprising the photosensitive composition of photopolymerisable component, Photoepolymerizationinitiater initiater and adhesive resin.In the method, the common requirement do not produce remnants and do not have background dyeing in the part of developing after removing, and the part for the treatment of removing guarantees sufficiently high solubleness, and has improved pixel formation performance, for example pattern edge sharpness (sharpness).

When pixel is when using above-mentioned photosensitive colored composition with high painted material content to form, following phenomenon appears easily, for example in development step, on the unexposed area of substrate, generate remnants or background dyeing, unexposed area can't obtain good solubility, poor definition in the edge contour of pixel, even the photosensitivity deficiency of the pixel that in the exposure area, forms or surface light slippage, these all are the problems of especially severe.

In order to address these problems, following photosensitive colored composition is disclosed, in this photosensitive colored composition, use to have the phenolic aldehyde epoxy acrylate of carboxyl as adhesive resin (referring to patent documentation 1).Yet, even have been found that when using this adhesive resin, because the balanced differences between solubleness and the photosensitivity, developer takes place be penetrated into the exposure area unexposed area dissolving takes place simultaneously, and this causes the unsharp formation of pixel edge and the pixel problems such as poor adhesion to substrate.

In addition, disclose and used following photosensitive resin composition as adhesive resin, in described photosensitive resin composition, the unsaturated compound and acrylic acid (ester) resinoid (acryl resin) reaction (referring to patent documentation 2) that contain the alicyclic epoxy base with carboxyl, but have been found that:, occurred owing to photosensitivity is not enough as pixel to the poor adhesion of substrate and be difficult to form the problem of the pixel of pinpoint accuracy even when using this adhesive resin.

On the other hand, the photocurable resin composition that is used to weld resist (solder resist) is disclosed, it can solve the more highly integrated etc. of printed wiring board, wherein used reactant and multi-anhydride to react the photosensitive resin that obtains by making epoxy resin and unsaturated monocarboxylic acid, thereby resolution, development property, cohesiveness and plating patience (referring to, patent documentation 3) have been improved.Yet, different with color filter composition is, it is low to be used to weld the coloured material content that the photocurable resin composition of resist has, and do not know that fully can this resin be used for the color filter purposes, this purposes has the trend that increases in the photosensitive colored composition as the content of the coloured material of pigment or carbon black.Especially, can not predict that can this resin overcome following problem: in development step, the remnants that on the unexposed area of substrate, produce or background dyeing, pixel edge contour sharpness and smooth surface.

[patent documentation 1]

JP-A-11-84126

[patent documentation 2]

JP-A-1-289820

[patent documentation 3]

Jap.P. 2931860

Summary of the invention

An object of the present invention is to provide excellently and have high painted material concentration and be applicable to the photosensitive composition of color filter purposes, and provide photosensitive colored composition, color filter and the liquid crystal display by using this photosensitive composition to prepare separately at imaging performance.

The result that takes a broad survey who carries out as addressing the above problem, the present inventor has been found that the balance of photosensitive composition between photosensitivity and solubleness that contains special adhesive resin (A) is excellent, and given pixel very excellent marginal sharpness and bounding force, found that also the light shield pattern (light-shielding pattern) (black matrix) that is obtained has good profile.The present invention is based on above-mentioned discovery and be achieved.

More specifically, first main points of the present invention are: a kind of photosensitive composition, and it comprises that (A) is by making (a) epoxy resin and (b) containing the adhesive resin that reactant and (c) polybasic carboxylic acid or its anhydride reaction of the carboxylic acid of unsaturated group obtain; (B) Photoepolymerizationinitiater initiater, wherein

Epoxy resin (a) is the reaction product that epihalohydrins and per molecule have the polyaddition reaction product of the cyclic hydrocarbon compound of two or more unsaturated groups and phenol.

Second main points of the present invention are: a kind of photosensitive colored composition, it comprises above-mentioned photosensitive composition and (C) coloured material.

The 3rd main points of the present invention are: the photosensitive composition that is used for the light shield pattern, wherein in the cross-sectional profiles of the light shield pattern image on being formed on transparent substrates, by basal surface with the substrate contact side on the angle that forms of light shield pattern plane be 50 ° or little.

The 4th main points of the present invention are: a kind of color filter, it comprises the transparent substrates that has the light shield pattern on it, wherein said light shield pattern is to use photosensitive composition to form, and by basal surface with the substrate contact side on the angle that forms of light shield pattern plane be 50 ° or little.

Five points of the present invention is: a kind of color filter, and it comprises transparent substrates, described transparent substrates has the pixel by using above-mentioned photosensitive colored composition to form thereon.

The 6th main points of the present invention are: a kind of liquid crystal display, it is made by using above-mentioned color filter.

Photosensitive composition of the present invention has good bounding force to substrate.In addition, is excellent by coloured material being blended into the photosensitive colored composition that obtains in the described photosensitive composition in development property, aspect the bounding force of substrate or light shielding layer and smooth surface, even and the coloured material that contains high concentration (for example, pigment or carbon black) time, the pixel of pinpoint accuracy also can be formed.In addition, can provide high-quality color filter that uses this photosensitive colored composition and the high-quality liquid crystal display that uses this color filter.

Except that the color filter purposes, photosensitive composition of the present invention is suitable as welding resist, the plating resist of flexibility printed circuit board, the interlayer dielectric that is used for multilayer printed wiring board, photosensitive optical waveguide, Photosetting liquid crystal sealing material, Photosetting EL encapsulant and Photosetting bonding agent etc.

Description of drawings

Fig. 1 is the synoptic diagram of bevel angle in the explanation black matrix pattern.

In the drawings, 1 expression black matrix pattern, 2 expression basal surfaces and 3 expression bevel angles.

Embodiment

Below will describe the present invention in detail.

[photosensitive composition]

Photosensitive composition of the present invention contains as (A) adhesive resin of principal ingredient and (B) Photoepolymerizationinitiater initiater, and can contain photopolymerisable monomer etc. as required.

＜adhesive resin (A) 〉

Adhesive resin (A) is to obtain with (c) polybasic carboxylic acid or its anhydride reaction by the reactant that makes (a) epoxy resin and (b) contain the carboxylic acid of unsaturated group.

Epoxy resin (a):

Epoxy resin (a) is the reaction product of the polyaddition reaction product of cyclic hydrocarbon compound (being designated hereinafter simply as " unsaturated cyclic hydrocarbon hydrocarbon compound ") with two or more unsaturated groups of epihalohydrins and per molecule and phenol (phenol).

Adhesive resin (A) is considered to show good properties, because the cyclic hydrocarbon structure of principal ingredient epoxy resin (a) and volume are big and have suitable hydrophobicity and because the infiltration of developer prevents that the exposure area from corroding.

Unsaturated cyclic hydrocarbon compound per molecule has 4 unsaturated groups usually, preferred 2 unsaturated groups.

Unsaturated cyclic hydrocarbon compound is not particularly limited, but has 5-20 carbon atom usually, preferably have 6-12 carbon atom.The instantiation of unsaturated cyclic hydrocarbon compound comprises the unsaturated aliphatic hydrocarbon compound, as bicyclopentadiene, tetrahydro indenes, 2-vinyl cyclohexene, 5-vinyl norbornene-2-alkene, australene, nopinene and citrene, and unsaturated compound aromatic hydrocarbon, for example divinylbenzene.In the middle of these, preferred bicyclopentadiene.

Bicyclopentadiene is contained in the petroleum fraction, therefore, for example other aliphatic series or aromatic diene contain as impurity in industrial bicyclopentadiene sometimes, but consider thermotolerance, curability (curability) etc., the purity of bicyclopentadiene is preferably 90wt% or higher, more preferably 95wt% or higher.

The phenol that polymerization is added to unsaturated cyclic hydrocarbon compound is not particularly limited, as long as its compound of having at least one aromatic hydroxy for per molecule, its instantiation comprise unsubstituted phenol and with the phenol of the replacement of bondings such as alkyl, alkenyl, allyl, aryl, aralkyl and halogen.The example of the phenol of the latter's replacement comprises: mono-substituted phenol, for example cresols, two phenyl methylcarbamates, ethyl-phenol, isopropyl-phenol, butylphenol, octyl phenol, nonyl phenol, vinylphenol, isopropyl-phenol, chavicol, phenylphenol, benzyl phenol, chlorophenol and bromophenol (comprise separately and replace the different isomeride in position); Dibasic phenol, for example xylenol and tert-butyl-5-methyl phenol (comprise separately and replace the different isomeride in position); Trisubstituted phenol, for example pseudocuminol (comprise separately and replace the different isomeride in position); Naphthols, for example 1-naphthols, beta naphthal and naphthalenediol (comprising 1,2-, 1,3-, 1,4-, 1,5-, 1,6-, 1,7-, 1,8-, 2,3-, 2,6-and 2,7-isomeride); And divalent phenol, for example bisphenol-A, Bisphenol F, bisphenol S, bisphenol Z, bis-phenol P, bis-phenol M, naphthalenediol-benzophenone, biphenyl, p-dihydroxy-benzene and resorcinol.In the middle of these, consider curability, be preferably phenol and cresols.

Epihalohydrins (epihalohydrin) as for being used for the reaction of the polyaddition reaction product of unsaturated cyclic hydrocarbon compound and phenol can use chloropropylene oxide, epiiodohydrin, epibromohydrin, Beta-methyl chloropropylene oxide etc., but most preferably be chloropropylene oxide.

Therefore, epoxy resin (a) most preferably is the polyaddition reaction product of bicyclopentadiene and phenol or cresols and the reaction product of epihalohydrins.

The preparation method of the epoxy resin (a) that the present invention is used is not particularly limited, as long as use above-mentioned starting material, and the preparation method comprises the method described in the JP-A-11-209584.

Epoxy resin (a) also can be bought acquisition, for example dicyclopentadiene-type epoxy resin EpiclonHP7200 series (Dai-Nippon Ink﹠amp; Chemicals, Inc. produces), preferably use epoxy resin XD1000 series (Nippon Kayaku Co., Ltd. produces).

The carboxylic acid compound (b) that contains unsaturated group:

The carboxylic acid compound (b) that contains unsaturated group comprises the unsaturated carboxylic acid with ethylenical unsaturated double bonds, its instantiation comprises that (in the present invention, " (methyl) acryloyl-", " (methyl) acrylate " etc. are meant " acryloyl-or methacryl-", " acrylate or methacrylate " etc. respectively to (methyl) acrylic acid; For example, " (methyl) acrylic acid " is meant " acrylic or methacrylic acid "), crotonic acid, adjacent, between or to vinyl benzoic acid, monocarboxylic acid, for example haloalkyl of (methyl) acrylic acid alpha-position, alkoxy, halogen, the product of nitro or cyano group-replacement, 2-(methyl) acrylyl oxy-ethyl succinic acid, 2-acrylyl oxy-ethyl hexane diacid, 2-(methyl) acrylyl oxy-ethyl phthalic acid (phthalic acid), 2-(methyl) acrylyl oxy-ethyl hexahydrophthalic acid, 2-(methyl) acrylyl oxy-ethyl maleic acid, 2-(methyl) acryloyl-oxy propyl group succinic acid, 2-(methyl)-acryloyl-oxy propyl group hexane diacid, 2-(methyl) acryloyl-oxy propyl group tetrahydrophthalic acid, 2-(methyl) acryloyl-oxy propyl group phthalic acid, 2-(methyl) acryloyl-oxy propyl group maleic acid, 2-(methyl) acryloyl-oxy butyl succinic acid, 2-(methyl) acryloyl-oxy butyl hexane diacid, 2-(methyl) acryloyl-oxy butyl hydrogen phthalic acid, 2-(methyl) acryloyl-oxy butyl phthalic acid, 2-(methyl) acryloyl-oxy butyl maleic acid, will be as 6-caprolactone, lactone such as beta-butyrolactone or δ-Wu Neizhi is added into (methyl) acrylic acid and the monomer that obtains, will be as succinic acid (acid anhydride), phthalic acid (acid anhydride) or maleic acid acid such as (acid anhydrides) (acid anhydride) are added into (methyl) acrylic acid hydroxy alkyl ester or pentaerythrite three (methyl) acrylate and monomer and (methyl) acrylic acid dimer of obtaining.

Unsaturated carboxylic acid with ethylenical unsaturated double bonds is preferably aliphatic unsaturated carboxylic acid, more preferably (methyl) acrylic acid.These can with being used in combination of multiple material.

Epoxy resin (a) and contain the reaction of the carboxylic acid (b) of unsaturated group:

As for the method for reaction that makes epoxy radicals and the carboxylic acid that contains unsaturated group in the epoxy resin, can use known method.For example, the carboxylic acid that in the presence of catalyzer, makes epoxy resin and contain unsaturated group in organic solvent in 50-150 ℃ temperature of reaction stoichiometric number hour to tens of hours, carboxylic acid can be added in the epoxy resin thus, described catalyzer, for example tertiary amine (for example, triethylamine, benzyl methyl amine), quaternary ammonium salt (for example, chlorination dodecyl trimethyl ammonium, tetramethyl ammonium chloride, etamon chloride, benzyltriethylammonium chloride), pyridine or triphenylphosphine.

Based on the reaction mixture of raw material, the amount of catalyst system therefor is preferably 0.01-10wt%, more preferably 0.3-5wt%.In order to prevent polymerization reaction take place between the reaction period, preferred use polymerization inhibitor (for example, p methoxy phenol (methoquinone), p-dihydroxy-benzene, methyl hydroquinone, p-dihydroxy-benzene monomethyl ether, pyrogallol, tert-butyl catechol or phenothiazine), and based on the reaction mixture of raw material, the amount of used polymerization inhibitor is preferably 0.01 to 10wt%, and more preferably 0.1 to 5wt%.The carboxylic acid that contains unsaturated group that is added is generally 90-100mol% with the ratio of the epoxy radicals of epoxy resin.Therefore if the residual epoxide base, then this has a negative impact to storage stability, and reaction is usually whenever the amount epoxy radicals, and the equivalent of 0.8-1.5 is preferably under the ratio of 0.9-1.1 equivalent and carries out.

Polybasic carboxylic acid or its acid anhydride (c):

With epoxy resin (a) with contain carboxylic acid (b) reaction of unsaturated group and polybasic carboxylic acid or its acid anhydride (c) of the hydroxyl addition that produces can be known compound, described examples for compounds comprises: dicarboxylic acids, for example maleic acid, succinic acid, itaconic acid, phthalic acid, tetrahydrophthalic acid, hexahydrophthalic acid, methyl-Nei-methylene tetrahydrophthalic acid, chlorendic acid, methyl tetrahydrophthalic acid, 5-norborene-2,3-dicarboxylic acid and methyl-5-norborene-2,3-dicarboxylic acid, and their acid anhydrides; And polybasic carboxylic acid, for example trimellitic acid, pyromellitic acid, benzophenone tetrabasic carboxylic acid and biphenyltetracarboxyacid acid, and their acid anhydrides.In the middle of these, be preferably polybasic acid anhydride, more preferably tetrabydrophthalic anhydride and succinic anhydride.

Based on the addition of component (b) and the hydroxyl that produces, the addition ratio of polybasic carboxylic acid or its acid anhydrides (c) is generally 10-100rnol%, is preferably 20-100mol%, more preferably 30-100mol%.If this addition is bigger than too, residual film is than reducing when then developing; If yet this ratio is too little, solubleness is not enough or to the bounding force deficiency of substrate.

After compound that contains unsaturated group (b) and epoxy resin (a) addition, the method for the described polybasic carboxylic acid of addition or its acid anhydride can be used known method.

In the present invention, also can use following adhesive resin, described adhesive resin is that addition then (d) contains the compound of epoxy radicals and the carboxy moiety of generation obtains by addition polybasic carboxylic acid or its acid anhydride (c).As for component (d), for example, can add the unsaturated compound that contains epoxy radicals, as glycidyl (methyl) acrylate, 3,4-epoxycyclohexyl (methyl) acrylate or have the glycidyl ether compound of polymerisable unsaturated group, to strengthen photosensitivity, can add does not have the glycidyl of polymerisable unsaturated group ether compound yet, to strengthen development property.These two kinds of compounds also can be used in combination.The glycidyl ether compound that does not have the instantiation of the glycidyl ether compound of polymerizable unsaturated group to comprise to have phenyl or alkyl (for example, Denacol EX-111, DenacolEX-121, Denacol EX-141, Denacol EX-145, Denacol EX-146, DenacolEX-171, Denacol EX-192, be trade name, grow) by Nagase Chemicals Ltd..

The adhesive resin that uses among the present invention (A) also comprises the adhesive resin of following acquisition, obtains in the part carboxyl of the described adhesive resin resin that to be the compound (d) that contains epoxy radicals by addition generate to carboxylic acid (b) the reaction back that makes reactant epoxy resin (a) and contain unsaturated group and polybasic carboxylic acid or its acid anhydride (c) reaction.

The weight-average molecular weight (Mw) of the polystyrene conversion (polystyrene-reduced) of the adhesive resin that uses among the present invention (A) is generally 700 or higher, be preferably 1,000 or higher, and be generally 50,000 or lower, be preferably 30,000 or lower, described weight-average molecular weight is by gpc measurement.If this weight-average molecular weight is too little, then thermotolerance and film strength are poor; If yet this weight-average molecular weight is too big, the solubleness deficiency of developer, thereby not preferred.

The acid number (mgKOH/g) of the adhesive resin that uses among the present invention (A) is generally 10 or higher, is preferably 50 or higher, and is generally 200 or lower, is preferably 150 or lower.If this acid number is too low, then can not obtain sufficiently high solubleness; If yet this acid number is too high, the curability deficiency, and surface nature worsens.

Based on the whole solids content of photosensitive composition of the present invention, the content of adhesive resin (A) is generally 10wt% or higher, is preferably 20wt% or higher.If the content of this adhesive resin (A) is extremely low, then developer reduces the solubleness of unexposed area, and this is easy to cause the failure of developing.The term that uses among the present invention " whole solids content " is meant all components outside desolventizing.The whole solids content of photosensitive composition of the present invention is generally 10-90wt%.

＜Photoepolymerizationinitiater initiater (B) 〉

The Photoepolymerizationinitiater initiater that uses among the present invention is not particularly limited, as long as it is the compound that can use active ray polymerization ethylenically unsaturated group under irradiation, but when photosensitive composition of the present invention contains the ethylene type compound when having the compound of polymerizable groups, preferred use following Photoepolymerizationinitiater initiater, this Photoepolymerizationinitiater initiater has by direct absorbing light or by photoactivate generation decomposition reaction or dehydrogenation reaction and produce the ability of polymerization-living radical.

The instantiation of spendable polymerization initiator comprises: the pyrrolotriazine derivatives of halomethylation, 2-(4-methoxyphenyl)-4 for example, two (the trichloromethyl)-s-triazine of 6-, 2-(4-methoxyl naphthyl)-4,6-couple-(trichloromethyl)-s-triazine, 2-(4-ethoxy naphthyl)-4, two (trichloromethyl)-s-triazine of 6-and 2-(4-carbethoxyl group naphthyl)-4, two (the trichloromethyl)-s-triazine of 6-; Halomethylation De oxadiazole derivant, 2-trichloromethyl-5-(2-benzofuranyl)-1 for example, 3,4-oxadiazole, 2-trichloromethyl-5-[(β-(2 '-benzofuranyl) vinyl]-1,3,4-oxadiazole, 2-trichloromethyl-5-(β-(2 '-(6 " benzofuranyl) vinyl)]-1; 3; 4-oxadiazole and 2-trichloromethyl-5-furyl-1,3,4-oxadiazole; Imdazole derivatives, 2-(2 '-chlorphenyl)-4 for example, 5-diphenyl-imidazole dipolymer, 2-(2 '-chlorphenyl)-4,5-two (3 '-methoxyphenyl) imidazole dimer, 2-(2 '-fluorophenyl)-4,5-diphenyl-imidazole dipolymer, 2-(2 '-methoxyphenyl)-4,5-diphenyl-imidazole dipolymer and 2-(4 '-methoxyphenyl)-4,5-diphenyl-imidazole dipolymer; Benzoin alkylether, for example benzoin methyl ether, benzoin phenyl ether, benzoin isobutyl ether and benzoin isopropyl ether; Anthraquinone derivative, for example 2-methylanthraquinone, 2-EAQ, 2-tert-butyl group anthraquinone and 1-chloroanthraquinone; Benzophenone derivates, for example benzophenone, Michler's keton (Michler ' s ketone), 2 methyl benzophenone, 3-methyldiphenyl ketone, 4-methyldiphenyl ketone, 2-chlorobenzophenone, 4-bromine benzophenone and 2-carboxyl benzophenone; Acetophenone derivative, for example 2,2-dimethoxy-2-phenyl acetophenone, 2,2-diethoxy acetophenone, 1-hydroxyl-chlorine hexyl phenyl ketone, alpha-hydroxy-2-aminomethyl phenyl acetone, 1-hydroxyl-1-Methylethyl-(p-isopropyl phenyl) ketone, 1-hydroxyl-1-(to dodecylphenyl) ketone, 2-methyl-(4 '-(methyl sulfenyl (thio)) phenyl)-2-morpholino-1-acetone and 1,1,1-trichloromethyl-(to butyl phenyl) ketone; Thioxanthone derivates, for example thioxanthones, 2-ethyl thioxanthones, 2-isopropyl thioxanthone, 2-clopenthixal ketone, 2,4-dimethyl thioxanthones, 2,4-diethyl thioxanthone and 2,4-diisopropyl thioxanthones; Benzoate derivatives, for example ESCAROL 507 ethyl ester and to the lignocaine ethyl benzoate; Acridine derivatives, for example 9-phenylacridine and 9-(p-methoxyphenyl) acridine; The azophenlyene derivant, for example 9,10-dimethylbiphenyl azophenlyene; Anthracyclinone derivatives, for example benzanthrone; And two luxuriant titanium (titanocene) derivant, dicyclopentadienyl-Ti-dichloride for example, the two phenyl of dicyclopentadienyl-Ti-, dicyclopentadienyl-Ti-two-2,3,4,5,6-phenyl-pentafluoride-1-base, dicyclopentadienyl-Ti-two-2,3,5,6-phenyl tetrafluoride-1-base, dicyclopentadienyl-Ti-two-2,4,6-trifluoro-benzene-1-base, dicyclopentadienyl-Ti-2,6-two fluorobenzene-1-base, dicyclopentadienyl-Ti-2,4-two fluorobenzene-1-base, dimethyl cyclopentadienyl group-Ti-two-2,3,4,5,6-phenyl-pentafluoride-1-base, dimethyl cyclopentadiene-Ti-two-2,6-two fluorobenzene-1-base and dicyclopentadienyl-Ti-2,6-two fluoro-3-(pyl-l-yl)-benzene-1-bases.In addition, can preferably use the oximes polymerization inhibitor described in the JP-A-2000-80068.

Other example of the spendable Photoepolymerizationinitiater initiater of the present invention comprises Fine Chemical, Vol.20, No.4, those initiating agents described in pp.16-26 (March 1,1991), JP-A-59-152396, JP-A-61-151197, JP-6-45-37377, JP-A-58-40302 and the JP-A-10-39503.

Whole solids content based on photosensitive composition of the present invention, the content ratio of Photoepolymerizationinitiater initiater is generally 0.01wt% or bigger, is preferably 0.1wt% or bigger, more preferably 0.5wt% or bigger, and be generally 30wt% or littler, be preferably 10wt% or littler.Photosensitivity reduces if than too little, then may take place this content; If yet too big, the solubleness of the unexposed area of developer is reduced, this causes the failure of developing easily.

＜photo polymerization monomer 〉

In the present invention, in view of photosensitivity etc., except that adhesive resin (A) and Photoepolymerizationinitiater initiater (B), preferably use photo polymerization monomer (photopolymerization compounds).The example of the photo polymerization monomer that uses among the present invention comprises the compound with at least one ethylenically unsaturated group.The compound that has ethylenically unsaturated group in the molecule comprises (methyl) acrylic acid, (methyl) acrylic acid Arrcostab, vinyl cyanide, styrene and polyhydroxy-alcohol (hydric alcohol) or single hydroxyl alcohol and has the monoesters of the carboxylic acid of ethylenic unsaturated bond.

In the present invention, the multiple functionalized olefinic type monomers that has two or more ethylenically unsaturated groups in the preferred per molecule.The example of this olefinic type monomers comprises the ester of aliphatic series polyol and unsaturated carboxylic acid; And as the esterification of multivalence hydroxyl compound such as aliphatic series polyol and aromatics polyol and unsaturated carboxylic acid and polybasic carboxylic acid and the ester that obtains.

The example of the ester of aliphatic series polyol and unsaturated carboxylic acid comprises the acrylate of aliphatic series polyol, glycol diacrylate for example, triethylene glycol diacrylate, trimethylolpropane triacrylate, the trimethylolethane trimethacrylate acrylate, pentaerythritol diacrylate, pentaerythritol triacrylate, tetramethylol methane tetraacrylate, the dipentaerythritol tetraacrylate, dipentaerythritol five acrylate, dipentaerythritol acrylate and glycerine acrylate, and use methacrylic acid respectively, itaconic acid, crotonic acid and maleic acid replace the acrylic acid in these compounds and the methacrylate that obtains, itaconate, crotonates and glutarate.

The example of the ester of aromatics polyol and unsaturated carboxylic acid comprises the acrylate and the methacrylate of aromatics polyol, for example hydroquinone diacrylate, p-dihydroxy-benzene dimethylacrylate, resorcinol diacrylate, resorcinol dimethylacrylate and pyrogallol triacrylate.

The ester that esterification by multivalence polyol and polybasic carboxylic acid and unsaturated carboxylic acid obtains is not necessary for single product, but their representative instantiation comprises the condensation product of acrylic acid, phthalic acid and ethylene glycol; The condensation product of acrylic acid, maleic acid and diglycol; The condensation product of the condensation product of methacrylic acid, terephthalic acid (TPA) and pentaerythrite and acrylic acid, hexane diacid, butylene glycol and glycerine.

Other example that is used for the present invention's polyfunctional olefinic type monomers comprises carbamate (methyl) acrylate, for example make (methyl) acrylate reactions of polyisocyanate compounds and hydroxyl and obtain those, perhaps make (methyl) acrylate reactions of polyisocyanate compounds and polyvalent alcohol and hydroxyl and obtain those; Epoxy acrylate, for example acrylic acid addition reaction product of multivalence epoxy compound and hydroxyl (methyl) acrylate or (methyl); Acrylamide, for example ethylenebis acrylamide; Allyl ester, for example diallyl phthalate; And the compound that contains vinyl, for example phthalic acid divinyl ester.

Based on whole solids content, the content of photo polymerization monomer ratio is generally 90wt% or lower in the photosensitive composition, is preferably 80wt% or lower.If the content of this photo polymerization monomer is higher than too, then developer enters the perviousness increase of exposure area, thereby is difficult to obtain preferable image.

[photosensitive colored composition]

Under the situation of photosensitive composition of the present invention as color filter purposes etc., blend coloured material in photosensitive composition (coloring material) is with the preparation photosensitive colored composition.

＜coloured material (C) 〉

Coloured material is meant the material of painted photosensitive composition of the present invention.Dyestuff or pigment can be used as coloured material, but consider thermotolerance, photostability etc., preferred pigments.Spendable pigment comprises various color pigments, for example blue pigment, viridine green, red pigment, yellow uitramarine, violet pigment, orange pigment, brown and black pigment.As for their structure, can use organic pigment, for example azo-type, phthalocyanine type, quinacridone type, benzimidazolone type, iso-dihydro-indole type, dioxazine type, indanthrene Xing He perylene type, and various inorganic pigment.To number by pigment below the instantiation of spendable pigment and illustrate.Below, expression such as term " C.I. paratonere 2 " Colour Index (C.I.).

The example of red pigment comprises C.I. pigment 1,2,3,4,5,6,7,8,9,12,14,15,16,17,21,22,23,31,32,37,38,41,47,48,48:1,48:2,48:3,48:4,49,49:1,49:2,50:1,52:1,52:2,53,53:1,53:2,53:3,57,57:1,57:2,58:4,60,63,63:1,63:2,64,64:1,68,69,81,81:1,81:2,81:3,81:4,83,88,90:1,101,101:1,104,108,108:1,109,112,113,114,122,123,144,146,147,149,151,166,168,169,170,172,173,174,175,176,177,178,179,181,184,185,187,188,190,193,194,200,202,206,207,208,209,210,214,216,220,221,224,230,231,232,233,235,236,237,238,239,242,243,245,247,249,250,251,253,254,255,256,257,258,259,260,262,263,264,265,266,267,268,269,270,271,272,273,274,275 and 276.In the middle of these, be preferably C.I. pigment red 4 8:1,122,168,177,202,206,207,209,224,242 and 254, more preferably the C.I. paratonere 177,209,224 and 254.

The example of blue pigment comprises C.I. pigment blue 1,1:2,9,14,15,15:1,15:2,15:3,15:4,15:6,16,17,19,25,27,28,29,33,35,36,56,56:1,60,61,61:1,62,63,66,67,68,71,72,73,74,75,76,78 and 79.In the middle of these, be preferably C.I. pigment blue 15,15:1,15:2,15:3,15:4 and 15:6, more preferably the C.I. pigment blue 15: 6.

The example of viridine green comprises C.I. naphthol green 1,2,4,7,8,10,13,14,15,17,18,19,26,36,45,48,50,51,54 and 55.In the middle of these, be preferably C.I. pigment Green 7 and 36.

The example of yellow uitramarine comprises C.I. pigment yellow 1,1:1,2,3,4,5,6,9,10,12,13,14,16,17,24,31,32,34,35,35:1,36,36:1,37,37:1,40,41,42,43,48,53,55,61,62,62:1,63,65,73,74,75,81,83,87,93,94,95,97,100,101,104,105,108,109,110,111,116,117,119,120,126,127,127:1,128,129,133,134,136,138,139,142,147,148,150,151,153,154,155,157,158,159,160,161,162,163,164,165,166,167,168,169,170,172,173,174,175,176,180,181,182,183,184,185,188,189,190,191,191:1,192,193,194,195,196,197,198,199,200,202,203,204,205,206,207 and 208.In the middle of these, be preferably C.I. pigment yellow 83,117,129,138,139,150,154,155,180 and 185, more preferably C.I. pigment yellow 83,138,139,150 and 180.

The example of orange pigment comprises C.I. pigment yellow 1,2,5,13,16,17,19,20,21,22,23,24,34,36,38,39,43,46,48,49,61,62,64,65,67,68,69,70,71,72,73,74,75,77,78 and 79.In the middle of these, be preferably C.I. pigment yellow 48 and 71.

The example of violet pigment comprises C.I. pigment violet 1,1:1,2,2:2,3,3:1,3:3,5,5:1,14,15,16,19,23,25,27,29,31,32,37,39,42,44,47,49 and 50.In the middle of these, be preferably C.I. pigment violet 19 and 23, more preferably the C.I. pigment Violet 23.

Under by the situation at the bottom of the resin black of using photosensitive colored composition formation color filter, can use the black colorant material.The black colorant material can be the potpourri of independent black colorant material or red, green and blue etc.This coloured material can suitably be selected inorganic or organic pigment and dyestuff.Under the situation of inorganic or organic pigment, preferably by being 1 micron or littler with described pigment dispersing, more preferably 0.5 micron or littler particle mean size and use.

Be used to prepare the example black colorant material and blendable coloured material and comprise VictoriaPure Blue (42595), Auramine O (41000), Carotene Brilliant Flavin (basic 13), Rhodamine 6GCP (45160), Rhodamine B (45170), Safranine OK70:100 (50240), Erioqlaucine X (42080), No.120/Lyonol Yellow (21090), Lyonol Yellow GRO (21090), Simular Fast Yellow 8GF (21105), Benzidine Yellow 4T-564D (21095), Simular Fast Red 4015 (12355), Lyonol Red 7B4401 (15850), Fastgen BlueTGR-L (74160), Lyonol Blue SM (26150), Lyonol Blue ES (pigment blue 15: 6), Lyonogen Red GD (paratonere 168) and Lyonol Green 2YS (pigment green 36).(numeral in the bracket () is meant Colour Index (C.I.)).

Other example that can mix the pigment of use comprises, by the expression of C.I. numbering, Yellow Pigment20,24,86,93,109,110,117,125,137,138,147,148,153,154 and 166; C.I.Orange Pigment 36,43,51,55,59 and 61; C.I.Red Pigment 9,97,122,123,149,168,177,180,192,215,216,217,220,223,224,226,227,228 and 240; C.I.Violet Pigment 19,23,29,30,37,40 and 50; C.I.Blue Pigment 15,15:1,15:4,22,60 and 64; C.I.Green Pigment 7; With C.I.Brown Pigment 23,25 and 26.

The example of the black colorant material that can use separately comprises carbon black, acetylene carbon black, dim, bone black, graphite, iron black, nigrosine, cyanine is black and titanium is black.In the middle of these, consider light shield ratio and picture characteristics, be preferably carbon black.The example of carbon black comprises following carbon black.

The product of Mitsubishi Chemical Corp.:

MA7, MA8, MA11, MA100, MA100R, MA220, MA230, MA600, #5, #10, #20, #25, #30, #32, #33, #40, #44, #45, #47, #50, #52, #55, #650, #750, #850, #950, #960, #970, #980, #990, #1000, #2200, #2300, #2350, #2400, #2600, #3050, #3150, #3250, #3600, #3750, #3950, #4000, #4010, OIL7B, OIL9B, OIL11B, OIL30B and OIL31B

The product of Degussa Company:

Printex 3, Printex 30P, Printex 30, Printex 300P, Printex 40, Printex 45, Printex 55, Printex 60, Printex 75, Printex 80, Printex 85, Printex 90, PrintexA, Printex L, Printex G, Printex P, Printex U, Printex V, Printex G, SpecialBlack 550, Special Black 350, Special Black 250, Special Black 100, SpecialBlack 6, Special Black 5, Special Black 4, Color Black FW l, Color Black FW2, Color Black FW2V, Color Black FW18, Color Black FW18, Color BlackFW20, Color Black S160 and Color Black S170

The product of Cabot Corp.:

Monarch 120, Monarch 280, Monarch 460, Monarch 800, Monarch 880, Monarch 900, Monarch 1000, Monarch 1100, Monarch 1300, Monarch 1400, Monarch 4630, REGAL 99, REGAL 99R, REGAL 415, REGAL 415R, REGAL250, REGAL 250R, REGAL 330, REGAL 400R, REGAL 55R0, REGAL 660R, BLACK PEARLS 480, PEARLS 130, VULCAN XC72R and ELFTEX-8

Colombian Carbon Co., the product of Ltd.:

RAVEBN 11, RAVEBN 14, RAVEBN 15, RAVEBN 16, RAVEBN 22, RAVEBN 30, RAVEBN 34, RAVEBN 40, RAVEBN 410, RAVEBN 420, RAVEBN 450, RAVEBN 500, RAVEBN 780, RAVEBN 850, RAVEBN 890H, RAVEBN 1000, RAVEBN 1020, RAVEBN 1040, RAVEBN 1060U, RAVEBN1080U, RAVEBN 1170, RAVEBN 1190U, RAVEBN 1250, RAVEBN 1500, RAVEBN 2000, RAVEBN 2500U, RAVEBN 3500, RAVEBN 5000, RAVEBN5250, RAVEBN 5750 and RAVEBN 7000

Other example of black pigment comprises that titanium is black, nigrosine, iron oxides black pigment and the black pigment that obtains by mixture of red, organic pigment green and blue three-color.

In addition, barium sulphate, lead sulfate, titania, lead and yellow-collation, iron oxide red, chromium oxide etc. also can be used as pigment.

These pigment can be used in combination with multiple series material.For example, the combination of the combination of viridine green and yellow uitramarine or blue pigment and violet pigment can be used as pigment.

The particle mean size of this pigment is generally 1 micron, is preferably 0.5 micron or littler, more preferably 0.25 micron or littler.The example that can be used as the dyestuff of coloured material comprises azo dyes, anthraquinone dyes, phthalocyanines dye, quinone imides dyestuff, quinolines dyestuff, nitro class dyestuff, carbonyl class dyestuff and first alkynes class dyestuff.

The example of azo dyes comprises C.I.Acid Yellow 11, C.I.Acid Orange 7, C.I.AcidRed 37, C.I.Acid Red 180, C.I.Acid Blue 29, C.I.Direct Red 28, C.I.DirectRed 83, C.I.Direct Yellow 12, C.I.Direct Orange 26, C.I.Direct Green 28, C.I.Direct Green 59, C.I.Reactive Yellow 2, C.I.Reactive Red 17, C.I.ReactiveRed 120, C.I.Reactive Black 5, C.I.Disperse Orange 5, C.I.Disperse Red 58, C.I.Disperse Blue 165, C.I.Basic Blue 41, C.I.Basic Red 18, C.I.Mordant Red7, C.I.Mordant Yellow 5 and C.I.Mordant Black 7.

The example of anthraquinone dyes comprises C.I.Vat Blue 4, C.I.Acid Blue 40, C.I.Acid Green25, C.I.Reactive Blue 19, C.I.Reactive Blue 49, C.I.Disperse Red 60, C.I.Disperse Blue 56 and C.I.Disperse Blue 60.

The example of phthalocyanines dye comprises C.I.Vat Blur 3, the example of quinone imides dyestuff comprises C.I.Basic Blue 3 and C.I.Basic Blue 9, the example of quinolines dyestuff comprises C.I.Solvent Yellow33, C.I, Acid Yellow 3 and C.I.Disperse Yellow 64, and the example of nitro class dyestuff comprises C.I.Acid Yellow l, C.I.Acid Orange 3 and C.I.Disperse Yellow 42.

Based on whole solids content in the photosensitive composition, the ratio of coloured material (that is to say in the whole solids content of photosensitive colored composition, the whole content of photosensitive colored composition does not comprise solvent) be generally 10wt% or bigger, be preferably 20wt%, and be generally 70wt% or littler, preferred 60wt% or littler.

If the ratio of coloured material is too little, then for colour saturation, film thickness is too big, and this clearance control (gap control) when the liquid crystal structure cell is formed produces adverse influence; If yet the ratio of coloured material is too big, can not obtain gratifying image formation property.Incidentally, whole solids content is generally 10-80wt% in the photosensitive colored composition of the present invention.

In order to improve dispersing of pigments and to improve dispersion stabilization, can add pigment derivative etc.The example of pigment derivative comprises that azo-type, phthalocyanine type, quinacridone type, benzimidazolone type, quinophthalone (quinophthalone) type, iso-dihydro-indole type, dioxazine type, anthraquinone type, indanthrene Xing, perylene Xing, perylene ketone (perinone) type, diketopyrrolo-pyrrole type are with the dioxazine type.In the middle of these, be preferably quinophthalone type (quinophthalone) derivant.The substituent example of pigment derivative comprises sulfonic group, sulfoamido or its quaternary salt, phthalimidomethyl, dialkyl aminoalkyl, hydroxyl, carboxyl and amide group, and they are separately directly or by on alkyl, aryl or heterocyclic radical etc. and the pigment skeleton keyed jointing.In the middle of these, be preferably sulfonic group.A plurality of these substituting groups can be bonded to a pigment skeleton.The instantiation of pigment derivative comprises that the sulfonic acid of sulfonic acid, diketopyrrolo-pyrrole of sulfonic acid, the quinacridone of sulfonic acid, the anthraquinone of sulfonic acid, the quinophthalone of phthalocyanine is with the sulfonic acid of dioxazine.

Based on pigment, the amount of the pigment derivative of interpolation is generally 0.1-30wt%, is preferably 0.1-20wt%, 0.1-10wt% more preferably, even 0.1-5wt% more preferably.

In addition, in photosensitive composition of the present invention and photosensitive colored composition, suitably blend organic solvent, pigment dispersing agent, bonding improver, coating improver, development improver, ultraviolet absorber, antioxidant, silane coupling agent etc.

＜organic solvent 〉

Organic solvent is not particularly limited, but the instantiation of organic solvent comprises Di Iso Propyl Ether, rosin (mineral spirit), n-pentane, amyl ether, ethyl caprilate, normal hexane, ether, isoprene, the ethyl isobutyl ether, butyl stearate, normal octane, Varsol#2, the Apco#18 solvent, diisobutylene, amyl acetate, butyl butyrate, the Apco thinning agent, butyl ether, diisobutyl ketone, methylcyclohexene, methyl nonyl ketone, propyl ether, dodecane, Socal solvent No.1 and No.2, amyl formate, hexyl ether, diisopropyl ketone, Solvesso#150, the acetate fourth (just, the second month in a season or uncle-) ester, hexene, the ShellTS28 solvent, the butyl chloride, ethyl pentyl group ketone, ethyl benzoate, the amyl group chloride, ethylene glycol diethyl ether, ethyl orthoformate, the methoxy pentanone, methyl butyl ketone, methyl hexyl ketone, methyl isobutyrate, benzonitrile, ethyl propionate, methylcellosolve acetate (methyl cellosolve acetate), methyl isoamyl ketone, methyl isobutyl ketone, propyl acetate, amyl acetate, amyl formate, bicyclohexane, the diethylene glycol monoethyl ether acetic acid esters, cinene, the methoxy amylalcohol, methyl amyl ketone, methyl isopropyl Ketone, propyl propionate, the glycol tertiary butyl ether, methyl ethyl ketone, methyl cellosolve, ethyl cellosolve, ethyl cellosolve acetate, carbitol, cyclohexanone, ethyl acetate, propylene glycol, propylene glycol monomethyl ether, propylene glycol methyl ether acetate, dihydroxypropane single-ether, propylene glycol monoethyl ether acetate, the single ether of dipropylene glycol, dipropylene glycol monomethyl ether, propylene glycol monoethyl ether acetate, the dipropylene glycol monomethyl ether acetic acid esters, the 3-methoxypropionic acid, the 3-ethoxy-propionic acid, the 3-ethoxyl ethyl propionate, 3-methoxypropionic acid methyl esters, 3-methoxy propyl acetoacetic ester, 3-methoxy propyl propyl propionate, 3-methoxy propyl acid butyl ester, diethylene glycol dimethyl ether, dipropylene glycol monomethyl ether, the ethylene glycol ethyl ethers acid esters, ethyl carbitol, butyl carbitol, ethylene glycol monobutyl ether, the glycol tertiary butyl ether, 3-methyl-3-methoxybutanol, tripropylene glycol methyl ether and 3-methyl-3-methoxyl butylacetic acid ester.

Preferred select following solvent, it can dissolve or disperse respective components and have 100-250 ℃ boiling point usually, and more preferably boiling point is 120-170 ℃ a solvent.These solvents can use separately or use as potpourri.

＜pigment dispersing agent 〉

In dispersion treatment, particularly when polymeric dispersant is used as pigment dispersing agent, can in aging, obtain excellent dispersion stabilization, thereby this is preferred.The example of polymeric dispersant comprises the modified poly ester class spreading agent of carbamates spreading agent, polyethyene diamine class spreading agent, polyoxyethylene alkyl ether class spreading agent, polyoxyethylene glycol diester class spreading agent, sorbitan aliphatic (acid) ester class spreading agent and aliphatic series.The instantiation of this spreading agent comprises that trade mark is called EFKA (EFKA Chemicals B.V production), Disperbik (BYK Chemie production), Dispalon (Kusumoto Chemicals Co., Ltd. production), Solsperse (Zeneca production), KP (Shin-Etsu Chemical Co., Ltd. produce) and those of Polyflow (Kyoeisha Chemical Co., Ltd. production).These spreading agents can use separately or use with two or more form of mixtures.Based on the solids content of photosensitive colored composition, the content of pigment dispersing agent is generally 50wt% or littler, is preferably 30wt% or littler.

＜silane coupling agent 〉

In order to improve cohesive, can add silane coupling agent to substrate.As for the kind of silane coupling agent, can use various silane coupling agents, for example epoxy type, methacryl type and amino-type are preferably the epoxies silane coupling agent.

The preparation method of＜photosensitive colored composition 〉

Photosensitive colored composition of the present invention prepares by conventional method.For example, quantitative coloured material, solvent and the spreading agent of difference weighing, in dispersion steps, the dispersion staining material is to obtain liquid color composition (liquid of ink-like) then.In dispersion steps, can use paint regulator (paintconditioner), sand mill, bowl mill, roll mill (roll mill), burrstone mill and jet mill and homogenizer etc.By carrying out dispersion treatment, pulverize coloured material, therefore, improve the coating character of photosensitive colored composition and strengthened the transmittance of the color filter substrate of product.

In the dispersion staining material, preferably suitably be used in combination above-mentioned adhesive resin or spreading agent.For example, undertaken by sand mill under the situation of dispersion treatment, preferably using diameter is 0.1 to several millimeters beaded glass or zirconium oxide bead.Temperature during dispersion treatment is set at 0-100 ℃ scope usually, is preferably room temperature to 80 ℃ scope.Must suitably regulate jitter time, this is to change because of the composition { coloured material, solvent, spreading agent } and the size of sand mill device of suitable time with ink-like liquid.

In the ink-like liquid that obtains by dispersion treatment, the photo polymerization monomer of mixed solvent, adhesive resin, scheduled volume (if desired), Photoepolymerizationinitiater initiater system components and other component obtain uniform dispersion liquid.In these dispersions and the blend step, can mix micronic dust (fine dust) at each.Therefore, the ink-like liquid of acquisition is preferably by filtrations such as filtrators.

In the photosensitive colored composition that generates, based on whole solids content, the content of adhesive resin (A) is generally 5wt% or higher, is preferably 10wt% or higher, and is generally 95wt% or lower, is preferably 80wt% or lower.

Based on whole solids content, the content of photo polymerization monomer is generally 90wt% or lower in photosensitive group of painted compound, is preferably 80wt% or lower.If this content is too big, then developer enters the perviousness increase of exposure area, thereby has worsened the cohesive of sharpness or pixel.

In addition, in photosensitive colored composition, adhesive resin (A) is generally 20-500wt% with the ratio of coloured material, is preferably 30-300wt%, more preferably 50-200wt%.If the content of adhesive resin (A) is too low, then the solubleness to the developer unexposed area reduces, and this causes the failure of developing easily; If yet this content is too high, be difficult to obtain required pixel thick.

Based on whole solids content, the content of Photoepolymerizationinitiater initiater is generally 0.1wt% or bigger in the photosensitive colored composition, is preferably 0.5wt% or bigger, 0.7wt% or bigger more preferably, and be generally 30wt% or littler, be preferably 10wt% or littler.

In addition, the photosensitive colored composition of the present invention that is used for the light shield pattern is characterised in that: at the cross-sectional profiles that is imaged on light shield pattern on the transparent substrates (below be sometimes referred to as " black matrix pattern "), basal surface with side that substrate contacts on the angle that forms of light shield pattern plane be 50 ° or littler.Photosensitive colored composition with such character can preferably obtain by the photosensitive colored composition of the present invention that contains the black colorant material.Below will describe the cross-sectional profiles of light shield pattern in detail.

[3] preparation color filter substrate

[3-1] transparent substrates (support)

The preparation method of color filter substrate and color filter is described below.The transparent substrates of color filter is not particularly limited about building material, as long as it is the transparent material with suitable intensity.The example of building material comprises: polyester resin, for example polyethylene terephthalate; Polyolefin resin, for example polypropylene and tygon; The sheet that thermoplastic resin is made, for example polymethylmethacrylate and polysulfones; Thermoset resin sheet, for example epoxy resin, unsaturated polyester resin and poly-(methyl) acrylic acid (ester) resinoid and various glass.In the middle of these,, be preferably glass and heat stable resin in view of thermotolerance.

If desired, available substrate to transparent substrates and black matrix formation is carried out, and for example, Corona discharge Treatment, ozone treatment, silane coupling agent are handled or carried out film forming as various resins such as urethane resins and handle, to improve surface nature, as cohesive.The thickness of transparent substrates is generally the 0.05-10 millimeter, is preferably the 0.1-7 millimeter.In the situation of carrying out film formation processing with various resins, the thickness of film is generally the 0.01-10 micron, is preferably the 0.05-5 micron.

[3-2] black matrix (black matrix)

On transparent substrates, provide black matrix and be formed with redness, green and blue pixels image usually, can prepare color filter of the present invention thus.Above-mentioned photosensitive colored composition is as the coating fluid that forms at least a resist in black, redness, green and the blueness.Under the situation of black resist, coating fluid is applied to the coarse glass of transparent substrates, perhaps under the situation of red, green or blue resist, coating fluid is applied on the resin black bottom surface that is formed on the transparent substrates, perhaps be applied on the metal black bottom surface of using chromium compound or the formation of other light shield metal material, respectively coating is carried out following steps then: heat drying, image exposure, development and heat curing form versicolor pixel image thus.

By using the light shield metallic film or being used for the photosensitive colored composition of black matrix, black matrix is formed on the transparent substrates.As for the light shield metal material, can use chromium compound, for example crome metal, chromium oxide and chromium nitride, nickel-tungsten etc.These materials can be stacked into multilayered state and use.

The metal optical screen film is normally by sputter, by using positive resist film to make it form required membranaceous pattern, etching then, under the situation that is chromium, use the etching solution that obtains by mixed nitrate cerium ammonium and perchloric acid and/or nitric acid, perhaps under the situation that is other material, use is at the etching solution of this material, and last, utilize specific release agent to remove positive photoresist, form black matrix thus.

In this case, at first by vapour deposition or sputter at the film that transparent substrates forms above-mentioned metal or metal-metallic oxide.Then, the coated film of photosensitive colored composition is formed on the film, and utilizes and to have repeat patterns the photomask of (for example, striped, inlay or triangle) this coated film to be exposed-developed, formation resist image., coated film carried out etching, form black matrix thus thereafter.

Use photosensitive colored composition as under the situation of black matrix, utilizing the photosensitive colored composition that contains the black colorant material to form black matrix.For example, utilize following photosensitive colored composition, can form black matrix as the following mode that forms redness, green or blue pixel image, described photosensitive colored composition contains independent or multiple black colorant material, for example carbon black, graphite, iron black, nigrosine, cyanine are black and titanium is black, perhaps contain by mixing the black colorant material that the painted materials such as redness, green and blueness that suitably are selected from organic pigment and dyestuff prepare.

[3-3] forms pixel

To contain a kind of photosensitive colored composition coating that is selected from the coloured material of redness, green and blue colorant provides on the transparent substrates of black matrix thereon, dry, and behind the stacked thereon photomask, by photomask this coated film is carried out the imaging exposure, develop, and if desired, heat curing or photocuring, form pixel image, prepare dyed layer thus.Every kind of photosensitive colored composition to three kinds of colors of red, green and blue carries out this operation, can form the color filter image thus.

The photosensitive colored composition that is used for color filter can pass through coatings such as spin-coating method, wire bar method, flow coat method, punch die rubbing method, rolling method and spraying process.Especially,, be preferably the punch die rubbing method, for example, can greatly reduce the consumption of coating fluid from whole aspect, the influence of the mist that adheres to when this system is not coated with by spin-coating method fully etc., and suppressed the generation of impurity.

If the thickness of coated film is too big, then not only pattern development becomes difficult, and the intermediate gap control of formation liquid crystal structure cell step also becomes difficult; If yet thickness is too little, being difficult to increases pigment concentration, and may not express required color.

Usually, with regard to thickness after the drying, the thickness of coated film is preferably the 0.2-20 micron, 0.5-10 micron more preferably, even 0.8-5 micron more preferably.

The drying of [3-4] coated film

After being coated on photosensitive colored composition in the substrate, coated film preferably utilizes heating plate, IR stove and convection furnace to carry out drying.Usually, predrying coated film, and then heating are carried out drying thus.Can suitably select pre-dried condition according to the performance of used solvent composition and exsiccator.According to the performance of used solvent composition and exsiccator, select drying time, be generally 40-80 ℃ following 15 seconds to 5 minutes of temperature, be preferably 30 seconds to 3 minutes under the 50-70 ℃ of temperature.

Jia Re drying condition is higher than pre-dried temperature once more, and is preferably 50-200 ℃, and more preferably 70-160 ℃, even more preferably 70-130 ℃.Depend on heating-up temperature drying time, but be preferably 10 seconds to 10 minutes, more preferably 15 seconds to 5 minutes.Along with baking temperature increases, to the cohesive enhancing of transparent substrates, if but baking temperature is too high, and adhesive resin decomposes and causes thermal polymerization, and this will cause the failure of developing.The thickness of dry back photosensitive colored composition coated film is the 0.5-3 micron, is preferably the 1-2 micron.Incidentally, in the step of this drying coating film, can use does not need the temperature that raises yet, the heating in vacuum method that heats in vacuum chamber.

[3-5] step of exposure

By the negativity ground patterns is covered on the coated film of photosensitive colored composition, and by mask pattern with ultraviolet or visible light source treatment with irradiation, and carry out image exposure.At this moment, for the photosensitivity that prevents photopolymerization layer owing to oxygen reduces, if desired, can after the oxygen barrier that forms on the photopolymerization layer as polyvinyl alcohol (PVA) etc., expose.The light source that is used for image exposure is not particularly limited.The example of light source comprises lamp source, for example xenon lamp, Halogen lamp LED, tungsten lamp, high-pressure mercury-vapor lamp, extra-high-pressure mercury vapour lamp, metal halide lamp, middle medium pressure mercury lamp, Cooper-Hewitt lamp, carbon arc and fluorescent light, and LASER Light Source for example argon laser, YAG laser, excimer laser, nitrogen laser, He-Cd laser and semiconductor laser.Under the situation of the light that shines specific wavelength, can use light filter.

[3-6] development step

After carrying out image exposure, with organic solvent or contain surfactant and the aqueous solution of alkali compounds is developed to the coated film of photosensitive colored composition,, prepare color filter of the present invention thus in substrate, to form image by above-mentioned light source.This aqueous solution can further contain organic solvent, damping fluid, complexing agent and dyestuff or pigment.

The example of alkali compounds comprises: inorganic alkaline compound, for example NaOH, potassium hydroxide, lithium hydroxide, sodium carbonate, sal tartari, sodium bicarbonate, saleratus, sodium silicate, potassium silicate, sodium metasilicate, sodium phosphate, potassium phosphate, dibastic sodium phosphate, potassium hydrogen phosphate, sodium dihydrogen phosphate, potassium dihydrogen phosphate, ammonium hydroxide; And organic basic compound, for example single, two or triethanolamine; Single, two or trimethylamine; Single, two or triethylamine; List or diisopropylamine; N-butylamine; Single, two or triisopropanolamine; Ethylene imine (ethyleneimine), ethylenediamine (ethylenediimine), tetramethyl ammonium hydroxide (TMA) and choline.These alkali compounds can two or more form of mixtures use.

The example of surfactant comprises: non-ionic surfactant, for example polyoxyethylene alkyl ether, polyoxyethylene alkyl aryl ether, polyxyethylated ester, sorbitan Arrcostab and glycerine mono alkyl ester; Anionic surfactant, for example benzene sulfonamide acid esters, alkyl naphthalene sulfonic acid ester, alkyl sulfate, alkyl sulfonic ester and sulfosuccinate; And amphoteric surfactant, for example alkyl betaine and amino acid.

The example of organic solvent comprises isopropyl alcohol, benzylated polyol, ethyl cellosolve, butyl cellosolve, ethylene glycol monophenyl ether, propylene glycol and diacetone alcohol (diacetone alcohol).Organic solvent can directly use or be used in combination with aqueous solution.

Condition to development treatment is not particularly limited.Development temperature is generally 10-50 ℃, is preferably 15-45 ℃, more preferably 20-40 ℃.Developing method can be in immersion development method, spray developing method, magnetic brush development and the ultrasonic development method any.

[3-7] heat curing is handled

After developing, color filter substrate is carried out heat curing handle.As for the condition that this heat curing is handled, temperature is selected in preferred 150-250 ℃ the scope at 100-280 ℃, and the time is selected in 5-60 minute scope.By some these steps, finished a kind of formation of image of color by patterning.By repeating these steps in turn, carry out black, redness, green and blue patterning, generate color filter.The order of the patterning of four kinds of colors is not limited to this order.

The feature of color filter of the present invention also is the cross-sectional profiles of light shield pattern.That is to say, color filter of the present invention is following color filter, described color filter comprises the transparent substrates that has the light shield pattern on it, wherein the light shield pattern forms by using photosensitive colored composition, and the angle (being designated hereinafter simply as " bevel angle ") that is formed by basal surface and the light shield pattern plane on the substrate contact side is 5-50 °.This bevel angle is preferably 40 ° or littler, and more preferably 30 ° or littler, and be preferably 10 ° or bigger.If this bevel angle is too big, level difference (in-pixellevel difference) becomes big in the then following pixel that is about to describe; If yet this bevel angle size, the degree of accuracy of live width reduces.

The bevel angle of Shi Yonging is meant in the xsect of light shield pattern herein, by substrate and the angle (referring to Fig. 1) that is connected end of pattern and the straight line of height part from end to inner 2 microns positions forms.

Incidentally, bevel angle is preferably in above-mentioned scope, and taper simultaneously has the forward profile.Be used for preparing the photosensitive colored composition of color filter, to the color filter of light shield pattern with such bevel angle without limits, but color filter preferably utilizes the photosensitive colored composition preparation of the invention described above.

When forming the pixel image of multicolour pattern by this way, little bevel angle causes reducing at the thickness of the overlapping part of light shield pattern and redness, green or blue pixel.Therefore, by specifying the basal plane of substrate, difference in each pixel image between the highest planar point and the k level point (being designated hereinafter simply as " level difference in the pixel ") is generally 0.7 micron or littler in all pixel images, be preferably 0.5 micron or littler, more preferably 0.4 micron or littler.If level difference is too big in the pixel, then owing to outstanding part, the discontinuous of ITO film can be taken place, and can not obtain high-quality color filter.When being used to prepare the photosensitive colored composition of color filter, the color filter with level difference in such pixel but can be preferably be prepared by the photosensitive colored composition of the invention described above without limits.

Except these preparation methods, color filter of the present invention also can prepare by the following method: (1) will be contained solvent, be coated in the substrate as the phthalocyanine pigment of coloured material with as the curable coloured composition of the polyimide based resin of adhesive resin, and form the method for pixel image by etching method; (2) photosensitive colored composition that will contain phthalocyanine pigment is as colored ink, and directly forms method on the pixel image in transparent substrates by printer; (3) photosensitive colored composition that will contain phthalocyanine pigment is immersed in this electric depositing solution as electric depositing solution and with substrate, so that painted film deposit the method for formation predetermined pattern on the ITO electrode; (4) film lamination of photosensitive colored composition that coating on it is contained phthalocyanine pigment is on transparent substrates, and peels off, and by image exposure with develop and form the method for pixel image; Perhaps, (5) will contain the photosensitive colored composition of phthalocyanine pigment as colored ink, and form the method for pixel image by ink-jet printer.According to the composition of the photosensitive colored composition that is used for color filter, carry out suitable color filter preparation method.

[3-8] forms transparency electrode

Can in statu quo be formed on the image of acquisition like this ingredient as color monitor or liquid crystal display as the transparency electrode of ITO, but in order to improve the permanance of smooth surface or color filter, if desired, the top coat as polyamide or polyimide can be provided on the image.In the use of for example plane orthotype drive system (plane orientation-type driving system) (IPS mode), do not form transparency electrode sometimes.

[4] liquid crystal display (panel)

The preparation method of liquid crystal display (panel) is below described.Usually, oriented film is formed on the color filter, and spacer is scattered thereon, and oriented film and electrode of opposite lamination form the liquid crystal structure cell, and liquid crystal is injected the liquid crystal structure cell that forms, and to be set up to the connection of comparative electrode, finish liquid crystal display thus.Oriented film is appropriate resin film, for example polyimide.Usually, carry out gravure processes and/or hectographic printing method, with the formation oriented film, and the thickness of oriented film is tens nanometer.Bake by heating, carry out surface treatment with ultraviolet ray or use friction cloth then,, solidify oriented film so that the surface state that can adjust liquid crystal tilting (tilting) to be provided.

As for spacer, use at the corresponding spacer of size in the gap of relative substrate, normally suitable is the spacer with size of 2-8 micron.In addition, (photo-spacer, PS) photoetching process is formed on the color filter substrate and replaces spacer to use the photospacer of transparent resin film usually.As for relative substrate, use array substrate usually, be preferably TFT (thin film transistor (TFT)) substrate.

Owing to the size in the gap that forms with the relative substrate lamination purposes along with liquid crystal display changes, but in the scope of 2-8 micron, select usually.After to relative substrate lamination, the part except that liquid crystal injecting port is used and is sealed such as sealants such as epoxy resin.Sealant shines by UV and/or is heating and curing then, thus the border of encapsulated liquid crystals structure cell.

The liquid crystal structure cell that the border is sealed cuts into panel unit (panel unit), and decompression (decompress) after being immersed in liquid crystal injecting port in the liquid crystal, makes the internal leak of vacuum chamber in vacuum chamber, thus liquid crystal is injected the liquid crystal structure cell.The intensity of compression of liquid crystal structure cell is generally 1 * 10 ^-2To 1 * 10 ^-7, be preferably 1 * 10 ^-3To 1 * 10 ^-6When decompression, preferably heating fluid Jingjing born of the same parents, and heating-up temperature are generally 30-100 ℃, are preferably 50-90 ℃.The liquid crystal structure cell keeps decompression 10-60 minute under heating, be immersed in the liquid crystal then.The liquid crystal that is injected in the liquid crystal structure cell is packed by the UV curable resin that solidifies the liquid crystal injecting port place, finishes liquid crystal display (panel) thus.

Kind to liquid crystal is not particularly limited, and can use known liquid crystal, for example aromatics, aliphatic series or polycyclic compund, and they can be lyotropic liquid crystal (liotropic liquid crystal), thermotropic liquid crystal (thermotropic liquid crystal) etc.As for thermotropic liquid crystal, for example, nematic crystal, smectic crystal and cholesterol liquid crystal are known and can use in these liquid crystal any.

Embodiment

Describe the present invention in detail below with reference to preparation embodiment of the present invention, embodiment and comparative example the present invention, as long as but stated main points of the present invention, the present invention is not limited to these embodiment.In following example, " part " is " weight portion ".

[1] compares bond strength and pixel resolution＜synthetic embodiment 1 〉

In reactor, load 300 parts of XD1000 (poly-(and bicyclopentadiene. phenol) poly epihydric alcohol base ether, weight-average molecular weight: 700, epoxide equivalent: 252, Nippon Kayaku Co., Ltd. preparation), 87 parts of acrylic acid, 0.2 part of p methoxy phenol, 5 parts of triphenylphosphines and 255 parts of propylene glycol monomethyl ether, to stir up to acid number down at 100 ℃ be 3.0mgKOH/g.(acid number: the time 2.5) is 9 hours up to obtaining the target acid number.Then, further add 145 parts of tetrabydrophthalic anhydrides, and, obtain adhesive resin I solution 120 ℃ of reactions 4 hours, described adhesive resin acid number be 100 and the weight-average molecular weight of the polystyrene conversion by gpc measurement be 2600.

＜synthetic embodiment 2 〉

In reactor, load 155 parts of Epiclon HP7200HH (poly-(and bicyclopentadiene. phenol) poly epihydric alcohol base ether, weight-average molecular weight: 1000, epoxide equivalent: 270, Dai-Nippon Ink; Chemicals, Inc. preparation), 41 parts of acrylic acid, 0.1 part of p methoxy phenol, 2.5 parts of triphenylphosphines and 130 parts of propylene glycol monomethyl ether, 100 ℃ of heated and stirred, be 3.0mgKOH/g or littler up to acid number.(acid number: the time 2.9) is 9 hours up to obtaining the target acid number.Then, further add 74 gram tetrabydrophthalic anhydrides,, obtain binder resin solution II 120 ℃ of reactions 4 hours, the acid number of described adhesive resin be 98 and weight-average molecular weight be 3500.

＜embodiment 1 〉

In propylene glycol monomethyl ether, mix 52 weight portions (counting 35 weight portions) the adhesive resin I solution, 5 weight portion dipentaerythritol acrylates, 4 weight portion CGI-124 (Ciba Geigy preparation) and the 56 weight portion carbon black dispersions (concentration of carbon: 25%), obtain the photosensitive black composition that obtain among the synthetic embodiment 1 with solids content.

The photosensitive black composition that so obtains is spin-coated on 10 square centimeters the substrate of glass, and in 90 ℃ on heating plate dry 150 seconds.Dry back film thickness is 1 micron.Then, utilize high-pressure mercury-vapor lamp, by mask this sample is carried out image exposure, utilizing concentration then is that 0.1% KOH aqueous solution is carried out spray developing at 23 ℃, forms black picture element (black matrix).

＜embodiment 2 〉

With with embodiment 1 in identical method form black picture element, difference is to change the adhesive resin I among the embodiment 1 into adhesive resin II.

＜comparative example 1 〉

With with embodiment 1 in identical method form black picture element, difference is to change adhesive resin I among the embodiment 1 into EA4805 (the tetrabydrophthalic anhydride adduct of cresols novolac type epoxy acrylate, Mitsubishi Chemical Corp. preparation, acid number: 100).

＜comparative example 2 〉

With with embodiment 1 in identical method form black picture element, difference is to change adhesive resin I among the embodiment 1 into ZAR (the tetrabydrophthalic anhydride adduct of bisphenol-a epoxy acrylate, Nippon Kayaku Co., the Ltd. preparation, acid number: 100).

＜comparative example 3 〉

With with embodiment 1 in identical method form black picture element, difference is to change adhesive resin I among the embodiment 1 into the ACA200M (acrylic acid (ester) resinoid 3 with carboxylic acid, 4-epoxycyclohexyl acrylate adduct, Daicel Chemical Industries, Ltd. prepare acid number: 115).

Pixel is estimated:

From following several the pixels of estimating above-mentioned acquisition, the result is as shown in table 2.

＜cohesive 〉

By microscope, under 200 times magnification, observe the minimum pattern size of soluble resist with the exposure of duplicating 20 microns mask patterns strictly according to the facts.When minimum pattern was of a size of 10 microns, the cohesive grade was zero; Perhaps when the time greater than 10 microns, grade is *.The result who is obtained is as shown in table 1.

＜pixel resolution 〉

By microscope, under 1000 times magnification, observe fine rule black picture element profile with the exposure of duplicating 20 microns mask patterns strictly according to the facts.When the resist pattern had favorable linearity, grade was zero, perhaps when having projection or out-of-flatness, grade is *.The result who is obtained is as shown in table 1.

Table 1

	Embodiment 1	Embodiment 2	Comparative example 1	Comparative example 2	Comparative example 3
						Cohesive	○	○	×	○	×
Sharpness	○	○	×	×	×

[2] compare level difference in bevel angle and the pixel

＜embodiment 3 〉

With PGMEA (72.6g) and 19.7g carbon black (" MA-220 ", Mitsubishi Chemical Corp. preparation) and 7.7 " Disperbyk-182 " (the BYK Chemie preparation) mixing that restrain as spreading agent, and adding 100ml granularity is the zirconium oxide bead of 0.5mm in it, in paint regulator, shake potpourri 10 hours, and obtained carbon black dispersion.This dispersion 50.7 of taking a sample restrains parts, and in it, add 10.79 grams (counting 7.26 grams) adhesive resin I solution, 1.82 gram dipentaerythritol acrylates (Nippon Kayaku Co., " DPHA " of Ltd. preparation), 2.0g as CGI-242 (Ciba Specialty Chemicals preparation), the 0.025g of Photoepolymerizationinitiater initiater Megafac F475 (Dai-Nippon Ink﹠amp as surfactant with solids content; Chemicals, the Inc. preparation) and 38.2 PGMEA that restrain as organic solvent, with preparation photosensitive black composition.

Use the punch die coating machine, on substrate of glass (AN100, Asahi Glass Company, Ltd. preparation), apply the thickness of 1.0 microns of the photosensitive black compositions of preparation like this, photomask (pattern line-width: 20 microns) by being used for black matrix then is at 20mw/cm ²Under the light intensity of (being scaled i-line (i-line)), by irradiation 3 seconds (60mJ/cm of ultraviolet exposure from mercury vapor lamp ²).Gap between photomask and the resist face is 150 microns.Use the develop substrate of exposure of 0.1%KOH aqueous solution, in 230 ℃ of thermal treatments 30 minutes in stove, obtain the black matrix pattern then.

＜comparative example 4 〉

The carbon black dispersion 63.4 gram parts of preparation among the sampling embodiment 2, and in it, add EA4808 (the tetrabydrophthalic anhydride adduct of cresol novolac resin type epoxy acrylate of 4.98g as adhesive resin, Mitsubishi Chemical Corp. preparation, acid number: 100), 1.25 gram dipentaerythritol acrylate (Nippon Kayaku Co., Ltd. " DPHA "), 1.37 gram is as the CGI-242 (Ciba Specialty Chemicals preparation) of Photoepolymerizationinitiater initiater, 0.025 gram is as Megafac F475 (the Dai-Nippon Ink﹠Chemicals of surfactant, Inc. prepare) and 29.0 PGMEA that restrain as organic solvent, with preparation photosensitive black composition.

With with embodiment 3 in identical mode, to the photosensitive black composition of preparation like this expose, development and thermal treatment, to obtain the black matrix pattern.

Pixel is estimated:

From following two pixels of estimating acquisition, the result who is obtained is as shown in table 2.

＜bevel angle 〉

Observe the cross-sectional profiles of the black picture element that obtains by SEM (S-4500 of Hitachi Ltd. preparation), and measure bevel angle.

Level difference in the＜pixel 〉

With PGMEA (6.4 gram) and 7.7 gram red pigments (" the Paliotol Yellow K1841D " of " the CromophtalRed A2B " of Chiba Geigy preparation and BASF preparation) and 3.1 gram polyesters dispersant, adding the 10ml granularity to it is 0.5 millimeter zirconium oxide bead, in paint regulator, shake potpourri 5 hours, and obtained red pigment dispersion.This dispersion 7.48 of taking a sample restrains parts, and its interior acrylic acid (ester) resinoid Chem.1,0.5 dipentaerythritol acrylate (Nippon Kayaku Co. that restrain as the ethylene type compound that add 1.0 grams as bonding agent, Ltd. Zhi Bei " DPHA "), 0.075 gram bisglyoxaline (biimidazole) and 0.045 gram are as Michler's keton, 0.0004 gram fluorochemical surfactant (" FC-430 " that Sumitomo 3M prepares) and the 1.51g of the Photoepolymerizationinitiater initiater PGMEA as organic solvent, to prepare photosensitive red composition.

(a∶b∶c∶d＝55∶15∶20∶10(mol％，Mw：12,000)

By spin-coating method, apply the photosensitive red composition of preparation like this so that with the overlapping width of black matrix be that 5 microns and dried thickness are 1.3 microns, then in 70 ℃ on heating plate dry 1 minute, by being used for the mask of red color filter, to 150mj/cm ²Ultraviolet ray carry out contact exposure, and use 0.5wt% diethanolamine aqueous solution to develop, obtain the red pixel pattern in the black matrix pattern.Thereafter, by high-pressure mercury-vapor lamp, with 15,000mj/Gm ²Ultraviolet ray irradiation sample,

Further thermal treatment 10 minutes in 200 ℃ stove forms pixel image thus.

As for the surface profile of red pixel image in the sample that so obtains, " α-step " of utilizing TENCORINSTRUMENTS to make measures level difference in the pixel.

To form the green pixel image with above-mentioned identical mode, difference is to use viridine green (Toyo Ink Mfq.Co., Ltd. " Lionol Green 61501 " of Sheng Chaning and BASF " the Paliotol Yellow K1841D " that produce) replace red pigment, and measure level difference in the pixel.

To form the blue pixel image with above-mentioned identical mode, difference is to use blue pigment (Toyo Ink Mfq.Co., Ltd. " Lionol Blue ES " of Sheng Chaning and CIBA GEIGY " the IRGAZIN BLUE A3RN " that produce) replace red pigment, and measure level difference in the pixel.

Table 2

		Embodiment 3	Comparative example 4
				Bevel angle (°)		??40	??60
Level difference (micron) in the pixel	Red	??0.5	??0.9
				Green	??0.4	??0.8
	Blue	??0.4	??0.8

Although described the present invention in detail and, it should be apparent to those skilled in the art that under the situation of the spirit and scope of the present invention, can in the present invention, make various changes and modifications with reference to specific embodiments of the present invention.

The application is incorporated herein by reference its full content at this based on the Japanese patent application (No.2003-067021) of application on May 12nd, 2003 and the Japanese patent application (No.2004-006676) of application on January 14th, 2004.

Industrial applicibility

According to the present invention, it is excellent and have high painted material concentration and be applicable to the photosensitive composition of colour filter purposes to be provided at imaging performance, and separately photosensitive colored composition, colour filter and the liquid crystal display by using this photosensitive composition to prepare is provided.

Claims (15)

1. photosensitive composition that is used for color filter, it comprises: (A) adhesive resin, it is to obtain with (c) polybasic carboxylic acid or its anhydride reaction by the reactant that makes (a) epoxy resin and (b) contain the carboxylic acid of unsaturated group, and (B) Photoepolymerizationinitiater initiater, wherein

Wherein, epoxy resin (a) is the reaction product that epihalohydrins and per molecule have the polyaddition reaction product of the cyclic hydrocarbon compound of two or more unsaturated groups and phenol.

2. the photosensitive composition that is used for color filter of claim 1, wherein per molecule has that carbon number is 5-20 in the cyclic hydrocarbon compound of two or more unsaturated groups.

3. claim 1 or 2 the photosensitive composition that is used for color filter, wherein epoxy resin (a) is the polyaddition reaction product of bicyclopentadiene and phenol or cresols and the reaction product of epihalohydrins.

4. each the photosensitive composition that is used for color filter among the claim 1-3, wherein the polystyrene conversion weight-average molecular weight (Mw) of the adhesive resin of being measured by GPC (A) is 700-50,000.

5. each the photosensitive composition that is used for color filter among the claim 1-4, wherein the acid number (mgKOH/g) of adhesive resin (A) is 10-200.

6. each the photosensitive composition that is used for color filter among the claim 1-5, it comprises the monomer of photopolymerizable.

7. the photosensitive colored composition that is used for color filter, it comprises among the claim 1-6 each photosensitive composition and (C) coloured material.

8. the photosensitive colored composition that is used for color filter of claim 7, wherein coloured material (C) is black coloured material.

9. claim 7 or 8 the photosensitive colored composition that is used for color filter, wherein based on the whole solids content in the photosensitive colored composition, the content of coloured material (C) is 10wt% or higher.

10. photosensitive colored composition that is used for the light shield pattern, wherein in the cross-sectional profiles of the light shield pattern image on being formed on transparent substrates, by basal surface with the substrate contact side on the angle that forms of light shield pattern plane be 50 ° or little.

11. a color filter, it comprises transparent substrates, has on the described transparent substrates by using the pixel that each photosensitive colored composition forms among the claim 7-10.

12. a color filter, it comprises the transparent substrates that has the light shield pattern on it, and wherein said light shield pattern is to use photosensitive colored composition to form, and by basal surface with the substrate contact side on the angle that forms of light shield pattern plane be 5 °-50 °.

13. the color filter of claim 12, wherein the light shield pattern is by using the photosensitive colored composition in the claim 8 or 9 to form.

14. each color filter among the claim 11-13, wherein two or more different pixel image positions of colored pattern are formed with in the substrate of light shield pattern thereon, and by specifying the basal plane of substrate, the difference in each pixel image between highest surface point and the minimum surface point is 0.7 micron or littler in all pixel images.

15. a liquid crystal display, each color filter among its use claim 11-14.

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