CN1680049A - Cleaner - Google Patents
Cleaner Download PDFInfo
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- CN1680049A CN1680049A CN 200410033423 CN200410033423A CN1680049A CN 1680049 A CN1680049 A CN 1680049A CN 200410033423 CN200410033423 CN 200410033423 CN 200410033423 A CN200410033423 A CN 200410033423A CN 1680049 A CN1680049 A CN 1680049A
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- substrate
- cavernous body
- cleaning device
- cleaning
- support portion
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Abstract
A washing apparatus features use of detergent to wash the edge of a basic board. It has a supporting unit and a sponge body, to which said detergen is dropped for wash said basic board.
Description
Technical field
The present invention relates to a kind of cleaning device, relate in particular to a kind of cleaning device of liquid crystal panel.
Background technology
Progress day by day along with manufacturing technology, LCD (Liquid Crystal Display, LCD) be a kind of display element that is widely used, its operation principle mainly utilizes electric field to control the ordered state of liquid crystal molecule, can be by liquid crystal molecule whether to reach the display effect of light and shade on the screen by the light that backlight produces.
In the manufacture process of LCD; regular meeting carries out an offset printing (lithography) processing procedure; in order to form pattern on the photoresist layer of crystal liquid substrate, this offset printing processing procedure comprises a plurality of steps: crystal liquid substrate cleaning, crystal liquid substrate oven dry, photoresist layer coating, photoresist layer exposure and the formation of photoresistance pattern etc.
See also Fig. 1, it is the structure chart of traditional photoresist layer coating process, in Fig. 1, be coated with one deck photoresist layer 11 on the substrate 10, because capillary relation, the part 12 of uneven thickness takes place in regular meeting on four limits of substrate 10, and this phenomenon that results from the edge of substrate 10 can have a strong impact on the running of back-end process and the qualification rate of whole piece lcd productive line; In order to address this problem, following multiple improvement method has appearred in the prior art.
(1) infusion method
See also Fig. 2, it is the schematic diagram of infusion method in the prior art, it utilizes a clamper 20 to clamp substrate 21, four limits of substrate 21 is soaked among the cleaning agent 23 of 22 splendid attires of container in regular turn, with thicker photoresist layer 24 on four limits of cleaning, removing substrate 21.
Therefore yet this method is because the cleaning agent 23 in the container 22 is repeatedly to be used always, and the number of the substrate 21 that cleans is many more, and the effect of the manufacturing process for cleaning of back just is not easy control more, causes the number of scrapping of substrate more can be many more to the back; If but the replacing number of times of increase cleaning agent 23 can improve production cost on the contrary.
(2) spraying
See also Fig. 3, it is the schematic diagram of the use spraying of 6,062,288 United States Patent (USP) for the patent No. in the prior art, it utilizes four edges of 30 pairs of substrates 31 of sprinkler of a movable type to spray cleaning agent, with thicker photoresist layer on four limits of cleaning, removing substrate 31.
Yet, because the cleaning agent spraying range of sprinkler 30 is wayward, and therefore the photoresistance pattern of the inboard, four edges of close substrate 31 just is subjected to the destruction of cleaning agent easily, though consequently removed the photoresist layer at substrate 31 edges, has destroyed whole photoresistance pattern also.
(3) air blast
See also Fig. 4, it is the schematic diagram of air blast in the prior art.In order to improve the disappearance of above-mentioned spraying, the cleaning device that a kind of use air knife (air-knife) occurred, as shown in Figure 4, its inboard at sprinkler 40 is provided with air knife 41, the cleaning agent that the gas that utilizes air knife 41 to be blown out makes sprinkler 40 be sprayed is limited within certain scope, can destroy the disappearance of photoresistance pattern to avoid aforementioned spraying.
Yet,, at first,, still can make the edge of photoresist layer 42 produce the uneven phenomenon of thickness because the pressure distribution of gas when touching photoresist layer 42 that air knife 41 is blown out is inhomogeneous in the mode of microcosmic; Moreover when if the distance between air knife 41 and the substrate 44 is minimum, the gas that air knife 41 is blown out forms a vacuum state touching photoresist layer 42 parts, makes substrate 44 be held by air knife 41 easily, causes the breakage of substrate 44.
Summary of the invention
Main purpose of the present invention is to provide a kind of cleaning device, it splashes into cavernous body with cleaning agent, utilize the porous of cavernous body and the careful property of structure with the cleaning base plate edge, and flow, the mould that can control cleaning agent are thick, cleaning area and pressure and stability when cleaning, improve the disappearance of traditional side washing device.
According to main purpose of the present invention, a kind of cleaning device is proposed, to clean the edge of a substrate, this cleaning device comprises: a support portion by a cleaning agent; And a cavernous body, be connected in this support portion; Wherein, this cleaning agent splashed into this cavernous body after, utilize between this cavernous body and this substrate contact and relative motion to clean.
According to above-mentioned conception, wherein, this cleaning device can be parallel to a plane at this substrate place and move, to control the relative position between this cavernous body and this substrate.
According to above-mentioned conception, wherein, the kind of this cleaning agent has a corresponding relation with the kind of this cavernous body.
According to above-mentioned conception, wherein, this cleaning agent splashes into this cavernous body by a syringe needle.
According to above-mentioned conception, wherein, this substrate is a silicon substrate.
According to above-mentioned conception, wherein, this cleaning device is in order to the photoresist layer on the edge that cleans this substrate.
According to above-mentioned conception, wherein, this support portion also is connected in a retractor device, by stretching of this retractor device, makes this cavernous body to move perpendicular to a plane at this substrate place, to control the exposure level between this cavernous body and this substrate.
According to above-mentioned conception, wherein, this retractor device is a spring.
According to above-mentioned conception, wherein, this cavernous body is sheathed on this support portion by a bearing.
According to above-mentioned conception, wherein, this substrate is fixed in a mobile device, and this mobile device can be parallel to a plane at this substrate place and move, to control the relative position between this cavernous body and this substrate.
According to above-mentioned conception, wherein, this mobile device also comprises: a pedestal, in order to fix this substrate; One rotation motor is connected in this pedestal; And advance motor always, be connected in this rotation motor; Directly advance the start that cooperatively interacts of motor by this rotation motor and this, make this pedestal can be parallel to this plane at this substrate place and move.
According to another object of the present invention, a kind of cleaning device is proposed, to clean the edge of a substrate, this cleaning device comprises by a cleaning agent; One first support portion is positioned at a side of this substrate; One first cavernous body is connected in this first support portion; One second support portion is positioned at the opposite side of this substrate; And one second cavernous body, be connected in this second support portion; Wherein, this cleaning agent splashed into this first and second cavernous body after, utilize respectively between this first and second cavernous body and this substrate contact and relative motion to clean.
According to above-mentioned conception, wherein, this cleaning device can be parallel to a plane at this substrate place and move, to control the relative position between this first and second cavernous body and this substrate respectively.
According to above-mentioned conception, wherein, the kind of first and second cavernous body of kind and this of this cleaning agent has a corresponding relation.
According to above-mentioned conception, wherein, this cleaning agent splashes into this first and second cavernous body by a syringe needle.
According to above-mentioned conception, wherein, this substrate is a silicon substrate.
According to above-mentioned conception, wherein, this cleaning device is in order to the photoresist layer on the edge that cleans this substrate.
According to above-mentioned conception, wherein, this first and second support portion more is connected to first and second retractor device, by stretching of this first and second retractor device, make this first and second cavernous body to move, to control the exposure level between this first and second cavernous body and this substrate respectively perpendicular to a plane at this substrate place.
According to above-mentioned conception, wherein, this first and second retractor device is a spring.
According to above-mentioned conception, wherein, this cavernous body is sheathed on this support portion by a bearing.
According to above-mentioned conception, wherein, this substrate is fixed in a mobile device, and this mobile device can be parallel to a plane at this substrate place and move, to control the relative position between this first and second cavernous body and this substrate respectively.
According to above-mentioned conception, wherein this mobile device also comprises: a pedestal, in order to fix this substrate; One rotation motor is connected in this pedestal; And advance motor always, be connected in this rotation motor; Directly advance the start that cooperatively interacts of motor by this rotation motor and this, make this pedestal can be parallel to this plane at this substrate place and move.
Description of drawings
Fig. 1 is the structure chart of traditional photoresist layer coating process;
Fig. 2 is the schematic diagram of infusion method in the prior art;
Fig. 3 is the schematic diagram of spraying in the prior art;
Fig. 4 is the schematic diagram of air blast in the prior art;
Fig. 5 is the structure side view of a preferred embodiment of cleaning device of the present invention;
Fig. 6 is the structure side view of mobile device of the present invention; And
Fig. 7 is the structure side view of another preferred embodiment of cleaning device of the present invention.
Wherein, description of reference numerals is as follows:
10 substrates, 11 photoresist layers
21 substrates, 22 containers
23 cleaning agents, 24 photoresist layers
30 sprinklers, 31 substrates
40 sprinklers, 41 air knives
The part of 42 photoresist layers, 43 uneven thickness
44 substrates, 50 cleaning devices
501 support portions, 502 cavernous bodies
503 bearings, 51 injection devices
511 containers, 512 buffer containers
513 tube connectors, 514 control valves
515 syringe needles, 52 cleaning agents
53 substrates, 54 photoresist layers
55 retractor devices, 60 substrates
61 mobile devices, 611 pedestals
612 rotation motors 613 directly advance motor
62 cavernous bodies, 70 substrates
71 photoresist layers, 72 photoresist layers
The specific embodiment
See also Fig. 5, it is the structure side view of a preferred embodiment of cleaning device of the present invention.Wherein, cleaning device 50 is made of support portion 501 and coupled cavernous body 502, by injection device 51, after cleaning agent 52 splashed into cavernous body 502, utilize contacting and relative motion between cavernous body 502 and the substrate 53, with the edge of cleaning base plate 53 or the photoresist layer 54 that is had on it.
As shown in Figure 5, substrate 53 can be a silicon substrate, cavernous body 502 is sheathed on support portion 501 by bearing 503, and injection device 51 is formed by connecting jointly by container 511, buffer container 512, tube connector 513, control valve 514 and 515 at syringe needle, can control cleaning agent 52 splashes into cavernous body 502 from syringe needle 515 quality, volume and speed by control valve 514.
In addition, because the material difference of employed photoresist layer 54 is therefore also just inequality with the cleaning agent 52 of its collocation, and in order to cooperate cleaning agent 52 different types of Acidity of Aikalinitys, the kind of employed cavernous body 502 also can be different.
Secondly, support portion 501 also can be connected in retractor device 55, by stretching of retractor device 55, make cavernous body 502 to move perpendicular to a plane at substrate 53 places, with the exposure level between control cavernous body 502 and the substrate 53, wherein, retractor device 55 can be a spring.
What deserves to be mentioned is that cleaning device 50 and retractor device 55 can be parallel to a plane at substrate 53 places and move, with the relative position between control cavernous body 502 and the substrate 53, to carry out washing and cleaning operation.
In addition, as shown in Figure 6, substrate 60 can be fixed on the pedestal 611 on the mobile device 61, and mobile device 61 can have the rotation motor 612 that is connected in pedestal 611 and be connected in rotation motor 612 directly advance motor 613, by rotation motor 612 and the start that cooperatively interacts of directly advancing motor 613, make mobile device 61 when carrying substrate 60, can be parallel to a plane at substrate 60 places and move, with the relative position between control cavernous body 62 and the substrate 60, be convenient to carry out washing and cleaning operation.
At last, except for the one-sided washing and cleaning operation of substrate, also can be as shown in Figure 7, in the both sides of substrate 70 one group of above-mentioned cleaning device is set respectively, with respectively or side by side for the edge of substrate 70 or the photoresist layer on it 71,72 carries out washing and cleaning operation, certainly, above-mentioned qualification for single group cleaning device all can be applicable on two group cleaning devices.
In sum, cleaning device proposed by the invention as can be known splashes into cavernous body with cleaning agent, utilize the porous of cavernous body and the careful property of structure with the cleaning base plate edge, and flow, the mould that can control cleaning agent are thick, cleaning area and pressure and stability when cleaning, have improved the disappearance that traditional side washing device is had fully; Furthermore, cleaning device of the present invention has more following advantage at the side washing operation aspect of substrate:
(1) fabric width control in side washing edge is more accurate;
(2) linearity at side washing edge more improves;
(3) thick being convenient to of the mould of the cleaning agent of transfer printing controlled;
(4) feed system of cleaning agent is more stable;
(5) flow-control of cleaning agent is more accurate;
(6) pressure distribution of the left and right sides, washing and cleaning operation district is identical; And
(7) both sides up and down of substrate can be cleaned simultaneously.
The above is preferred embodiment of the present invention only, is not to be used for limiting practical range of the present invention; Be that all equalizations of doing according to preferred embodiment of the present invention change and modification, be all scope of patent protection of the present utility model and contain.
Claims (10)
1. cleaning device, be by a cleaning agent to clean the edge of a substrate, this cleaning device comprises:
One support portion; And
One cavernous body is connected in this support portion;
Wherein, this cleaning agent splashed into this cavernous body after, utilize between this cavernous body and this substrate contact and relative motion to clean.
2. cleaning device as claimed in claim 1, wherein, this cleaning device can be parallel to a plane at this substrate place and move, to control the relative position between this cavernous body and this substrate.
3. cleaning device as claimed in claim 1, wherein, the kind of this cleaning agent has a corresponding relation with the kind of this cavernous body.
4. cleaning device as claimed in claim 1, wherein, this cleaning agent splashes into this cavernous body by a syringe needle, so that this cleaning device cleans the photoresist layer on the edge of this substrate.
5. cleaning device as claimed in claim 1, wherein,
This support portion also is connected in a retractor device, by stretching of this retractor device, makes this cavernous body to move perpendicular to a plane at this substrate place, to control the exposure level between this cavernous body and this substrate; And this retractor device is a spring.
6. cleaning device as claimed in claim 1, wherein, this cavernous body is sheathed on this support portion by a bearing.
7. cleaning device as claimed in claim 1, wherein,
This substrate is fixed in a mobile device, and this mobile device can be parallel to a plane at this substrate place and move, to control the relative position between this cavernous body and this substrate; And this mobile device also comprises:
One pedestal is in order to fix this substrate;
One rotation motor is connected in this pedestal; And
Advance motor always, be connected in this rotation motor;
Directly advance cooperatively interacting of motor by this rotation motor and this, make this pedestal can be parallel to this plane at this substrate place and move.
8. cleaning device, to clean the edge of a substrate, this cleaning device comprises by a cleaning agent:
One first support portion is positioned at a side of this substrate;
One first cavernous body is connected in this first support portion;
One second support portion is positioned at the opposite side of this substrate; And
One second cavernous body is connected in this second support portion;
Wherein, this cleaning agent splashed into this first and second cavernous body after, utilize respectively between this first and second cavernous body and this substrate contact and relative motion to clean.
9. cleaning device as claimed in claim 8, wherein, this cleaning device can be parallel to a plane at this substrate place and move, to control the relative position between this first and second cavernous body and this substrate respectively.
10. cleaning device as claimed in claim 8, wherein, this first and second support portion also is connected to first and second retractor device, by stretching of this first and second retractor device, make this first and second cavernous body to move, to control the exposure level between this first and second cavernous body and this substrate respectively perpendicular to a plane at this substrate place.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200410033423 CN1680049A (en) | 2004-04-07 | 2004-04-07 | Cleaner |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200410033423 CN1680049A (en) | 2004-04-07 | 2004-04-07 | Cleaner |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN1680049A true CN1680049A (en) | 2005-10-12 |
Family
ID=35067015
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 200410033423 Pending CN1680049A (en) | 2004-04-07 | 2004-04-07 | Cleaner |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN1680049A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107797316A (en) * | 2017-11-08 | 2018-03-13 | 昆山龙腾光电有限公司 | Drip the preparation method of sour device, drop acid board and touching display screen |
| CN108179486A (en) * | 2018-03-20 | 2018-06-19 | 四川省建筑科学研究院 | The cleaning device of electrospinning device and its syringe needle |
-
2004
- 2004-04-07 CN CN 200410033423 patent/CN1680049A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107797316A (en) * | 2017-11-08 | 2018-03-13 | 昆山龙腾光电有限公司 | Drip the preparation method of sour device, drop acid board and touching display screen |
| CN108179486A (en) * | 2018-03-20 | 2018-06-19 | 四川省建筑科学研究院 | The cleaning device of electrospinning device and its syringe needle |
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