CN1664493A - Method and device for testing deep of film - Google Patents
Method and device for testing deep of film Download PDFInfo
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- CN1664493A CN1664493A CN2004101007540A CN200410100754A CN1664493A CN 1664493 A CN1664493 A CN 1664493A CN 2004101007540 A CN2004101007540 A CN 2004101007540A CN 200410100754 A CN200410100754 A CN 200410100754A CN 1664493 A CN1664493 A CN 1664493A
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B13/00—Oxygen; Ozone; Oxides or hydroxides in general
- C01B13/10—Preparation of ozone
- C01B13/11—Preparation of ozone by electric discharge
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B2201/00—Preparation of ozone by electrical discharge
- C01B2201/20—Electrodes used for obtaining electrical discharge
- C01B2201/22—Constructional details of the electrodes
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B2201/00—Preparation of ozone by electrical discharge
- C01B2201/20—Electrodes used for obtaining electrical discharge
- C01B2201/24—Composition of the electrodes
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B2201/00—Preparation of ozone by electrical discharge
- C01B2201/60—Feed streams for electrical dischargers
- C01B2201/62—Air
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B2201/00—Preparation of ozone by electrical discharge
- C01B2201/60—Feed streams for electrical dischargers
- C01B2201/64—Oxygen
Abstract
The invention provides a film thickness measurement technique which correctly measures film thickness even for a transparent film which selectively transmits light of specific wavelength ranges such as a color filter.Theoretical spectral reflectance calculated as the spectral reflectance of a sample, in which a colorless transparent film having predetermined film thickness is formed on a substrate, is acquired a plurality of times for different film thickness. The spectral transmittance of a color filter, which is an object to be measured, is acquired. Concerning the spectral transmittance, a wavelength range providing transmittance of a predetermined value or more is selected as a measurement wavelength range. A plurality of theoretical spectral reflectance calculated for different film thickness are corrected by the spectral transmittance to determine corrected theoretical spectral reflectance. A sample, in which the color filter is formed on a substrate, is irradiated with light, and reflected light from the sample is spectrally separated to measure the spectral reflectance. The measured spectral reflectance is compared to the corrected theoretical spectral reflectance to calculate the film thickness of the color filter.
Description
Technical field
The present invention relates to a kind of transparent membrane, the particularly film thickness measuring method and device of the thickness of the transparent membrane of the light of the selective permeation particular wavelength region as color filter that forms on semiconductor substrate or the substrate of liquid crystal indicator that be determined at glass substrate etc.
Background technology
In the past, for example disclose and proposed the technology that the use optical interferometry is determined at the thickness of transparent membranes as thin as a wafer such as the resist film that forms on above-mentioned such substrate or silicon oxide layer in the flat 6-249620 communique (1994) in Japan special permission.In using the determining film thickness of optical interferometry, inject under the condition of light having formed on the substrate of transparent membrane that thickness is setting d, obtain spectral reflectance by the interference of light regulation of this transparent membrane by calculated in advance.At this moment, in certain thickness scope, be stored in the memory storages such as storer as a plurality of theoretical spectral reflectances at obtaining spectral reflectance with the thickness of equidistant setting.
Irradiates light on the substrate of the transparent membrane that has formed determination object carries out beam split with the reflected light that reflects thus by optical splitter, the actual measurement spectral reflectance.Afterwards, calculate the difference of this actual measurement spectral reflectance and above-mentioned a plurality of theoretical spectral reflectances, try to achieve this difference for minimum film thickness value, the thickness of the film thickness value that obtains with former well-known curve fitting method (カ one Block Off イ Star ト method) as the transparent membrane of determination object.
Along with popularizing rapidly of the portable phone that has digital camera or video camera, the needs of colored CCD increase greatly but in recent years.In the manufacturing process of colored CCD, on silicon wafer, be the color filter of rectangular stickup RGB three looks.In addition, in projector, use the parts that on liquid crystal glass base, form color filter.Form in the operation of color filter on such substrate, the thickness of strict control color filter is very important, requires the correct thickness of measuring color filter.
Yet color filter only sees through the light of particular wavelength region, for example sees through the light that wavelength region may is roughly 480nm～600nm following of the situation of green color filter.Fig. 9 is the view of expression color filter transmissison characteristic.The spectral reflectance that obtains when forming irradiates light on the sample of the color filter with the optical transmission characteristics shown in this figure on substrate (with respect to the curve map of the reflectivity of wavelength) as shown in figure 10.In addition, in Figure 10, represent the spectral reflectance that obtains from the substrate that has formed color filter with solid line, for reference, dot and replace color filter and the spectral reflectance of the light of whole relatively visible region when on substrate, forming clear films (being colorless and transparent film).
As shown in figure 10, under the situation of colorless and transparent film, the peak period ground of the reflectivity under the wavelength X that satisfies the interference condition 2d=n λ of film (n is that integer, λ are wavelength) occurs, and under the situation of color filter, the peak valley of reflectance curve only occurs in seeing through the light wavelength zone.Promptly be limited to this particular wavelength region when yes to the wavelength region may that produces the interference of light on the sample of the color filter of the light that is formed with the selective permeation particular wavelength region on substrate during irradiates light.
Thereby, when being determined at the thickness of the color filter that forms on the substrate, be limited in the particular wavelength region that produces light transmission, so have to reduce the mensuration reliability owing to measure wavelength region may by optical interferometry.And the spectral transmission (with respect to the curve map of the transmissivity of wavelength) that color filter is shown as shown in Figure 9 is not rectangle but trapezoidal shape waveform.Promptly in the particular wavelength region that light transmission produces, also change in its boundary vicinity transmissivity with simulating.And because in the wavelength region may of the rake of transmittance graph, the luminance factor theoretical value is also low, so when comprising this wavelength region may in measuring wavelength region may, the reliability of determining film thickness is decline significantly.
Therefore, can think by only the wavelength coverage the wavelength region may of the rake in transmittance graph, promptly as shown in Figure 9 the wavelength region may of the top, horizontal portion in transmittance graph as measuring wavelength region may, thereby measuring accuracy is improved, but the width of measuring wavelength region may under this situation is about 40nm～50nm, very narrow, might cause the decline of measuring reliability by it.Particularly because the waveform of the thin more reflectance curve of thickness of color filter becomes the low frequency waveform more, so, the problem that determining film thickness self becomes difficult can take place then if measure the narrowed width of wavelength region may.
Summary of the invention
The present invention proposes in view of the above problems, also can correctly measure the film thickness measuring method and the device of its thickness even its objective is the transparent membrane of the light that a kind of selective permeation particular wavelength region resemble the color filter is provided.
In order to address the above problem, the film thickness measuring method of the first aspect of invention, measure the thickness of described transparent membrane according to the spectral reflectance that the sample irradiates light that has formed transparent membrane on substrate is obtained, comprising: spectral transmission obtains operation, obtains the spectral transmission of described transparent membrane; Spectral reflectance is measured operation, to described sample irradiates light, and will survey spectral reflectance from the reflected light beam split of described sample reflection; Revise operation, by described spectral transmission correction as the spectral reflectance of the sample that on substrate, has formed transparent membrane and in advance fixed theoretical spectral reflectance with regulation thickness; The thickness calculation process, theoretical spectral reflectance and measure the actual measurement spectral reflectance of measuring in the operation at described spectral reflectance after the correction of relatively revising in described correction operation calculates the thickness of the transparent membrane of determination object.
A second aspect of the present invention is in first aspect, described thickness calculation process carries out the weighting corresponding to described spectral transmission, more describedly revises the theoretical spectral reflectance in back and described actual measurement spectral reflectance and calculates the thickness of the transparent membrane of determination object.
A third aspect of the present invention be first or second aspect in, the wavelength region may that also comprises the transmissivity more than the defined threshold that will have in the described spectral transmission is as the mensuration wavelength region may of described thickness calculation process and the operation of selecting.
The film thickness measuring method of a fourth aspect of the present invention, measure the thickness of described transparent membrane according to the spectral reflectance that the sample irradiates light that has formed transparent membrane on substrate is obtained, comprising: spectral transmission obtains operation, obtains the spectral transmission of described transparent membrane; Spectral reflectance is measured operation, to described sample irradiates light, and will survey spectral reflectance from the reflected light beam split of described sample reflection; Revise operation, will measure the actual measurement spectral reflectance of measuring in the operation at described spectral reflectance and revise by described spectral transmission; The thickness calculation process relatively calculates the thickness of the transparent membrane of determination object as actual measurement spectral reflectance at the spectral reflectance of the sample that has formed the transparent membrane with regulation thickness on the substrate and after in advance fixed theoretical spectral reflectance and the correction revised in described correction operation.
The determining film thickness device of a fifth aspect of the present invention, measure the thickness of described transparent membrane according to the spectral reflectance that the sample irradiates light that has formed transparent membrane on substrate is obtained, comprising: first memory storage, it stores the spectral transmission of described transparent membrane; Second memory storage, its storage are as the spectral reflectance of sample that has formed the transparent membrane with regulation thickness on substrate and in advance fixed theoretical spectral reflectance; Light source, it is to the sample irradiates light of determination object; The spectral reflectance determinator, it will carry out beam split from the reflected light that described light source irradiation light and the sample by determination object reflect and measure spectral reflectance; Correcting device, it revises described theoretical spectral reflectance by described spectral transmission; The thickness calculation element, theoretical spectral reflectance and the actual measurement spectral reflectance by described spectral reflectance determinator mensuration after its correction of relatively revising in described correcting device calculate the thickness of the transparent membrane of determination object.
A sixth aspect of the present invention be aspect the 5th in, described second memory device stores is corresponding to a plurality of theoretical spectral reflectance of the transparent membrane of different thickness, multiply by described spectral transmission on described correcting device each in described a plurality of theoretical spectral reflectances and calculate the theoretical spectral reflectance in a plurality of corrections back, described thickness calculation element is obtained described a plurality of each of the theoretical spectral reflectance in back and difference of described actual measurement spectral reflectance revised, and the film thickness value of the minimum value when expression is made a plurality of difference approximation quafric curve that obtains is as the thickness of the transparent membrane of determination object.
A seventh aspect of the present invention be aspect the 6th in, described thickness calculation element is weighted each of the theoretical spectral reflectance in described a plurality of corrections back and the difference of described actual measurement spectral reflectance, make the high more weighting of described spectral transmission big more, the film thickness value of the minimum value when making expression a plurality of weighted differences that obtain be similar to quafric curve is as the thickness of the transparent membrane of determination object.
A eighth aspect of the present invention is in aspect the 5th to seven any, also comprise the wavelength region may selecting apparatus, its wavelength region may with the transmissivity more than the defined threshold in described spectral transmission when calculating thickness the mensuration wavelength region may and select.
The determining film thickness device of a ninth aspect of the present invention, measure the thickness of described transparent membrane according to the spectral reflectance that the sample irradiates light that has formed transparent membrane on substrate is obtained, comprising: first memory storage, it stores the spectral transmission of described transparent membrane; Second memory storage, its storage are as the spectral reflectance of sample that has formed the transparent membrane with regulation thickness on substrate and in advance fixed theoretical spectral reflectance; Light source, it is to the sample irradiates light of determination object; The spectral reflectance determinator, it will carry out beam split from the reflected light that described light source irradiation light and the sample by determination object reflect and measure spectral reflectance; Correcting device, it will be revised by described spectral transmission by the actual measurement spectral reflectance that described spectral reflectance determinator is measured; The thickness calculation element, actual measurement spectral reflectance and described theoretical spectral reflectance after its correction of relatively in described correcting device, revising and calculate the thickness of the transparent membrane of determination object.
The determining film thickness device of a tenth aspect of the present invention, measure the thickness of described transparent membrane according to the spectral reflectance that the sample irradiates light that has formed transparent membrane on substrate is obtained, comprising: first light source, its film to described sample forms the face irradiates light; Secondary light source, it forms the opposite sides irradiates light of face to the described film of described sample; Light-dividing device, its transmitted light that will see through described substrate and described transparent membrane from described secondary light source irradiation carries out beam split, measure the spectral transmission of described transparent membrane, simultaneously will be and carry out beam split by the reflected light of described sample reflection from described first light source irradiation, measure spectral reflectance; Memory storage, its storage are as the spectral reflectance of sample that has formed the transparent membrane with regulation thickness on substrate and in advance fixed theoretical spectral reflectance; Correcting device, its described theoretical spectral reflectance of described spectral transmission correction by measuring by described light-dividing device; The thickness calculation element, theoretical spectral reflectance and the actual measurement spectral reflectance of being measured by described light-dividing device after its correction of relatively revising in described correcting device calculate the thickness of the transparent membrane of determination object.
According to a first aspect of the invention, owing to relatively revise as theoretical spectral reflectance and actual measurement spectral reflectance at the spectral reflectance of the sample that forms transparent membrane on the substrate and after the correction of in advance fixed theoretical spectral reflectance with regulation thickness by spectral transmission, calculate the thickness of the transparent membrane of determination object, so the deviation of theoretical spectral reflectance and actual measurement spectral reflectance is disengaged, even resemble the transparent membrane of the light of selective permeation particular wavelength region the color filter, also can correctly measure its thickness.
According to a second aspect of the invention, owing to carry out weighting corresponding to spectral transmission, relatively revise the theoretical spectral reflectance in back calculates the transparent membrane of determination object with the actual measurement spectral reflectance thickness, so can add comparison, more correctly carry out determining film thickness corresponding to the reliability of spectral transmission.
According to a third aspect of the invention we, because the wavelength region may of the transmissivity more than the selected defined threshold that has in the spectral transmission so the mensuration wavelength region may is broadened, improves the determining film thickness precision as measuring wavelength region may.
According to a forth aspect of the invention, because relatively as surveying spectral reflectance after in advance fixed theoretical spectral reflectance and the correction by the spectral transmission correction at the spectral reflectance of the sample that has formed transparent membrane on the substrate with regulation thickness, calculate the thickness of the transparent membrane of determination object, so can eliminate the deviation of theoretical spectral reflectance and actual measurement spectral reflectance, even resemble the transparent membrane of the light of selective permeation particular wavelength region the color filter, also can correctly measure its thickness.
According to a fifth aspect of the invention, since relatively by the spectral transmission correction as theoretical spectral reflectance and actual measurement spectral reflectance at the spectral reflectance of the sample that has formed transparent membrane on the substrate and after the correction of in advance fixed theoretical spectral reflectance with regulation thickness, calculate the thickness of the transparent membrane of determination object, so can eliminate the deviation of theoretical spectral reflectance and actual measurement spectral reflectance, even resemble the transparent membrane of the light of selective permeation particular wavelength region the color filter, also can correctly measure its thickness.
According to a sixth aspect of the invention, calculate the theoretical spectral reflectance in a plurality of corrections back owing on each of a plurality of theoretical spectral reflectances, multiply by spectral transmission, obtain these a plurality of each of the theoretical spectral reflectance in back and difference of actual measurement spectral reflectance revised, the film thickness value of the minimum value when expression is made a plurality of difference approximation quafric curve that obtains is as the thickness of the transparent membrane of determination object, so can eliminate the deviation of theoretical spectral reflectance and actual measurement spectral reflectance, significantly reduce the error of the difference that comprises both, the precision of approximate quafric curve uprises, even resemble the transparent membrane of the light of selective permeation particular wavelength region the color filter, also can correctly measure its thickness.
According to a seventh aspect of the invention, because a plurality of each that revise the theoretical spectral reflectance in back are weighted with the difference of surveying spectral reflectance, make the high more then weighting of spectral transmission big more, the film thickness value of the minimum value when making expression a plurality of weighted differences that obtain be similar to quafric curve is as the thickness of the transparent membrane of determination object, so the difference evaluation that transmissivity height, reliability are high is just high more, can more correctly carry out determining film thickness.
According to an eighth aspect of the invention, because the mensuration wavelength region may of the wavelength region may of the transmissivity more than the selected defined threshold that has in spectral transmission when calculating thickness, measure wavelength region may and broaden, make the raising of determining film thickness precision so can make.
According to a ninth aspect of the invention, because relatively as surveying spectral reflectance after in advance fixed theoretical spectral reflectance and the correction by the spectral transmission correction at the spectral reflectance of the sample that has formed transparent membrane on the substrate with regulation thickness, calculate the thickness of the transparent membrane of determination object, so can eliminate the deviation of theoretical spectral reflectance and actual measurement spectral reflectance, even resemble the transparent membrane of the light of selective permeation particular wavelength region the color filter, also can correctly measure its thickness.
According to the tenth aspect of the invention, since relatively by the spectral transmission correction as theoretical spectral reflectance and actual measurement spectral reflectance at the spectral reflectance of the sample that has formed transparent membrane on the substrate and after the correction of in advance fixed theoretical spectral reflectance with regulation thickness, calculate the thickness of the transparent membrane of determination object, so can eliminate the deviation of theoretical spectral reflectance and actual measurement spectral reflectance, even resemble the transparent membrane of the light of selective permeation particular wavelength region the color filter, also can correctly measure its thickness.
Description of drawings
Fig. 1 is the view of the structure of expression determining film thickness device of the present invention;
Fig. 2 is the block diagram of structure of operational part of the determining film thickness device of presentation graphs 1;
Fig. 3 is the process flow diagram that expression relates to the processing sequence of film thickness measuring method of the present invention;
Fig. 4 A, Fig. 4 B are that example illustrates the transparent membrane of different thickness and the view of the theoretical spectral reflectance that calculates;
Fig. 5 is the view that example illustrates the spectral transmission of color filter;
Fig. 6 is the view of an example of actual measurement spectral reflectance of the sample of expression determination object;
Fig. 7 is at the view of conceptual illustration with spectral transmission revised theory spectral reflectance;
Fig. 8 is the view that is used to measure the approximate quafric curve of thickness in conceptive expression;
Fig. 9 is the view of the light transmission characteristic of expression color filter;
The view of Figure 10 spectral reflectance that to be expression obtained by the substrate of the color filter that has formed Fig. 9.
Embodiment
With reference to the accompanying drawings embodiments of the present invention are elaborated.
1. first embodiment
Fig. 1 is the view of the structure of expression determining film thickness device of the present invention.This determining film thickness device comprises: first lamp optical system 10, second lamp optical system 20, imaging optical system 30.First lamp optical system 10 comprises Halogen lamp LED 11 and the illuminating lens 12 that penetrates white light.Illuminating lens 12 has been set up on this collector lens and has been omitted illustrated field stop etc. for example by the constituting of collector lens.The light that penetrates from Halogen lamp LED 11 is injected into the imaging optical system 30 by illuminating lens 12.
Imaging optical system 30 is made of object lens 31, semi-transparent semi-reflecting lens 32 and imaging len 33.Illumination light from first lamp optical system 10 is reflected by semi-transparent semi-reflecting lens 32, by irradiation above the sample 1 of object lens 31 on being placed in sample objective table 5.In addition, sample 1 is the parts that form on semiconductor substrate or the liquid crystal indicator substrate with glass substrate etc. as the color filter of coloured transparent membrane.Be that light is radiated on the film formation face of sample 1 from first lamp optical system 10.
Sample objective table 5 is sample mounting tables that its central portion has opening.Set up on sample objective table 5 and omitted illustrated XY driving mechanism, it can move along directions X in the surface level and Y direction when placing sample 1.In addition, so long as central portion has opening and can place sample 1 just, for example also can be the such parts of framework that keep the periphery of sample 1 as sample objective table 5.
On the other hand, second lamp optical system 20 is configured in the opposition side of imaging optical system 30 across sample objective table 5.Second lamp optical system 20 comprises Halogen lamp LED 21 and the illuminating lens 22 that penetrates white light.The dichroism of ejaculation light of wishing Halogen lamp LED 21 is identical with Halogen lamp LED 11.Perhaps also can be to constitute Halogen lamp LED 11 and 21, with the other leaded light of optical fiber five equilibrium with a Halogen lamp LED.Illuminating lens 22 is the lens combinations with light-focusing function, and the light that penetrates from Halogen lamp LED 21 is by illuminating lens 22 and by optically focused, by the opening of sample objective table 5 shine sample 1 the back side, be that the film of sample 1 forms on the opposite sides of face.
From the irradiation of first lamp optical system 10, the light that on sample 1, reflects and from 20 irradiations of second lamp optical system, see through sample 1 light by object lens 31, semi-transparent semi-reflecting lens 32 and the assigned position of imaging len 33 on the optical axis of imaging optical system 30 by optically focused.The configuration spectrophotometric unit 40, make spectrophotometric unit 40 go into perforation be positioned at this spot position near.
Fig. 2 is the block diagram of the structure of expression operational part 50.Operational part 50 calculates the thickness of the color filter of sample 1 based on the spectrophotometric spectra information that receives from spectrophotometric unit 40.Operational part 50 has the hardware configuration same with general computing machine, comprising: the CPU51 that carries out various calculation process; The ROM52 as ROM (read-only memory) of storage base program etc.; Bring into play the conduct of function as the operating area of CPU51 and read and write the RAM53 of storer freely; The disk 54 of stored programme and various data.CPU51 is connected by omitting illustrated IO interface and keyboard 60, CRT61, printer 62 and above-mentioned photodetector 42.The operator of determining film thickness device can confirm from the operation result of CRT61 and printer 62 outputs from keyboard 60 with various instructions and parameter input operational part 50 simultaneously.And then, set up the lamp power supply respectively at Halogen lamp LED 11 and Halogen lamp LED 21, on sample objective table 5, set up XY driving circuit (the whole province is diagram slightly), the CPU51 of operational part 50 also is electrically connected with them.Correction portion 55 shown in Figure 2, thickness calculating part 56 and the selected portion 57 of mensuration wavelength region may all are by carrying out the handling part that CPU51 predetermined process program realizes, below will further setting forth about the details of its contents processing.
Below, the processing sequence of film thickness measuring method of the present invention is described.Fig. 3 is the process flow diagram of the processing sequence of expression film thickness measuring method of the present invention.Measure the order of the thickness of this color filter according to the spectral reflectance that obtains to sample 1 irradiates light that on substrate, forms as the color filter of the green of coloured transparent membrane in this explanation.Certainly, be not limited only to green color filter, also can be to the color filter of other colors such as blue colo(u)r filter and Red lightscreening plate by same sequential determination thickness.
At first obtain the theoretical spectral reflectance (step S1) that calculates as the spectral reflectance of the sample that on substrate, forms transparent membrane with regulation thickness.This theory spectral reflectance be with formed the substrate identical as the substrate of the color filter of determination object on form the colourless transparent film of regulation thickness d and inject the spectral reflectance of obtaining by calculating under the condition of white light above the colorless and transparent film to this from first lamp optical system 10.In this manual, so-called " reflectivity " strictly says it is the reflection strength ratio of the reflection strength when not forming transparent membrane (thickness is zero) on substrate, i.e. relative reflectance.
Theoretical spectral reflectance in certain limit, (when the thickness of for example imagining the color filter of determination object is hundreds of nm, be the scope of 100nm～1000nm) corresponding to the thickness level of the color filter that becomes determination object uniformly-spaced the colorless and transparent film of (for example 10nm at interval) different thickness d of setting calculate respectively.Since in transparent membrane, produce interference of light, so reflectivity uprises under the wavelength that light is strengthened mutually, reflectivity step-down under the wavelength that weakens mutually.And owing to produce the thickness decision of the condition of interference of light by transparent membrane, according to thickness, the figure difference of theoretical spectral reflectance.Therefore, can calculate theoretical spectral reflectance according to the interference of light condition to each different thickness.
Fig. 4 A, Fig. 4 B are the views of expression theoretical spectral reflectance that the colorless and transparent film of different thickness is calculated.Fig. 4 A is the theoretical spectral reflectance of the thicker transparent membrane of Film Thickness Ratio, and Fig. 4 B is the theoretical spectral reflectance of thin transparent membrane of Film Thickness Ratio.As shown in Figure 4, thickness is thin more, and the cycle of the figure of theoretical spectral reflectance is low more.Promptly the peak valley of the theoretical spectral reflectance in certain wavelength region may tails off.Corresponding to the data storage of a plurality of theoretical spectral reflectances of the transparent membrane of prior so different thickness of calculating in disk 54.
Then, enter step S2, obtain spectral transmission as the color filter of determination object.The spectral transmission of color filter both can directly be measured in the determining film thickness device of Fig. 1, also can use the value that determines in advance.Promptly when on transparent glass substrate, forming color filter, directly measure the spectral transmission of having utilized second lamp optical system 20 with respect to the whole zone of visible light.When on opaque silicon substrate, forming color filter, use the spectral transmission that determines in advance with respect to visible light.
When on glass substrate, forming color filter, because its substrate self almost completely sees through light, so can directly measure spectral transmission.At this moment from the irradiation of second lamp optical system 20, and the light that sees through sample 1 (being substrate and color filter) by imaging optical system 30 by optically focused, by with spectrophotometric unit 40 this light beam split, measure the spectral transmission of color filter.The spectral transmission that determines with spectrophotometric unit 40 is passed to operational part 50, is stored in the disk 54.
On the other hand, when on silicon substrate, forming color filter,, can not directly measure spectral transmission because substrate self is light tight.Use to form to use and measure spectral transmission in advance with the color filter same material of determination object, transparency carrier (for example glass substrate) with color filter of same thickness.Use such simulation both can to carry out with the determining film thickness device of present embodiment with the mensuration of the spectral transmission of the color filter of sample; Also can use other spectral transmission mensuration isolated plant to carry out.Assay method is identical with above-mentioned direct mensuration, and the data of the spectral transmission that obtains are taken into operational part 50 by the telecommunication circuit or the recording medium of regulation, are stored in the disk 54.Present embodiment is stored in the data both sides of the data of a plurality of theoretical spectral reflectances and spectral transmission in the disk 54, but also can be stored in either party in the different memory storage (for example RAM53).
Fig. 5 is the view of the spectral transmission of expression color filter.Color filter has a characteristic of the light of selective permeation particular wavelength region substantially, and as shown in Figure 5, roughly seeing through wavelength region may during the color filter of green is the light of 480nm～600nm.Even in this wavelength region may, the width of wavelength region may that almost completely sees through the top, horizontal portion of (transmissivity about 100%) light is 40nm～50nm, and other parts become the rake through light quantity decay (passing the transmissivity from 0% to 100%).Spectral transmission in this manual is the relative value of the maximal value in the measurement range after beam split as 100% o'clock.
If in the such wavelength region may that sees through light quantity decline of rake, carry out determining film thickness, then, become the reason of measuring error because the deviation of theoretical spectral reflectance and actual measurement spectral reflectance becomes greatly.The present invention utilizes method described later that this deviation is diminished, even but like that, preferably measure in the big wavelength region may of transmissivity.Therefore, the wavelength region may with the transmissivity more than the threshold value certain in spectral transmission as shown in Figure 5 is elected to be the mensuration wavelength region may (step S3) that is used for determining film thickness.
The selected of this mensuration wavelength region may promptly can manually be carried out by the operator of determining film thickness device, also can be carried out automatically by device according to pre-set threshold.When manually carrying out, the operator is seeing on the limit spectral transmission as Fig. 5 that is illustrated among the CRT61, the limit select suitable mensuration wavelength region may and this wavelength region may with keyboard 60 inputs.At this moment, can consider to measure the width of wavelength region may and the balance of transmissivity is selected.On the other hand, when selecting automatically, the selected portion of mensuration wavelength region may 57 bases are obtained as the data of the spectral transmission of Fig. 5 and are become the above transmisivity data of pre-set threshold, select the wavelength region may corresponding with it as the mensuration wavelength region may.In addition, the operator also can see the spectral transmission as Fig. 5 that shows in the limit on CRT61, the limit is measured 57 wavelength region may corresponding with becoming this transmisivity data more than threshold value of the selected portion of wavelength region may and is elected to be the mensuration wavelength region may with keyboard 60 input suitable threshold.
The width of measuring wavelength region may is big more, and the computational accuracy of the difference of theoretical spectral reflectance and actual measurement spectral reflectance is high more, and on the other hand, the error that is caused by transmissivity decline is big more.Therefore, no matter by manually still by selecting automatically, must select to have considered the mensuration wavelength region may of their balance.In the present embodiment, measure the selected portion 57 of wavelength region may and automatically select to measure wavelength region may, select transmissivity in the spectral transmission of Fig. 5 to surpass 70% wavelength region may and (be roughly 500nm～570nm) as the mensuration wavelength region may that is used to measure thickness according to pre-set threshold.Selected mensuration wavelength region may for example temporarily is stored among the RAM53.
Next enters into step S4.Spectral reflectance with determining film thickness device actual measurement sample 1 shown in Figure 1.At this moment, the light that shines and reflect from first lamp optical system 10 with imaging optical system 30 optically focused, by this light is carried out beam split with spectrophotometric unit 40, is measured the spectral reflectance of sample 1 on sample 1.The actual measurement spectral transmission of measuring with spectrophotometric unit 40 is passed to operational part 50.
Fig. 6 is the view of an example of the actual measurement spectral reflectance of expression sample 1.In the actual measurement spectral reflectance, occur because the peak value of the reflectivity that causes in the interference of light of transparent membrane.The transparent membrane of sample 1 is if not color filter, but colourless transparent membrane, then in the actual measurement spectral reflectance, should go out the such periodic peak value of phenomenon theoretical spectral reflectance shown in Figure 4 repeatedly, but because the light of a color filter selective permeation particular wavelength region, so the peak value of reflectivity only in particular wavelength region, occurs as shown in Figure 6.In addition, even in particular wavelength region, can obtain the reflectivity Characteristics identical with theoretical spectral reflectance in transmissivity is almost 100% wavelength region may, but the wavelength region may beyond it is along with the decline of transmissivity, the deviation of theoretical spectral reflectance and actual measurement spectral reflectance becomes big.The actual measurement spectral reflectance of the sample of measuring 1 for example temporarily is stored among the RAM53.Present embodiment is surveyed the mensuration of spectral reflectance in relating to the extensive wavelength region may of whole visible region, but also can be only to measuring the actual measurement spectral reflectance according to the selected mensuration wavelength region may of above-mentioned spectral transmission.
Then enter into step S5.The theoretical spectral reflectance that is stored in the disk 54 is revised with spectral transmission.At this moment, in scope, revise according to the selected mensuration wavelength region may of above-mentioned spectral transmission.In addition, each is revised corresponding to a plurality of theoretical spectral reflectance of the transparent membrane of different thickness.Specifically, correction portion 55 is carried out the correction of theoretical spectral reflectance according to following formula 1.
Formula 1:
R′(λ)＝T(λ)·R(λ)
In formula 1, R (λ) is the value of the theoretical spectral reflectance of wavelength X, T (λ) be the spectral transmission of wavelength X value (strictly say be transmissivity 100% as 1 and the value of normalization), R ' is the value of the theoretical spectral reflectance of revised wavelength X (λ).Be that correction portion 55 calculates revised theoretical spectral reflectance R ' (λ) by take advantage of spectral transmission T (λ) with theoretical spectral reflectance R (λ).
Fig. 7 is at the view of conceptual illustration with spectral transmission revised theory spectral reflectance.Theoretical spectral reflectance before the solid line of upside figure is represented to revise among this figure, dotted line is represented revised theoretical spectral reflectance.As mentioned above, have transmissivity in the spectral transmission and be almost the rake that 100% top, horizontal portion and transmissivity are passed from 0% to 100%, in the wavelength region may corresponding with top, horizontal portion, theoretical spectral reflectance almost is identical value with revised theoretical spectral reflectance.On the other hand, in the wavelength region may corresponding with the rake of spectral transmission, revised theoretical spectral reflectance with revise before compare, descend corresponding to the value of spectral transmission.Correction portion 55 is carried out such correction to each a plurality of theoretical spectral reflectance of obtaining according to the transparent membrane of different thickness, calculates a plurality of revised theoretical spectral reflectances.Because transmissivity is that wavelength region may 70% or more is as the mensuration wavelength region may that is used to measure thickness, so be about 30% by the maximal value of correction rate of descent in the selected spectral transmission of present embodiment.
Then, enter into step S6, thickness calculating part 56 calculates the thickness of the color filter that becomes determination object by more revised theoretical spectral reflectance and actual measurement spectral reflectance.Specifically, at first, thickness calculating part 56 calculates the actual measurement spectral reflectance measured according to following formula 2 and is the difference D (d) of revised theoretical spectral reflectance of the transparent membrane of d for thickness in step S4.
Formula 2:
D(d)＝∫{R′(λ、d)-S(λ)}
2dλ
In formula 2, R ' (λ, d) is to be the value of revised theoretical spectral reflectance of wavelength X of the transparent membrane of d at thickness, and S (λ) is the value of the actual measurement spectral reflectance of wavelength X.The limit of integration of formula 2 is mensuration wavelength region may of selecting in step S3 according to above-mentioned spectral transmission.In addition also can with calculate absolute value replace calculating R ' (λ, d) and S (λ) difference square.Thickness calculating part 56 calculates each and the difference of actual measurement spectral reflectance in a plurality of revised theoretical spectral reflectance of different relatively thickness transparent membranes according to formula 2.
Then, it is minimum film thickness value that a plurality of difference values that 56 pairs of thickness calculating parts obtain are as described above obtained difference with curve fitting method, the thickness of this film thickness value as the color filter of determination object.Specifically, thickness calculating part 56 is the thickness of the film thickness value of the minimum value of expression actual measurement spectral reflectance with at each the difference approximation quafric curve in a plurality of revised theoretical spectral reflectance of the transparent membrane of different thickness time the as the color filter of determination object.
Fig. 8 is the view that is used to measure the approximate quafric curve of thickness in conceptive expression.In the example of Fig. 8, by making the actual measurement spectral reflectance and being d at thickness
1～d
5The a plurality of revised theoretical spectral reflectance of transparent membrane in each difference D (d
1)～D (d
5) for approximate quafric curve, obtain lowest difference score value D
Min, calculate and this lowest difference score value D
MinCorresponding film thickness value d
xAnd thickness calculating part 56 is this film thickness value d
xThickness as the color filter of determination object.The film thickness value that calculates is presented on the CRT61 as measurement result, and as required from printer 62 outputs.
As mentioned above, in the first embodiment relatively by the spectral transmission correction the revised theoretical spectral reflectance and the actual measurement spectral reflectance of theoretical spectral reflectance, the thickness that carries out the color filter of determination object calculates.As described above, the light of a color filter selective permeation particular wavelength region, under the identical condition of film thickness value, be almost in transmissivity that theoretical spectral reflectance is consistent with the actual measurement spectral reflectance in the wavelength region may of 100% top, horizontal portion, but in the wavelength region may beyond it, along with the decline of transmissivity, the deviation of theoretical spectral reflectance and actual measurement spectral reflectance becomes big.Be almost in transmissivity promptly that the difference of theoretical spectral reflectance and actual measurement spectral reflectance is correct in the wavelength region may of 100% top, horizontal portion, and, comprise a lot of errors in the difference of theoretical spectral reflectance in this wavelength region may and actual measurement spectral reflectance along with the decline of transmissivity.Thereby, in order to reduce such error, preferably as far as possible only transmissivity is almost 100% top, horizontal portion as measuring wavelength region may.On the other hand, in order to improve the precision of the curve fitting method that is used to calculate thickness, preferably enlarge as far as possible and measure wavelength region may and the difference of theory of computation spectral reflectance and actual measurement spectral reflectance.Particularly when the thickness of color filter approaches,, make as far as possible and measure the emphasis that wavelength region may enlarges becomes the precision that improves curve fitting method for the waveform steady (low frequency waveform) that makes spectral reflectance.
In the first embodiment, by with spectral transmission revised theory spectral reflectance, satisfy two requirements of mutual contradiction as described above.As long as promptly carry out the correction that theoretical spectral reflectance is taken advantage of spectral transmission, in the wavelength region may of carrying out this correction, just can eliminate the deviation of theoretical spectral reflectance and actual measurement spectral reflectance, the error that comprises both difference reduces significantly, and can set the mensuration wavelength region may above top, horizontal portion widelyr.As a result, the precision that is used to calculate the curve fitting method of thickness uprises, and can more correctly carry out determining film thickness.
If be described in further detail, added the theoretical spectral reflectance of spectral transmission by use, even the transparent membrane of the light of the such selective permeation particular wavelength region of color filter also can correctly be measured its thickness.Particularly when the thickness attenuation of color filter, can set extensivelyr measuring wavelength region may, so can improve the precision of the curve fitting method that is used to calculate thickness.
2. second embodiment
Below, second embodiment of the present invention is described.The apparatus structure of the determining film thickness device of second embodiment and Fig. 1, first embodiment shown in Figure 2 identical, the processing sequence of film thickness measuring method is also roughly identical with first embodiment.The difference of second embodiment and first embodiment is when calculating the thickness of color filter, and the difference of theoretical spectral reflectance and actual measurement spectral reflectance is carried out weighting corresponding to spectral transmission.
In second embodiment, when measuring the thickness of color filter, also carry out the identical processing of step S1～S5 with above-mentioned Fig. 3.Enter into step S6 afterwards, thickness calculating part 56 calculates the thickness of the color filter that becomes determination object, but at this moment carries out the weighting corresponding to spectral transmission by more revised theoretical spectral reflectance and actual measurement spectral reflectance.Specifically, thickness calculating part 56 according to following formula 3 calculate the actual measurement spectral reflectance with at thickness be theoretical spectral reflectance after the correction of transparent membrane of d weighted difference D ' (d).
Formula 3:
D′(d)＝∫T(λ){R′(λ、d)-S(λ)}
2dλ
In formula 3, R ' (λ, d) is to be the value of theoretical spectral reflectance after the correction of wavelength X of transparent membrane of d at thickness, and S (λ) is the value of the actual measurement spectral reflectance of wavelength X, and T (λ) is the value of the spectral transmission of wavelength X.As mentioned above, spectral transmission T (λ) is to be the value of 1 normalization with transmissivity 100%.In addition, the limit of integration of formula 3 is mensuration wavelength region may selected in step S3.
According to formula 3, thickness calculating part 56 carries out integration to the value that square further is multiplied by spectral transmission T (λ) of revising back theoretical spectral reflectance R ' (λ, d) and surveying the difference of spectral reflectance S (λ).Because spectral transmission T (λ) is to be the value of 1 normalization with transmissivity 100%, so in formula 3, the difference value of revising back theoretical spectral reflectance R ' (λ, d) and actual measurement spectral reflectance S (λ) is weighted, make that spectral transmission T (λ) is high more, weighting is big more.Promptly the difference of the wavelength region may that the rake of passing the differential ratio that almost becomes the corresponding wavelength region may of 100% top, horizontal portion with transmissivity and the transmissivity from 0% to 100% is corresponding is increased the weight of to estimate.In addition, identical with above-mentioned first embodiment, thickness calculating part 56 calculates a plurality of each of the theoretical spectral reflectance in back and weighted differences of actual measurement spectral reflectance revised at the transparent membrane of different thickness according to formula 3.
A plurality of weighted difference score values that 56 pairs of thickness calculating parts obtain as described above use curve fitting method to obtain the film thickness value of difference minimum, the thickness of this film thickness value as the color filter of determination object.Promptly the same with above-mentioned first embodiment, the film thickness value of the minimum value when expression a plurality of weighted differences that will obtain are approximately quafric curve is as the thickness of the color filter of determination object.
In second embodiment, the difference value of revising theoretical spectral reflectance in back and actual measurement spectral reflectance is weighted, make spectral transmission high more, weighting is big more.If it is such to make first embodiment, just can significantly be reduced in the error of the difference that comprises theoretical spectral reflectance and actual measurement spectral reflectance in the wavelength region may of transmissivity step-down in the spectral transmission, however, still be almost the theoretical spectral reflectance in the wavelength region may of 100% top, horizontal portion and the difference reliability height of actual measurement spectral reflectance in transmissivity.Therefore, in second embodiment, estimate the high difference of such reliability emphatically.Simultaneously, the difference evaluation that transmissivity descends, reliability is low is low more.If it is such to make second embodiment, the precision that is used to calculate the curve fitting method of thickness can further uprise, even the transparent membrane of the light of the such selective permeation particular wavelength region of color filter also can more correctly be measured its thickness.
3. variation
More than embodiments of the present invention are illustrated, and the present invention is not limited to above-mentioned example.For example in the respective embodiments described above, be with in a plurality of theoretical spectral reflectances of spectral transmission correction each, but also can replace it and with spectral transmission correction actual measurement spectral reflectance.Specifically, correction portion 55 calculates correction back actual measurement spectral reflectance by remove the actual measurement spectral reflectance with spectral transmission.Thickness calculating part 56 is surveyed the thickness that spectral reflectance calculates the color filter that becomes determination object by more theoretical spectral reflectance with after revising afterwards.At this moment comparative approach is identical with above-mentioned embodiment.The error of the difference that comprises theoretical spectral reflectance and actual measurement spectral reflectance is significantly reduced, and the precision that is used in the curve fitting method of calculating thickness uprises, and can more correctly carry out the mensuration of thickness.
Promptly need only with the either party in spectral transmission revised theory spectral reflectance or the actual measurement spectral reflectance, the theoretical spectral reflectance that becomes big along with the decline of the transmissivity of color filter and the deviation of actual measurement spectral reflectance are eliminated, the error of the difference that comprises theoretical spectral reflectance and actual measurement spectral reflectance is reduced, even the transparent membrane of the light of the such selective permeation particular wavelength region of color filter also can correctly be measured its thickness.
In the above-described embodiment, obtain spectral transmission and theoretical reflectivity respectively and revise, if but the kind of color filter is known, its spectral transmission and theoretical spectral reflectance are obtained, and then also can be stored in theoretical spectral reflectance after the correction with the spectral transmission correction in advance in the disk 54.
Measure the thickness of color filter in the above-described embodiment, but be not limited to color filter, in the visible region, when measuring the thickness of the uneven transparent membrane of transmissivity, also can use technology of the present invention.
As the use-case that makes of the present invention, can list as thickness that in the manufacturing process of colored CCD, is determined at the color filter that forms on the semiconductor substrate and the thickness that in the manufacturing process of projector, is determined at the color filter that forms on the liquid crystal glass base etc.
Claims (10)
1, a kind of film thickness measuring method is measured the thickness of described transparent membrane according to the spectral reflectance that the sample irradiates light that has formed transparent membrane on substrate is obtained, and it is characterized in that, comprising:
Spectral transmission obtains operation, obtains the spectral transmission of described transparent membrane;
Spectral reflectance is measured operation, to described sample irradiates light, and will survey spectral reflectance from the reflected light beam split of described sample reflection;
Revise operation, by described spectral transmission correction as the spectral reflectance of the sample that on substrate, has formed transparent membrane and in advance fixed theoretical spectral reflectance with regulation thickness;
The thickness calculation process, theoretical spectral reflectance and measure the actual measurement spectral reflectance of measuring in the operation at described spectral reflectance after the correction of relatively revising in described correction operation calculates the thickness of the transparent membrane of determination object.
2, film thickness measuring method as claimed in claim 1, it is characterized in that, described thickness calculation process carries out the weighting corresponding to described spectral transmission, more describedly revises the theoretical spectral reflectance in back and described actual measurement spectral reflectance and calculates the thickness of the transparent membrane of determination object.
3, film thickness measuring method as claimed in claim 1 or 2 is characterized in that, the wavelength region may that also comprises the transmissivity more than the defined threshold that will have in the described spectral transmission is as the mensuration wavelength region may of described thickness calculation process and the operation of selecting.
4, a kind of film thickness measuring method is measured the thickness of described transparent membrane according to the spectral reflectance that the sample irradiates light that has formed transparent membrane on substrate is obtained, and it is characterized in that, comprising:
Spectral transmission obtains operation, obtains the spectral transmission of described transparent membrane;
Spectral reflectance is measured operation, to described sample irradiates light, and will survey spectral reflectance from the reflected light beam split of described sample reflection;
Revise operation, will measure the actual measurement spectral reflectance of measuring in the operation at described spectral reflectance and revise by described spectral transmission;
The thickness calculation process relatively calculates the thickness of the transparent membrane of determination object as actual measurement spectral reflectance at the spectral reflectance of the sample that has formed the transparent membrane with regulation thickness on the substrate and after in advance fixed theoretical spectral reflectance and the correction revised in described correction operation.
5, a kind of determining film thickness device is measured the thickness of described transparent membrane according to the spectral reflectance that the sample irradiates light that has formed transparent membrane on substrate is obtained, and it is characterized in that, comprising:
First memory storage, it stores the spectral transmission of described transparent membrane;
Second memory storage, its storage are as the spectral reflectance of sample that has formed the transparent membrane with regulation thickness on substrate and in advance fixed theoretical spectral reflectance;
Light source, it is to the sample irradiates light of determination object;
The spectral reflectance determinator, it will carry out beam split from the reflected light that described light source irradiation light and the sample by determination object reflect and measure spectral reflectance;
Correcting device, it revises described theoretical spectral reflectance by described spectral transmission;
The thickness calculation element, theoretical spectral reflectance and the actual measurement spectral reflectance by described spectral reflectance determinator mensuration after its correction of relatively revising in described correcting device calculate the thickness of the transparent membrane of determination object.
6, determining film thickness device as claimed in claim 5 is characterized in that, described second memory device stores is corresponding to a plurality of theoretical spectral reflectance of the transparent membrane of different thickness,
Multiply by described spectral transmission on described correcting device each in described a plurality of theoretical spectral reflectances and calculate the theoretical spectral reflectance in a plurality of corrections back,
Described thickness calculation element is obtained described a plurality of each of the theoretical spectral reflectance in back and difference of described actual measurement spectral reflectance revised, and the film thickness value of the minimum value when expression is made a plurality of difference approximation quafric curve that obtains is as the thickness of the transparent membrane of determination object.
7, determining film thickness device as claimed in claim 6, it is characterized in that, described thickness calculation element is weighted each of the theoretical spectral reflectance in described a plurality of corrections back and the difference of described actual measurement spectral reflectance, make the high more weighting of described spectral transmission big more, the film thickness value of the minimum value when making expression a plurality of weighted differences that obtain be similar to quafric curve is as the thickness of the transparent membrane of determination object.
8, as each described determining film thickness device in the claim 5 to 7, it is characterized in that, also comprise the wavelength region may selecting apparatus, its wavelength region may with the transmissivity more than the defined threshold in described spectral transmission when calculating thickness the mensuration wavelength region may and select.
9, a kind of determining film thickness device is measured the thickness of described transparent membrane according to the spectral reflectance that the sample irradiates light that has formed transparent membrane on substrate is obtained, and it is characterized in that, comprising:
First memory storage, it stores the spectral transmission of described transparent membrane;
Second memory storage, its storage are as the spectral reflectance of sample that has formed the transparent membrane with regulation thickness on substrate and in advance fixed theoretical spectral reflectance;
Light source, it is to the sample irradiates light of determination object;
The spectral reflectance determinator, it will carry out beam split from the reflected light that described light source irradiation light and the sample by determination object reflect and measure spectral reflectance;
Correcting device, it will be revised by described spectral transmission by the actual measurement spectral reflectance that described spectral reflectance determinator is measured;
The thickness calculation element, actual measurement spectral reflectance and described theoretical spectral reflectance after its correction of relatively in described correcting device, revising and calculate the thickness of the transparent membrane of determination object.
10, a kind of determining film thickness device is measured the thickness of described transparent membrane according to the spectral reflectance that the sample irradiates light that has formed transparent membrane on substrate is obtained, and it is characterized in that, comprising:
First light source, its film to described sample forms the face irradiates light;
Secondary light source, it forms the opposite sides irradiates light of face to the described film of described sample;
Light-dividing device, its transmitted light that will see through described substrate and described transparent membrane from described secondary light source irradiation carries out beam split, measure the spectral transmission of described transparent membrane, simultaneously will be and carry out beam split by the reflected light of described sample reflection from described first light source irradiation, measure spectral reflectance;
Memory storage, its storage are as the spectral reflectance of sample that has formed the transparent membrane with regulation thickness on substrate and in advance fixed theoretical spectral reflectance;
Correcting device, its described theoretical spectral reflectance of described spectral transmission correction by measuring by described light-dividing device;
The thickness calculation element, theoretical spectral reflectance and the actual measurement spectral reflectance of being measured by described light-dividing device after its correction of relatively revising in described correcting device calculate the thickness of the transparent membrane of determination object.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004060867 | 2004-03-04 | ||
| JP2004060867A JP4216209B2 (en) | 2004-03-04 | 2004-03-04 | Film thickness measuring method and apparatus |
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| Publication Number | Publication Date |
|---|---|
| CN1664493A true CN1664493A (en) | 2005-09-07 |
| CN100392349C CN100392349C (en) | 2008-06-04 |
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|---|---|---|---|
| CNB2004101007540A Expired - Fee Related CN100392349C (en) | 2004-03-04 | 2004-12-13 | Method and device for testing deep of film |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP4216209B2 (en) |
| KR (1) | KR100624542B1 (en) |
| CN (1) | CN100392349C (en) |
| TW (1) | TWI275772B (en) |
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| CN111279147A (en) * | 2017-11-01 | 2020-06-12 | 柯尼卡美能达株式会社 | Film thickness measuring method, film thickness measuring system, method for manufacturing light reflecting film, and system for manufacturing light reflecting film |
| CN108180846A (en) * | 2017-11-30 | 2018-06-19 | 广州兴森快捷电路科技有限公司 | Organic guarantor welds the process control method of film and film thickness acquisition methods |
| CN108180846B (en) * | 2017-11-30 | 2020-11-17 | 广州兴森快捷电路科技有限公司 | Process control method and film thickness obtaining method of organic solderability preservative film |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2005249602A (en) | 2005-09-15 |
| CN100392349C (en) | 2008-06-04 |
| JP4216209B2 (en) | 2009-01-28 |
| KR100624542B1 (en) | 2006-09-19 |
| KR20060041959A (en) | 2006-05-12 |
| TW200532164A (en) | 2005-10-01 |
| TWI275772B (en) | 2007-03-11 |
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