CN1656251A - Mcral涂层 - Google Patents
Mcral涂层 Download PDFInfo
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- CN1656251A CN1656251A CNA03811870XA CN03811870A CN1656251A CN 1656251 A CN1656251 A CN 1656251A CN A03811870X A CNA03811870X A CN A03811870XA CN 03811870 A CN03811870 A CN 03811870A CN 1656251 A CN1656251 A CN 1656251A
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- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical compound [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims abstract description 15
- 239000000919 ceramic Substances 0.000 claims abstract description 6
- 229910052742 iron Inorganic materials 0.000 claims abstract description 4
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 4
- 239000011248 coating agent Substances 0.000 claims description 74
- 238000000576 coating method Methods 0.000 claims description 74
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 21
- 239000000654 additive Substances 0.000 claims description 12
- 230000000996 additive effect Effects 0.000 claims description 12
- 229910052757 nitrogen Inorganic materials 0.000 claims description 11
- 239000000956 alloy Substances 0.000 claims description 10
- 229910045601 alloy Inorganic materials 0.000 claims description 10
- 229910052735 hafnium Inorganic materials 0.000 claims description 8
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 claims description 8
- 229910052727 yttrium Inorganic materials 0.000 claims description 8
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 claims description 8
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 7
- 229910052799 carbon Inorganic materials 0.000 claims description 7
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 7
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 6
- 229910052782 aluminium Inorganic materials 0.000 claims description 6
- 238000009413 insulation Methods 0.000 claims description 6
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims description 5
- 239000004411 aluminium Substances 0.000 claims description 5
- 229910052726 zirconium Inorganic materials 0.000 claims description 5
- 229910052746 lanthanum Inorganic materials 0.000 claims description 4
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 claims description 4
- 229910052715 tantalum Inorganic materials 0.000 claims description 4
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 4
- 229910052706 scandium Inorganic materials 0.000 claims description 3
- SIXSYDAISGFNSX-UHFFFAOYSA-N scandium atom Chemical compound [Sc] SIXSYDAISGFNSX-UHFFFAOYSA-N 0.000 claims description 3
- 229910052710 silicon Inorganic materials 0.000 claims description 3
- 239000010703 silicon Substances 0.000 claims description 3
- 229910052684 Cerium Inorganic materials 0.000 claims description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 2
- 238000006243 chemical reaction Methods 0.000 claims description 2
- 229910052804 chromium Inorganic materials 0.000 claims description 2
- 239000011651 chromium Substances 0.000 claims description 2
- 229910017052 cobalt Inorganic materials 0.000 claims description 2
- 239000010941 cobalt Substances 0.000 claims description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 2
- 229910052702 rhenium Inorganic materials 0.000 claims description 2
- WUAPFZMCVAUBPE-UHFFFAOYSA-N rhenium atom Chemical compound [Re] WUAPFZMCVAUBPE-UHFFFAOYSA-N 0.000 claims description 2
- 238000007669 thermal treatment Methods 0.000 claims description 2
- 239000010936 titanium Substances 0.000 claims description 2
- 229910052719 titanium Inorganic materials 0.000 claims description 2
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 claims 1
- 230000001590 oxidative effect Effects 0.000 claims 1
- 230000003647 oxidation Effects 0.000 abstract description 5
- 238000007254 oxidation reaction Methods 0.000 abstract description 5
- 239000000203 mixture Substances 0.000 abstract description 3
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 abstract description 3
- 239000010410 layer Substances 0.000 description 24
- 150000004767 nitrides Chemical class 0.000 description 7
- 239000007789 gas Substances 0.000 description 6
- 229910000943 NiAl Inorganic materials 0.000 description 5
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 4
- 230000035882 stress Effects 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 3
- 230000007797 corrosion Effects 0.000 description 3
- 238000005260 corrosion Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 239000003963 antioxidant agent Substances 0.000 description 2
- 230000003078 antioxidant effect Effects 0.000 description 2
- 235000006708 antioxidants Nutrition 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- 238000001556 precipitation Methods 0.000 description 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical group [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 239000012159 carrier gas Substances 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- ZMIGMASIKSOYAM-UHFFFAOYSA-N cerium Chemical compound [Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce] ZMIGMASIKSOYAM-UHFFFAOYSA-N 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000005536 corrosion prevention Methods 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 238000009533 lab test Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 150000002829 nitrogen Chemical class 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
- 230000003245 working effect Effects 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C30/00—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/32—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
- C23C28/321—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer with at least one metal alloy layer
- C23C28/3215—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer with at least one metal alloy layer at least one MCrAlX layer
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
- C23C28/345—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02T—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO TRANSPORTATION
- Y02T50/00—Aeronautics or air transport
- Y02T50/60—Efficient propulsion technologies, e.g. for aircraft
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12535—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.] with additional, spatially distinct nonmetal component
- Y10T428/12583—Component contains compound of adjacent metal
- Y10T428/1259—Oxide
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12535—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.] with additional, spatially distinct nonmetal component
- Y10T428/12611—Oxide-containing component
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12771—Transition metal-base component
- Y10T428/12861—Group VIII or IB metal-base component
- Y10T428/12944—Ni-base component
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- Materials Engineering (AREA)
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- Organic Chemistry (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
- Coating By Spraying Or Casting (AREA)
Abstract
现有技术中的MCrAl涂层中，热生长的氧化铝层(TGO)常常会由于热诱导产生的应力而剥落，这样就明显会降低陶瓷绝热层的氧化能力或粘结性。本发明的MCrAl涂层是这样设计，即其上形成的TGO是多微孔性并因此能耐受膨胀。TGO中的微孔性可以通过向MCrAl涂层中有目的地添加元素而确保。
Description
本发明涉及一种用于耐高温部件，特别是用于涡轮叶片，特别是用于燃气涡轮的MCrAl涂层。
能在高温下使用的金属元件，在许多技术领域内必须通过涂层体系以防止工作气氛的氧化、腐蚀和/或老化作用。对于燃气涡轮机，即飞机发动机和工业用固定式燃气涡轮机领域来说，多年来现有技术中通过涂覆MCrAl(M＝Fe，Co，Ni)或β-NiAl型涂层来保护高温元件的降解作用。
MCrAl涂层通常是借助真空喷涂或空气等离子体喷涂而涂覆到金属高温元件上。
而β-NiAl涂层则通过渗铝法而涂覆。
根据各个元件和各种工作条件的不同，可以将这种保护涂层不仅用作单纯(rein)的抗氧化涂层和抗腐蚀涂层，而且也可以以粘结介质层的形式用于陶瓷隔热层，例如用在氧化锆基质上。
在上述的两种应用场合中，涂层体系的保护作用是基于能于较高的工作温度下在这些层上形成的氧化铝层。为获得较小的生长速率和较好的氧化铝层粘结性，MCrAl涂层和β-NiAl涂层通常含有较少量的亲氧元素，特别是钇。
为保证在长时间使用期内也能形成氧化铝，涂层体系中的铝含量就必须足够的高。对于β-NiAl涂层通常为约25-30wt％，而MCrAl涂层则含有约8-14wt％的铝。较之β-NiAl涂层，MCrAl涂层具有如下优点，即它的脆性较小并且在含硫的工作气体中更耐腐蚀。
基于实验室试验和工作经验表明，MCrAl涂层安全性的长效性质和功能取决于在高工作温度下形成于表面上的氧化铝基质上的热生长的氧化物层(TGO)的粘附性。不仅是在使用MCrAl涂层对金属元件进行抗氧化和腐蚀防护时，而且特别地也在将其用作陶瓷绝热层的粘结介质层时，存在这种情况。
TGO粘附问题主要在于如下事实，即在涂层有MCrAl的元件进行冷却时，在TGO内和在TGO附近区域内均会产生因热诱发的应力，而该应力的产生则要归因于氧化铝基质上MCrAl涂层与TGO之间在热膨胀系数方面存在着差异。如果在长期使用时，在TGO和MCrAl涂层之间的界面相邻区形成生长限制性裂缝，则热诱导的应力会导致TGO剥落。
如果使用MCrAl材料作为金属元件的单纯的抗氧化和抗腐蚀层，则TGO经常剥落和由此新形生成的氧化层会加速形成覆盖层的元素铝的消耗，并因此而导致MCrAl涂层使用寿命的缩短。
如果使用MCrAl涂层作为用于陶瓷绝热层的粘结介质层，则直接发生TGO的剥落，并因此而使绝热层发生灾难性的损毁。
目前企图，在含有约8wt％较低含量的铝的MCrAl涂层上镀铂能获得一种与陶瓷啮合得很好的涂层结构。但这就意味着需要再涂覆一层。
US-PS5741556中揭示了一种含有钇的MCrAl涂层，其中，在制备涂层时要使用氮气作为惰性气体。
US-PS5981091中揭示了一种MCrAl涂层，该涂层中含有铪、钇、碳和氮。但是在该绝热层体系中要将一富集有铂的层涂覆到MCrAl层上。
US-PS4774149中公开了一种含有铪、钇且粉末中还有一定氮含量的MCrAl涂层，但是该氮含量是不希望有的并应降低至最小值。
US-PS5780171中公开了一种含有铪和钇的MCrAl涂层，其中，在生产涂层时使用氮气作为载气。
US-PS5652028中公开了一种组成为NiCoCrAl的MCrAl涂层。
WO99/23270公开了一种添加有镧和铪的MCrAl涂层。
GB2243161A中公开了一种添加有锆、硅、钽、铪、钇、钪或镧的MCrAl涂层。
US-PS5141821公开了一种MCrAl涂层，其中包含有碳化物颗粒以改善涂层的研磨性。此外，MCrAl涂层还可以含有锆、铪和钽。
因此本发明的任务是一种MCrAl涂层，且在该涂层中不发生氧化铝涂层的剥落或只会在极小程度内发生。
该任务可以通过如权利要求1和2中所述的MCrAl涂层来解决。
在下附的权利要求中列举了MCrAl层的有利安排。
本发明基于如下知识，通过TGO的微孔性对TGO在MCrAl涂层上的粘结性有积极的影响。
其中，存在于TGO中的微孔应具有10至500nm的直径。孔距为30至600nm，并且孔距随着孔径增大而增大。
微孔的积极影响是基于以下事实，即在冷却时产生的热应力会由于在氧化铝层的微观区域中发生的膨胀而降低。而在高密度的TGO’s中这是不可能发生的，因为已经是最小值的膨胀，会导致灾难性的裂缝生长并因此造成TGO的剥落。
因此微孔性TGO’s与高密度TGO’s相比，其更能容许膨胀并且更适于降低热诱导产生的应力。
所使用的MCrAl涂层可以是例如NiCoCrAl涂层，并且具有如下浓度的相当于现有技术中的主要合金元素：
10至82wt％的钴，
10至35wt％的铬，
8至14wt％的铝，
其余为镍和其他一些任选的合金添加物。
对于该组合物或是其他一些组合物来说，这些合金添加物是例如硅(至多2wt％)，铼(0.3至5wt％)和钽(至多8wt％)。
为了以优选的方式在TGO’s中得到微孔性，MCrAl涂层中还必须具有选自下组I，II和III中的各至少一个元素的添加物：
组I：至少一种亲氧的元素，即能形成热力学很稳定的氧化物的元素，它选自钇、铈、钪、镧或其他镧系元素；
这些元素的总浓度在0.02至1wt％，优选0.05至0.5wt％的范围内。
组II：至少一种选自如下的元素，即铪、锆和钛，因为这些元素能与氮和碳形成热力学很稳定的化合物(氮化物和碳化物)；
这些元素的总浓度在0.02至1wt％，优选0.05至0.3wt％的范围内。
组III：碳和/或氮，其中碳和氮的总浓度为0.005至0.2wt％，优选0.01至0.1wt％。
如果对实施例是通过选自上述三组的元素的必要组合，则就能实现以下目的：通过添加一种或多种选自组I的元素可以大大改善氧化铝层在现有技术的MCrAl涂层上的粘结性。
选自组II的元素同样是很亲氧的元素，但它们同时会形成很稳定的氮化物和碳化物。由于MCrAl涂层不仅含有选自组I并且含有选自组II的元素添加物，这样组I的元素会优先被氧化。而组II的元素则优先和存在于MCrAl涂层中的碳和/或氮反应，并因此而形成很精细的碳化物和/或氮化物的析出物。
如果不添加组I的元素，则组II的元素优先和氧气反应，因为这些元素的相关氧化物比各碳化物、氮化物或碳氮化物具有更高的热力学稳定性。通过这些氧化物的生成会消耗掉选自组II的元素，从而使得不生成碳化物和氮化物。
由于MCrAl涂层含有选自全部三个组的添加物，所以当高温下使用或当在先的热处理时，组II的元素能与碳和/或氮以碳化物、氮化物和/或碳氮化物形式生成，直径一般为10至900nm的细小沉淀。当有目的地进行预氧化过程时，即在涂覆MCrAl粘结介质层和陶瓷绝热层之前，存在于MCrAl层的近表面区域内的细小沉淀会被向内生长的氧化铝层所包裹。在涂层进一步生长时，被包裹的碳化物和/或氮化物或碳氮化物由于氧偏压的局部升高而氧化。
使体积的变化和气体的释放相结合。这两个过程在氧化铝层(TGO)内会生成很细小的且直径为10至800nm的微孔和长度为10至600nm的微小裂缝。
以这种技术和方法就能在MCrAl涂层的表面上形成一种具有微孔性的理想的耐膨胀的氧化铝层。
Claims (12)
1.一种MCrAl涂层，特别是用于涡轮叶片，其中M表示选自Fe，Co，Ni中之一的元素且其中氧化铝层设置在MCrAl涂层上，其特征在于氧化铝层是形成微孔。
2.一种MCrAl涂层，其中M表示选自元素Fe，Co，Ni中之一的元素，特别是用于涡轮叶片，其特征在于MCrAl涂层具有选自以下三组I，II和III中的各至少一种元素：
组I：钇、铈、钪、镧或其他镧系元素，其中总浓度在0.02至1wt％的范围内，
组II：铪、锆和钛，其中总浓度在0.02至1wt％的范围内，
组III：碳或氮，其中总浓度为0.005至0.2wt％。
3.如权利要求2的MCrAl涂层，其特征在于选自组I的元素总浓度在0.05至0.5wt％的范围内。
4.如权利要求2的MCrAl涂层，其特征在于选自组II的元素总浓度在0.05至0.3wt％的范围内。
5.如权利要求2的MCrAl涂层，其特征在于选自组III的元素总浓度在0.01至0.1wt％的范围内。
6.如权利要求1或2的MCrAl涂层，其特征在于MCrAl涂层为NiCoCrAl涂层。
7.如权利要求1或2的MCrAl涂层，其特征在于MCrAl涂层具有以下组分：
10至82wt％的钴，
10至35wt％的铬，
8至14wt％的铝，
可任选的其它合金添加物
其余为镍。
8.如权利要求1或7的MCrAl涂层，其特征在于MCrAl涂层具有其他合金添加物，并且作为其他合金添加物有至多2wt％的硅。
9.如权利要求1或7的MCrAl涂层，其特征在于MCrAl涂层具有其他合金添加物，并且MCrAl涂层具有作为其他合金添加物的0.3至5wt％的铼。
10.如权利要求1或7的MCrAl涂层，其特征在于MCrAl涂层具有其他合金添加物，并且在MCrAl涂层中作为其他合金添加物有至多8wt％的钽。
11.如权利要求1或2的MCrAl涂层，其特征在于微孔性是在自身形成的氧化铝层中通过热处理和/或氧化反应而制得。
12.如权利要求1或2的MCrAl涂层，其特征在于在MCrAl涂层上设置一个陶瓷绝热层。
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP02011461.7 | 2002-05-24 | ||
| EP02011461A EP1365044A1 (de) | 2002-05-24 | 2002-05-24 | MCrAl-Schicht |
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| Publication Number | Publication Date |
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| CN1656251A true CN1656251A (zh) | 2005-08-17 |
| CN100497738C CN100497738C (zh) | 2009-06-10 |
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| Application Number | Title | Priority Date | Filing Date |
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| CNB03811870XA Expired - Fee Related CN100497738C (zh) | 2002-05-24 | 2003-05-21 | 用于涡轮叶片的涂层 |
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| Country | Link |
|---|---|
| US (1) | US7338719B2 (zh) |
| EP (3) | EP1365044A1 (zh) |
| JP (1) | JP3927574B2 (zh) |
| CN (1) | CN100497738C (zh) |
| WO (1) | WO2003100133A1 (zh) |
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| CN101611171B (zh) * | 2006-04-06 | 2012-11-28 | 西门子公司 | 具有高孔隙度的层状热障涂层和部件 |
| CN102947485A (zh) * | 2010-03-12 | 2013-02-27 | 斯奈克玛 | 制造热障保护的方法以及适于形成热障的多层涂层 |
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| JP4607530B2 (ja) * | 2004-09-28 | 2011-01-05 | 株式会社日立製作所 | 遮熱被覆を有する耐熱部材およびガスタービン |
| EP1780294A1 (de) * | 2005-10-25 | 2007-05-02 | Siemens Aktiengesellschaft | Legierung, Schutzschicht zum Schutz eines Bauteils gegen Korrosion und Oxidation bei hohen Temperaturen und Bauteil |
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| DE602006015904D1 (de) * | 2006-03-24 | 2010-09-16 | Forschungszentrum Juelich Gmbh | Component mit einer Schutzschicht |
| CN101139470B (zh) * | 2006-09-07 | 2012-04-18 | 梯西艾燃气轮机材料技术（上海）有限公司 | 一种燃气轮机热通道部件高温合金涂料 |
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| EP2115186A1 (en) * | 2007-02-26 | 2009-11-11 | Siemens Aktiengesellschaft | Component with a substrate and a protective layer |
| WO2009109199A1 (de) * | 2008-03-04 | 2009-09-11 | Siemens Aktiengesellschaft | Legierung, schutzschicht gegen hochtemperaturkorrosion und schichtsystem |
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- 2002-05-24 EP EP02011461A patent/EP1365044A1/de not_active Withdrawn
-
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- 2003-05-21 JP JP2004507570A patent/JP3927574B2/ja not_active Expired - Fee Related
- 2003-05-21 US US10/516,095 patent/US7338719B2/en not_active Expired - Fee Related
- 2003-05-21 EP EP03727493A patent/EP1507897A1/de not_active Withdrawn
- 2003-05-21 CN CNB03811870XA patent/CN100497738C/zh not_active Expired - Fee Related
- 2003-05-21 WO PCT/EP2003/005337 patent/WO2003100133A1/de active Application Filing
- 2003-05-21 EP EP10007167.9A patent/EP2251457B1/de not_active Expired - Lifetime
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101611171B (zh) * | 2006-04-06 | 2012-11-28 | 西门子公司 | 具有高孔隙度的层状热障涂层和部件 |
| CN101229699B (zh) * | 2007-01-25 | 2012-06-27 | 湖南科力远新能源股份有限公司 | 一种多孔金属载体及其制备方法 |
| CN102947485A (zh) * | 2010-03-12 | 2013-02-27 | 斯奈克玛 | 制造热障保护的方法以及适于形成热障的多层涂层 |
| CN102947485B (zh) * | 2010-03-12 | 2014-11-19 | 斯奈克玛 | 制造热障保护的方法以及适于形成热障的多层涂层 |
Also Published As
| Publication number | Publication date |
|---|---|
| EP1365044A1 (de) | 2003-11-26 |
| US20050164026A1 (en) | 2005-07-28 |
| CN100497738C (zh) | 2009-06-10 |
| WO2003100133A1 (de) | 2003-12-04 |
| EP1507897A1 (de) | 2005-02-23 |
| EP2251457B1 (de) | 2016-12-14 |
| JP3927574B2 (ja) | 2007-06-13 |
| JP2005534805A (ja) | 2005-11-17 |
| EP2251457A1 (de) | 2010-11-17 |
| US7338719B2 (en) | 2008-03-04 |
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