CN1649067A - Method for preparing anti-ion feedback film for preventing micro path plate from pollution - Google Patents
Method for preparing anti-ion feedback film for preventing micro path plate from pollution Download PDFInfo
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- CN1649067A CN1649067A CNA200410010839XA CN200410010839A CN1649067A CN 1649067 A CN1649067 A CN 1649067A CN A200410010839X A CNA200410010839X A CN A200410010839XA CN 200410010839 A CN200410010839 A CN 200410010839A CN 1649067 A CN1649067 A CN 1649067A
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
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Abstract
A preparation method of an anti-ion feedback film for preventing the pollution of micro-channel plates includes the preparation of self-carried organic film in de-ionized water spraying Al film by magnet control, adhering the Al film, oxidizing and stripping the organic film in a vacuum chamber. The adherence of Al film and input face of micro-channel plates is finished in gas glow-discharge which generates oxygen ions to oxidize the Al film to strip the organic film. Since the Al film is closely adhered to the input face of the micro-channel plate, it blocks the volatilized molecules in the process of resolving organic film carriers.
Description
One, technical field: the invention belongs to the preparation method that relate in the photoelectronic imaging technical field a kind of prevents to pollute the ion feedback preventing film of microchannel plate.
Two, technical background: photoelectronic imaging or photoelectric detector are partly to be made of photocathode, microchannel plate and phosphor screen (or collector) three in general.Photocathode receives exterior light information, the photoelectron of overflowing under its effect, the photoelectron that microchannel plate is overflowed photocathode is given multiplication and is strengthened, photoelectron quantity is increased severely and the energy enhancing, after phosphor screen (or collector) receives the electronics of microchannel plate ejaculation, give the demonstration of image or electronic information.The effect of microchannel plate in photoelectronic imaging or photoelectric detector is vital, and the quality of its performance, cleannes directly has influence on the quality of photoelectronic imaging or photoelectric detector image quality.
Photoelectronic imaging or photoelectric detector are when work, the cation that forms in microchannel plate high field intensity district feeds back in the process of photocathode, not only make microchannel plate be subjected to positive ion bombardment and produce the additional electron emission, and the cation that the gas molecule that can also excite the absorption of microchannel plate inwall is ionized to feeds back to photocathode, the photocathode structure is changed, sensitivity reduces, and working life shortens, and image background is degenerated.In order to address this problem, on the microchannel plate input face, attach one deck alundum (Al (Al
2O
3) ion feedback preventing film.In the technology of traditional fabrication ion feedback preventing film, make microchannel plate and rete be subjected to carbon contamination, cause photocathode to be subjected to carbon contamination when device dress group and operate as normal again, its sensitivity descends, therefore lifetime, proposes and employing prevents that microchannel plate is contaminated and exempts from dirty film build method and prevent that microchannel plate, photocathode from avoiding carbon contamination, guaranteed also that simultaneously photocathode avoids positive ion bombardment, prolonged useful life and improved background again.
On the microchannel plate input face, attach technology of preparing extremely insider's the concern always of one deck alundum (Al ion feedback preventing film.The prior art the most approaching with the present invention is a kind of preparation technology method that on microchannel plate input face attach alundum (Al ion feedback preventing film of Changchun University of Science and Technology in development in twenty end of the century.As shown in Figure 1, be included in the deionized water the organic film carrier 1 of preparation, the organic film carrier 2 of oven dry, sputtered aluminum film and oxidation 3 on organic film carrier, remove organic film carrier and finish pad pasting 4.
The organic film carrier 1 of preparation in deionized water: in filling the vessel of deionized water, placement is loaded with the support of microchannel plate, water layer thickness above the microchannel plate is greatly about 2mm, on the water surface, splash into an amount of organic membrane solution, organic membrane solution is drawn the water in the vessel with siphon pipe after the water surface progressively scatters, organic membrane is attached on the upper surface of microchannel plate, becomes organic film carrier of microchannel plate.
Dry organic film carrier 2: organic film carrier will be inserted in the drying baker with the microchannel plate of organic film carrier after doing naturally, and 60 ℃ are incubated 1-1.5 hour.
Sputtered aluminum film and oxidation 3 on organic film carrier: this process is to carry out in vacuum chamber, the microchannel plate tray deck that supports with organic film carrier is housed in vacuum chamber, make microchannel plate have the placed face down of organic membrane film carrier on support, the aluminium sheet target surface is placed in bottom at vacuum chamber, on the support organic film carrier facing under the aluminium sheet target surface, tray deck is as anode, the aluminium sheet target is as negative electrode, charge into argon gas in vacuum chamber, interpolar applies high direct voltage, produces glow discharge, the argon ion bombardment aluminium target that produces, the aluminium atomic deposition of sputter forms the aluminium film on organic film carrier, the thickness of aluminium film can be monitored.Finish after the sputtered aluminum film, extract argon gas out, make the vacuum degree in the vacuum chamber reach 3 * 10
-3Pa charges into oxygen again in vacuum chamber, kept 1.5-2 hour, makes aluminium film oxidation the becoming alundum (Al (Al that is splashed on organic film carrier
2O
3) film.
Remove organic film carrier and finish pad pasting 4: will be placed into vacuum chamber with the microchannel plate of organic film carrier and di-aluminium trioxide film, vacuum chamber being evacuated is 10 again
-2The high vacuum that Pa is above is heated 360 ℃-380 ℃, keeps 1 hour, and organic film carrier progressively decomposes volatilization, by the vacuum system eliminating, just di-aluminium trioxide film be attached on the input face of microchannel plate, as Fig. 15 shown in, finished attachment process.
The subject matter that this making ion feedback preventing film technology exists is: because microchannel plate is placed on and is formed with airborne film in the deionized water, in whole technical process, organic film carrier contacts all the time with microchannel plate, therefore, microchannel plate directly is subjected to organic film carrier and the especially pollution of carbon of analyte thereof, packing into causes the pollution of carbon to photocathode again behind the device, causes the decreased performance of microchannel plate and photocathode like this, thereby has a strong impact on the life-span and the effect of photoelectronic imaging and photoelectric detector.
Three, summary of the invention:
In order to overcome the shortcoming that above-mentioned prior art exists, the objective of the invention is to overcome the pollution of making in the ion feedback preventing film traditional handicraft process microchannel plate, a kind of new preparation of ad hoc meter and film coating process.
The technical problem to be solved in the present invention is: a kind of preparation method who prevents to pollute the ion feedback preventing film of microchannel plate is provided.The technical scheme of technical solution problem comprises the preparation 6 of organic film carrier of controlling oneself, sputtered aluminum film 7, Aluminium film paste film, oxidation and remove organic film carrier 8 on organic film carrier of controlling oneself as shown in Figure 2, specifically implements as follows:
The preparation 6 of self-holding organic film carrier, as shown in Figure 3, in deionized water, carry out, in vessel, put into deionized water, on the liquid level that splashes into deionized water that the organic membrane solution that stirs is an amount of, splash into an amount of organic membrane solution after waiting to scatter at once again, in the opportune moment of solidification process, the film carrier ring of will controlling oneself is put on it, the two is well sticked together, then, scrape decyclization limit organic membrane, and the self-holding film carrier ring that slowly will be loaded with organic membrane shifts out from deionized water, be strictly on guard against pollution, keep clean, put into baking oven and be warming up to 60 ℃, kept temperature 1-1.5 hour; Sputtered aluminum film (7) on organic film carrier of controlling oneself carries out in vacuum chamber, on the top of vacuum chamber, will be placed on the ring baffle through the self-holding film carrier ring that has organic film carrier that the back technical process is finished, and makes organic film carrier up; In the bottom of vacuum chamber, plane magnet is housed in the metallic channel, placement planar aluminum target on the magnet of plane, the aluminium target surface is relative with organic film carrier, and vacuum chamber is vacuumized, and vacuum degree reaches 4-5 * 10
-3Pa, charge into argon gas again, keep vacuum degree 2-3Pa, carry out magnetron sputtering, Current Control is about 90mA, the aluminium atomic deposition that sputters forms the aluminium film on organic film carrier, organic film carrier is the supporter of aluminium film, and the thickness monitoring of aluminium film is at 3-5nm, powered-down, taking-up is loaded with the self-holding film carrier ring of the duplicature of organic film carrier and aluminium film, and it is not contaminated to keep clean; The Aluminium film paste film, oxidation and remove organic film carrier (8), in vacuum chamber, carry out, insulation support device is housed in the vacuum chamber, its top is placed with cathode disc, place the self-holding film carrier ring that is loaded with organic film carrier and aluminium film on the film carrier ring pallet at middle part, the aluminium face is equipped with the adjustment height square position of fine adjustment height up and down, as anode down under them, microchannel plate keep flat on it and input face up, and aim at the aluminium film, regulate the adjustment height square position, make the two closely contact cathode and anode spacing be about 80mm, vacuum chamber is evacuated to 1-2Pa, charge into oxygen then to 6Pa, and keep balance, regulate discharge voltage to 600V left and right sides build-up of luminance, whole discharge process discharge voltage can not surpass 1000V, discharging current maintains about 10mA, and 5 minutes time, the film coating process process is finished in gas glow discharge, the aluminium film is attached to the input face of microchannel plate, the oxonium ion that glow discharge produces makes the oxidation of aluminium film, simultaneously, organic film carrier is decomposed and is removed.
Good effect of the present invention: because the aluminium film directly closely is attached to the microchannel plate input face, decompose in organic film carrier process in the gas glow discharge gasification, the organic film carrier molecule that decomposes volatilization is directly blocked by the aluminium film, get rid of by vacuum system, microchannel plate is not polluted, keep the cleannes of height, thereby prolonged the useful life of photoelectronic imaging or photoelectric detector greatly, also improved the image device image background.
Four, description of drawings
Fig. 1 is the conventional process flow schematic diagram, Fig. 2 is a technological process block-diagram of the present invention, Fig. 3 is vessel and the inner storage schematic diagram thereof that the preparation of self-holding organic film carrier among the present invention is adopted, Fig. 4 is the apparatus structure schematic diagram that adopts magnetic sputtered aluminum membrane process to adopt among the present invention, Fig. 5 is Aluminium film paste film, oxidation and remove the apparatus structure schematic diagram of organic film carrier process using among the present invention, and Figure of abstract also adopts Fig. 2.
Five, embodiment: the present invention implements by process flow diagram shown in Figure 2, organic film carrier preparation technology that controls oneself adopts vessel shown in Figure 3, the material of used self-holding film carrier ring adopts aluminium sheet, and physical dimension is set as required, the material selection guncotton preparation of organic film carrier solution; Adopt device shown in Figure 4 in the sputtered aluminum membrane process on organic film carrier of controlling oneself, the ring baffle material of placing the film carrier ring of controlling oneself adopts brass, and the material of metallic channel adopts brass, magnet to adopt the plane neodymium iron boron; Aluminium film paste film, oxidation and remove organic film carrier process using device shown in Figure 5, the material of film carrier ring pallet adopts four polyvinyl fluorides, and the material of adjustment height square position adopts brass, and the bracing or strutting arrangement material adopts glass tubing.
Claims (1)
1, a kind of preparation method who prevents to pollute the ion feedback preventing film of microchannel plate, be by preparing organic film carrier, sputtered aluminum film on organic film carrier, the Aluminium film paste film, oxidation and remove that organic film carrier technical process realizes, it is characterized in that the preparation (6) of self-holding organic film carrier, in deionized water, carry out, in vessel, put into deionized water, on the liquid level that splashes into deionized water that the organic membrane solution that stirs is an amount of, splash into an amount of organic membrane solution after waiting to scatter at once again, in the opportune moment of solidification process, the film carrier ring of will controlling oneself is put on it, the two is well sticked together, then, scrape decyclization limit organic membrane, and the self-holding film carrier ring that slowly will be loaded with organic membrane shifts out from deionized water, is strictly on guard against pollution, keeps clean, put into baking oven and be warming up to 60 ℃, kept temperature 1-1.5 hour; Sputtered aluminum film (7) on organic film carrier of controlling oneself carries out in vacuum chamber, on the top of vacuum chamber, will be placed on the ring baffle through the self-holding film carrier ring that has organic film carrier that the back technical process is finished, and makes organic film carrier up; In the bottom of vacuum chamber, plane magnet is housed in the metallic channel, placement planar aluminum target on the magnet of plane, the aluminium target surface is relative with organic film carrier, and vacuum chamber is vacuumized, and vacuum degree reaches 4-5 * 10
-3Pa, charge into argon gas again, keep vacuum degree 2-3Pa, carry out magnetron sputtering, Current Control is about 90mA, the aluminium atomic deposition that sputters forms the aluminium film on organic film carrier, organic film carrier is the supporter of aluminium film, and the thickness monitoring of aluminium film is at 3-5nm, powered-down, taking-up is loaded with the self-holding film carrier ring of the duplicature of organic film carrier and aluminium film, and it is not contaminated to keep clean; The Aluminium film paste film, oxidation and remove organic film carrier (8), in vacuum chamber, carry out, insulation support device is housed in the vacuum chamber, its top is placed with cathode disc, place the self-holding film carrier ring that is loaded with organic film carrier and aluminium film on the film carrier ring pallet at middle part, the aluminium face down, the adjustment height square position of fine adjustment height up and down is housed under them, as anode, microchannel plate keep flat on it and input face up, and aim at the aluminium film, regulate the adjustment height square position, make the two tight contact, cathode and anode spacing is about 80mm, vacuum chamber is evacuated to 1-2Pa, charge into oxygen then to 6Pa, and the maintenance balance, regulate discharge voltage to 600V left and right sides build-up of luminance, further be forced into complete build-up of luminance again, whole discharge process discharge voltage can not surpass 1000V, discharging current maintains about 10mA, and 5 minutes time, the film coating process process is finished in gas glow discharge, the aluminium film is attached to the input face of microchannel plate, the oxonium ion that glow discharge produces makes the oxidation of aluminium film, simultaneously, organic film carrier is decomposed and is removed.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB200410010839XA CN100517548C (en) | 2004-04-30 | 2004-04-30 | Method for preparing anti-ion feedback film for preventing micro path plate from pollution |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB200410010839XA CN100517548C (en) | 2004-04-30 | 2004-04-30 | Method for preparing anti-ion feedback film for preventing micro path plate from pollution |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1649067A true CN1649067A (en) | 2005-08-03 |
| CN100517548C CN100517548C (en) | 2009-07-22 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB200410010839XA Expired - Fee Related CN100517548C (en) | 2004-04-30 | 2004-04-30 | Method for preparing anti-ion feedback film for preventing micro path plate from pollution |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111613500A (en) * | 2020-06-03 | 2020-09-01 | 鲁东大学 | Preparation method of aluminum oxide ion feedback prevention film of microchannel plate |
| CN112420476A (en) * | 2020-10-30 | 2021-02-26 | 北方夜视技术股份有限公司 | Microchannel plate for near-contact photoelectric detector and preparation method thereof |
-
2004
- 2004-04-30 CN CNB200410010839XA patent/CN100517548C/en not_active Expired - Fee Related
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111613500A (en) * | 2020-06-03 | 2020-09-01 | 鲁东大学 | Preparation method of aluminum oxide ion feedback prevention film of microchannel plate |
| CN111613500B (en) * | 2020-06-03 | 2023-03-31 | 鲁东大学 | Preparation method of aluminum oxide ion feedback prevention film of microchannel plate |
| CN112420476A (en) * | 2020-10-30 | 2021-02-26 | 北方夜视技术股份有限公司 | Microchannel plate for near-contact photoelectric detector and preparation method thereof |
| CN112420476B (en) * | 2020-10-30 | 2022-04-22 | 北方夜视技术股份有限公司 | Microchannel plate for near-contact photoelectric detector and preparation method thereof |
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| Publication number | Publication date |
|---|---|
| CN100517548C (en) | 2009-07-22 |
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Granted publication date: 20090722 Termination date: 20100430 |