CN1634682A - Grinding liquid reusing device and system thereof - Google Patents
Grinding liquid reusing device and system thereof Download PDFInfo
- Publication number
- CN1634682A CN1634682A CN 200310122917 CN200310122917A CN1634682A CN 1634682 A CN1634682 A CN 1634682A CN 200310122917 CN200310122917 CN 200310122917 CN 200310122917 A CN200310122917 A CN 200310122917A CN 1634682 A CN1634682 A CN 1634682A
- Authority
- CN
- China
- Prior art keywords
- lapping liquid
- circulation line
- lapping
- filter element
- waste discharge
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Images
Abstract
This invention relates to a grinding recycle device and its system used in chemical and mechanic grinding process. The system comprises the following: grinding recycle pipes; at least one grinding liquid supply unit form the pipes; several grinding liquid recycle device connected to the grinding recycle pipes; several chemistry mechanic grinding units separately connected to the grinding liquid. The device comprises the recycled and filtered grind liquid recycle pump, waste liquid exhausted and drainage unit for waste gas.
Description
Technical field
The invention relates to a kind of lapping liquid re-use device and system thereof, particularly a kind of lapping liquid re-use device and system thereof that is applied to the cmp flow process.
Background technology
Increase along with the reduction of semiconductor subassembly live width and the number of plies, the planarization processing procedure has been indispensable, cmp (Chemical Machine Polishing, CMP) be the major technique of present planarization processing procedure, it utilizes grinding pad and lapping liquid, carries out machinery and removes dual grinding with chemical erosion, removes the material of crystal column surface, can allow product surface reach comprehensive planarization, in order to the carrying out of subsequent thin film deposition.
Also include filter element in the known cmp flow process, be before the cmp unit, to filter this lapping liquid, abrasive grains filtering with contained (settling) excessive, precipitation or caking (agglomeration) in the lapping liquid, with the stability (stability) that keeps this lapping liquid and continuity (consistency), avoid product in process of lapping by scratch.As shown in Figure 1, be the schematic flow sheet of known chemical-mechanical grinding liquid, lapping liquid imports filter element 11a, behind the excessive abrasive grains, is delivered to cmp unit 12a in this lapping liquid of filtering, product is carried out after the grinding of planarization and effluent discharge; When the automated production operation was carried out, the abrasive grains in this lapping liquid of the continuous filtering of this filter element 11a used to supply with this cmp unit 12a.
In the semiconductor factory for production operation smoothly and the board life-time dilatation, can to board regularly carry out " prevention and maintain " (Prevention Maintenance, PM), hereinafter to be referred as the PM operation; Generally speaking, the program of PM operation probably comprises the immersion of board (Chamber) unlatching, board wiping, spare part dismounting and wiping, pipe fitting dismounting and wiping, spare part and pipe fitting and cleaning, more renews spare part and board and restore.When this cmp unit 12a carries out the PM operation; this filter element 11a and this cmp unit 12a all need shut down the acceptance maintenance; be with; last time produced this lapping liquid having finished the filtration among this filter element 11a but be not sent to this cmp unit 12a as yet that is deposited in, and also all be eliminated and dispose according to the general flow of PM operation.Yet cleaning operation inconvenience that lapping liquid caused during the PM operation also can be elongated the time of PM operation and influences production capacity; In addition, it is on reality is used, and the lapping liquid that has filtered can be reused but and be eliminated, and is the wasting of resources of a certain degree; The most important thing is that the meaning of removing available lapping liquid another side representative is the environmental requirement that can't meet green processing procedure.
Summary of the invention
Main purpose of the present invention is to provide a kind of lapping liquid re-use device and system thereof, in the cmp processing procedure, can easyly carry out prevention and maintain.
Secondary objective of the present invention is to provide a kind of lapping liquid re-use device and system thereof, in the cmp processing procedure, can improve the utilization rate of this lapping liquid, avoids producing the wasting of resources and compliance with environmental protection requirements.
In order to reach above-mentioned purpose, the invention provides a kind of lapping liquid re-use device and system thereof, be applied to the cmp processing procedure, this system comprise lapping liquid circulation line, this lapping liquid circulation line of at least one connection lapping liquid feed unit, several lapping liquid re-use devices that connect this lapping liquid circulation line, and several connect the cmp unit of this lapping liquid re-use device respectively; Wherein this device comprises the recovery pump of the lapping liquid that recovery has been filtered and abandons the waste liquid of filtration discharge and the waste discharge unit of waste gas.
This lapping liquid that adopts said apparatus and system to reclaim smoothly to have filtered reaches the purpose that this lapping liquid utilizes again to this lapping liquid circulation line 2; Thereby clear up operation inconvenience and the time that this lapping liquid causes when reducing the PM operation; And this lapping liquid that has filtered can make full use of, and can reach reusable environmental requirement.
In order further to understand feature of the present invention and technology contents, see also following about detailed description of the present invention and accompanying drawing, yet appended graphic only provide with reference to and the explanation usefulness, be not to be used for this wound is limited.
Description of drawings
Fig. 1 is the schematic flow sheet of known chemical-mechanical grinding liquid;
Fig. 2 is the schematic flow sheet of lapping liquid re-use device of the present invention and system thereof; And
Fig. 3 is the structural representation of lapping liquid re-use device of the present invention and system thereof.
Known cmp flow process
Filter element 11a cmp unit 12a
Lapping liquid of the present invention utilizes system 1 again
Lapping liquid circulation line 2 lapping liquid feed units 3
Lapping liquid re-use device 4 chemical machineries grind unit 5
Body 41 lapping liquids inlet 411
Lapping liquid reclaims mouthful 412 a lapping liquids outlet 413
Waste discharge mouth 414 filter elements 42
Reclaim pump 43 waste discharge unit 44
451 No. two valves 452 of a valve
No. three valve 453 blast pipes 46
External treatment system 47
The specific embodiment
Please refer to shown in Figure 2, the invention provides a kind of lapping liquid and utilize system 1 again, be applied to the cmp processing procedure, this system comprise lapping liquid circulation line 2, this lapping liquid circulation line 2 of at least one connection lapping liquid feed unit 3, several lapping liquid re-use devices 4 that connect this lapping liquid circulation line 2, and several be arranged in the cmp unit 5 of this lapping liquid re-use device 4 respectively.
The present invention is in this cmp processing procedure, the slurry (abrasive) that utilizes lapping liquid feed unit 3 to provide to contain abrasive grains, inject this lapping liquid circulation line 2, can transmit this lapping liquid to a plurality of this cmp unit 5 (as, chemical mechanical grinder) by this lapping liquid circulation line 2; With known, this lapping liquid circulation line 2 is middle with this cmp unit 5, with excessive abrasive grains in this this lapping liquid of lapping liquid re-use device 4 filterings; When carrying out the PM operation, this lapping liquid that these lapping liquid re-use device 4 recovery have been filtered uses in order to this cmp unit 5 of supplying other to this lapping liquid circulation line 2; Thereby clear up operation inconvenience and the time that this lapping liquid causes when reducing the PM operation, take into account effect that prolongs board service life and the purpose that improves this processing procedure production capacity.
Wherein, this lapping liquid re-use device 4 have body 41, be arranged at filter element 42 in this body 41, be connected to respectively this cmp unit 5 and this body 41 recovery pump 43, reach the waste discharge unit that is connected this body 41 and external treatment system 47 respectively.The lapping liquid that this body 41 has the lapping liquid inlet 411 that connects this lapping liquid circulation line 2, connect this recoverys pump 43 reclaims mouthfuls 412, be connected in lapping liquid outlet 413, the exhaust outlet (indicating) of this cmp unit 5, connect waste discharge mouth 414, and the storage space (sign) of this waste discharge unit 44, ccontaining via this lapping liquid behind these filter element 42 filtering abrasive grains, and this lapping liquid that respectively this lapping liquid led reclaims mouth 412 and this lapping liquid outlet 413; This recovery pump 43 reclaims mouth 412 by this lapping liquid and draws back this lapping liquid that has filtered in this storage space, and is sent to this lapping liquid circulation line 2, for the repeated use of this processing procedure; This waste discharge unit 44 also comprises the blast pipe 46 that connects this exhaust outlet of establishing this body 41, when carrying out the PM operation procedure, need to change this filter element 42, and this blast pipe 46 was changed behind this filter element 42 residual air in this body 41 in order to discharge.
This lapping liquid re-use device 4 also comprises at least three hand-operated valves, and a valve 51, this lapping liquid that is respectively this lapping liquid inlet 411 of control exports 413 No. two valves 52, reaches No. three valves 53 of this blast pipe 46; Like this, when changing this filter element 42, controlling this hand-operated valve is closed condition, activates this recovery pump 43, can reclaim this lapping liquid of having filtered smoothly to this lapping liquid circulation line 2, reaches the purpose that this lapping liquid utilizes again; Thereby clear up operation inconvenience and the time that this lapping liquid causes when reducing the PM operation; And this lapping liquid that has filtered can make full use of, and can reach reusable environmental requirement.
Claims (3)
1, a kind of lapping liquid re-use device and system thereof, be applied to the cmp processing procedure, this system comprise lapping liquid circulation line, this lapping liquid circulation line of at least one connection lapping liquid feed unit, several lapping liquid re-use devices that connect this lapping liquid circulation line, and several connect the cmp unit of this lapping liquid re-use device respectively; This device comprises:
Body has the lapping liquid outlet that the lapping liquid inlet, exhaust outlet, the lapping liquid that connect this lapping liquid circulation line reclaim mouth, waste discharge mouth and be connected in this cmp unit;
Filter element is arranged at the contained abrasive grains of lapping liquid that this body is interior and filtering is imported by this lapping liquid inlet;
Reclaim pump, this lapping liquid that an end connects this body reclaims mouth, the other end is connected in this lapping liquid circulation line; And
The waste discharge unit, this waste discharge mouth that connects this body respectively reaches in the external treatment system, in order to abandon the waste liquid of being discharged by this body;
Wherein, this body has storage space, and is ccontaining via this lapping liquid behind this filter element filtering abrasive grains; This recovery pump reclaims mouth by this lapping liquid and draws back this lapping liquid that has filtered in this storage space, and is sent to this lapping liquid circulation line, for the repeated use of this processing procedure.
2, lapping liquid re-use device as claimed in claim 1 and system thereof, this waste discharge unit also comprises the blast pipe that connects this waste discharge mouth of establishing this body, after this filter element was changed, this blast pipe was discharged the air in this body.
3, lapping liquid re-use device as claimed in claim 2 and system thereof also comprise at least three hand-operated valves, control this lapping liquid inlet, this lapping liquid outlet, and the switch of this blast pipe respectively; By this, when changing this filter element, controlling this hand-operated valve is closed condition, makes this recovery pump be reclaimed this lapping liquid that has filtered smoothly.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2003101229170A CN100374245C (en) | 2003-12-29 | 2003-12-29 | Grinding liquid reusing device and system thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2003101229170A CN100374245C (en) | 2003-12-29 | 2003-12-29 | Grinding liquid reusing device and system thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1634682A true CN1634682A (en) | 2005-07-06 |
| CN100374245C CN100374245C (en) | 2008-03-12 |
Family
ID=34844673
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB2003101229170A Expired - Fee Related CN100374245C (en) | 2003-12-29 | 2003-12-29 | Grinding liquid reusing device and system thereof |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN100374245C (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2013013373A1 (en) * | 2011-07-22 | 2013-01-31 | 温州欣视界科技有限公司 | Small automatic polishing liquid cleaning device for rigid gas permeable contact lens |
| CN103639885A (en) * | 2013-10-29 | 2014-03-19 | 南昌欧菲光学技术有限公司 | Glass grinding device and grinding method |
| CN104476383A (en) * | 2014-11-21 | 2015-04-01 | 深圳市力合材料有限公司 | Circulation polishing device of silicon wafer and circulation polishing method |
| CN104551976A (en) * | 2013-10-29 | 2015-04-29 | 上海上冶阀门制造有限公司 | Multifunctional self-adaption ball valve grinding miller |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5664990A (en) * | 1996-07-29 | 1997-09-09 | Integrated Process Equipment Corp. | Slurry recycling in CMP apparatus |
| JPH11277434A (en) * | 1998-03-30 | 1999-10-12 | Speedfam Co Ltd | Slurry recycle system for cmp device and method therefor |
| JP3693847B2 (en) * | 1999-03-26 | 2005-09-14 | Ｎｅｃエレクトロニクス株式会社 | Method and apparatus for storing wafer after polishing |
| JP2001121421A (en) * | 1999-10-28 | 2001-05-08 | Hitachi Chemical Techno-Plant Co Ltd | Water recovery system |
| JP2002331456A (en) * | 2001-05-08 | 2002-11-19 | Kurita Water Ind Ltd | Recovering device of abrasive |
| JP4456308B2 (en) * | 2001-12-05 | 2010-04-28 | 富士通マイクロエレクトロニクス株式会社 | Chemical supply device |
-
2003
- 2003-12-29 CN CNB2003101229170A patent/CN100374245C/en not_active Expired - Fee Related
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2013013373A1 (en) * | 2011-07-22 | 2013-01-31 | 温州欣视界科技有限公司 | Small automatic polishing liquid cleaning device for rigid gas permeable contact lens |
| US10150202B2 (en) | 2011-07-22 | 2018-12-11 | Wenzhou Focusee Vision Care Technologies Co., Ltd. | Small automatic polishing liquid cleaning device for rigid gas permeable contact lens |
| CN103639885A (en) * | 2013-10-29 | 2014-03-19 | 南昌欧菲光学技术有限公司 | Glass grinding device and grinding method |
| CN104551976A (en) * | 2013-10-29 | 2015-04-29 | 上海上冶阀门制造有限公司 | Multifunctional self-adaption ball valve grinding miller |
| CN103639885B (en) * | 2013-10-29 | 2017-02-08 | 南昌欧菲光学技术有限公司 | Glass grinding device and grinding method |
| CN104551976B (en) * | 2013-10-29 | 2017-04-12 | 上海上冶阀门制造有限公司 | Multifunctional self-adaption ball valve grinding miller |
| CN104476383A (en) * | 2014-11-21 | 2015-04-01 | 深圳市力合材料有限公司 | Circulation polishing device of silicon wafer and circulation polishing method |
Also Published As
| Publication number | Publication date |
|---|---|
| CN100374245C (en) | 2008-03-12 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN1265046A (en) | Method and appts. for recovery of water and slurry abrasives used for chemical and mechanical planarization | |
| KR20090009266A (en) | Method of recovering abrasive from abrasive slurry waste liquid and apparatus therefor | |
| EP2301653A1 (en) | Filtration method, method of purifying abrasive composition using the same, method of regenerating filter for use in filtration, and apparatus for regenerating filter | |
| CN2853282Y (en) | Polishing equipment for ceramic product | |
| US7157012B2 (en) | Water treatment device and water treatment method using the same | |
| JP2003011031A (en) | Eco-coping type coolant device | |
| TW567083B (en) | Method for removing waste particle | |
| CN103286073A (en) | Recycling and supplying method for mix jet flow cleaned media | |
| CN1634682A (en) | Grinding liquid reusing device and system thereof | |
| KR100985861B1 (en) | Apparatus for supplying slurry for semiconductor and method thereof | |
| US7059943B2 (en) | Method and apparatus for recycling slurry | |
| CN201912833U (en) | Treatment device for recycling reclaimed oil from silicon wafer cutting waste oil sludge | |
| CN209383520U (en) | The working solution circulation purifier and wet type shot-blasting machine of wet type shot-blasting machine | |
| CN103072085A (en) | Grinding particle recycling device, grinding fluid management system, manufacturing method of glass substrate, and grinding particle recycling method | |
| CN202200170U (en) | Grinding head and chemical mechanical grinding equipment | |
| CN214132194U (en) | Grinding machine grinding oil filter equipment | |
| CN206156822U (en) | Regenerated plastic particle washs sewage treatment ware | |
| CN114603397B (en) | Movable lifting type filter for industrial cooling liquid and working method thereof | |
| CN214112951U (en) | Novel filtering and filling integrated machine | |
| CN215855613U (en) | Filtering and recycling system for descaling suspension | |
| JPH07108458A (en) | Treating device for exhaust gas and drainage in polishing device | |
| CN214990691U (en) | Wastewater treatment system | |
| CN219517894U (en) | Glass production water saving system capable of recycling circulating water | |
| CN210595511U (en) | Water ring type vacuum pump liquid cyclic utilization device | |
| CN107213698A (en) | Cellulose is ground the application of particle occasion in graphite |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| ASS | Succession or assignment of patent right |
Owner name: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (BEIJING Effective date: 20111205 |
|
| C41 | Transfer of patent application or patent right or utility model | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20111205 Address after: 201203 Shanghai Zhangjiang Road, Zhangjiang High Tech Park of Pudong New Area No. 18 Co-patentee after: Semiconductor Manufacturing International (Beijing) Corporation Patentee after: Semiconductor Manufacturing International (Shanghai) Corporation Address before: 201203 Shanghai Zhangjiang Road, Zhangjiang High Tech Park of Pudong New Area No. 18 Patentee before: Semiconductor Manufacturing International (Shanghai) Corporation |
|
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20080312 Termination date: 20181229 |