CN1634670A

CN1634670A - Wall cleaning device

Info

Publication number: CN1634670A
Application number: CN 200310109861
Authority: CN
Inventors: 吴锦亮; 赵主巨; 酆黎明
Original assignee: Semiconductor Manufacturing International Shanghai Corp
Current assignee: Semiconductor Manufacturing International Shanghai Corp; Semiconductor Manufacturing International Beijing Corp
Priority date: 2003-12-30
Filing date: 2003-12-30
Publication date: 2005-07-06
Anticipated expiration: 2023-12-30
Also published as: CN1286584C

Abstract

This invention provides a wall-clearing device, which comprises one connection pipe with several spray heads; several racks with one end connected to the connection pipe; one hollow body with its wall connected to the other end of the rack.

Description

The wall cleaning device

Technical field

The present invention utilizes a kind of wall cleaning device to spray lotion (as deionized water), to prevent that the formed crystal of semi-conductive developer solution and photoresist or etching solution from remaining on the wall, and remove the defective that this crystal drops on wafer to be produced, this wall cleaning device can be used in the processing procedure of conductor etching and development.

Background technology

Existing semi-conductive development and etched step all place in the ducted body 1a carries out; wherein step of developing is behind the processing procedure of semiconductor through exposing; to wash with developer solution without photochemically reactive photoresist again; and keep the line map of development here; by etched step logicalnot circuit partially-etched fallen afterwards and keep etched circuit; but regular meeting has the mixture of developer solution and photoresist to splash on the wall 11a in the above-mentioned step of developing; time one is long to be had the situation that crystal 2a is deposited on this wall 11a and takes place; after this crystal 2a deposition is saturated or uncommon concussion all can drop on wafer 3a; afterwards as continuing etched program; this crystal 2a will cause etching incomplete in the place of dropping, and then causes the defective of this wafer 3a.

Edge is, the improving of the above-mentioned shortcoming of inventor's thoughts is that the spy concentrates on studies and cooperates the utilization of scientific principle, proposes a kind of reasonable in design and effectively improve the present invention of above-mentioned shortcoming.

Summary of the invention

The object of the present invention is to provide a kind of wall cleaning device, can prevent that crystal is deposited on the wall, and solve that crystal drops on wafer and the defective that produces, and then improve the production yield of wafer.

A kind of wall cleaning device provided by the invention comprises: a tube connector, be arranged at a ducted body inner chamber, and which is provided with several shower nozzles; Several supports, the one end is connected in described tube connector; And a wall of a ducted body is connected in the other end of this support.

The present invention produces a lotion film by the agent of shower nozzle hydro-peening on the wall of ducted body, the mixture that can effectively prevent the developer solution that splashes and photoresist is adsorbed on the wall and produces crystal, and can solve the defective that crystal drops on wafer and produce, improve the yield of producing wafer.

For making your juror can further understand feature of the present invention and technology contents, see also following about detailed content of the present invention and accompanying drawing, now for a preferable feasible embodiment and cooperate graphic detailed description as after, believe purpose of the present invention, feature and advantage, go deep into and concrete understanding when getting one thus.

Description of drawings

Fig. 1 develops and the etching schematic diagram for known wafer places in the ducted body.

Fig. 2 is deposited on the wall schematic diagram of ducted body for known crystal.

Fig. 3 is the stereogram of wall cleaning device of the present invention.

Symbol description:

(known)

1a ducted body 2a wafer

11a wall 3a crystal

(the present invention)

1 ducted body, 41 shower nozzles

11 walls, 42 supports

2 wafers, 5 earthing or grounding means

4 tube connectors

The specific embodiment

Wall cleaning device of the present invention, comprise: a tube connector 4, this tube connector 4 designs according to the shape of a ducted body 1 inside that (ducted body of present embodiment 1 is for circular, so this tube connector 4 is designed to the tube connector of a circle), produce the lotion film of one deck densification with a wall 11 that conveniently makes described ducted body 1; This tube connector 4 is provided with several shower nozzles 41, these shower nozzle 41 fast demountables, and in order to spray the lotion (lotion in present embodiment is a deionized water) of pressurization; One end of several supports 42 is connected in described tube connector 4, the other end then is connected in this wall 11 of this ducted body 1, make described tube connector 4 be fixed in the top of described ducted body 1, allow the lotion that sprays can effectively clean the crystal 2 of wall, in addition for preventing that lotion and shower nozzle 41 frictions from producing static, so on described wall cleaning device, be provided with an earthing or grounding means 5, with the infringement that prevents that static from causing wafer 2.

Sketch structure of the present invention at this: a tube connector 4 which is provided with several shower nozzles 41; An end that reaches several supports 42 is connected in described tube connector 4, has sufficient intensity and supports this tube connector 4; Wherein the wall inner face of a ducted body 1 is connected in the other end of these several supports 42; Wherein this tube connector 4 is introduced lotion by the outside of this ducted body, to be sprayed by this shower nozzle 41.

In sum, the present invention produces a lotion film with several shower nozzle 41 hydro-peening agent on the wall 11 of ducted body 1, the mixture that can effectively prevent the developer solution that splashes and photoresist is adsorbed on the wall and produces crystal, and can solve the defective that crystal drops on wafer and produce, improve the yield of producing wafer.

Claims

1. A device wall cleaning device, comprising:

A connecting pipe, set in a hollow inner cavity, on which several nozzles are arranged; and

a plurality of brackets, one end of which is connected to the connecting pipe, having sufficient strength to support the connecting pipe;

The inner surface of the wall of a hollow body is connected to the other end of the plurality of brackets;

The connecting pipe introduces lotion from the outside of the hollow body to be sprayed out from the spray head.

2. The device wall cleaning device according to claim 1, characterized in that, the shape of the connecting pipe is consistent with the shape of the wall.

3. The device wall cleaning device according to claim 2, characterized in that, the shape of the connecting pipe is circular.

4. The device wall cleaning device according to claim 1, wherein the spray head is a lotion spray head.

5. The device wall cleaning device according to claim 4, characterized in that, said lotion nozzle is a deionized water nozzle.

6. The device wall cleaning device according to claim 1, characterized in that, said several spray heads spray detergent to form a dense detergent film on said vessel wall.

7. The device wall cleaning device according to claim 1, wherein the spray head is a quick disassembly spray head.

8. The device wall cleaning device according to claim 1, characterized in that, the device wall cleaning device is provided with a grounding device.