CN1603460A - Plasma injection method and apparatus for insulation material spare parts - Google Patents
Plasma injection method and apparatus for insulation material spare parts Download PDFInfo
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- CN1603460A CN1603460A CN 200410044012 CN200410044012A CN1603460A CN 1603460 A CN1603460 A CN 1603460A CN 200410044012 CN200410044012 CN 200410044012 CN 200410044012 A CN200410044012 A CN 200410044012A CN 1603460 A CN1603460 A CN 1603460A
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Abstract
The insulation material spare part plasma pours into the method and its pours into the installment, involves a kind and pours into the installment to the insulation material spare part ion implantation method. The traditional plasma pours into the condition is the work piece can the electric conduction, is unable regarding the insulation material to pour into. The invention pours into the method, is in the insulation material spare part (1) exterior establishment meets the pulse high pressure power source cathode, may bonding jumper which relatively revolves with the insulation material spare part (4) or metal cylinder grid (5). The invention pours into the installment, the insulation material spare part (1) through moves the seal and the electricity engine shaft (8) is connected, in states the insulation material spare part (1) periphery fixedly has the bonding jumper (4) or the metal cylinder grid (5); Another kind of equipment, in insulation material spare part (1) periphery is equipped with with the electricity engine shaft (8) the connected bonding jumper (4) or the metal cylinder grid (5). The invention installment and the method may process a bigger area the insulation material spare part, this processing method efficiency high, the effect is good; The invention installment structure simple, the production cost is low, favor the promoted application.
Description
Technical field:
The present invention relates to a kind of ion injection method and injection device to the insulating material component.
Background technology:
The insulating material component are used widely in industry, as glasswork, ceramic, polymer product etc.In order to obtain specific surface property, as higher wear resistance, toughness, hardness, electroconductibility etc., the surface needs to handle.Ion implantationly proved a kind of effective insulating material surface modifying method.If but traditional ion implantation injection area more greatly then need scanning, and then need work stage operated so that be injected into the surface for the on-plane surface component and face ion source, the degree of depth descends, splash effect increases otherwise inject.In order to improve processing efficiency, easy and simple to handle and reduction equipment cost, a kind of ion implantation mutation: the plasma immersion ion implantttion technique was invented the eighties in last century.This technology is that processed workpiece is placed in the vacuum chamber, utilize external plasma sources to produce needed plasma body, apply the negative bias of certain pulse shape then on workpiece, the electronics in the plasma body will be ostracised like this, ion to quicken to be injected in the middle of the workpiece.Such technical superiority is: can handle big area simultaneously work stage also need not to operate and can obtain the ion implantation of each surface.But the condition that obtains to inject like this is: workpiece needs conduction, can't apply for the insulating material current potential, injects just to be difficult to realize.
Summary of the invention:
The object of the present invention is to provide a kind of at insulating material use can be to carry out ion implantation insulating material component plasma body method for implanting and injection device thereof than the big area component, insulating material component plasma body method for implanting, be arranged on the insulating material component 1 in the vacuum chamber 2, vacuum chamber 2 communicates with plasma source 3, connect the metal strip 4 or the metal cylinder grid 5 of pulsed high voltage generator negative pole in the outer setting of insulating material component 1, control metal strip 4 or metal cylinder grid 5 and the relative rotation between the insulating material component 1 can realize the injection of insulating material component plasma body.A kind of insulating material component plasma body injection device, it comprises the vacuum chamber 2 that is communicated with plasma source 3, be provided with insulating material component 1 in the vacuum chamber 2, described insulating material component 1 place on the work stage 7, this work stage 7 links to each other with the motor shaft 8 of outside by dynamic seal, be fixed with metal strip 4 or metal cylinder grid 5 around described insulating material component 1, these metal cylinder grid 5 have only warp not have parallel, and described metal strip 4 or metal cylinder grid 5 link to each other with the pulsed high voltage generator negative pole.Another kind of insulating material component plasma body injection device, it comprises the vacuum chamber 2 that is communicated with plasma source 3, be provided with insulating material component 1 in the vacuum chamber 2, described insulating material component 1 are fixed on the inside of vacuum chamber 2, around insulating material component 1, be provided with metal strip 4 or metal cylinder grid 5, described metal strip 4 or metal cylinder grid 5 link to each other with the pulsed high voltage generator negative pole, and metal strip 4 or metal cylinder grid 5 link to each other with the motor shaft 8 of outside by dynamic seal.Device and method of the present invention can be handled larger area insulating material component, this treatment process efficient height, and effective, products obtained therefrom is indefectible; Treatment unit of the present invention is simple in structure, low cost of manufacture, and easy to use, be beneficial to and apply.
Description of drawings:
Fig. 1 is the structural representation of embodiment two, and Fig. 2 is the structural representation of embodiment three, and Fig. 3 is the structural representation of embodiment four, and Fig. 4 is the structural representation of embodiment five.
Embodiment:
Embodiment one: insulating material component plasma body method for implanting, insulating material component 1 are arranged in the vacuum chamber 2, vacuum chamber 2 communicates with plasma source 3, connect the metal strip 4 or the metal cylinder grid 5 of pulsed high voltage generator negative pole in the outer setting of insulating material component 1, control metal strip 4 or metal cylinder grid 5 and the relative rotation between the insulating material component 1 can realize the injection of insulating material component plasma body.Core of the present invention is that near the negative potential that obtains equivalence column insulation component surface attracts the ion in the plasma body to facilitate injection effect.
Embodiment two: with reference to Fig. 1, present embodiment insulating material component plasma body injection device, it comprises the vacuum chamber 2 that is communicated with plasma source 3, be provided with column insulating material component 1 in the vacuum chamber 2, described column insulating material component 1 place on the work stage 7, this work stage 7 links to each other with the motor shaft 8 of outside by dynamic seal, around described insulating material component 1, be fixed with metal strip 4, metal strip 4 is parallel with the axis of insulating material component 1, and metal strip 4 links to each other with the pulsed high voltage generator negative pole.
Embodiment three: with reference to Fig. 2, present embodiment and embodiment two differences are, described metal strip 4 is replaced by metal cylinder grid 5, metal cylinder grid 5 are cylindric, cylindrical metal tube grid 5 are enclosed within the outside of column insulating material component 1, and the dead in line of its axis and column insulating material component 1, these metal cylinder grid 5 have only warp not have parallel.
Rotation by motor can form relatively rotating of insulation workpiece and conducting circular cylinder metal cylinder grid.When high-voltage pulse was applied to metal grid mesh, the ion in the plasma body will be subjected to the influence of the secondary current potential of aperture plate and fly to aperture plate, because aperture plate has bigger space, most ions will fly over aperture plate by the aperture plate slit and be injected into inner insulating material workpiece.But can stay the shade influence that metal grid mesh causes this moment, and promptly ion implantation dosage is inhomogeneous.Need relatively rotating of insulating material workpiece and metal grid mesh, shade influence will disappear so for this reason.In order to reduce charging effects, need pulsed mode, so that in the high voltage pulse period at intermittence, the charging of the electron pair insulating material workpiece surface in the plasma body is discharged to injecting the influence of energy.In addition, in order to reduce the charging effects influence, injected pulse is unsuitable long.
Embodiment four: with reference to Fig. 3, present embodiment comprises the vacuum chamber 2 that is communicated with plasma source 3, be provided with insulating material component 1 in the vacuum chamber 2, described insulating material component 1 are column, column insulating material component 1 are fixed on the inside of vacuum chamber 2, around insulating material component 1, be provided with metal strip 4, metal strip 4 is parallel with the axis of column insulating material component 1, described metal strip 4 links to each other with the pulsed high voltage generator negative pole, and metal strip 4 links to each other with the motor shaft 8 of outside by dynamic seal.
Embodiment five: with reference to Fig. 4, present embodiment and embodiment four differences are, metal strip 4 is replaced by metal cylinder grid 5, metal cylinder grid 5 are cylindric, cylindrical metal tube grid 5 are enclosed within the outside of column insulating material component 1, and the dead in line of the axis of cylindrical metal tube grid 5 and column insulating material component 1, aforementioned cylindrical metal tube grid 5 have only warp not have parallel.
Claims (9)
1. insulating material component plasma body method for implanting, it comprises the insulating material component (1) that are arranged in the vacuum chamber (2), vacuum chamber (2) communicates with plasma source (3), connect the metal strip (4) or the metal cylinder grid (5) of pulsed high voltage generator negative pole in the outer setting of insulating material component (1), it is characterized in that controlling the injection that metal strip (4) or metal cylinder grid (5) and the relative rotation between the insulating material component (1) can realize insulating material component plasma body.
2. insulating material component plasma body method for implanting according to claim 1 is characterized in that described insulating material component (1) are column, and is parallel with its axis at the metal strip (4) that the outside of column insulating material component (1) is provided with.
3. insulating material component plasma body method for implanting according to claim 1, it is characterized in that described insulating material component (1) are column, be with cylindrical metal tube grid (5) in the outside of column insulating material component (1), these metal cylinder grid (5) have only warp not have parallel, and the dead in line of the axis of cylindrical metal tube grid (5) and column insulating material component (1).
4. insulating material component plasma body injection device, it comprises the vacuum chamber (2) that is communicated with plasma source (3), be provided with insulating material component (1) in the vacuum chamber (2), it is characterized in that described insulating material component (1) place on the work stage (7), this work stage (7) links to each other by the motor shaft (8) of dynamic seal with the outside, around described insulating material component 1, be fixed with metal strip (4) or metal cylinder grid (5), these metal cylinder grid (5) have only warp not have parallel, and described metal strip (4) or metal cylinder grid (5) link to each other with the pulsed high voltage generator negative pole.
5. insulating material component plasma body injection device according to claim 4 is characterized in that described insulating material component (1) are column, and is parallel with its axis at the metal strip (4) that the outside of column insulating material component (1) is provided with.
6. insulating material component plasma body injection device according to claim 4, it is characterized in that described insulating material component (1) are column, be with cylindrical metal tube grid (5) in the outside of column insulating material component (1), these metal cylinder grid (5) have only warp not have parallel, and the dead in line of the axis of cylindrical metal tube grid (5) and column insulating material component (1).
7. insulating material component plasma body injection device, it comprises the vacuum chamber (2) that is communicated with plasma source (3), be provided with insulating material component (1) in the vacuum chamber (2), it is characterized in that described insulating material component (1) are fixed on the inside of vacuum chamber (2), around insulating material component (1), be provided with metal strip (4) or metal cylinder grid (5), described metal strip (4) or metal cylinder grid (5) link to each other with the pulsed high voltage generator negative pole, and metal strip (4) or metal cylinder grid (5) link to each other with outside motor shaft (8) by dynamic seal.
8. insulating material component plasma body injection device according to claim 7 is characterized in that described insulating material component (1) are column, and is parallel with its axis at the metal strip (4) that the outside of column insulating material component (1) is provided with.
9. insulating material component plasma body injection device according to claim 7, it is characterized in that described insulating material component (1) are column, be with cylindrical metal tube grid (5) in the outside of column insulating material component (1), these metal cylinder grid (5) have only warp not have parallel, and the dead in line of the axis of cylindrical metal tube grid (5) and column insulating material component (1).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2004100440120A CN1322163C (en) | 2004-11-05 | 2004-11-05 | Plasma injection method and apparatus for insulation material spare parts |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2004100440120A CN1322163C (en) | 2004-11-05 | 2004-11-05 | Plasma injection method and apparatus for insulation material spare parts |
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| Publication Number | Publication Date |
|---|---|
| CN1603460A true CN1603460A (en) | 2005-04-06 |
| CN1322163C CN1322163C (en) | 2007-06-20 |
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| Application Number | Title | Priority Date | Filing Date |
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| CNB2004100440120A Expired - Fee Related CN1322163C (en) | 2004-11-05 | 2004-11-05 | Plasma injection method and apparatus for insulation material spare parts |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104988468A (en) * | 2015-07-27 | 2015-10-21 | 哈尔滨工业大学 | Device for injection and deposition of metal plasma immersion ions on insulating material and injecting and depositing method using device |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4764394A (en) * | 1987-01-20 | 1988-08-16 | Wisconsin Alumni Research Foundation | Method and apparatus for plasma source ion implantation |
| US5374456A (en) * | 1992-12-23 | 1994-12-20 | Hughes Aircraft Company | Surface potential control in plasma processing of materials |
| CA2130167C (en) * | 1993-08-27 | 1999-07-20 | Jesse N. Matossian | Nondestructive determination of plasma processing treatment |
| DE19750909C1 (en) * | 1997-11-17 | 1999-04-15 | Bosch Gmbh Robert | Rotating unit for plasma immersion aided treatment of substrates |
| EP1055745A1 (en) * | 1999-05-27 | 2000-11-29 | Sony Corporation | Method and apparatus for surface modification |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104988468A (en) * | 2015-07-27 | 2015-10-21 | 哈尔滨工业大学 | Device for injection and deposition of metal plasma immersion ions on insulating material and injecting and depositing method using device |
| CN104988468B (en) * | 2015-07-27 | 2018-03-16 | 哈尔滨工业大学 | A kind of method of insulating materials metal plasma immersion ion implantation and deplsition |
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| Publication number | Publication date |
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| CN1322163C (en) | 2007-06-20 |
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Granted publication date: 20070620 Termination date: 20161105 |