CN1601231A - Human eye aberration Hartmann wavefront sensor based on microprism array - Google Patents
Human eye aberration Hartmann wavefront sensor based on microprism array Download PDFInfo
- Publication number
- CN1601231A CN1601231A CN 03126431 CN03126431A CN1601231A CN 1601231 A CN1601231 A CN 1601231A CN 03126431 CN03126431 CN 03126431 CN 03126431 A CN03126431 A CN 03126431A CN 1601231 A CN1601231 A CN 1601231A
- Authority
- CN
- China
- Prior art keywords
- microprism array
- array
- wavefront sensor
- microprism
- grating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000004075 alteration Effects 0.000 title claims abstract description 22
- 230000003287 optical effect Effects 0.000 claims abstract description 29
- 238000001259 photo etching Methods 0.000 claims abstract description 22
- 238000005516 engineering process Methods 0.000 claims abstract description 13
- 238000012545 processing Methods 0.000 claims abstract description 5
- 230000007704 transition Effects 0.000 claims abstract description 4
- 238000010276 construction Methods 0.000 claims description 18
- 238000000034 method Methods 0.000 claims description 11
- 239000000758 substrate Substances 0.000 claims description 11
- 238000005530 etching Methods 0.000 claims description 10
- 230000011218 segmentation Effects 0.000 claims description 5
- 238000010923 batch production Methods 0.000 abstract description 3
- 238000009434 installation Methods 0.000 abstract description 3
- 230000008901 benefit Effects 0.000 abstract description 2
- 238000004519 manufacturing process Methods 0.000 description 5
- 230000008859 change Effects 0.000 description 3
- 238000010168 coupling process Methods 0.000 description 3
- 238000005520 cutting process Methods 0.000 description 3
- 238000003384 imaging method Methods 0.000 description 3
- 230000007812 deficiency Effects 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 230000000737 periodic effect Effects 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 230000011514 reflex Effects 0.000 description 2
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 230000008030 elimination Effects 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- 230000004313 glare Effects 0.000 description 1
- 206010025482 malaise Diseases 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 210000001747 pupil Anatomy 0.000 description 1
- 238000013519 translation Methods 0.000 description 1
Images
Landscapes
- Testing Of Optical Devices Or Fibers (AREA)
Abstract
The human eye aberration Hartmann wavefront sensor based on the microprism array consists of a light source, a light beam matching telescope, a transition system, a microprism array, a Fourier lens and a photoelectric detector CCD, and is characterized in that: the microprism Hartmann wavefront sensor consists of a microprism array with a variable-period two-dimensional sawtooth-shaped phase grating structure, a Fourier lens and a photoelectric detector, wherein the Fourier lens is tightly attached to the microprism array, the microprism array with the two-dimensional sawtooth-shaped phase grating structure can have two structures, namely a single-sided photoetching centrosymmetric annular structure and a double-sided photoetching double-sided grating structure, and can be processed by adopting a micro-optical technology or a binary optical technology. The Hartmann wavefront sensor has the advantages of simple and stable structure and easy realization of processing technology, and can simplify the installation and adjustment of the Hartmann wavefront sensor and realize batch production compared with the existing microlens technology.
Description
Technical field
The present invention relates to a kind of human eye aberration Hartmann Wavefront sensor based on microprism array.
Background technology
Be used for the Hartmann wave front sensor that human eye aberration is measured at present, usually adopt microlens array to cut apart light beam aperture, and incident light focused on the photosensitive target surface of ccd detector, perhaps lenticular focal plane hot spot image is imaged in the ccd detector photosensitive target surface by a relay system.Measure human eye aberration with the lenticule Hartmann wave front sensor and see patent " Rapid, automatic measurement of the eye ' s wave aberration ", Williams et al.Patent No.US 6,199,986 b1, Mar.13,2001.The deficiency of this class Hartmann sensor is the coupling technique more complicated of microlens array and ccd detector, the focus error of the lenticule unit of microlens array is inconsistent to cause influencing sensor accuracy, requirement to the microlens array manufacturing technology is very high, installation, debug difficulties are not suitable for manufacturing in enormous quantities.
Jiang Wenhan etc. once proposed and made the mirror of cutting apart that a kind of prism (referring to wedge or wedge) that has different angles of wedge forms and cut apart light beam aperture (" 37 unit self-adapting optical system ", Jiang Wenhan, Wu Xubin, Ling Ning, photoelectric project, 22 volumes, 1 phase 38-45 page or leaf, nineteen ninety-five), and, can overcome the difficulty that aperture segmentation element and ccd detector are coupled with the Hartmann sensor of object lens focusing in the CCD photosensitive target surface.But the manufacturing technology that is assembled into the aperture segmentation element with single sub-prism is complicated and expensive, also is unwell to batch process.
Chinese invention patent application " 01108433.2 " proposes in embodiment 1: the aperture segmentation element 1 ' of Hartmann wave front sensor can be the integrated form binary Fresnel microprism array that adopts micro-optic technology or binary optical technique to make, the focal plane of condenser lens 2 ' overlaps with the photosensitive target surface of ccd detector 3 ' 4 ', as shown in Figure 1.The foregoing invention patented claim has proposed a kind of Hartmann wave front sensor structure of simple and stable, but to wherein key components one light beam aperture cutting element, does not provide definite structure and production program.Therefore, the present invention is the continuation to above-mentioned patented claim.
Summary of the invention
Technology of the present invention is dealt with problems and is: overcome that the focus error of lenticule unit of coupling technique more complicated, microlens array of microlens array and ccd detector in the prior art is inconsistent to cause influencing sensor accuracy; And sub-wedge assembling technique complex process and costliness, be not suitable for deficiency such as batch process, a kind of microprism Hartmann wave front sensor that human eye aberration is measured that is used for that is suitable for industrialized mass production is provided.
Technical solution of the present invention is: based on the human eye aberration Hartmann Wavefront sensor of microprism array, form by light source, Beam matching telescope, transition system, microprism array, fourier transform lens and photodetector CCD, its characteristics are: described microprism array is a variable period two dimension sawtooth shaped phase grating array structure, with the common aperture segmentation that realizes light beam of fourier transform lens combination.
The variable period two dimension sawtooth shaped phase grating array of serration depth such as the microprism array of described variable period two dimension sawtooth shaped phase optical grating construction is, promptly each grating is same serration depth in the array, and just x, y director space cycle have nothing in common with each other.
Described variable period two dimension sawtooth shaped phase optical grating construction microprism array two kinds of implementations can be arranged: the two-sided optical grating construction of centrosymmetric annular layout structure of single face photoetching and two sides photoetching.The centrosymmetric annular layout structure of single face photoetching is single face photoetching on substrate, with the center is basic point, the circle-shaped outside expansion that is centrosymmetric, and each sub-aperture x, y director space period T x and Ty outwards are 1 by the center simultaneously in the array, 1/2,1/3...1/n progression multiplying power alternation.The two-sided optical grating construction of two sides photoetching is for being benchmark in substrate one side with the x coordinate axis, and etching produces and is arranged in parallel, the grating cycle, its grating cycle outwards was 1,1/2 by the center, 1/3...1/n progression multiplying power alternation along the sawtooth shaped phase grating of x direction; Is benchmark at the substrate another side with the y coordinate axis, and etching produces and to be arranged in parallel, the grating cycle, its grating cycle outwards was 1,1/2 by the center, 1/3...1/n progression multiplying power alternation along the sawtooth shaped phase grating of y direction.
The microprism array of described variable period two dimension sawtooth shaped phase optical grating construction can adopt micro-optic technology or binary optical technique processing.
Principle of the present invention is: microprism array is to adopt micro-optic or binary optical technique, etching forms variable period two dimension sawtooth shaped phase grating array on a sheet base, its serration depth remains unchanged and cycle alternation between sub-aperture, realize evenly arranging of spot array by setting serration depth, grating in parameters such as the space periodic of pairwise orthogonal direction and fourier transform lens focal lengths, two kinds of implementations of two-sided optical grating construction of centrosymmetric annular layout structure of single face photoetching and two sides photoetching can be arranged; The sawtooth shaped phase structure of grating adopts the binary optical technique etching to form; Fourier transform lens is according to the anaberration lens of focal length, the processing of f number parameter requests such as (focal length/bores of lens), does not receive by photodetector like this and can produce distortion.
The present invention compared with prior art has following advantage:
1. microprism Hartmann wave front sensor disclosed in this invention, its light beam aperture cutting element one microprism array is made of variable period two dimension sawtooth shaped phase grating array, only need and a fourier transform lens combination, just can realize that light beam aperture cuts apart, converge to the photodetector photosensitive target surface by public fourier transform lens before all wavelets, overcome the inconsistent influence that the Hartmann wave front sensor precision is produced of the lenticule unit focal length of microlens array in the prior art.
2. microprism array disclosed in this invention, be adopt micro-optic or binary optical technique directly on a slice base photoetching form, avoided a work sheet prism respectively, carry out the complexity of sub-prism assembly unit, loaded down with trivial details, expensive technology then.
3. microprism array disclosed in this invention is adding man-hour, only need to change the space periodic of each sawtooth shaped phase grating in the array and serration depth remains unchanged, and broached-tooth design adopts micro-optic or binary optical technique etching to form, it is simple in structure, processing technology easily realizes, is easy to realize mass production.
4. the installation adjustment of Hartmann wave front sensor will be simplified.Existing lenticule Hartmann sensor needs a relay system usually, the focus of microlens array is coupled to the photosensitive target surface of CCD.As shown in Figure 2, except that the collimation adjustment that must finish microlens array 21, relay system 22 and CCD 23, also must finish between the focal plane of the focal spot array of microlens array 21 and CCD 23 object-image conjugate adjustment with respect to relay system 22, the whole link of debuging is more and difficulty is big, is unfavorable for producing in batches.And two-dimentional sawtooth shaped phase grating array 41 that this patent proposed and fourier transform lens 42 combinations, direct imaging is in CCD photosensitive target surface 44, as shown in Figure 4, except that necessary collimation adjustment, only CCD photosensitive target surface 44 need be focused with respect to fourier transform lens 42, simplify the work of debuging of sensor.
Description of drawings
Fig. 1 is the Hartmann wave front sensor structural representation that Chinese invention patent application " 01108433.2 " proposes in embodiment 1;
Fig. 2 is a lenticule Hartmann wave front sensor structural representation in the prior art;
Fig. 3 is for measuring human eye aberration device synoptic diagram based on the Hartmann wave front sensor of microprism array among the present invention;
Fig. 4 among the present invention based on the human eye aberration Hartmann wavefront sensor construction and the principle of work synoptic diagram of microprism array;
Fig. 5 adopts the centrosymmetric annular layout structural representation of single face photoetching for the microprism array of variable period two dimension sawtooth shaped phase optical grating construction among the present invention;
Fig. 6 is the schematic perspective view of Fig. 5;
Fig. 7 is the two-sided optical grating construction front view that the microprism array of variable period two dimension sawtooth shaped phase optical grating construction among the present invention adopts the two sides photoetching;
Fig. 8 is the left view of Fig. 7;
Fig. 9 is the right view of Fig. 7.
Embodiment
As shown in Figure 3, in human eye aberration Hartmann measuring system based on microprism array, the light that sends by beacon 1, through pin hole 2 filtering, by collimating mirror 3 collimations is parallel light emergence, through catoptron 5 and beam splitter 6 reflections, (confocal wave-filtration optical door screen 10 is placed at the public focus place of its two groups of lens by Beam matching telescope 7, only allow the fundus reflex light transmission, thereby the elimination veiling glare) enter eye pupil 8, fundus reflex light Returning beam coupling telescope 7 also sees through beam splitter 6, enter human eye aberration Hartmann Wavefront sensor based on microprism array via transition system 9: light beam sees through microprism array 41, through fourier transform lens 42 imagings, on CCD 43 photosensitive target surfaces, form spot array again;
As shown in Figure 4, based on the human eye aberration Hartmann Wavefront sensor of microprism array microprism array 41 by variable period two dimension sawtooth shaped phase optical grating construction, fourier transform lens 42 and CCD 43 form, fourier transform lens 42 is close to the microprism array 41 of variable period two dimension sawtooth shaped phase optical grating construction, the photosensitive target surface 44 of CCD 43 is positioned on fourier transform lens 42 focal planes, microprism array 41 is for adopting micro-optic or the binary optical technique two-dimentional sawtooth shaped phase grating array that etching produces on same substrate, and the variable period two dimension sawtooth shaped phase grating array of serration depth such as be, be that each grating is same serration depth in the array, be x, the y director space cycle has nothing in common with each other, it can have two kinds of implementations: the two-sided optical grating construction of centrosymmetric annular layout structure of single face photoetching and two sides photoetching, respectively as Fig. 5, Fig. 6 and Fig. 7, Fig. 8, shown in Figure 9.
Its concrete enforcement of structure shown in Figure 4 can be: microprism array 41 and fourier transform lens 42 adopt the mechanical parts that has three-dimensional adjustment function to fix respectively, and CCD 43 thereafter needs the axial translation adjustment.When debuging, respectively to microprism array 41, fourier transform lens 42 and CCD 43 adjustment that collimates; Directional light incident then, CCD 43 axially adjusts, and its photosensitive target surface is positioned on the focal plane of fourier transform lens 42, and the whole process of debuging is finished.
When based on the human eye aberration Hartmann sensor of microprism array during in work, as shown in Figure 4, incident beam is behind microprism array 41, the light beam in each sub-aperture has produced the respective phase variation respectively, by being close to fourier transform lens 42 imagings thereafter, survey its light distribution by the CCD 43 that is positioned on the fourier transform lens focal plane, this light distribution is comprising the phase information that two-dimentional sawtooth shaped phase grating array is produced, the phase change difference that each sub-aperture produced, thereby on the fourier transform lens focal plane, forming a spot array, the overall optical beam orifice is evenly cut apart.The spot array that the incident of standard flat ripple produces will be saved and be used as nominal data.
When having the wavefront incident of certain aberration, each local dip plane wave produces new additive phase to two-dimentional sawtooth shaped phase grating in its sub-aperture, and this phase change will be reflected in the facula position skew of fourier transform lens focal plane.
The hot spot signal that CCD 43 receives can be handled by computing machine, adopts centroid algorithm: the position (x that is 1. calculated hot spot by formula
i, y
i), the corrugated control information of detection full aperture:
In the formula, m=1～M, n=1～N are that sub-aperture is mapped to pixel region corresponding on CCD 43 photosensitive target surfaces 44, I
NmBe (n, the m) signal received of individual pixel-by-pixel basis, x on CCD 43 photosensitive target surfaces 44
Nm, y
NmBe respectively (n, m) the x coordinate of individual pixel and y coordinate.
2. calculate the wavefront slope g of incident wavefront again according to formula
Xi, g
Yi:
In the formula, (x
0, y
0) demarcate the spot center reference position that Hartmann sensor obtains for the standard flat ripple; During Hartmann sensor probing wave front-distortion, spot center is displaced to (x
i, y
i), finish the detection of Hartmann wave front sensor to signal.
As shown in Figure 5, microprism array can have the centrosymmetric annular layout structure of single face photoetching: the cycle of each grating and groove direction form annular layout, i.e. single face photoetching on substrate, with central point O is basic point, circle-shaped outside expansion is centrosymmetric, each sub-aperture x, y director space period T x and Ty outwards are 1,1/2 by the center, 1/3...1/n progression multiplying power alternation simultaneously in the array.
Fig. 6 is the schematic perspective view of structure shown in Figure 5.
As Fig. 7, Fig. 8 and shown in Figure 9, microprism array can also have the two-sided optical grating construction of two sides photoetching: the branch two sides is determined the X of each grating in the array and the grating cycle of Y direction respectively, produce the directions X cycle at groove of substrate, another side then groove produces the Y direction cycle, two-sided groove forms the different cycles of grating array jointly, be benchmark with the x coordinate axis promptly in the substrate one side, etching produces and to be arranged in parallel, the grating cycle is along the sawtooth shaped phase grating of x direction, its grating cycle outwards is 1 by the center, 1/2,1/3...1/n progression multiplying power alternation; Is benchmark at the substrate another side with the y coordinate axis, and etching produces and to be arranged in parallel, the grating cycle, its grating cycle outwards was 1,1/2 by the center, 1/3...1/n progression multiplying power alternation along the sawtooth shaped phase grating of y direction.
Claims (6)
1, based on the human eye aberration Hartmann Wavefront sensor of microprism array, comprise light source, Beam matching telescope, transition system, microprism array, fourier transform lens and photodetector CCD, it is characterized in that: described microprism Hartmann sensor is the aperture segmentation that realizes light beam by the microprism array of variable period two dimension sawtooth shaped phase optical grating construction and fourier transform lens combination.
2, the human eye aberration Hartmann Wavefront sensor based on microprism array according to claim 1, it is characterized in that: described microprism array such as is at the variable period two dimension sawtooth shaped phase grating array of serration depth, be that each grating is same serration depth in the array, just x, y director space cycle have nothing in common with each other.
3, the human eye aberration Hartmann Wavefront sensor based on microprism array according to claim 1 and 2, it is characterized in that: the microprism array of described variable period two dimension sawtooth shaped phase optical grating construction both can adopt the micro-optic technology, also can adopt binary optical technique processing.
4, the human eye aberration Hartmann Wavefront sensor based on microprism array according to claim 1 and 2 is characterized in that: described microprism array adopts the two-sided optical grating construction of centrosymmetric annular layout structure of single face photoetching or two sides photoetching.
5, the human eye aberration Hartmann Wavefront sensor based on microprism array according to claim 4, it is characterized in that: the centrosymmetric annular layout structure of described single face photoetching is single face photoetching on substrate, with the center is basic point, circle-shaped outside expansion is centrosymmetric, each sub-aperture x, y director space period T x and Ty outwards are 1 by the center simultaneously in the array, 1/2,1/3 ... 1/n progression multiplying power alternation.
6, the human eye aberration Hartmann Wavefront sensor based on microprism array according to claim 4, it is characterized in that: the two-sided optical grating construction of described two sides photoetching is for being benchmark in substrate one side with the x coordinate axis, etching produces and to be arranged in parallel, the grating cycle is along the sawtooth shaped phase grating of x direction, its grating cycle outwards is 1 by the center, 1/2,1/3 ... 1/n progression multiplying power alternation; Is benchmark at the substrate another side with the y coordinate axis, and etching produces and to be arranged in parallel, the grating cycle, its grating cycle outwards was 1,1/2,1/3 by the center along the sawtooth shaped phase grating of y direction ... 1/n progression multiplying power alternation.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB03126431XA CN100405016C (en) | 2003-09-28 | 2003-09-28 | Human eye aberration Hartmann wavefront sensor based on microprism array |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB03126431XA CN100405016C (en) | 2003-09-28 | 2003-09-28 | Human eye aberration Hartmann wavefront sensor based on microprism array |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1601231A true CN1601231A (en) | 2005-03-30 |
| CN100405016C CN100405016C (en) | 2008-07-23 |
Family
ID=34658796
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB03126431XA Expired - Fee Related CN100405016C (en) | 2003-09-28 | 2003-09-28 | Human eye aberration Hartmann wavefront sensor based on microprism array |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN100405016C (en) |
Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100586406C (en) * | 2007-12-28 | 2010-02-03 | 中国科学院光电技术研究所 | Transmission type artificial crystal aberration Hartmann measuring instrument |
| CN100589780C (en) * | 2007-12-28 | 2010-02-17 | 中国科学院光电技术研究所 | Reflection type artificial crystal aberration Hartmann measuring instrument |
| CN1955701B (en) * | 2006-09-30 | 2010-10-06 | 中国科学院光电技术研究所 | Hartmann-shack wavefront sensor based on Fourier spectrum filtering module |
| CN101947157B (en) * | 2009-12-18 | 2012-02-15 | 中国科学院光电技术研究所 | Human eye adaptive optical visual perception learning training instrument |
| CN101718542B (en) * | 2009-09-30 | 2012-06-27 | 深圳市斯尔顿科技有限公司 | Optical ranging device and portable refractometer thereof |
| CN101947158B (en) * | 2009-12-18 | 2012-07-04 | 中国科学院光电技术研究所 | Binocular self-adaptive optical visual perception learning training instrument |
| CN102937512A (en) * | 2012-10-26 | 2013-02-20 | 中国人民解放军国防科学技术大学 | Spectroscope aberration measuring system based on double hartmenn-shack detectors |
| US20130229486A1 (en) * | 2010-08-03 | 2013-09-05 | Cornell University | Angle sensitive pixel (asp)-based image processing system, method, and applications |
| US9610022B1 (en) | 2015-10-19 | 2017-04-04 | The Institute Of Optics And Electronics, The Chinese Academy Of Sciences | Adaptive optical objective inspection instrument for optic nerve function |
| CN111664802A (en) * | 2020-06-03 | 2020-09-15 | 中国科学院西安光学精密机械研究所 | Semiconductor wafer surface morphology measuring device based on dynamic quantitative phase imaging |
| CN111795921A (en) * | 2020-07-14 | 2020-10-20 | 南京理工大学 | Particle counter sensor beam homogenization and sharpening illumination system |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH1114831A (en) * | 1997-06-20 | 1999-01-22 | Matsushita Electric Ind Co Ltd | Polarized light separating device, and polarized light illuminating and projection type display device using the same |
| CN1189774C (en) * | 1998-08-26 | 2005-02-16 | 中国科学院光电技术研究所 | Optical Wavefront Sensor |
| CN1148150C (en) * | 1999-07-30 | 2004-05-05 | 中国科学院光电技术研究所 | Adaptive optical retina imaging system (1) |
| CN1385675A (en) * | 2001-05-16 | 2002-12-18 | 中国科学院光电技术研究所 | Wavefront sensor |
| CN1206514C (en) * | 2001-05-16 | 2005-06-15 | 中国科学院光电技术研究所 | Wavefront sensor |
| US6575572B2 (en) * | 2001-09-21 | 2003-06-10 | Carl Zeiss Ophthalmic Systems, Inc. | Method and apparatus for measuring optical aberrations of an eye |
-
2003
- 2003-09-28 CN CNB03126431XA patent/CN100405016C/en not_active Expired - Fee Related
Cited By (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1955701B (en) * | 2006-09-30 | 2010-10-06 | 中国科学院光电技术研究所 | Hartmann-shack wavefront sensor based on Fourier spectrum filtering module |
| CN100589780C (en) * | 2007-12-28 | 2010-02-17 | 中国科学院光电技术研究所 | Reflection type artificial crystal aberration Hartmann measuring instrument |
| CN100586406C (en) * | 2007-12-28 | 2010-02-03 | 中国科学院光电技术研究所 | Transmission type artificial crystal aberration Hartmann measuring instrument |
| CN101718542B (en) * | 2009-09-30 | 2012-06-27 | 深圳市斯尔顿科技有限公司 | Optical ranging device and portable refractometer thereof |
| CN101947157B (en) * | 2009-12-18 | 2012-02-15 | 中国科学院光电技术研究所 | Human eye adaptive optical visual perception learning training instrument |
| CN101947158B (en) * | 2009-12-18 | 2012-07-04 | 中国科学院光电技术研究所 | Binocular self-adaptive optical visual perception learning training instrument |
| US8767047B2 (en) * | 2010-08-03 | 2014-07-01 | Cornell University | Angle sensitive pixel (ASP)-based image processing system, method, and applications |
| US20130229486A1 (en) * | 2010-08-03 | 2013-09-05 | Cornell University | Angle sensitive pixel (asp)-based image processing system, method, and applications |
| CN102937512A (en) * | 2012-10-26 | 2013-02-20 | 中国人民解放军国防科学技术大学 | Spectroscope aberration measuring system based on double hartmenn-shack detectors |
| CN102937512B (en) * | 2012-10-26 | 2015-06-24 | 中国人民解放军国防科学技术大学 | Spectroscope aberration measuring system based on double hartmenn-shack detectors |
| US9610022B1 (en) | 2015-10-19 | 2017-04-04 | The Institute Of Optics And Electronics, The Chinese Academy Of Sciences | Adaptive optical objective inspection instrument for optic nerve function |
| CN111664802A (en) * | 2020-06-03 | 2020-09-15 | 中国科学院西安光学精密机械研究所 | Semiconductor wafer surface morphology measuring device based on dynamic quantitative phase imaging |
| CN111795921A (en) * | 2020-07-14 | 2020-10-20 | 南京理工大学 | Particle counter sensor beam homogenization and sharpening illumination system |
| CN111795921B (en) * | 2020-07-14 | 2023-08-22 | 南京理工大学 | Illumination system for particle counter sensor beam homogenization and sharpening |
Also Published As
| Publication number | Publication date |
|---|---|
| CN100405016C (en) | 2008-07-23 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4782239A (en) | Optical position measuring apparatus | |
| CN100592214C (en) | Device and method for focusing and leveling based on microlens array | |
| CN100535767C (en) | Focusing leveling measuring method and device | |
| CN1831499A (en) | Self-adaptive optical system based on microprism shack-Hartmann wavefront sensor | |
| CN100405016C (en) | Human eye aberration Hartmann wavefront sensor based on microprism array | |
| JP2009526216A (en) | Rapid and powerful method and apparatus for chromatic confocal 3D measurement technology | |
| CN100458370C (en) | Hartmann wavefront sensor for optical detection based on microprism array | |
| CN102419213A (en) | Hartmann wavefront sensor based on diffraction grating arrays | |
| JPS6318166B2 (en) | ||
| CN108132142B (en) | Device and method for detecting large-caliber reflection optical system | |
| CN1385675A (en) | Wavefront sensor | |
| US10571252B2 (en) | Surface topography optical measuring system and surface topography optical measuring method | |
| JPS6037511A (en) | Focus detector of camera | |
| CN100451577C (en) | Hartmann wavefront sensor for pulse light beam quality detection based on microprism array | |
| CN110631510B (en) | High-precision angle measuring device and method based on Michelson structure | |
| EP0489399B1 (en) | Displacement detector | |
| JP4060494B2 (en) | Three-dimensional surface shape measuring device | |
| US20230084212A1 (en) | Three-dimensional space camera and photographing method therefor | |
| KR102434350B1 (en) | A polarized holographic microscope system and sample image acquisition method using the same | |
| US5815272A (en) | Filter for laser gaging system | |
| JP6904872B2 (en) | Wavefront measuring device, wavefront measuring method, and manufacturing method of optical system | |
| CN112504164A (en) | Measuring device and method capable of dynamically measuring surface shape of planar optical element | |
| JPS6332508A (en) | Projecting system for automatic focus detection | |
| JP2864171B2 (en) | Observation optical system | |
| JP3404066B2 (en) | Focus detection device |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20080723 Termination date: 20170928 |
|
| CF01 | Termination of patent right due to non-payment of annual fee |