CN1469845A - Process for recovering onium hydroxides from solutions containing onium compounds - Google Patents
Process for recovering onium hydroxides from solutions containing onium compounds Download PDFInfo
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- CN1469845A CN1469845A CNA018176461A CN01817646A CN1469845A CN 1469845 A CN1469845 A CN 1469845A CN A018176461 A CNA018176461 A CN A018176461A CN 01817646 A CN01817646 A CN 01817646A CN 1469845 A CN1469845 A CN 1469845A
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- hydroxide
- exchange material
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- quaternary ammonium
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D15/00—Separating processes involving the treatment of liquids with solid sorbents; Apparatus therefor
- B01D15/08—Selective adsorption, e.g. chromatography
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/3092—Recovery of material; Waste processing
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J49/00—Regeneration or reactivation of ion-exchangers; Apparatus therefor
- B01J49/50—Regeneration or reactivation of ion-exchangers; Apparatus therefor characterised by the regeneration reagents
- B01J49/53—Regeneration or reactivation of ion-exchangers; Apparatus therefor characterised by the regeneration reagents for cationic exchangers
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/42—Treatment of water, waste water, or sewage by ion-exchange
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
Abstract
In one embodiment the present invention is a process for recovering an onium hydroxide from a cation exchange material having onium cations adsorbed thereto which comprises (A) contacting said cation exchange material with an aqueous solution of a base selected from alkali metal hydroxides and ammonium hydroxide to form an onium hydroxide, and (B) recovering an aqueous solution of the onium hydroxide. In another embodiment, the present invention relates to a process for recovering an onium hydroxide from a solution containing an onium compound such as an onium hydroxide and/or onium salt, including contacting the solution with a cation exchange material so that at least a portion of onium cations from the onium compound are adsorbed by the cation exchange material; contacting the cation exchange material having the onium cations adsorbed thereto with an aqueous solution of an inorganic base to form an onium hydroxide; and recovering the onium hydroxide solution. The onium hydroxides that can be recovered in this manner include quaternary ammonium hydroxides, quaternary phosphonium hydroxides, and tertiary sulfonium hydroxides.
Description
Technical field
The present invention relates to from the method for the solution regenerated hydrogen oxide compound of inclusion compound.Especially, the present invention relates to use cation exchange material and alkali to reclaim the method for oxyhydroxide from the solution that comprises oxyhydroxide and/or salt.
Background of invention
Oxyhydroxide, as comprise the quaternary ammonium hydroxide of tetramethyl ammonium hydroxide (TMAH) and tetraethyl ammonium hydroxide (TEAH), be known many years strong organic bases.Quaternary ammonium hydroxide has been found various uses, comprised being used for zeolite manufacturing and polymkeric substance manufacturing.The aqueous solution of quaternary ammonium hydroxide, particularly TMAH solution also are widely used as the photographic developer of photoresist material in printed circuit board (PCB) and microelectronic chip manufacturing.Because a variety of causes need minimize the photographic developer total quantity that is used for printed circuit board (PCB) and microelectronic chip manufacturing.A kind of mode that minimizes the hydroxide developer total quantity is to re-use waste developer.Re-using photographic developer reduces volume cost and reduces handling problem.
Waste developer comprises impurity, and impurity comprises ionic impurity and nonionic impurities.Ionic impurity comprises various metallic cations such as sodium, potassium, zinc, nickel, aluminium, copper and calcium; With negatively charged ion such as halogen root, nitrate radical, nitrite anions, carbonate, carboxylate radical, sulfate radical.Nonionic impurities comprises photoresist material, tensio-active agent, amine and many other organic molecules.Waste developer also comprises the hydroxide developer of relative lower concentration.Therefore, continue and to make it to re-use with spendable form efficient recovery hydroxide developer, therefore minimize the photographic developer total quantity that is used for printed circuit board (PCB) and microelectronic chip manufacturing.
U.S. patent 4,714, and 530 people such as () Hale have described the electrolysis process of preparation high purity quaternary ammonium hydroxide, and this method adopts the electrolyzer that comprises by isolating catholyte liquid chamber of cationic exchange membrane and anolyte chamber.Method comprises in the anode electrolyte liquor chamber and adds aqueous quaternary ammonium hydroxide solution, in the catholyte liquid chamber, add entry and with direct current by electrolyzer in the catholyte liquid chamber, to produce quaternary ammonium hydroxide, reclaim quaternary ammonium hydroxide subsequently.' 530 patent has also been described improvement, improves to be included in oxyhydroxide is joined before the anolyte chamber of electrolyzer, at high temperature heats quaternary ammonium hydroxide.
U.S. patent 4,938, and 854 people such as () Sharifian have also described by reducing the electrolysis process of potential halide content purifying quaternary ammonium hydroxide.Electrolyzer can be divided into anolyte chamber and catholyte liquid chamber by separator, and separator can be negatively charged ion or cation selective membrane.Negative electrode in the catholyte liquid chamber comprises zinc, cadmium, tin, lead, copper or titanium, or its alloy, mercury or mercury amalgam.
Japan Kokai patent No.60-131985 (1985) people such as () Takahashi has described the method for making the high purity quaternary ammonium hydroxide in electrolyzer, and electrolyzer is divided into anolyte compartment and cathode compartment by cationic exchange membrane.The quaternary phosphonium hydroxides ammonium solution that will comprise impurity joins in the anolyte compartment, and applies direct current after water being joined cathode compartment between two electrodes.Obtain the quaternary ammonium hydroxide of purifying from cathode compartment.The quaternary ammonium hydroxide of purifying comprises the basic metal of reduction amount, alkaline-earth metal, negatively charged ion etc.
U.S. patent 5,439,564 and 5,545,309 people such as () Shimizu relate to the method that pack processing in the following way contains the waste liq of organic quaternary ammonium hydroxide: contact waste liq and cation exchange material, from the organic quaternary ammonium cation of cation exchange material wash-out be equipped with anode, electrolysis eluate in the two Room electrolyzers of negative electrode and cationic exchange membrane.Obtain the organic hydroxide quaternary ammonium from the cathode compartment of electrolyzer.
U.S. patent 5,968,338 (people such as Hulme) have described the use cation exchange material, are used to form the acid of salt, with be used for the electrochemical cell that the regenerated hydrogen oxide compound comprises at least three chambers, from the method for the solution regenerated hydrogen oxide compound that comprises compound such as oxyhydroxide and salt.
Summary of the invention
In one embodiment, the present invention is a kind of from containing the method that the cationic cation exchange material that is adsorbed onto on it reclaims oxyhydroxide, and this method comprises
(A) this cation exchange material is contacted with the aqueous solution of the alkali that is selected from alkali metal hydroxide and ammonium hydroxide with form oxyhydroxide and
(B) aqueous solution of recovery oxyhydroxide.
In another embodiment, the present invention relates to a kind of method that reclaims oxyhydroxide from the solution of inclusion compound such as oxyhydroxide and/or salt, comprise solution contacted with cation exchange material and make by the positively charged ion of cation exchange material absorption at least a portion from compound, to contain the cationic cation exchange material that is adsorbed onto on it contacts with the aqueous solution of mineral alkali to form oxyhydroxide and to reclaim hydroxide solution.The oxyhydroxide that can adopt this mode to reclaim comprises quaternary ammonium hydroxide, hydroxide quaternary phosphonium or hydroxide uncle sulfonium.
In another embodiment, the present invention relates to reclaim the method for tetraalkylammonium hydroxide from the lean solution that comprises tetraalkyl ammonium compound, comprise lean solution contacted with Zeo-karb making, mineral alkali is contacted so forms tetraalkylammonium hydroxide with cation exchange material by the tetraalkylammonium cation of cation exchange material absorption at least a portion from tetraalkyl ammonium compound; With recovery tetraalkylammonium hydroxide solution.
Because method of the present invention, can obtain the recirculation solution of the oxyhydroxide that wherein concentration and purity increases.The hydroxide solution that circulation has been used not only provides cost savings, and by eliminating or reducing synthetic new hydroxide compound solution, the relevant expensive purifying process and the toxic needs of lean solution effluent provide environmental benefit.In addition, must not store a large amount of chemical.Can be effective to many application by relative high density of oxyhydroxide and the purity that the present invention obtains, wherein need hydroxide solution.
The description of preferred embodiment
In one embodiment, the present invention is a kind of from containing the method that the cationic cation exchange material that is adsorbed onto on it reclaims oxyhydroxide, and this method comprises
(A) this cation exchange material is contacted with the aqueous solution of the alkali that is selected from alkali metal hydroxide and ammonium hydroxide with form oxyhydroxide and
(B) aqueous solution of recovery oxyhydroxide.
This technology is below described in more detail.
In another embodiment of the invention, from solution regeneration (producing purifying or the recovery) oxyhydroxide of inclusion compound such as oxyhydroxide and/or salt.In one embodiment, the solution of inclusion compound is to be used for technology at it, after the developing process relevant with the microelectronic chip manufacturing with printed circuit board (PCB), and the lean solution of oxyhydroxide.Because such technology, impurity enters and foul solution.In other words, the solution of the inclusion compound oxyhydroxide lean solution that may be to use.In another embodiment, the solution of inclusion compound is after it is used for technology, the lean solution of salt.Solution or lean solution can comprise other compound, as impurity above and described below.
The solution of the inclusion compound of handling according to the inventive method is mixture, preferred solution, it comprise oxidable liquid and the about 50wt% compound of about 0.01wt%-with, generally speaking, the not required impurity of one or more of variable quantity, for example, negatively charged ion such as halogen root, carbonate, formate, acetate moiety, nitrite anions, nitrate radical, sulfate radical etc., some positively charged ions such as metal comprise zinc and calcium, sodium, potassium and some neutral substances such as photoresist material, methyl alcohol, amine etc.Oxidable liquid can be water, the mixture of water and organic liquid, or organic liquid.Organic liquid comprises alcohol, as methyl alcohol and ethanol, glycol etc.In one embodiment, the solution of handling according to the present invention comprises the compound of the about 10wt% of about 0.01-.Anywhere, the scope of scope and ratio can make up in this and specification sheets and claim.
In one embodiment, method of the present invention effectively is reduced in the ion that exists in the compound solution and the quantity of nonionic impurities, obtains highly purified oxyhydroxide simultaneously.In further embodiment, method of the present invention causes the reduction of impurity metal ion in the compound solution and organic impurity, obtains highly purified oxyhydroxide simultaneously.In another embodiment, method of the present invention can be used for preparing oxyhydroxide such as quaternary ammonium hydroxide, hydroxide quaternary phosphonium and the hydroxide uncle sulfonium of purifying.
Oxyhydroxide generally can characterize by following general formula
A(OH)
x (I)
Wherein A is that group and x are the integers that equals the A valence mumber.The example of group comprises ammonium group, phosphorus group and sulfonium group.In one embodiment, oxyhydroxide should enough be dissolved in solution such as water, alcohol or other organic liquid, or its mixture is to allow the recovery rate of usefulness.
Quaternary ammonium hydroxide and hydroxide quaternary phosphonium can characterize by following general formula
Wherein A is nitrogen or phosphorus atom, R
1, R
2, R
3And R
4Each is to comprise about 20 of 1-independently, or the alkyl of about 10 carbon atoms of 1-, comprises about 20 of 2-, or the hydroxyalkyl or the alkoxyalkyl of about 10 carbon atoms of 2-, aryl or hydroxyaryl, or R
1And R
2Can form heterocyclic group with A, condition is if heterocyclic group comprises C=A group, R
3It is second key.
Alkyl R
1-R
4Can be that linearity or branching and the object lesson that comprises the alkyl of 1-20 carbon atom comprise methyl, ethyl, propyl group, butyl, amyl group, hexyl, heptyl, octyl group, iso-octyl, nonyl, decyl, isodecyl, dodecyl, tridecyl, isotridecyl, hexadecyl and octadecyl.R
1, R
2, R
3And R
4Also can be all isomer that comprise the hydroxyalkyl of 2-5 carbon atom such as hydroxyethyl and hydroxypropyl, hydroxyl butyl, hydroxyl amyl group etc.In one embodiment, R
1, R
2, R
3And R
4Be the hydroxyalkyl that comprises the alkyl of about 4 or 5 carbon atoms of 1-and/or comprise 2-3 carbon atom independently.The object lesson of alkoxyalkyl comprises ethoxyethyl group, butoxymethyl, butoxy butyl etc.The example of various aryl and hydroxyaryl comprises phenyl, benzyl and the equal group that replaced by one or more hydroxyls of phenyl ring wherein.
The quaternary salt that can handle according to the present invention characterizes by following general formula III
A wherein, R
0, R
2, R
3And R
4I defines as general formula I, X
-The negatively charged ion and the y that are acid are the numerals that equals the X valence mumber.The example of acid anion comprises bicarbonate radical, halogen root, nitrate radical, formate, acetate moiety, sulfate radical, carbonate, phosphate radical etc.
Can represent by following general formula I V according to the quaternary ammonium compound (oxyhydroxide and salt) that the inventive method is handled.
R wherein
1, R
2, R
3, R
4And Y such as general formula III define X
-It is the negatively charged ion of hydroxide radical anion or acid.In one embodiment, R
1-R
4It is the hydroxyalkyl that comprises the alkyl of about 4 carbon atoms of 1-and comprise 2 or 3 carbon atoms.The object lesson of ammonium oxyhydroxide comprises tetramethyl ammonium hydroxide (TMAH), tetraethyl ammonium hydroxide (TEAH), tetrapropylammonium hydroxide, tetrabutylammonium, hydroxide four n-octyl ammoniums, hydroxide methyl triethyl ammonium, diethyldimethylammonhydroxide hydroxide, hydroxide methyl tripropyl ammonium, hydroxide methyltributylammoni,m, cetyltrimethylammonium hydroxide trimethyl ammonium, hydroxide trimethylammonium hydroxyethyl ammonium, hydroxide trimethylammonium methoxy ethyl ammonium, hydroxide dimethyl dihydroxy ethyl ammonium, hydroxide methyl trihydroxy-ethyl ammonium, the hydroxide phenyltrimethyammonium, hydroxide phenyl triethyl ammonium, hydroxide benzyltrimethylammon.um, hydroxide benzyl triethyl ammonium ammonium, the hydroxide dimethyl pyrrolidine, the hydroxide lupetidine, hydroxide di-isopropyl tetrahydroglyoxaline, hydroxide N-alkyl pyridine etc.In one embodiment, the quaternary ammonium hydroxide of handling according to the present invention is TMAH and TEAH.The quaternary ammonium salt of being represented by general formula I V can be similar in appearance to above quaternary ammonium hydroxide, difference be hydroxide radical anion by, for example, replacements such as sulfate anion, chlorine root negatively charged ion, carbonate anion, formate anion, phosphate anion.For example, salt can be Tetramethylammonium chloride, sulfuric acid tetramethyl-ammonium (y=2), tetramethylammonium bromide, phosphofluoric acid 1 methyl-2-butyl imidazole, phosphofluoric acid normal-butyl pyridine etc.
Can handle according to the inventive method, represent wherein that the example of the quaternary phosphonium of the general formula I I of A=P comprises tetramethylphosphonihydroxide hydroxide base phosphorus, hydroxide tetraethyl-phosphorus, hydroxide tetrapropyl phosphorus, tetrabutylphosphoniuhydroxide hydroxide phosphorus, hydroxide trimethylammonium hydroxyethyl phosphorus, hydroxide dimethyl dihydroxy ethyl phosphorus, hydroxide methyl trihydroxy-ethyl phosphorus, hydroxide phenyl trimethylammonium phosphorus, hydroxide phenyl triethyl phosphine and hydroxide benzyl trimethyl phosphorus etc., with corresponding halogenide, vitriol, carbonate, phosphoric acid salt etc.
In another embodiment, can be according to the present invention the oxyhydroxide and the salt of uncle's sulfonium of recovery and purifying can represent by following general formula:
R wherein
1, R
2And R
3, X
-Define with y such as general formula III.
The example of uncle's sulfonium compound of being represented by general formula V comprises the hydroxide trimethylsulfonium, hydroxide triethyl sulfonium, hydroxide tripropyl sulfonium etc. and corresponding salt such as halogenide, vitriol, nitrate, carbonate etc.
Oxyhydroxide can be buied.In addition, oxyhydroxide can be from preparations such as corresponding salt such as corresponding halogenide, carbonate, formate, vitriol.Various preparation methods are described in U.S. patent 4,917,781 people such as () Sharifian and 5,286,354 people such as () Bard, and therefore the document is incorporated herein by reference.To how to obtain or prepare oxyhydroxide have no particular limits.
With before cation exchange material contacts, can optionally concentrate or pre-treatment comprises oxyhydroxide and/or salt and/or impurity in addition solution.That is, in the solution concentration of oxyhydroxide and/or salt can with increase before cation exchange material contacts and/or can remove various impurity from compound solution.
In some embodiments, usefully with the solution that concentrates oxyhydroxide and/or salt before cation exchange material contacts.The program of concentrating is known to those skilled in the art and comprises evaporation, distillation, nanofiltration and reverse osmosis in addition.
In other embodiments, usefully according to the present invention with before cation exchange material contacts, adopt the solution of the filtration pre-treatment compound of some forms.Can carry out various types of filtrations, comprise the filtration of gravity filtration, micro-filtration such as nanofiltration, cross-flow filtration, barrel type filtering, vacuum filtration and pressure inducement.The also coarse filtration that can be correlated with and screening pre-treatment.Filtering membrane can be made up of following material: be used for comprising plastics such as PTFE, PVDF from liquid separation solid known materials, PET, nylon, polyethylene and polypropylene, rhodia, nitrocellulose, regenerated cellulose, Nitrocellulose comprises the paper of ashless paper, comprises the various fibers of glass fibre, with various particulates, comprise gac, silicon-dioxide, sand etc.Perhaps, pre-treatment can comprise the solution of compound and various microparticle material, and for example gac contact makes organic impurity absorption and therefore removes from solution by microparticle material.
In some embodiments, because every kind filtered pre-treatment and can remove different types of impurity, can carry out filtration pre-treatment more than one type (or all over).For example, carry out two in one embodiment and filter pre-treatment: organic impurity is removed by gravity filtration substantially or partly and is being increased pH value of solution, cause that some metal forms insoluble hydroxide salt, therefore promote to filter (with therefore separating of insoluble substance) afterwards, the basic or part of metallic impurity is removed all over gravity filtration by another.
In other embodiments, preferably according to the present invention with before cation exchange material contacts, adopt the solution of the metal treatment pre-treatment compound of some forms.Metal preparation is removed excess metal impurity from the solution of compound.In one embodiment, metal preparation comprises the solution of compound contacted with preliminary ion-exchange material and is used for metal and removes.The preferably preliminary cation exchange material of preliminary ion-exchange material, its alternative distinguishes metallic cation and positively charged ion feasible by at least a portion impurity metal ion in the preliminary ion-exchange material adsorption compound solution.For example, sodium has the preliminary ion-exchange material of avidity to it, can according to the present invention with before cation exchange material contacts, remove sodium as metal preparation with solution from compound.
In another embodiment, metal preparation comprises that the solution with compound contacts with metal complex compounds.Metal complex compounds absorption, bonding, complexing, coordination, therefore at least a portion impurity metal ion in chelating or the other bond compound solution is removing them according to the present invention with before cation exchange material contacts.The example of metal complex compounds comprises crown ether, cryptand and chelate compound (diamines, diketone hydrochlorate etc.).
In another embodiment, metal preparation comprise with the solution of compound with can form insoluble precipitate (insoluble) acid with metallic cation or salt contacts to small part, therefore make it possible to according to the present invention with before cation exchange material contacts easily from the solution disgorging with remove metal thus.
According to the present invention, the solution of inclusion compound is contacted with first cation exchange material, make cation exchange material from solution absorbs positively charged ion (derived from the positively charged ion of oxyhydroxide and/or salt).Cation exchange material can be any ion-exchange material, and its active adsorption is derived from the positively charged ion of compound.Cation exchange material can be Subacidity cation exchange material or highly acidic cation exchange material.The basic thing of cation exchange material can be organic cation exchange material such as Zeo-karb or inorganic cation exchange material such as zeolite, silica gel etc.
The form of cation exchange material can be powder, pellet, particle, film and/or filamentary material.Depend on the characteristic and the performance of compound solution, two or more cation exchange materials can in conjunction with, for example, combination as Subacidity cation exchange material and highly acidic cation exchange material, the combination of inorganic cation exchange material and organic cation exchange material, two or more multi-form cation exchange materials are as the combination of powder and fiber.The operability of given cation exchange material, economy and loading capacity, preferably particle weakly acidic cation-exchange resin and/or storng-acid cation exchange resin.In one embodiment, the cation exchange material with oxonium ion (H+) form is used for the present invention.
The example of useful cation exchange material comprises gelation or porous formed Zeo-karb, this Zeo-karb is by sulfonic acid group or hydroxy-acid group are introduced for example polymkeric substance or the multipolymer basis thing of following material: styrenic polymer or multipolymer such as polystyrene etc., acrylic polymers or multipolymer such as polyacrylic acid resinoid etc., methacrylic polymer or multipolymer such as polymethacrylic acid resin etc. and tetrafluoroethylene base polymer or multipolymer such as tetrafluoroethylene etc., or introduce in the basic thing of polymer-modified or multipolymer that will prepare by adopting polymer-modified or multipolymer such as linking agent such as Vinylstyrene and produce.Cation exchange material further comprises phosphoric acid and phosphorous acid resin and inorganic cation exchange material such as zeolite, silica gel etc.
Object lesson comprises respectively with trade(brand)name AMBERLITE
And DOWEX
Respectively from Rohm ﹠amp; Haas Co. and Dow Chemical Co., the Zeo-karb of sale.Example comprises more specifically: the exchange resin of trade(brand)name AMBERLITE, and as IR-100, IR-105, IR-105 G, IR-112, IR-120, IR-122, IR-124, IRC-50, IRC-76, and IRC-84SP; The resin of trade(brand)name DUOLITE is as from Rohm; The C-280 of Haas Co., C-291, C-433 and C-464; C-464 from Sumitomo Chemical Co.; The resin of trade(brand)name DOWEX, as HGRW2, HCR-S, HGRW2, MWC-1,50WX2, the resin of 50WX4 and 50WX8 and trade(brand)name MONOSPHERE DOWEX, as C350 from DowChemical Co., C500 and C650; Ionac CC and C-267 from Sybron; Various Zeo-karbs from Organo Co.; With those of called after DIAION, as PK216H from Mitsubishi Kasei Corp, PK212, PK228, HPK25, SK-1 BS, SK-104, SK-112, SK-112, SK-116, WK10, WK11, WK20, WK40 and WK100; With Lewatit CNP80 from Bayer.In one embodiment, Zeo-karb is at least a of following material: from Rohm ﹠amp; The IRC-84SP of Haas Co.; From the MONOSPHERE DOWEX C350 of Dow Chemical Co., C500 and C650; From the PK216H of Mitsubishi KaseiCorp, PK212 and WK40 and from the Lewatit CNP80 of Bayer.
According to the characteristic and the form of cation exchange material, the solution that can adopt any known method to be used for comprising oxyhydroxide and/or salt contacts with cation exchange material.For example, can adopt column system, wherein the solution stream of inclusion compound be crossed the post of filling by cation exchange material.Perhaps can adopt batch system, wherein cation exchange material is joined make in the solution of inclusion compound by stir the latter contacted with the former and then filtering mixt so that solid-liquid separation.
To contain the cationic sun of absorption then and contact from the solution of exchange material with mineral alkali such as alkali metal hydroxide or ammonium hydroxide, therefore with the positively charged ion wash-out that adsorbs with remove, form the solution of required oxyhydroxide by it.Adopt therein in the embodiment of column system, can adopt and the mode of stream or adverse current adds alkali in post.
Be used for the solution that alkaline aqueous solution of the present invention can be a mineral alkali.In one embodiment, mineral alkali is alkali metal hydroxide or ammonium hydroxide.In another embodiment, alkali is to be selected from following basic metal highly basic: sodium hydroxide, potassium hydroxide and lithium hydroxide.The alkali that the concentration of alkali can change in wide region and the aqueous solution can comprise about 5%w-about 20 or 25%w generally speaking in the aqueous solution.In one embodiment, the concentration of alkali is about 5-about 12%.
When oxyhydroxide when comprising cationic cationic ion exchange material wash-out, the alkali metal hydroxide or the ammonium hydroxide quantity of wishing to minimize collection.Can reduce the alkali quantity of collection by the concentration of flow that changes alkaline solution and the alkali that contacts cation exchange material.When using ion exchange column, required flow and concentration depend on the characteristic of the characteristic of cation exchange material and alkali and change.Flow and concentration level can be determined by those skilled in the art in each case.
Relative with batch technology, adopt an advantage of ion exchange column to be that technology can carry out with half-continuous process, the solution that wherein specified rate is comprised oxyhydroxide and/or salt can be collected as two or more cuts by ion exchange column pumping and effluent.For example, effluent can be divided into three cuts: first cut can only comprise a small amount of oxyhydroxide; Second cut can comprise the oxyhydroxide of relative high density; (tailings) can comprise the oxyhydroxide of smaller amounts with the 3rd cut.The first and the 3rd cut can be used as that refuse is abandoned or re-uses as described in other places in the specification sheets.For example, the first and the 3rd cut can be used as the source of mineral alkali again.
For for purpose of brevity, following discussion relate to wherein as the situation of three cuts of above-mentioned collection and will comprise high density oxyhydroxide (as, 8-about 15 or 20wt%) middle runnings be considered as the product of technology.
Another advantage of the inventive method is directly to cause as above-mentioned method the formation and the recovery of oxyhydroxide.In some prior art processes of early describing, adopt acid treatment to contain the cationic cation exchange material of absorption, therefore produce salt, must adopt expensive electrolysis or electrodialysis process to handle then salt is changed into required oxyhydroxide.Therefore, because it has eliminated the expensive step in the existing method, method of the present invention is more more economical than the method for prior art.
In some cases, comprise as some base materials and the hydroxide concentration in the aqueous solution of impurity and may not use acceptable level for all from the hydroxide solution that Zeo-karb reclaims according to above the inventive method.According to one embodiment of the invention, from above-mentioned technology (as, from first ion exchange column) oxyhydroxide that reclaims can comprise the undesirable impurity and/or the oxyhydroxide of enough concentration not.Contact with second cation exchange material by the solution that will obtain from above technology (first post), can reduce the level of impurity and the concentration of increase oxyhydroxide with corresponding cationic form.That is, the oxyhydroxide of purifying is TMAH if desire is by contacting with second cation exchange material, and the Zeo-karb in purification step should be the TMA cationic form.Can by with cation exchange material with comprise the Zeo-karb of the aqueous solution contact preparation TMA cationic form of TMAH.Being used for the solution that this purpose comprises TMAH can be the waste streams that comprises TMAH, or comprises the TMAH aqueous solution of greater concn TMAH.The source of TMAH also can be one of the first or the 3rd cut of the first cationic exchange effluent.Should comprise second post clearly, can adopt the mode identical to form with containing absorption cationic first cationic exchange coloum thereon with absorption cationic cation exchange material thereon.Therefore, in one embodiment, enforcement of the present invention can be performed as follows:
1) provides several posts of the parallel connection of the Zeo-karb that comprises hydronium form;
2) will comprise a small amount of (as, 0.5w%) aqueous solution of TMAH be included in first post in contact for the Zeo-karb of hydronium form;
3) abandon effluent and when the resin capacity of Zeo-karb in the post 1 exhausts, the waste materials logistics that will enter post 1 stops and redirect to post 2;
4) aqueous solution that will the comprise TMAH resin capacity that joins the resin in being included in post 2 in the post 2 exhausts, and the aqueous solution logistics that at this moment will comprise TMAH redirect to post 3.Repeating this technology in post 4 grades exhausts up to the aqueous solution;
5) exhausted when having redirect to different posts when the resin capacity in the post 1 with the TMAH aqueous solution, then above-mentioned alkali aqueous solution is joined in the post 1 with from resin elution TMAH with form the aqueous solution of TMAH, this aqueous solution than initial soln comprise still less impurity and the TMAH of greater concn.
Can pass through the Zeo-karb in solution and the post 2 then, this exchange resin comprises the TMA positively charged ion that is adsorbed onto on it now, is further purified and concentrates the TMAH solution (or its cut) that is collected as first effluent.In this step, second post becomes purification column.Be present in sodium cation from the TMAH solution that post 1 reclaims and be adsorbed onto on the resin, form other TMAH with exchange TMA positively charged ion.The TMAH solution that reclaims from second post (that is, purification column) contains sodium and other cation impurity of significantly reduce level, and generally speaking, the level of sodium and other cation impurity is the specification that hundreds of ppb scopes and this material can satisfy some TMAH users.In an example, will be increased to about 15%w in the TMAH concentration the solution that reclaims from second post.
In one embodiment of the invention, comprise less but significant quantity alkali and oxyhydroxide (as, about 3-5% sodium hydroxide and 3-4%TMAH) effluent fraction, can reclaim and use replenishing of the greater concn alkaline solution that acts on the wash-out post.For example, can be that sodium hydroxide crystal (99+% sodium hydroxide) or form are the concentrated sodium hydroxide of commercially available sodium hydroxide enriched material (50% sodium hydroxide) with form, join in the effluent that comprises 3-4% sodium hydroxide to provide, for example, the desired concn of about 10% sodium hydroxide, as the alkaline solution from post wash-out TMAH, the TMA positively charged ion is adsorbed by cation exchange material in this post.Be used to reclaim and utilize the ability of the basic solution that comprises 3-5% sodium hydroxide to cause the remarkable reduction of waste treatment problem, reduce the refuse of sodium hydroxide and reduce the cost and the quantity of the sodium hydroxide of whole processing requirement.
Equally, owing to, be used to re-use by contact (that is, turning back to oxonium ion or the proton form) cation exchange material of easily to regenerate with acid from the metal of alkali or the ion on the ammonium ion replacement cation exchange material.The acid that is used for the cation regenerant exchange material can be selected from mineral acid example hydrochloric acid, Hydrogen bromide, nitric acid, sulfuric acid, carbonic acid, phosphoric acid, phosphorous acid etc. and organic acid such as acetate, formic acid, oxalic acid etc.In one embodiment, Suan pKa less than about 5 and pKa preferably less than about 4.The concentration of acid can change in a wide range and it can be selected from and is higher than about 0.01% to the wide region that is higher than about 20%.In one embodiment, acid mineral acid preferably.The specific examples of useful acid comprises that carbonic acid, hydrochloric acid or concentration are for greater than about 0.05% or greater than about 2.0% dilute sulphuric acid.
Therefore acid is contacted with used cation exchange material, remove metal ion (as, sodium ion) and formation water-soluble metal salt metal.Constitute from the metal-salt of cation exchange material wash-out to small part by the compound that comprises metallic cation (derived from the alkaline solution that initially contacts with used cation exchange material) and negatively charged ion (derived from the acid of the used cation exchange material that is used to regenerate).
In some cases, need be further purified hydroxide solution, it is to obtain during by second cationic exchange coloum when the hydroxide solution that will reclaim from first cationic exchange coloum.For example may need to be further purified oxyhydroxide and be used for specific electronic application.For example, can need to remove impurity metal ion (as, Na
+).Make it can be used for ultrapure application such as semi-conductor manufacturing for being further purified oxyhydroxide, solution can be contacted with the anion-exchange material of hydroxide ion form and/or the three cation exchange material of ionic species.Perhaps, replace the three cation ion-exchange material or except that the three cation ion-exchange material, hydroxide solution can be contacted with the metal ion scavenging agent, this scavenging agent can comprise at least a of following material: chelate compound, nano-porous materials and magnetic help chemical separation (MACS) material.Be used for this technology of method and metal ion scavenging agent and be described in detail in U.S. application No.09/370,682 people such as () Moulton.Perhaps, can by the hydroxide solution that will reclaim with can form insoluble precipitate (insoluble) acid with metallic cation or salt contacts to small part, therefore make it possible to easily from hydroxide solution product disgorging and therefore remove metallic cation, and remove metal ion.These other purification steps are called " playing purifying " at this.
When anionite-exchange resin and Zeo-karb during as ion-exchange material, anionite-exchange resin and Zeo-karb can be mixed with each other and use with the form of the mixture iron exchange resin that loads in post or tower.Yet composition preferably uses with the form of the layered structure that loads in post or tower, and wherein anionite-exchange resin is positioned at upstream side and Zeo-karb is positioned at the downstream side.Yet when hydroxide solution to be processed only comprised the photoresist material of slight amount, Zeo-karb is positioned at upstream side and anionite-exchange resin is positioned at the downstream side.In addition, by the upstream post of anionite-exchange resin filling or tower can with by the downstream column of Zeo-karb filling or tower spaced apart but be used in combination with this downstream column.In the case, when by reduction of long-time operation loading capacity or deterioration, the only a kind of of negatively charged ion and Zeo-karb can be replaced by new resin easily.
The example that can be used for anion-exchange material of the present invention comprises commercially available anionite-exchange resin such as type anionite-exchange resin such as vinylbenzene, acrylic acid or the like, and they can be forms such as fiber, particle.Anion-exchange material can use separately or with a plurality of they use in the form of the mixture of arbitrary proportion or layered structure.Vinylbenzene type anionite-exchange resin is used in particular for removing photoresist material.Acrylic acid or the like type anionite-exchange resin is by adopting those that Vinylstyrene crosslinked (methyl) vinylformic acid such as (DVB) and ester thereof obtain.Strongly basic anion exchange resin also is used to remove photoresist material, but weak base anion-exchange resin also applies the photoresist material removal effect in neutrality or acidic side especially.Therefore, a plurality of strong and weak base anion-exchange resins also can be in the form use of the mixture or the layered structure of arbitrary proportion.Although the counter ion of anionite-exchange resin can be OH-, or Cl-etc., preferably use the anionite-exchange resin of OH form, it contains the OH-ion as counter ion.Such reason is that they contain the Cl-plasma as counter ion, cause at least a portion ionic counter ion to be converted into the Cl-plasma owing to the use of the anionite-exchange resin of forms such as Cl.When neutrality or acidic side are used weak base anion-exchange resin, maybe when the anionite-exchange resin of forms such as use Cl, can salt be changed into hydroxide form again by program well known by persons skilled in the art.
The example that can be used for the cation exchange material of the H ion of ultrapureization of the present invention step or ionic species comprises that above-mentioned cation exchange material and they can be slightly acidics or highly acid.They can use separately or use with the form of a plurality of their mixtures under arbitrary proportion or layered structure.
Commercially available cation exchange material is generally H form or sodium ion form (Na form).Such Zeo-karb (if original preferably be converted into the H form) for the Na form but before it uses initial conversion become form to prevent the generation of following phenomenon: solution by cation-adsorption in the starting stage of Zeo-karb to the Zeo-karb to reduce the concentration of the treatment soln that obtains.More particularly, although it can use with the H form as the form of itself, preferably after changing into cationic form, use Zeo-karb.Yet, also can use not exclusively to form but part is the Zeo-karb of H form, or the Zeo-karb of the Zeo-karb of H form and form is alternately further with the form use of the mixture or the layered structure of arbitrary proportion.
Preferred use adopt alkali aqueous solution and aqueous acid alternate treatment and then the anionite-exchange resin of employing (surpassing) pure water thorough washing or Zeo-karb so that it is provided with any material that can go out from its lixiviate during its working process.
Can be according to various impurity such as photoresist material, other negatively charged ion and cationic permission quantity, these impurity can be stayed want in regenerated hydroxide solution relevant with the use of this solution, determine that anionite-exchange resin and Zeo-karb are any, or both are as ion exchange resin.Yet the regenerated hydrogen oxide solution for example is used as therein, and electronic unit such as above-mentioned semiconducter device under the situation of the photographic developer that liquid-crystal display and printing plate are produced, should use anionite-exchange resin and Zeo-karb.
Following embodiment illustrates method of the present invention.Unless explanation in addition in an embodiment and in specification sheets other places and claim, all umbers and percentages, temperature be degree centigrade and pressure is or near normal atmosphere.
Embodiment 1
Produced by Bayer AG, the commercial Zeo-karb that is designated CNP-80 is used to fill the resin height of 2.2 cm diameter posts to about 53cm.Cation exchange material is regeneration (oxonium ion) form.800ml./hour flow velocity under, be that the waste water solution of 0.5w% tetramethyl ammonium hydroxide (TMAH) passes through resin column with 14 liters of concentration.TMA cation-adsorption in the aqueous solution is to Zeo-karb.Because resin is special to positively charged ion, the negatively charged ion and the organic impurity that are included in rare waste streams pass through resin and can abandon the effluent that comprises the such impurity of greater concn.Use the 10w% aqueous sodium hydroxide solution of 800ml. then, with the TMA positively charged ion from the Zeo-karb wash-out, 200ml./hour flow velocity under post is passed through in this aqueous sodium hydroxide solution pumping.After sodium hydroxide solution be flow velocity be 200ml./hour the 600ml. deionized water.Be divided into 3 independent cuts from cationic exchange coloum as the solution that effluent occurs.The one 200ml. effluent is separated into first effluent.This rare cut that consists of 63ppb (w) sodium and 0.4w% TMAH can re-use or abandon as refuse.Next 600ml. effluent is collected as second effluent separately.It comprises 1.4w% sodium hydroxide and 10%TMAH.This cut is required TMAH solution.At last, collect next 600ml. effluent and this cut comprises 2.5w% sodium hydroxide and 2.2w%TMAH from post.This rare cut can re-use the source of sodium hydroxide (for example as) or abandon as refuse.
Can be under 1500ml./hour flow velocity by the 6.7w% sulfuric acid of 700ml. and 600ml. deionized water subsequently, the cation exchange resin column that is used for this embodiment can prepare and be used to re-use.From then on the solution of collection step comprises 200ppm (w) TMAH and can be used as refuse and abandon.
Embodiment 2
This embodiment illustrates method of the present invention, wherein by being that second cation exchange resin column of TMA ionic species contacts with product solution and resin wherein, is further purified the TMAH solution (second cut) that is recovered as product at embodiment 1.Can be by the program of describing such as embodiment 1, preparing wherein by cation exchange resin column TMAH solution, resin is second cation exchange resin column of TMA cationic form.
Therefore, the 600ml. solution that will be recovered as second effluent and comprise 1wt% sodium hydroxide and 10wt%TMAH in embodiment 1 is by second cation exchange resin column, and wherein resin is CNP-80 and is the TMA cationic form.TMAH by the resin absorption in second post, therefore removes impurity from solution by post and sodium ion and other cation impurity.
What a 200ml. solution that leaves second ion exchange resin column was collected as first effluent and this effluent consists of 26ppm sodium hydroxide and 0.4wt% TMAH.This rare cut can re-use or abandon as refuse.Next 600ml. effluent is collected as second effluent and is considered as process products, and it comprises 14w% TMAH and 200ppb sodium only.The 3rd and the end cuts of 600ml. are collected and found that this cut comprises 3% TMAH and 4% sodium hydroxide.This rare logistics can re-use or abandon as refuse.
1400ml./hour flow velocity under, with the 6.7w% sulfuric acid of 600ml. and 100ml subsequently.Deionized water is by used post, and the cation exchange resin column that preparation is used to re-use.From then on the solution of collection step comprises less than the TMAH of 10ppm by weight and can be used as refuse and abandons.
Embodiment 3
It is resin cation (R.C.) CNP-80 in the 2.0 cm diameter posts of 20cm that this embodiment adopts in resin height.Resin is the regenerated hydronium form.With five liters of concentration is that the lean solution of 0.5w% tetraethyl ammonium hydroxide (TEAH) passes through resin column.TEA cation-adsorption in the aqueous solution is to Zeo-karb.Use the aqueous solution that comprises 10w% sodium hydroxide from resin elution TEAH then, this aqueous solution of pumping passes through post under 100-150ml./hour flow velocity.After sodium hydroxide solution be flow velocity be 100-150ml./hour deionized water.
Be gathered into 3 independent cuts from ion exchange column as the solution that effluent occurs.The one 100ml. effluent is separated into first effluent and this cut comprises 5ppb sodium and 0.05w%TEAH by weight.Next 300ml. effluent is collected as product separately and this effluent comprises 0.6w% sodium hydroxide and 8%TEAH.Collect next 200ml. effluent and find that this cut comprises 2.3w% sodium hydroxide and 1w%TEAH. from post.This rare cut can re-use or abandon as refuse.
Embodiment 4
In this embodiment, be to use the cation exchange material available from Mitsubishi in the 2.2cm diameter post of 53cm in resin height with name WK-40.Cation exchange material is the regeneration hydronium form.With concentration is that the waste water solution (16.7 liters) of 0.48w% TMAH passes through post.TMA cation-adsorption in the aqueous solution is to Zeo-karb.Thereafter, the aqueous solution by will comprising 14w% potassium hydroxide under 200ml./hour flow velocity is by post, and with TMAH from resin elution.After the potassium hydroxide solution is deionized water.The solution that comes out from ion exchange column is collected as 3 independent cuts.The one 200ml. effluent is separated into first effluent and finds that this cut comprises 0.30w% TMAH.This rare cut can re-use or abandon as refuse.Next 600ml. effluent is collected as product and this cut comprises 0.7w% potassium hydroxide and 11.9w% TMAH.Collect next 500ml. effluent and find that this effluent comprises 7.08% potassium hydroxide and 1.1w% TMAH.This rare cut can re-use or abandon as refuse.
Embodiment 5
In this embodiment, the cation exchange material of employing is that the WK-40 and the exchange resin of hydronium form is included in the 2.2cm diameter post that resin height is 53cm.With 16 liters of concentration waste water solution that is 0.5w% TMAH by resin column and TMA cation-adsorption to Zeo-karb.Thereafter, the aqueous solution pumping by will comprising the 6.0w% lithium hydroxide under 200ml./hour flow velocity is by post, and with TMAH from resin elution.After the lithium hydroxide solution is deionized water.Be collected with 3 independent cuts from the solution that ion exchange column occurs as effluent.The one 200ml.Effluent is separated into first effluent and this cut, and to comprise concentration be 0.16w% TMAH.Next 600ml. effluent is collected as product and product comprises 0.03w% lithium hydroxide and 11.3w% TMAH.Collect and abandon the 3rd cut.
Although explained the present invention, should understand that its various improvement are obvious for those skilled in the art when reading specification sheets with regard to its preferred embodiment.Therefore, should understand the present invention disclosed herein and desire to contain the variant that falls in the claims scope.
Claims (34)
1. one kind from containing the method that the cationic cation exchange material that is adsorbed onto on it reclaims oxyhydroxide, and this method comprises
(A) this cation exchange material is contacted with the aqueous solution of mineral alkali with form oxyhydroxide and
(B) aqueous solution of recovery oxyhydroxide.
2. the process of claim 1 wherein that positively charged ion is quaternary ammonium cation, quaternary phosphonium cations or uncle's sulfonium cation
3. the process of claim 1 wherein that positively charged ion is a quaternary ammonium cation.
4. the method for claim 3, wherein quaternary ammonium cation characterizes by following general formula
R wherein
1, R
2, R
3And R
4Each is the alkyl that comprises about 10 carbon atoms of 1-independently, comprises the hydroxyalkyl or the alkoxyalkyl of about 10 carbon atoms of 2-, or aryl or hydroxyaryl, or R
1And R
2Be alkyl, it can form aromatics or non-aromatic heterocyclic with nitrogen-atoms, and condition is if heterocyclic group comprises-C=N-R
3It is second key.
5. one kind from containing the method that the cation exchange material that is adsorbed onto the quaternary ammonium cation on it reclaims quaternary ammonium hydroxide, and this method comprises
(A) this cation exchange material is contacted with the aqueous solution of alkali metal hydroxide with the wash-out quaternary ammonium hydroxide and
(B) aqueous solution of recovery quaternary ammonium hydroxide.
6. the method for claim 5, the quaternary ammonium cation that wherein is adsorbed onto on the cation exchange material characterizes by following general formula
R wherein
1, R
2, R
3And R
4Each is the alkyl that comprises about 10 carbon atoms of 1-independently, comprises the hydroxyalkyl or the alkoxyalkyl of about 10 carbon atoms of 2-, or aryl or hydroxyaryl, or R
1And R
2Be alkyl, it can form aromatics or non-aromatic heterocyclic with nitrogen-atoms, and condition is if heterocyclic group comprises-C=N-R
3It is second key.
7. the method for claim 6, wherein R
1, R
2, R
3And R
4It is the alkyl that comprises 1-5 carbon atom.
8. the method for claim 6, wherein R
1, R
2, R
3And R
4It is the alkyl that comprises 1 or 2 carbon atom.
9. the method for claim 5, wherein alkali metal hydroxide is selected from sodium hydroxide, potassium hydroxide and lithium hydroxide.
10. the method for claim 5, the wherein quaternary ammonium hydroxide that comprises alkali metal hydroxide that will in step (B), reclaim
(C) cation exchange material with the quaternary ammonium cation that contains absorption contacts, the positively charged ion that adsorbs on this quaternary ammonium cation and the cation exchange material that is used for step (A) is identical, therefore be included in that at least a portion alkali metal cation in the solution is adsorbed by cation exchange material and
(D) reclaim and to comprise reduction and measure alkali-metal quaternary phosphonium hydroxides ammonium solution.
11. the method for claim 10 wherein is further purified the quaternary phosphonium hydroxides ammonium solution that reclaims by following mode in step (D):
(E) separately or with any order, or as hybrid mode, the quaternary phosphonium hydroxides ammonium solution that will reclaim in step (D) and the anion-exchange material of OH-form contact with cation exchange material with the quaternary ammonium form, and wherein the quaternary ammonium cation that adsorbs on the cation exchange material in quaternary ammonium cation and the step (A) is identical.
12. the method from the solution recovery oxyhydroxide of inclusion compound comprises
(A) solution with inclusion compound contacts with the cation exchange material of hydrogen form, and compound comprises positively charged ion and negatively charged ion, therefore absorption at least a portion positively charged ion on cation exchange material;
(B) the cationic cation exchange material that will comprise absorption contacts with wash-out oxyhydroxide with the aqueous solution of mineral alkali; With
(C) hydroxide solution of recovery wash-out.
13. the method for claim 12, wherein compound is selected from oxyhydroxide and salt.
14. the method for claim 13, wherein salt is selected from supercarbonate, halogenide, nitrate, formate, acetate, vitriol, carbonate and phosphoric acid salt.
15. the method for claim 12, wherein compound is a quaternary ammonium salt.
16. the method for claim 12, wherein compound is selected from quaternary ammonium hydroxide, hydroxide quaternary phosphonium or hydroxide uncle sulfonium.
17. the method for claim 12, wherein compound is a quaternary ammonium compound.
18. the method for claim 17, wherein quaternary ammonium compound is characterised in that following general formula
R wherein
1, R
2, R
3And R
4Each is the alkyl that comprises about 10 carbon atoms of 1-independently, comprises the hydroxyalkyl or the alkoxyalkyl of about 10 carbon atoms of 2-, or aryl or hydroxyaryl, or R
1And R
2Be alkyl, it can form aromatics or non-aromatic heterocyclic with nitrogen-atoms, and condition is if heterocyclic group comprises-C=N-R
3It is second key; X
-It is the negatively charged ion of hydroxide radical anion or acid; With y be the numeral that equals the X valence mumber.
19. the method for claim 18, wherein X
-Be halogen root, hydroxide radical, sulfate radical, phosphate radical or carbonate anion.
20. the method for claim 18, wherein X
-It is the hydroxyl negatively charged ion.
21. the method for claim 18, wherein R
1, R
2, R
3And R
4It is the hydroxyalkyl that comprises the alkyl of about 4 carbon atoms of 1-or comprise 2-5 carbon atom.
22. the method for claim 18, wherein alkali metal hydroxide is selected from sodium hydroxide, potassium hydroxide and lithium hydroxide.
23. the method for claim 12, the wherein hydroxide solution of the wash-out that comprises alkali metal hydroxide that will reclaim in step (C)
(D) contact with the cationic cation exchange material that contains absorption, therefore by cation exchange material absorption at least a portion alkali metal cation and
(E) recovery comprises the hydroxide solution of the alkalimetal ion of reduction amount.
24. the method for claim 23 wherein is further purified the hydroxide solution that reclaims by following mode in step (E):
(F) separately with any order, or as hybrid mode, the hydroxide solution that will reclaim in step (E) contacts with the anion-exchange material of OH-form and the cation exchange material of form.
25. the method for claim 24 wherein contacts hydroxide solution and contacts with the Zeo-karb of form then with the anion-exchange material of OH-form.
26. one kind is reclaimed the method for quaternary ammonium hydroxide from the aqueous solution that comprises quaternary ammonium compound, comprises
(A) solution that will comprise quaternary ammonium compound contacts with the cation exchange material of hydrogen form, therefore by cation exchange material absorption at least a portion quaternary ammonium cation;
(B) cation exchange material that will comprise the quaternary ammonium cation of absorption contacts with wash-out quaternary phosphonium hydroxides ammonium solution with the aqueous solution of the alkali metal hydroxide that is selected from sodium hydroxide, potassium hydroxide and lithium hydroxide; With
(C) the quaternary phosphonium hydroxides ammonium solution of recovery wash-out, it comprises some alkali metal hydroxides.
27. the method for claim 26, wherein the wash-out quaternary phosphonium hydroxides ammonium solution that comprises the some amount alkali metal hydroxide that will in step (C), reclaim
(D) cation exchange material with the quaternary ammonium form contacts, therefore by at least a portion alkali metal cation in the cation exchange material adsorbent solution; With
(E) reclaim and to comprise reduction and measure alkali-metal quaternary phosphonium hydroxides ammonium solution.
28. the method for claim 26, wherein quaternary ammonium cation is characterised in that following general formula
R wherein
1, R
2, R
3And R
4Each is the alkyl that comprises about 10 carbon atoms of 1-independently, comprises the hydroxyalkyl or the alkoxyalkyl of about 10 carbon atoms of 2-, aryl or hydroxyaryl, or R
1And R
2Be alkyl, it can form aromatics or non-aromatic heterocyclic with nitrogen-atoms, and condition is if heterocyclic group comprises-C=N-R
3It is second key; X is the negatively charged ion of hydroxide radical anion or acid; With y be the numeral that equals the X valence mumber.
29. the method for claim 28, wherein X-is halogen root, hydroxide radical, sulfate radical, phosphate radical, formate, acetate moiety or carbonate anion.
30. the method for claim 28, wherein X
-It is the hydroxyl negatively charged ion.
31. the method for claim 28, wherein R
1, R
2, R
3And R
4It is the hydroxyalkyl that comprises the alkyl of about 4 carbon atoms of 1-or comprise 2-5 carbon atom.
32. the method for claim 26, wherein alkali metal hydroxide is selected from sodium hydroxide, potassium hydroxide and lithium hydroxide.
33. the method for claim 27 wherein is further purified the quaternary phosphonium hydroxides ammonium solution that reclaims by following mode in step (E):
(F) separately or with any order, or as hybrid mode, the quaternary phosphonium hydroxides ammonium solution that will reclaim in step (E) contacts with the anion-exchange material of OH-form and the cation exchange material of quaternary ammonium form.
34. the method for claim 33 wherein contacts the quaternary phosphonium hydroxides ammonium solution and contacts with the Zeo-karb of quaternary ammonium form then with the anion-exchange material of OH-form.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/693,293 | 2000-10-20 | ||
| US09/693,293 US6508940B1 (en) | 2000-10-20 | 2000-10-20 | Process for recovering onium hydroxides from solutions containing onium compounds |
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| Publication Number | Publication Date |
|---|---|
| CN1469845A true CN1469845A (en) | 2004-01-21 |
| CN1236454C CN1236454C (en) | 2006-01-11 |
Family
ID=24784083
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|---|---|---|---|
| CNB018176461A Expired - Lifetime CN1236454C (en) | 2000-10-20 | 2001-09-27 | Process for recovering onium hydroxides from solutions containing onium compounds |
Country Status (15)
| Country | Link |
|---|---|
| US (1) | US6508940B1 (en) |
| EP (1) | EP1337470B1 (en) |
| JP (1) | JP4142432B2 (en) |
| KR (1) | KR100676590B1 (en) |
| CN (1) | CN1236454C (en) |
| AT (1) | ATE312059T1 (en) |
| AU (1) | AU2001296960A1 (en) |
| CA (1) | CA2424110C (en) |
| DE (1) | DE60115704T2 (en) |
| ES (1) | ES2257448T3 (en) |
| HK (1) | HK1059770A1 (en) |
| IL (2) | IL155496A0 (en) |
| MY (1) | MY117670A (en) |
| TW (1) | TWI304795B (en) |
| WO (1) | WO2002034675A1 (en) |
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| CN104744269A (en) * | 2013-12-30 | 2015-07-01 | 塞克姆公司 | Process for improved recovery of onium hydroxide from compositions containing process residues |
| US9233849B2 (en) | 2011-03-03 | 2016-01-12 | Nippon Soda Co., Ltd. | Process for producing fluorine-containing sulfonylimide salt |
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| TWI583658B (en) * | 2013-06-24 | 2017-05-21 | 德山股份有限公司 | Method for producing high-concentration solution of tetraalkylammonium salt |
| CN104744269B (en) * | 2013-12-30 | 2018-08-31 | 塞克姆公司 | The improved method that hydroxide is recycled from the composition comprising process residue |
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Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20020158225A1 (en) * | 2000-12-20 | 2002-10-31 | Gyula Vigh | Buffer compositions with volatile combustion products for use with gas-phase or vapor-phase element-specific detectors |
| WO2004101147A1 (en) * | 2003-05-14 | 2004-11-25 | Wp Engineering Limited | Regeneration method for cation exchangers |
| US7972671B2 (en) * | 2005-09-01 | 2011-07-05 | Riordan Michael A | Electret and card assembly and method of manufacture |
| US7572379B2 (en) * | 2005-09-02 | 2009-08-11 | Sachem, Inc. | Removal of metal ions from onium hydroxides and onium salt solutions |
| JP5100104B2 (en) * | 2006-12-19 | 2012-12-19 | 日本錬水株式会社 | Method for producing ammonium tungstate aqueous solution |
| TW201040133A (en) * | 2009-05-01 | 2010-11-16 | Mega Union Technology Inc | Equipment for recycling tetramethyl ammonium hydroxide and method thereof |
| JP5483958B2 (en) * | 2009-06-03 | 2014-05-07 | 株式会社トクヤマ | Method for producing tetraalkylammonium hydroxide |
| US20130175478A1 (en) * | 2012-01-09 | 2013-07-11 | Noble Ion Llc | Reactive, non-corrosive, and dermal-friendly composition and methods for manufacturing |
| EP3364251A1 (en) * | 2017-02-17 | 2018-08-22 | GS Trading SA | Method for etching photopolymer plates |
| WO2023166999A1 (en) * | 2022-03-03 | 2023-09-07 | 株式会社トクヤマ | Method for manufacturing purified quaternary ammonium compound aqueous solution |
Family Cites Families (26)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB797295A (en) * | 1955-09-21 | 1958-07-02 | Ici Ltd | Improvements in lubrication |
| US4394226A (en) * | 1981-07-28 | 1983-07-19 | Thiokol Corporation | Electrolytic method for producing quaternary ammonium hydroxides |
| JPS60100690A (en) | 1983-11-02 | 1985-06-04 | Tama Kagaku Kogyo Kk | Production of quaternary ammonium hydroxide |
| JPS60131985A (en) | 1983-12-19 | 1985-07-13 | Showa Denko Kk | Manufacture of quaternary ammonium hydroxide of high purity |
| JPS60131986A (en) | 1983-12-19 | 1985-07-13 | Showa Denko Kk | Manufacture of quaternary ammonium hydroxide of high purity |
| JPS61170588A (en) | 1985-01-25 | 1986-08-01 | Tama Kagaku Kogyo Kk | Production of quaternary ammonium hydroxide |
| US4880513A (en) | 1986-06-20 | 1989-11-14 | The Graver Company | Method and apparatus for generating acid and base regenerants and the use thereof to regenerate ion-exchange resins |
| US4714530A (en) | 1986-07-11 | 1987-12-22 | Southwestern Analytical Chemicals, Inc. | Method for producing high purity quaternary ammonium hydroxides |
| US4917781A (en) | 1988-07-20 | 1990-04-17 | Southwestern Analytical Chemicals, Inc. | Process for preparing quaternary ammonium hydroxides |
| JPH0291089A (en) * | 1988-09-29 | 1990-03-30 | Nippon Chem Ind Co Ltd | Production of quaternary phosphonium hydroxide |
| US4938854A (en) | 1988-11-28 | 1990-07-03 | Southwestern Analytical Chemicals, Inc. | Method for purifying quaternary ammonium hydroxides |
| JP3109525B2 (en) | 1990-12-27 | 2000-11-20 | クロリンエンジニアズ株式会社 | Method for regenerating tetraalkylammonium hydroxide |
| US5352345A (en) | 1991-05-07 | 1994-10-04 | Alliedsignal Inc. | Ion exchange resin regenerant waste recovery and recycling via bipolar membranes |
| US5354434A (en) | 1991-07-12 | 1994-10-11 | Chlorine Engineers Corp. Ltd. | Method for regenerating tetraalkylammonium hydroxide |
| JP3110513B2 (en) | 1991-10-16 | 2000-11-20 | クロリンエンジニアズ株式会社 | Method for regenerating tetraalkylammonium hydroxide |
| US5439564A (en) | 1992-11-10 | 1995-08-08 | Tama Chemicals Co. Ltd. | Method of processing organic quaternary ammonium hydroxide-containing waste liquid |
| US5286354A (en) | 1992-11-30 | 1994-02-15 | Sachem, Inc. | Method for preparing organic and inorganic hydroxides and alkoxides by electrolysis |
| JP3360365B2 (en) | 1993-07-29 | 2002-12-24 | クロリンエンジニアズ株式会社 | Method for regenerating tetraalkylammonium hydroxide |
| US5389211A (en) | 1993-11-08 | 1995-02-14 | Sachem, Inc. | Method for producing high purity hydroxides and alkoxides |
| US5833832A (en) | 1996-08-30 | 1998-11-10 | Sachem, Inc. | Preparation of onium hydroxides in an electrochemical cell |
| US5709790A (en) | 1996-10-03 | 1998-01-20 | Sachem, Inc. | Electrochemical process for purifying hydroxide compounds |
| GB2319531B (en) * | 1996-11-21 | 2001-03-07 | Organo Corp | Process for rejuvenation treatment of photoresist development waste |
| US6217743B1 (en) * | 1997-02-12 | 2001-04-17 | Sachem, Inc. | Process for recovering organic hydroxides from waste solutions |
| JP3671644B2 (en) | 1998-01-05 | 2005-07-13 | オルガノ株式会社 | Photoresist developing waste liquid recycling method and apparatus |
| US5968338A (en) | 1998-01-20 | 1999-10-19 | Sachem, Inc. | Process for recovering onium hydroxides from solutions containing onium compounds |
| JP3728945B2 (en) * | 1998-10-30 | 2005-12-21 | オルガノ株式会社 | Method and apparatus for recovering and reusing developer from photoresist developer waste |
-
2000
- 2000-10-20 US US09/693,293 patent/US6508940B1/en not_active Expired - Lifetime
-
2001
- 2001-09-27 ES ES01977876T patent/ES2257448T3/en not_active Expired - Lifetime
- 2001-09-27 EP EP01977876A patent/EP1337470B1/en not_active Expired - Lifetime
- 2001-09-27 AT AT01977876T patent/ATE312059T1/en active
- 2001-09-27 DE DE60115704T patent/DE60115704T2/en not_active Expired - Lifetime
- 2001-09-27 CA CA002424110A patent/CA2424110C/en not_active Expired - Lifetime
- 2001-09-27 KR KR1020037005516A patent/KR100676590B1/en active IP Right Grant
- 2001-09-27 CN CNB018176461A patent/CN1236454C/en not_active Expired - Lifetime
- 2001-09-27 JP JP2002537673A patent/JP4142432B2/en not_active Expired - Lifetime
- 2001-09-27 AU AU2001296960A patent/AU2001296960A1/en not_active Abandoned
- 2001-09-27 IL IL15549601A patent/IL155496A0/en active IP Right Grant
- 2001-09-27 WO PCT/US2001/042429 patent/WO2002034675A1/en active IP Right Grant
- 2001-10-11 MY MYPI20014741A patent/MY117670A/en unknown
- 2001-10-12 TW TW090125197A patent/TWI304795B/en not_active IP Right Cessation
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| US9242862B2 (en) | 2011-02-10 | 2016-01-26 | Nippon Soda Co., Ltd. | Process for production of fluorosulfonylimide ammonium salt |
| US9233849B2 (en) | 2011-03-03 | 2016-01-12 | Nippon Soda Co., Ltd. | Process for producing fluorine-containing sulfonylimide salt |
| CN103732573A (en) * | 2011-10-28 | 2014-04-16 | 德山株式会社 | Method for producing tetraalkylammonium salt solution |
| CN103732573B (en) * | 2011-10-28 | 2016-05-18 | 德山株式会社 | The manufacture method of tetra-allkylammonium salting liquid |
| CN103524461A (en) * | 2012-07-05 | 2014-01-22 | 荒川化学工业株式会社 | A method for manufacturing an epoxy compound and an epoxy compound |
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| CN104744269A (en) * | 2013-12-30 | 2015-07-01 | 塞克姆公司 | Process for improved recovery of onium hydroxide from compositions containing process residues |
| CN104744269B (en) * | 2013-12-30 | 2018-08-31 | 塞克姆公司 | The improved method that hydroxide is recycled from the composition comprising process residue |
| CN110139829A (en) * | 2016-12-02 | 2019-08-16 | 埃科莱布美国股份有限公司 | Poly-aluminium salt and its purposes and zeolite in preparation high-purity colloidal aluminum-silica composite granules |
| CN110139829B (en) * | 2016-12-02 | 2023-10-13 | 埃科莱布美国股份有限公司 | Polyaluminium salts and their use in the preparation of high purity colloidal aluminum-silica composite particles and zeolites |
Also Published As
| Publication number | Publication date |
|---|---|
| ES2257448T3 (en) | 2006-08-01 |
| AU2001296960A1 (en) | 2002-05-06 |
| EP1337470A4 (en) | 2004-11-24 |
| MY117670A (en) | 2004-07-31 |
| KR100676590B1 (en) | 2007-01-30 |
| CN1236454C (en) | 2006-01-11 |
| HK1059770A1 (en) | 2004-07-16 |
| IL155496A (en) | 2006-07-05 |
| IL155496A0 (en) | 2003-11-23 |
| TWI304795B (en) | 2009-01-01 |
| DE60115704D1 (en) | 2006-01-12 |
| JP2004512315A (en) | 2004-04-22 |
| JP4142432B2 (en) | 2008-09-03 |
| US6508940B1 (en) | 2003-01-21 |
| CA2424110C (en) | 2008-12-02 |
| EP1337470B1 (en) | 2005-12-07 |
| DE60115704T2 (en) | 2006-07-27 |
| EP1337470A1 (en) | 2003-08-27 |
| ATE312059T1 (en) | 2005-12-15 |
| WO2002034675A1 (en) | 2002-05-02 |
| CA2424110A1 (en) | 2002-05-02 |
| KR20030059208A (en) | 2003-07-07 |
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