CN1461975A - Exposure method and exposure device - Google Patents
Exposure method and exposure device Download PDFInfo
- Publication number
- CN1461975A CN1461975A CN03138108A CN03138108A CN1461975A CN 1461975 A CN1461975 A CN 1461975A CN 03138108 A CN03138108 A CN 03138108A CN 03138108 A CN03138108 A CN 03138108A CN 1461975 A CN1461975 A CN 1461975A
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- substrate
- pressure
- space
- photomask
- seal member
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
- F16K31/00—Actuating devices; Operating means; Releasing devices
- F16K31/02—Actuating devices; Operating means; Releasing devices electric; magnetic
- F16K31/04—Actuating devices; Operating means; Releasing devices electric; magnetic using a motor
- F16K31/041—Actuating devices; Operating means; Releasing devices electric; magnetic using a motor for rotating valves
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
- F16K27/00—Construction of housing; Use of materials therefor
- F16K27/06—Construction of housing; Use of materials therefor of taps or cocks
- F16K27/067—Construction of housing; Use of materials therefor of taps or cocks with spherical plugs
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
- F16K31/00—Actuating devices; Operating means; Releasing devices
- F16K31/44—Mechanical actuating means
- F16K31/60—Handles
- F16K31/602—Pivoting levers, e.g. single-sided
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
- F16K5/00—Plug valves; Taps or cocks comprising only cut-off apparatus having at least one of the sealing faces shaped as a more or less complete surface of a solid of revolution, the opening and closing movement being predominantly rotary
- F16K5/06—Plug valves; Taps or cocks comprising only cut-off apparatus having at least one of the sealing faces shaped as a more or less complete surface of a solid of revolution, the opening and closing movement being predominantly rotary with plugs having spherical surfaces; Packings therefor
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- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
An exposure device has a substrate support base 2 for supporting the substrate 1 and a hollow seal member 13 which extends surrounding the circumference of the substrate 2. The photomask 6 is mounted on the seal member 13. A 1st space 27 surrounded with the photomask 6 is formed with the substrate support base 2 and seal member 13. A second space 28 is formed in the inside of the hollow seal member 13. When information regarding the size of the substrate 1 is inputted to control means 22 and 29, the first space 27 and a 2nd space 28 are applied with pressure according to the information. The value of the pressure is properly determined so that the photomask 6 comes into uniform contact with the entire surface of the substrate 1.
Description
Technical field
The present invention relates to a kind of connect airtight the configuration be decorated with pattern photomask and the surface be formed with the substrate of photographic layer and by photomask to the substrate irradiation light, thus with exposure method and the exposure device of pattern trasscription mehod on substrate.
Background technology
For example the surface of substrate such as used for printed circuit substrate is not necessarily smooth.If will transcribe the pattern that is drawn on the photomask exactly, then need photomask is connected airtight equably on the whole base plate surface to this irregular substrate surface.Thereby therefore commonly used in the past is that the space between photomask and the substrate is set as method and the device that negative pressure is connected airtight both.
Fig. 2 and Fig. 3 represent this exposure device in the past.Exposure device comprises substrate support platform 2 that is used for support substrate 1 and the annular seal parts 3 that are installed on the substrate support platform 2.
On the surface of substrate 1, be formed with photographic layer.Substrate is supported to be formed with a plurality of attractions hole 4 on the platform 2, and these attract hole 4 to be connected in air pressure source (not shown).By utilizing air pressure source, substrate 1 absorption can be remained in substrate and support on the platform 2 to attracting hole 4 to add negative pressure.If remove this negative pressure, can support platform 2 to take off substrate 1 from substrate.
As shown in Figure 2, the seal member 3 of ring-type extend surround be supported at substrate support on the platform 2 substrate 1 around.As shown in Figure 3, seal member 3 is made of the hollow elastic material.The inside of the seal member 3 of hollow is connected on the not shown air pressure source by passage 5.Supply with by the air that provides by this air pressure source is provided, can change the internal pressure of seal member 3.The seal member 3 that is made of resilient material changes its height according to its internal pressure with from the top externally applied forces.
In seal member 3, support to have photomask 6 in the position of covered substrate 1.Be decorated with the pattern that to transcribe on substrate 1 on the photomask 6.Under the state of Fig. 3, when the sealed parts 3 of photomask 6 are supported and substrate 1 between have the space.Because the peripheral part of photomask 6 is supported by sealing parts 3 with the state that the upper portion with seal member 3 seals, therefore support platform 2, be contained in substrate and support the substrate 1 on the platform 2 and the seal member 3 and the photomask 6 of ring-type by substrate, can constitute airtight space.This is called the 1st space 7.Corresponding, the airtight inner space of the seal member 3 of hollow is called the 2nd space 8.The 1st space is connected on the not shown air pressure source by passage 9.
By regulating, can change the 1st space 7 and the 2nd space 8 internal pressures from the supply pressure level of the air pressure source output that is connected to passage 9 and passage 5.When exposure, the pressure in the 1st space 7 is made as negative pressure, and the pressure in the 2nd space 8 is made as atmospheric pressure or malleation, the photomask 6 that sealed parts 3 are supported descends and connects airtight on the surface of substrate 1.
Yet, in above-mentioned method, can't guarantee to make photomask 6 to connect airtight really on substrate 1.Pressure equilibrium in pressure in the 1st space 7 and the 2nd space 8 is difficult to realize, and all will carries out this highly difficult pressure when changing when the size (length, width and thickness) of substrate 1 at every turn and regulate.
Fig. 4 is the height that can't fully keep photomask 6 peripheral parts because the relative mistake of malleation in the 2nd space 8 is low, and therefore by the effect of negative pressure in the 1st space 7, photomask 6 curves the example of the shape that projects upwards.In case be in this state, between substrate 1 and the photomask 6 air will residually be arranged, be difficult to photomask 6 is connected airtight on the whole surface of substrate 1.
Fig. 5 is because the malleation in the 2nd space is too high relatively, and photomask 6 peripheral parts can't fully descend, thereby by the effect of the interior negative pressure in the 1st space 7, photomask 6 curves the example of the recessed shape that makes progress.Under this state, the peripheral part of substrate 1 does not connect airtight in photomask 6.If under this state, slowly take out the pressure in the 2nd space 8, then when reaching a certain force value, photomask 6 is connected airtight on the whole surface of substrate 1, and residual air not between the photomask 6 of substrate 1.Yet, be difficult to manually finishing for setting trickle operation that this suitable force value carries out, and all will to carry out this operation to the substrate of each different size also be more numerous and diverse.
Therefore considered that around substrate configuration has the scheme with the pad (spacer) of substrate same thickness.By this pad, can prevent the big bending of substrate.Can prevent that also substrate that substrate might take place when supporting the intensity of platform low from supporting the bending of platform.
But, when using the substrate of different size (length, width and thickness), need to change the pad that size is suitable for this substrate.This is a numerous and diverse operation.In addition, if pad selects improperly, perhaps the installation of pad is abundant inadequately, and photomask and substrate are fully connected airtight, and this can become the reason that produces defective products in the exposure-processed.
Summary of the invention
Therefore, the object of the present invention is to provide and a kind ofly the time do not use pad and can photomask evenly be connected airtight in lip-deep exposure method of whole base plate and exposure device by shirtsleeve operation in exposure.
According to the invention provides a kind of exposure method, be connect airtight the configuration be decorated with pattern photomask and the surface be formed with the substrate of photographic layer and by photomask to the substrate irradiation light, with with the exposure method of pattern trasscription mehod on substrate, it is characterized in that having: the substrate of preparing to be used for support substrate is supported platform and makes to be installed in this substrate and to support the seal member of the ring-type on platform and extend to surround to carry to be held in this substrate and to support stage by the seal member that resilient material constituted of hollow structure around the substrate on platform; With the substrate of known its size be placed on described substrate support on the platform by the stage in the seal member of the described ring-type institute area surrounded; Make the photomask that is decorated with pattern be supported at stage on the seal member of described ring-type in the position that covers described substrate; Respectively to supporting platform by described substrate, being supported at that described substrate is supported the seal member of the described substrate on the platform, described ring-type and the 2nd space that is placed in the 1st space that described photomask surrounded on the seal member of described ring-type and constitutes the hollow structure resilient material inside of described seal member provides stage of pressure; And be known force value as described photomask is evenly connected airtight in the whole lip-deep suitable value of the substrate of described known dimensions for pressure respectively in described the 1st space and described the 2nd space.
In addition, according to the invention provides a kind of exposure method, be connect airtight the configuration be decorated with pattern photomask and the surface be formed with the substrate of photographic layer and by photomask to the substrate irradiation light, with with the exposure method of pattern trasscription mehod on substrate, it is characterized in that having: the substrate of preparing to be used for support substrate is supported platform and makes to be installed in this substrate and to support the seal member of the ring-type on platform and extend to surround to carry to be held in this substrate and to support stage by the seal member that resilient material constituted of hollow structure around the substrate on platform; With the substrate of known its size be placed on described substrate support on the platform by the stage in the seal member of the described ring-type institute area surrounded; Make the photomask that is decorated with pattern be supported at stage on the seal member of described ring-type in the position that covers described substrate; Support platform by described substrate, be supported at described substrate and support the seal member of the described substrate on the platform, described ring-type and be placed in the 1st space that described photomask surrounded on the seal member of described ring-type and the stage of the information of the relevant described substrate size of pressure control mechanism input of the pressure separately in the 2nd space of the hollow structure resilient material inside that constitutes described seal member to control; And according to the information that is input into the relevant described substrate size on the described pressure control mechanism, be suitable for making described photomask evenly to connect airtight by this pressure control mechanism setting, and the pressure that sets is offered described the 1st space and described the 2nd space respectively in the pressure in the whole lip-deep the described the 1st and the 2nd space of described substrate.
In the 2nd kind of exposure method, on the described pressure control mechanism except information relevant for described substrate size, also input has the information of the surface state of this substrate of expression, also can be designed to adopt when setting described convenient pressure the information of the surface state of representing this substrate.
And then, according to the invention provides a kind of exposure device, be connect airtight the configuration be decorated with pattern photomask and the surface be formed with the substrate of photographic layer and by photomask to the substrate irradiation light, thus with the exposure device of pattern trasscription mehod on substrate, it is characterized in that having: the substrate that is used for support substrate is supported platform; Make be installed in this substrate support the seal member of the ring-type on platform and extend surround carry be held in that this substrate is supported around the substrate on platform and by hollow structure resilient material constituted can support to be decorated with the seal member of peripheral part of the photomask of pattern; Pressure control mechanism; And support platform by described substrate as pressure control mechanism control, be supported at the described substrate on the described substrate support platform, the seal member of described ring-type, and be supported at the 1st space that described photomask surrounded on the seal member of described ring-type in the position that covers described substrate and constitute the pressure separately in the 2nd space of the hollow structure resilient material inside of described seal member, and by receiving information relevant for described substrate size, according to the information that is received about substrate size, setting is suitable for making described photomask evenly to connect airtight in the pressure in the whole lip-deep the described the 1st and the 2nd space of described substrate, and the pressure that sets is offered described the 1st space and described the 2nd space respectively.
In this exposure device, described pressure control mechanism can have: pressure source, connect this pressure source and described the 1st space the 1st passage, be connected described pressure source and described the 2nd space the 2nd passage, be separately positioned on the described the 1st and the 2nd passage and be used for respectively to the described the 1st and the 2nd space the 1st and the 2nd pressure governor of the pressure through regulating is provided, according to the described information Control the described the 1st of the relevant substrate size of being imported and the control device of the 2nd pressure governor.
And then can be set as described control device and have data processing equipment, this data processing equipment is according to the described information of the relevant substrate size of being imported, calculating is suitable for making described photomask evenly to connect airtight in the pressure in the whole lip-deep the described the 1st and the 2nd space of described substrate, and will send to the described the 1st and the 2nd pressure governor based on this result's output.
Description of drawings
Fig. 1 is the schematic section of an embodiment of exposure device of the present invention
Fig. 2 is the vertical view of exposure device in the past.
Fig. 3 is the sectional view of exposure device in the past.
Fig. 4 is illustrated in the sectional view that connects airtight a sufficient inadequately example between photomask and substrate in the exposure device in the past.
Fig. 5 is illustrated in the sectional view that connects airtight a sufficient inadequately example between photomask and substrate in the exposure device in the past.
Fig. 6 is the diagrammatic top view of another embodiment of exposure device of the present invention.
Fig. 7 is the schematic section of another embodiment of exposure device of the present invention.
Among the figure, the 1-substrate, the 2-substrate is supported platform, 3-seal member, 4-attracts the hole, 5-passage, 6-photomask, 7-the 1st space, 8-the 2nd space, 9-passage, 11-substrate, the 12-substrate is supported platform, 13-seal member, 14-the 1st pressure source (negative pressure source), 15-the 2nd pressure source (positive pressure source), 16-the 1st passage, 17-the 2nd passage, 18-the 3rd passage, 19-the 4th passage, 20-the 1st pressure governor, 21-the 2nd pressure governor, 22-control device, 23-the 1st T-valve, 24-the 2nd T-valve, 25-attracts hole, 26-photomask, 27-the 1st space, 28-the 2nd space, 29-data processing equipment, 30-light, 51,52,53,54-subsidizes parts, 51a, the 53a-passage.
Embodiment
The synoptic diagram of one embodiment of exposure device of the present invention has been shown among Fig. 1.Exposure device comprises that being used for the substrate that support surface is formed with the substrate 11 of photographic layer supports platform 12, is installed in substrate and supports annular seal parts 13 and pressure control mechanism on the platform 12.Pressure control mechanism has: pressure source 14 and 15; The passage 16,17,18 that extends out by these pressure sources, and 19; Be separately positioned on the pressure governor 20 and 21 on passage 16 and 17; Be used to control the control device 22 of these pressure governors 20 and 21.Pressure control mechanism can also have the T- valve 23 and 24 that is separately positioned on passage 16 and 17.The formation of the seal member 13 of substrate support platform 12 and ring-type is identical with substrate support platform 2 and the seal member 3 shown in Fig. 2 and Fig. 3.
The substrate of the substrate 11 that support the past operation transports supports to be formed with on the platform 12 the attraction hole 25 of a plurality of openings in the above.These attract hole 25 to be connected in air pressure source (not shown).Substrate 11 is supported at substrate supports after the certain position on the platform 12, by air pressure source to attracting hole 25 to apply negative pressure, can adsorb thus to keep substrate 11.After finishing exposure, remove the negative pressure that attracts hole 25, can support platform 12 to bear substrate 11 away from substrate, be transported to subsequent processing.
The seal member 13 of ring-type has extension and surrounds substrate 11 endless structure on every side.Seal member 13 is to make by having the hollow elasticity material of shape of cross section that transverse axis is shorter than the flat circle of Z-axis.Being decorated with the photomask 26 that need transcribe in the pattern on the substrate 11 is supported on the seal member 13 in the position of covered substrate 11.The height of flexible seal member 13 depends on its hollow pressure inside and the external force down that is applied by photomask 26.
In Fig. 1, by substrate support platform 12, be supported at substrate support on the platform 12 substrate 11, be installed in that substrate is supported the seal member 13 of the ring-type on the platform 12, the photomask 26 that is supported at sealing state on the seal member 13 of ring-type has formed airtight space.With identical among Fig. 3, this space is called the 1st space 27.Equally, the hollow volume inside with seal member 13 is called the 2nd space 28.The 1st space 27 is connected on the 1st pressure source 14 by the 1st passage 16.On the other hand, the 2nd space 28 is connected on the 2nd pressure source 15 by the 2nd passage 17.The the 1st and the 2nd pressure source 14,15 all can be used as air pressure source.The 1st pressure source 14 can be used as negative pressure source, and the 2nd pressure source 15 is used as positive pressure source.
Regulate by the 1st pressure source 14 and the 2nd pressure source 15 and offer force value on the 1st space 27 and the 2nd space 28 respectively by being arranged on the 1st pressure governor 20 on the 1st passage 16 and being arranged on the 2nd pressure governor 21 on the 2nd passage 17.Depend on control device 22 by the 1st and the 2nd pressure governor 20,21 force value of being regulated.The pressure governor 20,21 of the electric signal that reception is sent from control device 22, with offer pressure on the 1st space 27 and the 2nd space 28 be adjusted to fixed value.
Get back to atmospheric pressure in order to improve the pressure in the 1st space 27 that becomes negative pressure, can utilize i.e. the 2nd pressure source 15 of positive pressure source, in addition, get back to atmospheric pressure, can utilize i.e. the 1st pressure source 14 of negative pressure source in order to reduce the pressure in the 2nd space 28 that becomes malleation.For this reason, can be provided with by be arranged on the 3rd passage 18 that the 1st T-valve 23 on the 1st passage 16 connects the 2nd pressure sources 15 and the 1st space 27 with by being arranged on the 4th passage 19 that the 2nd T-valve 24 on the 2nd passage 17 is connected the 1st pressure source 14 and the 2nd space 28.The action of T- valve 23,24 can utilize the electric signal that is sent by control device 22 to control.
Set out the data processing equipment 29 that is suitable for making photomask 26 evenly connect airtight the pressure in the whole lip-deep the 1st and the 2nd space 27,28 of its substrate 11 and will be transported to the 1st and the 2nd pressure governor 20,21 based on this result's output by control device 22. Pressure governor 20,21 receives after the output that control device 22 sends, and will be adjusted to described setting value from the pressure that pressure source 14,15 is sent, and offer the 1st space 27 and the 2nd space 28.
As the information that is input to data processing equipment 29, can append the information of the surface state of surface substrate 11.During suitable pressure in setting the 1st and the 2nd space 27,28,, photomask 26 is connected airtight more securely on the whole surface of substrate 11 by in information, appending the information of the surface state of representing substrate 11 again about the size of substrate 11.
The following describes effect.Operation is transferred the substrate 11 that the surface is formed with photographic layer in the past, and is positioned on the substrate support platform 12 by in 13 area surrounded of the seal member of ring-type.Suction function is in attracting hole 25, and substrate 11 is adsorbed and is fixed on the substrate support platform 12.The photomask that is decorated with pattern is supported on the seal member 13 at the state that the position of covered substrate 11 coincides with the position with this substrate 11.Information to relevant substrate 11 sizes of data processing equipment 29 inputs.Control device 22 is according to the information of relevant substrate 11 sizes, calculates to set to be suitable for making photomask 26 evenly to connect airtight pressure in the whole lip-deep the 1st and the 2nd space 27,28 of substrate 11.
By to photomask 26 to substrate 11 irradiation light 30, can will be drawn in pattern trasscription mehod on the photomask 26 on substrate 11 thus.Afterwards, for substrate 11 is transported to subsequent processing, must separate from photomask 26.By switching the 1st T-valve 23, the 1st space 27 is linked to each other with the 2nd pressure source 15 as positive pressure source, improving was that negative pressure is the 1st space 27 originally, switch the 2nd T-valve 24 simultaneously, the 2nd space 28 is linked to each other with the 1st pressure source 14 as negative pressure source, and be the 2nd space 28 of malleation originally, bring under the situation energetically of distortion not attended the meeting by reducing, make photomask promptly break away from substrate 11, be in the state of Fig. 1.Afterwards, take down photomask 26, and stop, substrate 11 is supported that from substrate platform 12 is transported to subsequent processing to the suction function that attracts hole 25.
For residual air and both are connected airtight mutually not really between photomask 26 and substrate 11, also can adopt the method that the peripheral part of photomask 26 is slowly fallen from the state of perk as shown in Figure 5.At this moment, be when pressure in making the 1st space 27 becomes negative pressure at first, the pressure that improve in the 2nd space 28 become the malleation value.Afterwards, as shown in Figure 5, photomask 26 is concavity because its peripheral part perk makes progress.At this moment, have only the middle section of substrate 11 to connect airtight in photomask 26.After slowly reducing the pressure in the 2nd space 28 in the seal member 13 from this state, photomask 26 approaches smooth shape, the contact portion of substrate 11 and photomask 26 diffuses to the neighboring area from the middle section of substrate 11 thereupon, and final photomask 26 can evenly connect airtight on the whole surface of substrate 11.
More than narrated by automatic control and provide the method for suitable force value, but also can provide suitable force value by manual operation to the 1st space 27 and the 2nd space 28.At this moment, all to understand the suitable force value that need provide in advance to employed each size to the 1st and the 2nd space.That is, to the substrate of a certain size, if photomask is evenly connected airtight on the whole surface of this size substrate, then needing in advance, which type of force value investigation provides proper to the 1st and the 2nd space.If corresponding to a plurality of size patterns of used substrate, the suitable force value pattern that need provide to the 1st and the 2nd space is provided respectively in advance, can carry out suitable pressure by manual operation and regulate.Pressure is regulated and can be undertaken by direct manual operation the 1st and the 2nd pressure governor 20,21, also can control the 1st and the 2nd pressure governor 20,21 by manual operation control device 22.
When the asperratio of the asperratio of the formed rectangle of seal member of ring-type and substrate obviously not simultaneously, be difficult to photomask is connected airtight on the whole base plate surface.For example, when the formed rectangle of the seal member of ring-type near square, and substrate is elongated when rectangular-shaped, the distance between the limit of substrate and the annular seal parts about with fore-and-aft direction on not too consistent.Therefore, the bending of photomask can't be along same formation around it.In this case when the 1st space and the 2nd space provide pressure respectively, if connect airtight in photomask, can float up at the short brink photomask of substrate at the long side of substrate.Its as a result photomask can't connect airtight fully on the whole surface of substrate.In addition, compare substrate with the formed rectangle of the seal member of ring-type big or small obvious hour, because the distance between the seal member of the limit of substrate and ring-type is bigger, it is big that the bending of photomask also can become.Therefore, only can not fully provide photomask required power with the pressure in the seal member of ring-type.
In Fig. 6 and Fig. 7, represented to be used to solve the above problems another embodiment of exposure device of the present invention a little.In this another embodiment, one side on substrate is supported platform 12, installed by the subsidy parts 51,52,53 and 54 that constitute with the elongated hollow structural elasticity material that parallels of substrate 11.In the illustrated embodiment, be provided with respectively four subsidy parts 51 to 54 that become along substrate 11 quadrilaterals, but, the subsidy parts of more than one arbitrary number can be set according to the size and the shape of used substrate.In addition, in the illustrated embodiment, subsidy parts 51 to 54 are disposed at the inboard of the seal member 13 of ring-type, but also can be configured in the outside.The cross sectional shape of subsidy parts 51 to 54 can be identical with annular seal parts 13, perhaps also can change shape or size.The hollow volume inside of subsidy parts 51 to 54 is called as the 3rd space 55.The 3rd space 55 separately of subsidy parts 51 to 54 utilizes passage (only having represented to be connected in passage 51a and 53a on the subsidy parts 51 and 53 in Fig. 7) separately, and is connected on the pressure source (not shown) by pressure governor (not shown).May be controlled to mutually different pressure.Pressure in the 3rd space 55 separately in the subsidy parts 51 to 54 is controlled by control device 22.After the information of input size of relevant substrate 11 and presentation surface state is in data processing equipment 29, control device 22 is set according to these information calculations and is suitable for making photomask 26 evenly to connect airtight pressure in whole lip-deep the 1st, the 2nd and the 3rd space 27,28,55 of substrate 11, and the pressure that will set offers these spaces 27,28,55 afterwards.In each subsidy parts 51 to 54, the pressure in the 3rd space 55 can individually be set and provide.
In this embodiment, shape or size according to substrate, when the bending on each limit of photomask has nothing in common with each other or is excessive, also, therefore can act on suitable power to each limit of photomask corresponding to amount of bow owing to act on the photomask with the form of replenishing by the uniform force that pressure was brought in the seal member 13 of ring-type by indivedual power that pressure brought of subsidizing in the parts 51 to 54.
According to the present invention, because pad the time is not used in exposure, therefore can not take place by the selection of pad and ill-exposed that failure is caused is installed, also need not carry out numerous and diverse operations such as pad installation.
In addition, only utilize, photomask is evenly connected airtight on the whole surface of substrate to pressure control mechanism input this simple operation relevant for the information of substrate size.
Operation when therefore, the present invention is very beneficial for improving exposure and the bad incidence of reduction.
Claims (9)
1. exposure method, be connect airtight the configuration be decorated with pattern photomask and the surface be formed with the substrate of photographic layer and by photomask to the substrate irradiation light, with with the exposure method of pattern trasscription mehod on substrate, it is characterized in that having: the substrate of preparing to be used for support substrate is supported platform and makes to be installed in this substrate and to support the seal member of the ring-type on platform and extend to surround to carry to be held in this substrate and to support stage by the seal member that resilient material constituted of hollow structure around the substrate on platform; With the substrate of known its size be placed on described substrate support on the platform by the stage in the seal member of the described ring-type institute area surrounded; Make the photomask that is decorated with pattern be supported at stage on the seal member of described ring-type in the position that covers described substrate; Respectively to supporting platform by described substrate, being supported at that described substrate is supported the seal member of the described substrate on the platform, described ring-type and the 2nd space that is placed in the 1st space that described photomask surrounded on the seal member of described ring-type and constitutes the hollow structure resilient material inside of described seal member provides stage of pressure; And be known force value as described photomask is evenly connected airtight in the whole lip-deep appropriate value of the substrate of described known dimensions for pressure respectively in described the 1st space and described the 2nd space.
2. exposure method, be connect airtight the configuration be decorated with pattern photomask and the surface be formed with the substrate of photographic layer and by photomask to the substrate irradiation light, with with the exposure method of pattern trasscription mehod on substrate, it is characterized in that having: the substrate of preparing to be used for support substrate is supported platform and makes to be installed in this substrate and to support the seal member of the ring-type on platform and extend to surround to carry to be held in this substrate and to support stage by the seal member that resilient material constituted of hollow structure around the substrate on platform; With the substrate of known its size be placed on described substrate support on the platform by the stage in the seal member of the described ring-type institute area surrounded; Make the photomask that is decorated with pattern be supported at stage on the seal member of described ring-type in the position that covers described substrate; Support platform by described substrate, be supported at described substrate and support the seal member of the described substrate on the platform, described ring-type and be placed in the 1st space that described photomask surrounded on the seal member of described ring-type and the stage of the information of the relevant described substrate size of pressure control mechanism input of the pressure separately in the 2nd space of the hollow structure resilient material inside that constitutes described seal member to control; And according to the information that is input into the relevant described substrate size on the described pressure control mechanism, be suitable for making described photomask evenly to connect airtight by this pressure control mechanism setting, and the pressure that sets is offered described the 1st space and described the 2nd space respectively in the pressure in the whole lip-deep the described the 1st and the 2nd space of described substrate.
3. exposure method according to claim 2, it is characterized in that, on the described pressure control mechanism except information relevant for described substrate size, also input has the information of the surface state of this substrate of expression, also adopts the information of the surface state of this substrate of expression when setting described convenient pressure.
4. exposure device, be connect airtight the configuration be decorated with pattern photomask and the surface be formed with the substrate of photographic layer and by photomask to the substrate irradiation light, with with the exposure device of pattern trasscription mehod on substrate, it is characterized in that having: the substrate support platform that is used for support substrate; Make be installed in this substrate support the seal member of the ring-type on platform and extend surround carry be held in that this substrate is supported around the substrate on platform and by hollow structure resilient material constituted can support to be decorated with the seal member of peripheral part of the photomask of pattern; Pressure control mechanism; And support platform by described substrate as pressure control mechanism control, be supported at the described substrate on the described substrate support platform, the seal member of described ring-type, and be supported at the 1st space that described photomask surrounded on the seal member of described ring-type in the position that covers described substrate and constitute the pressure separately in the 2nd space of the hollow structure resilient material inside of described seal member, and by receiving information relevant for described substrate size, according to the information that is received about substrate size, setting is suitable for making described photomask evenly to connect airtight in the pressure in the whole lip-deep the described the 1st and the 2nd space of described substrate, and the pressure that will set offers described the 1st space and described the 2nd space respectively.
5. exposure device according to claim 4, it is characterized in that described pressure control mechanism has: pressure source, connect this pressure source and described the 1st space the 1st passage, be connected described pressure source and described the 2nd space the 2nd passage, be separately positioned on the described the 1st and the 2nd passage and be used for respectively to the described the 1st and the 2nd space the 1st and the 2nd pressure governor of the pressure through regulating is provided, according to the described information Control the described the 1st of the relevant substrate size of being imported and the control device of the 2nd pressure governor.
6. exposure device according to claim 5, it is characterized in that, described control device has data processing equipment, this data processing equipment is according to the information of the relevant substrate size of being imported, calculating is suitable for making described photomask evenly to connect airtight in the pressure in the whole lip-deep the described the 1st and the 2nd space of described substrate, and will send to the described the 1st and the 2nd pressure governor based on this result's output.
7. exposure method according to claim 1, it is characterized in that, also have except the seal member of described ring-type and also to prepare to be installed in the stage that described substrate is supported on the platform and is parallel at least one subsidy parts that the resilient material by the elongate hollow structure on one side of substrate constitutes, and in the stage that described pressure is provided, also provide pressure, and the pressure that provides to described the 3rd space is known force value as described photomask is evenly connected airtight in the whole lip-deep appropriate value of the substrate of known its size to the 3rd space of the resilient material inside of the hollow structure that constitutes described subsidy parts.
8. according to the exposure method described in claim 2 or 3, it is characterized in that, also have except the seal member of described ring-type and also to prepare to be installed in the stage that described substrate is supported on the platform and is parallel at least one subsidy parts that the resilient material by the elongate hollow structure on one side of substrate constitutes, and, described pressure control mechanism is also controlled the pressure in the 3rd space of the resilient material inside of the hollow structure that constitutes described subsidy parts, described pressure control mechanism is according to the information about described substrate size that is input on this pressure control mechanism, setting is suitable for making described photomask evenly to connect airtight in the pressure in whole lip-deep described the 3rd space of described substrate, and the pressure that will set offers described the 3rd space.
9. exposure device according to claim 4, it is characterized in that, also have and be installed in described substrate and support on the platform and be parallel at least one subsidy parts that the resilient material by the elongate hollow structure on one side of substrate constitutes, and described pressure control mechanism is set as also to be controlled the pressure in the 3rd space of the resilient material inside of the hollow structure that constitutes described subsidy parts, described pressure control mechanism is set as according to the information about described substrate size that is input on this pressure control mechanism, setting is suitable for making described photomask evenly to connect airtight in the pressure in whole lip-deep described the 3rd space of described substrate, and the pressure that will set offers described the 3rd space.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP156030/2002 | 2002-05-29 | ||
| JP2002156030 | 2002-05-29 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1461975A true CN1461975A (en) | 2003-12-17 |
| CN1265247C CN1265247C (en) | 2006-07-19 |
Family
ID=29772403
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB031381081A Expired - Fee Related CN1265247C (en) | 2002-05-29 | 2003-05-27 | Exposure method and exposure device |
Country Status (3)
| Country | Link |
|---|---|
| KR (1) | KR101024180B1 (en) |
| CN (1) | CN1265247C (en) |
| TW (1) | TWI329789B (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102130035A (en) * | 2009-12-30 | 2011-07-20 | 塔工程有限公司 | Integrated chip tray |
| CN101794077B (en) * | 2009-02-03 | 2012-02-29 | 王氏港建经销有限公司 | Operating platform and method of automatically installing shims |
| CN101419409B (en) * | 2007-10-26 | 2013-06-05 | 株式会社阿迪泰克工程 | Exposure device and rectification device of baseal plate |
| CN105388701A (en) * | 2015-12-01 | 2016-03-09 | 深圳市和誉达科技有限公司 | Printing-down method for screen printing plate |
| CN107346803A (en) * | 2016-05-05 | 2017-11-14 | 上海珏芯光电科技有限公司 | The manufacture method of silicon substrate backboard light-emitting diode display |
| CN111913363A (en) * | 2019-05-09 | 2020-11-10 | 株式会社阿迪泰克工程 | Direct writing type exposure device |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4892859B2 (en) * | 2005-04-20 | 2012-03-07 | ウシオ電機株式会社 | Polarized light irradiation device |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01139237U (en) * | 1988-03-15 | 1989-09-22 | ||
| JP2000081707A (en) | 1998-09-03 | 2000-03-21 | Adtec Engineeng Co Ltd | Aligner |
| KR20020071841A (en) * | 1999-09-01 | 2002-09-13 | 산에이 기껜 가부시키가이샤 | Substrate supporting table of exposure system |
| JP2001305744A (en) | 2000-04-20 | 2001-11-02 | Dainippon Screen Mfg Co Ltd | Contact exposure device |
-
2003
- 2003-05-26 TW TW092114162A patent/TWI329789B/en not_active IP Right Cessation
- 2003-05-27 CN CNB031381081A patent/CN1265247C/en not_active Expired - Fee Related
- 2003-05-28 KR KR1020030034097A patent/KR101024180B1/en not_active IP Right Cessation
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101419409B (en) * | 2007-10-26 | 2013-06-05 | 株式会社阿迪泰克工程 | Exposure device and rectification device of baseal plate |
| CN101794077B (en) * | 2009-02-03 | 2012-02-29 | 王氏港建经销有限公司 | Operating platform and method of automatically installing shims |
| CN102130035A (en) * | 2009-12-30 | 2011-07-20 | 塔工程有限公司 | Integrated chip tray |
| CN105388701A (en) * | 2015-12-01 | 2016-03-09 | 深圳市和誉达科技有限公司 | Printing-down method for screen printing plate |
| CN107346803A (en) * | 2016-05-05 | 2017-11-14 | 上海珏芯光电科技有限公司 | The manufacture method of silicon substrate backboard light-emitting diode display |
| CN111913363A (en) * | 2019-05-09 | 2020-11-10 | 株式会社阿迪泰克工程 | Direct writing type exposure device |
| CN111913363B (en) * | 2019-05-09 | 2024-05-17 | 株式会社阿迪泰克工程 | Direct-writing type exposure device |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20040012457A (en) | 2004-02-11 |
| TW200400783A (en) | 2004-01-01 |
| CN1265247C (en) | 2006-07-19 |
| KR101024180B1 (en) | 2011-03-22 |
| TWI329789B (en) | 2010-09-01 |
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