CN1441081A - Small substrate baffle for organic luminous film plating machine with automatic recognition function - Google Patents
Small substrate baffle for organic luminous film plating machine with automatic recognition function Download PDFInfo
- Publication number
- CN1441081A CN1441081A CN 03111338 CN03111338A CN1441081A CN 1441081 A CN1441081 A CN 1441081A CN 03111338 CN03111338 CN 03111338 CN 03111338 A CN03111338 A CN 03111338A CN 1441081 A CN1441081 A CN 1441081A
- Authority
- CN
- China
- Prior art keywords
- substrate
- small front
- recognition function
- automatic recognition
- pull
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Images
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
The present invention relates to machines and is especially a small baffle installed before the substrate holder of organic luminous film plating machine and with automatic recognition function. The small substrate baffle consists of a baffle comprising two semi-circular plates one a support board and rotating synchronous with the substrate holder, a magnetically driven manipulator, a pull-push control plate, a sensor, a position detector and an automatic recognition circuit. The small substrate baffle may be used in controlling the filming conditions of corresponding substrate conveniently so as to make several samples with one experiment period and raise the work efficiency of the film plating machine effectively.
Description
Technical field
The invention belongs to mechanical field, be specifically related to a kind of preceding small front apron of organic light emission coating equipment substrate frame that is installed on automatic recognition function.
Background technology
As shown in Figure 1, be the synoptic diagram of the most basic a kind of organic vacuum coating system that uses now.The effect of system's each several part and name are called: vacuum chamber 9 through vacuum lead 1 vacuumize reach requirement after, by contact conductor 2 energising preheatings, the big baffle plate 6 of substrate is closed in the pollution when substrate 7 is subjected to pre-thermal evaporation sources in advance to evaporation source 3.Planetary rotary substrate frame 8 can guarantee that the film forming on the substrate 7 is even.Substrate frame revolving power mechanism 10 is devices of rotation of control substrate and speed governing, and planetary rotary substrate frame 8 and substrate 7 are revolved round the sun synchronously around central shaft 13, makes substrate 7 rotations simultaneously.Can observe the working condition in the vacuum chamber 9 by glass window 5, quick operating valve 11 is in order to load and unload substrate and plating material fast.Connect glove box window 4 and be after having plated film and substrate to be sent to the encapsulation that glove box carries out device.
Explore and define the organic electro luminescent condition, the high-quality sample that needs to design and make a large amount of different ingredients and combination compares.Substrate frame with planetary rotation mode is owing to its coating quality evenly is used widely.But up to this point on the planetary rotary substrate frame of the organic film plating machine of this pattern,, in an experimental period, can only make a kind of sample no matter place several substrates.This is because each substrate all is exposed under the identical experiment condition fully, same evaporation in the cycle each on-chip film material structure and composition identical, do not reach and in same experimental period, select different experimental conditions to make the purpose of various sample.Yet the installation small front apron is controlled separately and is extremely difficult below position, substrate hole.So this is a problem that is not resolved for a long time.Thereby can only slowly in an experimental period, make a kind of sample, in another experimental period, make another kind of sample, make useful data of acquisition will spend a large amount of time and material resources, this is one of bottleneck of restriction raising vacuum organic film plating research work efficient.
Summary of the invention
Purpose of the present invention is exactly that one group of little plate washer with automatic recognition function is provided below substrate, and each little plate washer can be controlled the plated film condition of corresponding substrate easily, thereby is implemented in the purpose of making a plurality of samples in the experimental period.
The little plate washer of substrate with automatic recognition function of the present invention by be installed in two semicircles on the supporting plate can folding and with substrate frame synchronously substrate small front apron, magnetictransmission mechanical manipulator, push-and-pull switchboard, transmitter and the position sensor and the automatic identification circuit that constitute of the flat board of revolution constitute.
Description of drawings
Fig. 1: vacuum organic film plating machine structural representation in the prior art;
Fig. 2: vacuum organic film plating machine structural representation of the present invention;
Fig. 3: the little plate washer mounting structure of substrate synoptic diagram;
Fig. 4: little plate washer distributed architecture synoptic diagram on the supporting plate;
Fig. 5: magnetic drive device working state schematic representation;
Fig. 6: automatic identification circuit synoptic diagram;
Fig. 7 (a): position sensor scheme of installation;
Fig. 7 (b): position sensor, transmitter scheme of installation.
Embodiment
Specifically, as shown in Figure 2, the present invention is between 8 substrate 7 and the big baffle plate 6 of substrate on the planetary rotary substrate frame, is provided with supporting plate 12, supporting plate 12 is installed on the hollow shaft 13 of planetary rotary substrate frame 8, with 8 rotations synchronously on the planetary rotary substrate frame.The little plate washer of substrate is installed on supporting plate 12, and the position of each little plate washer is corresponding with the position, hole of each substrate, and the little plate washer of each substrate can be controlled corresponding on-chip plated film in an experimental period.Like this, on the planetary rotary substrate frame 8 of same vacuum chamber a plurality of substrates (＞=2) just can be set, a plurality of little plate washers correspondingly are set on supporting plate 12, a plurality of little plate washers are to arrange around the symmetric form of hollow shaft (13).Just can control by the little plate washer of folding, thereby can in an experimental period, obtain a plurality of samples, improve the working efficiency of coating equipment effectively processing condition such as each substrate coating time and Coating Materials compositions.The quantity of substrate and little plate washer is advisable with 2,3,4,5,6,8, is the best with 3,4,5.
The present invention is an example with the organic vacuum coating machine with 4 substrates, and inventive point of the present invention is the structure of little plate washer, and irrelevant with the number of substrate, the little plate washer that every application is identical or close with the present invention is all within protection scope of the present invention.
Shown in accompanying drawing 3 and accompanying drawing 4,4 small front apron symmetries are installed on the round pallet 12, and 4 small front aprons all are to be combined by two that radially separate along supporting plate 12 semicircular baffle plates 37.Each semicircle small front apron 37 all is separately fixed on supporting plate 12 and the push-and-pull switchboard 38 with dead axle 34 and moving axis 35.Guidepost 39 and dead axle 34 are to limit the direction of motion of push-and-pull switchboard 38 and distance, and push-and-pull switchboard 38 can only be along supporting plate 12 radial motions.On the moving axis 35 of two semicircle small front aprons 37, be with spring 36, spring 36 can make the small front apron 37 can both self-locking under the state that opens and closes, and can not close voluntarily or open in the process with supporting plate 12 and planetary rotary substrate frame 8 revolution to guarantee two semicircle small front aprons 37.
For the auto-lock function of spring, can do following understanding: when the right side of spring 36 at dead axle 34, little plate washer 37 is in closing condition, and at this moment spring tightly hauls two little plate washers, and little plate washer can oneself not opened; When push-and-pull switchboard 38 along guidepost 39 and dead axle 34 during to left movement, little plate washer is opened, spring 36 is that cover hangs on the moving axis 35, thereby spring 36 is pulled to the left side of dead axle 34, remain the little plate washer that hauls tightly, so no matter be the opened condition or the closing condition of corresponding little plate washer, spring all has auto-lock function.
Little plate washer folding control device is made up of magnetictransmission mechanical manipulator 31, magnetic force connecting rod 32, one end of magnetic force connecting rod 32 is positioned at the vacuum chamber outside, the other end and magnetictransmission mechanical manipulator 31 interlocks, thereby can fully guarantee under the constant situation of vacuum chamber vacuum condition, pass through to handle magnetic force connecting rod 32 in the vacuum chamber outside, interlock magnetictransmission mechanical manipulator 31 is controlled opening or closing of each little plate washer again, and this just realized in an experimental period, obtained the purpose of various sample.Fig. 5 is the schematic diagram of movements that expression small front apron 37 is opened and closed, when the end of magnetictransmission mechanical manipulator 31 is in the outside of push-and-pull switchboard 38, upwards promote the magnetic force connecting rod 32 of magnetictransmission mechanical manipulator 31, the end of mechanical manipulator 31 promotes push-and-pull switchboard 38 and moves right, rotate around dead axle 34 thereby drive small front apron 37, small front apron 37 is closed; When the end with mechanical manipulator 31 moved to the right side of push-and-pull switchboard 38, when pressing down the magnetic force connecting rod 32 of magnetictransmission mechanical manipulator 31, the end of mechanical manipulator 31 pushed away push-and-pull switchboard 38 left to left movement, thus the operation that has realized opening small front apron 37.
When utilizing after organic vacuum coating machine of the present invention finishs a sample (establishing this sample is 1#), in the time of making the 2# sample, want certainly earlier the substrate small front apron of sample 1# correspondence is closed, again the substrate small front apron of sample 2# correspondence is opened.Open or close the little plate washer of substrate no matter be, all need to make earlier the rotation of planetary rotary substrate frame 8 to stop, at this moment 1# substrate and following small front apron thereof will be parked in the optional position at random for the magnetic force connecting rod 32 that is installed in the vacuum plating unit fixed position, need with the substrate of 1# sample correspondence and small front apron finds and it is moved to the below of the magnetictransmission mechanical manipulator 31 that is connected with magnetic force connecting rod 32.This work is gone to observe and sought by glass window 5 and operates by substrate frame power rotating mechanism 10 with hand more obviously is pretty troublesome, then can rapid and precisely finish this operation by a substrate automatic identification equipment.The substrate automatic identification equipment is made of transmitter, position sensor and automatic identification circuit, thereby realizes selecting fast automatically the purpose of substrate.
The substrate automatic identification equipment is made of with the same number of position sensor of substrate and an automatic identification circuit 1 transmitter.Shown in Fig. 7 (a), 7 (b), transmitter 44 be installed in planetary rotary substrate frame 8 above, position corresponding with position, a certain substrate 7 hole (assert that it is the 1# sample) is near the internal surface of vacuum chamber upper flange plate top cover 33.This transmitter must be suitable for working under vacuum condition, and its signal can see through metal, and for example magnet steel is exactly a kind of transmitter commonly used.In the outside of true chamber upper flange plate top cover 33,4 detectors 45 that can accept the magnetic force signal that transmitter sends be distributed in symmetrically with the same circumference of transmitter on, the position of one of them position of detector and magnetic force connecting rod 32 is radially same.In the specific design process of vacuum chamber, make transmitter and detector at a distance of near more good more, can accept enough big signal to guarantee detector.
The substrate automatic identification circuit as shown in Figure 6.The purpose of this circuit is in order to discern substrate to be selected and it to be moved to the below of magnetictransmission mechanical manipulator 31, and the electromotor control circuit of automatic identification circuit and planetary rotary substrate frame combines.
(frame A) is the electromotor control circuit of planetary rotary substrate frame in the solid-line rectangle frame above in Fig. 6 schematic circuit, all is substrate automatic identification circuit (frame B) in the whole strokes and dots wire frame, and frame C is the connection circuit of position sensor and automatic identification circuit.
The principle of work of automatic identification circuit is summarized as follows.In frame A, K4 is " work/identification " knob, and pressing down is planetary substrate frame 8 work, and At time of eject is that substrate 7 is discerned automatically.After pressing K4, press the K3 knob again, then planetary substrate frame 8 is just started working, and ejects the then planetary substrate frame 8 of K3 and quits work.
In rotary course, when selecting a certain substrate (as 1#), in the time of need opening or closing small front apron, eject the K3 button earlier, the rotation of planetary rotary substrate frame 8 is stopped, eject K4 again, start automatic identification circuit, and then press K5 (corresponding 1# substrate) knob, at this moment J1-1, J1-2 and J1-3 closure are for identification is ready to working conditions.Press K3 (power supply " ON "), electric motor begins to rotate, when transmitter forwards position sensor 1 to, with detector 1 closure, make relay J 5 work, the normally closed contact of J5-1 is opened, electric motor is quit work, at this moment, the position, hole of 1# substrate just in time forward to magnetictransmission mechanical manipulator 31 below.After this automatic identification equipment has been arranged, can increase work efficiency significantly, it is very convenient to operate.
Claims (5)
1, have the organic light emission coating equipment substrate small front apron of automatic recognition function, it is characterized in that:
1. by two semicircular substrate small front aprons (37), push-and-pull switchboard (38), magnetictransmission machine
Tool hand (31), automatic identification equipment are formed;
2. semicircle little plate washer (37) together is installed on the supporting plate (12) with push-and-pull switchboard (38),
Little plate washer is positioned at below, substrate (7) position, hole, and supporting plate (12) is installed in planetary rotation base
On the hollow shaft (13) of horse (8), be positioned between substrate (7) and the big plate washer (6),
Rotate synchronously with planetary rotary substrate frame (8);
3. each semicircle little plate washer (37) is separately fixed at holder with dead axle (34) and moving axis (35)
On plate (12) and the push-and-pull switchboard (38);
4. magnetictransmission mechanical manipulator (31) is installed in the fixed position of vacuum chamber, by the push-and-pull switchboard
(38) folding of two little plate washers of semicircle of realization;
5. automatic identification equipment is made of transmitter, position sensor and automatic identification circuit, transmitter
(44) be installed in planetary rotary substrate frame (8) above, the position is corresponding to some
Substrate is installed in vacuum chamber ring flange top with the same number of position sensor of substrate (45)
The outside of lid (33), with transmitter with circumference and symmetrical distribution, one of them position is visited
The magnetic force connecting rod (32) of surveying device and magnetictransmission mechanical manipulator (31) is radially same.
2, the organic light emission coating equipment substrate small front apron with automatic recognition function as claimed in claim 1, it is characterized in that: at supporting plate (12) guidepost (39) is installed also, guidepost (39) is positioned on the medullary ray of push-and-pull switchboard (38).
3, the organic light emission coating equipment substrate small front apron with automatic recognition function as claimed in claim 1 or 2 is characterized in that: be with spring (36) on the moving axis (35) of two semicircle small front aprons (37).
4, the organic light emission coating equipment substrate small front apron with automatic recognition function as claimed in claim 1, it is characterized in that: described magnetictransmission mechanical manipulator (31) is by magnetic force connecting rod (32) interlock outside vacuum chamber.
5, the organic light emission coating equipment substrate small front apron with automatic recognition function as claimed in claim 1, it is characterized in that: described transmitter is a magnet steel, detector is a dry-reed tube, and the electromotor control circuit of automatic identification circuit and substrate frame (8) combines.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB031113389A CN1189587C (en) | 2003-03-30 | 2003-03-30 | Small substrate baffle for organic luminous film plating machine with automatic recognition function |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB031113389A CN1189587C (en) | 2003-03-30 | 2003-03-30 | Small substrate baffle for organic luminous film plating machine with automatic recognition function |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1441081A true CN1441081A (en) | 2003-09-10 |
| CN1189587C CN1189587C (en) | 2005-02-16 |
Family
ID=27770258
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB031113389A Expired - Fee Related CN1189587C (en) | 2003-03-30 | 2003-03-30 | Small substrate baffle for organic luminous film plating machine with automatic recognition function |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN1189587C (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112593202A (en) * | 2020-12-31 | 2021-04-02 | 无锡光润真空科技有限公司 | Winding film coating machine for point evaporation source |
-
2003
- 2003-03-30 CN CNB031113389A patent/CN1189587C/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112593202A (en) * | 2020-12-31 | 2021-04-02 | 无锡光润真空科技有限公司 | Winding film coating machine for point evaporation source |
Also Published As
| Publication number | Publication date |
|---|---|
| CN1189587C (en) | 2005-02-16 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| DE2946616A1 (en) | DEVICE FOR ALIGNING WORKPIECES | |
| CN1354891A (en) | Universal tool interface and/or workpiece transfer apparatus for SMIF and open pod applications | |
| CN111232901A (en) | Automatic cap opening machine for test tube | |
| CN1189587C (en) | Small substrate baffle for organic luminous film plating machine with automatic recognition function | |
| CN2615145Y (en) | Substrate small back plate of organic luminous membrane coating machine with automatic recognizing function | |
| CN109939870A (en) | Notebook A shell automates plastic-blasting device | |
| CN104451910A (en) | Electrostatic spinning device with jet flow induced at fixed point | |
| CN113814702A (en) | Double-layer large-diameter O-shaped ring assembling device and system for new energy motor | |
| CN211971730U (en) | Automatic cap opening machine for test tube | |
| CN213583692U (en) | Double-shaft linkage structure for vacuum motion platform in scanning electron microscope | |
| CN205235895U (en) | Melt spinning dyestuff automatic blending machine | |
| CN212301053U (en) | Edible agricultural product detection pretreatment device | |
| CN106964273A (en) | A kind of high coating material agitator of stirring efficiency | |
| CN113721015A (en) | Automatic microorganism detection device, system and method | |
| CN201508832U (en) | Load bearing and position converting device and on-line semiconductor detecting system provided with same | |
| CN2743828Y (en) | Rotary material falling tester | |
| CN112798523A (en) | Surface finish degree sampling inspection equipment for manufacturing bearing steel balls | |
| CN112474416A (en) | Utilize scanning electron microscope research loading attachment for rock | |
| CN2675666Y (en) | Rotary type full-automatic chemical scrubbing and filming arrangement | |
| CN206256156U (en) | Automation shift fork prong sprayed molybdenum special equipment | |
| CN221017207U (en) | Tea classification screening device | |
| CN220019359U (en) | Chip sample point detection equipment | |
| CN220672527U (en) | Wafer passivation device | |
| CN215437174U (en) | Rotating device of filling actuator | |
| CN218645970U (en) | Drying device of condenser |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C19 | Lapse of patent right due to non-payment of the annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |