CN2615145Y - Substrate small back plate of organic luminous membrane coating machine with automatic recognizing function - Google Patents
Substrate small back plate of organic luminous membrane coating machine with automatic recognizing function Download PDFInfo
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- CN2615145Y CN2615145Y CN 03212295 CN03212295U CN2615145Y CN 2615145 Y CN2615145 Y CN 2615145Y CN 03212295 CN03212295 CN 03212295 CN 03212295 U CN03212295 U CN 03212295U CN 2615145 Y CN2615145 Y CN 2615145Y
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Abstract
The utility model relates to a small baffle with automatic identifying function which is equipped in front of the base-plate bracket of the organic luminous film coating machine. The base-plate small baffle comprises a semi-circular small baffle (37) formed by two semi-circles capable of opening and closing, arranged on a supporting board and in synchronous revolution with the base-plate bracket, a mechanical hand with magnetic force driving (31), a push-pull controlling plate (38), a senor (44), a position detector (45), and an automatic identifying circuit. The semi-circular small baffle (37) and the push-pull controlling plate (38) are both arranged on the supporting board (12) which is disposed on the revolution axis (13) of the planetary rotating base-plate bracket (8) between the base-plate bracket (7) and a big baffle (6), and is in synchronous revolution with the planetary rotating base-plate bracket (8). The film coating condition of the corresponding base-plate can be conveniently controlled by the small baffle, thereby achieving the purpose of producing a plurality of samples in one experiment cycle, further effectively improving the working efficiency of the organic film coating.
Description
Technical field
The utility model belongs to mechanical field, is specifically related to a kind of preceding small front apron with automatic recognition function of organic light emission coating equipment substrate frame that is installed on.
Background technology
As shown in Figure 1, be the synoptic diagram of the most basic a kind of organic vacuum coating system that uses now.The effect of system's each several part and name are called: vacuum chamber 9 through vacuum lead 1 vacuumize reach requirement after, by contact conductor 2 energising preheatings, the big baffle plate 6 of substrate is closed in the pollution when substrate 7 is subjected to pre-thermal evaporation sources in advance to evaporation source 3.Planetary rotary substrate frame 8 can guarantee that the film forming on the substrate 7 is even.Substrate frame revolving power mechanism 10 is devices of rotation of control substrate and speed governing, and planetary rotary substrate frame 8 and substrate 7 are revolved round the sun synchronously around central shaft 13, makes substrate 7 rotations simultaneously.Can observe the working condition in the vacuum chamber 9 by glass window 5, quick operating valve 11 is in order to load and unload substrate and plating material fast.Connect glove box window 4 and be after having plated film and substrate to be sent to the encapsulation that glove box carries out device.
Explore and define the organic electro luminescent condition, the high-quality sample that needs to design and make a large amount of different ingredients and combination compares.Substrate frame with planetary rotation mode is owing to its coating quality evenly is used widely.But up to this point on the planetary rotary substrate frame of the organic film plating machine of this pattern,, in an experimental period, can only make a kind of sample no matter place several substrates.This is because each substrate all is exposed under the identical experiment condition fully, same evaporation in the cycle each on-chip film material structure and composition identical, do not reach and in same experimental period, select different experimental conditions to make the purpose of various sample.Yet the installation small front apron is controlled separately and is extremely difficult below position, substrate hole.So this is a problem that is not resolved for a long time.Thereby can only slowly in an experimental period, make a kind of sample, in another experimental period, make another kind of sample, make useful data of acquisition will spend a large amount of time and material resources, this is one of bottleneck of restriction raising vacuum organic film plating research work efficient.
The utility model content
The purpose of this utility model is exactly that one group of little plate washer with automatic recognition function is provided below substrate, each little plate washer can be controlled the plated film condition of corresponding substrate easily, thereby is implemented in the purpose of making a plurality of samples in the experimental period.
The little plate washer of substrate with automatic recognition function described in the utility model by be installed in two semicircles on the supporting plate can folding and with substrate frame synchronously substrate small front apron, magnetictransmission mechanical manipulator, push-and-pull switchboard, transmitter and the position sensor and the automatic identification circuit that constitute of the flat board of revolution constitute.
Description of drawings
Fig. 1: vacuum organic film plating machine structural representation in the prior art;
Fig. 2: vacuum organic film plating machine structural representation described in the utility model;
Fig. 3: the little plate washer mounting structure of substrate synoptic diagram;
Fig. 4: little plate washer distributed architecture synoptic diagram on the supporting plate;
Fig. 5: magnetic drive device working state schematic representation;
Fig. 6: automatic identification circuit synoptic diagram;
Fig. 7 (a): position sensor scheme of installation;
Fig. 7 (b): position sensor, transmitter scheme of installation.
Embodiment
Specifically, as shown in Figure 2, the utility model is between 8 substrate 7 and the big baffle plate 6 of substrate on the planetary rotary substrate frame, is provided with supporting plate 12, supporting plate 12 is installed on the hollow shaft 13 of planetary rotary substrate frame 8, with 8 rotations synchronously on the planetary rotary substrate frame.The little plate washer of substrate is installed on supporting plate 12, and the position of each little plate washer is corresponding with the position, hole of each substrate, and the little plate washer of each substrate can be controlled corresponding on-chip plated film in an experimental period.Like this, on the planetary rotary substrate frame 8 of same vacuum chamber a plurality of substrates (＞=2) just can be set, a plurality of little plate washers correspondingly are set on supporting plate 12, a plurality of little plate washers are to arrange around the symmetric form of hollow shaft (13).Just can control by the little plate washer of folding, thereby can in an experimental period, obtain a plurality of samples, improve the working efficiency of coating equipment effectively processing condition such as each substrate coating time and Coating Materials compositions.The quantity of substrate and little plate washer is advisable with 2,3,4,5,6,8, is the best with 3,4,5.
The utility model is an example with the organic vacuum coating machine with 4 substrates; inventive point of the present utility model is the structure of little plate washer; and irrelevant with the number of substrate, the little plate washer that every application is identical or close with the utility model is all within protection domain of the present utility model.
Shown in accompanying drawing 3 and accompanying drawing 4,4 small front apron symmetries are installed on the round pallet 12, and 4 small front aprons all are to be combined by two that radially separate along supporting plate 12 semicircular baffle plates 37.Each semicircle small front apron 37 all is separately fixed on supporting plate 12 and the push-and-pull switchboard 38 with dead axle 34 and moving axis 35.Guidepost 39 and dead axle 34 are to limit the direction of motion of push-and-pull switchboard 38 and distance, and push-and-pull switchboard 38 can only be along supporting plate 12 radial motions.On the moving axis 35 of two semicircle small front aprons 37, be with spring 36, spring 36 can make the small front apron 37 can both self-locking under the state that opens and closes, and can not close voluntarily or open in the process with supporting plate 12 and planetary rotary substrate frame 8 revolution to guarantee two semicircle small front aprons 37.
For the auto-lock function of spring, can do following understanding: when the right side of spring 36 at dead axle 34, little plate washer 37 is in closing condition, and at this moment spring tightly hauls two little plate washers, and little plate washer can oneself not opened; When push-and-pull switchboard 38 along guidepost 39 and dead axle 34 during to left movement, little plate washer is opened, spring 36 is that cover hangs on the moving axis 35, thereby spring 36 is pulled to the left side of dead axle 34, remain the little plate washer that hauls tightly, so no matter be the opened condition or the closing condition of corresponding little plate washer, spring all has auto-lock function.
Little plate washer folding control device is made up of magnetictransmission mechanical manipulator 31, magnetic force connecting rod 32, one end of magnetic force connecting rod 32 is positioned at the vacuum chamber outside, the other end and magnetictransmission mechanical manipulator 31 interlocks, thereby can fully guarantee under the constant situation of vacuum chamber vacuum condition, pass through to handle magnetic force connecting rod 32 in the vacuum chamber outside, interlock magnetictransmission mechanical manipulator 31 is controlled opening or closing of each little plate washer again, and this just realized in an experimental period, obtained the purpose of various sample.Fig. 5 is the schematic diagram of movements that expression small front apron 37 is opened and closed, when the end of magnetictransmission mechanical manipulator 31 is in the outside of push-and-pull switchboard 38, upwards promote the magnetic force connecting rod 32 of magnetictransmission mechanical manipulator 31, the end of mechanical manipulator 31 promotes push-and-pull switchboard 38 and moves right, rotate around dead axle 34 thereby drive small front apron 37, small front apron 37 is closed; When the end with mechanical manipulator 31 moved to the right side of push-and-pull switchboard 38, when pressing down the magnetic force connecting rod 32 of magnetictransmission mechanical manipulator 31, the end of mechanical manipulator 31 pushed away push-and-pull switchboard 38 left to left movement, thus the operation that has realized opening small front apron 37.
When utilizing after organic vacuum coating machine described in the utility model finishs a sample (establishing this sample is 1#), in the time of making the 2# sample, want certainly earlier the substrate small front apron of sample 1# correspondence is closed, again the substrate small front apron of sample 2# correspondence is opened.Open or close the little plate washer of substrate no matter be, all need to make earlier the rotation of planetary rotary substrate frame 8 to stop, at this moment 1# substrate and following small front apron thereof will be parked in the optional position at random for the magnetic force connecting rod 32 that is installed in the vacuum plating unit fixed position, need with the substrate of 1# sample correspondence and small front apron finds and it is moved to the below of the magnetictransmission mechanical manipulator 31 that is connected with magnetic force connecting rod 32.This work is gone to observe and sought by glass window 5 and operates by substrate frame power rotating mechanism 10 with hand more obviously is pretty troublesome, then can rapid and precisely finish this operation by a substrate automatic identification equipment.The substrate automatic identification equipment is made of transmitter, position sensor and automatic identification circuit, thereby realizes selecting fast automatically the purpose of substrate.
The substrate automatic identification equipment is made of with the same number of position sensor of substrate and an automatic identification circuit 1 transmitter.Shown in Fig. 7 (a), 7 (b), transmitter 44 be installed in planetary rotary substrate frame 8 above, position corresponding with position, a certain substrate 7 hole (assert that it is the 1# sample) is near the internal surface of vacuum chamber upper flange plate top cover 33.This transmitter must be suitable for working under vacuum condition, and its signal can see through metal, and for example magnet steel is exactly a kind of transmitter commonly used.In the outside of true chamber upper flange plate top cover 33,4 detectors 45 that can accept the magnetic force signal that transmitter sends be distributed in symmetrically with the same circumference of transmitter on, the position of one of them position of detector and magnetic force connecting rod 32 is radially same.In the specific design process of vacuum chamber, make transmitter and detector at a distance of near more good more, can accept enough big signal to guarantee detector.
The substrate automatic identification circuit as shown in Figure 6.The purpose of this circuit is in order to discern substrate to be selected and it to be moved to the below of magnetictransmission mechanical manipulator 31, and the electromotor control circuit of automatic identification circuit and planetary rotary substrate frame combines.
(frame A) is the electromotor control circuit of planetary rotary substrate frame in the solid-line rectangle frame above in Fig. 6 schematic circuit, all is substrate automatic identification circuit (frame B) in the whole strokes and dots wire frame, and frame C is the connection circuit of position sensor and automatic identification circuit.
The principle of work of automatic identification circuit is summarized as follows.In frame A, K4 is " work/identification " knob, and pressing down is planetary substrate frame 8 work, and At time of eject is that substrate 7 is discerned automatically.After pressing K4, press the K3 knob again, then planetary substrate frame 8 is just started working, and ejects the then planetary substrate frame 8 of K3 and quits work.
In rotary course, when selecting a certain substrate (as 1#), in the time of need opening or closing small front apron, eject the K3 button earlier, the rotation of planetary rotary substrate frame 8 is stopped, eject K4 again, start automatic identification circuit, and then press K5 (corresponding 1# substrate) knob, at this moment J1-1, J1-2 and J1-3 closure are for identification is ready to working conditions.Press K3 (power supply " ON "), electric motor begins to rotate, when transmitter forwards position sensor 1 to, with detector 1 closure, make relay J 5 work, the normally closed contact of J5-1 is opened, electric motor is quit work, at this moment, the position, hole of 1# substrate just in time forward to magnetictransmission mechanical manipulator 31 below.After this automatic identification equipment has been arranged, can increase work efficiency significantly, it is very convenient to operate.
Claims (5)
1, have the organic light emission coating equipment substrate small front apron of automatic recognition function, it is characterized in that:
1. form by two semicircular substrate small front aprons (37), push-and-pull switchboard (38), magnetictransmission mechanical manipulator (31), automatic identification equipment;
2. semicircle little plate washer (37) together is installed on the supporting plate (12) with push-and-pull switchboard (38), little plate washer is positioned at below, substrate (7) position, hole, supporting plate (12) is installed on the hollow shaft (13) of planetary rotary substrate frame (8), be positioned between substrate (7) and the big plate washer (6), rotate synchronously with planetary rotary substrate frame (8);
3. each semicircle little plate washer (37) is separately fixed on supporting plate (12) and the push-and-pull switchboard (38) with dead axle (34) and moving axis (35);
4. magnetictransmission mechanical manipulator (31) is installed in the fixed position of vacuum chamber, realizes the folding of two little plate washers of semicircle by push-and-pull switchboard (38);
5. automatic identification equipment is made of transmitter, position sensor and automatic identification circuit, transmitter (44) be installed in planetary rotary substrate frame (8) above, the position is corresponding to some substrates, be installed in the outside of vacuum chamber ring flange top cover (33) with the same number of position sensor of substrate (45), with transmitter with circumference and symmetrical distribution, the magnetic force connecting rod (32) of one of them position sensor and magnetictransmission mechanical manipulator (31) is radially same.
2, the organic light emission coating equipment substrate small front apron with automatic recognition function as claimed in claim 1, it is characterized in that: at supporting plate (12) guidepost (39) is installed also, guidepost (39) is positioned on the medullary ray of push-and-pull switchboard (38).
3, the organic light emission coating equipment substrate small front apron with automatic recognition function as claimed in claim 1 or 2 is characterized in that: be with spring (36) on the moving axis (35) of two semicircle small front aprons (37).
4, the organic light emission coating equipment substrate small front apron with automatic recognition function as claimed in claim 1, it is characterized in that: described magnetictransmission mechanical manipulator (31) is by magnetic force connecting rod (32) interlock outside vacuum chamber.
5, the organic light emission coating equipment substrate small front apron with automatic recognition function as claimed in claim 1, it is characterized in that: described transmitter is a magnet steel, detector is a dry-reed tube, and the electromotor control circuit of automatic identification circuit and substrate frame (8) combines.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 03212295 CN2615145Y (en) | 2003-03-30 | 2003-03-30 | Substrate small back plate of organic luminous membrane coating machine with automatic recognizing function |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 03212295 CN2615145Y (en) | 2003-03-30 | 2003-03-30 | Substrate small back plate of organic luminous membrane coating machine with automatic recognizing function |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN2615145Y true CN2615145Y (en) | 2004-05-12 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 03212295 Expired - Fee Related CN2615145Y (en) | 2003-03-30 | 2003-03-30 | Substrate small back plate of organic luminous membrane coating machine with automatic recognizing function |
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| CN (1) | CN2615145Y (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113265630A (en) * | 2021-06-30 | 2021-08-17 | 纳峰真空镀膜（上海）有限公司 | Coating film baffle |
-
2003
- 2003-03-30 CN CN 03212295 patent/CN2615145Y/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113265630A (en) * | 2021-06-30 | 2021-08-17 | 纳峰真空镀膜（上海）有限公司 | Coating film baffle |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C19 | Lapse of patent right due to non-payment of the annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |